JP2023140279A - Reflective plate, display, and method for manufacturing reflective plate - Google Patents

Abstract

To disperse reflected light first, and to manufacture a reflective plate by using a general manufacturing apparatus second.SOLUTION: A reflective plate 12 comprises: a substrate 17; an insulating film 18 that is provided on the substrate 17 and has an irregular surface 18A; and a reflective film 16 that is arranged on a side of an upper layer of the insulating film 18, has a surface extending along the irregular surface 18A, and reflects light. The insulating film 18 includes a plurality of projections 26 arranged at an interval and recesses 27 arranged between the adjacent projections 26, and the irregular surface 18A is formed of surfaces of the plurality of projections 26 and recesses 27. The projections 26 are inclined with respect to a normal direction of a principal surface of the substrate 17. The plurality of projections 26 include a first projection 26α, a second projection 26β adjacent to the first projection 26α at an interval, and a third projection 26γ adjacent to the first projection 26α at an interval. The first projection 26α, second projection 26β, and third projection 26γ are inclined in different directions from each other.SELECTED DRAWING: Figure 4

Description

The technology disclosed in this specification relates to a reflective plate, a display device, and a method for manufacturing a reflective plate.

BACKGROUND ART Conventionally, as an example of a reflective display element and a method for manufacturing the same, the one described in Patent Document 1 below is known. The reflective display element described in Patent Document 1 includes a reflector, a counter substrate facing the reflector, and a liquid crystal layer sandwiched between the reflector and the counter substrate. The reflective plate is provided on a glass substrate, and includes a photosensitive resin layer whose surface layer has a plurality of uneven surfaces inclined in a certain direction, and a reflective film provided on the photosensitive resin layer. .

The method for manufacturing a reflective display element described in Patent Document 1 includes a resin layer forming step of forming a photosensitive resin layer on a glass substrate of a reflective plate, and a step of forming a photosensitive resin layer into a predetermined shape from an oblique direction with respect to the surface of the glass substrate. An asymmetrical cross section tilted in a certain direction is formed by an exposure step of irradiating the photosensitive resin layer with light through a mask having a light-transmitting part and developing the exposed photosensitive resin layer. a step of forming an uneven portion in which a concave portion or a convex portion having a shape is formed in the photosensitive resin layer; a heat treatment step of heat-treating the photosensitive resin layer to make the corners of the concave portion or the convex portion curved; a reflective film forming step of forming a light-reflective reflective film on the transparent resin layer.

Japanese Patent Application Publication No. 2000-105370

In the reflective display element described in Patent Document 1 mentioned above, since the convex portions on the uneven surface of the photosensitive resin layer are uniformly inclined in a certain direction, the light reflected by the reflective film does not travel in the same direction. become. Therefore, when an observer observes an image at a specific position relative to the reflective display element, the image is sufficiently bright, but when the observer observes the image from a position away from the specific position. This may cause the problem that the image becomes extremely dark.

In Embodiment 1 of the method for manufacturing a reflective display element described in Patent Document 1 mentioned above, in the exposure step of exposing the photosensitive resin layer, ultraviolet rays are emitted from a direction inclined at 30 degrees with respect to the normal line of the glass substrate. need to be irradiated. Further, in the second embodiment, it is necessary to support the glass substrate in an inclined posture in the heat treatment step of heat-treating the photosensitive resin layer. Therefore, it was necessary to prepare a special exposure device and a special substrate support device.

The technology described in this specification was developed based on the above-mentioned circumstances. Firstly, it aims to disperse reflected light, and secondly, it uses general-purpose manufacturing equipment. The purpose is to manufacture.

(1) A reflecting plate related to the technology described in this specification includes a substrate, an insulating film provided on the substrate and having an uneven surface, and a surface disposed on the upper layer side of the insulating film that follows the uneven surface. and a reflective film that reflects light, the insulating film including a plurality of convex portions arranged at intervals, and a concave portion disposed between the adjacent convex portions, The uneven surface is constituted by the surfaces of the plurality of convex portions and the concave portions, the convex portions are inclined with respect to the normal direction of the main surface of the substrate, and the plurality of convex portions include a first surface. a convex portion, a second convex portion adjacent to the first convex portion with an interval, and a third convex portion adjacent to the first convex portion with an interval, the first convex portion; The second convex portion and the third convex portion are tilted in different directions.

(2) In addition to the above (1), in the reflector, the first convex portion has a first center of gravity, which is the center of gravity of the outer shape seen in a plane, and a first apex, which is the apex, when viewed in a plane. In the second protrusion, the second center of gravity, which is the center of gravity of the outer shape seen in a plane, and the second vertex, which is the apex, do not match in the second protrusion, and the third protrusion has the following: A third center of gravity, which is the center of gravity of the outer shape seen in a plane, and a third vertex, which is an apex, do not match when viewed in a plane, and the first convex part, the second convex part, and the third convex part are A direction from the first center of gravity toward the first apex when seen in a plan view, a direction from the second center of gravity toward the second apex when seen in a plan view, and a direction from the third center of gravity toward the third apex when seen in a plan view. and the direction toward which they are directed may intersect with each other.

(3) In addition to the above (1) or (2), in the reflecting plate, all the convex portions adjacent to each other at intervals may be inclined in different directions.

(4) In addition to the above (2) or (3), in the reflecting plate, the first convex portion, the second convex portion, and the third convex portion are located at the center of gravity of the first convex portion when viewed from above. a first direction that is a direction toward the first apex; a second direction that is a direction that is a direction toward the second apex from the second center of gravity as seen in a plane; and a second direction that is a direction toward the second apex from the third center of gravity as seen in a plane. The third direction, which is the direction toward , may include an upward vector component in the vertical direction.

(5) In addition to the above (4), the reflector has a rectangular planar shape, and has a first side along the vertical direction and a second side along the horizontal direction. The first convex part, the second convex part, and the third convex part have a length of the first side part "A" and a length of the second side part "B". The angle that the first direction makes with respect to the upward direction in the vertical direction is "θ1", the angle that the second direction makes with respect to the upward direction in the vertical direction is "θ2", and the angle that the first direction makes with the upward direction in the vertical direction is "θ2". When the angle formed by the third direction with respect to the upward direction is "θ3", the angles θ1, θ2, and θ3 may satisfy the following equation (1).

-arctan(B/A)≦θ1, θ2, θ3≦arctan(B/A) (1)

(6) In addition to the above (5), in the reflecting plate, any one of the first convex portion, the second convex portion, and the third convex portion has an angle θ1, θ2, or θ3. , "arctan(B/A)" and "-arctan(B/A)".

(7) A display device related to the technology described in this specification includes the reflective plate according to any one of (1) to (6) above, and a counter substrate disposed opposite to the reflective plate. Be prepared.

(8) A method for manufacturing a reflector related to the technology described in this specification includes forming an insulating film made of a positive-type photosensitive insulating material or a negative-type photosensitive insulating material on a substrate, and If the material is positive type, a light-shielding region that blocks light; and a first semi-transparent region that is arranged adjacent to a part of the outer periphery of the light-shielding region, transmits light, and has a higher light transmittance than the light-shielding region. and a second semi-transparent region that is arranged to surround the light-shielding region and the first semi-transmissive region, and that transmits light and has a light transmittance higher than that of the light-shielding region and lower than that of the first semi-transparent region. The insulating film is exposed to light through a first photomask including a photosensitive insulating material, and when the photosensitive insulating material is of a negative type, a transmissive region that transmits light and a first photomask disposed adjacent to a part of the outer periphery of the transmissive region and that transmits light. a third semi-transmissive region that transmits light and has a lower light transmittance than the transmissive region; and a third semi-transmissive region surrounding the transmissive region and the third semi-transmissive region that transmits light and has a light transmittance lower than that of the transmissive region. By exposing the insulating film through a second photomask including a fourth semi-transmissive region that is lower and higher than the third semi-transmissive region and developing the insulating film, the light-shielding region or A portion that overlaps with the transparent region becomes a convex portion, a portion that overlaps with the first semi-transparent region or the third semi-transparent region becomes a first recess, and overlaps with the second semi-transparent region or the fourth semi-transparent region. An uneven surface is formed on the surface of the insulating film so that a second recess is shallower than the first recess, and the insulating film is heat-treated so that the projection is aligned with the normal to the main surface of the substrate. A reflective film that reflects light is formed on the upper layer side of the insulating film, with the apexes of the convex portion being unevenly distributed on the first recess side.

(9) In addition to the above (8), when the photosensitive insulating material is positive type, the method for manufacturing the reflector plate includes: a first light-shielding region that is the light-shielding region; a second light-shielding region adjacent to the first light-shielding region with a space therebetween; a third light-shielding region which is the light-shielding region and adjacent to the first light-shielding region with a space therebetween; and the first semi-transparent region. a fifth semi-transmissive region arranged adjacent to a part of the outer periphery of the first light-shielding region; and a fifth semi-transmissive region arranged adjacent to a part of the outer periphery of the second light-shielding region. The first photomask includes a sixth semi-transmissive region, and a seventh semi-transmissive region that is the first semi-transmissive region and is arranged adjacent to a part of the outer periphery of the third light-shielding region. , a direction from the center of gravity of the outer shape of the first light-shielding region toward the fifth semi-transparent region, a direction from the center of gravity of the outer shape of the second light-shielding region toward the sixth semi-transparent region, and an outer shape of the third light-shielding region. The insulating film is exposed through the first photomask in a relationship in which the direction from the center of gravity of a first transmissive region, a second transmissive region that is the transmissive region and is adjacent to the first transmissive region with an interval therebetween, and a third transmissive region that is the transmissive region and is adjacent to the first transmissive region with an interval therebetween. a transmissive region, an eighth semi-transmissive region which is the third semi-transmissive region and is arranged adjacent to a part of the outer periphery of the first transmissive region, and a third semi-transmissive region which is the second transmissive region. a ninth semi-transparent region arranged adjacent to a part of the outer periphery of the region; and a tenth semi-transparent region, which is the third semi-transparent region and arranged adjacent to a part of the outer periphery of the third transmissive region. The second photomask includes a direction from the center of gravity of the outer shape of the first transmissive region toward the eighth semi-transparent region, and a direction from the center of gravity of the outer shape of the second transmissive region to the ninth semi-transparent region. exposing the insulating film through the second photomask in which a direction toward the third transmissive region and a direction from the center of gravity of the outer shape of the third transmissive region toward the tenth semi-transmissive region intersect with each other; By developing, the portion of the insulating film that overlaps with the first light-shielding region or the first transmissive region becomes the first convex portion, which is the convex portion, and the portion of the insulating film that overlaps with the first light-shielding region or the first transmissive region becomes the first convex portion, and the second light-shielding region or the second transmissive region becomes the first convex portion. The portion that overlaps with the third light-shielding region or the third transmissive region is the convex portion and is the second convex portion adjacent to the first convex portion with an interval, and the portion that overlaps with the third light-shielding region or the third transmissive region is the convex portion. A third convex portion adjacent to the first convex portion with an interval therebetween, and a portion overlapping with the fifth semi-transparent region or the eighth semi-transparent region serves as a third concave portion which is the first concave portion. , a portion that overlaps with the sixth semi-transparent region or the ninth semi-transparent region becomes a fourth recess that is the first recess, and a portion that overlaps with the seventh semi-transparent region or the tenth semi-transparent region, The second recess is the first recess, and a portion that overlaps with the second semi-transparent region or the fourth semi-transparent region is shallower than the third recess, the fourth recess, and the fifth recess. An uneven surface is formed on the surface of the insulating film so as to form a concave part, and the insulating film is heat-treated to make the first convex part inclined with respect to the normal direction of the main surface of the substrate. The apex of the convex portion is unevenly distributed on the third recess side, the second convex portion is inclined with respect to the normal direction of the main surface of the substrate, and the apex of the second convex portion is unevenly distributed on the fourth recess side. The third protrusion may be tilted with respect to the normal direction of the main surface of the substrate, and the apex of the third protrusion may be unevenly located on the fifth recess side.

(10) In addition to the above (8) or (9), in addition to the above (8) or (9), when the photosensitive insulating material is positive type, the method for manufacturing the reflective plate includes: the insulating film is exposed through the first photomask including the first semi-transparent region adjacent to a half or less of the outer periphery of the insulating film, and when the photosensitive insulating material is negative type; , the insulating film is exposed through the second photomask, which includes the transparent region having a circular planar shape, and the third semi-transparent region adjacent to a half or less of the outer periphery of the transparent region; May be exposed to light.

According to the technology described in this specification, first, reflected light can be dispersed, and second, manufacturing can be performed using a general-purpose manufacturing apparatus.

A plan view showing pixels included in the liquid crystal panel of the liquid crystal display device according to Embodiment 1. Cross-sectional view of the liquid crystal panel along the line ii-ii in Figure 1 Cross-sectional view of the liquid crystal panel along line iii-iii in Figure 1 A plan view showing three convex parts included in a plurality of convex parts Cross-sectional view along the v-v line in Figure 4 of the array substrate Graph showing the reflectance of the reflected light directed in the specular direction out of the reflected light by the reflective film A cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film formed through the film-forming process is exposed through the first photomask in the exposure process. Plan view of the first photomask used in the exposure process A cross-sectional view taken at the same cutting position as FIG. 5 showing the state in which the first insulating film is developed in the development process. A cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film has been heat-treated in the heat treatment process. A plan view showing three convex portions included in a plurality of convex portions according to Embodiment 2. Cross-sectional view along the line xii-xii in Figure 11 of the array substrate A cross-sectional view at the same cutting position as FIG. 11 showing a state in which the first insulating film 1 formed through the film-forming process is exposed through a gray-tone mask in the exposure process. Plan view of gray tone mask used in exposure process A cross-sectional view taken at the same cutting position as FIG. 12 showing a state in which the first insulating film is developed in the development process. A cross-sectional view taken at the same cutting position as FIG. 12 showing a state in which the first insulating film has been heat-treated in the heat treatment process. A plan view showing three convex portions included in a plurality of convex portions according to Embodiment 3. Cross section of the array substrate along line xviii-xviii in Figure 17 FIG. 19 is a plan view of a gray tone mask used in the exposure process. A cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film formed through the film forming process according to Embodiment 4 is exposed through the second photomask in the exposure process. Plan view of the second photomask used in the exposure process A plan view showing three convex parts included in a plurality of convex parts A cross-sectional view taken at the same cutting position as FIG. 5 showing the state in which the first insulating film is developed in the development process. A plan view showing three convex portions included in a plurality of convex portions according to Embodiment 5. Plan view of gray tone mask used in exposure process A plan view of a substrate constituting an array substrate according to Embodiment 6 A plan view showing three convex parts included in a plurality of convex parts. Cross-sectional view taken along the line xxviii-xxviii in FIG. 27 on the array substrate An enlarged plan view of the first convex portion An enlarged plan view of the second convex portion An enlarged plan view of the third convex portion Graph showing polar coordinates related to the verification results of verification experiment 1 A diagram showing the luminance distribution of reflected light within the main surface of the substrate according to Comparative Example 1 of Verification Experiment 2. A diagram showing the luminance distribution of reflected light within the main surface of the substrate according to Comparative Example 2 of Verification Experiment 2. A diagram showing the luminance distribution of reflected light within the main surface of the substrate according to Example 1 of Verification Experiment 2 Side view showing the board installed outdoors A plan view of a substrate constituting an array substrate according to Embodiment 7 A plan view showing three convex parts included in a plurality of convex parts An enlarged plan view of the second convex portion An enlarged plan view of the third convex portion A plan view showing three convex portions included in a plurality of convex portions provided on an array substrate according to Embodiment 8. An enlarged plan view of the first convex portion An enlarged plan view of the second convex portion An enlarged plan view of the third convex portion

<Embodiment 1>
Embodiment 1 will be described with reference to FIGS. 1 to 10. In this embodiment, a reflective liquid crystal display device (display device) 10 will be exemplified. Note that a part of each drawing shows an X-axis, a Y-axis, and a Z-axis, and the drawings are drawn so that the direction of each axis is the direction shown in each drawing.

The reflective liquid crystal display device 10 according to the present embodiment displays images using external light such as sunlight or indoor light. The liquid crystal display device 10 includes a liquid crystal panel 11 that reflects external light and controls the amount of output of the reflected light. Below, the schematic structure of the liquid crystal panel 11 will be explained using FIGS. 1 to 3.

FIG. 1 is a plan view showing a pixel 11PX included in the liquid crystal panel 11. FIG. 2 is a cross-sectional view of the liquid crystal panel 11 taken along line ii-ii in FIG. FIG. 3 is a cross-sectional view of the liquid crystal panel 11 taken along line iii--iii in FIG. As shown in FIG. 1, the liquid crystal panel 11 includes vertically elongated rectangular pixels 11PX when viewed from above. A plurality of pixels 11PX are arranged in a matrix in the plane of the liquid crystal panel 11 at intervals in the X-axis direction and the Y-axis direction.

As shown in FIGS. 2 and 3, the liquid crystal panel 11 includes an array substrate (reflection plate) 12, a counter substrate 13 that faces the array substrate 12 with a space between them, and a space between the array substrate 12 and the counter substrate 13. A liquid crystal layer 14 is sandwiched between the liquid crystal layers 14 and 14. The array substrate 12 includes at least a pixel electrode 15 constituting the pixel 11PX, and a reflective film 16 disposed on the side opposite to the liquid crystal layer 14 with respect to the pixel electrode 15. A plurality of pixel electrodes 15 are arranged in a matrix in the plane of the array substrate 12 at intervals in the X-axis direction and the Y-axis direction. The array substrate 12 includes a backplane circuit that is a circuit for driving the pixels 11PX. The backplane circuit includes at least a TFT (thin film transistor, switching element) connected to the pixel electrode 15, a gate wiring that scans the TFT, and a source wiring that supplies an image signal to the TFT. Similar to the pixel electrode 15, a plurality of TFTs are arranged in a matrix in the plane of the array substrate 12. The pixel electrode 15 is charged to a potential based on an image signal supplied by the source wiring as the TFT is driven by scanning by the gate wiring. Note that the backplane circuit may include a memory circuit (for example, SRAM) that is individually connected to the plurality of pixels 11PX.

