JP6381346B2 - Light source device, illumination device, exposure device, and article manufacturing method - Google Patents

Description

The present invention relates to a light source device, an illumination device, an exposure device, and an article manufacturing method.

  In lithography processes included in the manufacturing process of semiconductor devices, etc., exposure that transfers the pattern formed on the original (reticle etc.) to the substrate (wafer etc. with a resist layer formed on the surface) via the projection optical system etc. A device is used. The exposure apparatus includes an illuminating device that illuminates the original with a light beam from a light source device that collects and emits a light beam from a light source. Patent Document 1 discloses a light source device (illumination optical device) that uses a high-pressure mercury lamp as a light source and uses an elliptical mirror as a condensing part. The light source device here arranges the light emission point of the high-pressure mercury lamp in the vicinity of the first focal point of the elliptical mirror, thereby condensing the light beam emitted from the light emission point in the vicinity of the second focal point of the elliptical mirror. Patent Document 2 uses a two-stage condensing unit composed of an elliptical mirror and a spherical mirror in this order from the first focal point of the elliptical mirror to the second focal point, and is condensed by the condensing unit. A light source device (light source unit) that reduces the maximum incident angle of a light beam is disclosed. On the other hand, Patent Document 3 uses a two-stage condensing unit configured in the order of a spherical mirror and an elliptical mirror from the first focal point to the second focal point of the elliptical mirror. A light source device that reduces the light collection diameter is disclosed.

Japanese Patent No. 4640688 Japanese Patent No. 3151534 Japanese Patent No. 4705852

  However, in the techniques disclosed in Patent Documents 1 to 3, the maximum incident angle and the condensing diameter of the light beam condensed by the condensing unit and the maximum diameter of the condensing mirror constituting the condensing unit are simultaneously reduced. I can't. Therefore, there is room for further improvement in order to use the light flux emitted from the light source more efficiently.

  The present invention has been made in view of such a situation, and an object of the present invention is to provide a light source device that is advantageous in terms of utilization efficiency of a light beam emitted from a light source, for example.

In order to solve the above problems, a light source apparatus according to one aspect of the present invention, there in a light source device comprising a light source for emitting light from the light emission region, a condensing section for emitting condensing light to the outside Te, condensed portion has a reflecting mirror having a reflecting surface for reflecting light emitted from the light-emitting region 4 or more, each reflector is formed to surround the axis, four or more reflector light source is disposed so as to surround the four or more reflective mirror comprises a elliptical reflecting mirror reflecting surface is ellipsoidal, a spherical reflecting mirror reflecting surface is spherical, ellipsoidal reflector and the spherical reflecting mirror and are arranged alternately in the direction of the axis, the light reflected by one of the spherical reflector, characterized in that it emits is reflected to the outside by one of the ellipsoidal reflector.

  According to the present invention, for example, it is possible to provide a light source device that is advantageous in terms of utilization efficiency of a light beam emitted from a light source.

It is a figure which shows the structure of the light source device which concerns on 1st Embodiment of this invention. It is a figure explaining the condensing state by the condensing part in 1st Embodiment. It is a figure explaining the projecting shape of the 3rd reflective mirror in 1st Embodiment. It is a figure explaining the maximum condensing diameter etc. of the condensing part in 1st Embodiment. It is a figure which shows the structure of the light source device which concerns on 2nd Embodiment of this invention. It is a figure which shows the structure of the light source device which concerns on 3rd Embodiment of this invention. It is a figure which shows the structure of the light source device which concerns on 4th Embodiment of this invention. It is a figure which shows the structure of the illuminating device which concerns on one Embodiment of this invention. It is a figure which shows the structure of the exposure apparatus which concerns on one Embodiment of this invention. It is a figure for demonstrating the case where a conical prism is applied to an illumination system. It is a figure which shows the structure of the 1st example of the conventional light source device. It is a figure which shows the structure of the 2nd example of the conventional light source device.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.

(First embodiment)
First, the light source device according to the first embodiment of the present invention will be described. The light source device according to the present embodiment is employed in, for example, an illumination device (illumination system) in an exposure apparatus used in a lithography process in a semiconductor device manufacturing process, and is directed toward a predetermined position (region). Radiate luminous flux. Hereinafter, in order to clarify the characteristics of the light source device according to the present embodiment, first, two conventional light source devices will be exemplified, and then the light source device according to the present embodiment will be described in comparison with the conventional light source device. .

FIG. 11 is a schematic cross-sectional view showing a configuration of a light source device 500 as a first example of a conventional light source device, in which the light source 1 is a high-pressure mercury lamp and the light collecting unit is a single elliptical mirror (ellipsoidal reflecting mirror). It is. Of these, FIG. 11A shows a reflection angle at which two large and small elliptical mirrors having a rotational symmetry with respect to the optical axis AX reflect different luminous fluxes, and radiation at which the light source 1 emits luminous flux. It is a figure which shows the relationship with an angle. The light source 1 has two electrodes, ie, a cathode and an anode, and emits a light beam from a light emitting point (light emitting region) 1a having a predetermined size formed between the electrodes. The luminous point 1a has a rotationally symmetric luminous intensity distribution. The optical axis AX can be said to be a rotationally symmetric axis of the light emitting point 1a. At this time, a part of the light flux emitted from the light source 1 is blocked by the cathode and the anode near the light emitting point 1a, so that the radiation angle is in a range of predetermined angles θcathode and θanode represented by the first auxiliary line 2a as a boundary. Limited to. The first elliptical mirror 210 having the larger outer diameter and the second elliptical mirror 230 having the smaller outer diameter share two focal points on the optical axis AX, and angles θ ₂₁₀ and θ that each reflect the light flux. ₂₃₀ is equal. The first auxiliary line 2a is a line drawn at the position of the first focal point on the optical axis AX, and the second auxiliary line 2b is a line drawn at the position of the second focal point on the optical axis AX. In the figure, the distance between the first focus and the second focus (inter-focus distance) is denoted by f. The light source 1 is arranged with respect to the elliptical mirrors 210 and 230 so that the light emitting point 1a substantially coincides with the first focal point of the elliptical mirrors 210 and 230.

