JP2605001Y2 - Chemical mixing equipment for substrate processing equipment - Google Patents

Description

[Detailed description of the invention]

[0001]

The present invention relates to a chemical liquid mixing device,
The present invention relates to a chemical solution mixing device for a substrate processing apparatus, which mixes and supplies a chemical solution and pure water to a substrate processing tank of the substrate processing apparatus.

[0002]

2. Description of the Related Art When performing surface treatment on a thin substrate (hereinafter simply referred to as a substrate) such as a semiconductor substrate or a glass substrate for a liquid crystal, an immersion type in which the substrate is immersed in a processing bath to perform the treatment. A substrate processing apparatus is generally used. As this kind of conventional apparatus, there is, for example, an apparatus disclosed in Japanese Utility Model Laid-Open No. 4-99269.

This apparatus includes a plurality of substrate processing tanks for performing a surface treatment of a substrate, and a processing liquid supply unit that supplies a processing liquid to the substrate processing tank via a pure water supply path that forms a main path of pure water. It has. The processing liquid supply unit includes a plurality of chemical liquid storage containers, a chemical liquid supply pipe configured to supply a chemical liquid from the chemical liquid storage container by a pump, and a liquid supply line configured to introduce the supplied chemical liquid into a pure water supply path and mix the chemical liquid with the pure water. It is provided with a plurality of chemical liquid introduction valves and a mixing valve comprising an introduction valve connecting pipe in which these are arranged in parallel.
In the pure water supply path, a drain valve, a mixing valve, and a pure water supply valve are arranged in this order on the upstream side from the substrate processing tank.

In this type of substrate processing apparatus, a pure water supply valve and a chemical solution introduction valve required for a desired treatment among a plurality of chemical solution introduction valves are opened to introduce a chemical solution into a pure water supply path, and pure water and a chemical solution are introduced. And mix. Then, the mixed processing liquid is supplied into the substrate processing tank to process the substrate. When the next chemical is charged into the substrate processing tank, pure water is charged into the substrate processing tank to replace the internal processing liquid with pure water, and then the drain valve is opened to drain the processing liquid from the substrate processing tank. Liquid. Then, the next chemical solution introduction valve is opened, and the next chemical solution and pure water are mixed and charged into the substrate processing tank.

[0005]

SUMMARY OF THE INVENTION In the above conventional configuration,
A mixing valve, a pure water supply valve for supplying / cutting off pure water, and a drain valve for draining the processing liquid in the processing tank are separately arranged in the pure water supply path. For this reason, these valves must be connected by piping, and the piping space becomes large.
In addition, the number of tubes and fittings increases, and the cost required for piping increases, and as the number of fittings increases, the liquid leakage portion increases and the cost required for maintenance increases.

[0006] It is an object of the present invention to reduce piping space and reduce piping and maintenance costs.

[0007]

A substrate processing apparatus according to claim 1.
The chemical liquid mixing device for the device is installed in the substrate processing tank of the substrate processing device.
A chemical liquid mixing device for mixing and supplying a liquid and pure water,
Inlet valve connecting pipe, chemical supply valve, pure water supply valve, drainage
It has a vent. The introduction valve connecting pipe consists of one block.
And one end can be connected to the substrate processing bath. Chemical
The supply valve is located in the middle of the introduction valve connecting pipe,
The chemical is supplied to the valve connection pipe. The pure water supply valve is connected to the introduction valve
Located at the other end of the pipe, supplies pure water to the inlet valve connection pipe
I do. The drainage discharge valve is located at the other end of the introduction valve connecting pipe.
And drains the liquid from the inlet valve connection pipe.

[0008] A chemical mixing apparatus for a substrate processing apparatus according to claim 2
The apparatus is the apparatus according to claim 1, wherein the pure water supply valve and
The drainage discharge valve is a drainage discharge valve,
The pure water supply valves are arranged in this order.

A chemical mixing apparatus for a substrate processing apparatus according to claim 3.
The device is the device according to claim 1 or 2, wherein the flow path and the nozzle are provided.
A rain valve is further provided. The flow path is a drain discharge valve
Connect the secondary side and the primary side of the pure water supply valve. The drain valve is
It is provided in the channel.

