JP4520757B2 - Air diffuser - Google Patents

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JP4520757B2
JP4520757B2 JP2004059783A JP2004059783A JP4520757B2 JP 4520757 B2 JP4520757 B2 JP 4520757B2 JP 2004059783 A JP2004059783 A JP 2004059783A JP 2004059783 A JP2004059783 A JP 2004059783A JP 4520757 B2 JP4520757 B2 JP 4520757B2
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diffuser
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JP2005219036A (en
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久夫 小嶋
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Anemos Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
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Description

本発明は、産業排水、上下水および湖沼、河川、地下水等の水処理と浄化および気体中の異種物質の除去、回収や生物反応装置(バイオリアクター)などに利用される散気処理装置に関する。詳しくは、気体と液体とを混合、攪拌させて気液接触させる操作であり、空気を水中で曝気させて空気中の酸素を水中に溶解させたり、水中に溶存しているアンモニア、トリクロロエタン、塩化メチレン、塩素、トリハロメタン等の揮発性物質の放散および気体中の塩化水素、二酸化硫黄、粉麈などの異種物質を反応吸収、捕集による除去、回収、更に酵素反応および微生物反応などに利用される散気処理装置に関する。  The present invention relates to an aeration treatment apparatus used for water treatment and purification of industrial wastewater, water and sewage, lakes, rivers, groundwater, etc., removal and recovery of foreign substances in gas, and bioreactors (bioreactors). Specifically, it is an operation of mixing gas and liquid, stirring them and bringing them into gas-liquid contact. Aeration of air in water to dissolve oxygen in the air, ammonia dissolved in water, trichloroethane, chloride Emission of volatile substances such as methylene, chlorine, trihalomethane, and other substances such as hydrogen chloride, sulfur dioxide, and powder in the reaction are absorbed, removed by collection, recovered, and used for enzyme reactions and microbial reactions. The present invention relates to an air diffuser.

従来の散気処理装置は、大別すると、散気式(気泡式)、機械攪拌式(表面攪拌)である。特に、散気式による曝気処理装置110は、図16に示すように、曝気槽111の底部に散気板112、散気筒等を多数配置して、これらに送風機113および気送ライン114を介して加圧空気を供給して曝気処理を行っている。又、液体中に溶存しているアンモニア等の窒素化合物を放散して浄化・回収する場合は、図17に示すように、充填塔や棚段塔等が多く利用されている。充填塔方式による放散処理装置115の場合、充填塔116上部から液体が供給され、塔下部より気体が供給される。塔内に配置されている充填物117を向流で気液接触しながら、液体中のアンモニア(NH )、有機溶媒等の揮発性物質は気体側に放散されて、液体の浄化・回収処理が行われている。Conventional air diffusion treatment devices are roughly classified into an air diffusion type (bubble type) and a mechanical stirring type (surface stirring). In particular, as shown in FIG. 16, the aeration type aeration processing apparatus 110 has a large number of aeration plates 112, diffusion cylinders, and the like arranged at the bottom of the aeration tank 111, and these are connected via a blower 113 and an air supply line 114. Then, aeration processing is performed by supplying pressurized air. In addition, when a nitrogen compound such as ammonia dissolved in a liquid is diffused to be purified and recovered, a packed tower or a plate tower is often used as shown in FIG. In the case of the dispersal treatment apparatus 115 using a packed tower system, a liquid is supplied from the upper part of the packed tower 116 and a gas is supplied from the lower part of the tower. While the packing 117 arranged in the tower is in gas-liquid contact in countercurrent, volatile substances such as ammonia (NH 4 + ) and organic solvent in the liquid are diffused to the gas side to purify and recover the liquid. Processing is in progress.

又、粉麈と亜硫酸ガスを含む排ガスの処理装置の気液接触反応装置として、多数のガス噴出孔を有する筒状の排ガス分散管が使用されている。この排ガス分散管を利用した排ガス処理方法が特開平7−308536号、特開平9−865号に開示されているが、液体と多数のガス噴出孔から吹出す気泡との気液接触効率は低い。又、反応生成物である石膏の付着成長による閉塞の問題がある。  Moreover, a cylindrical exhaust gas dispersion pipe having a large number of gas ejection holes is used as a gas-liquid contact reaction device of a processing device for exhaust gas containing powder and sulfurous acid gas. An exhaust gas treatment method using this exhaust gas dispersion pipe is disclosed in Japanese Patent Application Laid-Open No. 7-308536 and Japanese Patent Application Laid-Open No. 9-865, but the gas-liquid contact efficiency between the liquid and the bubbles blown out from many gas injection holes is low. . Moreover, there is a problem of clogging due to adhesion growth of gypsum which is a reaction product.

更に、従来の静止型混合器を利用した散気処理装置は、構造上の問題から酸素吸収(溶解)効率は低く、又、大口径(直径で500mm以上)の散気処理装置の製作は難しく、製作可能でも気液接触効率は低い。更に製作加工費も高価となる。
更に又、従来の静止型混合器の下方に配置されている空気供給用気送管の空気吹出孔の口径は10〜40mmの範囲である。この気送管の上面に1つ又は複数個の吹出孔を有している。
この吹出孔から供給される気泡の気泡径は空気吹出孔の口径と同一の為に、気液接触効率は低く、酸素吸収効率も低くなり、混合器内での接触時間を長くする必要がある。
この結果、静止型混合器すなわち散気処理装置の全長は高くなり、設備費は高価となる。
又、従来の散気板,散気筒,静止型混合器等からなる散気処理装置の構成材料は、プラスチック,ゴム等が多く利用されている。その為に、材質の劣化,老化等により散気処理装置の寿命は短期間である。又、新品との交換時には、多量の廃棄物が発生して、その廃棄物処理費用も高価となる。
Furthermore, the conventional air diffuser using a static mixer has low oxygen absorption (dissolution) efficiency due to structural problems, and it is difficult to manufacture an air diffuser with a large diameter (500 mm or more in diameter). Even if it can be manufactured, the gas-liquid contact efficiency is low. Furthermore, the manufacturing cost is also expensive.
Furthermore, the diameter of the air outlet hole of the air supply pipe arranged below the conventional static mixer is in the range of 10 to 40 mm. One or a plurality of blowout holes are provided on the upper surface of the air pipe.
Since the bubble diameter of the bubbles supplied from the blowing hole is the same as the diameter of the air blowing hole, the gas-liquid contact efficiency is low, the oxygen absorption efficiency is also low, and it is necessary to lengthen the contact time in the mixer. .
As a result, the total length of the static mixer, that is, the diffuser is high, and the equipment cost is high.
In addition, plastic, rubber, and the like are often used as constituent materials of the conventional air diffuser including a diffuser plate, a diffuser cylinder, and a static mixer. For this reason, the life of the diffuser is short due to material deterioration, aging, and the like. In addition, when a new one is exchanged, a large amount of waste is generated, and the waste disposal cost becomes expensive.

特開平2−198694号公報      Japanese Patent Laid-Open No. 2-198694 特開昭44−8290号公報      JP-A-44-8290 特開昭53−36182号公報      JP-A-53-36182 特開平5−168882号公報      JP-A-5-168882 特開平7−284642号公報      Japanese Patent Laid-Open No. 7-284642 特開平7−308536号公報      JP-A-7-308536 特開平9−865号公報      JP-A-9-865 特開平10−80627号公報      Japanese Patent Laid-Open No. 10-80627 特開平10−85721号公報      Japanese Patent Laid-Open No. 10-85721 特開2001−62269号公報      JP 2001-62269 A 特開昭59−206096号公報      JP 59-206096 A S.J.チェン,他「スタティック・ミキシング・ハンドブック」総合化学研究所、1973年6月発行,P62〜82,P199〜217      S. J. et al. Chen, et al. "Static Mixing Handbook", Research Institute for Chemical Research, June 1973, P62-82, P199-217 松村 輝一郎,森島 泰,他「静止型混合器−基礎と応用−」日刊工業新聞社、1981年9月30日発行,P1〜18,P81〜95      Teruichiro Matsumura, Yasushi Morishima, et al. “Static Mixer: Basics and Applications”, Nikkan Kogyo Shimbun, published September 30, 1981, P1-18, P81-95

