JP2011186283A - Electrooptical device and electronic apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To achieve high quality in image display by preventing light loss in the vicinity of a boundary area with relatively simple structure and improving a contrast ratio of display image in an electrooptical device. <P>SOLUTION: In the electrooptical device, an electrooptical material (50) is sandwiched between a pair of substrates (10 and 20). The electrooptical device includes: a pixel electrode (9) which is provided corresponding to each pixel on one substrate of the pair of substrates; a light shielding film (401) which is provided on one substrate and at least partially specifies an opening region of each pixel in plane view on the pair of substrates; and an interlayer dielectric (501) which is provided between the pixel electrode and a layer of the light shielding film on one substrate and has higher refractive index compared to the electrooptical material, at least in a part facing the light shielding film. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a technical field of an electro-optical device such as a liquid crystal device and an electronic apparatus including the electro-optical device such as a liquid crystal projector.

  In this type of electro-optical device, the opening area of each pixel is separated by a grid-like non-opening area that is shielded by a light shielding film disposed on a TFT array substrate or a counter substrate (see, for example, Patent Document 1). . By providing a non-opening region, color mixing between adjacent pixels is prevented, or display light passes through a liquid crystal portion that is poorly aligned due to disturbance of an electric field between adjacent pixels, thereby degrading image quality. The situation has been prevented. Alternatively, a non-transparent electronic element such as a pixel switching thin film transistor (hereinafter referred to as “TFT (Thin Film Transistor)”), a storage capacitor, a wiring, or the like is provided in the non-opening region, and the presence of these elements adversely affects the display. The situation is prevented.

JP 2005-258004 A

  However, in the technique disclosed in the patent document, a boundary region between an open region and a non-open region, to which a turbulent electric field other than an assumed drive electric field, such as a lateral electric field, is applied (hereinafter simply referred to as “boundary region” as appropriate) In other words, in the region near the outer edge of the opening region of each pixel, even if the electric field is applied to the maximum in a normally white type liquid crystal device, for example, it does not become completely black (that is, whiteout occurs). . Alternatively, even when a maximum electric field is applied in a normally black type liquid crystal device, the liquid crystal device does not become completely white (that is, blacks are lost). The light leakage near the boundary region reduces the contrast ratio. If the light-shielding film that defines the non-opening region is widened in order to solve such a problem, the technical problem arises that this time, the brightness of the essential image is sacrificed and the display becomes dark. .

  In particular, for display light such as light source light, in addition to light that travels perpendicular to the ideal substrate surface, the display light spreads, the structure of the optical system and the laminated structure on the substrate cause And oblique light (hereinafter simply referred to as “oblique light” as appropriate). For this reason, it is extremely difficult in practice to prevent light leakage near the boundary region while stopping the non-opening region in an unnecessarily large range.

  The present invention has been made in view of, for example, the above-described problems, and can effectively prevent light leakage near the boundary region with a relatively simple configuration. By improving the contrast ratio of a display image, the present invention has high quality. An object is to provide an electro-optical device capable of displaying an image and an electronic apparatus using the electro-optical device.

  In order to solve the above problems, a first electro-optical device according to the present invention includes an electro-optical material sandwiched between a pair of substrates, and is provided on one of the pair of substrates corresponding to each pixel. A pixel electrode provided on the one side, and a light-shielding film that at least partially defines an opening region of each pixel when viewed in plan on the pair of substrates, and the pixel on the one side An interlayer insulating film is provided between the electrodes and the light shielding film, and has a refractive index higher than that of the electro-optic material at least in a portion facing the light shielding film.

  According to the first electro-optical device of the present invention, during the operation, the supply of image signals from the data lines formed on one substrate, for example, a TFT array substrate or an element substrate, to the pixel electrode is controlled. Thus, image display by the so-called active matrix method can be performed. The image signal is generated at a predetermined timing by turning on / off a transistor, which is a switching element electrically connected between the data line and the pixel electrode, according to a scanning signal supplied from the scanning line. To the pixel electrode via the transistor. The pixel electrode is a transparent electrode made of a transparent conductive material such as ITO (Indium Tin Oxide), for example, and is arranged in a matrix in an area to be a display area on a pair of substrates corresponding to the intersection of data lines and scanning lines. A plurality are provided.

  In the present invention, an electro-optic operation such as liquid crystal may be performed by applying a “longitudinal electric field” between the pixel electrode and a counter electrode provided on the other of the pair of substrates. Alternatively, by applying a “lateral electric field” between pixel electrodes adjacent to each other on one substrate side, an electro-optical operation such as liquid crystal may be performed. The scanning line, the data line, and the transistor are typically provided in a non-opening area, not an opening area of each pixel, in the pixel area so as not to hinder display. Here, the “pixel area” means not the area of each pixel but the entire area in which a plurality of pixels are arranged in a matrix, and is also called “image display area” or “display area”.