As shown in FIGS. 2 and 3, the array substrate 12 includes a substrate 17 made of a glass material or a resin material, and various films are formed on the substrate 17. A plurality of metal films, semiconductor films, etc. forming a backplane circuit are formed on the substrate 17. Further, on the substrate 17, a first insulating film (insulating film) 18 that covers the backplane circuit from the upper layer side, a conductive film disposed on the upper layer side of the first insulating film 18, and a conductive film disposed on the upper layer side of the conductive film are disposed on the substrate 17. a second insulating film 19 disposed on the upper layer side of the metal film, a transparent electrode film disposed on the upper layer side of the second insulating film 19, and an orientation disposed on the upper layer side of the transparent electrode film. The films 20 and 20 are formed so as to overlap in order from the lower layer side.

The first insulating film 18 is made of a positive photosensitive resin material. The positive photosensitive resin material used for the first insulating film 18 has a property that its dissolution rate by a developer increases depending on the amount of exposure. As the photosensitive resin material constituting the first insulating film 18, for example, an acrylic resin material (for example, polymethyl methacrylate resin (PMMA)), which is a type of organic resin material, is used. The first insulating film 18 is thicker than an insulating film made of an inorganic resin material, for example, on the order of several μm. As shown in FIGS. 2 and 3, the first insulating film 18 has an uneven surface 18A. Therefore, the conductive layer 21 and the reflective film 16 stacked on the upper layer side of the first insulating film 18 both have surfaces that follow the uneven surface 18A of the first insulating film 18. That is, the surfaces of the conductive layer 21 and the reflective film 16 have an uneven shape reflecting the uneven surface 18A of the first insulating film 18. Furthermore, a first contact hole 18CH is formed in the first insulating film 18 at a position overlapping with the center portion of the pixel electrode 15. A plurality of first contact holes 18CH are arranged in a matrix in the plane of the array substrate 12, corresponding to the arrangement of the pixel electrodes 15. The conductive film is made of a metal material or a transparent electrode film material. A portion of the conductive film constitutes a conductive layer 21 laminated on the lower layer side of the reflective film 16.

The metal film is made of a metal material (eg, silver alloy, aluminum, aluminum alloy, etc.) that has excellent light reflectivity. A part of the metal film constitutes the reflective film 16. As shown in FIGS. 2 and 3, the surface of the reflective film 16 has an uneven shape that reflects the uneven surface 18A of the first insulating film 18, so it diffuses (scatters) and reflects light, resulting in a paper white color. This contributes to realizing a similar display. The second insulating film 19 is made of resin material. For example, using an organic resin material as the material of the second insulating film 19 is suitable for flattening the surface of the second insulating film 19, that is, the base of the transparent electrode film. A second contact hole 19CH is formed in the second insulating film 19 at a position overlapping the center portion of the pixel electrode 15 . A plurality of second contact holes 19CH are arranged in a matrix in the plane of the array substrate 12, corresponding to the arrangement of the pixel electrodes 15. The transparent electrode film is made of a transparent electrode material such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). The transparent electrode film constitutes the pixel electrode 15. The alignment film 20 is made of a resin material such as polyimide. The surface of the alignment film 20 is subjected to rubbing treatment or photo alignment treatment.

As shown in FIGS. 2 and 3, the array substrate 12 is provided with a contact portion 22 for connecting the pixel electrode 15 and the TFT forming the backplane circuit. The contact portion 22 is arranged to overlap both the first contact hole 18CH formed in the first insulating film 18 and the second contact hole 19CH formed in the second insulating film 19. The contact portion 22 includes a first contact electrode 22A, a second contact electrode 22B, and a third contact electrode 22C. The first contact electrode 22A is located on the lower layer side of the first insulating film 18 and is arranged at a position overlapping with the first contact hole 18CH. The first contact electrode 22A is connected to the backplane circuit. The second contact electrode 22B is located on the upper layer side of the first insulating film 18 and is arranged in a range overlapping both the first contact hole 18CH and the second contact hole 19CH. The second contact electrode 22B is connected to the first contact electrode 22A through the first contact hole 18CH. The second contact electrode 22B is made of a part of the same conductive film as the conductive layer 21. The third contact electrode 22C is located above the second contact electrode 22B and below the second insulating film 19, and is arranged at a position overlapping the second contact hole 19CH. The third contact electrode 22C is connected to the second contact electrode 22B on the lower layer side, and is also connected to the pixel electrode 15 on the upper layer side through the second contact hole 19CH. The third contact electrode 22C is made of a part of the same metal film as the reflective film 16.

As shown in FIGS. 2 and 3, the counter substrate 13 is formed by forming various films on a substrate 23 made of a glass material or a resin material. When a glass material is used as the material of the substrate 23, the refractive index of the substrate 23 is, for example, about 1.53. On the substrate 23, in addition to color filters, spacers, etc., a counter electrode 24 and an alignment film 25 are laminated. The color filter is disposed at a position overlapping with the pixel electrode 15, and together with the pixel electrode 15 constitutes a pixel 11PX. The spacer protrudes toward the liquid crystal layer 14 side, and its protruding end surface can come into contact with the inner surface of the array substrate 12. The spacer makes it possible to maintain the distance between the pair of substrates 12 and 13, that is, the cell gap (thickness of the liquid crystal layer 14). The counter electrode 24 is made of the same transparent electrode material as the pixel electrode 15. A common potential is supplied to the counter electrode 24. Therefore, an electric field is generated between the counter electrode 24 and the pixel electrode 15 charged by the TFT, and the alignment state of the liquid crystal molecules contained in the liquid crystal layer 14 can be controlled by the electric field. It is considered possible. Note that by supplying a common potential to the reflective film 16 and making the reflective film 16 have the same potential as the counter electrode 24, it is possible to form an auxiliary capacitance between the reflective film 16 and the pixel electrode 15. Like the alignment film 20 on the array substrate 12 side, the alignment film 25 is made of a resin material such as polyimide, and its surface has been subjected to a rubbing process or a photo-alignment process.

Here, the uneven surface 18A of the first insulating film 18 will be explained in detail. The first insulating film 18 includes a plurality of protrusions 26 arranged at intervals and a recess 27 arranged between adjacent protrusions 26, as shown in FIGS. 1 to 3. The uneven surface 18A is composed of surfaces of a plurality of convex portions 26 and concave portions 27. The convex portion 26 has a circular planar shape. The outer diameter of the convex portion 26 viewed from a plane is, for example, about 6 μm. The plurality of convex portions 26 are randomly distributed within the plane of the substrate 17 of the array substrate 12 . Specifically, in the plurality of convex portions 26, the direction in which two convex portions 26 adjacent to each other with the concave portion 27 in between is irregular, and the direction between the two convex portions 26 adjacent to each other with the concave portion 27 in between is irregular. Each interval is irregular. A plurality of convex portions 26 are arranged on the pixel electrode 15 so as to overlap each other when viewed from above. The recesses 27 are arranged in the plane of the substrate 17 in areas where the plurality of protrusions 26 and the first contact holes 18CH are not arranged.

Here, three representative protrusions 26 shown in FIG. 4 from among the plurality of protrusions 26 will be described in detail. FIG. 4 is a plan view showing three protrusions 26 included in the plurality of protrusions 26. In FIG. 4, the outer shape of each convex portion 26 viewed from a plane is shown by a circle. FIG. 5 is a sectional view taken along the line v-v in FIG. 4 of the array substrate 12. As shown in FIG. 4, the plurality of convex portions 26 include a first convex portion 26α, a second convex portion 26β adjacent to the first convex portion 26α with an interval therebetween, and a second convex portion 26β adjacent to the first convex portion 26α with an interval therebetween. At least the third convex portions 26γ adjacent to each other are included. In addition, in the following, when distinguishing the configuration related to the convex portion 26, the suffix "α" is added to the code of the configuration related to the first convex part, and the suffix "β" is added to the code of the configuration related to the second convex part. ", and the suffix "γ" is added to the reference numeral of the structure related to the third convex portion, and when the reference numeral is referred to generically without distinction, no suffix is added to the reference numeral.

As shown in FIGS. 4 and 5, the convex portion 26 is inclined with respect to the Z-axis direction, that is, the normal direction of the main surface of the substrate 17. Specifically, in the convex portion 26, the center of gravity 26C of the outer shape seen in a plane does not match the apex 26V which is the protruding tip (the highest portion). The "center of gravity" here refers to the position of the arithmetic mean taken over all points belonging to the outline of the convex portion 26 viewed in a plane, and is synonymous with the geometric center. Therefore, the convex portion 26 is configured such that the direction from the center of gravity 26C to the apex 26V is inclined with respect to the normal direction of the main surface of the substrate 17. In this embodiment, since the outer shape of the convex portion 26 when viewed in a plan view is circular, the center of gravity 26C of the convex portion 26 coincides with the center of the outer shape of the convex portion 26 in a plan view. The angle that the direction from the center of gravity 26C to the apex 26V of the convex portion 26 makes with respect to the normal direction of the main surface of the substrate 17 (hereinafter referred to as “the inclination angle of the convex portion 26”) is, for example, about less than 20°. be done. The convex portion 26 has an asymmetric cross-sectional shape taken along the Z-axis direction at a position passing through the center of gravity 26C and the apex 26V. Further, the convex portion 26 has a rounded tapered shape from the protruding base end toward the apex 26V constituting the external shape seen in a plan view. Most of the outer shape of the cut surface of the convex portion 26 is formed by a curve. Note that in FIGS. 1 to 3, illustrations of the convex portion 26 and the concave portion 27 are simplified, and illustrations of the center of gravity 26C and the apex 26V are omitted.

In this way, by configuring the convex portion 26 to be inclined with respect to the normal direction of the main surface of the substrate 17, the light reflected by the portion of the reflective film 16 that overlaps with the convex portion 26 can be directed in the regular reflection direction. can proceed in different directions. As a result, the traveling direction of the light reflected by the reflective film 16 does not match the traveling direction of the light specularly reflected at the interface between the substrate 23 of the counter substrate 13 and the polarizing plate, that is, the traveling direction of the light related to reflection. It becomes easier for the observer to visually recognize the image. Moreover, by adjusting the inclination of the convex portion 26, that is, the position of the apex 26V with respect to the center of gravity 26C in a plan view, the height of the convex portion 26, etc., the reflective film can be adjusted, for example, as shown by the arrow in FIG. It becomes possible for the light reflected by the substrate 16 to travel at an angle close to the normal direction of the main surface of the substrate 17. By allowing the reflected light to travel in this manner, for example, when the liquid crystal display device 10 is applied to a display part of a signage used outdoors or a smart street light, a large amount of light can be supplied to the viewer. . This allows the viewer to view a bright image. Specifically, most of the external light that enters the display parts of signage, smart street lights, and the like used outdoors tends to have an incident angle of about 80°. When the light having an incident angle of 80° enters the substrate 23 of the counter substrate 13, it is refracted. The light refracted by the substrate 23 is incident on the reflective film 16 at an incident angle of about 40°. In order to cause light having an incident angle of 40° to travel at an angle close to the normal direction of the main surface of the substrate 17, the inclination angle of the convex portion 26 may be set to less than 20°. However, if the inclination angle of the convex portion 26 is too large, the light is likely to be diffusely reflected at the interface of the color filter provided on the counter substrate 13 and become stray light, which may deteriorate the contrast performance. Therefore, by setting the inclination angle of the convex portion 26 to 17.5° or less, the generation of stray light as described above can be suppressed and good contrast performance can be obtained.

Here, in order to verify the influence that the configuration of the convex portion 26 has on the light reflected by the reflective film 16, the following comparative experiment was conducted. In this comparative experiment, a liquid crystal panel 11 having a convex portion 26 having the configuration described in the previous paragraph was used as an example, and a liquid crystal panel having a convex portion having a configuration in which the center of gravity and the apex coincided was used as a comparative example. The liquid crystal panel according to the comparative example has the same configuration as the liquid crystal panel 11 according to the example except for the configuration of the convex portion. The liquid crystal panel 11 according to the example and the liquid crystal panel according to the comparative example were each irradiated with external light, and the amount of reflected light directed in the specular reflection direction was measured. The experimental results are shown in FIG. FIG. 6 is a graph showing the reflectance of the reflected light directed in the specular reflection direction among the reflected light by the reflective film 16. In FIG. 6, the vertical axis is the reflectance (unit: "%"). The reflectance in FIG. 6 is the ratio of the amount of reflected light in the specular reflection direction, with the amount of light incident on the reflective film 16 as a reference (100%). According to the experimental results shown in FIG. 6, it was found that the liquid crystal panel 11 according to the example had a lower reflectance of reflected light in the specular reflection direction than the liquid crystal panel according to the comparative example. The reason for this is thought to be that the convex portion 26 is configured to be inclined with respect to the normal direction of the principal surface of the substrate 17, making it difficult for the light reflected by the reflective film 16 to be regularly reflected.

As shown in FIG. 4, the first protrusion 26α, the second protrusion 26β, and the third protrusion 26γ included in the plurality of protrusions 26 are inclined in different directions. Specifically, the first convex portion 26α is inclined diagonally upward to the right as shown in FIG. 4 . The second convex portion 26β is inclined to the right as shown in FIG. The third convex portion 26γ is inclined diagonally upward to the left as shown in FIG. The traveling direction of the light reflected by the reflective film 16 differs depending on the direction in which the convex portion 26 is inclined. In this embodiment, the inclination of the convex portion 26, that is, the position of the apex 26V with respect to the center of gravity 26C as seen in a plane, and the convex portion are determined so that the light reflected by the reflective film 16 travels at an angle close to the normal direction of the main surface of the substrate 17. The height of the portion 26 and the like are adjusted. Therefore, the traveling direction of each reflected light from the portion of the reflective film 16 that overlaps with the first convex portion 26α, the portion that overlaps with the second convex portion 26β, and the portion that overlaps with the third convex portion 26γ is as follows. Although both angles are close to the normal direction of the main surface of the substrate 17, they differ somewhat depending on the direction in which the convex portions 26α, 26β, and 26γ are inclined. This allows the traveling direction of the light reflected by the reflective film 16 to be dispersed, and prevents the light reflected by the reflective film 16 from traveling in the same direction. The plurality of convex portions 26 shown in FIG. 1 are similar to the three convex portions 26α, 26β, and 26γ shown in FIG. 4, such that adjacent convex portions 26 spaced apart are inclined in different directions. That is, within the main surface of the array substrate 12, all the convex parts 26 that are adjacent to each other at intervals are tilted in different directions, and the directions in which they are tilted are random.

More specifically, as shown in FIG. 4, in the first convex portion 26α, the direction from the first center of gravity 26Cα, which is the center of gravity 26C of the outer shape seen in a plane, toward the first vertex 26Vα, which is the apex 26V, is as shown in FIG. The first direction D1 is indicated by the arrow. The second convex portion 26β has a second direction D2 shown by an arrow in FIG. It has become. The third convex portion 26γ has a third direction D3 shown by an arrow in FIG. It has become. The first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ are arranged in a first direction D1, which is a direction from the first center of gravity 26Cα to the first apex 26Vα, and from the second center of gravity 26Cβ to the second apex 26Vβ. The vertices 26Vα, 26Vβ, and 26Vγ are arranged in different directions so that the second direction D2, which is the direction toward are unevenly distributed. Thereby, the traveling direction of the light reflected by the reflective film 16 can be dispersed well.

Next, the recess 27 will be explained. As shown in FIGS. 4 and 5, the recess 27 has a first recess 27A disposed adjacent to a part of the outer shape (outer periphery) of the protrusion 26 when viewed in a plane, and a first recess 27A that connects the protrusion 26 and the first recess. and a second recess 27B disposed to surround the second recess 27B. The first recessed portion 27A is arranged adjacent to a part of the protruding base end portion that constitutes the outer shape of the convex portion 26 when viewed in a plane. The first recess 27A extends along a part of the outer shape of the convex portion 26 when viewed from above, and has an arc shape with a predetermined width when viewed from above. The formation range of the first recess 27A in the circumferential direction of the protrusion 26 is a range that is less than half the length of the outer circumference of the protrusion 26. The first recess 27A is unevenly located on the apex 26V side when viewed from the center of gravity 26C of the convex portion 26. The direction from the center of gravity 26C of the protrusion 26 toward the apex 26V intersects with the center position of the first recess 27A in the circumferential direction of the protrusion 26. In other words, the first recess 27A is configured to extend on the outer periphery of the convex portion 26 within an angular range of 180° or less about the apex 26V. The first recess 27A is deeper than the second recess 27B, and its depth is, for example, about 3 μm. That is, the bottom surface of the first recess 27A is lower than the bottom surface of the second recess 27B, and the difference therebetween is, for example, about 2 μm. The second recesses 27B are arranged in the plane of the substrate 17 in areas where the plurality of projections 26, the first contact holes 18CH, and the first recesses 27A are not arranged. The second recess 27B is shallower than the first recess 27A, and has a depth of, for example, about 1 μm. That is, the bottom surface of the second recess 27B is higher than the bottom surface of the first recess 27A.

