JP3527902B2 - Semiconductor element storage package and semiconductor device - Google Patents

Semiconductor element storage package and semiconductor device

Info

Publication number
JP3527902B2
JP3527902B2 JP2001296630A JP2001296630A JP3527902B2 JP 3527902 B2 JP3527902 B2 JP 3527902B2 JP 2001296630 A JP2001296630 A JP 2001296630A JP 2001296630 A JP2001296630 A JP 2001296630A JP 3527902 B2 JP3527902 B2 JP 3527902B2
Authority
JP
Japan
Prior art keywords
semiconductor element
metal plate
mounting portion
hole
ceramic substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001296630A
Other languages
Japanese (ja)
Other versions
JP2003100975A (en
Inventor
宗裕 上村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001296630A priority Critical patent/JP3527902B2/en
Publication of JP2003100975A publication Critical patent/JP2003100975A/en
Application granted granted Critical
Publication of JP3527902B2 publication Critical patent/JP3527902B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Led Device Packages (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体素子を収容
するための半導体素子収納用パッケージと、この半導体
素子収納用パッケージに半導体素子を収納した半導体装
置に関し、特に外部装置の放熱板等への実装構造を改良
したものに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor element housing package for housing a semiconductor element, and a semiconductor device in which a semiconductor element is housed in the semiconductor element housing package, and more particularly to a heat sink or the like of an external device. It relates to an improved packaging structure.

【0002】[0002]

【従来の技術】従来の半導体素子を収容するための半導
体素子収納用パッケージ(以下、半導体パッケージとい
う)Aを図3(a)に平面図、(b)に(a)のH−
H’線における断面図で示す。同図は、底板をなす金属
板の上面の全面にセラミック基板が接合されている場合
を示し、これらの図において、11は略長方形の金属
板、11Aは金属板の長辺、11Bは金属板11の短
辺、12はセラミック基板、12aは半導体素子の載置
部、13は枠体、14は入出力端子、15は蓋体であ
る。これら金属板11、セラミック基板12、枠体1
3、入出力端子14、蓋体15とで内部に半導体素子C
を収容する容器が基本的に構成される。
2. Description of the Related Art A conventional semiconductor device housing package (hereinafter referred to as a semiconductor package) A for housing a semiconductor device is shown in FIG. 3 (a) in a plan view and in FIG. 3 (b) at H-.
It is shown in a sectional view taken along the line H ′. The figure shows a case where a ceramic substrate is bonded to the entire upper surface of a metal plate which constitutes a bottom plate. In these figures, 11 is a substantially rectangular metal plate, 11A is a long side of the metal plate, and 11B is a metal plate. Reference numeral 11 is a short side, 12 is a ceramic substrate, 12a is a semiconductor element mounting portion, 13 is a frame, 14 is an input / output terminal, and 15 is a lid. These metal plate 11, ceramic substrate 12, frame 1
3, the input / output terminal 14, and the lid body 15 internally form the semiconductor element C.
A container for housing is basically configured.

【0003】金属板11は、銅(Cu)−タングステン
(W)合金や、鉄(Fe)−ニッケル(Ni)−コバル
ト(Co)合金等の金属材料からなり、上面にアルミナ
(Al23)質焼結体やムライト(3Al23・2Si
23)質焼結体等からなるセラミック基板12が取着さ
れ、このセラミック基板12上に半導体素子Cを載置す
る載置部が12aが設けられる。金属板11は、その両
短辺11Bの4つの端部に、外側に延出して設けられた
張出部に貫通孔または切欠きから成るネジ孔11bが設
けられたネジ取付部11aを有する。
The metal plate 11 is made of a metal material such as a copper (Cu) -tungsten (W) alloy or an iron (Fe) -nickel (Ni) -cobalt (Co) alloy, and has an upper surface made of alumina (Al 2 O 3). ) quality sintered body and mullite (3Al 2 O 3 · 2Si
A ceramic substrate 12 made of a 2 O 3 ) sintered material or the like is attached, and a mounting portion 12a on which the semiconductor element C is mounted is provided on the ceramic substrate 12. The metal plate 11 has screw attachment portions 11a at four end portions of both short sides 11B, each of which is provided with an outwardly extending protrusion and a screw hole 11b formed of a through hole or a notch.

【0004】金属板11は、半導体素子Cが載置部12
aに載置固定され作動した際に、半導体素子Cが発する
熱を効率よく外部電気回路基板(図示せず)の放熱板D
に伝達する所謂熱伝達媒体として機能し、またネジ取付
部11aのネジ孔11bにネジを挿入し放熱板Dにネジ
止めして固定される。
On the metal plate 11, the semiconductor element C is placed on the mounting portion 12.
The heat generated by the semiconductor element C when it is mounted and fixed on a and operates is efficiently the heat dissipation plate D of the external electric circuit board (not shown).
It functions as a so-called heat transfer medium that transfers heat to the heat sink, and is fixed by screwing the screw into the screw hole 11b of the screw mounting portion 11a and fixing the screw to the heat dissipation plate D.

【0005】セラミック基板12の上面には、Fe−N
i−Co合金やFe−Ni合金などの金属材料からな
り、側部に貫通孔または切欠きからなる入出力端子14
の取付部13aを有する枠体13が、載置部12aを囲
繞するように銀(Ag)ロウなどのロウ材で接合され
る。
On the upper surface of the ceramic substrate 12, Fe--N
An input / output terminal 14 made of a metal material such as an i-Co alloy or an Fe-Ni alloy and having a through hole or a notch on a side portion.
The frame body 13 having the mounting portion 13a is joined by brazing material such as silver (Ag) brazing so as to surround the mounting portion 12a.

【0006】また、取付部13aの内周面には半導体素
子Cと外部電気回路基板とで高周波信号の入出力を行う
入出力端子14が取着される。尚、入出力端子14に
は、高周波信号が伝送されるメタライズ層14aが形成
されている。
An input / output terminal 14 for inputting / outputting a high frequency signal between the semiconductor element C and the external electric circuit board is attached to the inner peripheral surface of the mounting portion 13a. The input / output terminal 14 is provided with a metallization layer 14a for transmitting high frequency signals.

