JP3324228B2 - Copper wire for ultrafine wire and method of manufacturing the same - Google Patents

Copper wire for ultrafine wire and method of manufacturing the same

Info

Publication number
JP3324228B2
JP3324228B2 JP25224093A JP25224093A JP3324228B2 JP 3324228 B2 JP3324228 B2 JP 3324228B2 JP 25224093 A JP25224093 A JP 25224093A JP 25224093 A JP25224093 A JP 25224093A JP 3324228 B2 JP3324228 B2 JP 3324228B2
Authority
JP
Japan
Prior art keywords
wire
copper
copper wire
ultrafine
sulfur
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP25224093A
Other languages
Japanese (ja)
Other versions
JPH0790430A (en
Inventor
幸一 田村
正義 青山
貴朗 市川
孝 根本
浩義 蛭田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP25224093A priority Critical patent/JP3324228B2/en
Publication of JPH0790430A publication Critical patent/JPH0790430A/en
Application granted granted Critical
Publication of JP3324228B2 publication Critical patent/JP3324228B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45147Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00011Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group

Landscapes

  • Conductive Materials (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は電気/電子機器,時計等
の巻線用銅導体等として使用される極細線用銅線,及び
その製造方法に関し、特に、導電率をあまり低下させず
に、機械的特性,及び伸線加工性を向上させた極細線用
銅線,及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper wire for a fine wire used as a copper conductor for windings of electric / electronic devices, watches and the like, and a method of manufacturing the same. The present invention relates to a copper wire for an ultrafine wire having improved mechanical properties and drawability, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】近年、電気/電子機器,時計等の巻線用
銅導体は、機器の小型・軽量化に伴って益々極細線化の
傾向にあり、中には10数ミクロンの超極細線の需要も
でてきている。
2. Description of the Related Art In recent years, copper conductors for windings of electric / electronic devices, watches and the like have become increasingly finer in line with the miniaturization and weight reduction of the devices. Demand is also rising.

【0003】この極細線用銅線は、伸線加工等の細線加
工によって得られるが、このときに銅線に微量介在する
不純元素や、結晶粒粗大化などの影響によって断線が生
じ易い。このため、極細線用銅線の銅線材として、より
加工性能に優れ、しかも高強度,高導電性を有している
ことが要望されている。
[0003] The ultrafine copper wire is obtained by fine wire processing such as wire drawing. At this time, a disconnection is apt to occur due to an impurity element present in a trace amount in the copper wire or the effect of coarsening of crystal grains. For this reason, there is a demand for a copper wire material for a copper wire for an ultrafine wire to have more excellent processing performance and to have high strength and high conductivity.

【0004】従来、この種の極細線には、表面を皮剥き
して清浄化した無酸素銅(OFC)や、タフピッチ銅
(TPC)が多く使用されている。
Conventionally, oxygen-free copper (OFC) whose surface is peeled and cleaned and tough pitch copper (TPC) are often used for this kind of ultrafine wire.

【0005】[0005]

【発明が解決しようとする課題】しかし、無酸素銅やタ
フピッチ銅を使用した極細線用銅線によると、上述した
不純元素や、結晶粒粗大化などの影響によって伸線加工
時に断線が起こり易く、極細化伸線が困難になって作業
歩留りを低下させている。また、これらの純銅線は軟化
温度が低いため、エナメル被覆時の焼付温度により線材
が半軟化から完全軟化状態に変化してしまい、所望の強
度特性、特に引張特性が得られない。このため、機械的
特性と導電性に優れた極細線用銅線が望まれている。
However, according to the ultrafine copper wire using oxygen-free copper or tough pitch copper, disconnection is likely to occur at the time of wire drawing due to the influence of the above-described impure elements and coarsening of crystal grains. In this case, it is difficult to draw wires with extremely small thickness, and the work yield is reduced. Further, since the softening temperature of these pure copper wires is low, the wire material changes from a semi-softened state to a completely softened state depending on the baking temperature at the time of enamel coating, so that desired strength properties, particularly, tensile properties cannot be obtained. Therefore, a copper wire for an ultrafine wire having excellent mechanical properties and conductivity is desired.

【0006】従って、本発明の目的は導電率をあまり低
下させずに機械的特性を向上させ、伸線加工性の向上に
よって歩留りを良好にすることができる極細線用銅線,
及びその製造方法を提供することである。
Accordingly, it is an object of the present invention to provide a copper wire for an ultrafine wire, which can improve mechanical properties without significantly lowering the conductivity and improve the yield by improving drawability.
And a method for producing the same.