FIG. 11B illustrates the maximum condensing diameter Φ ₂₃₀ and the maximum condensing angle Ψ _{230 of} the light beam collected by the second elliptical mirror 230, and the maximum reflecting mirror outer diameter D ₂₃₀ of the second elliptical mirror 230. FIG. In FIG. 11 (b), the notation of the overall view of the light source 1 is simplified, the state of condensing rays emitted from the outermost periphery of the light emitting point 1a having a predetermined size is shown, and the first focal point FP ₁ , The second focal point FP ₂ , the reflection point PI ₂₃₀ and the reflection point PO ₂₃₀ are clearly shown. First, it is assumed that the reflecting surface of the second elliptical mirror 230 is composed of a continuous and extremely small plane, and the condensing diameter of the light beam is considered. Assuming that the reflection point PI ₂₃₀ is a minimal plane, it can be approximated that the spread angle of the incident light beam and the spread angle of the reflected light at the reflection point PI ₂₃₀ are equal. Similarly, it can be approximated that the spread angle of the incident light beam at the reflection point PO ₂₃₀ is equal to the spread angle of the reflected light. Also, when the spread angle of the incident light beam at the reflection point and the spread angle of the reflected light are equal, focused diameter formed by the reflected light, the diameter of the light emitting points 1a, a distance from the reflection point to the second focal point FP ₂ It can be approximated by multiplying the ratio of the distance from the reflection point to the first focal point FP _1. Therefore, the maximum condensing diameter Φ ₂₃₀ is formed on a plane perpendicular to the optical axis AX including the second focal point FP ₂ by the light reflected on the second elliptical mirror 230 at the reflection point PI ₂₃₀ closest to the light emitting point 1a. Expand. On the other hand, the maximum condensing angle Ψ ₂₃₀ is the first focal point FP ₁ on the optical axis AX out of the light reflected on the second elliptical mirror 230 at the reflection point PO ₂₃₀ closest to the second focal point FP _2. The angle formed by the light having an intersection on the side. The maximum reflecting mirror outer diameter D ₂₃₀ is an outer diameter formed by the opening on the second focal point FP ₂ side of the second elliptical mirror 230. When the two focal points FP ₁ and FP ₂ of the second elliptical mirror 230 are fixed and the maximum condensing diameter of the light beam collected by the second elliptical mirror 230 is reduced, the elliptical mirror closest to the light emitting point 1a is used. The distance from the upper reflection point to the first focal point FP ₁ may be increased.

FIG. 11C illustrates the maximum condensing diameter Φ ₂₁₀ and the maximum condensing angle Ψ _{210 of} the light beam collected by the first elliptical mirror 210 and the maximum reflecting mirror outer diameter D ₂₁₀ of the first elliptical mirror 210. FIG. In FIG. 11C, the notation of the overall view of the light source 1 is simplified to show the state of condensing rays emitted from the outermost periphery of the light emitting point 1a having a predetermined size, and the first focus FP ₁ , The second focal point FP ₂ , the reflection point PI ₂₁₀ and the reflection point PO ₂₁₀ are clearly shown. Also in the first elliptical mirror 210, as in the second ellipsoidal mirror 230, maximum collection size [Phi _210, the light reflected by the closest reflection point _{PI 210} to the light emitting point 1a on the first ellipsoidal mirror 210, the spread to be formed on a plane perpendicular to the optical axis AX including the second focal point FP _2. Here, the maximum condensing diameter Φ ₂₁₀ is smaller than the maximum condensing diameter Φ ₂₃₀ of the second elliptical mirror 230. The maximum condensing angle Ψ ₂₁₀ is larger than the maximum condensing angle Ψ ₂₃₀ of the second elliptical mirror 230. Further, the maximum reflecting mirror outer diameter D ₂₁₀ is larger than the maximum reflecting mirror outer diameter D _{230 of} the second elliptical mirror 230.

  As described above, in the conventional light source device 500 in which the condensing part is a single elliptical mirror, even if the shape (eccentricity) of the elliptical mirror is changed, the maximum condensing diameter Φ and the maximum condensing of the condensing part. The values of the angle Ψ and the maximum reflector outer diameter D cannot be reduced at the same time.

FIG. 12 shows, as a second example of a conventional light source device, a light source 1 is a high-pressure mercury lamp, and a condensing unit is configured in the order of one elliptical mirror (ellipsoidal reflecting mirror) and one spherical mirror (spherical reflecting mirror). It is a schematic sectional drawing which shows the structure of the light source device 600 which is the condensing mirror of 2 steps | paragraphs. Of these, FIG. 12A shows a reflection angle at which each of the first elliptical mirror 2101 and the first spherical mirror 2102 having a rotationally symmetric shape with respect to the optical axis AX reflects the light beam, and the light source 1 emits the light beam. It is a figure which shows the relationship with the radiation angle to do. The first elliptical mirror 2101 and the first spherical mirror 2102 are obtained by replacing the first elliptical mirror 210 in the first example with a two-stage condensing unit, and the first elliptical mirror 2101 is the first in the first example. The aperture on the second focal point FP ₂ side of the elliptical mirror 210 is reduced. Further, FIG. 12 (a) in the second size of the focal FP ₂ side of the opening, the second focal point FP ₂ side of the opening of the second ellipsoidal mirror 230 of the first example the size of the first ellipsoidal mirror 2101 ( D ₂₃₀ ). The center point of the first spherical mirror 2102 is assumed to be at substantially the same position as the first focal point of the first elliptical mirror 2101. The reflection angle on the second focal point FP ₂ side of the first spherical mirror 2102 is the same as the angle on the second focal point FP ₂ side of the radiation angle θanode of the light source 1. Further, the opening end of the first elliptical mirror 2101 on the first auxiliary line 2a side extends to the first spherical mirror 2102 side across the first auxiliary line 2a by a distance δ ₂₁₀₁ determined by the distance between the cathode and the anode of the light source 1. put out. This is because when the opening end of the first spherical mirror 2102 extends to the first auxiliary line 2 a, a part of the light beam returned to the vicinity of the light emitting point 1 a of the light source 1 by the first spherical mirror 2102 is reflected again by the first spherical mirror 2102. This is to avoid multiple reflections that are repeated.

FIG. 12B shows the maximum condensing diameter Φ ₂₁₀₁ and the maximum condensing angle Ψ _{2101 of the} light beam condensed by the first elliptical mirror 2101, the spherical mirror 2102 and the condensing unit, and the outside of the maximum reflecting mirror of the condensing unit. It is a figure explaining diameter _D2101 . In FIG. 12B, the notation of the overall view of the light source 1 is simplified, the state of condensing rays emitted from the outermost periphery of the light emitting point 1a having a predetermined size is shown, and the first focal point FP ₁ , The second focal point FP ₂ , the reflection point PI ₂₁₀₁ and the reflection point PO ₂₁₀₁ are clearly shown. The first ellipsoidal mirror 2101 are part of the first ellipsoidal mirror 210 in the first embodiment, the maximum condensing diameter [Phi _2101, the maximum collection diameter [Phi ₂₁₀ of the first ellipsoidal mirror 210 in the first embodiment Equally smaller than the maximum condensing diameter Φ ₂₃₀ of the second elliptical mirror 230. As described above, the size of the opening on the second focal point FP ₂ side of the first elliptical mirror 2101 is defined to be the same as the size of the opening on the second focal point FP ₂ side of the second elliptical mirror 230 in the first example. Therefore, the maximum condensing angle Ψ ₂₁₀₁ is smaller than the maximum condensing angle Ψ ₂₃₀ of the second elliptical mirror 230 in the first example. In addition, since the maximum reflecting mirror outer diameter D ₂₁₀₂ is the outer diameter of the first spherical mirror 2102 here, it is larger than the maximum reflecting mirror outer diameter D ₂₃₀ of the second elliptical mirror 230 in the first example.