【0007】このような構成の半導体パッケージAに半
導体素子Cを収容しセラミック基板12上に載置固定し
た後、半導体素子Cとメタライズ層14aとをボンディ
ングワイヤ(図示せず)で電気的に接続し、蓋体15に
より半導体素子Cを気密に封止することにより、製品と
しての半導体装置となる。尚、半導体素子Cは、外部電
気回路基板から入力される高周波信号により作動する。
After the semiconductor element C is housed in the semiconductor package A having such a structure and mounted and fixed on the ceramic substrate 12, the semiconductor element C and the metallized layer 14a are electrically connected by a bonding wire (not shown). Then, the semiconductor element C is hermetically sealed by the lid body 15 to form a semiconductor device as a product. The semiconductor element C operates by the high frequency signal input from the external electric circuit board.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、半導体
パッケージAのネジ取付部11aが金属板11の両短辺
11Bの両端部付近から外側に延設されており、金属板
11がネジ孔11bにネジを挿入して外部電気回路基板
にネジ止めされている。そのため、金属板11は外部電
気回路基板を構成するアルミニウム(Al)などの金属
からなる放熱板Dと一体化されており、半導体装置の作
動時に半導体素子Cから発する熱が金属板11を介して
放熱板Dに伝達した場合、放熱板Dの熱膨張係数が20
×10-6/℃以上と大きいため、Cu−W合金,Fe−
Ni−Co合金等のセラミックスに近似する熱膨張係数
(6×10-6〜7×10-6/℃)を有する材料から成る
金属板11を用いた半導体装置との間で大きな熱膨張差
が発生する。
However, the screw mounting portion 11a of the semiconductor package A is extended outward from the vicinity of both ends of both short sides 11B of the metal plate 11, and the metal plate 11 is screwed into the screw hole 11b. Inserted and screwed to the external electrical circuit board. Therefore, the metal plate 11 is integrated with the heat dissipation plate D made of a metal such as aluminum (Al) forming the external electric circuit board, and the heat generated from the semiconductor element C during the operation of the semiconductor device is transmitted through the metal plate 11. When transmitted to the heat sink D, the thermal expansion coefficient of the heat sink D is 20
Since it is as large as × 10 -6 / ° C or more, Cu-W alloy, Fe
There is a large difference in thermal expansion between the semiconductor device using the metal plate 11 made of a material having a thermal expansion coefficient (6 × 10 −6 to 7 × 10 −6 / ° C.) close to that of ceramics such as Ni—Co alloy. Occur.

【0009】このとき、放熱板Dに金属板11がネジ取
付部11aで強固に固定されているため、金属板11に
は放熱板Dの熱膨張に伴なってネジ取付部11aが長辺
11Aに略平行な方向で外側方向K,K1(図3)に引
張られる力が作用し、ネジ取付部11aは外側方向K,
K1に伸びて若干移動することとなる。このネジ取付部
11aの動きに伴なって金属板11に大きな引張り応力
が作用し、金属板11も伸びてしまう。その結果、金属
板11上のセラミック基板12にクラックが発生するこ
とがあり、このクラックによりセラミック基板12に形
成された配線導体に断線が生じたり、またセラミック基
板12上に載置固定されている半導体素子Cにクラック
を生じさせるという問題点があった。
At this time, since the metal plate 11 is firmly fixed to the heat radiation plate D by the screw mounting portion 11a, the screw mounting portion 11a has a long side 11A along with the thermal expansion of the heat radiation plate D on the metal plate 11. The pulling force acts in the outer direction K, K1 (FIG. 3) in a direction substantially parallel to the outer direction K, and the screw mounting portion 11a moves in the outer direction K, K1.
It will extend to K1 and move a little. A large tensile stress acts on the metal plate 11 along with the movement of the screw mounting portion 11a, and the metal plate 11 also extends. As a result, a crack may occur in the ceramic substrate 12 on the metal plate 11, and the crack may cause a disconnection in the wiring conductor formed on the ceramic substrate 12, or the ceramic substrate 12 may be mounted and fixed on the ceramic substrate 12. There is a problem that the semiconductor element C is cracked.

【0010】なお、放熱板DとしてAl板を用いるの
は、Al板が極めて軽量であるとともに大きな熱伝導率
を有し、また比較的大きな剛性を有しているためであ
り、Cuなどに比べて上記の点で総合的に優れているた
めである。
The Al plate is used as the heat dissipation plate D because the Al plate is extremely lightweight, has a large thermal conductivity, and has a relatively large rigidity. This is because the above points are comprehensively superior.

【0011】また、セラミック基板12が枠体13の内
側に取着され、枠体13が金属板11の上面に直接接合
されている場合、枠体13の取付部13aに嵌着されて
いる入出力端子14に、半導体装置の作動時に上記のよ
うに引張り応力が作用し、入出力端子14にクラックが
発生して半導体装置の気密性が損なわれるという不具合
が発生していた。
Further, when the ceramic substrate 12 is attached to the inside of the frame body 13 and the frame body 13 is directly joined to the upper surface of the metal plate 11, it is fitted in the mounting portion 13a of the frame body 13. As described above, the tensile stress acts on the output terminal 14 during the operation of the semiconductor device, and the input / output terminal 14 is cracked to impair the hermeticity of the semiconductor device.

【0012】従って、本発明は上記問題点に鑑み完成さ
れたものであり、その目的は、外部電気回路基板に半導
体装置が取着され作動する際に半導体装置に大きな引張
り応力が作用しないようにすることにより、半導体装置
の金属板上面に取着されているセラミック基板や枠体に
嵌着されている入出力端子の破壊を有効に防止し、これ
により半導体素子を長期に亘り正常かつ安定に作動させ
ることにある。
Therefore, the present invention has been completed in view of the above problems, and an object thereof is to prevent a large tensile stress from acting on a semiconductor device when the semiconductor device is attached to an external electric circuit board and operated. By doing so, it is possible to effectively prevent the destruction of the ceramic substrate attached to the upper surface of the metal plate of the semiconductor device or the input / output terminals fitted to the frame body, and to keep the semiconductor element normal and stable for a long period of time. To activate it.

