JP4418816B2 - Medal cleaning device - Google Patents

Medal cleaning device Download PDF

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JP4418816B2
JP4418816B2 JP2006331669A JP2006331669A JP4418816B2 JP 4418816 B2 JP4418816 B2 JP 4418816B2 JP 2006331669 A JP2006331669 A JP 2006331669A JP 2006331669 A JP2006331669 A JP 2006331669A JP 4418816 B2 JP4418816 B2 JP 4418816B2
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medal
cleaning
conveyor
wet
medals
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JP2008146291A (en
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友博 泉山
秀彦 金澤
久 千々岩
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Kyoraku Industrial Co Ltd
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Kyoraku Industrial Co Ltd
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Description

本発明は、遊技媒体としてメダル(コイン,円形チップと同じ)を使用するスロットマシン、コインゲーム機、パチンコ機等の遊技機が多数設置された遊技場に設けられ、該メダルを洗浄するための装置に関するものである。   The present invention is provided in a game hall where a large number of gaming machines such as slot machines, coin game machines, and pachinko machines that use medals (same as coins and circular chips) are used as game media, and for cleaning the medals. It relates to the device.

遊技場にて遊技媒体として使用されるメダルは、遊技者の手垢や循環通路との摩擦等によって汚れることからその循環通路の途中に従来からメダル洗浄装置が設けられ、メダルが清浄に保たれるようにしている。
下記特許文献1〜4は、従来のメダル洗浄装置(コイン研磨装置に同じ)を例示するもので、特許文献1,2では、メダルを水平にし該メダルを搬送ベルトとガイドにより挟んで回転させながら搬送すると共に該メダルの上下面に研磨布を摺接させるように構成している。また、特許文献3では、メダル押出手段を備えていて、メダルが上下の研磨布間に押し出されるように構成されたものであった。また、特許文献4は、メダルの厚み以下の板材にメダル保持枠部を形成したメダル保持部材を多数連結してメダル搬送装置を構成するとともに、これを両側から挟むように研磨布を配設し、メダル搬送装置により搬送されるメダルの両面が該研磨布により研磨・洗浄されるように構成したものである。
特開平7−220134号公報 特開平7−220136号公報 特許第3660112号 特許第3767813号
Since medals used as game media in amusement halls are soiled by the player's hand dirt, friction with the circulation passage, etc., a medal cleaning device has been conventionally provided in the circulation passage to keep the medals clean. I am doing so.
The following Patent Documents 1 to 4 exemplify a conventional medal cleaning device (same as a coin polishing device). In Patent Documents 1 and 2, while the medals are leveled, the medals are sandwiched between a conveyor belt and a guide and rotated. The polishing cloth is configured to be slidably brought into contact with the upper and lower surfaces of the medal. Moreover, in patent document 3, the medal pushing means was provided and it was comprised so that a medal might be extruded between upper and lower polishing cloth. In Patent Document 4, a medal transport device is configured by connecting a large number of medal holding members each having a medal holding frame portion to a plate material having a thickness equal to or less than the thickness of the medal, and a polishing cloth is disposed so as to sandwich the medal from both sides. The both sides of the medal conveyed by the medal conveying device are polished and cleaned by the polishing cloth.
Japanese Patent Laid-Open No. 7-220134 JP-A-7-220136 Patent No. 3660112 Japanese Patent No. 3767813

ところで、メダルには一般に直径30mmのものと直径25mmのものとがあって、遊技機の種類によってそれぞれ使用し得るメダルが異なるというのが現況である。このため多数台の遊技機を設置した遊技場では、大小2種類のメダルが混じって流通しているのが現状であり、この2種類のメダルをいかに間違いなく扱うかという問題と、いかに省設備、省スペースで両メダルを処理できるかということが問題となっている。   By the way, there are generally medals having a diameter of 30 mm and medals having a diameter of 25 mm, and the medals that can be used differ depending on the type of gaming machine. For this reason, in amusement arcades where a large number of gaming machines are installed, there are currently two types of large and small medals in circulation, the problem of how to handle these two types of medals without fail, and how to save equipment. The problem is whether both medals can be processed in a space-saving manner.

ところが、上記特許文献1〜3に示されたような従来のメダル洗浄装置は、メダルの直径が一定のものにしか対応していないので、大小のメダルが混じって搬入されると対処できず、故障、停止するという問題があった。
また、特許文献4に示されたメダル洗浄装置は、搬送装置の構成が複雑で装置が大型化するとともに、メダルの両面を同時に研磨布に接触させて洗浄するものであったので、メダルの両面に十分な摩擦力が掛からず、綺麗に洗浄されないという問題があった。
本発明はこれらの問題点を解消しようとするものである。
However, the conventional medal cleaning devices as shown in the above-mentioned Patent Documents 1 to 3 are only compatible with medals having a constant diameter, and therefore cannot be dealt with when large and small medals are mixed in. There was a problem of breakdown and stoppage.
Further, the medal cleaning device disclosed in Patent Document 4 has a complicated configuration of the transport device, and the size of the device is increased, and both surfaces of the medal are simultaneously brought into contact with the polishing cloth for cleaning. However, there was a problem that a sufficient frictional force was not applied, and the cleaning was not performed cleanly.
The present invention seeks to eliminate these problems.