  As described above, even in the conventional light source device 600 which is a two-stage condensing mirror in which the condensing unit is configured in the order of one elliptical mirror and one spherical mirror, the maximum condensing diameter Φ and the maximum condensing of the condensing unit. The values of the angle Ψ and the maximum reflector outer diameter D cannot be reduced at the same time. This also applies to a conventional light source device having a two-stage configuration in which the condensing unit is configured in the order of one spherical mirror and one elliptical mirror. For example, when the maximum condensing diameter Φ is made smaller than the state shown in FIG. 11C, the maximum condensing angle Ψ and the maximum reflecting mirror outer diameter D are increased.

  Therefore, the light source device according to the present embodiment employs a condensing unit including four reflecting mirrors in which elliptical mirrors and spherical mirrors having a rotationally symmetric shape with respect to the optical axis AX are arranged, thereby collecting light. The maximum condensing diameter Φ, the maximum condensing angle Ψ, and the maximum reflecting mirror outer diameter D are simultaneously reduced.

FIG. 1 is a schematic cross-sectional view showing the configuration of the light source device 100 according to the present embodiment, corresponding to FIG. 11A used in the description of the conventional light source device 500, and the same description conditions and the like. The light source device 100 includes a light source 1 that is a high-pressure mercury lamp and a condensing unit 2 that is a four-stage reflecting mirror as in the conventional case. First, the first reflecting mirror 21 and the third reflecting mirror 23 are ellipsoidal mirrors whose reflecting surfaces are elliptical surfaces and have different eccentricities, and share two focal points on the optical axis AX. Among these, the first reflecting mirror 21 can be regarded as a part of the conventional first elliptical mirror 210, and the third reflecting mirror 23 can be regarded as a part of the second elliptical mirror 230. On the other hand, each of the second reflecting mirror 22 and the fourth reflecting mirror 24 is a spherical mirror having a spherical reflecting surface, and the center point of each of the second reflecting mirror 22 and the fourth reflecting mirror 24 is a first focal point FP shared by the first reflecting mirror 21 and the third reflecting mirror 23. It is assumed that it is at the same position as ₁ .

In FIG. 1, the ranges of angles at which the first reflecting mirror 21, the second reflecting mirror 22, the third reflecting mirror 23, and the fourth reflecting mirror 24 reflect the light flux are respectively θ ₂₁ , θ ₂₂ , θ ₂₃ , θ ₂₄ . Here, it is desirable that θ ₂₁ and θ ₂₂ , θ ₂₂ and θ ₂₃ , and θ ₂₃ and θ ₂₄ are substantially continuous. In addition, it is desirable that the angle range (θ ₂₁ + θ ₂₂ + θ ₂₃ + θ ₂₄ ) at which the light collecting unit 2 reflects the light flux and the angle range (θcathode + θanode) at which the light source 1 emits the light flux are substantially equal. In addition, the ranges of angles θ ₂₁ (θ) and θ ₂₄ (θ ′) reflected by the first reflecting mirror 21 and the fourth reflecting mirror 24 have a relationship (θ ≧ θ ′) of θ ₂₁ ≧ θ _24. Shall be satisfied. On the other hand, the angle ranges θ ₂₂ (θ ′) and θ ₂₃ (θ) reflected by the second reflecting mirror 22 and the third reflecting mirror 23 satisfy the relationship θ ₂₂ ≦ θ ₂₃ . Further, the third reflecting mirror 23 has a shape protruding by δ ₂₃ determined by the distance between the cathode and the anode of the light source 1 on the second reflecting mirror 22 side with the first auxiliary line 2a interposed therebetween.

FIG. 2 is a schematic cross-sectional view for explaining a condensing state by the condensing unit 2 in the configuration shown in FIG. Among these, Fig.2 (a) is a figure which shows each condensing state of the 1st reflective mirror 21 and the 3rd reflective mirror 23 which are respectively elliptical mirrors. A part of the light beam emitted from the light source 1 is reflected by the first reflecting mirror 21 and condensed at the second focal point with an angle θ ′ ₂₁ . On the other hand, the other part of the light beam emitted from the light source 1 is reflected by the third reflecting mirror 23 and condensed at the second focal point with an angle θ ′ ₂₃ . Here, it is desirable that the angles θ ′ ₂₁ and θ ′ ₂₃ that are focused on the second focal point are substantially continuous.

FIG. 2B is a diagram showing a light collection state of the fourth reflecting mirror 24 which is a spherical mirror. A part of the light beam emitted from the light source 1 is reflected by the fourth reflecting mirror 24, returned to the vicinity of the light emitting point 1a, reflected by the first reflecting mirror 21, and condensed on the second focal point. Here, the relationship between the angle ranges θ ₂₁ and θ ₂₄ is set to θ ₂₁ ≧ θ ₂₄ as described above, because all of the light flux returned to the vicinity of the light emitting point 1a by the fourth reflecting mirror 24 is the first reflection. This is because the light is reflected by the mirror 21.

FIG. 2C is a diagram showing a light collection state of the second reflecting mirror 22 which is a spherical mirror. A part of the light beam emitted from the light source 1 is reflected by the second reflecting mirror 22, returned to the vicinity of the light emitting point 1 a, reflected by the third reflecting mirror 23, and condensed on the second focal point. Here, as described above, the relationship between the angle ranges θ ₂₂ and θ ₂₃ is set to θ ₂₂ ≦ θ ₂₃ because all of the light flux returned to the vicinity of the light emitting point 1a by the second reflecting mirror 22 is third reflected. This is because the light is reflected by the mirror 23.

Next, the reason why the third reflecting mirror 23 is shaped so as to protrude by δ ₂₃ toward the second reflecting mirror 22 with the first auxiliary line 2a interposed therebetween will be described. FIG. 3 is a schematic cross-sectional view showing only the second reflecting mirror 22 and the third reflecting mirror 23 and explaining the protruding shape of the third reflecting mirror 23. In FIG. 3, the first focus FP ₁ , the second focus FP _2, and the points p _{1 to} p ₉ are added for the sake of explanation. Here, the description will be focused on the light beam emitted from the center of the light emitting point 1a and passing through the opening end of the third reflecting mirror 23.