【0013】[0013]

【課題を解決するための手段】本発明の半導体パッケー
ジは、略長方形であり、隅部に外側へ延出するように形
成された張出部に貫通孔が形成されて成るネジ取付部を
有する金属板と、該金属板の上面に下側主面が接合さ
れ、上側主面に半導体素子を載置する載置部が設けられ
たセラミック基板と、前記金属板または前記セラミック
基板の上面の外周部に前記載置部を囲繞するように取着
され、側部に貫通孔または切欠き部から成る入出力端子
の取付部が形成された枠体と、前記取付部に嵌着された
入出力端子とを具備した半導体素子収納用パッケージに
おいて、前記ネジ取付部は、前記金属板の各長辺の両端
に短辺に平行な方向に外側へ延出するように形成された
前記張出部の先端部に前記貫通孔が形成されて成り、か
つ前記張出部の前記短辺側の辺に前記長辺から前記貫通
孔近傍までを、前記貫通孔近傍に角部が形成されるよう
に切り欠いて成る切欠き部が形成されており、該切欠き
部は、前記貫通孔近傍の角部が45〜90°であり、前
記短辺に平行な内側の部分の長さが1〜5mmであるこ
とを特徴とする。
A semiconductor package of the present invention has a substantially rectangular shape, and has a screw mounting portion having a through hole formed in an overhanging portion formed to extend outward at a corner. A metal plate, a ceramic substrate having a lower main surface bonded to the upper surface of the metal plate, and a mounting portion for mounting a semiconductor element on the upper main surface; and an outer periphery of the metal plate or the upper surface of the ceramic substrate. A frame body attached to the mounting portion so as to surround the mounting portion, and a side portion having a mounting portion for an input / output terminal formed of a through hole or a cutout portion; and an input / output fitted to the mounting portion. In the package for storing a semiconductor element including a terminal, the screw mounting portion is provided at both ends of each long side of the metal plate so as to extend outward in a direction parallel to the short side. The through hole is formed at the tip portion, and On the side on the side, a notch is formed by cutting out from the long side to the vicinity of the through hole so that a corner is formed in the vicinity of the through hole, and the notch is the through hole. The corner portion near the hole is 45 to 90 °, and the length of the inner portion parallel to the short side is 1 to 5 mm.

【0014】本発明は、上記の構成により、半導体パッ
ケージに半導体素子を収納して半導体装置となし、この
半導体装置を外部電気回路基板の放熱板にネジ止め固定
して半導体装置を作動させた際に、半導体素子が発する
熱により放熱板が熱膨張して半導体装置が引張り応力を
受けて、セラミック基板や半導体素子が破壊されるのを
有効に防止できる。また、枠体が金属板上に直接取着さ
れている場合は、枠体の取付部に嵌着された入出力端子
の破壊を防止することができる。その結果、半導体パッ
ケージの気密性が損なわれることがなく、また半導体素
子を長期にわたり正常かつ安定に作動させることができ
る。
According to the present invention, when the semiconductor element is housed in the semiconductor package to form a semiconductor device having the above-described structure, and the semiconductor device is operated by screwing and fixing the semiconductor device to the heat dissipation plate of the external electric circuit board. In addition, it is possible to effectively prevent the heat dissipation plate from being thermally expanded by the heat generated by the semiconductor element and the semiconductor device to receive a tensile stress, thereby destroying the ceramic substrate and the semiconductor element. Further, when the frame body is directly attached to the metal plate, it is possible to prevent breakage of the input / output terminal fitted to the attachment portion of the frame body. As a result, the hermeticity of the semiconductor package is not impaired, and the semiconductor element can be operated normally and stably for a long period of time.

【0015】本発明の半導体装置は、上記本発明の半導
体素子収納用パッケージと、前記載置部に載置固定され
前記入出力端子に電気的に接続された半導体素子と、前
記枠体の上面に接合された蓋体とを具備したことを特徴
とする。
The semiconductor device of the present invention comprises the above-mentioned package for housing a semiconductor element of the present invention, a semiconductor element mounted and fixed on the mounting portion and electrically connected to the input / output terminals, and an upper surface of the frame body. And a lid bonded to the.

【0016】本発明は、上記の構成により、半導体素子
にクラックや酸化腐食を発生させず、半導体素子を長期
にわたり正常かつ安定に作動させることができる信頼性
の高い半導体装置を提供することができる。
The present invention can provide a highly reliable semiconductor device capable of operating the semiconductor element normally and stably for a long period of time without causing cracks or oxidative corrosion in the semiconductor element with the above structure. .

【0017】[0017]

【発明の実施の形態】本発明の半導体パッケージおよび
半導体装置について下に詳細に説明する。図1(a)は
本発明の半導体パッケージA1について実施の形態の一
例を示す平面図であり、同図ではセラミック基板が金属
板の上面の全面に接合されている場合を示す。勿論、本
発明では、金属板よりもセラミック基板が小さく、金属
板上面の外周部に枠体が接合されていてもよい。図1
(b)は図1のG−G’線における断面図である。ま
た、図2は図1の要部の拡大平面図である。
DETAILED DESCRIPTION OF THE INVENTION A semiconductor package and a semiconductor device of the present invention will be described in detail below. FIG. 1A is a plan view showing an example of an embodiment of a semiconductor package A1 of the present invention. In the figure, a case where a ceramic substrate is bonded to the entire upper surface of a metal plate is shown. Of course, in the present invention, the ceramic substrate may be smaller than the metal plate, and the frame body may be joined to the outer peripheral portion of the upper surface of the metal plate. Figure 1
FIG. 2B is a sectional view taken along the line GG ′ in FIG. 1. 2 is an enlarged plan view of the main part of FIG.