【0007】[0007]

【課題を解決するための手段】本発明は上記問題点に鑑
み、導電率をあまり低下させずに機械的特性を向上さ
せ、伸線加工性の向上によって歩留りを良好にするた
め、純度99.9〜99.99%の銅に、7〜100p
pmの硫黄を添加した銅線材より構成され、30μm以
下の結晶粒径を有する極細線用銅線を提供するものであ
る。なお、純度の単位である「%」と含有量を示す「p
pm」は、いずれも、一般的に用いられている重量に基
づくものであり、本明細書中でのその説明表示は省略す
る。
SUMMARY OF THE INVENTION In view of the above problems, the present invention improves the mechanical properties without significantly lowering the electrical conductivity, and improves the drawability by improving the drawability. 7 to 100p for 9 to 99.99% copper
It is composed of copper wire to which pm sulfur is added.
An object of the present invention is to provide an ultrafine copper wire having the following crystal grain size . The unit of purity “%” and the content “p”
pm ”are based on commonly used weights.
In the present specification, the explanation display is omitted.
You.

【0008】上記銅線材は、溶体化処理後、中間熱処理
を施さずに90%以上の加工度で加工されることによ
り、調質処理後において30μm以下の結晶粒径を有す
る。
The above-mentioned copper wire is processed at a working ratio of 90% or more without performing an intermediate heat treatment after the solution treatment, and thus has a crystal grain size of 30 μm or less after the tempering treatment.

【0009】また、上記目的を達成する本発明の極細線
用銅線の製造方法は、純度99.9〜99.99%の溶
銅に7〜100ppmの硫黄を添加し、連続鋳造により
鋳造材を製造し硫黄を固溶状態にし、この鋳造材に中間
熱処理を施さずに90%以上の加工度で冷間伸線した
後、焼鈍を行い30μm以下の結晶粒径を有する銅線と
することによって行う。
Further, a method for producing a copper wire for ultrafine wires according to the present invention, which achieves the above object, comprises adding 7 to 100 ppm of sulfur to molten copper having a purity of 99.9 to 99.99%, and continuously casting the material. Is produced in a solid solution state of sulfur, and the cast material is subjected to cold drawing at a working ratio of 90% or more without performing intermediate heat treatment, and then annealed to form a copper wire having a crystal grain size of 30 μm or less.
Performed by.

【0010】ここで、硫黄の含有量を7〜100ppm
の範囲にする理由は、一般的に無酸素銅には硫黄が5〜
7ppm含まれているが、結晶粒径が不均一の場合が多
く、Sの添加量が7ppm以下では、結晶粒微細化の十
分な効果が得られず、100ppm以上では鋳造材の鋳
肌表面が悪化し、硫黄の偏析が生じ易くなるので微細加
工性の低下,導電率の低下を招く。また、加工度80%
以下では均一な結晶粒径が得られずに混粒結晶状とな
る。すなわち、加工度が低いと再結晶の核発生サイトが
少なくなって結晶粒の十分な微細化を得ることができな
い。
Here, the sulfur content is 7 to 100 ppm.
The reason is generally that oxygen-free copper contains 5 to 5 sulfur.
Although 7 ppm is contained, the crystal grain size is often non-uniform, and if the added amount of S is 7 ppm or less, a sufficient effect of crystal grain refinement cannot be obtained. As a result, sulfur segregation is apt to occur, leading to a decrease in fine workability and a decrease in conductivity. In addition, processing degree 80%
Below, a uniform grain size is not obtained, and a mixed grain is formed. That is, if the degree of processing is low, the number of nucleation sites for recrystallization is reduced, and it is not possible to obtain sufficiently fine crystal grains.

【0011】従って、高純度銅に硫黄を7〜100pp
mの範囲で添加して鋳造し、これを中間熱処理を施さず
90%の加工度で加工することによって、最終加工サ
イズの調質熱処理後の最大結晶粒径を30μm以下の均
一な微細結晶粒径とすることができ、その結果、導電率
をそれほど低下させずに機械的特性を向上させることが
できる。
Therefore, sulfur is added to high-purity copper in an amount of 7 to 100 pp.
m and cast without adding intermediate heat treatment
By processing at a working ratio of 90%, the maximum crystal grain size after the tempering heat treatment of the final processing size can be made a uniform fine crystal grain size of 30 μm or less, and as a result, the conductivity is significantly reduced. The mechanical properties can be improved without the need.

【0012】[0012]

【実施例】以下、本発明の極細線用銅線について詳細に
説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The copper wire for extra fine wires of the present invention will be described in detail below.