上記課題を達成するために請求項1に記載したメダル洗浄装置は、第1洗浄部と第2洗浄部とによってメダルを片面ずつ順に洗浄するメダル洗浄装置であって、第1洗浄部は、無端状の搬送ベルトによりメダルが搬送されるようにしたコンベヤと、洗浄液が含浸された無端帯状のウエット拭布を前記搬送ベルトの搬送面に対して適宜間隔を離して平行に張設し該ウエット拭布を走行させることにより該ウエット拭布によってメダル表面が拭われるようにする拭布支持機構と、押圧板を前記ウエット拭布の背面に設け、該押圧板によって該ウエット拭布をメダル表面に弾性的に押圧する拭布押圧機構とからなり、第2洗浄部は、前記第1洗浄部におけるコンベヤと拭布支持機構とを倒置した関係にてコンベヤと拭布支持機構を配設すると共に該コンベヤの搬送ベルトは表面に細かな凹凸を形成することで高摩擦性のものとすることによりメダルをウエット拭布と該搬送ベルトとの間で移動させるものであることを特徴とする。
このように第1洗浄部と第2洗浄部を設けたことにより、メダルを片面ずつ綺麗に洗浄することが可能となる。
In order to achieve the above object, a medal cleaning apparatus according to claim 1 is a medal cleaning apparatus that sequentially cleans medals one side at a time by a first cleaning section and a second cleaning section, and the first cleaning section is endless. Conveyors for transporting medals by a belt-shaped transport belt and endless belt-shaped wet wipes impregnated with a cleaning liquid are stretched in parallel with the transport surface of the transport belt at an appropriate distance from each other, and the wet wiping is performed. A wiping cloth supporting mechanism that wipes the surface of the medal with the wet wiping cloth by running the cloth, and a pressing plate is provided on the back surface of the wet wiping cloth, and the wet wiping cloth is elastically applied to the medal surface by the pressing plate. The second cleaning unit is arranged to dispose the conveyor and the wiping support mechanism in an inverted relationship between the conveyor and the wiping support mechanism in the first cleaning unit. Conveyor belt Nbeya is characterized in that to move between the wet wipers and conveying belt medals by those of high friction by forming fine irregularities on the surface.
Thus, by providing the 1st washing | cleaning part and the 2nd washing | cleaning part, it becomes possible to wash | clean medals beautifully one side at a time.

また、請求項2に記載したメダル洗浄装置は、第1洗浄部と第2洗浄部とによってメダルを片面ずつ順に洗浄するメダル洗浄装置であって、第1洗浄部は、無端状の搬送ベルトの表面に高さがメダルの厚さよりも低い係合部を該搬送ベルトの幅方向にメダルの直径よりも狭い間隔にて横並びに形成すると共に、該搬送ベルトの搬送面がメダル集合箱から斜め上向きに起立姿勢となるように支持することにより該メダル集合箱のメダルが該係合部間に係合して斜め上向きに搬送されるようにしたコンベヤと、洗浄液が含浸された無端帯状のウエット拭布を前記搬送ベルトの搬送面に対して適宜間隔を離して平行に張設すると共に、該ウエット拭布を定方向に走行させることにより該ウエット拭布によってメダル表面が拭われるようにする拭布支持機構と、押圧板を前記ウエット拭布の背面に設け、該押圧板によって該ウエット拭布をメダル表面に弾性的に押圧する拭布押圧機構とからなり、第2洗浄部は、前記第1洗浄部における上下を倒置した関係にてコンベヤと拭布支持機構を配設し、該コンベヤの搬送ベルトは表面に細かな凹凸を形成することで高摩擦性のものとすることによりメダルをウエット拭布と該搬送ベルトとの間で斜め下向きに移動させるものであることを特徴とする。
このように、第1洗浄部では重力に反して斜め上向きに搬送されるメダルに対してウエット拭布を押圧しメダルを磨き上げることにより高い研磨効果が得られる。また第2洗浄部ではメダルが自重によっても斜め下向きに移動するので、メダルが途中で詰まるおそれもなく、移動がスムースになる。
The medal cleaning device according to claim 2 is a medal cleaning device that sequentially cleans medals one side at a time by the first cleaning unit and the second cleaning unit, and the first cleaning unit includes an endless transport belt. Engagement portions whose height is lower than the thickness of the medal are formed side by side in the width direction of the transport belt at intervals smaller than the diameter of the medal, and the transport surface of the transport belt faces obliquely upward from the medal collection box A conveyor in which the medals of the medal collection box are engaged between the engaging portions and conveyed obliquely upward by supporting the medallion box in an upright posture, and an endless belt-like wet wipe impregnated with a cleaning liquid A wiping cloth that stretches the cloth in parallel with the conveying surface of the conveying belt at an appropriate interval, and allows the surface of the medal to be wiped by the wet wiping cloth by running the wet wiping cloth in a fixed direction. Branch And a wiping cloth pressing mechanism that elastically presses the wet wiping cloth against the medal surface by the pressing plate. The conveyor and wiper support mechanism are arranged in a relationship where the top and bottom are turned upside down, and the conveyor belt of the conveyor has a high frictional property by forming fine irregularities on the surface, so that the medals are wet wiped And the conveyor belt are moved obliquely downward.
As described above, in the first cleaning unit, a high polishing effect can be obtained by pressing the wet wiping cloth against the medal conveyed obliquely upward against the gravity to polish the medal. Further, in the second cleaning unit, the medal moves diagonally downward due to its own weight, so there is no possibility that the medal is jammed in the middle, and the movement is smooth.

また、請求項3に記載した発明は上記メダル洗浄装置において、第1洗浄部の搬送ベルトの走行速度を第2洗浄部の搬送ベルトの走行速度よりも低速に設定すると共に、該第1洗浄部および第2洗浄部のウエット拭布の走行速度を該各搬送ベルトの走行速度よりも低速に設定したことを特徴とする。
このため、第2洗浄部にメダルが滞留するようなトラブルが生じ難くなり、メダルが常にスムースに搬送される。
According to a third aspect of the present invention, in the medal cleaning device, the traveling speed of the transport belt of the first cleaning unit is set lower than the traveling speed of the transport belt of the second cleaning unit, and the first cleaning unit In addition, the traveling speed of the wet wipes of the second cleaning unit is set to be lower than the traveling speed of the respective conveyor belts.
For this reason, it is difficult for troubles such as medals to stay in the second cleaning section, and the medals are always transported smoothly.