【0018】これらの図において、1は略長方形の金属
板、1Aは金属板1の長辺、1Bは金属板1の短辺、1
aはネジ取付部、1bは貫通孔から成るネジ孔である。
また、1cはネジ取付部1aの先端部、1dはネジ取付
部1aの基部、1fは切欠き部Fのネジ孔1b近傍の角
部、Fは切欠き部である。また、2はセラミック基板、
3は枠体、4は入出力端子、5は蓋体である。これら金
属板1、セラミック基板2、枠体3、入出力端子4、蓋
体5とで、内部に半導体素子Cを気密に収容する容器が
基本的に構成される。
In these figures, 1 is a substantially rectangular metal plate, 1A is the long side of the metal plate 1, 1B is the short side of the metal plate 1, 1
Reference numeral a is a screw mounting portion, and reference numeral 1b is a screw hole formed of a through hole.
Further, 1c is a tip portion of the screw mounting portion 1a, 1d is a base portion of the screw mounting portion 1a, 1f is a corner portion of the cutout portion F near the screw hole 1b, and F is a cutout portion. 2 is a ceramic substrate,
3 is a frame, 4 is an input / output terminal, and 5 is a lid. The metal plate 1, the ceramic substrate 2, the frame 3, the input / output terminals 4, and the lid 5 basically constitute a container for hermetically containing the semiconductor element C therein.

【0019】本発明の半導体パッケージA1は基本的に
以下のような構成である。即ち、略長方形であり、隅部
に外側へ延出するように形成された張出部に貫通孔が形
成されて成るネジ取付部1aを有する金属板1と、金属
板1の上面に下側主面が接合され、上側主面に半導体素
子Cを載置する載置部2aが設けられたセラミック基板
2と、金属板1またはセラミック基板2の上面の外周部
に載置部2aを囲繞するように取着され、側部に貫通孔
または切欠き部から成る入出力端子4の取付部3aが形
成された枠体3と、取付部3aに嵌着された入出力端子
4とを具備した構成である。
The semiconductor package A1 of the present invention basically has the following structure. That is, a metal plate 1 having a substantially rectangular shape and a screw mounting portion 1a formed by forming a through hole in an overhanging portion formed so as to extend to the outside, and a metal plate 1 on the upper surface of the metal plate 1 A ceramic substrate 2 having main surfaces joined to each other and a mounting portion 2a on which the semiconductor element C is mounted is provided on the upper main surface, and the mounting portion 2a is surrounded by the metal plate 1 or the outer peripheral portion of the upper surface of the ceramic substrate 2. The frame body 3 is attached in such a manner that the mounting portion 3a of the input / output terminal 4 formed of a through hole or a cutout portion is formed on the side portion, and the input / output terminal 4 fitted in the mounting portion 3a. It is a composition.

【0020】本発明の金属板1は、Cu−W合金やFe
−Ni−Co合金などの金属材料からなり、上面にセラ
ミック基板2が設けられ、このセラミック基板2上に半
導体素子Cを載置する載置部2aが設けられるととも
に、載置部2aを囲むように取付部3aを側部に有する
枠体3がAgロウなどのロウ材を介して取着されてい
る。金属板1およびセラミック基板2は、半導体素子C
が載置部2aの上面に載置固定されて作動した際に、半
導体素子Cが発する熱を効率よく外部電気回路基板の金
属製の放熱板Dに伝達する伝熱達媒体として機能する。
また、金属板1は、そのネジ取付部1aのネジ孔1bに
ネジを挿入し外部電気回路基板にネジ止めして固定され
る。
The metal plate 1 of the present invention is made of Cu-W alloy or Fe.
A ceramic substrate 2 made of a metal material such as —Ni—Co alloy is provided on the upper surface, a mounting portion 2a for mounting the semiconductor element C is provided on the ceramic substrate 2, and the mounting portion 2a is surrounded. The frame 3 having the mounting portion 3a on its side is attached via a brazing material such as Ag brazing. The metal plate 1 and the ceramic substrate 2 are semiconductor elements C
Functions as a heat transfer medium that efficiently transfers the heat generated by the semiconductor element C to the metal radiator plate D of the external electric circuit board when the element is mounted and fixed on the upper surface of the mounting portion 2a and operated.
Further, the metal plate 1 is fixed by inserting a screw into the screw hole 1b of the screw mounting portion 1a and screwing it to the external electric circuit board.

【0021】また金属板1は、例えばFe−Ni−Co
合金からなる場合、この合金のインゴットに圧延加工や
プレス加工などの金属加工を施すことにより所定の形状
に作製される。このとき、表面に0.5〜9μmの厚さ
のNi層や0.5〜5μmの厚さの金(Au)層などの
金属層をメッキ法などの金属膜形成方法により被着させ
ておくと良い。
The metal plate 1 is made of, for example, Fe-Ni-Co.
When it is made of an alloy, it is formed into a predetermined shape by subjecting an ingot of this alloy to metal working such as rolling and pressing. At this time, a metal layer such as a Ni layer having a thickness of 0.5 to 9 μm or a gold (Au) layer having a thickness of 0.5 to 5 μm is deposited on the surface by a metal film forming method such as a plating method. And good.

【0022】本発明においては、図2に示すように、ネ
ジ取付部1aは、金属板1の各長辺1Aの両端に短辺1
Bに平行な方向に外側へ延出するように形成された張出
部の先端部1cに貫通孔(ネジ孔1b)が形成されて成
り、かつ張出部の短辺1B側の辺に長辺1Aから貫通孔
近傍までを切り欠いて成る略L字状の切欠き部Fが形成
されており、切欠き部Fは、貫通孔近傍の角部1fの角
度θが45〜90°であり、短辺1Bに平行な方向の長
さFaが1〜5mmである。
In the present invention, as shown in FIG. 2, the screw mounting portion 1a has a short side 1 at each end of each long side 1A of the metal plate 1.
A through hole (screw hole 1b) is formed in the tip end portion 1c of the overhanging portion formed to extend outward in a direction parallel to B, and a long side is formed on the short side 1B side of the overhanging portion. A substantially L-shaped notch F formed by notching from the side 1A to the vicinity of the through hole is formed, and the notch F has an angle θ of a corner 1f near the through hole of 45 to 90 °. The length Fa in the direction parallel to the short side 1B is 1 to 5 mm.

