JP4399709B2 - Cleaning composition for tin-containing alloy parts and cleaning method - Google Patents

Description

  The present invention relates to a cleaning composition for tin-containing alloy parts and a cleaning method using the cleaning composition.

  Conventionally, when cleaning various electronic components and alloy single components, a chlorine-based cleaning agent mainly containing a chlorine-based solvent such as trichlorethylene, perchloroethylene, or methylene chloride has been used. These chlorinated solvents have the advantage of being nonflammable and excellent in drying properties, but their use is currently limited due to environmental problems such as ozone layer destruction and soil contamination, and toxicity to the human body. Further, in the cleaning of electronic parts and the like, there has been a problem that a cleaning effect by a chlorine-based solvent is hardly recognized for ionic residues such as chlorine ions and sulfate ions, which are particularly important in recent years.

  Accordingly, the present applicant has proposed a non-halogen cleaning composition comprising a specific glycol ether compound, a nonionic surfactant and a polyoxyalkylene phosphate ester surfactant as essential components (Patent Literature). 1). This cleaning composition is excellent in cleaning power, toxicity, odor, flammability, influence on objects to be cleaned, and cleaning performance for ionic residues, and is used for cleaning precision parts such as optical parts, electronic parts, ceramic parts, etc. It is used for awards.

  Cleaning using such a halogen-free cleaning composition is performed by a water rinsing process and a drying process after cleaning with a cleaning agent. When cleaning an object to be cleaned on which an alloy part is mounted, the alloy is used during the water rinsing process. There was a problem that the surface was noticeably discolored. In order to solve such problems, the present applicant further contains a polyoxyalkyleneamine surfactant as an essential component in the cleaning composition described in Patent Document 1, and the pH of a 1 wt% aqueous solution of the cleaning agent is 6 A cleaning composition that suppresses discoloration during the rinsing step (see Patent Document 2), or a cleaning agent or a water rinsing agent made of a volatile organic base, carbonate, or nitrogen-based heterocyclic compound is used. Proposed a cleaning composition / rinsing agent (see Patent Document 3).

  However, recently, due to demands for downsizing, thinning, weight reduction, etc. of the electronic parts, the metal components of the mounted alloy parts are, for example, those having a simple configuration such as Shinchu made of copper and zinc, strength, It has begun to change into a complex composition to meet the fine requirements of conductivity, heat resistance, thermal conductivity, etc., using non-halogen-based cleaning compositions and water rinses developed so far In the water-based cleaning, discoloration of the alloy part during the water rinsing process after cleaning cannot be suppressed, resulting in a problem that the appearance and quality of the product are deteriorated.

In the conventional discoloration, for example, in the case of Sinchu, zinc having a high ionization tendency preferentially elutes into water among the two kinds of metals (ie, copper and zinc) constituting the Sinchu by contact with water. The copper-zinc composition ratio of the alloy surface layer was changed, and the relatively large amount of remaining copper was oxidized and discolored by water or air.

  On the other hand, in the case of recent tin-containing alloys (for example, copper alloys composed of copper, tin, nickel, and phosphorus), tin, which is a minor component in the alloy, elutes into the cleaning agent in the cleaning process rather than the water rinsing process. However, a relatively large amount of the remaining copper surface becomes active, and is oxidized with water or air in the water rinsing process and turns reddish brown. Such a discoloration phenomenon cannot be solved even by using the cleaning composition of Patent Document 2 and Patent Document 3, and conversely, when the cleaning composition of Patent Document 3 is used, the nitrogen system in the water rinsing agent is used. When the heterocyclic compound is excessively attached to the copper surface in an active state, there is a problem that discoloration other than oxidation occurs.

Japanese Patent Publication No. 5-40000 Japanese Patent No. 2813862 Japanese Patent No. 3383973

  The present invention provides a cleaning composition capable of aqueous cleaning without causing discoloration due to oxidation or adhesion of a nitrogen-based heterocyclic compound when a tin-containing alloy part is cleaned, and further, the cleaning composition It aims at providing the washing | cleaning method using.

  As a result of intensive studies to solve the above problems, the present inventors have found that the above problems can be solved by performing cleaning using a cleaning composition having a specific composition. The present invention has been completed based on such findings.