[0010]

In the chemical liquid mixing device according to the present invention, both the pure water supply valve and the drainage discharge valve are provided at the other end of the introduction valve connecting pipe .
Pure water is supplied from a pure water supply valve . Then, the chemical from the chemical supply valve is supplied to the middle of the introduction valve connecting pipe . The supplied chemical solution and pure water are mixed and flow from one end of the introduction valve connecting pipe to the substrate processing tank. Further, when discharging the processing solution in the substrate processing tank, the processing solution flows from the substrate processing chamber to one end of the introduction valve connecting pipe, further flows to the other end of the introduction valve connection pipe, arranged in the other end It is discharged from the drainage discharge valve .

Here, the introduction valve connecting pipe is constituted by one block, and the introduction valve connecting pipe is provided with a chemical solution supply valve and a pure water supply valve.
A valve and a drainage valve are arranged. That is, introduction
Chemical supply valve, pure water supply valve and drainage discharge at valve connection pipe
The valve is integrated. For this reason, the number of piping is reduced, and the piping space is reduced. Also, the number of tubes and joints required for piping is reduced, and piping costs and maintenance costs are reduced.

Further, in the chemical liquid mixing device according to claim 2,
The drainage discharge valve is located on the other end of the introduction valve connecting pipe than the pure water supply valve.
Because of the arrangement, when draining (the processing liquid in the substrate processing tank is drained).
Liquid stays in the connection pipe at the time of
It becomes.

Further, in the chemical liquid mixing apparatus according to claim 3,
Connects the secondary side of the drainage discharge valve and the primary side of the pure water supply valve
Because the flow path is provided, it is necessary to open the drain valve.
Prevent stagnation of liquid in piping on the secondary side of drainage valve
be able to.

[0014]

1 and 2, an immersion type substrate cleaning apparatus 1 employing one embodiment of the present invention includes a loading / unloading section 2 for a carrier C containing a large number of substrates, and a substrate W from the carrier C. Transfer unit 3 for taking out or loading the substrate W into the carrier C, a carrier cleaning unit 3a for cleaning the carrier C, a loading / unloading unit 2, a substrate transfer unit 3, and a carrier cleaning unit 3a. A carrier transfer robot 4 for transferring the carrier C between the above, a immersion type substrate cleaning processing unit 5 for cleaning a plurality of substrates at a time, a substrate drying unit 6 for draining and drying the substrates, The substrate transfer unit 3 includes a substrate transport robot 7 that collectively holds a plurality of substrates taken out of the carrier C and transports the substrates to the substrate cleaning unit 5 and the substrate drying unit 6.

The substrate transfer section 3 has two rotatable tables 8 on which the carrier C is mounted. Table 8
The carrier C is rotated 90 ° as needed. At the center of the table 8, a rectangular opening is formed. Below the opening, the substrate W can be taken out of the carrier C at one time, and can be moved up and down to load the substrate W into the carrier C at one time. The substrate receiving portion 8a is disposed.

The carrier transfer robot 4 is configured to be movable up and down, rotatable, and movable in the direction of arrow A in FIG. The carrier transfer robot 4 transfers the carrier C carried into the carry-in / carry-out section 2 onto the table 8, transfers the carrier C between the carrier cleaner 3a and the table 8 during substrate cleaning, and The carrier C containing the cleaned substrate W is transferred from the table 8 to the loading / unloading unit 2.

The substrate transfer robot 7 is movable in the direction of arrow B in the moving section 10 and has a substrate holding arm 9 for holding a plurality of substrates W received from the substrate receiving section 8a of the substrate transfer section 3. ing. The robot 7 sequentially transports the plurality of substrates W held by the substrate holding arms 9 to the substrate cleaning unit 5 and the substrate drying unit 6 along the moving unit 10.

The substrate cleaning section 5 is of an overflow type, and includes three substrate cleaning tanks 12 and a substrate cleaning tank 12.
And a substrate holder 11 provided to be able to move up and down. A plurality of substrates W received from the substrate transport robot 7 are held and immersed in the cleaning tanks 12 by the substrate holder 11.

The substrate cleaning tank 12 is made of quartz glass.
It is formed in a substantially V-shape in side view and a substantially rectangular shape in plan view. The inside of the substrate cleaning tank 12 is configured as an overflow tank that forms a uniform upward flow of the cleaning liquid to perform a surface treatment on the substrate W and that can quickly replace the cleaning liquid for each of a plurality of types of cleaning processing steps. Note that the substrate cleaning tank 12 is not limited to quartz glass. For example, when hydrofluoric acid or the like that wipes quartz glass is used as a cleaning liquid, the substrate cleaning tank 12 may be formed of a resin material such as tetrafluoroethylene resin. .