Three first recesses 27A arranged adjacent to each of the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ shown in FIG. 4 will be described. As shown in FIG. 4, these three first concave portions 27A include a third concave portion 27Aα arranged adjacent to a part of the outer shape of the first convex portion 26α when viewed from a plane, and a second convex portion 26β. The fourth recess 27Aβ is arranged adjacent to a part of the outer shape of the third convex part 26γ when viewed from the plane, and the fifth recess 27Aγ is arranged adjacent to a part of the outer shape of the third protrusion 26γ when viewed from the plane. It will be done. The third recess 27Aα is unevenly distributed on the first apex 26Vα side (diagonally upper right side in FIG. 4) when viewed from the first center of gravity 26Cα of the first convex portion 26α. The fourth recess 27Aβ is unevenly distributed on the second apex 26Vβ side (on the right side in FIG. 4) when viewed from the second center of gravity 26Cβ of the second convex portion 26β. The fifth recess 27Aγ is unevenly distributed on the third apex 26Vγ side (diagonally upper left side in FIG. 4) when viewed from the third center of gravity 26Cγ of the third convex portion 26γ. In this way, the third recess 27Aα, the fourth recess 27Aβ, and the fifth recess 27Aγ are unevenly distributed in different directions when viewed from the centers of gravity 26Cα, 26Cβ, and 26Cγ of the respective projections 26α, 26β, and 26γ.

This embodiment has the above structure, and a method for manufacturing the array substrate 12 will be described next. The method for manufacturing the array substrate 12 according to the present embodiment includes a first step of forming a backplane circuit on the substrate 17, a second step of forming and patterning the first insulating film 18, and forming a conductive film. a third step of forming and patterning the metal film; a fourth step of forming and patterning the metal film; a fifth step of forming and patterning the second insulating film 19; and forming and patterning the transparent electrode film. The method includes a sixth step and a seventh step of forming an alignment film 20 and performing an alignment treatment. By performing the first step, a backplane circuit and first contact electrode 22A are formed. By performing the second step, an uneven surface 18A is formed on the surface of the first insulating film 18, and a first contact hole 18CH is formed. By performing the third step, the conductive layer 21 and the second contact electrode 22B are formed. By performing the fourth step, the reflective film 16 and the third contact electrode 22C are formed. By performing the fifth step, a second contact hole 19CH is formed in the second insulating film 19. By performing the sixth step, the pixel electrode 15 is formed. By performing the seventh step, an alignment film 20 that has been subjected to alignment treatment is formed. Below, the second step will mainly be explained using FIGS. 7 to 10.

The second step includes a film forming step of forming the first insulating film 18 on the substrate 17, an exposure step of exposing the formed first insulating film 18, and developing the exposed first insulating film 18. The process includes a developing process and a heat treatment process of heat-treating the developed first insulating film 18. 7 to 10 will be explained. FIG. 7 is a cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film 18 formed through the film-forming process is exposed through the first photomask 50 in the exposure process. FIG. 8 is a plan view of the first photomask 50 used in the exposure process. FIG. 9 is a cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film 18 has been developed in the development process. FIG. 10 is a cross-sectional view taken at the same cutting position as FIG. 5, showing a state where the first insulating film 18 has been heat-treated in the heat treatment step.

In the film forming process, a first insulating film 18 made of a positive photosensitive resin material is formed on the substrate 17 so as to cover the backplane circuit. In the exposure process, the deposited first insulating film 18 is exposed using an exposure device and a first photomask 50. Here, the first photomask 50 will be explained. The first photomask 50 is a so-called halftone mask. As shown in FIG. 7, the first photomask 50 includes a transparent base material 51 having sufficiently high light transmittance, a light shielding film 52 formed on the main surface of the base material 51, and a transparent base material 51 having a sufficiently high light transmittance. A first semi-transparent film 53 is formed on the light shielding film 52 and a part thereof is laminated on the light shielding film 52, and a second semi-transparent film 54 is laminated on the first semi-transparent film 53. The light shielding film 52 blocks exposure light from a light source of an exposure device, and has a transmittance of approximately 0% for the exposure light. The first semi-transparent film 53 and the second semi-transparent film 54 transmit exposure light from a light source of an exposure device with a predetermined transmittance. The first semi-transparent film 53 and the second semi-transparent film 54 both have higher exposure light transmittance than the exposure light transmittance of the light shielding film 52, for example, about 10% to 70%. Note that in FIG. 7, the exposure light irradiated onto the first insulating film 18 is represented by a downward arrow.

The light-shielding film 52, the first semi-transparent film 53, and the second semi-transparent film 54 are each patterned to have a predetermined distribution pattern within the plane of the base material 51. The light shielding film 52 is selectively disposed in a position of the first insulating film 18 that overlaps with a portion where the convex portion 26 is planned to be formed, and is not placed in a position where it overlaps with a portion where the concave portion 27 and the first contact hole 18CH are planned to be formed. It is said to be formed. The light shielding film 52 has a circular planar shape, and a plurality of light shielding films 52 are randomly arranged at intervals within the plane of the base material 51. The first semi-transparent film 53 is selectively disposed at a position of the first insulating film 18 that overlaps with a portion where the convex portion 26 and the concave portion 27 are planned to be formed, and a position where the first semi-transparent film 53 overlaps with a portion where the first contact hole 18CH is planned to be formed. It is said that it does not form. The second semi-transparent film 54 is selectively disposed in a position overlapping with the portion of the first insulating film 18 where the convex portion 26 and the second concave portion 27B are planned to be formed. No formation is made at a position that overlaps with the portion to be formed.

The first photomask 50 has a light-shielding area 50LS that blocks exposure light, a transmission area that transmits the exposure light, and a light-shielding area 50LS that blocks exposure light, based on the patterns of the light-shielding film 52, the first semi-transparent film 53, and the second semi-transparent film 54. It has a first semi-transparent region 50HT1 that semi-transmits exposure light, and a second semi-transmissive region 50HT2 that semi-transmits exposure light with a lower transmittance than the first semi-transparent region 50HT1. The light shielding region 50LS coincides with the formation range of the light shielding film 52. The transmissive region coincides with the overlapping range of the non-forming range of the light shielding film 52, the non-forming range of the first semi-transparent film 53, and the non-forming range of the second semi-transmissive film 54. The transmission region is arranged to overlap with a portion of the first insulating film 18 where the first contact hole 18CH is to be formed. The first semi-transparent region 50HT1 is arranged adjacent to a part of the outer periphery of the light shielding region 50LS. The first semi-transmissive region 50HT1 coincides with the overlapping range of the non-forming range of the light shielding film 52, the forming range of the first semi-transmissive film 53, and the non-forming range of the second semi-transmissive film 54. The second semi-transparent region 50HT2 coincides with the overlapping range of the non-formation range of the light shielding film 52, the formation range of the first semi-transmission film 53, and the formation range of the second semi-transmission film 54.

The light-shielding region 50LS and the first semi-transmissive region 50HT1 of the first photomask 50 will be described in detail using FIG. 8. FIG. 8 is a plan view showing a range of the first photomask 50 that corresponds to the range of the array substrate 12 shown in FIG. In addition, in FIG. 8, the light-shielding region 50LS, the first semi-transmissive region 50HT1, and the second semi-transmissive region 50HT2 are illustrated in different hatching shapes. As shown in FIG. 8, the light-shielding region 50LS includes a first light-shielding region 50LS1, a second light-shielding region 50LS2 spaced from the first light-shielding region 50LS1, and a second light-shielding region 50LS2 spaced apart from the first light-shielding region 50LS1. A third light shielding region 50LS3 arranged therein is included. The first light-shielding region 50LS1 is arranged at a position overlapping a portion of the first insulating film 18 where the first convex portion 26α is planned to be formed. The second light-shielding region 50LS2 is arranged at a position overlapping a portion of the first insulating film 18 where the second convex portion 26β is planned to be formed. The third light-shielding region 50LS3 is arranged at a position overlapping a portion of the first insulating film 18 where the third convex portion 26γ is planned to be formed. The first semi-transmissive region 50HT1 includes a fifth semi-transmissive region 50HT3 arranged adjacent to a part of the outer periphery of the first light shielding region 50LS1, and a fifth semi-transmissive region 50HT3 arranged adjacent to a part of the outer periphery of the second light shielding region 50LS2. The third light-shielding region 50LS3 includes a sixth semi-transmissive region 50HT4 and a seventh semi-transmissive region 50HT5 arranged adjacent to a part of the outer periphery of the third light-shielding region 50LS3. The fifth semi-transparent region 50HT3 is arranged at a position overlapping a portion of the first insulating film 18 where the third recess 27Aα is planned to be formed. The sixth semi-transparent region 50HT4 is arranged at a position overlapping a portion of the first insulating film 18 where the fourth recess 27Aβ is planned to be formed. The seventh semi-transparent region 50HT5 is arranged at a position overlapping a portion of the first insulating film 18 where the fifth recess 27Aγ is planned to be formed. The direction from the center of gravity 50LS1C of the outer shape of the first light shielding region 50LS1 toward the fifth semi-transparent region 50HT3, the direction from the center of gravity 50LS2C of the outer shape of the second light shielding region 50LS2 toward the sixth semi-transparent region 50HT4, and the direction of the outer shape of the third light shielding region 50LS3. The direction from the center of gravity 50LS3C of the outer shape toward the seventh semi-transparent region 50HT5 intersects with each other.

In the exposure process, as shown in FIG. 7, exposure light emitted from a light source of an exposure apparatus is applied to the first insulating film 18 through the first photomask 50 having the above-described configuration. As a result, the first insulating film 18 is selectively exposed. Specifically, a portion of the first insulating film 18 that overlaps with the light-shielding region 50LS of the first photomask 50 is not exposed to light. The portion of the first insulating film 18 that overlaps with the first semi-transparent region 50HT1 has a lower exposure amount than the portion that overlaps with the transmissive region, but has a higher exposure amount than the portion that overlaps with the second semi-transparent region 50HT2. . Although the portion of the first insulating film 18 that overlaps with the second semi-transmissive region 50HT2 has a higher exposure amount than the portion that overlaps with the light shielding region 50LS, it has a higher exposure amount than the portion that overlaps with the first semi-transparent region 50HT1. Less is. Further, the first insulating film 18 is exposed to light over its entire depth in a portion that overlaps with the transmission region of the first photomask 50.

In the development process, the first insulating film 18 that was selectively exposed in the exposure process is developed with a developer. During development, as shown in FIG. 9, the first insulating film 18 is removed over a deeper range as the exposed portion increases, and the unexposed portion remains unremoved. Specifically, a portion of the first insulating film 18 that overlaps with the light-shielding region 50LS of the first photomask 50 remains throughout the entire depth, and becomes a portion that constitutes the convex portion 26 . Of the portions of the first insulating film 18 that overlap with the first semi-transparent region 50HT1 and the second semi-transparent region 50HT2 of the first photomask 50, the top surface side portion is selectively removed, and the bottom surface side portion is selectively removed. remain. The portion of the first insulating film 18 that overlaps with the first semi-transparent region 50HT1 is removed more deeply on the upper surface side than the portion that overlaps with the second semi-transparent region 50HT2, thereby forming the second recess 27B. This is the part that constitutes the first recess 27A, which is deeper than the first recess 27A. The portion of the first insulating film 18 that overlaps with the second semi-transparent region 50HT2 is removed more shallowly on the upper surface side than the portion that overlaps with the first semi-transparent region 50HT1. This is the part that constitutes the second recess 27B, which is shallower than the second recess 27B. Further, a portion of the first insulating film 18 that overlaps with the transparent region of the first photomask 50 is removed to the full depth, and a first contact hole 18CH is formed (see FIG. 3).

More specifically, a portion of the first insulating film 18 that overlaps with the first light shielding region 50LS1 becomes a portion that constitutes the first convex portion 26α (see FIGS. 4 and 8). A portion of the first insulating film 18 that overlaps with the second light shielding region 50LS2 becomes a portion that constitutes the second convex portion 26β. A portion of the first insulating film 18 that overlaps with the third light shielding region 50LS3 becomes a portion that constitutes the third convex portion 26γ. A portion of the first insulating film 18 that overlaps with the fifth semi-transparent region 50HT3 becomes a portion forming the third recess 27Aα. A portion of the first insulating film 18 that overlaps with the sixth semi-transparent region 50HT4 becomes a portion forming the fourth recess 27Aβ. A portion of the first insulating film 18 that overlaps with the seventh semi-transparent region 50HT5 becomes a portion forming the fifth recess 27Aγ. A direction from the center of gravity of the outer shape of the first convex portion 26α toward the third recess 27Aα, a direction from the center of gravity of the outer shape of the second convex portion 26β toward the fourth recess 27Aβ, and a center of gravity of the outer shape of the third convex portion 26γ before heat treatment. and the direction toward the fifth recess 27Aγ intersect with each other (see FIG. 4). At the stage where the development step is completed as described above, the portion of the first insulating film 18 that constitutes the convex portion 26 has a substantially cylindrical shape with a substantially constant diameter over the entire height range, and the top surface is substantially flat, and the peripheral surface (side surface) is parallel to the Z-axis direction. The portion of the first insulating film 18 constituting the recess 27 has a substantially flat bottom surface and side surfaces parallel to the Z-axis direction.

In the heat treatment process, heat treatment is performed on the substrate 17 having the first insulating film 18 that has undergone the development process. In this heat treatment step, the first insulating film 18 is heated to a temperature higher than the melting point of the photosensitive resin material forming the first insulating film 18 (for example, about 180° C.). Then, a deformation called "thermal sag" occurs in the first insulating film 18. As a result, the portion of the first insulating film 18 that constitutes the convex portion 26 has a rounded top surface and rounded side surfaces, thereby forming the convex portion 26 in a tapered shape. Similarly, the portion of the first insulating film 18 that forms the recess 27 has a rounded bottom and side surfaces, forming the recess 27 . Here, the first recess 26A disposed adjacent to a part of the outer periphery of the protrusion 26 is deeper than the second recess 26B surrounding the protrusion 26 and the first recess 26A. Therefore, when the heat treatment is performed, the convex portion 26 is inclined with respect to the normal direction of the main surface of the substrate 17, and the apex 26V is unevenly distributed on the first concave portion 26A side. More specifically, the first convex portion 26α is configured such that the first vertex 26Vα is unevenly distributed on the third concave portion 27Aα side (see FIG. 4). The second convex portion 26β is configured such that the second vertex 26Vβ is unevenly distributed on the fourth recess 27Aβ side. The third convex portion 26γ has a configuration in which the third vertex 26Vγ is unevenly distributed on the fifth recess 27Aγ side. As a result, the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ are in a state in which the first direction D1, the second direction D2, and the third direction D3 intersect with each other and are tilted in different directions. Become. In the manner described above, the uneven surface 18A of the first insulating film 18 is formed.

After the second step is performed as described above, when the third step is performed, a conductive film is formed and patterned to form the conductive layer 21 and the second contact electrode 22B. After that, when the fourth step is performed, a metal film is formed and patterned to form a reflective film 16 and a third contact portion 22C. The uneven surface 18A has a first convex portion 26α, a second convex portion 26β, and a third convex portion 26γ that are inclined in different directions from each other as described above. , the traveling direction of the light reflected by the reflective film 16 can be dispersed well.

As described above, the array substrate (reflector) 12 of this embodiment includes the substrate 17, the first insulating film (insulating film) 18 provided on the substrate 17 and having the uneven surface 18A, and the first insulating film 18. The first insulating film 18 includes a plurality of convex portions 26 arranged at intervals, and a reflective film 16 disposed on the upper layer side and having a surface that follows the uneven surface 18A and reflecting light. a concave portion 27 disposed between adjacent convex portions 26 , an uneven surface 18A is constituted by the surfaces of a plurality of convex portions 26 and a plurality of concave portions 27 , and the convex portion 26 is aligned with the normal line of the main surface of the substrate 17 . The plurality of convex portions 26 include a first convex portion 26α, a second convex portion 26β adjacent to the first convex portion 26α with a space therebetween, and a second convex portion 26β adjacent to the first convex portion 26α with a space therebetween. The first protrusion 26α, the second protrusion 26β, and the third protrusion 26γ are tilted in different directions.

In this way, the reflective film 16 disposed on the upper layer side of the first insulating film 18 reflects light with its surface that follows the uneven surface 18A of the first insulating film 18. Since the plurality of convex portions 26 constituting the uneven surface 18A are inclined with respect to the normal direction of the principal surface of the substrate 17, the light reflected by the reflective film 16 cannot be caused to travel in a direction different from the direction of specular reflection. can. Since the plurality of convex portions 26 include a first convex portion 26α, a second convex portion 26β, and a third convex portion 26γ that are inclined in mutually different directions, the traveling direction of the light reflected by the reflective film 16 can be dispersed. Can be done. According to this embodiment, it is possible to disperse reflected light.

Further, in the first convex portion 26α, the first center of gravity 26Cα, which is the center of gravity 26C of the outer shape seen in the plane, and the first vertex 26Vα, which is the apex 26V, do not match when viewed in the plane, and the second convex portion 26β , the second center of gravity 26Cβ, which is the center of gravity 26C of the outer shape when seen in a plane, and the second vertex 26Vβ, which is the vertex 26V, do not match when seen in a plane, and the third convex portion 26γ is the center of gravity of the outer shape when seen in a plane. The third center of gravity 26Cγ, which is 26C, and the third vertex 26Vγ, which is the vertex 26V, do not match when viewed in a plane, and the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ are a direction from the first center of gravity 26Cα to the first apex 26Vα, a direction from the second center of gravity 26Cβ to the second apex 26Vβ when seen in a plane, and a direction from the third center of gravity 26Cγ to the third apex 26Vγ when seen in a plane. , are assumed to intersect with each other. In this way, in each of the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ, the center of gravity 26C of the external shape seen in a plane does not match the apex 26V, and the apex 26V is unevenly distributed. Therefore, the shape is inclined with respect to the normal direction of the main surface of the substrate 17. The first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ are arranged so that the directions from the centers of gravity 26Cα, 26Cβ, 26Cγ to the vertices 26Vα, 26Vβ, 26Vγ intersect with each other. Since they are unevenly distributed in different directions, the traveling direction of the light reflected by the reflective film 16 can be dispersed well.