従来の散気処理装置は、酸素の溶存および吸収効率が低く、散気板1台あたりの供給空気量は小さいので広大な面積を必要としている。又、曝気槽内の混合攪拌の為に、必要酸素量以上の空気を散気板等に加圧供給している。更に散気板を通過する空気抵抗は大きい。その為に、多大の電力を消費している。又、従来の充填塔、棚段塔等の放散処理装置は、充填物や棚段に液体中のカルシウム化合物や微生物等が付着成長して目詰まりを起こし、定期的な保守管理を必要としている。更に、従来の静止型混合器を利用した散気処理装置は酸素吸収効率が低く、大型化が困難であった。そこで、本発明の課題は、気液接触効率の向上と曝気、放散および反応処理を極めて効果的に省エネルギー、省スペース、低コスト、メンテナンスフリーで排水等を浄化し、又気体中の異種物質を除去・回収する散気処理装置を提供することである。更に高効率の酵素反応および微生物反応に利用できる生物反応装置(バイオリアクター)を提供することである。  The conventional air diffuser has a low oxygen dissolution and absorption efficiency and requires a large area because the amount of air supplied per air diffuser is small. In addition, for the purpose of mixing and stirring in the aeration tank, air exceeding the required oxygen amount is pressurized and supplied to a diffuser plate or the like. Furthermore, the air resistance passing through the diffuser plate is large. For this reason, a large amount of power is consumed. In addition, conventional diffusion treatment apparatuses such as packed towers and tray towers cause clogging due to the growth of calcium compounds and microorganisms in the liquid on the packings and trays and require regular maintenance management. . Furthermore, the conventional air diffuser using a static mixer has a low oxygen absorption efficiency and is difficult to increase in size. Therefore, the object of the present invention is to improve the efficiency of gas-liquid contact and aeration, release and reaction treatment, effectively purify wastewater etc. with energy saving, space saving, low cost and maintenance-free, and also dissimilar substances in gas It is to provide an aeration processing apparatus that removes and collects. It is another object of the present invention to provide a bioreactor (bioreactor) that can be used for highly efficient enzyme reactions and microbial reactions.

課題を解決するための部Department for solving problems

上記の課題を解決するための本発明の第1の散気処理装置は、長手方向に実質的に垂直に配置された静止型混合器を内設した筒状の流体が通流する通路管と前記通路管の下端側に気体を前記通路管内に気送ラインを介して噴出供給する気体噴出部を配置し、前記気体噴出部にスプレーノズルを配設し、前記気送管の気体噴出部に気体を供給し、前記通路管の下方側から液体を前記通路管内に導入し、前記気体および液体は前記通路管内を並流で上昇し、両者は前期通路管の内部で気液接触し、前記通路管の上端側から液体中に排出される散気処理装置。これらの散気処理装置は、混合攪拌動力を必要としない流体の流動エネルギーを利用して流体の混合攪拌を行なう静止型混合器を配置し、その下方に気体噴出部を配置し、その噴出エネルギーにより液体は気体噴出部の下方から導入される。液体と気体とは通路管の下端側から上端側に並流で通流して気液接触混合し、曝気,放散および反応処理が行なわれる。  In order to solve the above-mentioned problems, a first air diffusion treatment device of the present invention comprises a passage pipe through which a cylindrical fluid flows, which is provided with a static mixer disposed substantially perpendicular to the longitudinal direction. A gas ejection part that supplies gas into the passage pipe through an air feeding line is disposed at the lower end side of the passage pipe, a spray nozzle is disposed in the gas ejection part, and a gas ejection part of the air feeding pipe is provided. A gas is supplied, and a liquid is introduced into the passage pipe from a lower side of the passage pipe, the gas and the liquid rise in a parallel flow in the passage pipe, and both come into gas-liquid contact inside the passage pipe, An air diffuser that is discharged into the liquid from the upper end side of the passage pipe. In these diffuser processing devices, a static mixer that performs fluid mixing and stirring using fluid flow energy that does not require mixing and stirring power is disposed, and a gas ejection portion is disposed below the stationary mixer, and the ejection energy thereof. Thus, the liquid is introduced from below the gas ejection portion. The liquid and the gas flow in parallel from the lower end side to the upper end side of the passage tube and are gas-liquid contact mixed to perform aeration, diffusion, and reaction processing.

又、前記の課題を解決するための本発明の第2の散気処理装置は、長手方向を実質的に垂直にして配置された静止型混合器を内設した筒状の流体が通流する通路管と前記通路管の下端側に気体を前記通路管内に供給する気体噴出部を配置し、前記気体噴出部に静止型混合器を配設し、前記気体噴出部に気体を供給し、前記通路管の下方側から液体を前記通路管内に導入し、前記気体および液体は前記通路管内を並流で上昇し、両者は前記通路管の内部で気液接触混合し、前記通路管の上端側から液体中に排出される散気処理装置。  Further, in the second air diffusion treatment device of the present invention for solving the above-mentioned problems, a cylindrical fluid having a stationary mixer arranged with the longitudinal direction substantially vertical passes therethrough. A gas ejection part that supplies gas into the passage pipe is disposed on the lower end side of the passage pipe and the passage pipe, a static mixer is disposed in the gas ejection part, gas is supplied to the gas ejection part, Liquid is introduced into the passage pipe from the lower side of the passage pipe, and the gas and the liquid rise in a parallel flow in the passage pipe, and both are gas-liquid contact mixed in the passage pipe, and the upper end side of the passage pipe. Air diffuser that is discharged from the liquid into the liquid.

更に、前記通路管内および前記気体噴出部に配置される前記静止型混合器は、右捻り又は左捻りの螺旋状の複数個の羽根体を内設して、複数個の流体通路を形成し、流体通路同士は羽根体の長手方向の開口部を介して連通し、前記羽根体は多孔板で形成されている。  Further, the stationary mixer disposed in the passage pipe and in the gas ejection portion includes a plurality of right-handed or left-handed spiral blades to form a plurality of fluid passages, The fluid passages communicate with each other through an opening in the longitudinal direction of the blade body, and the blade body is formed of a perforated plate.

発明の効果The invention's effect

本発明の散気処理装置によれば、低圧力損失下で気液接触効率の高効率化による酸素溶存効率の向上により、消費電力が大幅に削減できる。又、気液接触効率の向上により、曝気,放散および反応処理時間は短縮される。更に又、散気処理装置は単位面積あたりの気体供給能力の向上により、水平方向の設置面積が小さくなって、省スペースとなり、建築土木費、設備費も安価になる。又、空気供給用配管等の工事費も低減される。更に又、目詰まりによる運転停止の発生もないので、保守管理費や生産管理費も安価になる。又、流体の淀み部(死領域)がないので大型化が容易になる。更に又、本発明による散気処理装置の構成材料を、鉄,ステンレス,チタン,ハステロイ等の金属を利用することで、半永久的に使用可能となり、処理コストを大幅に低減でき、廃棄物処理費用をなくすことが可能となる。  According to the aeration treatment apparatus of the present invention, power consumption can be significantly reduced by improving the oxygen dissolution efficiency by increasing the gas-liquid contact efficiency under a low pressure loss. Moreover, aeration, dissipation, and reaction processing time are shortened by improving the gas-liquid contact efficiency. In addition, the diffuser processing apparatus has an improved gas supply capacity per unit area, which reduces the horizontal installation area, saves space, and reduces civil engineering and equipment costs. In addition, construction costs such as air supply piping are reduced. Furthermore, since there is no outage due to clogging, maintenance management costs and production management costs are also reduced. Further, since there is no fluid stagnation part (dead region), it is easy to increase the size. Furthermore, the constituent material of the diffuser according to the present invention can be used semipermanently by using a metal such as iron, stainless steel, titanium, hastelloy, etc., and the processing cost can be greatly reduced, and the waste processing cost. Can be eliminated.

以下、本発明の実施例について、添付の図面を参照して具体的に説明する。図1は本発明に係る第1実施例を示す模式図である。図2は同様に第2実施例の模式図、図3は同様に第3実施例を示す模式図、図4(a)、(b)は本発明で使用する静止型混合器の一実施例を示す羽根体を有する通路管の斜視図、図5は本発明で使用する静止型混合器の一実施例を示す基本構造図。図6は本発明の第1の実施例に係る散気処理装置の概略図、図7は本発明の第1の実施例で使用されるスプレーノズルの一実施例を示す斜視図。図8は同様に第2の実施例に係る散気処理装置の概略図。図9は本発明の第2の実施例に係る散気処理装置の部分概略底面図。図10は本発明の第2の実施例に係る気体噴出部の部分概略斜視図。図11は本発明の第3の実施例に係る散気処理装置の概略断面図。図12は本発明に係る散気処理装置を活性汚泥法の曝気処理に適用した場合の実施例を示すブロック図である。図13は同様に排水の放散処理に適用した場合の実施例を示すブロック図である。図14は同様に排ガス処理装置に適用した場合の実施例を示すブロック図、図15は同様に酵素又は微生物を利用した生物反応に適用した場合の実施例を示すブロック図、図16は従来の散気板方式による曝気処理装置を示す模式図、図17は従来の充填物方式による放散処理装置を示す模式図である。  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a schematic view showing a first embodiment according to the present invention. 2 is a schematic view of the second embodiment, FIG. 3 is a schematic view of the third embodiment, and FIGS. 4A and 4B are an embodiment of a static mixer used in the present invention. FIG. 5 is a basic structural view showing an embodiment of a static mixer used in the present invention. FIG. 6 is a schematic view of an air diffusion treatment apparatus according to the first embodiment of the present invention, and FIG. 7 is a perspective view showing an embodiment of a spray nozzle used in the first embodiment of the present invention. FIG. 8 is a schematic view of the air diffuser according to the second embodiment. FIG. 9 is a partial schematic bottom view of the air diffusion treatment device according to the second embodiment of the present invention. FIG. 10 is a partial schematic perspective view of a gas ejection portion according to the second embodiment of the present invention. FIG. 11 is a schematic cross-sectional view of a diffuser according to a third embodiment of the present invention. FIG. 12 is a block diagram showing an embodiment in the case where the aeration treatment apparatus according to the present invention is applied to the activated sludge aeration process. FIG. 13 is a block diagram showing an embodiment in the case where the present invention is similarly applied to drainage treatment. FIG. 14 is a block diagram showing an embodiment when similarly applied to an exhaust gas treatment apparatus, FIG. 15 is a block diagram showing an embodiment when similarly applied to a biological reaction using an enzyme or a microorganism, and FIG. FIG. 17 is a schematic view showing an aeration treatment apparatus using a diffuser plate system, and FIG.