FIG. 3A is a diagram showing a case where the opening end of the third reflecting mirror 23 does not protrude toward the second reflecting mirror 22 with the first auxiliary line 2a interposed therebetween as a comparative example. First, part of the light flux emitted from the center of the light emitting point 1a is, between the reflection point p ₁ on the second reflecting mirror 22 at the opposite position across the first focal point FP ₁ and the reflection point p ₂ multiplexing repeatedly reflected and does not reach the second focal point FP _2. Further, a part of the light beam emitted from the point p ₃ at the end of the light emitting point 1 a and passing through the vicinity of the opening end of the third reflecting mirror 23 is shown in the drawing from the reflecting point p ₁ on the second reflecting mirror 22. After being reflected at the left reflection point p _4, it is reflected again at the reflection point p ₅ on the second reflecting mirror 22. The light beam reflected by the reflection point p _5, in a state where the light intensity of the amount corresponding light beam reflects the second reflecting mirror 22 extra once drops, reflected at the reflection point p ₆ on the third reflecting mirror 23, The second focal point FP ₂ is reached. Further, a part of the light beam emitted from the point p ₃ at the end of the light emitting point 1a and reflected on the second reflecting mirror 22 at the reflection point p ₇ on the left side in the drawing further than the reflection point p ₄ is the second light beam. boundary between the reflecting mirror 22 and third reflecting mirror 23 to diverge as the outside, does not reach the second focal point FP _2. Further, in a part of the light beam emitted from a point p ₃ end of the light emitting points 1a, the light flux reflected by the further left side in the drawing than the reflection point p ₇ on the second reflecting mirror 22 (not shown), the third reflection is reflected by the mirror 23, reaches the second focal point FP _2. As described above, when the third reflecting mirror 23 is not provided with an overhang, a part of the light beam emitted from the light emitting point 1 a is partially reflected by the light beam that does not reach the second focal point FP ₂ or twice by the second reflecting mirror 22. There is a light beam that is reflected and reaches the second focal point FP ₂ with a reduced light intensity.

FIG. 3B is a diagram illustrating a case where the open end of the third reflecting mirror 23 projects by δ ₂₃ toward the second reflecting mirror 22 with the first auxiliary line 2a interposed therebetween in the present embodiment. First, part of the light flux emitted from the center of the light emitting point 1a is reflected by the reflection point p ₈ on the second reflecting mirror 22, third reflecting mirror on opposite positions across the first focal point FP ₁ 23 It reflected by the reflection point _{p 9} above, to reach the second focal point FP _2. Further, a part of the light beam emitted from the point p ₃ at the end of the light emitting point 1 a and passing through the vicinity of the opening end of the third reflecting mirror 23 is shown in the drawing from the reflecting point p ₈ on the second reflecting mirror 22. After being reflected at the left reflection point p _10, it is reflected at the reflection point p ₁₁ on the third reflecting mirror 23 and reaches the second focal point FP ₂ . As described above, when the third reflecting mirror 23 is provided with an overhang, the light beam emitted from the light emitting point 1a is reflected twice by the light beam that does not reach the second focal point FP ₂ or the second reflecting mirror 22, thereby increasing the light intensity. It is possible to eliminate the light flux that reaches the second focal point FP ₂ by being lowered. The diameter of the light emitting point 1a of the light source 1 is substantially equal to the distance between the cathode and the anode of the light source 1 where the light emitting point 1a is formed. Therefore, it is desirable that the value of δ ₂₃ is not less than ½ of the distance between the cathode and the anode of the light source 1.

Next, the maximum condensing diameter Φ, the maximum condensing angle Ψ, and the maximum reflecting mirror outer diameter D in the light source device 100 will be described. FIG. 4 is a diagram for explaining the maximum condensing diameter Φ ₂₁ and the maximum condensing angle Ψ _{23 of} the light beam collected by the condensing unit 2 and the maximum reflecting mirror outer diameter D ₂₄ of the condensing unit 2. FIG. 4 corresponds to FIG. 11B illustrating the conventional light source device 500, and the description conditions and the like are also the same. Also, in FIG. 4, the notation of the overall view of the light source 1 is simplified, the state of condensing rays emitted from the outermost periphery of the light emitting point 1 a having a predetermined size is shown, and the first focus FP ₁ , the second focus FP ₂ , reflection point PI ₂₁ and reflection point PO ₂₃ are clearly shown. First, the maximum condensing diameter Φ ₂₁ is equal to the maximum condensing diameter Φ ₂₁₀ of the conventional first elliptical mirror 210 since the first reflecting mirror 21 can be regarded as a part of the conventional first elliptical mirror 210. smaller than the maximum condensing diameter [Phi ₂₃₀ of 2 ellipsoidal mirror 230. The size of the opening on the second focal point FP ₂ side of the third reflecting mirror 23 is smaller than the opening on the second focal point FP ₂ side of the conventional second elliptical mirror 230 by an amount corresponding to the provision of the fourth reflecting mirror 24. The maximum condensing angle Ψ ₂₃ is smaller than the maximum condensing angle Ψ ₂₃₀ of the conventional second elliptical mirror 230. The maximum reflecting mirror outer diameter D ₂₄ is the outer diameter of the fourth reflecting mirror 24. The outer diameter of the fourth reflecting mirror 24 is approximately the same as the maximum reflecting mirror outer diameter D ₂₃₀ of the conventional second elliptical mirror 230 by adjusting the position of the boundary with the third reflecting mirror 23. Can be. Therefore, the maximum reflecting mirror outer diameter D ₂₄ can be made substantially the same as the conventional maximum reflecting mirror outer diameter D ₂₃₀ .

Thus, the light source device 100 condenses the light beam emitted from the light source 1 on the second focal point FP ₂ of the condensing unit 2 by using the condensing unit 2 as the four-stage reflecting mirror as described above. Can be made. At this time, the light source device 100 simultaneously obtains the values of the maximum condensing diameter Φ, the maximum condensing angle ψ, and the maximum reflecting mirror outer diameter D of the condensing unit 2 at the same time as the conventional light source device 500 shown in FIG. It is possible to make it equal to or smaller than the above state. That is, the light source device 100 can efficiently use the light flux emitted from the light source 1 while maintaining the overall size of the light collecting unit 2.

  As described above, according to the present embodiment, it is possible to provide a light source device that is advantageous in terms of utilization efficiency of a light beam emitted from a light source.

(Second Embodiment)
Next, a light source device according to a second embodiment of the invention will be described. The light source device 100 according to the first embodiment employs a four-stage condensing unit in which elliptical mirrors and spherical mirrors having a rotationally symmetric shape with respect to the optical axis AX are alternately arranged. Not limited to this, a light collecting section having four or more reflecting mirrors may be employed. In this embodiment, a light source device that employs a six-stage condensing unit in which elliptical mirrors and spherical mirrors having a rotationally symmetric shape with respect to the optical axis AX are alternately arranged is illustrated.