Further, all the convex portions 26 that are adjacent to each other at intervals are inclined in different directions. In this way, the traveling direction of the light reflected by the reflective film 16 can be further dispersed.

Further, the liquid crystal display device (display device) 10 according to the present embodiment includes the array substrate 12 described above and a counter substrate 13 disposed opposite to the array substrate 12. According to such a liquid crystal display device 10, since the traveling direction of the reflected light by the reflective film 16 of the array substrate 12 is dispersed, an observer who observes an image can view the image from various positions with respect to the liquid crystal display device 10. Good images can be observed.

Furthermore, the method for manufacturing the array substrate 12 according to the present embodiment includes forming a first insulating film 18 made of a positive photosensitive insulating material on the substrate 17, and forming a light-shielding region 50LS that blocks light and a light-shielding region 50LS. a first semi-transmissive region 50HT1 that is arranged adjacent to a part of the outer periphery, transmits light and has a higher light transmittance than the light-shielding region 50LS, and is arranged to surround the light-shielding region 50LS and the first semi-transmissive region 50HT1; The first insulating film 18 is exposed through a first photomask 50 including a second semi-transmissive region 50HT2 that transmits light and has a light transmittance higher than that of the light-shielding region 50LS and lower than that of the first semi-transmissive region 50HT1. By developing the first insulating film 18, the portion of the first insulating film 18 that overlaps with the light-shielding region 50LS becomes a convex portion 26, the portion that overlaps with the first semi-transparent region 50HT1 becomes a first recess 27A, and a second By forming an uneven surface 18A on the surface of the first insulating film 18 and heat-treating the first insulating film 18 so that the portion overlapping with the semi-transparent region 50HT2 becomes a second recess 27B shallower than the first recess 27A, The convex portion 26 is inclined with respect to the normal direction of the main surface of the substrate 17, the apex 26V of the convex portion 26 is unevenly distributed on the first concave portion 27A side, and a reflective film is formed to reflect light toward the upper layer side of the first insulating film 18. 16 is formed into a film.

After a first insulating film 18 made of a positive photosensitive insulating material is formed on the substrate 17 , the first insulating film 18 is exposed to light through a first photomask 50 . When the first insulating film 18 made of a positive photosensitive insulating material is exposed through the first photomask 50, a portion of the first insulating film 18 that overlaps with the first semi-transparent region 50HT1 becomes a second semi-transparent region 50HT1. The amount of exposure is greater than the portion overlapping with the region 50HT2, and the portion overlapping with the light shielding region 50LS is not exposed. When the first insulating film 18 is developed, an uneven surface 18A is formed on the surface of the first insulating film 18. The portion of the first insulating film 18 that overlaps with the light shielding region 50LS becomes the convex portion 26 of the uneven surface 18A. A portion of the first insulating film 18 that overlaps with the first semi-transparent region 50HT1 becomes the first recess 27A of the uneven surface 18A. The first recess 27A is arranged adjacent to a part of the outer periphery of the protrusion 26. A portion of the first insulating film 18 that overlaps with the second semi-transparent region 50HT2 becomes the second recess 27B of the uneven surface 18A. The second recess 27B is arranged to surround the protrusion 26 and the first recess 27A.

When the developed first insulating film 18 is heat-treated, a deformation called "thermal sag" occurs in the first insulating film 18. Here, since the first recess 27A disposed adjacent to a part of the outer periphery of the protrusion 26 is deeper than the second recess 27B surrounding the protrusion 26 and the first recess 27A, the protrusion 26 is inclined with respect to the normal direction of the main surface of the substrate 17, and the apex 26V is unevenly located on the first recess 27A side. A reflective film 16 is formed on the upper layer side of the heat-treated first insulating film 18. The reflective film 16 can reflect light with its surface that follows the uneven surface 18A of the first insulating film 18. Since the uneven surface 18A includes the inclined convex portions 26 as described above, the light reflected by the reflective film 16 can be caused to travel in a direction different from the direction of specular reflection.

As described above, the convex portions 26 having the above-mentioned slope can be formed on the first insulating film 18 using the first photomask 50 used when exposing the first insulating film 18. There is no need to prepare an exposure device or a special substrate support device. Therefore, the array substrate 12 can be manufactured using a general-purpose manufacturing apparatus used for exposure and heat treatment. Moreover, the direction in which the convex portions 26 are inclined can be freely set based on the pattern design of the first photomask 50. This increases the degree of freedom in designing the convex portion 26. According to this embodiment, manufacturing can be performed using a general-purpose manufacturing apparatus.

Further, a first light-shielding region 50LS1 which is the light-shielding region 50LS, a second light-shielding region 50LS2 which is the light-shielding region 50LS and adjacent to the first light-shielding region 50LS1 with an interval, and a first light-shielding region 50LS1 which is the light-shielding region 50LS. a third light-shielding region 50LS3 adjacent to each other with a space therebetween; a fifth semi-transmissive region 50HT3 which is a first semi-transmissive region 50HT1 and is arranged adjacent to a part of the outer periphery of the first light-shielding region 50LS1; A sixth semi-transmissive region 50HT4, which is the semi-transmissive region 50HT1 and is arranged adjacent to a part of the outer periphery of the second light-shielding region 50LS2, and a part of the outer periphery of the third light-shielding region 50LS3, which is the first semi-transmissive region 50HT1. A first photomask 50 including a seventh semi-transmissive region 50HT5 disposed adjacent to the first light-shielding region 50HT5, and a direction from the center of gravity 50LS1C of the outer shape of the first light shielding region 50LS1 toward the fifth semi-transmissive region 50HT3; A relationship in which the direction from the center of gravity 50LS2C of the outer shape of the second light shielding region 50LS2 toward the sixth semi-transmissive region 50HT4 and the direction from the center of gravity 50LS3C of the outer shape of the third light shielding region 50LS3 toward the seventh semi-transparent region 50HT5 intersect with each other. By exposing the first insulating film 18 through the photomask 50 and developing the first insulating film 18, the portion of the first insulating film 18 that overlaps with the first light-shielding region 50LS1 becomes the convex portion 26. The first convex portion 26α, which overlaps with the second light-shielding region 50LS2, becomes the second convex portion 26β, which is the convex portion 26 and is adjacent to the first convex portion 26α with an interval, and overlaps with the third light-shielding region 50LS3. The portion is the convex portion 26 and is the third convex portion 26γ adjacent to the first convex portion 26α with an interval, and the portion that overlaps with the fifth semi-transparent region 50HT3 is the third concave portion 27Aα which is the first concave portion 27A. The portion that overlaps with the sixth semi-transparent region 50HT4 becomes the fourth recess 27Aβ which is the first recess 27A, and the portion which overlaps with the seventh semi-transparent region 50HT5 becomes the fifth recess 27Aγ which is the first recess 27A. An uneven surface 18A is formed on the surface of the first insulating film 18 so that the portion overlapping with the second semi-transparent region 50HT2 becomes a second recess 27B that is shallower than the third recess 27Aα, the fourth recess 27Aβ, and the fifth recess 27Aγ. Then, by heat-treating the first insulating film 18, the first convex portion 26α is inclined with respect to the normal direction of the main surface of the substrate 17, and the first vertex 26Vα of the first convex portion 26α is moved toward the third concave portion 27Aα. The second convex portion 26β is inclined with respect to the normal direction of the main surface of the substrate 17, the second apex 26Vβ of the second convex portion 26β is unevenly distributed on the fourth concave portion 27Aβ side, and the third convex portion 26γ is inclined with respect to the normal direction of the main surface of the substrate 17, and the third apex 26Vγ of the third convex portion 26γ is unevenly located on the fifth recess 27Aγ side.

In this way, when the first insulating film 18 made of a positive photosensitive insulating material is exposed through the first photomask 50, the fifth part of the first insulating film 18, which is the first semi-transparent region 50HT1, is exposed to light through the first photomask 50. The portions that overlap with each of the semi-transparent region 50HT3, the sixth semi-transparent region 50HT4, and the seventh semi-transparent region 50HT5 have a higher exposure amount than the portions that overlap with the second semi-transparent region 50HT2, and the light shielding region 50LS Portions overlapping each of the first light-shielding region 50LS1, the second light-shielding region 50LS2, and the third light-shielding region 50LS3 are not exposed. When the first insulating film 18 is developed, the portion of the first insulating film 18 that overlaps with the first light-shielding region 50LS1 becomes the first convex portion 26α, which is the convex portion 26, and the portion that overlaps with the second light-shielding region 50LS2. becomes the second protrusion 26β, which is the protrusion 26, and the portion that overlaps with the third light-shielding region 50LS3 becomes the third protrusion 26γ, which is the protrusion 26. A space is left between the first convex portion 26α and the second convex portion 26β. A space is left between the first convex portion 26α and the third convex portion 26γ. The part of the first insulating film 18 that overlaps with the fifth semi-transparent region 50HT3 becomes the third recess 27Aα, which is the first recess 27A, and the part which overlaps with the sixth semi-transparent region 50HT4 becomes the third recess 27A, which is the first recess 27A. The portion that overlaps with the seventh semi-transparent region 50HT5 becomes the fifth recess 27Aγ, which is the first recess 27A. The direction from the center of gravity of the outer shape of the first convex portion 26α toward the third recess 27Aα, the direction from the center of gravity of the outer shape of the second convex portion 26β toward the fourth recess 27Aβ, and the direction from the center of gravity of the outer shape of the third convex portion 26γ toward the third recess 27Aα. The direction toward the concave portion 27Aγ crosses each other.

When the developed first insulating film 18 is heat-treated, the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ are all inclined with respect to the normal direction of the main surface of the substrate 17. The first convex portion 26α has a configuration in which the apex 26V is unevenly distributed on the third concave portion 27Aα side. The second convex portion 26β has a configuration in which the apex 26V is unevenly distributed on the fourth concave portion 27Aβ side. The third convex portion 26γ has a configuration in which the apex 26V is unevenly distributed on the fifth concave portion 27Aγ side. As a result, the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ are tilted in different directions. The reflective film 16 formed on the upper layer side of the heat-treated first insulating film 18 can reflect light with its surface that follows the uneven surface 18A of the first insulating film 18. Since the uneven surface 18A includes the first convex portion 26α, the second convex portion 26β, and the third convex portion 26γ tilted in different directions as described above, the traveling direction of the reflected light by the reflective film 16 is dispersed. can be done.

Further, the first insulating film is passed through the first photomask 50 including a light-shielding region 50LS having a circular planar shape and a first semi-transmissive region 50HT1 disposed adjacently within half or less of the outer circumference of the light-shielding region 50LS. The film 18 is exposed. In this way, when the first insulating film 18 is developed, the convex part 26, the first concave part 27A disposed adjacent to less than half of the outer circumference of the convex part 26, and the convex part 26 and a second recess 27B surrounding the first recess 27A. When the developed first insulating film 18 is heat-treated, the first recess 27A, which is deeper than the second recess 27B, is disposed adjacent to less than half of the outer circumference of the projection 26. The portion 26 is highly reliably inclined with respect to the normal direction of the main surface of the substrate 17 in such a manner that the apex 26V is unevenly distributed toward the first recess 27A side. Thereby, the direction in which the convex portion 26 is inclined can be easily controlled.

<Embodiment 2>
Embodiment 2 will be described with reference to FIGS. 11 to 16. In this second embodiment, the configuration of the first recess 127A is changed and a gray tone mask 60 is used in the second step. Note that redundant explanations regarding the structure, operation, and effects similar to those of the first embodiment described above will be omitted.

FIG. 11 is a plan view showing three protrusions 126 included in the plurality of protrusions 126. FIG. 12 is a cross-sectional view of the array substrate 112 taken along the line xii-xii in FIG. As shown in FIGS. 11 and 12, the first insulating film 118 provided on the array substrate 112 according to this embodiment is provided with a first recess 127A that is narrower than that in the first embodiment described above. The first recess 127A is deeper than in the first embodiment described above. Note that the formation range of the convex portion 126 in the first concave portion 127A in the circumferential direction is the same as in the first embodiment described above. The convex portion 126 is inclined with respect to the normal direction of the main surface of the substrate 117 so that the apex 126V is unevenly distributed on the first concave portion 127A side.

The second step included in the method for manufacturing the array substrate 112 will be described. In the exposure step included in the second step, a gray tone mask (first photomask) 60 is used. The gray tone mask 60 will be explained in detail using FIGS. 13 and 14. FIG. 13 is a cross-sectional view taken at the same cutting position as FIG. 11, showing a state in which the first insulating film 118 formed through the film-forming process is exposed through the gray-tone mask 60 in the exposure process. FIG. 14 is a plan view of a graytone mask 60 used in the exposure process. As shown in FIG. 13, the gray tone mask 60 includes a transparent base material 61 having sufficiently high light transmittance and a light shielding film 62 formed on the main surface of the base material 61. The light shielding film 62 blocks exposure light from a light source of an exposure device, and has a transmittance of approximately 0% for the exposure light. A plurality of slits 63 having a resolution lower than that of the exposure device are formed in a part of the light shielding film 62. In the portion of the light-shielding film 62 where the slits 63 are formed, the transmittance of the exposure light is higher than the transmittance of the exposure light in the light-shielding film 52, for example, about 10% to 70%. The transmittance of the exposure light at the portion of the light-shielding film 62 where the slits 63 are formed changes depending on the distribution density of the slits 63, and the higher the distribution density of the slits 63, the higher the transmittance of the exposure light tends to be. . An aperture with a resolution higher than the resolution of the exposure device is formed in a part of the light shielding film 62. The transmittance of the exposure light through the opening of the light shielding film 62 is approximately 100%. Note that in FIG. 13, the exposure light irradiated onto the first insulating film 118 is represented by a downward arrow.

The distribution pattern of the light shielding film 62 will be explained in detail. The portion of the light shielding film 62 where the slit 63 and the opening are not formed is selectively arranged at a position overlapping with the portion of the first insulating film 118 where the convex portion 126 is planned to be formed. The portion of the light shielding film 62 where the slit 63 is formed is selectively arranged at a position overlapping with the portion of the first insulating film 118 where the recess 127 is planned to be formed. The portion of the light shielding film 62 where the slits 63 are formed includes a first portion 62A in which the distribution density of the slits 63 is higher than a second portion 62B described below, and a first portion 62A in which the distribution density of the slits 63 is lower than the first portion 62A. 2 parts 62B are included. The first portion 62A is selectively disposed at a position of the first insulating film 118 that overlaps a portion of the first insulating film 118 where the first recess 127A is planned to be formed. The second portion 62B is selectively disposed at a position of the first insulating film 118 that overlaps a portion of the first insulating film 118 where the second recess 127B is to be formed. The opening of the light shielding film 62 is arranged at a position overlapping with a portion of the first insulating film 118 where the first contact hole is to be formed.

The gray tone mask 60 includes, based on the distribution pattern of the light shielding film 62, a light shielding area 60LS that blocks exposure light, a transmission area that transmits the exposure light, a first semi-transparent area 60HT1 that partially transmits the exposure light, and a first It has a second semi-transparent region 60HT2 that semi-transmits exposure light with a lower transmittance than the semi-transparent region 60HT1. The light shielding region 60LS coincides with a portion of the light shielding film 62 where the slit 63 and the opening are not formed. The transmission region coincides with the opening of the light shielding film 62. The first semi-transparent region 60HT1 is arranged adjacent to a part of the outer periphery of the light shielding region 60LS. The first semi-transparent region 60HT1 coincides with the first portion 62A included in the portion of the light shielding film 62 where the slit 63 is formed. The first semi-transparent region 60HT1 according to the present embodiment is narrower than the first semi-transparent region 50HT1 described in the first embodiment, and has a slightly higher light transmittance. The second semi-transparent region 60HT2 coincides with the second portion 62B included in the portion of the light shielding film 62 where the slit 63 is formed.

In FIG. 14, the light-shielding region 60LS, the first semi-transmissive region 60HT1, and the second semi-transmissive region 60HT2 are shown in different hatching shapes. As shown in FIG. 14, the light-shielding region 60LS includes a first light-shielding region 60LS1 disposed at a position overlapping with a portion where the first convex portion 126α is planned to be formed, and a position overlapping with a portion where the second convex portion 126β is planned to be formed. A second light-shielding region 60LS2 disposed in the third convex portion 126γ and a third light-shielding region 60LS3 disposed in a position overlapping the portion where the third convex portion 126γ is to be formed are included. The first semi-transparent region 60HT1 includes a fifth semi-transparent region 60HT3 located at a position overlapping with a portion where the third recess 127Aα is planned to be formed, and a fifth semi-transparent region 60HT3 located at a position overlapping with a portion where the fourth recess 127Aβ is scheduled to be formed. A sixth semi-transparent region 60HT4 and a seventh semi-transparent region 60HT5 arranged at a position overlapping the portion where the fifth recess 127Aγ is to be formed are included. The direction from the center of gravity 60LS1C of the outer shape of the first light shielding region 60LS1 toward the fifth semi-transparent region 60HT3, the direction from the center of gravity 60LS2C of the outer shape of the second light shielding region 60LS2 toward the sixth semi-transparent region 60HT4, and the direction of the outer shape of the third light shielding region 60LS3. The direction from the center of gravity 60LS3C of the outer shape toward the seventh semi-transparent region 60HT5 intersects with each other.

In the exposure process, as shown in FIG. 13, when the first insulating film 118 is irradiated with exposure light emitted from the light source of the exposure apparatus through the gray tone mask 60 configured as described above, the first insulating film 118 is 1 insulating film 118 is selectively exposed. The exposure pattern of the first insulating film 118 using the gray tone mask 60 is generally the same as in the first embodiment described above. When a development step is performed after the exposure step, as shown in FIG. 15, the exposed portion of the first insulating film 118 is selectively removed according to the amount of exposure. FIG. 15 is a cross-sectional view taken at the same cutting position as FIG. 12, showing a state in which the first insulating film 118 has been developed in the development process. The first insulating film 118 in the developed state is generally the same as that in the first embodiment described above. When a heat treatment process is performed after the development process, a deformation called "thermal sag" occurs in the first insulating film 118, as shown in FIG. 16. FIG. 16 is a cross-sectional view taken at the same cutting position as FIG. 12, showing a state where the first insulating film 118 has been heat-treated in the heat treatment step. The first insulating film 118 in the heat-treated state is generally the same as that in the first embodiment described above.