図1は本発明に係る第1実施例を示す模式図である。長手方向を実質的に垂直にして配置された筒状の流体が通流する通路管1内において、1組の静止型混合器2が内設され、その下方の空間部3内に気送ライン4を介して気体を供給するスプレーノズルを配設した気体噴出部5が配置されて、更にその下方に液体(FL)を導入する液体導入部6が配置されている。このように構成された散気処理装置7においては、気体(FG)は通路管1内の静止型混合器2の下端部に空間部3を介して気体噴出部5から上方向に噴出、供給されて、その気体(FG)の浮力により発生するエアリフト効果により通路管1の下端側の液体導入部6から液体(FL)は通路管1内の空間部3内に導入される。その気体(FG)と同伴する液体(FL)とは、並流で上昇しながら静止型混合器2内を通流して、微細化されて気液接触して液体中に排出される。これにより、液体と気体とが十分に気液接触して、曝気,放散又は化学反応が進行する。
なお、気体噴出部5の位置は静止型混合器2の下端から静止型混合器2の直径の0.2倍から3倍の範囲の距離に配置することが好ましい。又、液体導入部6は通路管1の下部の管壁に開口部を設けて使用してもよい。これにより、液体の循環流が向上する。
FIG. 1 is a schematic view showing a first embodiment according to the present invention. A set of static mixers 2 is provided in a passage tube 1 through which a cylindrical fluid arranged with the longitudinal direction substantially vertical flows, and an air feed line is provided in a space 3 below the set. A gas ejection part 5 provided with a spray nozzle for supplying gas via 4 is arranged, and further a liquid introduction part 6 for introducing liquid (FL) is arranged below it. In the diffuser 7 thus configured, gas (FG) is jetted and supplied upward from the gas jetting part 5 to the lower end part of the static mixer 2 in the passage pipe 1 via the space part 3. Then, the liquid (FL) is introduced into the space portion 3 in the passage tube 1 from the liquid introduction portion 6 on the lower end side of the passage tube 1 by the air lift effect generated by the buoyancy of the gas (FG). The gas (FG) and the accompanying liquid (FL) flow in the static mixer 2 while rising in parallel flow, are refined, come into gas-liquid contact, and are discharged into the liquid. As a result, the liquid and the gas are sufficiently in gas-liquid contact, and aeration, emission, or chemical reaction proceeds.
In addition, it is preferable to arrange | position the position of the gas ejection part 5 in the range of 0.2 times-3 times the diameter of the static mixer 2 from the lower end of the static mixer 2. Further, the liquid introducing portion 6 may be used by providing an opening in the tube wall below the passage tube 1. Thereby, the circulation flow of the liquid is improved.

本実施例においては、静止型混合器2の下方から気送ライン4を介して、気体噴出部5のスプレーノズルから気体(FG)を上方向に噴出、供給することで、上昇する気体(FG)の浮力により発生するエアリフト効果により通路管1の下方から導入された液体(FL)を巻き込みながら上昇する気体(FG)と液体(FL)とを並流で静止型混合器2内を通流させることで、混合,攪拌機能により微細化されて気液接触して液体中に排出されて曝気,放散又は化学反応処理が行なわれる。この気液混合、攪拌操作は無動力で高効率で行なわれる。それ故に省エネルギーとなる。  In the present embodiment, the gas (FG) that rises by ejecting and supplying gas (FG) upward from the spray nozzle of the gas ejection section 5 from below the static mixer 2 via the air feed line 4. The gas (FG) and the liquid (FL) rising while entraining the liquid (FL) introduced from below the passage tube 1 by the air lift effect generated by the buoyancy of As a result, it is refined by the mixing and stirring function, brought into gas-liquid contact, discharged into the liquid, and subjected to aeration, emission or chemical reaction treatment. This gas-liquid mixing and stirring operation is performed with no power and high efficiency. Therefore, it becomes energy saving.

図2は、前記同様に、本発明の第2実施例を示す模式図である。長手方向を実質的に垂直にして配置された筒状の流体が通流する通路管8内において、1組の静止型混合器9が内設され、その下方の空間部10内に気送ライン11を介して気体(FG)を供給する気体噴出部12が配置されている。気体噴出部12には静止型混合器13が内設されている。更に、その下方に液体(FL)を導入する液体導入部14が配置されている。このように構成された散気処理装置15においては、気体(FG)は通路管8内の静止型混合器9の下端部に空間部10を介して気体噴出部12内に配設されている静止型混合器13から微細化されて噴出、供給される。その噴出した気体(FG)の浮力により発生するエアリフト効果により液体(FL)は通路管8の下端側の液体導入部14から空間部10内に導入される。微細化された気体(FG)と同伴する液体(FL)とは並流で上昇しながら静止型混合器9内を通流して気液接触して液体中に排出される。これにより、液体と気体とが十分に気液接触して曝気,放散および化学反応が進行する。  FIG. 2 is a schematic diagram showing a second embodiment of the present invention, as described above. A set of static mixers 9 are provided in a passage tube 8 through which a cylindrical fluid arranged with the longitudinal direction substantially vertical flows, and an air feed line is formed in a space 10 below the set. A gas ejection part 12 for supplying gas (FG) through 11 is arranged. A static mixer 13 is provided in the gas ejection part 12. Further, a liquid introduction part 14 for introducing a liquid (FL) is disposed below the liquid introduction part 14. In the air diffuser 15 configured as described above, the gas (FG) is disposed in the gas ejection part 12 via the space 10 at the lower end of the static mixer 9 in the passage pipe 8. From the static mixer 13, it is made fine and ejected and supplied. The liquid (FL) is introduced into the space portion 10 from the liquid introduction portion 14 on the lower end side of the passage tube 8 by the air lift effect generated by the buoyancy of the jetted gas (FG). The atomized gas (FG) and the accompanying liquid (FL) flow in the static mixer 9 while rising in parallel flow, come into gas-liquid contact, and are discharged into the liquid. As a result, the liquid and the gas are sufficiently in gas-liquid contact, and aeration, emission, and chemical reaction proceed.

図3は、前記同様に、本発明に係る第3実施例を示す模式図である。筒状の流体が通流する通路管16内に1組の静止型混合器17が内設され、その下方の空間部18内には気送ライン19を介して気体(FG)を供給する気体噴出部20が複数個配置されている。気送ライン19は静止型混合器17の長手方向の開口部を介して上方から下方に配管されている。
このように構成された散気処理装置21においては、静止型混合器17の下方から気送ライン19を介して気体噴出部20から気体(FG)を上方向に噴出、供給することで、前記同様に、通路管16の下端側の液体導入部22より導入された液体(FL)は上昇する気体と共に静止型混合器17内を並流で通流して気液接触が進行する。
なお、気体噴出部20に、本発明の第2実施例同様に、静止型混合器を配設して利用することで気液接触効率はより向上する。気体噴出部20の個数は目的に応じて適宜加減できる。
FIG. 3 is a schematic view showing a third embodiment according to the present invention, as described above. A set of static mixers 17 is provided in a passage pipe 16 through which a cylindrical fluid flows, and a gas (FG) is supplied into a space 18 below it through an air feed line 19. A plurality of ejection parts 20 are arranged. The air feed line 19 is piped from above to below through the opening in the longitudinal direction of the static mixer 17.
In the air diffusion treatment device 21 configured as described above, the gas (FG) is ejected upward from the gas ejection unit 20 via the air feeding line 19 from below the stationary mixer 17, thereby supplying the gas Similarly, the liquid (FL) introduced from the liquid introduction part 22 on the lower end side of the passage pipe 16 flows in the static mixer 17 together with the rising gas, and gas-liquid contact proceeds.
Note that the gas-liquid contact efficiency is further improved by disposing and using a static mixer in the gas ejection portion 20 as in the second embodiment of the present invention. The number of gas ejection portions 20 can be appropriately adjusted according to the purpose.