また、請求項4に記載した発明は上記メダル洗浄装置において、第1洗浄部のコンベヤと第2洗浄部のコンベヤとは渡し板を介して正面「ヘ」字形に連なるよう配置したことを特徴とする。
このため、第1洗浄部および第2洗浄部にそれぞれ長いウエット拭布を設けても、平面視した場合の全長が抑制され、設置スペースを要しないので、洗浄装置を小型化することができる。
The invention described in claim 4 is characterized in that , in the medal cleaning device, the conveyor of the first cleaning section and the conveyor of the second cleaning section are arranged so as to be connected in a front “H” shape via a transfer plate. To do.
For this reason, even if a long wet wipe is provided for each of the first cleaning unit and the second cleaning unit, the overall length in a plan view is suppressed, and no installation space is required, so the cleaning device can be miniaturized.

また、請求項5に記載した発明は上記メダル洗浄装置において、周壁に複数の小孔が開設された中空状の支軸にガイドローラを回転自在に支持し、該ガイドローラに前記ウエット拭布を張設し、該支軸中に供給された洗浄液を該小孔から吐出させることにより該ウエット拭布に洗浄液が定量ずつ補給されるようにしたことを特徴とする。
このため、ウエット拭布が常に適切な湿潤状態に保たれ、洗浄効果を高めることができる。
According to a fifth aspect of the present invention, in the medal cleaning apparatus, a guide roller is rotatably supported on a hollow support shaft having a plurality of small holes formed in the peripheral wall, and the wet wipe is applied to the guide roller. The cleaning liquid is stretched, and the cleaning liquid supplied into the support shaft is discharged from the small holes so that the cleaning liquid is replenished to the wet wiping cloth in a fixed amount.
For this reason, the wet wiping cloth is always kept in an appropriate wet state, and the cleaning effect can be enhanced.

また、請求項6に記載した発明は上記メダル洗浄装置において、電動により突上棒を底部から出没動させるメダル攪拌装置をメダル集合箱に設けたことを特徴とする。
このため、メダル集合箱のメダルをコンベヤの搬送面上に確実に送り出すことができる。
According to a sixth aspect of the present invention, in the medal washing apparatus, the medal aggregating device is provided with a medal agitating device for electrically moving the protrusion rod from the bottom portion.
For this reason, the medals in the medal collection box can be surely sent out on the transport surface of the conveyor.

大きさの異なるメダルが混じって搬入されてもこれらを問題なく洗浄処理できる。このため、遊技場におけるメダル洗浄装置の設備コスト、設置スペース等が軽減される。また、メダルをより綺麗に洗浄することができる。   Even if medals of different sizes are mixed in, they can be washed without problems. For this reason, the equipment cost, installation space, etc. of the medal washing apparatus in the game hall are reduced. In addition, the medal can be washed more neatly.

図1は本発明に係るメダル洗浄装置を縦断面した正面図である。同図中、Aは第1洗浄部、Bは第2洗浄部、10はメダル集合箱で、該メダル集合箱に収容されたメダルM1,M2は第1洗浄部Aと第2洗浄部Bを通過することにより片面ずつ順に洗浄されてホッパー11に至る。   FIG. 1 is a front elevational view of a medal cleaning device according to the present invention. In the figure, A is the first cleaning unit, B is the second cleaning unit, 10 is the medal collection box, and the medals M1 and M2 accommodated in the medal collection box are the first cleaning unit A and the second cleaning unit B. By passing, it is washed one by one in order and reaches the hopper 11.

第1洗浄部Aおよび第2洗浄部Bは鉛直に支持された組付板12の前面に形成されており、20aは第1洗浄部Aのコンベヤ、20bは第2洗浄部Bのコンベヤである。メダル集合箱10は上面10aが開放され底面10bが傾斜面に形成され、その傾斜下方側面に第1洗浄部Aのコンベヤ20aの下端部が臨んでいる。   The 1st washing | cleaning part A and the 2nd washing | cleaning part B are formed in the front surface of the assembly board 12 supported vertically, 20a is a conveyor of the 1st washing | cleaning part A, 20b is a conveyor of the 2nd washing | cleaning part B. . The medal collecting box 10 has an upper surface 10a open and a bottom surface 10b formed as an inclined surface, and a lower end portion of the conveyor 20a of the first cleaning unit A faces the inclined lower side surface.

図2は第1洗浄部Aの拡大縦断面図、図3はそのA−A線断面図で、コンベヤ20aの無端状の搬送ベルト21aは、定幅帯状のゴム布ベルトからなり、図4の斜視図にも示したように、高さがメダルM1,M2の厚さよりも少し低く(高さ1.4mm)、直径が3mm程の多数の係合部22aが、ベルト表面の幅方向にはメダルM1,M2の直径よりも狭い22mmの間隔にて横並びに形成され、ベルト表面の長手方向にはメダルM1,M2の直径よりも広い35mmの間隔にて連続して形成されたものである。23a,24aは該搬送ベルト21aを巻回している該コンベヤ20aの駆動ローラと従動ローラである。該コンベヤ20aは、該搬送ベルト21aの搬送面がメダル集合箱10から斜め上向きに起立(起立角度:約70度)姿勢となるように支持され、該搬送ベルト21aを矢印で示した方向に駆動することにより該メダル集合箱中のメダルM1,M2を図4に示したように隣り合う一対の係合部22aの間に填ったような状態で係合させて斜め上向きに搬出させる。   2 is an enlarged longitudinal sectional view of the first cleaning section A, FIG. 3 is a sectional view taken along the line AA in FIG. 4, and an endless transport belt 21a of the conveyor 20a is composed of a constant width belt-like rubber cloth belt. As shown in the perspective view, a number of engaging portions 22a whose height is slightly lower than the thickness of the medals M1 and M2 (height 1.4 mm) and whose diameter is about 3 mm are arranged in the width direction of the belt surface. They are formed side by side at intervals of 22 mm narrower than the diameters of the medals M1 and M2, and are continuously formed at intervals of 35 mm wider than the diameters of the medals M1 and M2 in the longitudinal direction of the belt surface. Reference numerals 23a and 24a denote a driving roller and a driven roller of the conveyor 20a around which the conveyor belt 21a is wound. The conveyor 20a is supported so that the conveying surface of the conveying belt 21a is inclined upward (standing angle: about 70 degrees) from the medal collecting box 10 and drives the conveying belt 21a in the direction indicated by the arrow. As a result, the medals M1 and M2 in the medal collection box are engaged with each other in a state of being fitted between a pair of adjacent engaging portions 22a as shown in FIG.