That is, the present invention relates to (A) general formula (1): (R ¹ —COO) _h M ¹ (wherein R ¹ is an alkyl group having 1 to 18 carbon atoms or an alkenyl group having 1 to 18 carbon atoms, M ¹ represents a tin atom, and h represents 2. ) A detergent composition for a tin-containing alloy part containing an organic carboxylate represented by the formula: (B) a benzotriazole derivative and (C) an organic solvent as active ingredients; The present invention relates to a cleaning method for cleaning a tin-containing alloy part using the cleaning agent.

  By using the cleaning composition of the present invention, when a tin-containing alloy part (particularly a copper alloy part containing tin) is cleaned, the cleaning property is not deteriorated and discoloration of the part is prevented. can do.

The cleaning composition for tin-containing alloy parts of the present invention comprises (A) an organic carboxylate (hereinafter referred to as (A) component), (B) a nitrogen-based heterocyclic compound (hereinafter referred to as (B) component) and (C) An organic solvent (hereinafter referred to as “component (C)”) is contained as an active ingredient.

As the component (A), the general formula (1): (R ¹ —COO) _h M ¹ (wherein R ¹ is an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 1 to 18 carbon atoms, and M ¹ is A monocarboxylate represented by a tin atom and h is 2. ). In particular, since the effect of preventing discoloration when a tin-containing copper alloy is washed is significant, tin octylate is preferable from the viewpoint of solubility and the effect of suppressing elution of trace metal components.
Is preferred.

(B) As the component base benzotriazole, 1-methylbenzotriazole, 1-hydroxymethyl-benzotriazole, 1 - ((2-ethylhexyl) methyl) benzotriazole, 1- (2,3-dihydroxypropyl) benzo triazoles include benzotriazole derived material such as carboxybenzotriazole. Among these (B) components, a benzotriazole derivative is preferable from the viewpoint of the effect of preventing discoloration, and benzotriazole is particularly preferable.

As (C) component in this invention, it does not specifically limit but a well-known thing can be used. Specifically, for example, hydrocarbon solvents such as hexane, heptane and octane, alcohol solvents such as methanol, ethanol and propanol, ketone solvents such as acetone and methyl ethyl ketone, ethers such as diethyl ether, tetrahydrofuran and glycol ethers Various known organic solvents such as ester solvents such as organic solvents, ethyl acetate and methyl acetate, and nitrogen compound solvents can be used. Of these, glycol ethers are preferably used from the standpoint of detergency and the like, and among the glycol ethers, general formula (5): R ³ O— (CH ₂ CHR ⁴ O) _k —R ⁵ (wherein R ³ represents a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, R ⁴ represents a linear or branched alkyl group having 1 to 5 carbon atoms, and R ⁵ represents a hydrogen atom or It is preferable to use a glycol ether represented by the following formula: k represents a methyl group, and k represents an integer of 2 to 4. From the viewpoint of detergency, safety, environmental characteristics, and the like. Examples of the glycol ether represented by the general formula (5) include diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol monopropyl ether, diethylene glycol dipropyl ether, and diethylene glycol methyl. Propyl ether, diethylene glycol ethyl propyl ether, diethylene glycol monobutyl ether, diethylene glycol dibutyl ether, diethylene glycol methyl butyl ether, diethylene glycol ethyl butyl ether, diethylene glycol propyl butyl ether, diethylene glycol monopentyl Or tetraethylene glycol ethers include - ether, diethylene glycol dipentyl ether, diethylene glycol methyl pentyl ether, diethylene glycol ethyl pentyl ether, diethylene glycol propyl pentyl ether, diethylene glycol butyl pentyl ether, triethylene corresponding to diethylene glycol hexyl ether, as well as these. Among these, diethylene glycol monobutyl ether, diethylene glycol dibutyl ether, and diethylene glycol monohexyl ether are preferable.