  The “opening region” of each pixel according to the present invention is a region where an electro-optic operation by an electro-optic element or an electro-optic material is actually performed in each pixel, such as a region where light that actually contributes to display is emitted for each pixel. Say.

  In addition, the “non-opening region” according to the present invention is a region that separates the opening regions of each pixel from each other, such as a region in which light contributing to display is not emitted for each pixel. This is a region where the electro-optic operation is not actually performed. The non-opening region is formed, for example, by forming at least a part of the data line or the scanning line from a light-shielding film having a light-shielding property, and using the light-shielding film as a region capable of shielding light incident on each pixel. It is defined to surround the open area above. In addition to or in place of this, the non-opening region may be a light-shielding film having other functions such as a capacitor electrode, a light-shielding film built in a substrate dedicated to light-shielding, or one substrate or the other substrate (for example, a counter substrate) ) It may be defined at least partially or redundantly by a black matrix or a black mask formed thereon. In any case, at least a part of the non-opening region is defined by the light shielding film provided on one substrate.

  Note that the light shielding film is formed of a material having a low light transmittance as compared with members such as a pair of substrates, an interlayer insulating film, and a pixel electrode. For example, it is made of various light-reflective materials such as Al (aluminum), and various materials that have low light reflectivity or excellent light absorption compared to aluminum such as TiN (titanium nitride) and W (tungsten). Is done.

  In the present invention, in particular, an interlayer insulating film is provided between the pixel electrode and the light shielding film on one substrate. In addition, the interlayer insulating film has a refractive index higher than that of the electro-optical material at least in a portion facing the light shielding film. The interlayer insulating film is composed of, for example, a silicon oxide film, a silicon nitride film, a transparent resin film, or the like having a higher refractive index than that of an electro-optic material that is liquid crystal.

  Therefore, when the oblique light is mixed with display light such as light source light and travels obliquely through the gap between the pixel electrodes, the difference in refractive index between the electro-optic material and the portion of the interlayer insulating film facing the light shielding film causes the difference between the two. When the light passes through the boundary or interface or between both of the other films, the oblique light is bent to the side where the light shielding film exists due to a refraction phenomenon. Then, as compared with the case where it is assumed that there is no such refraction phenomenon, the amount of light that is bent by refraction among the oblique light and reaches the light shielding film increases. In other words, the light leakage near the boundary region is reduced by guiding the oblique light that travels through the side of the light shielding film near the boundary region to the surface of the light shielding film to a greater or lesser extent. .

  For example, in a boundary region where a turbulent electric field other than the assumed driving electric field is applied, such as a lateral electric field, white spots can be reduced when the electric field is applied to the maximum in a normally white liquid crystal device. Alternatively, blackout can be reduced when a maximum electric field is applied in a normally black liquid crystal device. Therefore, a situation where the contrast ratio is lowered due to light leakage near the boundary region can be avoided very effectively. It is not necessary to unnecessarily widen the light shielding film that defines the non-opening region. That is, the brightness of the essential image can be maintained.

  As a result, according to the first electro-optical device of the present invention, it is possible to achieve bright display by stopping the non-opening area in a range that is not unnecessarily large, and to prevent light leakage near the boundary area. The contrast can be displayed. In addition, the configuration required for this is relatively simple, that is, the use of an interlayer insulating film having a high refractive index in at least a portion facing the light shielding film on one substrate.

  In order to solve the above-described problems, a second electro-optical device according to the present invention includes an electro-optical material sandwiched between a pair of substrates, and is provided on one of the pair of substrates corresponding to each pixel. A pixel electrode, a counter electrode provided on the other of the pair of substrates so as to oppose the pixel electrode, and provided on the other of the pair of substrates, and viewed in plan on the pair of substrates. A light shielding film that at least partially defines an opening region of each pixel, and the electro-optics at least at a portion facing the light shielding film. And an interlayer insulating film having a refractive index higher than that of the substance.

  The second electro-optical device according to the present invention operates in substantially the same manner as the first electro-optical device described above. However, in the present invention, by applying a “longitudinal electric field” between the pixel electrode and the counter electrode, an electro-optic operation such as liquid crystal is performed. The counter electrode is formed of a transparent conductive material that is the same as or different from the pixel electrode, for example, on a solid surface of the counter substrate on the side facing the pixel electrode. The light shielding film is, for example, a black matrix or a black mask provided in a lattice shape or a stripe shape on the other substrate which is a counter substrate. The light shielding film defines the non-opening region at least partially or redundantly.