13はメダル集合箱10に設けられたメダル攪拌装置で、該メダル攪拌装置は、図5に示したように、底面10bに複数の突上棒14をそれぞれ貫通するように設けると共に、低速回転モータ15の回転軸に複数の偏心カム16を隣接状に設け、該偏心カム16の外周に摺接するようにリング17をそれぞれ設け、該リングに該各突上棒14の下端部を連結し、該偏心カム16が回転すると該突上棒14がメダル集合箱10内に出没動することから、該メダル集合箱10内のメダルM1,M2が攪拌されるようにしたもので、この攪拌によりメダル集合箱10中のメダルM1,M2を搬送ベルト21aの係合部22a間に係合させ易くしている。   Reference numeral 13 denotes a medal agitating device provided in the medal collecting box 10, and the medal agitating device is provided so as to penetrate the plurality of protruding rods 14 in the bottom surface 10b as shown in FIG. A plurality of eccentric cams 16 are provided adjacent to each other on 15 rotation shafts, a ring 17 is provided so as to be in sliding contact with the outer periphery of the eccentric cam 16, and a lower end portion of each protruding rod 14 is connected to the ring, When the eccentric cam 16 rotates, the thrust bar 14 moves in and out of the medal collection box 10, so that the medals M1 and M2 in the medal collection box 10 are agitated. The medals M1 and M2 in the box 10 are easily engaged between the engaging portions 22a of the transport belt 21a.

また、30aは、洗浄液が含浸された無端帯状のウエット拭布31aを前記搬送ベルト21aの搬送面に対して適宜間隔を離して平行に張設すると共に、該ウエット拭布31aを定方向に走行させることにより該ウエット拭布によってメダルM1,M2の表面を拭う拭布支持機構で、ガイドローラ32aとガイドローラ33aおよび駆動ゴムローラ34aに該ウエット拭布31aを巻回すると共に、テンションローラ35aを該ウエット拭布31aに圧接することにより、該ウエット拭布は前記搬送ベルト21aの搬送面に対し平行に張設され、駆動ゴムローラ34aが回転動することで該ウエット拭布を矢印で示した方向に走行させる。なお、ウエット拭布31aの走行速度は搬送ベルト21aの走行速度よりも低速(約1/10の速度)となるように設定される。このようにウエット拭布31aをメダル搬送方向と同方向であって搬送ベルトよりも低速にて走行させることにより、該ウエット拭布31aが摩擦によって搬送中のメダルに過剰な負荷を掛け、メダルが搬送ベルトの両脇に飛び出してしまうことのないようにしている。   In addition, 30a stretches an endless belt-shaped wet wiping cloth 31a impregnated with a cleaning liquid in parallel to the conveying surface of the conveying belt 21a at an appropriate interval and travels in a fixed direction. By the wiping cloth supporting mechanism that wipes the surfaces of the medals M1 and M2 with the wet wiping cloth, the wet wiping cloth 31a is wound around the guide roller 32a, the guide roller 33a, and the driving rubber roller 34a, and the tension roller 35a is The wet wipe is stretched in parallel with the conveyance surface of the conveyance belt 21a by being pressed against the wet wipe 31a, and the drive rubber roller 34a is rotated to move the wet wipe in the direction indicated by the arrow. Let it run. The traveling speed of the wet wipe 31a is set to be lower (approximately 1/10 speed) than the traveling speed of the transport belt 21a. In this way, by causing the wet wipe 31a to run in the same direction as the medal conveyance direction and at a lower speed than the conveyance belt, the wet wipe 31a applies an excessive load to the medal being conveyed due to friction, and the medal is It prevents it from jumping out on both sides of the conveyor belt.

また、上記ガイドローラ32aは、図6に示したように、軸方向に分断された複数のローラ部材36aがそれぞれ中空状の支軸37aに回転自在に支持され、該支軸の周壁には複数の小孔38aが開設されている。
そして、該支軸の一端を電磁弁を介して洗浄液タンクに連通させ、タイマーの作動によって例えば5分おきに該電磁弁が開かれて該洗浄液タンクから洗浄液が上記ガイドローラ32aに例えば2〜3ccずつ補給され、該洗浄液を小孔38aから吐出させることにより、ウエット拭布31aが常に適度な湿潤状態に維持されるようにしている。
なお、ウエット拭布31aの湿潤状態を検出する湿潤センサーを設け、その検出によって洗浄液タンクから洗浄液が自動的に補給され、該ウエット拭布31aが適度な湿潤状態に保たれるようにしてもよい。
Further, as shown in FIG. 6, the guide roller 32a has a plurality of roller members 36a that are divided in the axial direction rotatably supported by a hollow support shaft 37a, and a plurality of roller members 36a are provided on the peripheral wall of the support shaft. A small hole 38a is opened.
Then, one end of the support shaft is communicated with the cleaning liquid tank via an electromagnetic valve, and the electromagnetic valve is opened every 5 minutes, for example, by the operation of a timer, so that the cleaning liquid is supplied to the guide roller 32a from the cleaning roller, for example, 2 to 3 cc. The wet wiping cloth 31a is always maintained in an appropriate wet state by being replenished one by one and discharging the cleaning liquid from the small holes 38a.
A wet sensor for detecting the wet state of the wet wipe 31a may be provided so that the cleaning liquid is automatically replenished from the cleaning liquid tank by the detection, so that the wet wipe 31a is maintained in an appropriate wet state. .