Although the usage-amount of (A)-(C) component is not specifically limited, Usually, (A) component is about 0.001-0.45 weight% of a cleaning composition, Preferably it is 0.005-0.4 weight. %, More preferably 0.01 to 0.35% by weight, and component (B) is about 0.001 to 1% by weight of the detergent composition, preferably 0.01 to 0.1% by weight, and component (C) Is added in an amount of about 40 to 99% by weight, preferably 70 to 99% by weight. It is preferable to contain the component (A) in the above ratio in the cleaning agent because elution of trace metal components in the alloy can be suppressed. Since suppression of the elution of the trace metal component in the alloy utilizes the equilibrium reaction of the carboxylate, the elution of the metal component can be sufficiently suppressed with a small amount of addition. If the content of these carboxylates is less than 0.001%, the ability to suppress elution due to equilibrium reaction is insufficient, and trace metal components may begin to elute from the alloy. On the other hand, if the content exceeds 0.45%, the amount of free carboxylic acid present in the cleaning agent becomes excessive, and the metal component may be eluted from the alloy due to the influence of the acid. It is preferable to use the component (B) in an amount of 0.001 to 1% by weight of the cleaning composition because the discoloration suppressing effect of the copper alloy is particularly improved. It is preferable to use 40 to 99% by weight of the component (C) because the solubility of the flux component is improved.

The detergent composition further includes (D) a nonionic surfactant (hereinafter referred to as (D) component), (E) a polyoxyalkylene phosphate ester-based surfactant (hereinafter referred to as (E) component). And (F) a polyoxyalkyleneamine surfactant (hereinafter referred to as “component (F)”) may be mixed.

The component (D) is not particularly limited as long as its ionicity is nonionic, and known components can be used. Specifically, for example, polyethylene glycol ether type nonionic surfactants such as polyoxyethylene alkyl (C6 or more) ether, polyoxyethylene phenyl ether, polyoxyethylene alkyl phenyl ether; polyethylene glycol monoester, polyethylene glycol diester, etc. Polyethylene glycol ester type nonionic surfactants; ethylene oxide adducts of higher aliphatic amines; ethylene oxide adducts of fatty acid amides; polyhydric alcohol type nonionic surfactants such as sorbitan fatty acid esters and sucrose fatty acid esters; fatty acids Alkanolamide, etc., and corresponding polyoxypropylene nonionic surfactants and polyoxyethylene polyoxypropylene copolymer type nonionic surfactants It can be mentioned. These nonionic surfactants can be used alone or in combination of two or more. Among these, from the viewpoint of detergency, preferred are polyethylene glycol ether type nonionic surfactants, and more preferred are those represented by general formula (6): R ⁶ O— (CH ₂ CH ₂ O) _m —H. (In the formula, R ⁶ represents a linear or branched alkyl group having 6 to 20 carbon atoms, a phenyl group, or a phenyl group substituted with a linear or branched alkyl group having 7 to 12 carbon atoms; It is preferable to use a polyethylene glycol ether type nonionic surfactant represented by the following formula: ~ 20.

The component (E) is not particularly limited as long as it is a polyoxyalkylene phosphate ester-based surfactant, and a known one can be used, but the general formula (7): R ⁷ O— (CH ₂ CH ₂ O) _n -PO (OH) X (wherein R ⁷ is a linear or branched alkyl group having 5 to 20 carbon atoms, a phenyl group, or a linear or branched alkyl group having 7 to 12 carbon atoms. N is an integer of 0 to 20, X is a hydroxyl group or R ⁸ O— (CH ₂ CH ₂ O) _n — (wherein R ⁸ has 5 to 5 carbon atoms) 20 represents a linear or branched alkyl group, a phenyl group, or a phenyl group substituted with a linear or branched alkyl group having 7 to 12 carbon atoms, and n represents the same as above. Polyoxyethylene phosphate ester-based interface represented by The use of sex, or a salt thereof, when used in particular dilution with water, the preferred because of the excellent cleaning property improving effect. Examples of such salts include metal salts such as sodium salts and potassium salts, ammonium salts, and alkanolamine salts.

  The component (F) is not particularly limited as long as it is a polyoxyalkylene amine surfactant, and known components can be used. Among these, general formula (9): from the viewpoints of cleanability, environmental characteristics, and flammability

（式中、Ｒ^９ は水素原子または炭素数１〜２２の直鎖もしくは分岐鎖のアルキル基またはアルケニル基を示し、Ｚは水素原子または炭素数１〜４の直鎖もしくは分岐鎖のアルキル基またはアシル基を示し、ｐは１〜１５、ｑは０〜１５の整数を示す。）で表されるポリオキシエチレンアミン系界面活性剤を用いることが好ましい。これらのなかでもＲ^９ が炭素数８〜１８の直鎖もしくは分岐鎖のアルキル基またはアルケニル基、Ｚが水素原子、ｐ＋ｑが２〜１５の整数であるポリオキシエチレンアミン系界面活性剤とすることで、特に水で希釈して使用する際に、優れた洗浄性向上効果があるため好ましい。