As shown in FIG. 3, the cleaning section 5 includes a cleaning liquid supply section 13 for supplying a plurality of types of cleaning liquid to each substrate cleaning tank 12 from below, and a cleaning liquid for discharging the cleaning liquid overflowing from each substrate cleaning tank 12. And a discharge unit 14.

Around the substrate cleaning tank 12, there is provided an overflow liquid recovery section 15 constituting a cleaning liquid discharge section 14. The overflow liquid recovery section 15 has a drain pipe 1
6 is connected, and the drainage pipe 16 is connected to a drainage drain 17. Here, the cleaning liquid that has overflowed in the overflow liquid recovery unit 15 is discharged to a drain drain 17 via a drain pipe 16.

The cleaning liquid supply section 13 has a pure water supply pipe 18 connected to a lower portion of each substrate cleaning tank 12. In the pure water supply pipe 18, an introduction valve connection pipe 19, a flow meter 26, and a control valve 27 are arranged in order from the upstream side of the substrate cleaning tank 12. The pure water supply pipe 18 is supplied with pure water _DW at room temperature or heated to a predetermined temperature.

The introduction valve connecting pipe 19 has an upstream side (wash tank 1).
From the end of the 2 opposite side) in order, a pure water supply valve 23, the drain valve 25, and a plurality of chemical introducing valve 20 _A to 20 _D. Each chemical introducing valve 20 _A to 20 _D, chemical pumping unit 21 for supplying the drug solution Q _A to Q _D is connected (only for chemical introducing valve 20 _A). This chemical introducing valve 20 _A ~2
0 _D is selectively opened and closed, and a predetermined chemical solution from the chemical solution pumping unit 21 is introduced into the pure water supply pipe 18.

As shown in FIG. 4, a linear fluid passage 24 is formed inside the introduction valve connecting pipe 19 from the upstream end to the downstream end (on the side of the cleaning tank 12). A connection port 24a to which a pipe from the cleaning tank 12 is connected is formed at the downstream end, and four chemical liquid introduction valves 20 are provided on the inner wall of the intermediate portion.
Secondary flow path _A to 20 _D are opened along the feed direction of the fluid. In addition, chemical solution inlets 20a to 20d (only 20d is shown) are formed on the side surface of the introduction valve connecting pipe 19, and a pipe from the chemical solution pressure feeding unit 21 is connected to the chemical solution inlets 20a to 20d. Furthermore, the introduction valve connecting pipe 19
A pure water supply port 23 a communicating with the fluid passage 24 is formed at the upstream end of the water supply port 23. The pure water supply pipe 18 is connected to the pure water supply port 23a. Pure water supply port 23a
A drain port 25 a communicating with the fluid passage 24 is formed adjacent to the downstream side of the fluid passage 24. The drainage pipe 16 is connected to the drainage port 25a. The pure water supply port 23a and the drain port 25a are opened and closed by a pure water supply valve 23 and a drain valve 25, respectively.

Further, as shown in FIG. 5, a flow path 30 connecting the secondary flow path of the drain valve 25 and the primary flow path of the pure water supply valve 23 is formed in the introduction valve connecting pipe 19. In this flow path 30, dead water in the pipe (liquid stays in the passage)
A drain valve 29 for preventing the occurrence of a drain is provided.

[0026] Each chemical pumping unit 21 includes a single type of chemical liquid medicine reservoir container 22 for reserving the _A (22 _{B ~22 D).} Chemical reservoir container 22 _A (22 _B ~22 _D) is the container sealed, this container 22 _A, a nitrogen gas piping 39
And the chemical supply pipe 40 are connected. Nitrogen gas pipe 39 is opened at the top of the container 22 _A, the chemical liquid supply pipe 40
It is reached near the bottom of the container 22 _A. The drug solution reservoir container 22 _A, a nitrogen gas source 3 via a nitrogen gas pipe 39
1 supplies nitrogen gas. Nitrogen gas piping 39 between the drug solution reservoir container 22 _A and the nitrogen gas source 31, a nitrogen supply valve 32 in order from the upstream side, a filter 33 and a corrosion resistant regulator 34 for pressure adjustment is arranged. Here, the reason why the corrosion-resistant regulator 34 is used is that the chemical storage container 22 _A is used.
This is because the corrosive gas of the chemical solution may flow backward.