また、40aは搬送ベルト21aによって搬送されるメダルM1,M2の表面にウエット拭布31aを弾性的に押圧するために設けられる拭布押圧機構で、該拭布押圧機構は、図7に示したように、表面に適宜間隔で複数条の縦溝41aが形成された合成樹脂製の押圧板42aをカバー板43aの内側に配置し、該押圧板42aの背面に固植された支持軸44aをカバー板43aに貫挿すると共に、該押圧板42aとカバー板43aとの間にコイルバネ等の弾性体45aを圧縮状態にて介在させ、該カバー板43aをコンベヤ20aのフレームに複数の摘子ネジ46aにより着脱自在に組み付けることにより、該弾性体45aの弾性により該押圧板42aがウエット拭布31aを背面から押圧し得るように構成している。なお、摘子ネジ46aを緩めることによりカバー板43a,押圧板42aがコンベヤフレームから着脱され、ウエット拭布31aを必要に応じて交換できるようにしている。   Reference numeral 40a denotes a wiping cloth pressing mechanism provided to elastically press the wet wiping cloth 31a on the surfaces of the medals M1 and M2 conveyed by the conveying belt 21a. The wiping cloth pressing mechanism is shown in FIG. In this way, a synthetic resin pressing plate 42a having a plurality of longitudinal grooves 41a formed on the surface at appropriate intervals is disposed inside the cover plate 43a, and a support shaft 44a fixedly planted on the back surface of the pressing plate 42a is provided. The cover plate 43a is inserted into the cover plate 43a, and an elastic body 45a such as a coil spring is interposed between the pressing plate 42a and the cover plate 43a in a compressed state, and the cover plate 43a is attached to the frame of the conveyor 20a. The pressing plate 42a is configured to be able to press the wet wipe 31a from the back by the elasticity of the elastic body 45a by being detachably assembled by the 46a. The cover plate 43a and the pressing plate 42a are detached from the conveyor frame by loosening the knob screw 46a so that the wet wipe 31a can be replaced as necessary.

次に第2洗浄部Bの構成を説明する。第2洗浄部Bは、第1洗浄部Aにおける上下を倒置した関係にてコンベヤ20bと拭布支持機構30bが配置され、該コンベヤ20bの搬送ベルト21bと拭布支持機構30bのウエット拭布31bによって形成される搬送面が斜め下向き(下傾角度:約30度)姿勢となるようにしている。47は第1洗浄部Aのコンベヤ20aの上端部から排出されたメダルM1,M2を受けて該メダルを自重で第2洗浄部Bの搬送ベルト21bとウエット拭布31bとの間隔に導くために傾斜状に設けられた渡し板である。このため、第1洗浄部Aのコンベヤ20aと第2洗浄部Bのコンベヤ20bとは組付板12の前面に渡し板47を介して正面「ヘ」字形に連なるように配置される。なお、コンベヤ20bは上記コンベヤ20aと同様に定幅帯状のゴムベルトからなる搬送ベルト21bを駆動ローラ23bと従動ローラ24bに巻掛してなるものであるが、該搬送ベルト21bは表面に搬送ベルト21aのような係合部は形成されず、図8に示したように、表面に細かな凹凸が形成されたものを用いることで、メダル表面に対し高い摩擦性が得られるようにしている。このため、渡し板47から滑落したメダルM1,M2は搬送ベルト21bが矢印で示した方向に駆動されることによりウエット拭布31bとの間を斜め下向きに搬送される。このように搬送ベルト21bには搬送ベルト21aのような係合部が形成されていないので、第2洗浄部Bにおいてメダルが係合部上に乗り上げてしまうおそれがなく、第1洗浄部Aから送られてきたメダルが滞留するようなトラブルの発生も無く、常にスムースに搬送することができる。   Next, the structure of the 2nd washing | cleaning part B is demonstrated. In the second cleaning section B, the conveyor 20b and the wiping cloth support mechanism 30b are arranged in a relationship where the upper and lower sides of the first cleaning section A are turned upside down. The conveyor belt 21b of the conveyor 20b and the wet wiping cloth 31b of the wiping cloth support mechanism 30b The conveyance surface formed by is inclined obliquely downward (downward tilt angle: about 30 degrees). 47 is for receiving the medals M1 and M2 discharged from the upper end of the conveyor 20a of the first cleaning section A and guiding the medals to the distance between the transport belt 21b of the second cleaning section B and the wet wipe 31b by its own weight. It is a transfer board provided in an inclined shape. For this reason, the conveyor 20a of the 1st washing | cleaning part A and the conveyor 20b of the 2nd washing | cleaning part B are arrange | positioned on the front surface of the assembly | attachment board 12 so that it may continue in a front "H" shape via the transfer board 47. The conveyor 20b is formed by winding a conveyor belt 21b made of a constant-width belt-like rubber belt around a driving roller 23b and a driven roller 24b in the same manner as the conveyor 20a. The conveyor belt 21b has a conveyor belt 21a on the surface. Such an engaging portion is not formed, and as shown in FIG. 8, by using a member having fine irregularities on the surface, high frictional properties can be obtained with respect to the medal surface. For this reason, the medals M1 and M2 sliding down from the transfer plate 47 are transported diagonally downward between the wet wipes 31b by driving the transport belt 21b in the direction indicated by the arrow. Thus, since the engaging part like the conveying belt 21a is not formed in the conveying belt 21b, there is no possibility that the medal rides on the engaging part in the second cleaning part B. There is no trouble that the sent medals stay, and the medals can always be smoothly transported.