(Wherein R ⁹ represents a hydrogen atom or a linear or branched alkyl group or alkenyl group having 1 to 22 carbon atoms, Z represents a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms, or It is preferable to use a polyoxyethylene amine surfactant represented by the following formula: an acyl group, p is an integer of 1 to 15, and q is an integer of 0 to 15. Among these, a polyoxyethylene amine surfactant in which R ⁹ is a linear or branched alkyl or alkenyl group having 8 to 18 carbon atoms, Z is a hydrogen atom, and p + q is an integer of 2 to 15 is used. In particular, when diluted with water and used, it is preferable because it has an excellent cleaning effect.

When these components (D) to (F) are used, the amount used is not particularly limited, but the component (D) is usually about 0.1 to 60% by weight of the detergent composition, preferably 1 It is good to contain -30% by weight. If the amount is less than 0.1% by weight, the rinsing property at the time of rinsing with water tends to be remarkably lowered. If the amount exceeds 60% by weight, the content of the component (C) is relatively reduced and the detergency tends to be lowered. is there. (E) It is good to contain a component normally about 0.1 to 60 weight% of a cleaning composition, Preferably it is 0.5 to 10 weight%. If it is less than 0.1% by weight, the effect of improving detergency when diluted with water is low, and if it exceeds 60% by weight, not only will it be added excessively but the effect will not be improved. May occur, which is not preferable. (F) It is good to contain a component normally about 0.1 to 60 weight% of a cleaning composition, Preferably it is 0.5 to 10 weight%. If it is less than 0.1% by weight, the effect of improving detergency when diluted with water is low, and if it exceeds 60% by weight, not only will it be added excessively but the effect will not be improved, but rather corrosion on the object to be cleaned, etc. It is not preferable because of the influence of. In addition, although (D)-(F) component may add any one component independently and may use it in combination of 2 or more components, (D)-(F) all components were added. In this case, it is preferable because the cleaning property is improved.

The cleaning composition of the present invention comprises the components (A) to (C) as essential components, and further contains components (D) to (F) as necessary, but further contains water. Since the safety can be improved, for example, the flash point disappears, water can be added and used as an aqueous solution. In such a case, the concentration of the cleaning composition is usually adjusted to be about 10% by weight or more. From the viewpoint of detergency, it is preferable that the concentration of the detergent composition is about 50 to 98% by weight.

In addition, the pH in particular when using the cleaning composition of this invention as aqueous solution is although it does not restrict | limit, When a cleaning composition is made into 5 weight% aqueous solution, it will show about 5.5-8.0. It is preferable to prepare it in such a manner that the object to be cleaned is not affected.

  The cleaning composition of the present invention exhibits good cleaning properties and anti-discoloration effect in cleaning of tin-containing alloy parts. Specific examples of the tin-containing alloy include bronze (copper-tin alloy), phosphor bronze (copper-tin-phosphorus alloy), eutectic solder alloy (tin-lead alloy), and lead-free solder alloy (tin- Silver-copper alloy, etc.). Among these, particularly when used for a copper alloy containing tin as a tin-containing alloy, it exhibits high detergency and anti-discoloration effect.

  Furthermore, additives, such as an antifoamer, a rust inhibitor, and antioxidant, can be mix | blended with the cleaning composition of this invention as needed. The amount of the additive used is about 0.1% or less with respect to the cleaning agent.

  In cleaning an object to be cleaned using the cleaning composition of the present invention, various cleaning methods can be employed. In the following, as a general cleaning method, the rosin flux on the electronic component is contacted. explain. That is, a method of directly immersing and cleaning an electronic component in a cleaning composition, a method of flushing the aqueous solution using a spray device, or a method of brushing by a mechanical means may be appropriately selected and employed. it can. When cleaning a flip chip mounting substrate, the cleaning agent must be passed through a gap of 50 μm or less, and cleaning is performed using a direct pass cleaning device (trade name, Japanese Patent No. 2621800, manufactured by Arakawa Chemical Industries, Ltd.). Is the best.