又、大口径(直径500mm以上)の通路管16の利用が可能となり、1基あたりの気体供給能力が大幅に向上して、処理時間が短縮される。更に、気送ラインの配管数量も低減して配管工事費および保守管理費も安価となる。更に又、設備の大型化が容易となる。  Further, the passage pipe 16 having a large diameter (diameter of 500 mm or more) can be used, and the gas supply capacity per unit is greatly improved, thereby shortening the processing time. In addition, the piping quantity of the pneumatic line is reduced, and the piping work cost and the maintenance management cost are also reduced. Furthermore, the size of the facility can be easily increased.

図4は、本発明で使用される静止型混合器の一実施例を示すもので、(a)図は右捻り螺旋状の羽根体を有する通路管の概略斜視図、(b)図は、同様に、左捻り羽根体を有する通路管の概略斜視図である。(a)図においては、筒状の通路管23内に配置されている静止型混合器24内には3枚の右捻り羽根体25が内設されている。その羽根体25は多数の穿孔された孔26を有する多孔板で形成されている。又、3つの流体通路27を有し、その流体通路27同士は開口部28を介して羽根体25の長手方向の全長に亘り連通している。(b)図においては、同様に、筒状の通路管29内に配置されている静止型混合器30内には3枚の左捻り羽根体31が内設されている。その羽根体31は多数の穿孔された孔32を有する多孔板で形成されている。又3つの流体通路33を有し、その流体通路33同士は開口部34を介して羽根体31の長手方向の全長に亘り連通している。静止型混合器24,30を配置した(a)図又は(b)図のように構成された通路管23,29においては、通路管23,29の下方から並流で上昇する気体(FG)と液体(FL)とは右捻り又は左捻りの螺旋状の羽根体を通流する間に右又は左方向の回転および分割、合流、反転並びに剪断応力作用を連続的に繰り返しながら、両者は気液接触されて、液中に排出される。  FIG. 4 shows an embodiment of a static mixer used in the present invention. FIG. 4A is a schematic perspective view of a passage tube having a right-handed spiral blade body, and FIG. Similarly, it is a schematic perspective view of a passage tube having a left twist blade body. (A) In the figure, three right-handed blade bodies 25 are provided in a static mixer 24 arranged in a cylindrical passage tube 23. The blade body 25 is formed of a perforated plate having a large number of perforated holes 26. Further, the fluid passage 27 has three fluid passages 27, and the fluid passages 27 communicate with each other over the entire length of the blade body 25 through the opening 28. (B) In the figure, similarly, three left twist blade bodies 31 are provided in a static mixer 30 disposed in a cylindrical passage tube 29. The blade body 31 is formed of a perforated plate having a large number of perforated holes 32. Three fluid passages 33 are provided, and the fluid passages 33 communicate with each other over the entire length of the blade body 31 through the opening 34. In the passage pipes 23 and 29 having the stationary mixers 24 and 30 arranged as shown in (a) or (b), the gas (FG) rising in parallel flow from below the passage pipes 23 and 29. And liquid (FL), while flowing through right or left-handed spiral blades, rotate and split in the right or left direction, merging, reversing and shearing stress action continuously, The liquid is contacted and discharged into the liquid.

なお、羽根体25、31に穿孔された孔(26,32)径は5〜30mmの範囲が好ましく、又、孔(26,32)の開口率は5〜80%の範囲が好ましい。更に,通路管(23,29)内の気体の上昇速度は0.1〜10m/sの範囲が好ましく、より好ましくは0.5〜5m/sの範囲である。更に又、羽根体25,31の捻り角度(螺旋角度)は90°,180°,270°が好ましいが、15°,30°,45°,60°などでも使用できる。大口径(直径500mm以上)の通路管を製作する場合は、15°,30°などの小さな捻り角度の羽根体(25,31)を製作して、例えば3枚の羽根体を接続して30°+30°+30°=90°のように配置して使用してもよい。こうすることで、製作加工も容易になり、製作加工費も安価となる。なお、捻り角度の異なる羽根体の組合せは用途に応じて適宜選択使用できる。又、静止型混合器は本実施例に限定されることなく種々の静止型混合器が使用可能である。  The diameter of the holes (26, 32) drilled in the blade bodies 25, 31 is preferably in the range of 5 to 30 mm, and the aperture ratio of the holes (26, 32) is preferably in the range of 5 to 80%. Furthermore, the rising speed of the gas in the passage pipe (23, 29) is preferably in the range of 0.1 to 10 m / s, more preferably in the range of 0.5 to 5 m / s. Furthermore, the twist angles (spiral angles) of the blade bodies 25 and 31 are preferably 90 °, 180 °, and 270 °, but may be used at 15 °, 30 °, 45 °, 60 °, and the like. When manufacturing a passage tube having a large diameter (diameter 500 mm or more), a blade body (25, 31) having a small twist angle such as 15 ° or 30 ° is manufactured, and for example, three blade bodies are connected to each other. You may arrange | position and use so that (degree) +30 degree + 30 degree = 90 degree. By doing so, the manufacturing process becomes easy, and the manufacturing process cost is also reduced. A combination of blades having different twist angles can be appropriately selected and used depending on the application. The static mixer is not limited to this embodiment, and various static mixers can be used.

図5は、本発明で使用される静止型混合器の一実施例を示す基本構造図である。
図5においては、筒状の通路管35内には複数個の流体通路を有する螺旋状の右捻りおよび左捻りの羽根体36,37が筒状の空間部38を介して内設されている。又、左捻り羽根体37の下方には筒状の空間部39が形成されている。なお、右捻りおよび左捻り羽根体36、37の通路管35内での配置は、この基本構造図に限定されることなく、羽根体36,37の配置の組合せは用途に応じて、例えば、右+左+右、右+左+右+左など種々利用可能である。このように構成された筒状の通路管35内においては、通路管35の下方から空間部39を介して並流で上昇する気体(FG)と液体(FL)とは、左捻り羽根体37,空間部38、右捻り羽根体36を通流する間に、両者は左方向、右方向の回転および分割、合流、反転、並びに剪断応力作用を連続的に繰り返しながら気液接触されて、液中に排出される。
FIG. 5 is a basic structural diagram showing an embodiment of a static mixer used in the present invention.
In FIG. 5, spiral right-handed and left-handed blades 36 and 37 having a plurality of fluid passages are provided in a cylindrical passage pipe 35 through a cylindrical space 38. . A cylindrical space 39 is formed below the left twisted blade body 37. The arrangement of the right and left twisted blade bodies 36 and 37 in the passage pipe 35 is not limited to this basic structure diagram, and the combination of the arrangement of the blade bodies 36 and 37 depends on the application, for example, Various uses such as right + left + right, right + left + right + left, etc. are possible. In the cylindrical passage pipe 35 configured as described above, the gas (FG) and the liquid (FL) rising in parallel from the lower side of the passage pipe 35 through the space portion 39 are the left twisted blade body 37. , While flowing through the space 38 and the right twisted blade body 36, they are in gas-liquid contact while continuously repeating the rotation and division in the left direction and the right direction, merging, reversing, and shear stress action, Discharged inside.

図6は、本発明の第1の実施例に係る散気処理装置の概略図である。散気処理装置40は静止型混合器41を内設し、その下方に空間部42を有する筒状の通路管43と気体噴出部44を有して気体を供給する気送管45とを接続させる2枚の支持板46で構成されている。気送管45は気体を垂直方向に噴出させるスプレーノズル48を配設した気体噴出部44を有し、又、気体の入口側の反対側は閉止されている。このように構成された散気処理装置40は、液中に配置され、気体(FG)はブロワー又はコンプレッサーなどにより気送管45を介して気体噴出部44から加圧気体(FG)が通路管43の空間部42内に供給される。供給された気体(FG)の浮力によるエアリフト効果により通路管43の下端部の液体導入部47から液体(FG)を巻き込み、同伴させながら並流で静止型混合器41内を通流させて気液接触を行ない、液体中に排出させて曝気、放散および反応処理が進行する。気体噴出部44にスプレーノズル48を使用することで、気体(FG)は効率よく液体(FG)中に分散されて、気液接触効率は向上する。このスプレーノズル48は円錐状および多重膜状で噴出状態の可能な構造を有する図7に示す形状の使用が好ましい。  FIG. 6 is a schematic diagram of the air diffusion processing apparatus according to the first embodiment of the present invention. The air diffuser 40 has a stationary mixer 41 provided therein, and a cylindrical passage pipe 43 having a space 42 and a gas supply section 45 having a gas ejection section 44 are connected to the lower part of the static mixer 41. It is comprised by the two support plates 46 to be made. The air feed tube 45 has a gas ejection part 44 provided with a spray nozzle 48 for ejecting gas in the vertical direction, and the opposite side of the gas inlet side is closed. The diffuser 40 thus configured is disposed in the liquid, and the gas (FG) is sent from the gas jetting part 44 through the air feed pipe 45 by a blower or a compressor, and the pressurized gas (FG) is passed through the passage pipe. 43 is supplied into the space 42. The liquid (FG) is entrained from the liquid introduction part 47 at the lower end of the passage tube 43 by the air lift effect due to the buoyancy of the supplied gas (FG), and is allowed to flow through the stationary mixer 41 in parallel while being entrained. Liquid contact is performed and discharged into the liquid, and aeration, release, and reaction process proceed. By using the spray nozzle 48 in the gas ejection part 44, gas (FG) is efficiently disperse | distributed in liquid (FG), and gas-liquid contact efficiency improves. This spray nozzle 48 is preferably used in the shape shown in FIG.