Air whose pressure has been adjusted from an electropneumatic regulator 35 is supplied to a pilot port of the corrosion resistant regulator 34. The electropneumatic regulator 35 is a valve that controls air pressure by an electric signal, and is supplied with pressurized air from an air pressure source 36. Electro-pneumatic regulator 35
Is connected to the programmable controller 37. The programmable controller 37 is provided with a pressure signal from a pressure sensor 38 that detects the pressure of the chemical supply pipe 40. The programmable controller 37 supplies a feedback signal corresponding to the detected pressure value to the electropneumatic regulator 35.

The chemical solution supply pipe 40 branches to the chemical solution introduction valves 20 _A of each cleaning tank 12. A flow meter 41 and a filter 42 are disposed upstream of the branch portion of the chemical supply pipe 40. A stop valve 44 for the pressurized drain is connected to the filter 42. The stop valve 44 is connected to the drain 17. _A relief valve 43 for relief is also connected to the chemical storage container 22A.

Next, the control valve 27 of the cleaning liquid supply unit 13 will be described.

The control valve 27 is for controlling the pure water _DW to a constant flow rate and a constant pressure, and as shown in FIG.
A valve body 48 made of resin such as F, a valve cover 49 arranged on the upper part of the valve body 48, a diaphragm 50 arranged between the valve body 48 and the valve cover 49, and a diaphragm 50
And a valve body 51 that can move up and down in the valve body 48 in conjunction with the valve body 48.

A discharge side (secondary side) is provided above the valve body 48.
A liquid pressure introduction chamber 52 into which pure water is introduced is formed.
A pure water flow path 5 through which pure water flows is provided inside the valve body 48.
3 are formed. The pure water channel 53 has an inlet 5 at the base end.
4 is formed, a valve body channel 56 extending upward from the tip of the introduction channel 55, and a discharge channel 57 extending rightward in FIG. 6 from the tip of the valve channel 56. Have been. A valve seat 72 is formed in the valve body channel 56. A discharge port 58 is formed at the tip of the discharge channel 57. A communication hole 59 is formed between the discharge channel 57 and the hydraulic pressure introduction chamber 52 to communicate them.

An air chamber 60 is formed below the valve body flow path 56. In the air chamber 60, a piston 61 capable of contacting the valve body 51 is disposed so as to be vertically movable. The air chamber 60 is hermetically sealed by a cover 62. An air inlet 63 is formed in the cover 62.
In the upper part of the air chamber 60, an air hole 65 communicating with an air inlet 64 formed on the side of the valve body 48 is opened.

The valve cover 49 has an air introduction chamber 66 formed at the lower part. The air introduction chamber 66 is airtightly separated from the hydraulic pressure introduction chamber 52 by the diaphragm 50. An air introduction port 67 communicates with the air introduction chamber 66. In the air introduction chamber 66, a piston 68 that can move up and down is arranged. At the lower end of the piston 68, a large-diameter flange portion 69 is formed.

The valve element 51 has a flange portion 70 sandwiching the diaphragm 50 together with the flange portion 69 at the upper part. Thereby, the valve element 51 moves up and down in conjunction with the diaphragm 50.

The lower part of the valve element 51 has a larger diameter than the upper part. A tapered portion 71 is formed between an upper portion and a lower portion of the valve element 51. The tapered portion 71 fits into a valve seat 72 formed in the valve body flow path 56 of the valve body 48,
The introduction flow path 35 and the discharge flow path 37 can be shut off. Note that the valve body 51 and the valve seat 72 may have any shape as long as they fit into each other.

The vertical position of the valve element 51 is determined by the pressure difference between the pressure of the air introduced into the air introduction chamber 66 and the pressure of the pure water on the secondary side introduced into the hydraulic pressure introduction chamber 52. Therefore, at the time of pressure adjustment, by introducing a desired pressure into the air introduction chamber 66, the pressure on the discharge flow path 57 side in the pure water flow path 53 becomes constant and the flow rate becomes constant. Further, by introducing low-pressure air into the air introduction chamber 66, a small amount of pure water can flow. Thereby, a water saving function can be realized. Further, by introducing high-pressure air from the air inlet 63, the valve body 51 is pushed upward, and the pure water flow path 53 is shut off.

Next, the corrosion-resistant regulator 34 will be described.