【0013】まず、小型連続鋳造装置において、銅母材
として純度99.995%の無酸素銅(OFC)を高周
波真空溶解(5×10-4Torr)によって溶解し、Cu−
S母合金におけるS成分が固溶状態となるように、この
溶銅にSを添加して外径8mmの鋳造ロッドを鋳造し
た。
[0013] First, in a small continuous casting apparatus, purity 99.995% of oxygen-free copper (OFC) was dissolved by a high-frequency vacuum melting (5 × 10 -4 Torr) as the copper base material, Cu-
This S component in the S master alloy is in a solid solution state,
S was added to the molten copper to cast a casting rod having an outer diameter of 8 mm.

【0014】続いて、鋳造ロッドを冷間伸線し、線径3
0μmの極細線とした後に不活性ガス雰囲気中で100
〜400℃の温度範囲で連続焼鈍を行って調質処理す
る。このようにしてSを異なる添加量で含有させ、残余
を銅とした極細線を実施例1〜4として作成した。
Subsequently, the cast rod was cold drawn, and the wire diameter was 3 mm.
After forming a fine line of 0 μm, 100 μm in an inert gas atmosphere.
Tempering treatment is performed by performing continuous annealing in a temperature range of up to 400 ° C. In this way, ultrafine wires containing S in different amounts and the balance being copper were prepared as Examples 1 to 4.

【0015】一方、純度99.99%の無酸素銅にSを
5ppm添加した極細線を比較例1として、また、純度
99.9%のタフピッチ銅にSを4ppm添加した極細
線を比較例2としてそれぞれ作成した。
On the other hand, an ultra-fine wire obtained by adding 5 ppm of S to oxygen-free copper having a purity of 99.99% is referred to as Comparative Example 1, and an ultra-fine wire obtained by adding 4 ppm of S to a tough pitch copper having a purity of 99.9% is referred to as Comparative Example 2. Each was created as.

【0016】次に、実施例1から4,及び比較例1,2
に対し、素材導電率,長手方向断面における最大結晶粒
径,及び常温引張特性を測定した。表1は測定結果を示
し、ここで、素材導電率は冷間伸線前の鋳造ロッドの状
態での測定結果を、また、引張特性は伸び10%におけ
る測定結果を示している。
Next, Examples 1 to 4 and Comparative Examples 1 and 2
In comparison, the electrical conductivity of the material, the maximum crystal grain size in the cross section in the longitudinal direction, and the tensile properties at room temperature were measured. Table 1 shows the measurement results. Here, the material conductivity shows the measurement results in the state of the cast rod before cold drawing, and the tensile properties show the measurement results at an elongation of 10%.

【表1】 [Table 1]

【0017】表1の測定結果から判るように、調質処理
後の引張特性ついては、比較例1の極細線が26kgf
/mm2 ,比較例2の極細性が21.5kgf/mm2
であるのに対し、実施例1〜4の極細線は27.0〜3
3.5kgf/mm2 と何れも比較例1,2より高い値
になっている。すなわち、Sの含有量が増加するに従っ
て素材導電率が若干低下する傾向はあるものの、結晶粒
径が微細化されることによって引張特性は向上してお
り、機械的強度が改善されている。
As can be seen from the measurement results in Table 1, regarding the tensile properties after the tempering treatment, the extra fine wire of Comparative Example 1 was 26 kgf.
/ Mm 2 , the fineness of Comparative Example 2 is 21.5 kgf / mm 2
On the other hand, the fine lines of Examples 1 to 4 are 27.0 to 3
3.5 kgf / mm 2 , which is higher than Comparative Examples 1 and 2. That is, although the material conductivity tends to slightly decrease as the S content increases, the tensile properties are improved and the mechanical strength is improved as the crystal grain size is reduced.

【0018】このように本発明の極細線用銅線は、高純
度銅に硫黄を7〜100ppmの範囲で添加して鋳造
し、これを中間熱処理を施さずに90%の加工度で加工
して構成されているため、最終加工サイズの調質熱処理
後の最大結晶粒径を30μm以下の均一な微細結晶粒径
とすることができ、その結果、導電率をそれほど低下さ
せずに機械的特性を向上させることができる。
As described above, the ultrafine copper wire of the present invention is cast by adding sulfur to high-purity copper in the range of 7 to 100 ppm, and is processed at a processing rate of 90% without intermediate heat treatment. In this case, the maximum grain size after the tempering heat treatment of the final processing size can be a uniform fine grain size of 30 μm or less, and as a result, the mechanical properties can be reduced without significantly lowering the conductivity. Can be improved.