FIG. 5 is a schematic cross-sectional view showing the configuration of the light source device 110 according to the present embodiment. The light source device 110 includes a light source 1 that is a high-pressure mercury lamp and a condensing unit 20 that is a six-stage condensing mirror. FIG. 5A is a diagram corresponding to FIG. 11A used in the description of the conventional light source device 500, and the description conditions and the like are also the same. First, the first reflecting mirror 25, the third reflecting mirror 27, and the fifth reflecting mirror 29 are elliptical mirrors having different eccentricities from each other, and share two focal points on the optical axis AX. The eccentricity of the first reflecting mirror 25 is smaller than the eccentricity of the third reflecting mirror 23, and the eccentricity of the third reflecting mirror 23 is smaller than the eccentricity of the fifth reflecting mirror 29. Among these, the fifth reflecting mirror 29 can be regarded as a part of the third reflecting mirror 27 in the first embodiment, and the opening diameter of the fifth reflecting mirror 29 on the second focal point FP ₂ side is the opening of the third reflecting mirror 23. It is the same size as the caliber. On the other hand, the second reflecting mirror 26, the fourth reflecting mirror 28, and the sixth reflecting mirror 24 are spherical mirrors, and the first reflecting mirror 21, the third reflecting mirror 23, and the fifth reflecting mirror 29 are at the center points. It is assumed that the first focal point FP ₁ to be shared is substantially at the same position. Among these, the sixth reflecting mirror 24 is the same spherical mirror as the fourth reflecting mirror 24 in the first embodiment.

In FIG. 5A, angles at which the first reflecting mirror 25, the second reflecting mirror 26, the third reflecting mirror 27, the fourth reflecting mirror 28, the fifth reflecting mirror 29, and the sixth reflecting mirror 24 reflect the light flux. Are represented as θ ₂₅ , θ ₂₆ , θ ₂₇ , θ ₂₈ , θ _29, and θ ₂₄ , respectively. Here, it is desirable that θ ₂₅ and θ ₂₆ , θ ₂₆ and θ ₂₇ , θ ₂₇ and θ ₂₈ , θ ₂₈ and θ _29, and θ ₂₉ and θ ₂₄ are substantially continuous. In addition, it is desirable that the angle range (Σθ _{25 to 29} + θ ₂₄ ) at which the light collecting unit 20 reflects the light flux and the angle range (θcathode + θanode) at which the light source 1 emits the light flux are substantially equal. In addition, as described in the first embodiment, there is a relationship of (the angle θ reflected by the elliptic mirror) ≧ (the angle θ ′ reflected by the spherical mirror) between the elliptic mirrors that reflect the light reflected by the spherical mirror. It is desirable. For example, it is assumed that the angle ranges θ ₂₅ and θ ₂₄ reflected by the first reflecting mirror 25 and the sixth reflecting mirror 24 satisfy the relationship θ ₂₅ ≧ θ ₂₄ . The angle ranges θ ₂₅ and θ ₂₉ reflected by the second reflecting mirror 26 and the fifth reflecting mirror 29 are assumed to satisfy the relationship θ ₂₉ ≧ θ ₂₆ . Further, the angle ranges θ ₂₇ and θ ₂₈ reflected by the third reflecting mirror 27 and the fourth reflecting mirror 28 respectively satisfy the relationship θ ₂₇ ≧ θ ₂₈ . Further, the third reflecting mirror 27 has a shape projecting by δ ₂₇ determined by the distance between the cathode and the anode of the light source 1 on the fourth reflecting mirror 28 side with the first auxiliary line 2a interposed therebetween.

  In the present embodiment, the reflection path of the elliptical mirror and the reflection path of the elliptical mirror via the spherical mirror are the same as those of the light source device 100 according to the first embodiment, and thus description thereof is omitted.

Next, the maximum condensing diameter Φ, the maximum condensing angle Ψ, and the maximum reflecting mirror outer diameter D of the condensing unit 20 will be described. FIG. 5B is a diagram for explaining the maximum condensing diameter Φ ₂₅ and the maximum condensing angle Ψ _{29 of} the light beam collected by the condensing unit 20 and the maximum reflecting mirror outer diameter D ₂₄ of the condensing unit 20. is there. 5B corresponds to FIG. 11B illustrating the conventional light source device 500, and the description conditions and the like are the same. Also, in FIG. 4, the notation of the overall view of the light source 1 is simplified, the state of condensing rays emitted from the outermost periphery of the light emitting point 1 a having a predetermined size is shown, and the first focus FP ₁ , the second focus FP ₂ , reflection point PI ₂₅ and reflection point PO ₂₉ are clearly shown. First, since the sixth reflecting mirror 24 is the same as the fourth reflecting mirror 24 in the first embodiment, the maximum reflecting mirror outer diameter D ₂₄ is equal to the maximum reflecting mirror outer diameter D ₂₄ in the first embodiment. Fifth reflecting mirror 29, regarded as part of the ellipsoidal mirror of the third reflection mirror 23 in the first embodiment, since the same opening diameter of the second focal point FP ₂ side, a maximum collection angle [psi _29, the It is equal to the maximum collection angle Ψ ₂₃ in one embodiment. Further, since the eccentricity of the first reflecting mirror 25 is smaller than the eccentricity of the first reflecting mirror 21 in the first embodiment, the reflection point PI ₂₅ on the first reflecting mirror ₂₅ is the first in the first embodiment. distance from the light emitting point 1a of the reflecting point _{PI 21} on the reflecting mirror 21 is large. Therefore, the maximum condensing diameter Φ ₂₅ is smaller than the maximum condensing diameter Φ ₂₁ in the first embodiment.

  In the light source device 110, the condensing unit has a six-stage configuration as described above, so that the maximum condensing angle Φ and the maximum reflection of the condensing unit are compared with the four-stage condensing unit in the first embodiment. It is possible to make the outer diameter D of the mirror the same and to reduce the maximum condensing diameter Ψ. In the present embodiment, the condensing unit has a six-stage configuration. However, the light source device of the present invention further increases the number of stages by 8, 10, and even stages, thereby increasing the maximum condensing angle Φ and The maximum condensing diameter Ψ can be further reduced while maintaining the maximum reflecting mirror outer diameter D. As a result, according to the present embodiment, the same effects as those of the first embodiment can be obtained.

(Third embodiment)
Next, a light source device according to a third embodiment of the invention will be described. In the light source devices 100 and 110 according to the above-described embodiments, the condensing unit has an even-stage configuration of an elliptical mirror and a spherical mirror. On the other hand, the feature of the light source device according to the present embodiment is that it employs a condensing unit having an odd-numbered configuration in which elliptical mirrors and spherical mirrors having a rotationally symmetric shape with respect to the optical axis AX are alternately arranged. It is in.

  FIG. 6 is a schematic cross-sectional view showing the configuration of the light source device 120 according to the present embodiment. FIG. 6 is a diagram corresponding to FIG. 11A used in the description of the conventional light source device 500, and the description conditions and the like are also the same. The light source device 120 includes a light source 1 that is a high-pressure mercury lamp as in the conventional case, and a condensing unit 40 that is a five-stage condensing mirror as an example. In this way, the condition that enables the condensing unit to be configured with an odd number of stages depends on the radiation angle of the light beam emitted from the light source 1. Specifically, the light source 1 applicable in this case is such that the radiation angle θanode of the emitted light beam is smaller than the radiation angle θanode of the light beam emitted by the light source 1 in the second embodiment shown in FIG. is there. And the condensing part 40 becomes a structure remove | excluding the 6th reflective mirror 24 which is a spherical mirror from the condensing part 20 shown in FIG. 5 according to the light source 1 in this case. The light source device 120 has the same effects as those of the above-described embodiments even when the light collecting unit has an odd-numbered stage configuration as described above.