【0023】本発明の半導体パッケージAでは、上記の
構成としているため、放熱板Dの熱膨張とともに放熱板
Dに固定されたネジ取付部1aの先端部1cが、長辺1
Aに略平行な方向で外側方向Kに引っ張られるように動
くが、その際基部1dの先端部1c寄りの部分に角部1
fがあるため先端部1cの動きとともに角部1fが比較
的容易に若干開いて応力を緩和する。その結果、半導体
パッケージAに大きな引張り応力が作用しにくくなる。
Since the semiconductor package A of the present invention has the above-mentioned structure, the tip end portion 1c of the screw mounting portion 1a fixed to the heat dissipation plate D is aligned with the long side 1 due to the thermal expansion of the heat dissipation plate D.
It moves so as to be pulled in the outward direction K in a direction substantially parallel to A, but at that time, the corner portion 1 is formed in the portion of the base 1d near the tip 1c.
Since there is f, the corner portion 1f relatively easily opens slightly along with the movement of the tip portion 1c to relieve the stress. As a result, it becomes difficult for a large tensile stress to act on the semiconductor package A.

【0024】このように、先端部1cが外側方向Kに動
くに伴ない基部1dの先端部1c寄りの部分が比較的容
易に動くことができる。これは、角部1fに内部応力が
集中するが、角部1fの角度θが45〜90°であるた
め、外側方向Kに作用する引張り応力によって角部1f
が開きやすくなっているからである。これにより、角部
1fで基部1dと先端部1cの曲げに対する抵抗力が小
さくなって曲がりやすくなり、この曲りやすさにより角
部1fおよび先端部1cが応力を吸収する。その結果、
半導体パッケージA1に大きな引張り応力が作用せず、
よってセラミック基板2に引張り応力がほとんど作用す
ることがなくなる。
Thus, as the tip 1c moves in the outward direction K, the portion of the base 1d near the tip 1c can move relatively easily. This is because the internal stress concentrates on the corner portion 1f, but since the angle θ of the corner portion 1f is 45 to 90 °, the corner portion 1f is caused by the tensile stress acting in the outward direction K.
Is easier to open. As a result, the corner portion 1f has a smaller resistance to bending of the base portion 1d and the tip portion 1c and becomes easier to bend, and due to this bendability, the corner portion 1f and the tip portion 1c absorb stress. as a result,
Large tensile stress does not act on the semiconductor package A1,
Therefore, almost no tensile stress acts on the ceramic substrate 2.

【0025】そして、半導体素子Cの作動が停止して熱
が発生しなくなれば、ネジ取付部1aは伸びたバネが元
に戻るようにして加熱前の状態に戻り、このときも半導
体パッケージA1にほとんど応力を作用させることがな
い。即ち、本発明の半導体パッケージA1によれば、半
導体素子Cを収納して半導体装置となし、外部回路基板
の放熱板Dにネジ止めにより接合して作動させ発熱して
も、半導体パッケージA1に大きな応力がほとんど作用
しなくなる。
When the operation of the semiconductor element C is stopped and heat is no longer generated, the screw mounting portion 1a returns to the state before heating so that the stretched spring returns to the original state, and at this time, the semiconductor package A1 is also returned. Almost no stress is applied. That is, according to the semiconductor package A1 of the present invention, the semiconductor element C is housed to form a semiconductor device, and even if the semiconductor device C is joined to the heat dissipation plate D of the external circuit board by screwing and is operated to generate heat, the semiconductor package A1 is large. Almost no stress acts.

【0026】角部1fの角度θが90°を超える場合、
角部1fが開きにくくなる。そのため、半導体パッケー
ジA1に大きな引張り応力が作用し、セラミック基板2
や半導体素子Cにクラックが発生する場合がある。また
角度θが45°未満の場合、半導体装置の作動と停止が
繰り返された場合に角部1fに応力の過度な集中と緩和
が繰り返し発生して、その結果角部1fに亀裂が発生す
る。このため、半導体パッケージA1を強固に外部電気
回路装置に固定することができなくなる場合がある。
When the angle θ of the corner 1f exceeds 90 °,
The corner portion 1f becomes difficult to open. Therefore, a large tensile stress acts on the semiconductor package A1, and the ceramic substrate 2
In some cases, the semiconductor element C may be cracked. When the angle θ is less than 45 °, excessive concentration and relaxation of stress repeatedly occur in the corner portion 1f when the operation and stop of the semiconductor device are repeated, and as a result, cracks occur in the corner portion 1f. Therefore, it may not be possible to firmly fix the semiconductor package A1 to the external electric circuit device.

【0027】さらに、切欠き部Fの短辺1Bに平行な方
向の長さFa、即ち基部1dの長さは1〜5mmであ
り、また基部1dの幅は数mm程度である。長さFaが
1mm未満になると、角部1fの角度θが上記本発明の
範囲内であってもネジ取付部1aの剛性が適度に低下し
なくなる。従って、セラミック基板2にクラックが発生
する場合がある。また、長さFaが5mmを超える場
合、ネジ取付部1aで半導体パッケージA1を外部電気
回路基板の放熱板Dに強固にネジ止めにより固着するこ
とが困難になる。その結果、放熱効率が劣化し半導体素
子Cが熱破壊される場合がある。
Further, the length Fa of the notch F in the direction parallel to the short side 1B, that is, the length of the base 1d is 1 to 5 mm, and the width of the base 1d is about several mm. If the length Fa is less than 1 mm, the rigidity of the screw mounting portion 1a will not be appropriately reduced even if the angle θ of the corner portion 1f is within the range of the present invention. Therefore, cracks may occur in the ceramic substrate 2. Further, when the length Fa exceeds 5 mm, it becomes difficult to firmly fix the semiconductor package A1 to the heat dissipation plate D of the external electric circuit board by screwing the screw mounting portion 1a. As a result, the heat dissipation efficiency may deteriorate and the semiconductor element C may be thermally destroyed.