<Embodiment 3>
Embodiment 3 will be described with reference to FIGS. 17 to 19. Embodiment 3 shows a configuration in which the configuration of the convex portion 226 and the like are changed from Embodiment 2 described above. Note that redundant explanations regarding the structure, operation, and effects similar to those of the second embodiment described above will be omitted.

FIG. 17 is a plan view showing three protrusions 226 included in the plurality of protrusions 226. FIG. 18 is a cross-sectional view of the array substrate 212 taken along the line xviii-xviii in FIG. As shown in FIG. 17, the convex portion 226 provided on the first insulating film 218 of the array substrate 212 according to this embodiment has a planar shape with an arcuate portion cut out from a circle. The outer shape of the convex portion 226 when viewed from a plane is defined by a circular arc portion 226A having a central angle exceeding 180° and a linear portion 226L that intersects both end positions of the circular arc portion 226A. The linear portion 226L forming the outer shape of the convex portion 226 has an infinite radius of curvature, which is larger than the radius of curvature of the arcuate portion 226A. In the convex portion 226 having a linear portion 226L with a large radius of curvature as part of its outer shape, the center of gravity 226C of the outer shape is located on the opposite side of the linear portion 226L with respect to the center of the arcuate portion 226A. As shown in FIGS. 17 and 18, the first recess 227A of the recesses 227 provided in the first insulating film 218 is arranged adjacent to the linear portion 226L that constitutes the outer shape of the protrusion 226. . The first recess 227A extends along the linear portion 226L and has a band shape with a predetermined width when viewed from above.

The gray tone mask 260 used in the second exposure step included in the method for manufacturing the array substrate 212 will be described. The configuration of the gray tone mask 260 is as described in the second embodiment, and the differences from the second embodiment will be mainly described below. FIG. 19 is a plan view of a graytone mask 260 used in the exposure process. The gray tone mask 260 includes a light-shielding region 260LS that blocks exposure light, a transmission region that transmits the exposure light, a first semi-transmission region 260HT1 that partially transmits the exposure light, and a transmittance lower than that of the first semi-transmission region 260HT1. It has a second semi-transparent region 260HT2 that semi-transmits exposure light. In FIG. 19, the light-shielding region 260LS, the first semi-transmissive region 260HT1, and the second semi-transmissive region 260HT2 are shown in different hatching shapes. The light-shielding region 260LS has a planar shape obtained by cutting out an arcuate portion from a circle, and matches the planar shape of the convex portion 226. The first semi-transparent region 260HT1 is arranged adjacent to a part of the outer periphery of the light shielding region 260LS. The first semi-transparent region 260HT1 has a band shape with a predetermined width when viewed from above, and matches the planar shape of the first recess 227A.

As shown in FIG. 19, the light-shielding region 260LS includes a first light-shielding region 260LS1 disposed at a position overlapping with a portion where the first convex portion 226α is planned to be formed, and a position overlapping with a portion where the second convex portion 226β is planned to be formed. A second light-shielding region 260LS2 disposed in the third convex portion 226γ and a third light-shielding region 260LS3 disposed in a position overlapping the portion where the third convex portion 226γ is to be formed are included. The first semi-transparent region 260HT1 includes a fifth semi-transparent region 260HT3 located at a position overlapping with a portion where the third recess 227Aα is planned to be formed, and a fifth semi-transparent region 260HT3 located at a position overlapping with a portion where the fourth recess 227Aβ is scheduled to be formed. The seventh semi-transparent region 260HT4 includes a sixth semi-transparent region 260HT4 and a seventh semi-transparent region 260HT5 located at a position overlapping with the portion where the fifth recess 227Aγ is planned to be formed. The direction from the center of gravity 260LS1C of the outer shape of the first light shielding region 260LS1 toward the fifth semi-transparent region 260HT3, the direction from the center of gravity 260LS2C of the outer shape of the second light shielding region 260LS2 toward the sixth semi-transparent region 260HT4, and the direction of the outer shape of the third light shielding region 260LS3. The direction from the center of gravity 260LS3C of the outer shape toward the seventh semi-transparent region 260HT5 intersects with each other.

<Embodiment 4>
Embodiment 4 will be described with reference to FIGS. 20 to 23. In this fourth embodiment, the material of the first insulating film 318 and the like are changed from the first embodiment described above. Note that redundant explanations regarding the structure, operation, and effects similar to those of the first embodiment described above will be omitted.

FIG. 20 is a cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film 318 formed through the film-forming process is exposed through the second photomask 70 in the exposure process. FIG. 21 is a plan view of the second photomask 70 used in the exposure process. The first insulating film 318 provided on the array substrate 312 according to this embodiment is made of a negative type photosensitive resin material, as shown in FIG. The negative photosensitive resin material used for the first insulating film 318 has a property that its dissolution rate by a developer decreases depending on the amount of exposure.

In the second exposure step included in the method for manufacturing the array substrate 312 according to the present embodiment, since the material of the first insulating film 318 is a negative photosensitive resin material, a second photosensitive resin film having the following configuration is used. A mask 70 is used. The second photomask 70 will be explained. The second photomask 70 is a halftone mask like the first photomask 50 of the first embodiment described above. Like the first photomask 50 of Embodiment 1, the second photomask 70 includes a base material 71, a light shielding film, a first semi-transparent film 72, and a second semi-transparent film 73. Explanation of rates etc. will be omitted.

The light-shielding film, the first semi-transparent film 72, and the second semi-transparent film 73 included in the second photomask 70 are each patterned to have a predetermined distribution pattern within the plane of the base material 71. The light shielding film is selectively disposed at a position of the first insulating film 318 that overlaps with a portion where the first contact hole is planned to be formed, and is not formed at a position where it overlaps with a portion where the convex portion 326 and the recessed portion 327 are planned to be formed. be done. The first semi-transparent film 72 is selectively disposed at a position of the first insulating film 318 that overlaps with a portion where the concave portion 327 is planned to be formed, and is not formed at a position where it overlaps with a portion where the convex portion 326 is planned to be formed. Ru. The second semi-transparent film 73 is selectively disposed at a position of the first insulating film 318 that overlaps with a portion where the first convex portion 327A is planned to be formed, and overlaps with a portion where the convex portion 326 and the second concave portion 327B are planned to be formed. It is considered non-forming in the position where it occurs. The light-shielding film, the first semi-transparent film 72, and the second semi-transparent film 73 are not formed at positions that overlap with the portions of the first insulating film 318 where the convex portions 326 are planned to be formed. The portions where the light-shielding film, the first semi-transparent film 72, and the second semi-transparent film 73 are not formed have a circular planar shape, and are randomly arranged at intervals within the plane of the base material 71.

The second photomask 70 has a transmission region 70T that transmits the exposure light, a light-shielding region that blocks the exposure light, and a light-shielding region 70T that transmits the exposure light based on the patterns of the light-shielding film, the first semi-transmissive film 72, and the second semi-transparent film 73. It has a third semi-transparent region 70HT1 that semi-transmits the exposure light, and a fourth semi-transmissive region 70HT2 that semi-transmits the exposure light with a higher transmittance than the third semi-transparent region 70HT1. The transmissive region 70T coincides with the formation range of the non-forming portions of the light shielding film, the first semi-transparent film 72, and the second semi-transparent film 73. The light-shielding region coincides with the formation range of the light-shielding film. The third semi-transparent region 70HT1 is arranged adjacent to a part of the outer periphery of the transparent region 70T. The third semi-transparent region 70HT1 coincides with the formation range of the second semi-transparent film 73. The fourth semi-transparent region 70HT2 coincides with the overlapping range of the region where the first semi-transparent film 72 is formed and the region where the second semi-transparent film 73 is not formed.

The transmissive region 70T and third semi-transmissive region 70HT1 of the second photomask 70 will be described in detail using FIGS. 21 and 22. In FIG. 21, the transparent region 70T, the third semi-transparent region 70HT1, and the fourth semi-transparent region 70HT2 are shown in different hatching shapes. FIG. 22 is a plan view showing three protrusions 326 included in the plurality of protrusions 326. As shown in FIG. 21, the transmission region 70T includes a first transmission region 70T1, a second transmission region 70T2 spaced from the first transmission region 70T1, and a second transmission region 70T2 spaced apart from the first transmission region 70T1. A third transmission region 70T3 arranged therein is included. As shown in FIGS. 21 and 22, the first transmission region 70T1 is arranged at a position overlapping a portion of the first insulating film 318 where the first convex portion 326α is planned to be formed. The second transmission region 70T2 is arranged at a position overlapping a portion of the first insulating film 318 where the second convex portion 326β is planned to be formed. The third transmission region 70T3 is arranged at a position overlapping a portion of the first insulating film 318 where the third convex portion 326γ is planned to be formed. As shown in FIG. 21, the third semi-transmissive region 70HT1 includes an eighth semi-transmissive region 70HT3 disposed adjacent to a part of the outer periphery of the first transmissive region 70T1, and a part of the outer periphery of the second transmissive region 70T2. A ninth semi-transparent region 70HT4 is disposed adjacent to the third transmissive region 70T3, and a tenth semi-transmissive region 70HT5 is disposed adjacent to a part of the outer periphery of the third transmissive region 70T3. As shown in FIGS. 21 and 22, the eighth semi-transparent region 70HT3 is arranged at a position overlapping a portion of the first insulating film 318 where the third recess 327Aα is planned to be formed. The ninth semi-transparent region 70HT4 is arranged at a position overlapping a portion of the first insulating film 318 where the fourth recess 327Aβ is planned to be formed. The tenth semi-transparent region 70HT5 is arranged at a position overlapping a portion of the first insulating film 318 where the fifth recess 327Aγ is planned to be formed. The direction from the center of gravity 70T1C of the outer shape of the first transmissive region 70T1 to the eighth semi-transparent region 70HT3, the direction from the center of gravity 70T2C of the outer shape of the second transmissive region 70T2 to the ninth semi-transparent region 70HT4, and the direction of the third transmissive region 70T3. The direction from the center of gravity 70T3C of the outer shape toward the tenth semi-transparent region 70HT5 intersects with each other.

In the exposure process, as shown in FIG. 20, exposure light emitted from a light source of an exposure apparatus is irradiated onto the first insulating film 318 through the second photomask 70 configured as described above. As a result, the first insulating film 318 is selectively exposed. Specifically, a portion of the first insulating film 318 that overlaps with the transmission region 70T of the second photomask 70 is exposed to light over the entire depth. The portion of the first insulating film 318 that overlaps with the third semi-transmissive region 70HT1 has a higher exposure amount than the portion that overlaps with the light shielding region, but has a lower exposure amount than the portion that overlaps with the fourth semi-transparent region 70HT2. . Although the portion of the first insulating film 318 that overlaps with the fourth semi-transmissive region 70HT2 has a lower exposure amount than the portion that overlaps with the transmissive region 70T, it has a lower exposure amount than the portion that overlaps with the third semi-transparent region 70HT1. There are many. Further, a portion of the first insulating film 318 that overlaps with the light-blocking region of the second photomask 70 is not exposed to light.

In the development process, the first insulating film 318 that was selectively exposed in the exposure process is developed with a developer. During development, as shown in FIG. 23, the first insulating film 318 is removed over a deeper range where the exposure amount is smaller, and the portion where the exposure amount is greater than a predetermined amount remains unremoved. FIG. 23 is a cross-sectional view taken at the same cutting position as FIG. 5, showing a state in which the first insulating film 318 has been developed in the development process. Specifically, a portion of the first insulating film 318 that overlaps with the transparent region 70T of the second photomask 70 remains throughout the entire depth, and becomes a portion forming the convex portion 326. Of the portions of the first insulating film 318 that overlap with the third semi-transparent region 70HT1 and the fourth semi-transparent region 70HT2 of the second photomask 70, the top surface side portion is selectively removed, and the bottom surface side portion is selectively removed. remain. The portion of the first insulating film 318 that overlaps with the third semi-transparent region 70HT1 is removed more deeply on the upper surface side than the portion that overlaps with the fourth semi-transparent region 70HT2, so that the second recess 327B This is the part that constitutes the first recess 327A which is deeper than the first recess 327A. The portion of the first insulating film 318 that overlaps with the fourth semi-transparent region 70HT2 is removed more shallowly on the upper surface side than the portion that overlaps with the third semi-transparent region 70HT1, so that the first recess 327A This is the part that constitutes the second recess 327B, which is shallower than the second recess 327B. Further, a portion of the first insulating film 318 that overlaps with the light-blocking region of the second photomask 70 is removed to the full depth, and a first contact hole is formed.

More specifically, a portion of the first insulating film 318 that overlaps with the first transmission region 70T1 becomes a portion that constitutes the first convex portion 326α (see FIGS. 21 and 22). A portion of the first insulating film 318 that overlaps with the second transmission region 70T2 becomes a portion forming the second convex portion 326β. A portion of the first insulating film 318 that overlaps with the third transmission region 70T3 becomes a portion forming the third convex portion 326γ. A portion of the first insulating film 318 that overlaps with the eighth semi-transparent region 70HT3 becomes a portion forming the third recess 327Aα. A portion of the first insulating film 318 that overlaps with the ninth semi-transparent region 70HT4 becomes a portion forming the fourth recess 327Aβ. A portion of the first insulating film 318 that overlaps with the tenth semi-transparent region 70HT5 becomes a portion forming the fifth recess 327Aγ. A direction from the center of gravity of the outer shape of the first convex portion 326α toward the third recess 327Aα, a direction from the center of gravity of the outer shape of the second convex portion 326β toward the fourth recess 327Aβ, and a center of gravity of the outer shape of the third convex portion 326γ before heat treatment. and the direction toward the fifth recess 327Aγ intersect with each other (see FIG. 22).

At the stage where the development step is completed as described above, the portion of the first insulating film 318 that constitutes the convex portion 326 has a substantially cylindrical shape with a substantially constant diameter over the entire height range, and the top surface is substantially flat, and the peripheral surface (side surface) is parallel to the Z-axis direction. The portion of the first insulating film 318 constituting the recess 327 has a substantially flat bottom surface and side surfaces parallel to the Z-axis direction. After that, when a heat treatment process is performed, deformation called "thermal sag" occurs in the first insulating film 318. As a result, the portion of the first insulating film 318 that constitutes the convex portion 326 has a rounded top surface and rounded side surfaces, and becomes a tapered convex portion 326 (see FIG. 10). Similarly, the portion of the first insulating film 318 that forms the recess 327 has a rounded bottom and side surfaces, forming the recess 327 . After the second step is performed as described above, a third step and a fourth step are performed to form a conductive layer, a reflective film, and the like. The formed reflective film has an uneven surface along the uneven surface 318A of the first insulating film 318 serving as the base.

As described above, the method for manufacturing the array substrate 312 according to the present embodiment includes forming the first insulating film 318 made of a negative photosensitive insulating material on the substrate 317, and forming the transmitting region 70T through which light passes; A third semi-transmissive region 70HT1 that is arranged adjacent to a part of the outer periphery of the transmissive region 70T, transmits light and has a lower light transmittance than the transmissive region 70T, and surrounds the transmissive region 70T and the third semi-transmissive region 70HT1. The first insulating film 318 is exposed to the first insulating film 318 through the second photomask 70, which includes a fourth semi-transmissive region 70HT2, which transmits light and has a light transmittance lower than the transmissive region 70T and higher than the third semi-transmissive region 70HT1. By exposing and developing the first insulating film 318, the portion of the first insulating film 318 that overlaps with the transmissive region 70T becomes a convex portion 326, and the portion that overlaps with the third semi-transparent region 70HT1 becomes a first recess 327A. An uneven surface 318A is formed on the surface of the first insulating film 318, and the first insulating film 318 is heat-treated so that the portion overlapping with the fourth semi-transparent region 70HT2 becomes a second recess 327B that is shallower than the first recess 327A. By doing so, the convex portion 326 is inclined with respect to the normal direction of the main surface of the substrate 317, the apex 326V of the convex portion 326 is unevenly distributed on the first concave portion 327A side, and light is directed to the upper layer side of the first insulating film 318. A reflective film is formed.

After a first insulating film 318 made of a negative photosensitive insulating material is formed on the substrate 317 , the first insulating film 318 is exposed to light through the second photomask 70 . When the first insulating film 318 made of a negative photosensitive insulating material is exposed through the second photomask 70, the portion of the first insulating film 318 that overlaps with the third semi-transparent region 70HT1 becomes a fourth semi-transparent region. The amount of exposure is smaller than the portion that overlaps with the region 70HT2, and the amount of exposure is the largest in the portion that overlaps with the transmissive region 70T.

When the first insulating film 318 is developed, an uneven surface 318A is formed on the surface of the first insulating film 318. A portion of the first insulating film 318 that overlaps with the transmission region 70T becomes a convex portion 326 of the uneven surface 318A. A portion of the first insulating film 318 that overlaps with the third semi-transparent region 70HT1 becomes the first recess 327A of the uneven surface 318A. The first recess 327A is arranged adjacent to a part of the outer periphery of the protrusion 326. A portion of the first insulating film 318 that overlaps with the fourth semi-transparent region 70HT2 becomes a second recess 327B of the uneven surface 318A. The second recess 327B is arranged to surround the protrusion 326 and the first recess 327A.