  In the present invention, in particular, an interlayer insulating film is provided between the counter electrode and the light shielding film on the other substrate. In addition, the interlayer insulating film has a refractive index higher than that of the electro-optical material at least in a portion facing the light shielding film. The interlayer insulating film is composed of a silicon oxide film, a silicon nitride film, or the like having a higher refractive index than that of an electro-optic material that is a liquid crystal, for example.

  Therefore, when the oblique light is mixed with the display light such as the light source light and proceeds obliquely through the gap between the pixel electrodes, the difference in refractive index between the electro-optic material and the portion of the interlayer insulating film facing the light shielding film When the light passes through the boundary or interface between the two or between both the other thin films, the oblique light is bent to the side where the light shielding film exists due to a refraction phenomenon. Then, as compared with the case where it is assumed that there is no such refraction phenomenon, the amount of light that is bent by refraction among the oblique light and reaches the light shielding film increases. In other words, the light leakage near the boundary region is reduced by guiding the oblique light that travels through the side of the light shielding film near the boundary region to the surface of the light shielding film to a greater or lesser extent. .

  As a result of the above, according to the second electro-optical device according to the present invention, as in the case of the first electro-optical device described above, bright display is possible by stopping the non-opening area in an area that is not unnecessarily large. However, high-contrast display is possible by preventing light leakage near the boundary region. In addition, the configuration required for this is relatively simple, that is, the use of an interlayer insulating film having a high refractive index at least in a portion facing the light shielding film on the other substrate.

  In one aspect of the first or second electro-optical device according to the present invention described above, the interlayer insulating film has a higher refractive index in a portion not facing the light shielding film than in the facing portion.

  According to this aspect, the interlayer insulating film is divided into two portions or two or more portions having different refractive indexes, including a portion facing the light shielding film and a portion not facing the light shielding film. In addition, the interlayer insulating film has a higher refractive index in the portion that does not face the light shielding film than in the portion that faces the light shielding film. For this reason, when passing through the boundary or interface between these two portions in the interlayer insulating film, the oblique light is bent to the side away from the display region due to the refraction phenomenon. That is, as compared with a case where it is assumed that there is no such a refraction phenomenon, the amount of light that is bent by refraction among the oblique light and deviates from the display area is increased. In other words, the light leakage near the boundary region is further reduced by removing the oblique light that travels through the side of the light-shielding film in the vicinity of the boundary region from the display region to a greater or lesser extent. . As a result, a decrease in contrast can be prevented more effectively.

  In order to solve the above problems, an electronic apparatus according to the present invention includes the above-described first or second electro-optical device according to the present invention (including various aspects thereof).

  According to the electronic apparatus of the present invention, since the electro-optical device of the present invention described above is provided, a projection display device, a television, a mobile phone, an electronic notebook, and a word processor capable of performing high-quality image display. Various electronic devices such as a viewfinder type or a monitor direct view type video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized. In addition, as an electronic apparatus of the present invention, for example, an electrophoretic device such as electronic paper, an electron emission device (Field Emission Display and Conduction Electron-Emitter Display), and a display device using these electrophoretic device and electron emission device are realized. Is also possible.

  The effect | action and other gain of this invention are clarified from the form for implementing invention demonstrated below.

It is a top view which shows the whole structure of the liquid crystal device which concerns on this embodiment. It is HH 'sectional drawing of FIG. It is a circuit diagram which shows the electrical structure of the liquid crystal device which concerns on this embodiment. It is typical sectional drawing which extracts and shows the interlayer insulation film of the high refractive index in this embodiment with the optical path of diagonal light. It is typical sectional drawing of the same meaning as FIG. 4 in one modification. It is typical sectional drawing of the same meaning as FIG. 4 in another modification. It is typical sectional drawing of the same meaning as FIG. 4 in another modification. It is an example of the electronic device to which the liquid crystal device according to the present embodiment is applied.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following embodiments, a driving circuit built-in type TFT active matrix driving type liquid crystal device, which is an example of the electro-optical device of the present invention, is taken as an example.

<Liquid crystal device>
First, the overall configuration of the liquid crystal device according to the present embodiment will be described with reference to FIGS. 1 and 2.

  FIG. 1 is a schematic plan view showing a configuration of a liquid crystal device when the TFT array substrate 10 is viewed from the counter substrate 20 side together with each component formed thereon, and FIG. 2 is a plan view of FIG. It is HH 'sectional drawing.

  1 and 2, the liquid crystal device according to the present embodiment includes a TFT array substrate 10 and a counter substrate 20 that are arranged to face each other. The TFT array substrate 10 is, for example, a transparent substrate such as a quartz substrate or a glass substrate, or a silicon substrate. The counter substrate 20 is also a substrate made of the same material as the TFT array substrate 10, for example. A liquid crystal layer 50 is sealed between the TFT array substrate 10 and the counter substrate 20, and the TFT array substrate 10 and the counter substrate 20 are sealed around the image display region 10a where the electro-optical operation is performed. They are bonded to each other by a sealing material 52 provided in the region.