(Fourth embodiment)
Next, a light source device according to a fourth embodiment of the invention will be described. In the light source device 100 according to the first embodiment, as can be seen with reference to FIG. 1, the emission angle θcathode of the cathode-side luminous flux emitted from the light source 1 and the emission angle θanode of the anode-side luminous flux satisfy the relationship of θcathode> θanode. It is in. In contrast, the light source device according to the present embodiment is characterized in that the condensing unit is set so that θcathode and θanode are equal (θcathode = θanode).

  FIG. 7 is a schematic cross-sectional view showing the configuration of the light source device 130 according to the present embodiment. The light source device 130 includes a light source 1 that is a high-pressure mercury lamp as in the prior art, and a condensing unit 50 that is a four-stage condensing mirror as in the first embodiment. FIG. 7A is a diagram corresponding to the light source device 100 according to the first embodiment shown in FIG. 1, and the description conditions and the like are also the same. In the present embodiment, for example, θanode is increased and made equal to θcathode by changing the tip shape of the anode near the light emitting point 1a. In this way, by changing the tip shape of the anode in the vicinity of the light emitting point 1a, it becomes possible to emit the light beam from the light emitting point 1a, which has been blocked by the shape of the anode, to the outside of the light source 1. The light output of the light source 1 can be increased. And the condensing part 50 makes the 1st reflective mirror 21-the 3rd reflective mirror 23 the same as the condensing part 2 of the light source device 100 which concerns on 1st Embodiment, and respond | corresponds to the increase in (theta) anode, 4th reflection. The area where the mirror 30 reflects the light flux is widened.

  Also in the present embodiment, the reflection path of the elliptical mirror and the reflection path of the elliptical mirror via the spherical mirror are the same as those of the light source device 100 according to the first embodiment, and thus description thereof is omitted.

Next, the maximum condensing diameter Φ, the maximum condensing angle Ψ, and the maximum reflecting mirror outer diameter D of the condensing unit 50 will be described. FIG. 7B is a diagram for explaining the maximum condensing diameter Φ ₂₁ and the maximum condensing angle Ψ _{23 of} the light beam collected by the condensing unit 50 and the maximum reflecting mirror outer diameter D ₃₀ of the condensing unit 50. is there. FIG. 7B corresponds to FIG. 4 illustrating the light source device 100 according to the first embodiment, and the description conditions and the like are also the same. Further, in FIG. 4, the notation of the overall view of the light source 1 is simplified, the state of condensing rays emitted from the outermost periphery of the light emitting point 1 a having a predetermined size is shown, and the first focus FP ₁ , The bifocal point FP ₂ , the reflection point PI ₂₁ and the reflection point PO ₂₃ are clearly shown. Here, the condensing part 50 changes only the 4th reflective mirror 30 with respect to the condensing part 2 of the light source device 100 which concerns on 1st Embodiment as mentioned above. Therefore, the maximum condensing diameter [Phi ₂₁ and the maximum collection angle [psi ₂₃ is the same as the maximum condensing diameter [Phi ₂₁ and the maximum collection angle [psi ₂₃ shown in FIG. 2 (a), up to the reflector outer diameter D ₃₀ Is larger than the maximum reflector outer diameter D ₂₄ shown in FIG. That is, according to the present embodiment, the final focus on the second focal point FP ₂ side without changing the maximum condensing diameter Φ and the maximum condensing angle Ψ even for the light source 1 in which θanode is increased to increase the light output. The light source device 130 can be configured simply by enlarging the mirror (fourth reflecting mirror 30).

(Lighting device)
Next, an illumination device according to an embodiment of the present invention will be described. The illumination device according to the present embodiment includes the light source device according to each of the embodiments described above, and emits a light beam from the light source device to a predetermined position (region). In particular, the illuminating device according to the present embodiment is characterized in that the maximum condensing diameter of the condensing unit 2 is the same as that of the conventional light source device even though the size of the light emitting point 1a of the light source 1 is further increased. It is in the point.

FIG. 8 is a schematic cross-sectional view showing the configuration of the illumination device. 8A shows an illumination according to this embodiment in which an optical integrator 70 is added to the light source device 100 according to the first embodiment, and the light emission point 1a of the light source 1 is made larger than the light emission point 1a of FIG. FIG. On the other hand, FIG.8 (b) is the figure of the conventional illuminating device 300 which added the optical integrator 70 to the conventional light source device 500 as a comparative example. In many cases, an imaging optical system is generally provided between the second focal point FP ₂ of the light converging unit and the incident surface of the optical integrator 70. It constitutes the incident surface of the direct optical integrator 70 to a second focal point FP _2. The light beam that has passed through the optical integrator 70 reaches the irradiated surface of the illumination device. Hereinafter, assuming that the size of the light beam condensed on the incident surface of the optical integrator 70 is the same in FIGS. 8A and 8B, the projection of the maximum light collection diameter Φ formed by each of the light source devices 100 and 500 is performed. The magnification will be described.

First, referring to FIG. 8A showing the illumination device 200 according to the present embodiment, the light beam forming the maximum condensing diameter Φ ₂₁ is emitted from the light emitting point 1 a and reflected on the first reflecting mirror 21. ₂₁ is reflected. Here, assuming that the interfocal distance f = 1,000 mm and the eccentricity of the first reflecting mirror 21 is 0.77, (line segment PI ₂₁ FP ₁ ) = 172 mm, (line segment PI ₂₁ FP ₂ ) = 1, 030 mm. That is, the length of (line segment PI ₂₁ FP ₂ ) is 6 times that of (line segment PI ₂₁ FP ₁ ), and the image of the light emitting point 1 a is projected on the incident surface of the optical integrator 70 by 6 times. The Therefore, the size of the light emitting points 1a in this case, it can be said that with the magnitude of maximum collection size 1 size of 6 minutes [Phi ₂₁ of the light beam converged on the incident surface of the optical integrator 70.

On the other hand, referring to FIG. 8 (b) showing the conventional illumination device 300, the luminous flux forming the maximum condensing diameter Φ ₂₃₀ is emitted from the light emitting point 1 a and reflected on the first reflecting mirror 23. ₂₃₀ is reflected. Here, assuming that the distance between the focal points is f = 1,000 mm and the eccentricity of the first reflecting mirror 21 is 0.85, (line segment PI ₂₁ FP ₁ ) = 102 mm, (line segment PI ₂₁ FP ₂ ) = 1017 mm Become. That is, the length of (line segment PI ₂₃₀ FP ₂ ) is 10 times that of (line segment PI ₂₃₀ FP ₁ ), and the image of the light emitting point 1 a is projected on the incident surface of the optical integrator 70 by 10 times. The Therefore, it can be said that the size of the light emitting point 1a in this case is one tenth of the maximum condensing diameter Φ ₂₃₀ that is the size of the light beam condensed on the incident surface of the optical integrator 70.