該搬送ベルト21bの走行速度は搬送ベルト21aの走行速度よりも少し高速に設定される。これは搬送ベルト21aによって搬送されたメダルが渡し板47上に溜まらないようにするためである。また、拭布支持機構30bは前記拭布支持機構30aと同様にウエット拭布31bがガイドローラ32bとガイドローラ33bおよび駆動ゴムローラ34bに巻回され、駆動ゴムローラ34aにより矢印で示した方向に搬送ベルト21bの走行速度よりも低速(約1/10の速度)で走行される。なお、上記駆動ローラ24a,24b、駆動ゴムローラ34a、34b等は組付板12の裏側に設けられたスプロケット、チェーン、ギヤ、等の伝動機構およびモータ(図示せず)を駆動源として上記所定の速度で回転駆動される。   The traveling speed of the conveyor belt 21b is set slightly higher than the traveling speed of the conveyor belt 21a. This is to prevent the medals transported by the transport belt 21a from accumulating on the transfer plate 47. Similarly to the wiping support mechanism 30a, the wiping support mechanism 30b has a wet wiping cloth 31b wound around a guide roller 32b, a guide roller 33b, and a driving rubber roller 34b, and is driven by the driving rubber roller 34a in the direction indicated by the arrow. The vehicle travels at a lower speed (about 1/10 speed) than the travel speed of 21b. The drive rollers 24a and 24b, the drive rubber rollers 34a and 34b, and the like are driven by a transmission mechanism such as a sprocket, chain, and gear provided on the back side of the assembly plate 12 and a motor (not shown) as a drive source. Driven at speed.

また、上記ガイドローラ32aと同様にガイドローラ32bには洗浄液タンクから洗浄液が補給され、ウエット拭布31bを常に適度な湿潤状態に維持している。拭布押圧機構40bは前記拭布押圧機構40aと同様に押圧板42bをカバー板43bの内側に配置され、該押圧板42bの背面に固植された支持軸44bをカバー板43bに貫挿すると共に、該押圧板42bとカバー板43bとの間にコイルバネ等の弾性体45bを圧縮状態にて介在させ、該カバー板43bをコンベヤ20bの両側フレームに複数の摘子ネジ46bにより着脱自在に組み付けることにより、該弾性体45bの弾性により該押圧板42bがウエット拭布31bを押圧しウエット拭布31bを搬送ベルト21bによって下向きに搬送されているメダルM1,M2の表面(下面)にウエット拭布31bを弾性的に押圧するように構成している。   Similarly to the guide roller 32a, the guide roller 32b is replenished with the cleaning liquid from the cleaning liquid tank, and the wet wiping cloth 31b is always kept in a proper wet state. Similar to the wiping cloth pressing mechanism 40a, the wiping cloth pressing mechanism 40b has a pressing plate 42b disposed inside the cover plate 43b, and a support shaft 44b fixed on the back surface of the pressing plate 42b is inserted into the cover plate 43b. In addition, an elastic body 45b such as a coil spring is interposed between the pressing plate 42b and the cover plate 43b in a compressed state, and the cover plate 43b is detachably assembled to both side frames of the conveyor 20b by a plurality of knob screws 46b. Accordingly, the pressing plate 42b presses the wet wiping cloth 31b by the elasticity of the elastic body 45b, and the wet wiping cloth 31b is transported downward on the surface (lower surface) of the medals M1 and M2 by the transport belt 21b. It is comprised so that 31b may be pressed elastically.

このように構成したメダル洗浄装置では、直径の異なる大小のメダルM1,M2を搬送ベルト21aの係合部22aに係合させることにより同時に搬送できると共に、該メダルの表面にウエット拭布31aが押圧板42aによって適宜押圧力により圧着することにより、該メダルの汚れを確実に拭き取ることができる。また、この第1洗浄部Aを通過した後に該メダルM1,M2は第2洗浄部Bに至りて搬送ベルト21bとの摩擦により斜め下向きに搬送され、該メダルの下面にウエット拭布31bを圧着させることにより、該メダルM1,M2を片面ずつ綺麗に洗浄することができる。
このため、遊技場の設備として洗浄装置をメダルの大きさ毎に2台以上設ける必要もなくなり、設備コストおよび設置スペースを大幅に軽減することができると共に、遊技場内に常に両面とも綺麗に洗浄されたメダルを循環させることができる。
In the medal cleaning apparatus configured as described above, the medals M1 and M2 having different diameters can be simultaneously conveyed by engaging with the engaging portion 22a of the conveying belt 21a, and the wet wipe 31a is pressed against the surface of the medal. The medals can be surely wiped off by pressing the plate 42a with appropriate pressing force. Further, after passing through the first cleaning section A, the medals M1 and M2 reach the second cleaning section B and are transported obliquely downward by friction with the transport belt 21b, and a wet wiping cloth 31b is pressure-bonded to the lower surface of the medals. By doing so, the medals M1 and M2 can be cleaned cleanly one by one.
For this reason, it is not necessary to install two or more cleaning devices for each medal size as a game facility, and the equipment cost and installation space can be greatly reduced, and both sides are always cleaned cleanly in the game facility. Medals can be circulated.