  In addition, the conditions for applying the cleaning composition may be appropriately selected depending on the concentration of the cleaning component in the cleaning composition, the use ratio of the component, the type of flux to be removed, and the like, and should generally be removed. The cleaning agent is brought into contact with the flux at a temperature and time effective to clean and remove the flux. The temperature at the time of use of a cleaning composition is about 20 degreeC to about 80 degreeC. This is because the solubility of the flux deteriorates when the use temperature is lower than 20 ° C., and when the temperature is higher than 80 ° C., cleaning becomes impossible due to evaporation of moisture and the like. Therefore, it is usually preferable to set the temperature to about 50 to 70 ° C. When removing the flux on the electronic component by, for example, the dipping method at a temperature of about 60 ° C., it is generally good if the electronic component having the solder flux is immersed in the cleaning composition of the present invention for about 1 to 20 minutes. Can be removed.

  The electronic component from which the flux has been removed in this way is subjected to a pre-rinsing process and a water rinse process for the final rinsing process after the cleaning with the cleaning composition to completely remove the remaining cleaning composition. Remove. Moreover, in this invention, you may use the water rinse agent of patent document 3 as needed by the kind etc. of an alloy. By such water washing treatment, the cleanliness of the substrate becomes very high.

  EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in more detail, this invention is not limited only to these Examples. In addition, the part and% of each example are a basis of weight.

  The cleaning agents having the compositions shown in Table 1 below, Examples 1 to 8 and Comparative Examples 1 and 2 were prepared.

In Table 1, the component (A) is an organic carboxylate represented by the general formula (1) or (2), a1 represents tin octylate, and a2 represents tin oleate. Component (B) is a nitrogen-based heterocyclic compound, b1 represents benzotriazole, and b2 represents 1-methylbenzotriazole. Component (C) is an organic solvent, c1 represents diethylene glycol monobutyl ether, and c2 represents 1,3-dimethylimidazolidinone. Component (D) is a nonionic surfactant, d is a polyethylene glycol alkyl ether type nonionic surfactant (Daiichi Kogyo Seiyaku Co., Ltd., trade name “Neugen ET-135”, in general formula (6) R ⁶ is a branched alkyl group having 12 to 14 carbon atoms, and m is 9. Component (E) is a polyoxyalkylene phosphate ester surfactant, e is a polyoxyethylene alkyl ether phosphate monoester (in formula (7), R ⁷ is a linear alkyl group having 12 carbon atoms, n 16 and X is a hydroxyl group). Component (F) is a polyoxyalkyleneamine surfactant, f is a polyoxyethylene alkylamine (in formula (9), R ⁹ is a linear alkyl group having 12 carbon atoms, p + q is 10, Z is a hydrogen atom That is).

  Various detergent compositions obtained in Examples and Comparative Examples were subjected to the following tests.

  Copper alloy NB109 (manufactured by Nippon Bell Parts Co., Ltd., composition Cu / Ni / Sn / P = 98.1 / 1.0 / 0.9 / 0) on which the diode is mounted by solder (tin / lead = 5/95 solder) .05) Using a direct pass cleaning device (Arakawa Chemical Industries, Ltd.), the lead frame manufactured was cleaned with the cleaning agents of Examples 1 to 8 and Comparative Examples 1 and 2 at 50 ° C. for 4 minutes, Next, after rinsing twice for 4 minutes each at 30 ° C. with a water rinsing agent described in Patent Document 3 (trade name “Pine Alpha ST-700BR”, 0.1% aqueous solution, manufactured by Arakawa Chemical Industries, Ltd.) Hot air drying was performed at 60 ° C. for 5 minutes. About the to-be-cleaned object obtained by the said washing | cleaning, (1) Detergency (Flux removal degree), (2) Cleanliness degree, (3) Surface discoloration degree was evaluated.

(1) Detergency (degree of flux removal)
The degree of flux removal of the solder mounting portion was visually determined using an optical microscope (50 times, manufactured by Keyence Corporation, trade name “VH-8000”) based on the following criteria. The results are shown in Table 2.
○: Can be removed satisfactorily. Δ: Some remaining. X It remains quite.

(2) Cleanliness The cleanliness (residual ion concentration) of the lead frame after washing and drying was measured using an omega meter 600-RC (manufactured by Alpha Metals). The results are shown in Table 2.