  That is, the size of the light emitting point 1a in the lighting device 200 according to the present embodiment is about 1.7 times the size of the light emitting point 1a in the conventional lighting device 300. Generally, the size of the light emitting point of a light source (high pressure mercury lamp) is considered to be proportional to the distance between the cathode and the anode. In addition, it is considered that a substantially proportional relationship is established between the output of the light source used in the lighting device and the distance between the cathode and the anode. Therefore, when the size of the light emitting point is 1.7 times, the output of the light source used in the illumination device is 1.7 times. In other words, by using the light source device 100 according to the first embodiment for the lighting device 200, an effect equivalent to that of using a light source with about 1.7 times larger output than the conventional one can be obtained. The illuminance of the apparatus can be increased 1.7 times from the conventional one. Furthermore, since the maximum condensing angle of the light source device 100 applied to the illumination device 200 is smaller than the condensing angle of the conventional light source device 500, an optical system (not shown) that can be installed on the downstream side of the optical integrator 70 is used. The diameter can be set smaller.

  Thus, according to the illuminating device according to the present embodiment, by using the light source device according to the above-described embodiment, the diameter of the optical system in the illuminating device is reduced to reduce the overall shape, and the illuminance is reduced. This can be improved compared to the prior art.

(Exposure equipment)
Next, an exposure apparatus according to an embodiment of the present invention will be described. The exposure apparatus according to the present embodiment includes the light source device according to each of the embodiments described above, and includes the light source device 110 according to the second embodiment as an example. FIG. 9 is a schematic view showing the arrangement of the exposure apparatus 400 according to this embodiment. The exposure apparatus 400 is used, for example, in a lithography process in a semiconductor device manufacturing process, and exposes an image of a pattern formed on a reticle R on a wafer W (on a substrate) by a scanning exposure method ( Transfer). In FIG. 9, the Z axis is parallel to the optical axis of the projection optical system 13, the X axis is taken in the scanning direction of the wafer W during exposure in the same plane perpendicular to the Z axis, and the non-axis perpendicular to the X axis is taken. The Y axis is taken in the scanning direction. The exposure apparatus 400 includes an illumination system 17, a reticle stage 11, a projection optical system 13 (exposure unit) , a wafer stage 16, and a control unit 18.

The illumination system 17 illuminates the reticle R by adjusting the light (light flux) emitted from the light source 1. The illumination system 17 includes a light source device 110 including a light source 1, a cold mirror 4, an optical rod 5, a Fourier transform optical system 6, an optical integrator 7, an aperture stop 8, a collimator 9, and a bending mirror 10. With. The light source device 110 condenses the light beam emitted from the light source 1 by the condensing unit 2 and reflects it by the cold mirror 4, so that the optical rod 5 disposed in the vicinity of the second focal point FP ₂ of the condensing unit 2. An image of the light emitting portion 1a of the light source 1 is formed on the incident surface. The cold mirror 4 is a reflecting mirror having a multilayer film such as a dielectric on the surface thereof, and mainly transmits infrared light and reflects ultraviolet light used for exposure light. The optical rod 5 is an optical waveguide having a cylindrical side surface, and is disposed on the incident surface of the optical integrator 7 and in the vicinity of the opening surface (the surface having the second focal point FP ₂ ) ₂ b of the light collecting unit 2. 1 is installed so as not to cause a shadow of the lead wire 1b for supplying power to the power source. The light beam incident on the optical rod 5 becomes a Skew light beam that is reflected and swiveled on the side surface of the cylinder, and the shadow of the lead wire 1b is blurred and disappears. The Fourier transform optical system (optical system) 6 receives the light beam from the output end of the optical rod 5 and converts it into a parallel light beam, and forms an image of the aperture surface 2 b of the light collecting unit 2 on the incident surface of the optical integrator 7. To do. The optical integrator 7 includes a plurality of small lenses arranged two-dimensionally, and forms a secondary light source on the exit surface. The aperture stop 8 is detachably installed on the exit surface of the optical integrator 7, blocks a part of the secondary light source image formed on the exit surface of the optical integrator 7, and shapes the shape of the secondary light source image. For example, when the cross section of the small lens constituting the optical integrator 7 is rectangular, the size of the secondary light source image formed on the exit surface of the optical integrator 7 is different in the XZ plane. Therefore, the aperture stop 8 can shape the size of the image of the secondary light source formed on the exit surface of the optical integrator 7 to be equal in the XZ plane. The collimator 9 includes two lens systems 9 a and 9 b arranged with the bending mirror 10 interposed therebetween, and illuminates the reticle R that is an irradiated surface placed on the reticle stage 11.

  The reticle R (or mask) is an original made of, for example, quartz glass on which a pattern (for example, a circuit pattern) to be transferred is formed on the wafer W. The reticle stage 11 holds the reticle R and is movable in the X and Y axis directions. The projection optical system 13 projects the light that has passed through the reticle R onto the wafer W at a predetermined magnification (for example, 1/2 times). In the present embodiment, the image of the secondary light source formed on the exit surface of the optical integrator 7 is formed near the pupil plane 13 a of the projection optical system 13 by the collimator 9. The wafer W is a substrate made of, for example, single crystal silicon, on which a resist (photosensitive agent) is applied. The wafer stage 16 holds the wafer W via the wafer chuck 15 and is movable in each axial direction of X, Y, and Z (which may include ωx, ωy, and ωz that are the respective rotation directions). The control unit 18 is configured by a computer, for example, and is connected to each component of the exposure apparatus 400 via a line, and can control the operation of each component according to a program or the like. Note that the control unit 18 may be configured integrally with other parts of the exposure apparatus 400 (in a common casing), or separate from the other parts of the exposure apparatus 400 (in a separate casing). It may be configured.

Next, a description will be given of a case where a light beam conversion member (conical prism) that is detachable and changes the light intensity distribution of the secondary light source is applied to the exposure apparatus 400, particularly the illumination system 17 including the light source device 110. Prior to this, an outer angle and an inner angle of the condensed light beam formed by the light collecting unit 2 in the light source device 110 will be described with reference to FIG. In FIG. 5B, the size of the light emitting point 1a is exaggerated, but the distance between the focal points of the light source device 110 mounted on the actual exposure apparatus 400 is, for example, 1,000 mm. The size of the light emitting point 1a is about 10 mm. Therefore, the outer angle of the condensed light flux formed by the light collecting unit 2 may be considered as ∠ (FP ₁ PO ₂₉ FP ₂ ) and the inner angle as ∠ (FP ₁ PI ₂₅ FP ₂ ). In general exposure apparatus design, the outer angle 外 (FP ₁ PO ₂₉ FP ₂ ) is often set to about 20 degrees. Further, the interior angle _{∠ (FP 1 PI 25 FP 2} ) , when it is assumed that external angle ∠ the _{(FP 1 PO 29 FP 2)} 18 degrees, the size of 1/3 with respect to the external angle _{∠ (FP 1 PO 29 FP 2} ) It can be set to 6 degrees. Therefore, in the following description, it is assumed that the outer angle ∠ (FP ₁ PO ₂₉ FP ₂ ) is 18 degrees and the inner angle ∠ (FP ₁ PI ₂₅ FP ₂ ) is 6 degrees.