なお、上記実施形態にて図示した搬送ベルト21aの係合部22aは、背の低い円柱形突起であるが、本発明では係合部22aはこの形状に限られることなく、メダルM1,M2を搬送ベルトの表面に係止可能であれば、例えばコ字枠状の係合部を形成するなど、その他の形態に形成してあってもよい。また、搬送ベルト21bは、上記実施形態にて図示した細かな凹凸(凹状部もしくは凸状部)を縞模様のように形成したが、メダルM1,M2との摩擦係数を高められるようにその他の形態に形成してもよいこと勿論である。   In addition, although the engaging part 22a of the conveyance belt 21a illustrated in the above embodiment is a short cylindrical protrusion, in the present invention, the engaging part 22a is not limited to this shape, and the medals M1 and M2 are used. As long as it can be locked to the surface of the conveyor belt, it may be formed in other forms, for example, a U-shaped engaging portion is formed. In addition, although the fine unevenness (concave portion or convex portion) illustrated in the above embodiment is formed in a striped pattern on the conveyor belt 21b, other conveyor belts 21b may be used to increase the friction coefficient with the medals M1 and M2. Of course, it may be formed into a form.

本発明に係るメダル洗浄装置を縦断面した正面図。The front view which carried out the longitudinal section of the medal washing device concerning the present invention. 図1の要部拡大縦断面図。The principal part expanded longitudinal cross-sectional view of FIG. 図2のA−A線断面図。FIG. 3 is a cross-sectional view taken along line AA in FIG. 2. 本発明に係るメダル洗浄装置における第1洗浄部の搬送ベルトの斜視図。The perspective view of the conveyance belt of the 1st washing | cleaning part in the medal washing apparatus which concerns on this invention. 図1におけるメダル攪拌装置の縦断面図。The longitudinal cross-sectional view of the medal stirring apparatus in FIG. 本発明に係るメダル洗浄装置におけるガイドローラの斜視図。The perspective view of the guide roller in the medal cleaning apparatus which concerns on this invention. 本発明に係るメダル洗浄装置における拭布支持機構の押圧板の斜視図。The perspective view of the press board of the wiping cloth support mechanism in the medal cleaning apparatus which concerns on this invention. 本発明に係るメダル洗浄装置における第2洗浄部の搬送ベルトの斜視図。The perspective view of the conveyance belt of the 2nd washing | cleaning part in the medal washing apparatus which concerns on this invention.

符号の説明Explanation of symbols

A 第1洗浄部
B 第2洗浄部
M1,M2 メダル
10 メダル集合箱
12 組付板
13 メダル攪拌装置
14 突上棒
20a,20b コンベヤ
21a,21b 搬送ベルト
22a,22b 係合部
30a,30b 拭布支持機構
31a,31b ウエット拭布
32a,32b ガイドローラ
33a,33b ガイドローラ
36a,36b ローラ部材
37a,37b 支軸
38a,38b 小孔
40a,40b 拭布押圧機構
41a,41b 縦溝
42a,42b 押圧板
43a,43b カバー板
45a,45b 弾性体
47 渡し板
A 1st washing | cleaning part B 2nd washing | cleaning part M1, M2 Medal 10 Medals collection box 12 Assembly plate 13 Medal agitation device 14 Raising bar 20a, 20b Conveyor 21a, 21b Conveying belt 22a, 22b Engagement part 30a, 30b Wiping cloth Support mechanism 31a, 31b Wet wipe 32a, 32b Guide roller 33a, 33b Guide roller 36a, 36b Roller member 37a, 37b Support shaft 38a, 38b Small hole 40a, 40b Wiping cloth pressing mechanism 41a, 41b Vertical groove 42a, 42b Press plate 43a, 43b Cover plate 45a, 45b Elastic body 47 Transfer plate

Claims (6)