As shown in FIG. 7, the corrosion-resistant regulator 34 includes a valve body 81 made of resin such as PVDF, an upper cover 82 disposed on the upper part of the valve body 81, and a lower cover 82 disposed on the lower part of the valve body 81. And a cover 83.

A gas pressure introducing chamber 86 is provided above the valve body 81.
Are formed. Further, a gas passage 84 through which nitrogen gas flows is formed inside the valve body 81. The gas flow path 84 is provided with an inlet flow path 87 connected to an inlet port 85 opened on the left side surface of the valve body 81 in FIG. Body channel 88
The outlet passage 89 extends downward from the gas pressure introduction chamber 86, bends at 90 °, and opens on the right side surface of the valve body 81 in FIG. 7. An outlet port 90 is formed at the tip of the outlet channel 89. Further, a tapered valve seat 91 is formed in the middle of the valve body flow path 88, and the lower surface of the upper cover 82 is provided on the lower surface of the air pressure introduction chamber 9 facing the gas pressure introduction chamber 86.
4 are formed. The air pressure introduction chamber 94 is provided with the upper cover 8.
2 communicates with a pilot port 101 which is open on the right side surface. The gas pressure introduction chamber 86 and the air pressure introduction chamber 94 are airtightly separated by a diaphragm 92 disposed between the valve body 81 and the upper cover 82. Diaphragm 92
, A piston 93 is integrally attached thereto, and the piston 93 can move up and down in the air pressure introduction chamber 94. Above the piston 93, an exhaust port 95 is formed in the upper cover 82.

Below the piston 93, a valve body 96 that can move up and down the valve body flow path 88 is disposed in contact. The valve body 96 has an enlarged portion 102 whose diameter gradually increases as it goes downward, and the enlarged portion 102 engages with the valve seat 91. In the lower part of the valve body 96, a seal 97 whose upper part is expandable and contractable and whose lower part seals the valve body 81 and the lower cover 83 is fitted. A spring receiver 99 that moves up and down is fitted into the seal 97.

A spring chamber 98 is formed on the upper surface of the lower cover 83, and a spring 100 abutting on a spring receiver 99 is disposed in the spring chamber 98 in a compressed state. As a result,
The valve body 96 is constantly urged upward by a spring 100 via a spring receiver 99 and a seal 97. Therefore, the anti-corrosion regulator 34 operates by applying the urging force of the spring 100 and the air chamber 94
Move up and down by the balance with the air pressure introduced into the
Nitrogen gas at a pressure which is adjusted by the air pressure can be supplied to the chemical liquid reservoir container 22 _A.

Next, the operation of the above embodiment will be described.

When the carrier C containing the substrate W is placed on the loading / unloading section 2, the carrier transfer robot 4 receives it and places it on the substrate transferring section 3. When the carrier C is transferred to the substrate transfer unit 3, the substrate receiving unit 8a takes out the substrate W from the carrier C and sends the substrate W to the substrate transfer robot 7.
give. The substrate transfer robot 7 transfers the substrate W to any one of the substrate cleaning tanks 12 of the cleaning processing unit 5. When the cleaning process is completed, the immersed substrate W is carried to the next step by the substrate transfer robot 7.

In the cleaning step, the substrate cleaning tank 12
Is filled with a substrate cleaning liquid. When the cleaning liquid is supplied to the substrate cleaning tank 12, the following operation is performed.

Before starting the supply operation, the control valve 2
7. Adjust the flow rate and pressure of the pure water supplied by 7. Further, the air pressure from the air pressure source 36 is adjusted to a predetermined pressure by the electropneumatic regulator 35, and the corrosion resistant regulator 34 is adjusted by the air pressure. Thereby, the nitrogen gas source 31
Is adjusted to a predetermined gas pressure.

In such a state, the nitrogen supply valve 32 is opened,
The nitrogen gas pressure regulator is introduced into the drug solution reservoir container 22 in _A. When the nitrogen gas is introduced into the liquid medicine reservoir container 22 _A,
By the pressure, liquid medicine in the container 22 _A flow rate meter 41, which via a filter 42 is introduced into chemical introducing valve 20 _A. The pressure in the chemical solution supply pipe 40 is detected by a pressure sensor 38. Here, when the pressure in the chemical solution supply pipe 40 fluctuates due to the opening and closing of an adjacent valve of another system, a deviation occurs between the pressure detected by the pressure sensor 38 and the target pressure.
This deviation is calculated by the programmable controller 37,
A command voltage corresponding to the deviation is output to the electropneumatic regulator 35. Then, air at a pressure controlled by the electropneumatic regulator 35 is supplied to the corrosion-resistant regulator 34 as pilot pressure, the valve body 96 of the corrosion-resistant regulator 34 moves up and down, and nitrogen gas having a pressure corresponding to the pilot pressure is supplied to the container _22A.
Given to. As a result, the pressure of the nitrogen gas becomes constant regardless of fluctuations in external factors, a predetermined amount of liquid medicine from the container 22 _A is discharged.