【0028】このようなネジ取付部1aを有する金属板
1上のセラミック基板2の上面には、Fe−Ni−Co
合金やFe−Ni合金などの金属材料からなり、側部に
貫通孔または切欠き部からなる入出力端子4の取付部3
aを有する枠体3が、載置部2aを囲繞するようにAg
ロウなどのロウ材で接合される。この枠体3は、例えば
Fe−Ni−Co合金からなる場合、金属板1と同様に
これらの合金のインゴットに圧延加工やプレス加工など
の金属加工を施すことにより所定の形状に作製される。
また、その表面には酸化腐食を防止するために、厚さ
0.5〜9μmのNi層や厚さ0.5〜5μmのAu層
などの金属層をメッキ法などの薄膜形成法で被着させて
おくと良い。
Fe-Ni-Co is formed on the upper surface of the ceramic substrate 2 on the metal plate 1 having the screw mounting portion 1a.
A mounting portion 3 for the input / output terminal 4, which is made of a metal material such as an alloy or Fe-Ni alloy and has a through hole or a cutout portion on its side.
The frame body 3 having a has Ag so as to surround the mounting portion 2a.
It is joined with a brazing material such as brazing. When the frame body 3 is made of, for example, an Fe—Ni—Co alloy, it is formed into a predetermined shape by subjecting the ingots of these alloys to metal working such as rolling and pressing similarly to the metal plate 1.
In order to prevent oxidative corrosion, a metal layer such as a Ni layer having a thickness of 0.5 to 9 μm or an Au layer having a thickness of 0.5 to 5 μm is deposited on the surface by a thin film forming method such as a plating method. It's good to let me.

【0029】また、取付部3aの内周面には、半導体素
子Cと外部電気回路基板との高周波信号の入出力を行う
入出力端子4がAgロウなどのロウ材で嵌着され取着さ
れる。なお、入出力端子4には高周波信号が伝送される
メタライズ層4aが形成される。
Further, the input / output terminal 4 for inputting / outputting a high frequency signal between the semiconductor element C and the external electric circuit board is fitted and attached to the inner peripheral surface of the mounting portion 3a with a brazing material such as Ag solder. It The input / output terminal 4 is provided with a metallization layer 4a for transmitting high frequency signals.

【0030】入出力端子4は、絶縁性のセラミック基板
に導電性のメタライズ層4aが被着されたものであり、
半導体パッケージA1の内部の気密性を保持する機能を
有するとともに、半導体パッケージA1と外部電気回路
基板との高周波信号の入出力を行う機能を有している。
なお、セラミック基板の材料は誘電率や熱膨張係数など
の特性に応じて、Al23セラミックスや窒化アルミニ
ウム(AlN)セラミックスなどのセラミックス材料か
ら選定される。
The input / output terminal 4 is composed of an insulative ceramic substrate and a conductive metallization layer 4a deposited thereon.
The semiconductor package A1 has a function of maintaining airtightness inside and a function of inputting / outputting a high frequency signal between the semiconductor package A1 and the external electric circuit board.
The material of the ceramic substrate is selected from ceramic materials such as Al 2 O 3 ceramics and aluminum nitride (AlN) ceramics according to characteristics such as dielectric constant and thermal expansion coefficient.

【0031】入出力端子4は、原料粉末に適当な有機バ
インダや溶剤などを添加混合しペースト状となし、この
ペーストをドクターブレード法やカレンダーロール法に
よって成形したセラミック基板となるセラミックグリー
ンシートに、W,モリブデン(Mo),マンガン(M
n)などの粉末に有機溶剤、溶媒を添加混合して得たメ
タライズ層4aとなる金属ペーストを、従来周知のスク
リーン印刷法により所望のパターン形状に印刷塗布し、
約1600℃の高温で焼結することにより作製される。
The input / output terminal 4 is made into a paste by adding and mixing an appropriate organic binder or solvent to the raw material powder, and this paste is formed into a ceramic green sheet which is a ceramic substrate formed by the doctor blade method or the calendar roll method. W, molybdenum (Mo), manganese (M
n) and the like, an organic solvent, and a metal paste to be the metallized layer 4a obtained by adding and mixing the solvent are printed and applied in a desired pattern shape by a conventionally known screen printing method,
It is made by sintering at a high temperature of about 1600 ° C.

【0032】また、メタライズ層4aの枠体3外側の上
面には、入出力端子4との接合を強固なものとするため
に、熱膨張係数が入出力端子4のセラミック基板に近似
した材料からなるリード端子(図示せず)がAgロウな
どのロウ材で接合される。例えば、入出力端子4のセラ
ミック基板がAl23セラミックスからなる場合、リー
ド端子はFe−Ni−Co合金やFe−Ni合金などの
金属材料からなるのがよく、熱膨張差による応力が発生
してリード端子が剥がれ落ちるなどの不具合が発生しに
くくなる。
On the upper surface of the metallized layer 4a outside the frame body 3, a material having a coefficient of thermal expansion similar to that of the ceramic substrate of the input / output terminal 4 is used in order to strengthen the bonding with the input / output terminal 4. The lead terminals (not shown) are joined with a brazing material such as Ag solder. For example, when the ceramic substrate of the input / output terminal 4 is made of Al 2 O 3 ceramics, the lead terminal is preferably made of a metal material such as Fe—Ni—Co alloy or Fe—Ni alloy, which causes stress due to the difference in thermal expansion. As a result, problems such as peeling off of lead terminals are less likely to occur.

【0033】入出力端子4が取着される枠体3の上面に
は、Fe−Ni−Co合金などからなる金属製の蓋体
5、またはAl23セラミックス,AlNセラミックス
などからなるセラミックス製の蓋体5が接合され、この
蓋体5により半導体素子Cを半導体パッケージA1の内
部に気密に封止する。
On the upper surface of the frame body 3 to which the input / output terminals 4 are attached, a metallic lid body 5 made of Fe-Ni-Co alloy or the like, or a ceramic body made of Al 2 O 3 ceramics, AlN ceramics or the like is used. The lid 5 is joined, and the lid 5 hermetically seals the semiconductor element C inside the semiconductor package A1.

【0034】半導体素子Cおよび枠体3はともにセラミ
ック基板2上に取着され、半導体素子Cの電極とセラミ
ック基板2上面の配線導体(図示せず)とがボンディン
グワイヤ(図示せず)によって電気的に接続され、また
半導体素子Cと入出力端子4上のメタライズ層4aとが
同様にボンディングワイヤによって電気的に接続され
る。
Both the semiconductor element C and the frame 3 are attached to the ceramic substrate 2, and the electrodes of the semiconductor element C and the wiring conductors (not shown) on the upper surface of the ceramic substrate 2 are electrically connected by bonding wires (not shown). And the semiconductor element C and the metallized layer 4a on the input / output terminal 4 are also electrically connected by a bonding wire.