図8は、本発明の第2の実施例に係る散気処理装置の概略図である。
散気処理装置49は、図6同様に、その下方に空間部52および液体導入部53とを有する筒状の通路管50と、静止型混合器51および気体噴出部54を有する筒状の気送管55と、この通路管50と気送管55とを支持する2枚の支持板56から構成されている。気体噴出部54には複数の右捻り又は左捻りの螺旋状の羽根体で形成された静止型混合器57が配設されている。気体(FG)と液体(FL)との気液接触作用は、前記図6同様であるので省略するが、気送管55の気体噴出部54に静止型混合器57を配設したことで、気体(FG)は乱流の発生により微細化されて通路管50の空間部52内を液体(FL)と並流で上昇する。微細化された気体(FG)と液体(FL)とは静止型混合器51内を通流して、高効率で気液接触が行なわれて、液中に排出され、曝気、放散および反応処理が進行する。
FIG. 8 is a schematic view of an aeration process apparatus according to the second embodiment of the present invention.
As in FIG. 6, the air diffusion treatment device 49 has a cylindrical passage tube 50 having a space portion 52 and a liquid introduction portion 53 below, a cylindrical gas pipe having a stationary mixer 51 and a gas ejection portion 54. It is composed of a feed pipe 55 and two support plates 56 that support the passage pipe 50 and the air feed pipe 55. A stationary mixer 57 formed of a plurality of right-handed or left-handed spiral blades is disposed in the gas ejection portion 54. The gas-liquid contact action between the gas (FG) and the liquid (FL) is the same as in FIG. 6 and will be omitted. However, the static mixer 57 is disposed in the gas ejection portion 54 of the air feeding tube 55. The gas (FG) is refined by the generation of turbulent flow, and rises in the space 52 of the passage tube 50 in parallel with the liquid (FL). The refined gas (FG) and liquid (FL) flow through the static mixer 51 and are brought into gas-liquid contact with high efficiency, discharged into the liquid, and subjected to aeration, emission and reaction processing. proceed.

図9は、本発明の第2の実施例に係る散気処理装置の部分概略底面図である。
散気処理装置58の底面は筒状の通路管59内に内設された3枚の右捻り羽根体60と筒状の気送管61で構成されている。羽根体60は厚み方向に穿孔された多数の孔62を有する多孔板で形成され、又、羽根体60の長手方向の全長に亘って開口部63を有している。
FIG. 9 is a partial schematic bottom view of the air diffusion treatment device according to the second embodiment of the present invention.
The bottom surface of the air diffuser 58 is composed of three right-handed twisted blades 60 and a cylindrical air pipe 61 provided in a cylindrical passage tube 59. The blade body 60 is formed of a perforated plate having a large number of holes 62 perforated in the thickness direction, and has an opening 63 over the entire length of the blade body 60 in the longitudinal direction.

図10は、本発明の第2の実施例に係る気体噴出部の部分概略斜視図である。気送管64は逆T字型に構成されており、気体噴出部65には3枚の右捻りの螺旋状の羽根体66が配設されて3個の流体通路67を形成し、この流体通路67は開口部68を介して羽根体66の長手方向の全長に亘って連通している。羽根体66は厚み方向に穿孔された多数の孔69を有する多孔板で形成されている。このような気送管64においては、気体(FG)の流れは、開口部68を直進する直進流と3枚の螺旋状の羽根体66に沿って流れる螺旋流と羽根体66の孔69を通過してくる分割流とによる乱流が発生して、気体(FG)は微細化される。この微細化された気体(FG)を利用することで、気液接触効率はより向上する。又、気体噴出部65の配置位置は、前記通路管内59に設置された静止型混合器の下端側からの離間距離は、前記通路管の直径の0.2倍から5倍の範囲が好ましい。更に、気体噴出部65内に供給される空気量の供給速度は2000〜140000m/m・時間の範囲が好ましい。なお、気体噴出部65に、3枚の左捻りの螺旋状の羽根体を同様に配設してもよい。これにより、気体噴出部65で左方向に回転しながら噴出される気体(FG)は、気体噴出部65の上部に配設されている右捻りの羽根体66により、気体と液体との上昇流は左方向から右方向への反転作用により大きな剪断応力が発生して微細化されて、酸素吸収効率はより向上する。又、羽根体66の捻り角度、捻り方向と捻り角度および右捻りと左捻りの配置などの組合せ、および孔径、孔の開口率などは用途に応じて種々利用可能である。FIG. 10 is a partial schematic perspective view of the gas ejection portion according to the second embodiment of the present invention. The air delivery pipe 64 is configured in an inverted T shape, and three right-handed spiral blades 66 are disposed in the gas ejection portion 65 to form three fluid passages 67. The passage 67 communicates with the entire length in the longitudinal direction of the blade body 66 through the opening 68. The blade body 66 is formed of a perforated plate having a large number of holes 69 perforated in the thickness direction. In such an air feed pipe 64, the flow of the gas (FG) is caused to flow straight through the opening 68, through the spiral flow flowing along the three spiral blade bodies 66, and through the hole 69 of the blade body 66. A turbulent flow due to the divided flow passing through is generated, and the gas (FG) is refined. By using this refined gas (FG), the gas-liquid contact efficiency is further improved. In addition, the arrangement position of the gas ejection portion 65 is preferably in the range of 0.2 to 5 times the diameter of the passage tube, as to the separation distance from the lower end side of the static mixer installed in the passage tube 59. Furthermore, the supply rate of the amount of air supplied into the gas ejection part 65 is preferably in the range of 2000 to 140000 m 3 / m 2 · hour. In addition, you may arrange | position the left-handed spiral blade body in the gas ejection part 65 similarly. Thereby, the gas (FG) ejected while rotating in the left direction by the gas ejection part 65 is caused to flow upward between the gas and the liquid by the right-handed blade body 66 disposed on the upper part of the gas ejection part 65. In the reversal action from the left direction to the right direction, a large shear stress is generated and refined, and the oxygen absorption efficiency is further improved. Further, various combinations of the twisting angle, twisting direction and twisting angle, right twisting and left twisting arrangement of the blade body 66, the hole diameter, the opening ratio of the holes, and the like can be used.

図11は、本発明の第3の実施例に係る散気処理装置の概略断面図である。散気処理装置70は筒状の流体が通流する通路管71内に2枚以上の90°右捻り羽根体72が内設されて静止型混合器73を形成し、その静止型混合器73内の開口部74を介して気体を供給する筒状の気送管75が配置され、2個の気体噴出部76が配設され、その気体噴出部76内は静止型混合器77が内設されている。羽根体72は多数の穿設された孔78を有している多孔板で形成されている。このように構成された散気処理装置70においては、気体(FG)はブロワーやコンプレッサー、ガスボンベ(不図示)等の気体供給手段により加圧された気体(FG)を気送管75,気体噴出部76,空間部79を介して静止型混合器73の下方から上方向に噴出供給する。その気体(FG)の浮力により発生するエアリフト効果により通路管71の下端部の液体導入部80から液体(FL)は通路管71内の空間部79内に導入される。その気体(FG)と同伴する液体(FL)とは、通路管71内を並流で上昇しながら静止型混合器73内を通流して、混合・攪拌により、微細化されて気液接触して液体中に排出される。これにより、液体と気体とは高効率で気液接触して、曝気、放散又は化学反応が連続的に進行する。なお、前記同様に、実施例で使用される螺旋状の羽根体の捻り方向、捻り角度、枚数、孔径、多孔板の開口率、直径、高さ、等は用途に応じて適宜選択使用できる。本実施例の散気処理装置70は、通路管71の大口径(直径500mm以上)化により、1基あたりの気体供給能力の向上による反応処理時間の短縮による省エネルギー化、曝気槽の容積の縮小による省スペース化、更に、流体の淀み部(死領域)が発生しない構造によるメンテナンスフリーが達成可能となる。    FIG. 11 is a schematic cross-sectional view of an aeration process apparatus according to the third embodiment of the present invention. In the air diffuser 70, two or more 90 ° right twisted blade bodies 72 are installed in a passage pipe 71 through which a cylindrical fluid flows to form a static mixer 73, and the static mixer 73. A cylindrical air supply pipe 75 for supplying gas through an opening 74 in the inside is disposed, two gas ejection portions 76 are disposed, and a static mixer 77 is provided in the gas ejection portion 76. Has been. The blade body 72 is formed of a perforated plate having a number of perforated holes 78. In the diffuser 70 configured as described above, the gas (FG) is a gas (FG) pressurized by a gas supply means such as a blower, a compressor, or a gas cylinder (not shown). From the lower part of the static mixer 73, it is ejected and supplied through the part 76 and the space part 79. The liquid (FL) is introduced into the space 79 in the passage pipe 71 from the liquid introduction section 80 at the lower end of the passage pipe 71 by an air lift effect generated by the buoyancy of the gas (FG). The gas (FG) and the accompanying liquid (FL) flow through the static mixer 73 while moving up in the passage pipe 71 in a cocurrent manner, and are finely gasified and contacted by mixing and stirring. Discharged into the liquid. As a result, the liquid and the gas are in gas-liquid contact with high efficiency, and aeration, emission, or chemical reaction proceeds continuously. Similarly to the above, the twist direction, twist angle, number of sheets, hole diameter, aperture ratio, diameter, height, etc. of the spiral blade used in the embodiments can be appropriately selected and used according to the application. In the diffuser 70 of this embodiment, the passage pipe 71 has a large diameter (diameter of 500 mm or more), thereby saving energy by reducing the reaction processing time by improving the gas supply capacity per unit and reducing the volume of the aeration tank. In addition, it is possible to achieve a space-saving and maintenance-free operation with a structure in which no fluid stagnation (dead area) occurs.