When the developed first insulating film 318 is heat-treated, a deformation called "thermal sag" occurs in the first insulating film 318. Here, since the first recess 327A disposed adjacent to a part of the outer periphery of the protrusion 326 is deeper than the second recess 327B surrounding the protrusion 326 and the first recess 327A, the protrusion 326 is inclined with respect to the normal direction of the main surface of the substrate 317, and the apex 326V is unevenly located on the first recess 327A side. A reflective film is formed on the upper layer side of the heat-treated first insulating film 318. The reflective film can reflect light with its surface that follows the uneven surface 318A of the first insulating film 318. Since the uneven surface 318A includes the inclined convex portions 326 as described above, the light reflected by the reflective film can be caused to travel in a direction different from the direction of specular reflection.

As described above, the convex portions 326 having the above-mentioned slope can be formed on the first insulating film 318 by the second photomask 70 used when exposing the first insulating film 318, so that special There is no need to prepare an exposure device or a special substrate support device. Therefore, the array substrate 312 can be manufactured using a general-purpose manufacturing apparatus used for exposure and heat treatment. Furthermore, the direction in which the convex portions 326 are inclined can be freely set based on the pattern design of the second photomask 70. This increases the degree of freedom in designing the convex portion 326. According to this embodiment, manufacturing can be performed using a general-purpose manufacturing apparatus.

Further, a first transmitting region 70T1 which is the transmitting region 70T, a second transmitting region 70T2 which is the transmitting region 70T and adjacent to the first transmitting region 70T1 with an interval, and a first transmitting region 70T1 which is the transmitting region 70T. a third transmissive region 70T3 adjacent to the first transmissive region 70T3 with a space therebetween; A ninth semi-transparent region 70HT4, which is the semi-transmissive region 70HT1 and is arranged adjacent to a part of the outer periphery of the second transmissive region 70T2, and a third semi-transmissive region 70HT1, which is arranged adjacent to a part of the outer periphery of the third transmissive region 70T3. A second photomask 70 including a tenth semi-transmissive region 70HT5 disposed adjacent to the second transmissive region 70HT5, and a direction from the center of gravity of the outer shape of the first transmissive region 70T1 toward the eighth semi-transmissive region 70HT3; A second photomask in which a direction from the center of gravity of the outer shape of the transmissive region 70T2 toward the ninth semi-transparent region 70HT4 and a direction from the center of gravity of the outer shape of the third transmissive region 70T3 toward the tenth semi-transparent region 70HT5 intersect with each other. By exposing the first insulating film 318 through 70 and developing the first insulating film 318, a portion of the first insulating film 318 that overlaps with the first transmission region 70T1 becomes a first convex portion which is the convex portion 326. 326α, and the portion that overlaps with the second transmission region 70T2 is the convex portion 326, and the second convex portion 326β adjacent to the first convex portion 326α with an interval, and the portion that overlaps with the third transmission region 70T3 is, The convex portion 326 is a third convex portion 326γ adjacent to the first convex portion 326α with an interval, and the portion that overlaps with the eighth semi-transparent region 70HT3 is the first concave portion 327A, a third concave portion 327Aα. The portion that overlaps with the ninth semi-transparent region 70HT4 becomes the fourth recess 327Aβ, which is the first recess 327A, and the portion that overlaps with the tenth semi-transparent region 70HT5 becomes the fifth recess 327Aγ, which is the first recess 327A. An uneven surface 318A is formed on the surface of the first insulating film 318 so that the portion overlapping with the transmission region 70HT2 becomes a second recess 327B shallower than the third recess 327Aα, the fourth recess 327Aβ, and the fifth recess 327Aγ. By heat-treating the first insulating film 318, the first convex portion 326α is inclined with respect to the normal direction of the main surface of the substrate 317, and the first apex 326Vα of the first convex portion 326α is unevenly distributed on the third concave portion 327Aα side. , the second convex portion 326β is inclined with respect to the normal direction of the main surface of the substrate 317, the second apex 326Vβ of the second convex portion 326β is unevenly distributed on the fourth concave portion 327Aβ side, and the third convex portion 326γ is tilted toward the substrate 317. is inclined with respect to the normal direction of the main surface of the third convex portion 326γ, so that the third vertex 326Vγ of the third convex portion 326γ is unevenly located on the fifth recessed portion 327Aγ side.

In this way, when the first insulating film 318 made of a negative photosensitive insulating material is exposed through the second photomask 70, the eighth part of the first insulating film 318, which is the third semi-transparent region 70HT1, The portions that overlap with each of the semi-transparent region 70HT3, the ninth semi-transparent region 70HT4, and the tenth semi-transparent region 70HT5 have a lower exposure amount than the portions that overlap with the fourth semi-transparent region 70HT2, so that The amount of exposure is highest in the portion that overlaps with the first transmissive region 70T1, the second transmissive region 70T2, and the third transmissive region 70T3.

When the first insulating film 318 is developed, a portion of the first insulating film 318 that overlaps with the first transparent region 70T1 becomes a first convex portion 326α, which is the convex portion 326, and a portion that overlaps with the second transparent region 70T2. The convex portion 326 becomes a second convex portion 326β, and the portion that overlaps with the third transmission region 70T3 becomes a third convex portion 326γ that is the convex portion 326. A space is left between the first convex portion 326α and the second convex portion 326β. A space is left between the first convex portion 326α and the third convex portion 326γ. The portion of the first insulating film 318 that overlaps with the eighth semi-transparent region 70HT3 becomes the third recess 327Aα, which is the first recess 327A, and the portion that overlaps with the ninth semi-transparent region 70HT4 becomes the third recess 327A, which is the first recess 327A. The fourth recess 327Aβ, and the portion overlapping with the tenth semi-transparent region 70HT5 becomes the fifth recess 327Aγ, which is the first recess 327A. The direction from the center of gravity of the outer shape of the first convex portion 326α toward the third recess 327Aα, the direction from the center of gravity of the outer shape of the second convex portion 326β toward the fourth recess 327Aβ, and the direction from the center of gravity of the outer shape of the third convex portion 326γ toward the third recess 327Aα. The direction toward the recessed portion 327Aγ crosses each other.

When the developed first insulating film 318 is heat-treated, the first protrusion 326α, the second protrusion 326β, and the third protrusion 326γ are all inclined with respect to the normal direction of the main surface of the substrate 317. The first convex portion 326α has an apex 326V unevenly located on the third concave portion 327Aα side. The second convex portion 326β has a configuration in which the apex 326V is unevenly distributed on the fourth concave portion 327Aβ side. The third convex portion 326γ has a configuration in which the apex 326V is unevenly distributed on the fifth concave portion 327Aγ side. As a result, the first convex portion 326α, the second convex portion 326β, and the third convex portion 326γ are tilted in different directions. The reflective film formed on the upper layer side of the heat-treated first insulating film 318 can reflect light with its surface that follows the uneven surface 318A of the first insulating film 318. Since the uneven surface 318A includes the first convex portion 326α, the second convex portion 326β, and the third convex portion 326γ tilted in different directions as described above, the traveling direction of the reflected light by the reflective film is dispersed. be able to.

Further, the first insulating film is passed through the second photomask 70 including a transparent region 70T having a circular planar shape and a third semi-transparent region 70HT1 disposed adjacently within half or less of the outer circumference of the transparent region 70T. The film 318 is exposed. In this way, when the first insulating film 318 is developed, the convex portion 326, the first concave portion 327A disposed adjacent to less than half of the outer circumference of the convex portion 326, and the convex portion 326 and a second recess 327B surrounding the first recess 327A. When the developed first insulating film 318 is heat-treated, the first recess 327A, which is deeper than the second recess 327B, is disposed adjacent to less than half of the outer circumference of the protrusion 326, so that the protrusion is removed. The portion 326 is highly reliably inclined with respect to the normal direction of the main surface of the substrate 317 in such a manner that the apex 326V is unevenly distributed toward the first recess 327A side. Thereby, the direction in which the convex portion 326 is inclined can be easily controlled.

<Embodiment 5>
Embodiment 5 will be described with reference to FIG. 24 or 25. In this fifth embodiment, the outer shape of the convex portion 426 is changed from the third embodiment described above. Note that redundant explanations regarding the structure, operation, and effects similar to those of the third embodiment described above will be omitted.

FIG. 24 is a plan view showing three protrusions 426 included in the plurality of protrusions 426. As shown in FIG. 24, the outer shape of the convex portion 426 provided on the first insulating film of the array substrate 412 according to this embodiment is composed of two arcuate portions 426A1 and 426A2 having different radii of curvature. The outer shape of the convex portion 426 when viewed from a plane is defined by a first arcuate portion 426A1 having a central angle exceeding 180°, and a second arcuate portion 426A2 that intersects both end positions of the first arcuate portion 426A1. . The radius of curvature of the second arcuate portion 426A2 forming the outer shape of the convex portion 426 is larger than the radius of curvature of the first arcuate portion 426A1. The convex portion 426 which has a second arcuate portion 426A2 with a large radius of curvature as a part of its outer shape has a center of gravity 426C of the outer shape on the opposite side of the second arcuate portion 426A2 with respect to the center of the first arcuate portion 426A1. Located in The first recess 427A of the recesses 427 provided in the first insulating film is arranged adjacent to the second arcuate portion 426A2 that forms the outer shape of the protrusion 426. The first recessed portion 427A extends along the second arcuate portion 426A2 and has an arcuate shape with a predetermined width when viewed from above.

The gray tone mask 460 used in the second exposure step included in the method for manufacturing the array substrate 412 will be described. The configuration of the gray tone mask 460 will be explained. FIG. 25 is a plan view of a graytone mask 460 used in the exposure process. The gray tone mask 460 includes a light-shielding region 460LS that blocks exposure light, a transmissive region that transmits the exposure light, a first semi-transparent region 460HT1 that partially transmits the exposure light, and a transmittance lower than that of the first semi-transparent region 460HT1. It has a second semi-transparent region 460HT2 that semi-transmits exposure light. In FIG. 25, the light-shielding region 460LS, the first semi-transmissive region 460HT1, and the second semi-transmissive region 460HT2 are shown in different hatching shapes. The light shielding region 460LS matches the planar shape of the convex portion 426. The first semi-transparent region 460HT1 is arranged adjacent to a part of the outer periphery of the light shielding region 460LS. The first semi-transparent region 460HT1 has an arc shape with a predetermined width when viewed from above, and matches the planar shape of the first recess 427A.

As shown in FIG. 25, the light-shielding region 460LS includes a first light-shielding region 460LS1 disposed at a position overlapping with a portion where the first convex portion 426α is planned to be formed, and a position overlapping with a portion where the second convex portion 426β is planned to be formed. A second light-shielding region 460LS2 disposed in the third convex portion 426γ and a third light-shielding region 460LS3 disposed in a position overlapping the portion where the third convex portion 426γ is to be formed are included. The first semi-transparent region 460HT1 includes a fifth semi-transparent region 460HT3 located at a position overlapping with a portion to be formed of the third recess 427Aα, and a fifth semi-transparent region 460HT3 located at a position overlapping with a portion to be formed of the fourth recess 427Aβ. It includes a sixth semi-transparent region 460HT4 and a seventh semi-transparent region 460HT5 arranged at a position overlapping with the portion where the fifth recess 427Aγ is planned to be formed.

<Embodiment 6>
Embodiment 6 will be described with reference to FIGS. 26 to 36. This sixth embodiment shows a case where the arrangement of the convex portion 526 and the like are changed from the first embodiment described above. Note that redundant explanations regarding the structure, operation, and effects similar to those of the first embodiment described above will be omitted. Further, the X-axis direction and the Z-axis direction shown in each drawing correspond to the horizontal direction, and the Y-axis direction corresponds to the vertical direction.

In the array substrate 512 according to this embodiment, as shown in FIG. 26, the planar shape of the substrate 517 is a horizontally long rectangle. When using the liquid crystal display device 10, the first side 17A of the substrate 517 along the vertical Y-axis direction is the short side, and the second side 17B along the horizontal X-axis direction is the long side. It is said that In other words, the board 517 is assumed to be used in a "horizontal" state. The substrate 517 has a length ratio of 9:16 between the first side 17A, which is the short side, and the second side 17B, which is the long side.

As shown in FIGS. 27 and 28, the plurality of convex portions 526 are arranged with a certain regularity within the main surface of the substrate 517 of the array substrate 512. FIG. 27 shows three representative protrusions 526α to 526γ out of the plurality of protrusions 526. As shown in FIG. 28, in each of the plurality of convex portions 526, a direction D from the center of gravity 526C of the outer shape toward the apex 526V, which is the protruding tip, as viewed in the plane (the direction It is configured to include an upward vector component in the Y-axis direction, which is the vertical direction (viewed from the line direction). Note that the upper side shown in FIG. 27 and the right side shown in FIG. 28 coincide with the upper direction in the vertical direction.

Specifically, as shown in FIG. 27, the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ included in the plurality of protrusions 526 extend in the direction from the first center of gravity 526Cα toward the first vertex 526Vα. A certain first direction D1, a second direction D2 which is a direction from the second center of gravity 526Cβ to the second vertex 526Vβ, and a third direction D3 which is a direction from the third center of gravity 526Cγ to the third vertex 526Vγ are all It is configured to include an upward vector component in the Y-axis direction, which is a vertical direction when viewed from above.

As shown in FIGS. 28 and 29, the first convex portion 526α has a first direction D1 that coincides with the upper direction in the vertical direction when viewed from above. Therefore, in the first convex portion 526α, the first direction D1 includes only an upward vector component in the vertical direction when viewed from a plane, and does not include vector components in other directions. That is, in the first convex portion 526α, the first direction D1 forms an angle θ1 of 0° with respect to the vertically upward direction when viewed from above. In the second convex portion 526β, as shown in FIG. 30, the second direction D2 forms an angle θ2 of, for example, about 60° to the right side shown in FIG. . Therefore, in the second convex portion 526β, the second direction D2 includes an upward vector component V1 in the vertical direction and a rightward vector component V2 in the horizontal direction. As shown in FIG. 31, the third convex portion 526γ is arranged such that the third direction D3 is on the left side in FIG. It forms an angle θ3 of about 60°. Therefore, in the second convex portion 526β, the second direction D2 includes an upward vector component V3 in the vertical direction and a vector component V4 in the left direction in the horizontal direction. Note that the plurality of convex portions 526 may have a direction D from the center of gravity 526C to the apex 526V at an angle other than 0° or 60° with respect to the upward direction in the vertical direction when viewed from above (for example, the direction D toward the apex 526V may be A convex portion 526 having an angle within an angular range of ±60° is included.

Here, as shown in FIG. 28, the reflective film 516 is anisotropically reflective due to the convex portion 526 configured such that the direction D from the center of gravity 526C to the apex 526V is inclined with respect to the normal direction of the main surface of the substrate 517. It has a sexual nature. The reflective anisotropy of the reflective film 516 is an optical property that allows incident light in a specific direction to be reflected and to travel more efficiently in the direction ND, which is closer to the normal direction of the main surface of the substrate 517 than in the specular reflection direction SD. It is. Specifically, the convex portion 526 causes the reflective film 516 to reflect incident light traveling in a direction opposite to the direction D from the center of gravity 526C to the apex 526V (leftward in FIG. 28) when viewed in plan, so that the convex portion 526 reflects the incident light in the specular reflection direction. It is possible to more efficiently advance in the direction ND, which is closer to the normal direction of the main surface of the substrate 517 than in the SD. More specifically, a fan-shaped portion of the convex portion 526 adjacent to the first recess 527A when viewed from above has a steeper inclination angle with respect to the main surface of the substrate 517 than other portions. The part of the reflective film 516 that overlaps with the fan-shaped part with a steep inclination angle in the convex part 526 reflects the incident light in the direction opposite to the direction D when viewed from the plane, and reflects the incident light on the main surface of the substrate 517 rather than in the specular reflection direction SD. can be efficiently raised in the direction ND close to the normal direction. Note that the above-described "direction ND" may coincide with the normal direction of the main surface of the substrate 517, but may also be inclined at a predetermined angle with respect to the normal direction of the main surface of the substrate 517.

Verification experiment 1 was conducted to verify the reflection anisotropy imparted to the reflective film 516 by the convex portions 526. In verification experiment 1, a substrate 517 was created in which the plurality of convex portions 526 included in the first insulating film 518 were all set in the same direction D from the center of gravity 526C to the apex 526V. Specifically, the direction D of all the convex portions 526 was made to coincide with the upward direction in the vertical direction when viewed in plan (viewed from the normal direction of the main surface of the substrate 517). Of the main surface of the substrate 517 having such convex portions 526, the uneven surface 518A of the first insulating film 518 is divided into minute unit regions for a predetermined range including the plurality of convex portions 526, and each unit region is The angle that the normal direction makes with respect to the reference direction when viewed in a plane was obtained by measurement or calculation. The reference direction is one direction along the horizontal direction (for example, the right direction in FIG. 27). The experimental results of Verification Experiment 1 are as shown in FIG. In FIG. 32, polar coordinates are shown. The "radius" of the polar coordinates shown in FIG. 32 is the number of unit areas described above. The "deflection angle" of the polar coordinates shown in FIG. 32 is the angle that the normal direction of the above-described unit area makes with respect to the reference direction. The rightward axis (starting line) from the origin in the polar coordinates shown in FIG. 32 is the above-described reference direction. The axis pointing upward from the origin in the polar coordinates shown in FIG. 32 is the upward direction in the vertical direction. The left axis from the origin in the polar coordinates shown in FIG. 32 is in the opposite direction to the reference direction. The downward axis from the origin in the polar coordinates shown in FIG. 32 is the downward direction in the vertical direction. Note that the numerical values shown in FIG. 32 are the numbers of unit areas.