(3) Surface discoloration The lead frame surface discoloration after washing and drying was visually determined based on the following criteria. The results are shown in Table 2.
○: No discoloration. Δ: Some discoloration and spots are observed on the surface of the lead frame. X: The lead frame surface is severely discolored.

  The said detergent composition can be used for washing | cleaning of the components made from a tin containing alloy by which high cleanliness is requested | required.

Claims (13)

(A) the general formula _{^{(1) :( R 1 -COO)}} h M 1 ( wherein, ^{R 1} represents an alkyl group or alkenyl group having 1 to 18 carbon atoms having 1 to 18 carbon atoms, ^{M 1} is a tin atom, h represents 2). A cleaning composition for parts made of tin-containing alloy containing an organic carboxylate represented by (2), (B) a benzotriazole derivative and (C) an organic solvent as active ingredients. (C) The organic solvent is represented by the general formula (5): R ^Three O- (CH ₂ CHR ^Four O) _k -R ^Five (Wherein R ^Three Is a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, R ^Four Is a linear or branched alkyl group having 1 to 5 carbon atoms, R ^Five Represents a hydrogen atom or a methyl group, and k represents an integer of 2 to 4. The cleaning composition of Claim 1 containing at least 1 sort (s) of glycol ethers represented by this. Furthermore, it comprises at least one selected from the group consisting of (D) nonionic surfactant, (E) polyoxyalkylene phosphate ester surfactant and (F) polyoxyalkyleneamine surfactant. The cleaning composition according to 1 or 2. (D) The nonionic surfactant is represented by the general formula (6): R ⁶ O— (CH ₂ CH ₂ O) _m —H (wherein R ⁶ is a linear or branched alkyl having 6 to 20 carbon atoms. Group, phenyl group, or phenyl group substituted with a C 7-12 linear or branched alkyl group, m is an integer of 2-20. The cleaning composition according to claim 3 , which is an activator. (E) Polyoxyalkylene phosphate-based surfactant is represented by the general formula (7): R ⁷ O— (CH ₂ CH ₂ O) _n —PO (OH) X (wherein R ⁷ has 5 to 5 carbon atoms) 20 a linear or branched alkyl group, a phenyl group, or a phenyl group substituted with a linear or branched alkyl group having 7 to 12 carbon atoms, n is an integer of 0 to 20, X is a hydroxyl group or general Formula (8): R ⁸ O— (CH ₂ CH ₂ O) _n — (wherein R ⁸ is a linear or branched alkyl group having 5 to 20 carbon atoms, a phenyl group, or having 7 to 12 carbon atoms. A phenyl group substituted with a linear or branched alkyl group, n is the same as defined above.)) Or a polyoxyethylene phosphate ester surfactant represented by The cleaning composition according to claim 3 or 4 , which is a salt. The (F) polyoxyalkyleneamine-based surfactant has the general formula (9):

(Wherein R ⁹ represents a hydrogen atom or a linear or branched alkyl group or alkenyl group having 1 to 22 carbon atoms, Z represents a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms, or The cleaning composition according to any one of claims 3 to 5, which is a polyoxyethylene amine surfactant represented by an acyl group, p is an integer of 1 to 15, and q is an integer of 0 to 15. object. Furthermore, the cleaning composition in any one of Claims 1-6 formed by containing water. (A) 0.001 to 0.45 wt% of the organic carboxylate, (B) benzotriazole derivative, 0.001 to 1 wt% of the cleaning composition, and (C) an organic solvent. The cleaning composition according to claim 1, comprising 40 to 99% by weight of the cleaning composition. (D) Nonionic surfactant is 0.1 to 60% by weight of the detergent composition, (E) Polyoxyalkylene phosphate-based surfactant is 0.1 to 60% by weight of the detergent composition. The cleaning composition according to any one of claims 3 to 8, further comprising (F) 0.1 to 60% by weight of the polyoxyalkyleneamine-based surfactant in the cleaning composition. The cleaning composition according to any one of claims 1 to 9, wherein the pH of the 5 wt% aqueous solution is 5.5 to 8.0. The cleaning composition according to any one of claims 1 to 10, wherein the tin-containing alloy part is a copper alloy part containing tin. A cleaning method comprising: cleaning a tin-containing alloy part using the cleaning composition according to any one of claims 1 to 11. The cleaning method according to claim 12, wherein the tin-containing alloy part is a copper alloy part containing tin.