図12は、本発明に係る散気処理装置を活性汚泥法の曝気処理に適用した場合の実施例を示すブロック図である。
散気処理装置81は原水を貯留している曝気槽82の底部に配置され、この散気処理装置81の下部に空気を供給するブロワー83と気送ライン84、原水を供給する原水供給ライン85および処理水を排出する処理水排出ライン86が設けられている。又、散気処理装置81の液体導入部は曝気槽82の底面から50〜200mm離間した位置に設置するのが好ましい。このように構成された散気処理装置81においては、原水はブロワー83および気送ライン84を介して散気処理装置81の下方から供給される空気の浮力によるエアリフト効果により散気処理装置81内を原水と空気とは並流で通流しながら混合、攪拌されて、空気中の酸素は原水中に溶解し、好気性微生物により原水は回分又は連続的に浄化処理されて、処理水排出ライン86より排出される。
なお、散気処理装置81内を下方から上方に通流する空気量の供給速度は、曝気槽82内の水深2〜6メートルの場合で、1800〜21000m/m・時間の範囲が好ましいが、より好ましくは3600〜12000m/m・時間の範囲である。又、直径150ミリメートルの散気処理装置81を使用した場合の1基あたりの曝気、攪拌受持面積は3〜8mである。更に、ブロワー83の吐出圧力は水深での圧力と気送ライン84の圧力損失とを足した数値でよい。低い圧力損失で曝気処理が可能となり、省エネルギーとなる。
従来の散気板方式と本発明法の通気抵抗を比較すると、本発明法は1/5〜3/5である。更に、従来の散気筒内に内設した静止型混合器を使用した従来法A,B,Cと本発明法との性能比較した結果を表1に示す。表1に示すように、本発明法によれば、1基あたりの空気供給能力は100Nm/m・Hrに対して、従来法は80,12,17Nm/m・Hrである。又、同様に酸素吸収効率は13.5%に対して、8.3,10.5,13.0である。
FIG. 12 is a block diagram showing an embodiment in the case where the aeration treatment apparatus according to the present invention is applied to the activated sludge aeration process.
The air diffuser 81 is disposed at the bottom of the aeration tank 82 that stores the raw water. The blower 83 and the air supply line 84 that supply air to the lower part of the air diffuser 81 and the raw water supply line 85 that supplies the raw water. A treated water discharge line 86 for discharging treated water is also provided. Moreover, it is preferable to install the liquid introduction part of the air diffusion treatment device 81 at a position separated from the bottom surface of the aeration tank 82 by 50 to 200 mm. In the air diffusion processing device 81 configured as described above, the raw water is stored in the air diffusion processing device 81 due to an air lift effect due to the buoyancy of air supplied from below the air diffusion processing device 81 via the blower 83 and the air feed line 84. The raw water and air are mixed and stirred while flowing in parallel flow, oxygen in the air is dissolved in the raw water, and the raw water is purified batchwise or continuously by aerobic microorganisms, and the treated water discharge line 86 More discharged.
Note that the supply rate of the amount of air flowing through the diffuser 81 from below is preferably in the range of 1800 to 21000 m 3 / m 2 · hour when the water depth in the aeration tank 82 is 2 to 6 meters. However, More preferably, it is the range of 3600-12000m < 3 > / m < 2 > * hour. In addition, the aeration / stirring holding area per unit when the diffuser 81 having a diameter of 150 mm is used is 3 to 8 m 2 . Further, the discharge pressure of the blower 83 may be a numerical value obtained by adding the pressure at the water depth and the pressure loss of the air feed line 84. Aeration processing is possible with low pressure loss, saving energy.
Comparing the ventilation resistance of the conventional diffuser plate method and the method of the present invention, the method of the present invention is 1/5 to 3/5. Further, Table 1 shows the result of performance comparison between the conventional methods A, B, C using the static mixer provided in the conventional scattering cylinder and the method of the present invention. As shown in Table 1, according to the method of the present invention, the air supply capacity per unit is 100 Nm 2 / m 2 · Hr, and the conventional method is 80,12,17 Nm 3 / m 2 · Hr. Similarly, the oxygen absorption efficiency is 8.3, 10.5, and 13.0 with respect to 13.5%.

Figure 0004520757
Figure 0004520757

図13は、本発明に係る散気処理装置を排水の放散処理に適用した場合の実施例を示すブロック図である。
本発明に係る散気処理装置87は、前記図12の実施例と同様であるが、筒状の放散槽88内の底部に配置され、この散気処理装置87の下部に空気を供給するブロワー89と気送ライン90、排水を供給する排水供給ライン91、および浄化された処理水を排出する処理水排出ライン92が設けられている。又、排気ライン93には揮発性物質を回収する冷却装置又は吸着装置が設けられている。このように構成された散気処理装置87においては、排水中のトリクロロメタン、トリハロメタン、アンモニア、塩素、クリプトンなどの揮発性物質は供給した空気側に物質移動して放散処理されて、排気ライン93を介して冷却装置又は吸着装置で回収、浄化される。浄化された空気は大気中に放出される。
なお、供給される気体の種類は空気に限定されることなく、窒素、ヘリウム、アルゴン、一酸化炭素ガスなどの不活性ガスも適宜利用可能である。例えば窒素ガスを利用することで液体中の溶存酸素を放散処理することも可能である。散気処理装置87内に供給する気体の供給速度は、放散槽88内の水深1〜3メートルの場合で、3600〜18000m/m・時間の範囲が好ましいが、より好ましいのは7200〜15000m/m・時間の範囲である。
FIG. 13: is a block diagram which shows the Example at the time of applying the aeration process apparatus based on this invention to the discharge process of waste_water | drain.
The air diffusion treatment device 87 according to the present invention is the same as that of the embodiment of FIG. 12, but is arranged at the bottom of the tubular diffusion tank 88 and supplies air to the lower part of the air diffusion treatment device 87. 89, an air feed line 90, a waste water supply line 91 for supplying waste water, and a treated water discharge line 92 for discharging purified treated water. The exhaust line 93 is provided with a cooling device or adsorption device for recovering volatile substances. In the air diffusion treatment device 87 configured in this way, volatile substances such as trichloromethane, trihalomethane, ammonia, chlorine, and krypton in the waste water are transferred to the supplied air side to be diffused and exhausted 93. It is recovered and purified by a cooling device or an adsorption device via The purified air is released into the atmosphere.
Note that the type of gas supplied is not limited to air, and an inert gas such as nitrogen, helium, argon, or carbon monoxide gas can be used as appropriate. For example, it is possible to dissipate dissolved oxygen in the liquid by using nitrogen gas. The supply rate of the gas supplied into the diffuser 87 is preferably in the range of 3600 to 18000 m 3 / m 2 · hour in the case of a water depth of 1 to 3 meters in the diffusion tank 88, more preferably 7200 to The range is 15000 m 3 / m 2 · hour.