【0035】セラミック基板2は、入出力端子4と同様
にして作製される。即ち、原料粉末に適当な有機バイン
ダや溶剤などを添加混合しペースト状となし、このペー
ストをドクターブレード法やカレンダーロール法によっ
て成形したセラミック基板となるセラミックグリーンシ
ートに、W,Mo,Mnなどの粉末に有機溶剤、溶媒を
添加混合して得た配線導体となる金属ペーストを、従来
周知のスクリーン印刷法により所望のパターン形状に印
刷塗布し、約1600℃の高温で焼結することにより作
製される。
The ceramic substrate 2 is manufactured in the same manner as the input / output terminal 4. That is, an appropriate organic binder or solvent is added to the raw material powder to form a paste, and the paste is formed by a doctor blade method or a calendar roll method into a ceramic green sheet to be a ceramic substrate. It is prepared by printing and applying a metal paste to be a wiring conductor obtained by adding and mixing an organic solvent and a solvent to the powder by a conventionally known screen printing method in a desired pattern shape and sintering at a high temperature of about 1600 ° C. It

【0036】本発明の半導体装置は、上記本発明の半導
体パッケージと、載置部2aに載置固定され入出力端子
4に電気的に接続された半導体素子Cと、枠体3の上面
に接合された蓋体5とを具備して成る。具体的には、載
置部2aに半導体素子Cをガラス、樹脂、ロウ材などの
接着剤を介して接着固定して、半導体素子Cの電極をボ
ンディングワイヤを介してセラミック基板2または入出
力端子3の配線導体,メタライズ層に電気的に接続し、
しかる後、枠体3の上面に蓋体5をガラス、樹脂、ロウ
材等の接着剤またはシーム熔接などにより接合すること
により、蓋体5、枠体3、入出力端子4、セラミック基
板2等からなる半導体パッケージA1の内部に半導体素
子Cを収容した製品としての半導体装置となる。
In the semiconductor device of the present invention, the semiconductor package of the present invention, the semiconductor element C mounted on the mounting portion 2a and electrically connected to the input / output terminal 4, and the upper surface of the frame 3 are bonded. And a cover 5 that is closed. Specifically, the semiconductor element C is bonded and fixed to the mounting portion 2a with an adhesive such as glass, resin, or brazing material, and the electrode of the semiconductor element C is bonded with the ceramic substrate 2 or the input / output terminal via the bonding wire. 3 electrically connected to the wiring conductor, metallization layer,
Thereafter, the lid body 5 is joined to the upper surface of the frame body 3 by an adhesive such as glass, resin, brazing material, or seam welding, so that the lid body 5, the frame body 3, the input / output terminals 4, the ceramic substrate 2, etc. The semiconductor device is a product in which the semiconductor element C is housed inside the semiconductor package A1.

【0037】なお、本発明は上記実施の形態に限定され
ず、本発明の要旨を逸脱しない範囲内で種々の変更を行
うことは何等支障ない。例えば、半導体素子が光半導体
素子であっても良く、この場合枠体の側部に光ファイバ
固定用の筒状の固定部材が取り付けられ、光半導体装置
として機能する。
The present invention is not limited to the above embodiment, and various modifications can be made without departing from the scope of the present invention. For example, the semiconductor element may be an optical semiconductor element, and in this case, a tubular fixing member for fixing an optical fiber is attached to a side portion of the frame body and functions as an optical semiconductor device.

【0038】[0038]

【発明の効果】本発明は、略長方形の金属板の隅部の外
側に延出するように形成された張出部に貫通孔が形成さ
れて成るネジ取付部は、金属板の各長辺の両端に短辺に
平行な方向に外側へ延出するように形成された張出部の
先端部に貫通孔が形成されて成り、かつ張出部の短辺側
の辺に長辺から貫通孔近傍までを、貫通孔近傍に角部が
形成されるように切り欠いて成る切欠き部が形成されて
おり、切欠き部は、貫通孔近傍の角部が45〜90°で
あり、短辺に平行な内側の部分の長さが1〜5mmであ
ることにより、半導体パッケージに半導体素子を収納し
て半導体装置となし、この半導体装置を外部電気回路基
板の放熱板にネジ止め固定して半導体装置を作動させた
際に、半導体素子の熱により放熱板が熱膨張して半導体
装置が引張り応力を受けて、セラミック基板や半導体素
子が破壊されるのを有効に防止できる。また、枠体が金
属板上に直接取着されている場合は、枠体の取付部に嵌
着された入出力端子の破壊を防止することができる。そ
の結果、半導体パッケージの気密性が損なわれることは
なく、また半導体素子を長期にわたり正常かつ安定に作
動させることができる。
As described above, according to the present invention, the screw mounting portion formed by forming the through hole in the overhanging portion formed so as to extend to the outside of the corner of the substantially rectangular metal plate has the long sides of the metal plate. Through-holes are formed at the tips of the overhangs that are formed so as to extend outward in the direction parallel to the short sides at both ends, and the sides on the short sides of the overhangs penetrate from the long sides. A notch is formed by cutting out up to the vicinity of the hole so that a corner is formed near the through hole. The notch has a corner near the through hole of 45 to 90 °, which is short. Since the length of the inner portion parallel to the side is 1 to 5 mm, the semiconductor element is housed in the semiconductor package to form a semiconductor device, and this semiconductor device is screwed and fixed to the heat dissipation plate of the external electric circuit board. When the semiconductor device is operated, the heat radiation of the semiconductor element causes thermal expansion of the heat dissipation plate and the semiconductor device experiences tensile stress. Receiving and can effectively prevent the ceramic substrate and the semiconductor element is destroyed. Further, when the frame body is directly attached to the metal plate, it is possible to prevent breakage of the input / output terminal fitted to the attachment portion of the frame body. As a result, the hermeticity of the semiconductor package is not impaired, and the semiconductor element can be operated normally and stably for a long period of time.