Here, since the pure water is controlled to a constant and constant pressure by the control valve 27 and the chemical is controlled to a constant flow by the corrosion-resistant regulator 34 and the electropneumatic regulator 35, the introduction pressure of the chemical and the supply pressure of the pure water are reduced. Even if it changes, the chemical solution and pure water can be mixed at a constant flow rate. For this reason, a chemical solution having a predetermined mixture ratio can be obtained without being affected by fluctuations due to external factors.

Further, since the chemical solution introduction valve, the drainage valve 25, and the pure water supply valve 23 are integrally disposed in the introduction valve connecting portion 19, the piping space is reduced. Also, since less piping material is required, piping costs are reduced. Further, since the maintenance part is reduced, the maintenance cost is also reduced.

[0049] As shown in Other Embodiments FIG. 8, the inlet valve connection pipe 19, may be formed drainage port 25 _a at the upstream end of the fluid passage 24.
Here, the pure water supply port 23a is formed between the chemical introducing valve 20 _A and draining port 25 _a. With this configuration, the amount of liquid remaining in the fluid passage 24 during drainage is further reduced.

[0050]

In the chemical liquid mixing apparatus according to the present invention, the chemical liquid supply section and the pure water supply section or the drainage discharge section are arranged in the fluid passage section, and the fluid passage section is constituted by one block. The piping connecting them is not required. For this reason, the piping space is reduced, and piping costs and maintenance costs are reduced.

[Brief description of the drawings]

FIG. 1 is a schematic perspective view of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a schematic longitudinal sectional view thereof.

FIG. 3 is a piping circuit diagram of the processing liquid supply unit.

FIG. 4 is a longitudinal sectional view of an introduction valve connecting pipe.

FIG. 5 is a piping circuit diagram thereof.

FIG. 6 is a longitudinal sectional view of a control valve.

FIG. 7 is a longitudinal sectional view of a corrosion-resistant regulator.

FIG. 8 is a diagram corresponding to FIG. 4 of another embodiment.

[Explanation of symbols]

1 substrate cleaning apparatus 5 substrate cleaning unit 12 substrate cleaning bath 13 the cleaning liquid supply section 19 introducing valve connecting pipe 20 _A to 20 _D chemical introducing valve 23 the deionized water supply valve 24 fluid passageway 25 drain valve

──────────────────────────────────────────────────続 き Continued on the front page (56) References JP-A 4-99269 (JP, U) JP-A 4-99267 (JP, U) (58) Fields surveyed (Int. Cl. ⁷ , DB name) H01L 21/304 306 B08B 3/00-3/14

Claims (3)

(57) [Scope of request for utility model registration] 1. A chemical mixing apparatus for a substrate processing apparatus for mixing and supplying a chemical solution and pure water to a substrate processing tank of the substrate processing apparatus, the apparatus comprising one block, one end of which is connected to the substrate processing tank.
And introducing valve connecting pipe which can be, placed in the middle of the inlet valve connecting pipe, said inlet valve connected
A chemical supply valve for supplying a chemical liquid to the tube, which is disposed at the other end of the introduction valve connecting pipe, said inlet valve connected
A pure water supply valve for supplying pure water to the pipe and the introduction valve connection;
A chemical mixing device for a substrate processing apparatus, comprising: a drainage discharge valve for discharging drainage from a tube . 2. The apparatus according to claim 1, wherein said pure water supply valve and said drainage discharge valve are provided in front of each other.
From the other end of the introduction valve connecting pipe, the drainage discharge valve, the pure water
The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is arranged in an order of a supply valve.
Liquid chemical mixing device for placement. 3. The secondary side of the drainage discharge valve and the pure water supply valve.
A flow path connecting the primary side of A drain valve provided in the flow path, The substrate processing apparatus according to claim 1, further comprising:
Chemical mixing device.