図14は、本発明に係る散気処理を排ガス処理に適用した場合の実施例を示すブロック図である。
散気処理装置94は筒状の反応槽95内の所定位置に複数個配置され、散気処理装置94の下方にブロワー96を介して排ガスを供給する気送ライン97および水又は吸収液を供給する新液供給ライン98、吸収液99を反応槽95外に排出する排出ライン100、清浄化された排ガスを反応槽95の上部から排気する排気ライン101が設けられている。このように構成された散気処理装置94においては、HCl,SO,NO,NH,HSおよび粉麈などを含んだ排ガスはブロワー96および気送ライン97を介して、散気処理装置94の下方から供給されて、NaOH,CCO,Ca(OH),Mg(OH)などのアルカリ性水溶液あるいはHSO,HClなどの酸性水溶液からなる吸収液と気液接触されて化学反応処理が進行し、吸収液中に溶解又は捕集され、清浄化された排ガスは排気ライン101を介して大気中に放出される。
このような散気処理装置94を排ガス中の異種物質の除去、捕集処理に適用した場合、従来の散気板,分散管などによる気液接触方式と比較して、排ガスと液体とが高効率で混合・攪拌されて短時間処理が可能となる。又、処理速度の向上により省スペースとなり、設備費も安価となる。更に、大口径(直径500mm以上)の散気処理装置94を配置することで、処理能力の向上とともに、より省スペースとなる。更に又、散気処理装置94内ての流体の淀み部(死領域)が発生しにくいので、カルシウムなとの付着、成長を防止して保守管理費を低減できる。
FIG. 14 is a block diagram showing an embodiment when the air diffusion treatment according to the present invention is applied to the exhaust gas treatment.
A plurality of diffuser treatment devices 94 are arranged at predetermined positions in a cylindrical reaction tank 95, and an air supply line 97 for supplying exhaust gas and a water or absorption liquid are supplied below the diffuser treatment device 94 via a blower 96. There are provided a new liquid supply line 98, a discharge line 100 for discharging the absorbent 99 to the outside of the reaction tank 95, and an exhaust line 101 for exhausting the cleaned exhaust gas from the upper part of the reaction tank 95. In the air diffusion treatment device 94 configured as described above, the exhaust gas containing HCl, SO x , NO x , NH 3 , H 2 S, and soot is diffused through the blower 96 and the air feed line 97. is supplied from below the processing device 94, NaOH, C a CO 3 , Ca (OH) 2, Mg (OH) 2 composed of an acidic aqueous solution such as an alkaline aqueous solution or H 2 SO 4, HCl, such as absorption liquid and gas-liquid The contacted chemical reaction treatment proceeds, and the exhaust gas that has been dissolved or collected in the absorption liquid and cleaned and discharged is released into the atmosphere via the exhaust line 101.
When such an air diffuser 94 is applied to the removal and collection of foreign substances in the exhaust gas, the exhaust gas and the liquid are higher in comparison with the conventional gas-liquid contact method using an air diffuser plate, a dispersion tube, etc. It can be mixed and agitated with efficiency and can be processed for a short time. In addition, the processing speed can be improved to save space and the equipment cost can be reduced. Furthermore, by arranging the diffuser 94 having a large diameter (diameter of 500 mm or more), the processing capacity is improved and the space is further saved. Furthermore, since the stagnation part (dead region) of the fluid in the diffuser processing device 94 is unlikely to occur, adhesion and growth of calcium can be prevented and maintenance management costs can be reduced.

図15は本発明に係る散気処理装置を酵素又は微生物による反応に適用した場合の実施例を示すブロック図である。
散気処理装置102は、筒状のバイオリアクター103内の所定位置に配置され、散気処理装置102の下方に気体を供給する気送ライン104、原液を供給する原液供給ライン105,反応生成物を排出する反応生成物排出ライン106、バイオリアクター103の頂部から気体を排出する排気ライン107、バイオリアクター103の液面から下部に原液を循環させる循環液ライン108が設けられている。又、バイオリアクター103内には、酵素又は微生物を担持した触媒担持体109又は生体触媒が液体中に存在している。このように構成された散気処理装置102においては、気体はブロワー、コンプレッサー、ガスボンベ(不図示)などの気体供給手段により気送ライン104を介して散気処理装置102の下方から供給され、原液はポンプ又は加圧などの供給手段により原液供給ライン105を介して供給される。
反応生成物および気体は、反応生成物排出ライン106および排気ライン107より外部に排出される。又、原液は、循環液ライン108によりバイオリアクター103の液面から下部に循環流を形成する。気体と原液とは散気処理装置102内を並流で通流して、原液中の酵素又は微生物の生体触媒機能により生物反応は進行する。本発明の散気処理装置102をバイオリアクターとして利用した場合には、従来の気泡塔方式と比較してバイオリアクター内のガス流速を0.1〜5m/sの高いガス流速域で操作でき、高い酸素移動速度を達成できる。又、バイオリアクター内の流速分布を均一化して酸素移動速度を等しくする混合、攪拌機能を有していることで死領域(デッドスペース)の発生がなく、大型化が容易になり、生産量はより向上する。更に、気体のチャンネリングの発生を防止し、高粘度液での気体分散も向上する。更に又、反応速度の向上により、省スペース、省エネルギーが達成されて生産費が低減される。なお、生体触媒を使用しない気液反応装置としても利用可能である。なお、従来の気泡塔における気体の空塔速度は0.01〜0.1m/sの範囲である。
FIG. 15 is a block diagram showing an embodiment in which the aeration treatment apparatus according to the present invention is applied to a reaction by an enzyme or a microorganism.
The air diffuser 102 is disposed at a predetermined position in the cylindrical bioreactor 103, and an air feed line 104 for supplying gas to the lower portion of the air diffuser 102, a raw liquid supply line 105 for supplying the raw liquid, and a reaction product. Product exhaust line 106 for exhausting gas, an exhaust line 107 for exhausting gas from the top of the bioreactor 103, and a circulating liquid line 108 for circulating the stock solution from the liquid level to the lower part of the bioreactor 103. In the bioreactor 103, a catalyst carrier 109 or a biocatalyst carrying an enzyme or a microorganism is present in the liquid. In the air diffusion processing device 102 configured as described above, the gas is supplied from below the air diffusion processing device 102 via the air feed line 104 by gas supply means such as a blower, a compressor, and a gas cylinder (not shown). Is supplied via the stock solution supply line 105 by a supply means such as a pump or pressurization.
The reaction product and gas are discharged to the outside from the reaction product discharge line 106 and the exhaust line 107. In addition, the stock solution forms a circulating flow from the liquid surface of the bioreactor 103 to the lower part through the circulating liquid line 108. The gas and the undiluted solution flow through the diffuser 102 in parallel flow, and the biological reaction proceeds by the biocatalytic function of the enzyme or microorganism in the undiluted solution. When the aeration treatment apparatus 102 of the present invention is used as a bioreactor, the gas flow rate in the bioreactor can be operated in a high gas flow rate range of 0.1 to 5 m / s as compared with the conventional bubble column system. High oxygen transfer rate can be achieved. In addition, the mixing / stirring function that equalizes the flow rate distribution in the bioreactor and equalizes the oxygen transfer rate eliminates the occurrence of dead areas and makes it easy to increase the size of production. More improved. Furthermore, generation of gas channeling is prevented, and gas dispersion in a high viscosity liquid is also improved. Furthermore, by improving the reaction rate, space saving and energy saving are achieved, and production costs are reduced. In addition, it can utilize also as a gas-liquid reaction apparatus which does not use a biocatalyst. In addition, the superficial velocity of the gas in the conventional bubble column is in the range of 0.01 to 0.1 m / s.

図16は、従来の散気板方式による曝気処理装置を示す模式図である。
従来の曝気処理装置110は、曝気槽111内の底面に多数の散気板112を配設し、空気はブロワー113、気送ライン114を介して多数の散気板112に供給される。散気板112は微細な多孔質体で形成され、微細な気泡を発生させている。一般的な散気板112の吹出し空気量は50〜400L/minである。又、通気抵抗は1000〜3000Paである。
FIG. 16 is a schematic view showing an aeration processing apparatus using a conventional diffuser plate method.
In the conventional aeration processing apparatus 110, a large number of diffuser plates 112 are arranged on the bottom surface in the aeration tank 111, and air is supplied to the diffuser plates 112 via the blower 113 and the air supply line 114. The diffuser plate 112 is formed of a fine porous body and generates fine bubbles. The amount of air blown from the general diffuser plate 112 is 50 to 400 L / min. The ventilation resistance is 1000 to 3000 Pa.

図17は、従来の充填物方式による放散処理装置を示す模式図である。従来の放散処理装置115は、筒状の放散塔116内に規則又は不規則充填物が充填されている。気体と原水は向流で充填物117内を通流し、気液接触して放散処理がされている。一般的な充填物方式の場合、気体の供給速度は10〜100m/m・時間の範囲である。FIG. 17 is a schematic diagram showing a conventional diffusion treatment apparatus using a packing method. In the conventional radiation treatment apparatus 115, a cylindrical radiation tower 116 is filled with a regular or irregular packing. Gas and raw water flow countercurrently through the filling 117 and come into gas-liquid contact to be diffused. In the case of a general packing method, the gas supply rate is in the range of 10 to 100 m 3 / m 2 · hour.