【0039】本発明の半導体装置は、上記本発明の半導
体素子収納用パッケージと、載置部に載置固定され入出
力端子に電気的に接続された半導体素子と、枠体の上面
に接合された蓋体とを具備したことにより、半導体素子
にクラックや酸化腐食を発生させず、半導体素子を長期
にわたり正常かつ安定に作動させることができる信頼性
の高い半導体装置を提供することができる。
The semiconductor device of the present invention is bonded to the upper surface of the frame body with the semiconductor element housing package of the present invention, the semiconductor element mounted and fixed on the mounting portion and electrically connected to the input / output terminals. By providing the lid, it is possible to provide a highly reliable semiconductor device capable of operating the semiconductor element normally and stably for a long period without causing cracks or oxidative corrosion in the semiconductor element.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体パッケージについて実施の形態
の一例を示し、(a)は半導体パッケージの平面図、
(b)は(a)のG−G’線における断面図である。
FIG. 1 shows an example of an embodiment of a semiconductor package of the present invention, (a) is a plan view of the semiconductor package,
(B) is sectional drawing in the GG 'line of (a).

【図2】図1の半導体パッケージの要部の拡大平面図で
ある。
FIG. 2 is an enlarged plan view of a main part of the semiconductor package of FIG.

【図3】(a)従来の半導体パッケージの平面図、
(b)は(a)のH−H’線における断面図である。
3A is a plan view of a conventional semiconductor package, FIG.
(B) is a sectional view taken along the line HH 'of (a).

【符号の説明】[Explanation of symbols]

1:金属板 1a:ネジ取付部 1b:ネジ孔 1c:ネジ取付部の先端部 1d:ネジ取付部の基部 2:セラミック基板 2a:載置部 3:枠体 3a:入出力端子の取付部 4:入出力端子 A:半導体パッケージ C:半導体素子 1: Metal plate 1a: Screw mounting part 1b: screw hole 1c: Tip of screw mounting part 1d: Base of screw mounting part 2: Ceramic substrate 2a: Placement part 3: frame 3a: Input / output terminal mounting part 4: Input / output terminal A: Semiconductor package C: Semiconductor element

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 23/02 - 23/10 H01L 23/40 H01L 23/48 H01L 33/00 Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) H01L 23/02-23/10 H01L 23/40 H01L 23/48 H01L 33/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 略長方形であり、隅部に外側へ延出する
ように形成された張出部に貫通孔が形成されて成るネジ
取付部を有する金属板と、該金属板の上面に下側主面が
接合され、上側主面に半導体素子を載置する載置部が設
けられたセラミック基板と、前記金属板または前記セラ
ミック基板の上面の外周部に前記載置部を囲繞するよう
に取着され、側部に貫通孔または切欠き部から成る入出
力端子の取付部が形成された枠体と、前記取付部に嵌着
された入出力端子とを具備した半導体素子収納用パッケ
ージにおいて、前記ネジ取付部は、前記金属板の各長辺
の両端に短辺に平行な方向に外側へ延出するように形成
された前記張出部の先端部に前記貫通孔が形成されて成
り、かつ前記張出部の前記短辺側の辺に前記長辺から前
記貫通孔近傍までを、前記貫通孔近傍に角部が形成され
るように切り欠いて成る切欠き部が形成されており、該
切欠き部は、前記貫通孔近傍の角部が45〜90°であ
り、前記短辺に平行な内側の部分の長さが1〜5mmで
あることを特徴とする半導体素子収納用パッケージ。
1. A metal plate having a substantially rectangular shape and having a screw attachment part formed by forming a through hole in an overhanging part formed so as to extend to the outside at a corner, and a metal plate having a lower surface on the upper surface thereof. A ceramic substrate provided with a mounting portion on which the side main surfaces are joined and a semiconductor element is mounted on the upper main surface, and the mounting portion is surrounded by an outer peripheral portion of the metal plate or the upper surface of the ceramic substrate. A package for storing a semiconductor element, comprising a frame body which is attached and has an input / output terminal mounting portion formed of a through hole or a cutout portion on a side portion, and an input / output terminal fitted in the mounting portion. The screw attachment portion is formed by forming the through hole at a tip end portion of the overhanging portion formed at both ends of each long side of the metal plate so as to extend outward in a direction parallel to the short side. And from the long side to the vicinity of the through hole on the short side of the overhang portion. , A corner is formed near the through hole
Notch formed by cutting out so that is formed, notch portion, the corner portion of the through hole near a 45 to 90 °, the length of the inner parallel to the short side portion A package for housing a semiconductor element, which is 1 to 5 mm.
【請求項2】 請求項1記載の半導体素子収納用パッケ
ージと、前記載置部に載置固定され前記入出力端子に電
気的に接続された半導体素子と、前記枠体の上面に接合
された蓋体とを具備したことを特徴とする半導体装置。
2. The semiconductor element housing package according to claim 1, the semiconductor element mounted and fixed on the mounting portion and electrically connected to the input / output terminals, and joined to the upper surface of the frame body. A semiconductor device comprising: a lid.
JP2001296630A 2001-09-27 2001-09-27 Semiconductor element storage package and semiconductor device Expired - Fee Related JP3527902B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001296630A JP3527902B2 (en) 2001-09-27 2001-09-27 Semiconductor element storage package and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001296630A JP3527902B2 (en) 2001-09-27 2001-09-27 Semiconductor element storage package and semiconductor device

Publications (2)

Publication Number Publication Date
JP2003100975A JP2003100975A (en) 2003-04-04
JP3527902B2 true JP3527902B2 (en) 2004-05-17

Family

ID=19117830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001296630A Expired - Fee Related JP3527902B2 (en) 2001-09-27 2001-09-27 Semiconductor element storage package and semiconductor device

Country Status (1)

Country Link
JP (1) JP3527902B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI314366B (en) * 2006-04-28 2009-09-01 Delta Electronics Inc Light emitting apparatus
JP5721359B2 (en) * 2010-07-29 2015-05-20 京セラ株式会社 Semiconductor device substrate and semiconductor device including the same

Also Published As

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