第1洗浄部と第2洗浄部とによってメダルを片面ずつ順に洗浄するメダル洗浄装置であって、第1洗浄部は、無端状の搬送ベルトによりメダルが搬送されるようにしたコンベヤと、洗浄液が含浸された無端帯状のウエット拭布を前記搬送ベルトの搬送面に対して適宜間隔を離して平行に張設し該ウエット拭布を走行させることにより該ウエット拭布によってメダル表面が拭われるようにする拭布支持機構と、押圧板を前記ウエット拭布の背面に設け、該押圧板によって該ウエット拭布をメダル表面に弾性的に押圧する拭布押圧機構とからなり、第2洗浄部は、前記第1洗浄部におけるコンベヤと拭布支持機構とを倒置した関係にてコンベヤと拭布支持機構を配設すると共に該コンベヤの搬送ベルトは表面に細かな凹凸を形成することで高摩擦性のものとすることによりメダルをウエット拭布と該搬送ベルトとの間で移動させるものであることを特徴としたメダル洗浄装置。   A medal cleaning device that sequentially cleans medals one side at a time by a first cleaning unit and a second cleaning unit, wherein the first cleaning unit includes a conveyor configured to transport medals by an endless transport belt, and a cleaning liquid. The impregnated endless belt-shaped wet wiping cloth is stretched in parallel with a distance from the conveying surface of the conveying belt, and the medal surface is wiped by the wet wiping cloth by running the wet wiping cloth. A wiping cloth supporting mechanism, and a wiping cloth pressing mechanism that elastically presses the wet wiping cloth against the medal surface with the pressing plate provided on the back surface of the wet wiping cloth. The conveyor and wiper support mechanism are disposed in an inverted relationship between the conveyor and the wiper support mechanism in the first cleaning section, and the conveyor belt has high friction by forming fine irregularities on the surface. Medals cleaning apparatus characterized by a medal by those of in which is moved between the wet wipers and conveying belt. 第1洗浄部と第2洗浄部とによってメダルを片面ずつ順に洗浄するメダル洗浄装置であって、第1洗浄部は、無端状の搬送ベルトの表面に高さがメダルの厚さよりも低い係合部を該搬送ベルトの幅方向にメダルの直径よりも狭い間隔にて横並びに形成すると共に、該搬送ベルトの搬送面がメダル集合箱から斜め上向きに起立姿勢となるように支持することにより該メダル集合箱のメダルが該係合部間に係合して斜め上向きに搬送されるようにしたコンベヤと、洗浄液が含浸された無端帯状のウエット拭布を前記搬送ベルトの搬送面に対して適宜間隔を離して平行に張設すると共に、該ウエット拭布を定方向に走行させることにより該ウエット拭布によってメダル表面が拭われるようにする拭布支持機構と、押圧板を前記ウエット拭布の背面に設け、該押圧板によって該ウエット拭布をメダル表面に弾性的に押圧する拭布押圧機構とからなり、第2洗浄部は、前記第1洗浄部における上下を倒置した関係にてコンベヤと拭布支持機構を配設し、該コンベヤの搬送ベルトは表面に細かな凹凸を形成することで高摩擦性のものとすることによりメダルをウエット拭布と該搬送ベルトとの間で斜め下向きに移動させるものであることを特徴としたメダル洗浄装置。   A medal cleaning device that sequentially cleans medals one side at a time by a first cleaning unit and a second cleaning unit, wherein the first cleaning unit is engaged with a surface of an endless transport belt whose height is lower than the thickness of the medal. Are formed side by side in the width direction of the transport belt at intervals narrower than the diameter of the medals, and the medals are supported so that the transport surface of the transport belt is in an upright posture obliquely upward from the medal collection box. A conveyor in which the medals of the assembly box are engaged between the engaging portions and conveyed obliquely upward, and an endless belt-shaped wet wipe impregnated with the cleaning liquid are appropriately spaced from the conveying surface of the conveying belt. And a wiping support mechanism for wiping the surface of the medal with the wet wiping cloth by running the wet wiping cloth in a fixed direction, and a pressing plate on the back surface of the wet wiping cloth In And a wiping cloth pressing mechanism that elastically presses the wet wiping cloth against the surface of the medal by the pressing plate, and the second cleaning section has a conveyor and a wiping cloth in a relationship in which the top and bottom of the first cleaning section are turned upside down. A support mechanism is provided, and the conveyor belt of the conveyor is made of high friction by forming fine irregularities on the surface, thereby moving the medal diagonally downward between the wet wipe and the conveyor belt. Medal washing device characterized by being a thing. 第1洗浄部の搬送ベルトの走行速度を第2洗浄部の搬送ベルトの走行速度よりも低速に設定すると共に、該第1洗浄部および第2洗浄部のウエット拭布の走行速度を該各搬送ベルトの走行速度よりも低速に設定したことを特徴とする請求項またはに記載のメダル洗浄装置。 The traveling speed of the transport belt of the first cleaning unit is set to be lower than the traveling speed of the transport belt of the second cleaning unit, and the traveling speed of the wet wipes of the first cleaning unit and the second cleaning unit is set to each of the transports. 3. The medal washing apparatus according to claim 1 , wherein the medal washing apparatus is set at a lower speed than a running speed of the belt. 第1洗浄部のコンベヤと第2洗浄部のコンベヤとは渡し板を介して正面「ヘ」字形に連なるよう配置したものであることを特徴とした請求項のいずれかに記載のメダル洗浄装置。 The medal according to any one of claims 1 to 3 , wherein the conveyor of the first cleaning section and the conveyor of the second cleaning section are arranged so as to be continuous in a front "H" shape via a transfer plate. Cleaning device. 周壁に複数の小孔が開設された中空状の支軸にガイドローラを回転自在に支持し、該ガイドローラに前記ウエット拭布を張設し、該支軸中に供給された洗浄液を該小孔から吐出させることにより該ウエット拭布に洗浄液が定量ずつ補給されるようにしたことを特徴とする請求項1〜のいずれかに記載のメダル洗浄装置。 A guide roller is rotatably supported on a hollow spindle having a plurality of small holes formed in the peripheral wall, the wet wipe is stretched on the guide roller, and the cleaning liquid supplied into the spindle is reduced in the small size. medals cleaning apparatus according to any one washing liquid to the wet wipers of claims 1-4, characterized in that it has to be replenished by quantified by discharging from the hole. 電動により突上棒を底部から出没動させるメダル攪拌装置をメダル集合箱に設けたことを特徴とする請求項のいずれかに記載のメダル洗浄装置。 The medal washing apparatus according to any one of claims 2 to 5 , wherein a medal agitation device is provided in the medal collecting box for electrically moving the protruding rod from the bottom.
JP2006331669A 2006-12-08 2006-12-08 Medal cleaning device Expired - Fee Related JP4418816B2 (en)

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JP5888808B2 (en) * 2011-11-15 2016-03-22 株式会社三信精機 Dish cleaning equipment
CN109794444B (en) * 2019-03-01 2024-05-07 浙江智博交通科技有限公司 Motor vehicle number plate wiping method and wiping device thereof
JP7214509B2 (en) * 2019-03-06 2023-01-30 日本金銭機械株式会社 COIN TRANSPORT UNIT AND COIN PROCESSING DEVICE USING THE SAME
CN112058836B (en) * 2020-08-28 2023-01-17 重庆冠昌光电科技有限公司 Lamp body cleaning device for bulb production
CN113477562A (en) * 2021-06-18 2021-10-08 杭州日设机器有限公司 Coin cleaning machine and implementation method thereof
CN114798577B (en) * 2022-04-12 2023-10-03 昆山宝兴精密五金有限公司 Machining device and method for precise composite tap

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