【0019】尚、以上説明した実施例では線径を30μ
mにしたが、特に限定されるものではなく、電子機器等
への使用サイズによって10〜100μmから任意に選
定することができる。また、無酸素銅の他にタフピッチ
銅についてもS添加による特性向上を期待することがで
きる。
In the embodiment described above, the wire diameter is set to 30 μm.
Although m is not particularly limited, it can be arbitrarily selected from 10 to 100 μm depending on the size used for an electronic device or the like. Further, in addition to oxygen-free copper, tough pitch copper can also be expected to improve characteristics by adding S.

【0020】[0020]

【発明の効果】以上説明したように、本発明の極細線用
銅線,及びその製造方法によると、純度99.9〜9
9.99%の銅に、7〜100ppmの硫黄を添加し、
且つ、これを90%以上の高加工度で加工して調質処理
後の結晶粒径を30μm以下にしたため、導電率をあま
り低下させずに機械的特性を向上させ、伸線加工性の向
上によって歩留りを良好にすることができる。
As described above, according to the ultrafine copper wire of the present invention and the method for producing the same, the purity is 99.9 to 9
To 9.99% copper, add 7-100 ppm sulfur,
In addition, since this is processed at a high working ratio of 90% or more to reduce the crystal grain size after the tempering treatment to 30 μm or less, the mechanical properties are improved without significantly lowering the conductivity, and the wire drawing workability is improved. Thereby, the yield can be improved.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C22F 1/00 630 C22F 1/00 630A 630K 661 661A 686 686A 691 691B 694 694A (72)発明者 根本 孝 茨城県日立市日高町5丁目1番1号 日 立電線株式会社パワーシステム研究所内 (72)発明者 蛭田 浩義 茨城県日立市川尻町4丁目10番1号 日 立電線株式会社 豊浦工場内 (56)参考文献 特開 平2−163330(JP,A) 特開 昭56−139643(JP,A) 特開 平2−22431(JP,A) 特開 平2−22432(JP,A) 特開 平6−2058(JP,A) (58)調査した分野(Int.Cl.7,DB名) C22C 9/00 C22F 1/00 - 3/02 H01B 1/02 ────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 Identification code FI C22F 1/00 630 C22F 1/00 630A 630K 661 661A 686 686A 691 691B 694 694A (72) Inventor Takashi Nemoto Hidaka, Hitachi City, Ibaraki Prefecture 5-1-1, Hitachi-cho, Hitachi, Ltd. Power System Research Laboratories (72) Inventor Hiroyoshi Hiruta 4-1-1, Kawajiri-cho, Hitachi-shi, Ibaraki Pref. JP-A-2-163330 (JP, A) JP-A-56-139643 (JP, A) JP-A-2-22431 (JP, A) JP-A-2-22432 (JP, A) JP-A-6-2058 (JP , A) (58) Fields studied (Int. Cl. 7 , DB name) C22C 9/00 C22F 1/00-3/02 H01B 1/02

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】純度99.9〜99.99%の銅に、7〜
100ppmの硫黄を添加した銅線材より構成され、3
0μm以下の結晶粒径を有することを特徴とする極細線
用銅線。
(1) copper having a purity of 99.9 to 99.99%;
It is composed of a copper wire to which 100 ppm of sulfur is added.
An ultrafine copper wire having a crystal grain size of 0 μm or less.
【請求項2】純度99.9〜99.99%の溶銅に7〜
100ppmの硫黄を添加し、連続鋳造により鋳造材を
製造し硫黄を固溶状態にし、前記鋳造材に中間熱処理を
施さずに90%以上の加工度で冷間伸線した後、焼鈍を
い30μm以下の結晶粒径を有する銅線とすることを
特徴とする極細線用銅線の製造方法。
2. A molten copper having a purity of 99.9 to 99.99% and a content of 7 to 9%.
100 ppm of sulfur is added, a cast material is produced by continuous casting, the sulfur is dissolved, and the cast material is subjected to cold drawing at a workability of 90% or more without being subjected to intermediate heat treatment. /> method for producing a fine wire copper wire, characterized in that a copper wire having a grain size less lines have 30 [mu] m.
JP25224093A 1993-09-14 1993-09-14 Copper wire for ultrafine wire and method of manufacturing the same Expired - Fee Related JP3324228B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25224093A JP3324228B2 (en) 1993-09-14 1993-09-14 Copper wire for ultrafine wire and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25224093A JP3324228B2 (en) 1993-09-14 1993-09-14 Copper wire for ultrafine wire and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH0790430A JPH0790430A (en) 1995-04-04
JP3324228B2 true JP3324228B2 (en) 2002-09-17

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Country Link
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JP6278812B2 (en) * 2014-04-21 2018-02-14 株式会社Shカッパープロダクツ Copper alloy material, distribution member for electric vehicle and distribution member for hybrid vehicle
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