JP2019537738A - 直接変換型放射線検出器 - Google Patents
直接変換型放射線検出器 Download PDFInfo
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- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/24—Measuring radiation intensity with semiconductor detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/24—Measuring radiation intensity with semiconductor detectors
- G01T1/241—Electrode arrangements, e.g. continuous or parallel strips or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/02—Dosimeters
- G01T1/023—Scintillation dose-rate meters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/085—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors the device being sensitive to very short wavelength, e.g. X-ray, Gamma-rays
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- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electromagnetism (AREA)
- Measurement Of Radiation (AREA)
- Light Receiving Elements (AREA)
Abstract
Description
第五の態様では、コンピューティング装置によって実行される場合、コンピューティング装置に第四の態様に関して説明されたいずれかの方法を実行させるコンピュータ可読命令が提供される。
ステップ36に関して上述した電荷を電極で収集して電流を記録する(アルゴリズム30のステップ38)。電流出力を入射放射線量に関連付けるように較正を行うことができる。注意すべきものとして、いくつかの実施例では、ステップ38は異なる方式―実施例の方式だけで、較正された電流検出を説明することができる。
以下の結果及び議論は、有機ドナーに基づくBHJシステム及び有機アクセプターに基づくBHJシステムから製造された直接放射線検出器に基づいている。我々の例のシステムでは、ポリ(3−ヘキシルチオフェン−2,5−ジイル):[6,6]−フェニルC71ブチラートメチルエステル(P3HT:PC70BM)バルクヘテロ接合活性材料と酸化ビスマス(Bi2O3)はそれぞれ有機BHJ(本体材料2)と高Z NP(ナノ粒子4)として使用される。アルミニウムと酸化インジウムスズ(ITO)はそれぞれ陰極と陽極(検出器10の電極12及び14)として使用される。
上記用途はX線を使用ことに限定されず、他の形態の電離放射線を使用することもできることに適用する。
・溶液印刷とコーティング技術を使用して溶液から直接堆積し、例えば軟質又は硬質基板にスロットダイコーティング、ブレードコーティング、グラビア印刷、フレキソ印刷、ドロップキャスティング、3D印刷、インクジェット印刷、スプレーコーティング、ディップコーティングするがこれらに限定されない。また、これらのインクはコーティングライン又はフィラメントに用いられてもよい。
・粒子を、X線撮像装置の下で説明されているように、適切な電気接触材料又はバッキングプレートからなる基板に圧縮することができる。
[表1]
例示的な電子伝送材料
[表2]
例示的な放射線減衰材料(即ち、ナノ粒子として):
[表3]
Claims (27)
- 正電荷を伝送するための第一の材料と負電荷を伝送するための第二の材料を含み、前記第一の材料と第二の材料が前記ネットワーク内に分散して複数の電気接合部を形成するネットワークと、
ナノ粒子であって、前記ナノ粒子の少なくとも一つのサイズが前記ナノ粒子の励起子ボーア半径の2倍より大きく、そして少なくとも一つのサイズが100nmより小さく、ここで、使用する時に、前記ナノ粒子が入射放射線を、それぞれ前記第一の材料及び第二の材料を通って伝送するように自由な正電荷及び負電荷に変換する、前記ネットワーク内に分散する複数のナノ粒子とを備える、装置。 - 前記ナノ粒子は入射放射線を減衰させることを特徴とする請求項1に記載の装置。