  FIG. 10 is a schematic diagram for explaining a case where a conical prism is applied to the illumination system 17, and the configuration from the optical rod 5 to the aperture stop 8 in the illumination system 17 shown in FIG. 9 is enlarged. Among these, Fig.10 (a) has shown the state which has not installed the conical prism. The light intensity distribution 180 indicates the light intensity distribution of the image of the aperture surface 2 b of the light collecting unit 2 formed on the incident surface of the optical integrator 7 by the Fourier transform optical system 6. Here, it is assumed that the Fourier transform optical system 6 projects an image of the aperture surface 2b of the light collecting unit 2 so that the outer diameter of the light intensity distribution 180 is σ0.6. At this time, the inner diameter of the light intensity distribution 180 is σ0.2. That is, the light intensity distribution 180 has a shape called “1/3 annular zone” with outer σ0.6 and inner σ0.2.

  FIG. 10B shows a state in which a first conical prism 171 and a second aperture stop 801 are installed between the Fourier transform optical system 6 and the optical integrator 7 (before the incident surface of the optical integrator 7). ing. The first conical prism 171 is rotationally symmetric with respect to the optical axis AX, has an inclined surface in which two surfaces of the entrance surface and the exit surface are parallel, and translates the light beam incident parallel to the optical axis AX inward. The second aperture stop 801 is adapted to the shape of the first conical prism 171 instead of the aperture stop 8 shown in FIG. At this time, the light intensity distribution 181 has a circular shape with an outer σ0.4 (inner σ0.0).

  FIG. 10C shows a state in which the second conical prism 172 and the third aperture stop 802 are installed between the Fourier transform optical system 6 and the optical integrator 7 (before the incident surface of the optical integrator 7). ing. The second conical prism 172 has a shape in which the first conical prism 171 is disposed in the direction opposite to the optical axis AX, and translates the light beam incident parallel to the optical axis AX to the outside. The third aperture stop 801 is adapted to the shape of the second conical prism 172 instead of the aperture stop 8 shown in FIG. At this time, the light intensity distribution 182 has a shape called “1/2 ring zone” with outer σ0.8 and inner σ0.4.

  The illumination system 17 appropriately uses the light beam conversion member as described above, so that the effective light source has an outer σ0.8 (inner σ0.0) circular shape, an outer σ0.8, and an inner σ0.4. It is possible to change the shape to a 1/2 zone. In the above description, the illumination system 17 includes an aperture stop. However, each aperture stop is not an essential component, the diameter of the small lens constituting the optical integrator 7 is sufficiently small, and the difference in the XZ direction of the image of the secondary light source formed on the exit surface of the optical integrator 7 is ignored. If possible, installation is not required. Moreover, in this embodiment, although the illumination system 17 is set as the structure which uses the optical rod 5, it is not an essential structure.

  Thus, according to the exposure apparatus according to the present embodiment, it is possible to achieve both space saving and power saving by using the light source device (illumination apparatus) according to the above-described embodiment.

(Product manufacturing method)
The method for manufacturing an article according to an embodiment of the present invention is suitable, for example, for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure. In the method for manufacturing an article according to the present embodiment, a latent image pattern is formed on the photosensitive agent applied to the substrate using the above-described exposure apparatus (a step of exposing the substrate), and the latent image pattern is formed in this step. Developing the substrate. Further, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 1 Light source 1a Light emission point 2 Condensing part 21 1st reflective mirror 22 2nd reflective mirror 23 3rd reflective mirror 24 4th reflective mirror 100 Light source device

Claims (11)

A light source device comprising a light source for emitting light from the light emission region, a condensing section for emitting to the outside by focusing the light,
Before SL condensing unit has a reflecting mirror having a reflecting surface for reflecting the light emitted from the light-emitting region 4 or more, each reflector is formed to surround the shaft,
The four or more reflecting mirrors are installed so as to surround the light source ,
Before SL four or more reflectors may include a elliptical reflecting mirror wherein the reflective surface is elliptical surface and a spherical reflecting mirror wherein the reflective surface is a spherical surface,
Wherein the elliptic surface reflector and front Symbol spherical reflecting mirror, they are arranged alternately in the direction of said axis,
The light reflected by one of the spherical reflector, is reflected to emit to the outside by one of the ellipsoidal reflector,
A light source device characterized by that. The spherical reflector has a spherical center point in the light emitting region,
The ellipsoidal reflector has an ellipsoidal focal point in the light emitting region;
The light source device according to claim 1. In a plane containing said axis, said the range of the angle theta 'one spherical reflecting mirror for reflecting light from the light emitting region, said one of said that the light reflected anti Isa by the one spherical reflector 3. The light source device according to claim 1, wherein the angle θ of the range reflected by the ellipsoidal reflecting mirror satisfies a relationship of θ ≧ θ ′.   The light source device according to claim 1, wherein the light source includes a cathode and an anode that form the light emitting region. When the one ellipsoidal reflector and the one spherical reflector are adjacent to each other across the light emitting region,
Open end of the side adjacent to the spherical reflector in the ellipsoidal reflector, the side of the spherical reflector from the light emitting region, protrudes by 1/2 or more of the distance between the cathode and the anode The light source device according to claim 4. In a plane containing said axis, claim 4 wherein the light source and the angle for emitting the light to the side of the cathode, and the angle which the light source emits the light to the side of the anode, characterized in that equal Or the light source device of 5. The light source device according to any one of claims 1 to 6,
An optical integrator on which a light beam emitted from the light source device is incident;
A lighting device comprising: A cylindrical waveguide that is installed between the light collecting unit and the optical integrator and into which the light condensed by the light collecting unit is incident;
An optical system installed between the waveguide and the optical integrator for converting light emitted from the waveguide into parallel light ;
The lighting device according to claim 7, comprising: 9. The illumination device according to claim 8, further comprising a light beam conversion member that is detachably installed between the optical system and the optical integrator, and changes a shape of light incident on the optical integrator. An exposure apparatus comprising: the illumination apparatus according to claim 7; and an exposure unit that exposes a substrate using a mask illuminated by the illumination apparatus. Exposing the substrate using the exposure apparatus according to claim 10;
Processing the substrate exposed in the step;
Manufacture articles from processed substrates
Method of manufacturing an article, characterized and this.

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