The verification results of verification experiment 1 will be explained using FIG. 32. According to FIG. 32, it can be seen that there is a bias in the distribution regarding the number of unit areas. Specifically, in the polar coordinates shown in FIG. 32, the number of unit areas existing near the axis pointing upward from the origin is far greater than the number of unit areas existing near the other three axes. This means that each convex portion 526 includes the most unit areas whose normal direction is upward in the vertical direction. As described above, in the substrate 517 according to Verification Experiment 1, the direction D of all the convex portions 526 coincides with the upward direction in the vertical direction when viewed from above, so that the normal direction of the convex portions 526 is It can be said that it tends to include the largest number of unit areas that coincide with direction D when viewed in plan. Therefore, based on Snell's law, the incident light that enters the convex portion 526 of the substrate 517 according to Verification Experiment 1 from the upper side in the vertical direction (the side opposite to the direction D when viewed from above) Therefore, it can be said that the light tends to be reflected more efficiently in the direction ND, which is closer to the normal direction of the principal surface of the substrate 517, than in the regular reflection direction SD.

Next, Verification Experiment 2 was conducted to verify how the brightness distribution of light reflected by the reflective film 516 changes when the direction D of the plurality of convex portions 526 provided on the substrate 517 is adjusted. In the verification experiment 2, the substrate 517 created in the verification experiment 1 (the substrate 517 whose direction D from the center of gravity 526C to the apex 526V was all the same) was used as a comparative example 1. In verification experiment 2, a substrate 517 was created that includes a plurality of convex portions 526 that vary in the direction D from the center of gravity 526C to the apex 526V within an angular range of ±90° centered on the vertically upward direction when viewed from above. Comparative Example 2 was prepared. In verification experiment 2, a substrate 517 was created that included a plurality of convex portions 526 that varied in the angle range of ±60° centered on the vertically upward direction when viewed from above in the direction D from the center of gravity 526C to the apex 526V. This was referred to as Example 1. In the explanations of Comparative Example 2 and Example 1, the "±" sign attached to the angular range in direction D is "+" on one side in the horizontal direction (the right side in FIG. 27) with respect to the vertically upward direction. This means that the other side in the horizontal direction (the left side in FIG. 27) with respect to the upper direction in the vertical direction is marked with a "-" symbol. Comparative Example 2 includes a plurality of convex portions 526 in which the direction D is at an angle of “+90°” with respect to the upward direction in the vertical direction, and a convex portion 526 in which the direction D is at an angle of “−90°” with respect to the upward direction in the vertical direction. It includes at least a convex portion 526 that forms an angle of 90 degrees, and also includes convex portions 526 that form other angles within the angular range of ±90°. In Comparative Example 2, the average value of the angles formed by the respective directions D of the plurality of convex portions 526 with respect to the upward direction in the vertical direction is adjusted to be approximately 0°. In the first embodiment, the plurality of convex portions 526 include a convex portion 526 in which the direction D is at an angle of “+60°” with respect to the upward direction in the vertical direction, and a convex portion 526 in which the direction D is at an angle of “−60°” with respect to the upward direction in the vertical direction. It includes at least a convex portion 526 that forms an angle of .degree., and also includes a convex portion 526 that forms an angle of .±.60 degrees. In the first embodiment, the average value of the angles formed by the respective directions D of the plurality of convex portions 526 with respect to the upward direction in the vertical direction is adjusted to be about 0°.

In verification experiment 2, a point light source was placed above each substrate 517 in the vertical direction and in the center position in the horizontal direction, and the light supplied from the point light source was The brightness of the reflected light obtained by being reflected by the reflective film 516 of each substrate 517 was measured or calculated. The verification results of verification experiment 2 are as shown in FIGS. 33 to 35. FIG. 33 is a diagram showing the luminance distribution of reflected light within the main surface of the substrate 517 according to Comparative Example 1. FIG. 34 is a diagram showing the luminance distribution of reflected light within the main surface of the substrate 517 according to Comparative Example 2. FIG. 35 is a diagram showing the luminance distribution of reflected light within the main surface of the substrate 517 according to Example 1. In FIGS. 33 to 35, the level of brightness of reflected light is expressed by grayscale shading, and the higher the brightness, the lighter the grayscale shading, and the lower the brightness, the darker the grayscale shading tends to be. Ru.

The experimental results of Verification Experiment 2 will be explained using FIGS. 33 to 35. According to FIG. 33, in Comparative Example 1, although the brightness near the center in the horizontal direction is high, the brightness tends to decrease as it approaches both end positions from the center position, so it can be said that the brightness uniformity is low. In Comparative Example 1, the direction D of all the convex portions 526 coincides with the upward direction in the vertical direction when viewed from above. Therefore, although the portion of the reflective film 516 that overlaps with the convex portion 526 located near the center in the horizontal direction efficiently reflects light from a point light source, the reflection efficiency of other portions is extremely low. This is considered to be the cause of the verification result of Comparative Example 1 described above. According to FIG. 34, although the comparative example 2 has high brightness uniformity, it can be said that the overall brightness tends to be low. In Comparative Example 2, the angular range (±90°) of the plurality of convex portions 526 in the direction D is wider than the angular range (±60°) of the plurality of convex portions 526 in the direction D provided in the first embodiment. Therefore, the portion of the reflective film 516 provided in Comparative Example 2 that overlaps with the convex portion 526 whose absolute value of the angle in direction D is too large is exposed to light from a point light source located at the center of the substrate 517 in the horizontal direction. It is presumed that the light cannot be reflected efficiently and the brightness decreases accordingly. On the other hand, according to FIG. 35, it can be said that Example 1 has high brightness uniformity and tends to have high overall brightness. In Example 1, the angular range (±60°) of the plurality of convex portions 526 in the direction D is narrower than the angular range (±90°) of the plurality of convex portions 526 in the direction D of the second comparative example. From this, the reflective film 516 provided in Example 1 can efficiently reflect light from a point light source located at the horizontal center of the substrate 517 over almost the entire area, thereby achieving high brightness uniformity. It is inferred that high brightness and high brightness have been achieved.

As described above, the plurality of convex portions 526 (including the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ) according to the present embodiment transmits an upward vector component in the vertical direction in the direction D. Contains. Therefore, as shown in FIG. 36, the plurality of convex portions 526 allows the reflective film 516 to reflect light, such as sunlight or indoor lights, that is irradiated from above in the vertical direction to the reflective film 516, and It is possible to make the light travel more efficiently in the direction ND, which is closer to the normal direction of the main surface of the substrate 517 than in the reflection direction SD. In other words, it is possible to efficiently use sunlight, indoor lights, etc. as reflected light, which is suitable for improving the brightness of reflected light. Note that although FIG. 36 illustrates a case where the board 517 is installed outdoors and uses the sun as a light source, if it is installed indoors, an indoor light or the like will be used as a light source.

Furthermore, in this embodiment, as in Example 1 of Verification Experiment 2, each direction D in the plurality of convex portions 526 has an angular range of ±60° centered on the upper direction in the vertical direction when viewed from the plane. It's fluctuating. The angular range is set based on the lengths of the first side portion 17A and the second side portion 17B of the substrate 517. In detail, first, the length of the first side 17A is "A", the length of the second side 17B is "B", and the angle formed by the direction D with respect to the upward direction in the vertical direction when viewed from a plane. Let be “θ”. The plurality of convex portions 526 according to this embodiment are configured such that the angle θ satisfies the following equation (2). The signs "+" and "-" in equation (2) are as explained in Verification Experiment 2.

-arctan(B/A)≦θ≦arctan(B/A) (2)

Equation (2) will be explained in detail. First, as shown in FIG. 26, the angle that the two diagonal lines DI1 and DI2 of the substrate 517, which has a rectangular planar shape, make with respect to the upward vertical direction is "±arctan (B/A)". . Since the substrate 517 according to this embodiment has a length ratio of 9:16 between the first side 17A, which is the short side, and the second side 17B, which is the long side, the equation Substitute "9" for A and "16" for B in (2). Then, the angular range of the angle θ at the convex portion 526 is approximately “±60° (−60° to +60°)”. Here, the light irradiated from above in the vertical direction to the reflective film 516 at an angle that coincides with either of the two diagonal lines DI1 and DI2 on the substrate 517 or at an angle that is closer to the vertical direction than the two diagonal lines DI1 and DI2. The amount of light is greater than the amount of light that is irradiated onto the reflective film 516 from above in the vertical direction at an angle closer to the horizontal direction than the two diagonal lines DI1 and DI2 on the substrate 517. Therefore, if the angle θ satisfies the above formula (2), the convex portion 526 will be formed at an angle that coincides with either of the two diagonal lines DI1 and DI2 on the substrate 517 or an angle that is closer to the vertical direction than the two diagonal lines DI1 and DI2. Therefore, the light irradiated onto the reflective film 516 from above in the vertical direction is reflected by the reflective film 516, and is caused to travel more efficiently in the direction ND, which is closer to the normal direction of the main surface of the substrate 517 than in the regular reflection direction SD. becomes possible. This improves the efficiency of light utilization, making it more suitable for improving the brightness of reflected light.

Further, the plurality of convex portions 526 include those whose angle θ matches "arctan (B/A)" and those whose angle θ matches "-arctan (B/A)." Specifically, as shown in FIG. 30, the angle θ2 of the second convex portion 526β is approximately 60° toward the right side in FIG. 30 as described above, and is consistent with "arctan (B/A)". There is. As shown in FIG. 31, the angle θ3 of the third convex portion 526γ is approximately 60° to the left in FIG. 31 as described above, and coincides with "-arctan(B/A)". In this way, the second convex portion 526β causes the reflective film 516 to reflect the light irradiated onto the reflective film 516 from above in the vertical direction at an angle θ2 that coincides with the diagonal line DI1 on the substrate 517. It is possible to make the light travel more efficiently in the direction ND, which is closer to the normal direction of the main surface of the substrate 517 than in the reflection direction SD. Similarly, the third convex portion 526γ causes the reflective film 516 to reflect the light irradiated onto the reflective film 516 from above in the vertical direction at an angle θ3 that coincides with the diagonal line DI2 on the substrate 517, so that the light is reflected in the specular reflection direction SD. It is possible to more efficiently advance in the direction ND, which is closer to the normal direction of the main surface of the substrate 517. Therefore, for example, if it is assumed that the incident light is incident from the upper end position of the substrate 517 in the vertical direction and near the center position in the horizontal direction, the incident light is The second convex portion 526β and the third convex portion 526γ that are present near the central position of can be effectively reflected by the reflective film 516. This makes it difficult for local dark areas to occur near the end positions of the substrate 517 in the horizontal direction, so that the brightness of the reflected light within the main surface of the substrate 517 can be made uniform.

As described above, according to the present embodiment, the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ are arranged in a direction from the first center of gravity 526Cα toward the first apex 526Vα when viewed from above. one direction D1, a second direction D2 which is a direction from the second center of gravity 526Cβ to the second vertex 526Vβ when seen in a plane, and a third direction which is a direction from the third center of gravity 526Cγ to the third vertex 526Vγ when seen in a plane. D3 includes an upward vector component in the vertical direction. The reflective film 516 reflects incident light in a specific direction by the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ, and is closer to the normal direction of the main surface of the substrate 517 than the specular reflection direction SD. It has reflection anisotropy that allows it to travel efficiently in the direction ND. Specifically, the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ reflect incident light traveling in directions opposite to the first direction D1, the second direction D2, and the third direction D3, respectively. The light can be reflected by the film 516 and travel more efficiently in the direction ND, which is closer to the normal direction of the principal surface of the substrate 517 than in the specular reflection direction SD. As described above, by including an upward vector component in the vertical direction in the first direction D1, second direction D2, and third direction D3, the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ reflects light that is irradiated from above in the vertical direction to the reflective film 516, such as sunlight or an indoor light, so that the normal to the main surface of the substrate 517 is set more closely than the regular reflection direction SD. It is possible to efficiently advance in the direction ND close to the direction. In other words, it is possible to efficiently use sunlight, indoor lights, etc. as reflected light, which is suitable for improving the brightness of reflected light.

Further, the substrate 517 has a rectangular planar shape, and has a first side portion 17A along the vertical direction and a second side portion 17B along the horizontal direction. The portion 526β and the third convex portion 526γ have a length of the first side portion 17A as “A”, a length of the second side portion 17B as “B”, and are arranged in the first direction D1 with respect to the vertically upward direction. Let the angle made by the second direction D2 with respect to the upward direction in the vertical direction be ``θ2'', and the angle made by the third direction D3 with respect to the upward direction in the vertical direction be ``θ3''. Then, the angles θ1, θ2, and θ3 satisfy the following equation (3).

-arctan(B/A)≦θ1, θ2, θ3≦arctan(B/A) (3)

First, the angle that the two diagonal lines DI1 and DI2 of the substrate 517, which has a rectangular planar shape, make with respect to the upward direction in the vertical direction is "±arctan (B/A)". Here, the light irradiated from above in the vertical direction to the reflective film 516 at an angle that coincides with either of the two diagonal lines DI1 and DI2 on the substrate 517 or at an angle that is closer to the vertical direction than the two diagonal lines DI1 and DI2. The amount of light is greater than the amount of light that is irradiated onto the reflective film 516 from above in the vertical direction at an angle closer to the horizontal direction than the two diagonal lines DI1 and DI2 on the substrate 517. Therefore, if the angles θ1, θ2, and θ3 satisfy the above equation (3), the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ are aligned with either of the two diagonals DI1, DI2 on the substrate 517. The reflective film 516 reflects the light irradiated onto the reflective film 516 from above in the vertical direction at a matching angle or an angle closer to the vertical direction than the two diagonals DI1 and DI2, and It becomes possible to efficiently advance in the direction ND close to the normal direction of the main surface of 517. This improves the efficiency of light utilization, making it more suitable for improving the brightness of reflected light. Note that the "-" sign in the above equation (3) means that it is on the opposite side from the "+" sign side in the horizontal direction with respect to the upward direction in the vertical direction.

Further, any one of the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ has an angle θ1, θ2, or θ3 that is “arctan (B/A)” or “−arctan (B/A)”. A).

In this way, any one of the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ is positioned on the upper side in the vertical direction at an angle that coincides with at least one of the two diagonals DI1 and DI2 on the substrate 517. The light irradiated onto the reflective film 516 from the reflection film 516 can be reflected by the reflective film 516, and can be made to travel more efficiently in the direction ND, which is closer to the normal direction of the principal surface of the substrate 517 than in the specular reflection direction SD. Therefore, for example, if it is assumed that the incident light is incident from the upper end position of the substrate 517 in the vertical direction and near the center position in the horizontal direction, the incident light is Any one of the first convex portion 526α, the second convex portion 526β, and the third convex portion 526γ existing in the vicinity of the central position can be effectively reflected by the reflective film 516. This makes it difficult for local dark areas to occur near the end positions of the substrate 517 in the horizontal direction, so that the brightness of the reflected light within the main surface of the substrate 517 can be made uniform.

<Embodiment 7>
Embodiment 7 will be described with reference to FIGS. 37 to 40. This seventh embodiment shows a case where the orientation of the substrate 617 is changed from the above-described sixth embodiment. Note that redundant explanations regarding the structure, operation, and effects similar to those of the sixth embodiment described above will be omitted.

As shown in FIG. 37, the substrate 617 according to this embodiment has a vertically elongated rectangular planar shape. In the substrate 617, a first side 617A along the vertical Y-axis direction is a long side, and a second side 617B along the horizontal X-axis direction is a short side. In other words, the board 617 is assumed to be used in a "vertical" state. The substrate 617 has a length ratio of 16:9 between a first side 617A, which is a long side, and a second side 617B, which is a short side.

In this way, the substrate 617 according to the present embodiment has a length ratio of 16:9 between the first side 617A, which is the long side, and the second side 617B, which is the short side. Therefore, "16" is substituted for A in equation (2) explained in the sixth embodiment, and "9" is substituted for B. Then, the angular range of the angle θ at the convex portion 626 is about "±30° (-30° to +30°)". Accordingly, as shown in FIG. 38, the plurality of convex portions 626 according to the present embodiment vary so that each direction D has an angular range of ±30° centered on the upper direction in the vertical direction when viewed from above. ing. In the first convex portion 626α, the first direction D1 coincides with the upward direction in the vertical direction. As shown in FIG. 39, the angle θ2 of the second convex portion 626β is approximately 30° to the right side in FIG. ing. As shown in FIG. 40, the angle θ3 of the third convex portion 626γ is approximately 30° toward the left side in FIG. We are doing so. According to this embodiment, the same functions and effects as those of the sixth embodiment described above can be obtained.

<Embodiment 8>
Embodiment 8 will be described with reference to FIGS. 41 to 44. Embodiment 8 shows a case where a convex portion 726 similar to that of Embodiment 3 described above is applied to the configuration described in Embodiment 6 described above. Note that redundant explanations regarding structures, operations, and effects similar to those of the third and sixth embodiments described above will be omitted.

As shown in FIG. 41, each of the plurality of convex portions 726 according to this embodiment has a planar shape with an arcuate portion cut out from a circular shape. That is, the planar shape of each convex portion 726 is similar to the planar shape of each convex portion 226 described in the third embodiment (see FIG. 17). Even with such a planar shape, the plurality of convex portions 726 vary so that each direction D has an angular range of ±60° centered on the upper direction in the vertical direction when viewed from the plane. As shown in FIG. 42, the first convex portion 726α has the first direction D1 aligned with the upper direction in the vertical direction. As shown in FIG. 43, the angle θ2 of the second convex portion 726β is approximately 60° toward the right side in FIG. ing. As shown in FIG. 44, the angle θ3 of the third convex portion 726γ is about 60° toward the left side in FIG. We are doing so. According to this embodiment, the same actions and effects as those of the third and sixth embodiments described above can be obtained.

<Other embodiments>
The technology disclosed in this specification is not limited to the embodiments described above and illustrated in the drawings, and includes, for example, the following embodiments within its technical scope.