- 前記ナノ粒子は、放射線−ナノ粒子相互作用イベントにおいて前記放射線を正電荷及び負電荷に変換することを特徴とする請求項1又は2に記載の装置。
- 前記ナノ粒子の少なくとも一つのサイズは、20nm〜100nmであることを特徴とする上記請求項のいずれか一項に記載の装置。
- 前記ナノ粒子の原子番号は少なくとも45であることを特徴とする上記請求項のいずれか一項に記載の装置。
- 前記ナノ粒子は一つ又は複数の金属酸化物から形成されることを特徴とする上記請求項のいずれか一項に記載の装置。
- 前記第一の材料及び第二の材料は有機半導体であることを特徴とする上記請求項のいずれか一項に記載の装置。
- 前記ネットワークはバルクヘテロ接合であることを特徴とする上記請求項のいずれか一項に記載の装置。
- 前記放射線は、α粒子、β粒子、中性子、X線及びγ線のうちの一つ又は複数を含むことを特徴とする上記請求項のいずれか一項に記載の装置。
- 前記ナノ粒子のサイズ及び/又は材料は、前記装置によって検出されることを意図する放射線の形態に応じて選択されることを特徴とする上記請求項のいずれか一項に記載の装置。
- 第一の電極と、
第二の電極と、
前記第一の電極と第二の電極の間に挟まれている請求項1−10のいずれか一項に記載の装置とを備える、放射線検出器。 - 電流測定装置をさらに備えることを特徴とする請求項11に記載の放射線検出器。
- 電圧ソースをさらに備えることを特徴とする請求項11又は12に記載の放射線検出器。
- リアルタイムデータをリモートコンピュータに伝送することができる無線送信機をさらに備えることを特徴とする請求項11−13のいずれか一項に記載の放射線検出器。
- 放射線レベルを示すためのディスプレイをさらに備えることを特徴とする請求項11−14のいずれか一項に記載の放射線検出器。
- 請求項11−15のいずれか一項に記載の複数の放射線検出器を備える、システム。
- 前記複数の放射線検出器のうちの少なくともいくつかは異なるタイプの放射線を検出し、及び/又は特定の放射線の異なるエネルギーを識別するように構成されることを特徴とする請求項16に記載のシステム。
- 前記放射線検出器又は各放射線検出器は、硬質裏地又は軟質裏地に統合される請求項11−15のいずれか一項に記載の放射線検出器又は請求項16もしくは17に記載のシステム。
- 入射放射線を自由な正電荷及び負電荷に変換するために、請求項1−10のいずれか一項に記載の装置、請求項11−15もしくは18のいずれか一項に記載の放射線検出器、又は請求項16−18のいずれか一項に記載のシステムを使用することと、
前記正電荷及び負電荷から生じる特徴を記録することとを含む、方法。 - 放射線−ナノ粒子相互作用イベントにおいて前記入射放射線を正電荷及び負電荷に変換することをさらに含むことを特徴とする請求項19に記載の方法。
- 前記装置に電圧を印加することに応じて電流が発生することを特徴とする請求項19又は20に記載の方法。
- 記録された電流を放射線レベルの推定値に変換することをさらに含むことを特徴とする請求項19−21のいずれか一項に記載の方法。
- 半導体を一つ又は複数の有機溶媒に溶解し、正電荷の伝送に適する第一の材料及び負電荷の伝送に適する第二の材料を形成することと、
前記溶解したポリマーに複数のナノ粒子を添加してマトリックスを形成し、ここで前記ナノ粒子の少なくとも一つのサイズが前記ナノ粒子の励起子ボーア半径の2倍より大きく、そして少なくとも一つのサイズが100nm未満であることとを含む、方法。 - 前記マトリックスを基板に印加することをさらに含むことを特徴とする請求項23に記載の方法。
- 前記基板への前記マトリックスの印加は、ナイフコーティング、スロットダイコーティング、インクジェット印刷、グラビア印刷、スプレーコーティング、スピンコーティング、ドロップキャスティングと3D印刷のうちの一つ又は複数を含むことを特徴とする請求項24に記載の方法。
- 前記マトリックスを一つもしくは複数の粒子又はブロックに形成することをさらに含むことを特徴とする請求項23−25のいずれか一項に記載の方法。
- 使用中、前記ナノ粒子は、入射放射線を、それぞれ前記第一の材料及び第二の材料を通って伝送するように自由な正電荷及び負電荷に変換することを特徴とする請求項23−26のうちのいずれか一項に記載の方法。
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