なお、本発明による散気処理装置の構成材料は、金属,セラミックス,プラスチック,ガラス等の1種類もしくはこれら材料の複合材料から適宜選択使用できる。ステンレス等の金属材料を利用することで半永久的に使用可能となり、産業廃棄物の発生が抑制される。  In addition, the constituent material of the diffuser according to the present invention can be appropriately selected and used from one kind of metal, ceramics, plastic, glass, or a composite material of these materials. By using a metal material such as stainless steel, it can be used semipermanently and the generation of industrial waste is suppressed.

本発明に係る第1実施例を示す模式図である。    It is a schematic diagram which shows 1st Example based on this invention. 本発明に係る第2実施例を示す模式図である。    It is a schematic diagram which shows 2nd Example based on this invention. 本発明に係る第3実施例を示す模式図である。    It is a schematic diagram which shows 3rd Example based on this invention. 本発明で使用する静止型混合器の一実施例を示すもので (a)図は右捻り螺旋状羽根体を有する通路管の概略斜視図。 (b)図は、同様に、左捻り螺旋状羽根体を有する通路管の概略斜視図である。    An example of the static mixer used by this invention is shown. (A) The figure is a schematic perspective view of the channel | path pipe | tube which has a right-handed spiral blade body. (B) The figure is a schematic perspective view of a passage tube having a left-handed spiral blade similarly. 本発明で使用する静止型混合器の一実施例を示す基本構造図である。    It is a basic structure figure which shows one Example of the static mixer used by this invention. 本発明の第1の実施例に係る散気処理装置の概略図である。    1 is a schematic view of an aeration processing apparatus according to a first embodiment of the present invention. 本発明の第1の実施例で使用されるスプレーノズルの一実施例を示す斜視図である。    It is a perspective view which shows one Example of the spray nozzle used by the 1st Example of this invention. 本発明の第2の実施例に係る散気処理装置の概略図である。    It is the schematic of the aeration process apparatus which concerns on the 2nd Example of this invention. 本発明の第2の実施例に係る散気処理装置の部分概略底面図である。    It is a partial schematic bottom view of the aeration processing apparatus concerning the 2nd example of the present invention. 本発明の第2の実施例に係る気体噴出部の部分概略斜視図である。    It is a partial schematic perspective view of the gas ejection part which concerns on 2nd Example of this invention. 本発明の第3実施例に係る散気処理装置の概略断面図である。    It is a schematic sectional drawing of the aeration processing apparatus concerning 3rd Example of this invention. 本発明に係る散気処理装置を活性汚泥法の曝気処理に適用した場合の実施例を示すブロック図である。    It is a block diagram which shows the Example at the time of applying the aeration process apparatus which concerns on this invention to the aeration process of an activated sludge method. 同様に、排水の放散処理に適用した場合の実施例を示すブロック図である。    Similarly, it is a block diagram which shows the Example at the time of applying to the discharge process of waste_water | drain. 同様に、排ガス処理装置に適用した場合の実施例を示すブロック図である。    Similarly, it is a block diagram which shows the Example at the time of applying to an exhaust gas processing apparatus. 同様に、酵素又は微生物を利用した生物反応に適用した場合の実施例を示すブロック図である。    Similarly, it is a block diagram which shows the Example at the time of applying to the biological reaction using an enzyme or microorganisms. 従来の散気板方式による曝気処理装置を示す模式図である。    It is a schematic diagram which shows the aeration processing apparatus by the conventional diffuser board system. 従来の充填物方式による放散処理装置を示す模式図である。    It is a schematic diagram which shows the diffusion processing apparatus by the conventional filler system.

符号の説明Explanation of symbols

1,8,16,23,29,35,43,50,59,71: 通路管
2,9,13,17,24,30,41,
51,57,73,77: 静止型混合器
3,10,18,38,39,42,52,79: 空間部
5,12,20,44,54,65,76: 気体噴出部
6,14,22,47,53,80: 液体導入部
7,15,21,40,49,58,70,
81,87,94,102: 散気処理装置
4,11,19,84,90,97,104: 気送ライン
45,55,61,64,75: 気送管
1, 8, 16, 23, 29, 35, 43, 50, 59, 71: passage pipes 2, 9, 13, 17, 24, 30, 41,
51, 57, 73, 77: Static mixer 3, 10, 18, 38, 39, 42, 52, 79: Space part 5, 12, 20, 44, 54, 65, 76: Gas ejection part 6, 14 , 22, 47, 53, 80: Liquid introduction parts 7, 15, 21, 40, 49, 58, 70,
81, 87, 94, 102: Air diffuser 4, 11, 19, 84, 90, 97, 104: Air line 45, 55, 61, 64, 75: Air pipe

Claims (4)

流体が通流する筒状の通路管の内側に右捻り(時計方向)又は左捻り(反時計方向)の螺旋状の複数個の羽根体を有し、前記通路管の内部に複数個の流体通路を形成し、前記流体通路同士は羽根体の長手方向の開口部を介して連通し、前記羽根体は多孔板からなる1の静止型混合器を内設した、長手方向を実質的に垂直にして配置された筒状の通路管と、前記通路管の下端に設けられた液体導入部と、前記液体導入部の上方であって、前記1の静止型混合器の下方に配置され、接続された気送ラインを介して前記通路管内に気体を噴出供給する、流体が通流する筒状の通路管の内側に右捻り(時計方向)又は左捻り(反時計方向)の螺旋状の複数個の羽根体を有し、前記通路管の内部に複数個の流体通路を形成し、前記流体通路同士は羽根体の長手方向の開口部を介して連通し、前記羽根体は多孔板からなる他の静止型混合器が内設された気体噴出部と、を備え、気体供給手段により、前記通路管内における上昇速度が0.1〜10m/sとなるように前記気体噴出部に気体を供給して、前記液体導入部から液体を前記通路管内に導入し、前記気体および液体は前記通路管内を並流で上昇し、前記1の静止型混合器の内部で気液接触混合し、前記通路管の上端側から排出されることを特徴とする散気処理装置。 A plurality of right-handed (clockwise) or left-handed (counterclockwise) spiral blades are provided inside a cylindrical passage tube through which fluid flows, and a plurality of fluids are contained in the passage tube. A passage is formed, the fluid passages communicate with each other through an opening in the longitudinal direction of the blade body, and the blade body includes one stationary mixer made of a perforated plate, and the longitudinal direction is substantially vertical. A cylindrical passage pipe arranged in the manner described above, a liquid introduction section provided at the lower end of the passage pipe, and above the liquid introduction section, below the one static mixer and connected. A plurality of spirals that are twisted clockwise (clockwise) or counterclockwise (counterclockwise) inside a cylindrical passage tube through which a fluid flows and supplies gas to the passage tube through the air supply line. A plurality of fluid passages, and a plurality of fluid passages are formed inside the passage pipe. Communicated via the longitudinal opening, it said sail body comprises a gas ejection portion of another static mixer consisting of a perforated plate is internally provided, and the gas supply means, the rise rate in said passage tube A gas is supplied to the gas ejection part so as to be 0.1 to 10 m / s, and a liquid is introduced into the passage pipe from the liquid introduction part, and the gas and the liquid rise in a parallel flow in the passage pipe. An air diffusion treatment device, wherein gas-liquid contact mixing is performed inside the static mixer of 1 and discharged from the upper end side of the passage pipe. 前記羽根体に穿孔された孔径が5〜80mmであることを特徴とする請求の範囲第1項記載の散気処理装置。   The diffuser according to claim 1, wherein the diameter of the hole drilled in the blade is 5 to 80 mm. 前記羽根体に穿孔された孔の開口率が5〜80%であることを特徴とする請求の範囲第2項記載の散気処理装置。   The diffuser according to claim 2, wherein the aperture ratio of the holes drilled in the blade body is 5 to 80%. 羽根体の捻り角度(螺旋角度)が15°、30°、45°、60°、90°、180°、270°であることを特徴とする請求の範囲第2項または第3項に記載の散気処理装置。
The twisting angle (spiral angle) of the blade body is 15 °, 30 °, 45 °, 60 °, 90 °, 180 °, 270 °, or claim 2 according to claim 2 or 3, Air diffuser.
JP2004059783A 2004-02-03 2004-02-03 Air diffuser Expired - Fee Related JP4520757B2 (en)

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JP4544017B2 (en) * 2005-03-31 2010-09-15 株式会社アネモス Air diffuser
JP2008168262A (en) 2007-01-15 2008-07-24 Anemosu:Kk Gas-liquid contact device
WO2018142497A1 (en) * 2017-02-01 2018-08-09 株式会社アイエンス Wastewater purification system
JP7384387B2 (en) * 2019-11-12 2023-11-21 セイコー化工機株式会社 Exhaust gas treatment equipment

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