(1) The first photomask 50 and the second photomask 70 described in Embodiments 1 and 4 may each be provided with one semi-transparent film. In that case, the thickness of the semi-transparent film may be varied depending on the in-plane position of the base materials 51 and 71. For example, in the first photomask 50, the portion of the semi-transparent film that constitutes the first semi-transparent region 50HT1 may be made thinner than the portion that constitutes the second semi-transparent region 50HT2. For example, in the second photomask 70, the portion of the semi-transparent film that constitutes the first semi-transparent region 70HT1 may be made thicker than the portion that constitutes the second semi-transparent region 70HT2.

(2) To pattern the first insulating films 118 and 218 described in Embodiments 2, 3, and 5, it is also possible to use the first photomask 50, which is the halftone mask described in Embodiment 1.

(3) In patterning the first insulating film 318 made of the negative photosensitive resin material described in Embodiment 4, it is also possible to use the gray tone masks 60 and 260 described in Embodiments 2, 3, and 5. It is.

(4) As the material for the first insulating films 118 and 218 described in Embodiments 2, 3, and 5, it is also possible to use a negative photosensitive resin material.

(5) The specific cross-sectional shapes of the convex portions 26, 126, 226, 326, 426, 526, 626, 726 and the concave portions 27, 127, 227, 327, 427 can be changed as appropriate other than those shown in the drawings.

(6) The positional relationships between the centers of gravity 26C, 226C, 426C, 526C of the convex portions 26, 126, 226, 326, 426, 526, 626, 726 and the vertices 26V, 126V, 326V, 526V may be determined as appropriate in addition to those shown in the drawings. Can be changed.

(7) Diameter dimensions of convex portions 26, 126, 226, 326, 426, 526, 626, 726, depths of first recesses 27A, 127A, 227A, 327A, 427A, 527A, and depths of second recesses 27B, 327B. The specific numerical value of the depth can be changed as appropriate. Further, the specific values of the inclination angles of the convex portions 26, 126, 226, 326, 426, 526, 626, and 726 can be changed as appropriate. Further, the specific numerical value of the refractive index of the substrate 23 of the counter substrate 13 can be changed as appropriate.

(8) In addition to the three illustrated patterns, four or more patterns may be set in which the convex portions 26, 126, 226, 326, 426, 526, 626, and 726 are inclined.

(9) The configuration is not limited to a configuration in which all the convex portions 26, 126, 226, 326, 426, 526, 626, and 726 that are adjacent to each other at intervals have different inclinations. For example, two convex portions 26, 126, 226, 326, 426, 526, 626, 726 that are adjacent to each other with an interval, and two convex portions 26, 126, 226, 326, 426, 526 that are inclined in the same direction. , 626, 726 may be included.

(10) The plurality of convex portions 26, 126, 226, 326, 426, 526, 626, and 726 may have a certain regularity in the direction of inclination.

(11) It is also possible to omit the conductive layer 21 and the conductive film.

(12) It is also possible to omit the second insulating film 19 and the transparent electrode film disposed on the upper layer side of the second insulating film 19. In that case, it is possible to apply the pattern of the plurality of pixel electrodes 15 described in each of the above-described embodiments as seen in a plane to the reflective film 16, 516. The reflective film 16, 516 to which the above pattern is applied is composed of a plurality of physically separated parts, and each of these parts is connected to a backplane circuit. Each portion of the reflective film 16, 516 connected to the backplane circuit constitutes a plurality of pixel electrodes 15.

(13) The liquid crystal panel 11 included in the liquid crystal display device 10 may be of a transflective type instead of a reflective type. When using a transflective liquid crystal panel, a backlight device is installed on the back side of the liquid crystal panel. As a light source of the backlight device, an LED, an organic EL, etc. are used. An optical member containing a quantum dot phosphor can be used in the backlight device. Quantum dot phosphors can convert the wavelength of primary light emitted from a light source and emit secondary light with excellent color purity.

(14) In addition to the liquid crystal display device 10, an organic EL display device may be used. The organic EL display device is of a transflective type.

(15) In the configurations described in Embodiments 6 to 8, the plurality of convex portions 526, 626, 726 (first convex portions 526α, 626α, 726α, second convex portions 526β, 626β, 726β, and third convex portions 526γ, 626γ, 726γ) (angle θ1, θ2, θ3) is equal to “arctan(B/A)” and “-arctan(B/A)” in equations (2) and (3). It may match only one of them and may not match the other. Also, the angle θ (angle θ1, θ2, θ3) may also be inconsistent with "arctan(B/A)" and "-arctan(B/A)" in equations (2) and (3). In either case, it is possible to make the angle θ (angles θ1, θ2, θ3) satisfy equations (2) and (3).

(16) In the configurations described in Embodiments 6 to 8, the length ratio of the first side portions 17A, 617A and the second side portions 17B, 617B in the substrates 517, 617 is “9:16”, It can be changed as appropriate other than "16:9". As the ratio of the lengths of the first side portions 17A, 617A and the second side portions 17B, 617B is changed, each direction D of the plurality of convex portions 526, 626, 726 is vertical when viewed from the plane. The angular range of the angle θ formed with respect to the upward direction can be changed as appropriate. When changing this angular range, it is possible to set the angular range based on the above equations (2) and (3), but this is not necessarily the case.

(17) In the configurations described in Embodiments 6 to 8, the planar shape of the substrates 517 and 617 may be a square, a trapezoid, a rhombus, a circle, an ellipse, etc. other than a rectangle. As the planar shape of the substrates 517, 617 is changed, the angle range of the angle θ that each direction D of the plurality of convex portions 526, 626, 726 makes with respect to the upper direction in the vertical direction when viewed from the plane is changed. It can be changed as appropriate. When changing this angular range, it is possible to set the angular range based on the above equations (2) and (3), but this is not necessarily the case.

(18) It is also possible to appropriately combine the configurations described in Embodiments 6 to 8 with Embodiments 2, 4, 5, etc.

10...Liquid crystal display device (display device), 12,112,212,312,412,512...Array substrate (reflection plate), 13...Counter substrate, 16,516...Reflection film, 17,117,317,517,617 ... Substrate, 17A, 617A... First side, 17B, 617B... Second side, 18, 118, 218, 318, 518... First insulating film (insulating film), 18A, 318A, 518A... Uneven surface, 26 , 126, 226, 326, 426, 526, 626, 726...convex portion, 26α, 126α, 226α, 326α, 426α, 526α, 626α, 726α...first convex portion, 26β, 126β, 226β, 326β, 426β, 526β , 626β, 726β...Second convex portion, 26γ, 126γ, 226γ, 326γ, 426γ, 526γ, 626γ, 726γ...Third convex portion, 26C, 226C, 426C, 526C... Center of gravity, 26Cα, 526Cα... First center of gravity, 26Cβ , 526Cβ...Second center of gravity, 26Cγ, 526Cγ...Third center of gravity, 26V, 126V, 326V, 526V...Vertex, 26Vα, 526Vα...First vertex, 26Vβ, 526Vβ...Second vertex, 26Vγ, 526Vγ...Third vertex, 27 , 127, 227, 327, 427... recess, 27A, 127A, 227A, 327A, 427A, 527A... first recess, 27B, 327B... second recess, 27Aα, 127α, 227α, 327α, 427α… third recess, 27Aβ , 127β, 227β, 327β, 427β...fourth recess, 27Aγ, 127γ, 227γ, 327γ, 427γ...fifth recess, 50...first photomask, 50HT1...first semi-transparent region, 50HT2...second semi-transparent region, 50HT3...Fifth semi-transparent area, 50HT4...Sixth semi-transparent area, 50HT5...Seventh semi-transparent area, 50LS...Light blocking area, 50LS1...First light blocking area, 50LS2...Second light blocking area, 50LS3...Third light blocking area, 50LS1C, 50LS2C, 50LS3C... Center of gravity, 60,260,460... Gray tone mask (first photomask), 60HT1, 260HT1, 460HT1... First semi-transparent region, 60HT2, 260HT2, 460HT2... Second semi-transparent region, 60HT3, 260HT3, 460HT3...Fifth semi-transparent area, 60HT4, 260HT4, 460HT4...Sixth semi-transparent area, 60HT5, 260HT5, 460HT5...Seventh semi-transparent area, 60LS, 260LS, 60LS...Light shielding area, 60LS1, 260LS1, 460LS1...th 1 light-shielding region, 60LS2, 260LS2, 460LS2...second light-shielding region, 60LS3, 260LS3, 460LS3...third light-shielding region, 70...second photomask, 70HT1...third semi-transmissive region, 70HT2...fourth semi-transmissive region, 70HT3 ... 8th semi-transparent area, 70HT4... 9th semi-transparent area, 70HT5... 10th semi-transparent area, 70T... Transmissive area, 70T1... 1st transparent area, 70T2... 2nd transparent area, 70T3... 3rd transparent area, center of gravity ...70T1C, 70T2C, 70T3C

Claims (10)

A substrate and
an insulating film provided on the substrate and having an uneven surface;
a reflective film disposed on the upper layer side of the insulating film, having a surface that follows the uneven surface, and reflecting light;
The insulating film includes a plurality of convex portions arranged at intervals, and a concave portion disposed between adjacent convex portions, and the uneven surface is formed on the surfaces of the plurality of convex portions and the concave portions. It is composed of
The convex portion is inclined with respect to the normal direction of the main surface of the substrate,
The plurality of convex portions include a first convex portion, a second convex portion adjacent to the first convex portion with an interval, and a third convex portion adjacent to the first convex portion with an interval, contains,
The first convex portion, the second convex portion, and the third convex portion are reflective plates that are inclined in different directions. The first convex portion has a first center of gravity, which is the center of gravity of the outer shape seen in a plane, and a first apex, which is an apex, which do not match when seen in a plane,
In the second convex portion, a second center of gravity, which is the center of gravity of the outer shape seen in a plane, and a second apex, which is an apex, do not match when seen in a plane,
In the third convex portion, a third center of gravity, which is the center of gravity of the outer shape seen in a plane, and a third apex, which is an apex, do not match when viewed in a plane,
The first convex portion, the second convex portion, and the third convex portion are arranged in a direction toward the first apex from the first center of gravity when viewed in plan, and from the second center of gravity toward the second apex when viewed in plan. 2. The reflector according to claim 1, wherein a direction toward the center of gravity and a direction toward the third vertex from the third center of gravity in a plan view intersect with each other. 3. The reflector according to claim 1, wherein all of the convex portions adjacent to each other at intervals are inclined in different directions. The first convex portion, the second convex portion, and the third convex portion are arranged in a first direction, which is a direction toward the first vertex from the first center of gravity when viewed from above, and from the second center of gravity when viewed from above. A second direction, which is a direction from the center toward the second apex, and a third direction, which is a direction from the third center of gravity to the third apex, include an upward vector component in the vertical direction. Reflector plate according to 2. The substrate has a rectangular planar shape and has a first side extending in the vertical direction and a second side extending in the horizontal direction,
The first convex part, the second convex part, and the third convex part have a length of the first side part "A", a length of the second side part "B", and the length of the first side part is "B", and the length of the first side part is "B", and the length of the first side part is "B". The angle that the first direction makes with respect to the upward direction is "θ1", the angle that the second direction makes with respect to the upward direction of the vertical direction is "θ2", and the angle that the first direction makes with respect to the upward direction of the vertical direction is "θ2", 5. The reflecting plate according to claim 4, wherein angles θ1, θ2, and θ3 satisfy the following formula (1), where the angle formed by the third direction is θ3.
-arctan(B/A)≦θ1, θ2, θ3≦arctan(B/A) (1) Any one of the first convex portion, the second convex portion, and the third convex portion has the angles θ1, θ2, and θ3 that are equal to “arctan (B/A)” and “−arctan (B/A).” 6. The reflector plate according to claim 5, which matches at least one of the following. The reflector plate according to any one of claims 1, 2, 4, 5, and 6;
A display device comprising: a counter substrate disposed to face the reflective plate. An insulating film made of a positive photosensitive insulating material or a negative photosensitive insulating material is formed on the substrate,
When the photosensitive insulating material is positive type, there is a light-shielding area that blocks light, and a third layer that is arranged adjacent to a part of the outer periphery of the light-shielding area and that transmits light and has a higher light transmittance than the light-shielding area. a second semi-transmissive region, which is disposed surrounding the light-shielding region and the first semi-transmissive region, transmits light and has a light transmittance higher than the light-shielding region and lower than the first semi-transmissive region. exposing the insulating film through a first photomask including a region;
When the photosensitive insulating material is of a negative type, it is arranged adjacent to a transmissive region that transmits light and a part of the outer periphery of the transmissive region, and that transmits light and has a lower light transmittance than the transmissive region. a third semi-transmissive region, and a fourth semi-transmissive region that is disposed surrounding the transmissive region and the third semi-transmissive region and that transmits light and has a light transmittance lower than that of the transmissive region and higher than that of the third semi-transmissive region. exposing the insulating film through a second photomask including a transparent region;
By developing the insulating film, a portion of the insulating film that overlaps with the light-shielding region or the transmissive region becomes a convex portion, and a portion that overlaps with the first semi-transparent region or the third semi-transmissive region becomes a convex portion. forming an uneven surface on the surface of the insulating film so that a portion that overlaps with the second semi-transparent region or the fourth semi-transparent region becomes a second recess that is shallower than the first recess;
heat-treating the insulating film so that the convex portion is inclined with respect to the normal direction of the main surface of the substrate, and the apex of the convex portion is unevenly distributed on the first concave side;
A method for manufacturing a reflecting plate, comprising forming a reflective film that reflects light on the upper layer side of the insulating film. When the photosensitive insulating material is positive type, a first light-shielding region which is the light-shielding region, a second light-shielding region which is the light-shielding region and is adjacent to the first light-shielding region with a space therebetween, and the light-shielding region. a third light-shielding region adjacent to the first light-shielding region with a space therebetween; and a fifth half of the first semi-transmissive region adjacent to a part of the outer periphery of the first light-shielding region. a transmissive region, a sixth semi-transmissive region which is the first semi-transmissive region and is arranged adjacent to a part of the outer periphery of the second light-shielding region, and a sixth semi-transmissive region which is the first semi-transmissive region and is disposed adjacent to a part of the outer periphery of the second light-shielding region; a seventh semi-transmissive region disposed adjacent to a part of the outer periphery of the region, the first photomask comprising: a direction from the center of gravity of the outer shape of the first light-shielding region toward the fifth semi-transmissive region; and a direction from the center of gravity of the outer shape of the second light shielding region toward the sixth semi-transparent region and a direction from the center of gravity of the outer shape of the third light shielding region toward the seventh semi-transparent region intersect with each other. exposing the insulating film through the first photomask;
When the photosensitive insulating material is negative type, the first transmissive region is the transmissive region, the second transmissive region is the transmissive region and is adjacent to the first transmissive region with a space therebetween, and the transmissive region is a third transmissive region adjacent to the first transmissive region with a space therebetween; and an eighth semi-transmissive region which is the third semi-transmissive region and is disposed adjacent to a part of the outer periphery of the first transmissive region. a ninth semi-transmissive region that is the third semi-transparent region and is arranged adjacent to a part of the outer periphery of the second transmissive region; and a ninth semi-transparent region that is the third semi-transparent region a tenth semi-transparent region disposed adjacent to a part of the outer periphery of the region, the second photomask comprising: a direction from the center of gravity of the outer shape of the first transmissive region toward the eighth semi-transparent region; and a direction from the center of gravity of the outer shape of the second transmissive region toward the ninth semi-transparent region and a direction from the center of gravity of the outer shape of the third transmissive region toward the tenth semi-transparent region intersect with each other. exposing the insulating film through the second photomask;
By developing the insulating film, a portion of the insulating film that overlaps with the first light-shielding region or the first transmissive region becomes the first convex portion, which is the convex portion, and the portion of the insulating film that overlaps with the first light-shielding region or the first transmissive region becomes the first convex portion, which is the second light-shielding region or the first transmissive region. The portion that overlaps with the second transmissive region is the convex portion and is the second convex portion adjacent to the first convex portion with an interval, and the portion that overlaps with the third light-shielding region or the third transmissive region is the convex portion. , a portion of the convex portion that is a third convex portion adjacent to the first convex portion with an interval therebetween and overlaps with the fifth semi-transparent region or the eighth semi-transparent region is the first concave portion. A third recess, which overlaps with the sixth semi-transparent region or the ninth semi-transparent region, becomes a fourth recess, which is the first recess, and overlaps with the seventh semi-transparent region or the tenth semi-transparent region. The portion that overlaps with the second semi-transparent region or the fourth semi-transparent region is the first recess, which is the fifth recess, and the portion that overlaps with the second semi-transparent region or the fourth semi-transparent region is larger than the third recess, the fourth recess, and the fifth recess. forming an uneven surface on the surface of the insulating film so that the second recess is shallow;
By heat-treating the insulating film, the first convex portion is inclined with respect to the normal direction of the main surface of the substrate, the apex of the first convex portion is unevenly distributed toward the third concave portion, and the second convex portion is unevenly distributed on the third concave side. The convex portion is inclined with respect to the normal direction of the principal surface of the substrate, the apex of the second convex portion is unevenly distributed toward the fourth concave portion, and the third convex portion is inclined with respect to the normal direction of the principal surface of the substrate. 9. The method of manufacturing a reflector according to claim 8, wherein the third convex portion is tilted toward the fifth concave portion so that the apex of the third convex portion is unevenly distributed toward the fifth concave portion. When the photosensitive insulating material is positive type, the light-shielding region has a circular planar shape, and the first semi-transparent region is arranged adjacent to a half or less of the outer circumference of the light-shielding region. exposing the insulating film through the first photomask including;
When the photosensitive insulating material is negative type, the transmissive region has a circular planar shape, and the third semi-transmissive region is arranged adjacent to a half or less of the outer circumference of the transmissive region. 10. The method of manufacturing a reflective plate according to claim 8, wherein the insulating film is exposed through the second photomask including the second photomask.

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