  The sealing material 52 is made of, for example, an ultraviolet curable resin, a thermosetting resin, or the like for bonding the two substrates, and is applied on the TFT array substrate 10 in the manufacturing process and then cured by ultraviolet irradiation, heating, or the like. It is. Further, for example, in the sealing material 52, a gap material 56 such as a glass fiber or a glass bead for dispersing the distance (inter-substrate gap) between the TFT array substrate 10 and the counter substrate 20 to a predetermined value is dispersed.

  A light-shielding frame light-shielding film 53 that defines the frame area of the image display area 10a is provided on the counter substrate 20 side in parallel with the inside of the seal area where the sealing material 52 is disposed. However, part or all of the frame light shielding film 53 may be provided as a built-in light shielding film on the TFT array substrate 10 side.

  A data line driving circuit 101, a sampling circuit 7, a scanning line driving circuit 104, and an external circuit connection terminal 102 are formed in the peripheral area located around the image display area 10 a on the TFT array substrate 10.

  In the peripheral region on the TFT array substrate 10, a data line driving circuit 101 and a plurality of external circuit connection terminals 102 are provided along one side of the TFT array substrate 10 on the outer peripheral side of the seal region.

  Further, a region located on the inner side of the seal region in the peripheral region on the TFT array substrate 10 is covered with the frame light shielding film 53 along one side of the image display region 10 a along one side of the TFT array substrate 10. A sampling circuit 7 is arranged.

  The scanning line driving circuit 104 is provided along two sides adjacent to one side of the TFT array substrate 10 so as to be covered with the frame light shielding film 53. Further, in order to electrically connect the two scanning line driving circuits 104 provided on both sides of the image display region 10a in this way, the TFT array substrate 10 is covered with the frame light shielding film 53 along the remaining side. A plurality of wirings 105 are provided.

  In the peripheral region on the TFT array substrate 10, vertical conduction terminals 106 are disposed in regions facing the four corners of the counter substrate 20, and vertical conduction is provided between the TFT array substrate 10 and the counter substrate 20. A material is provided corresponding to the vertical conduction terminal 106 and electrically connected to the terminal 106.

  In FIG. 2, on the TFT array substrate 10, a laminated structure is formed in which wirings such as TFTs for pixel switching, scanning lines, and data lines are formed. In the image display area 10a, pixel electrodes 9 are provided in a matrix form on the upper layer of wiring such as pixel switching TFTs, scanning lines, and data lines. The pixel electrode 9 is formed as a transparent electrode made of an ITO film. An alignment film 16 is formed on the pixel electrode 9.

  On the other hand, a light shielding film 23 is formed on the surface of the counter substrate 20 facing the TFT array substrate 10. The light shielding film 23 is formed of, for example, a light shielding metal film or the like, and is patterned, for example, in a lattice shape in the image display region 10a on the counter substrate 20. A counter electrode 21 made of an ITO film is formed on the light shielding film 23 (below the light shielding film 23 in FIG. 2), for example, in a solid shape so as to face the plurality of pixel electrodes 9, and further on the counter electrode 21 ( An alignment film 22 is formed on the lower side of the counter electrode 21 in FIG.

  The liquid crystal layer 50 is made of, for example, a liquid crystal in which one or several types of nematic liquid crystals are mixed, and takes a predetermined alignment state between the pair of alignment films. A liquid crystal storage capacitor is formed between the pixel electrode 9 and the counter electrode 21 by applying a voltage to each of the liquid crystal devices when the liquid crystal device is driven.

  Although not shown here, on the TFT array substrate 10, in addition to the data line driving circuit 101 and the scanning line driving circuit 104, a plurality of data lines are precharged at a predetermined voltage level prior to the image signal. A precharge circuit to be supplied, an inspection circuit for inspecting the quality, defects, etc. of the liquid crystal device during manufacture or at the time of shipment may be formed.

  Next, the electrical configuration of the image display area of the liquid crystal device according to the present embodiment will be described with reference to FIG. FIG. 3 is an equivalent circuit diagram of various elements, wirings, and the like in a plurality of pixels formed in a matrix forming the image display area of the liquid crystal device according to this embodiment.

  In FIG. 3, a pixel electrode 9 and a pixel switching TFT 30 are formed in each of a plurality of pixels formed in a matrix that forms the image display region 10a. The TFT 30 is electrically connected to the pixel electrode 9, and performs switching control of the pixel electrode 9 when the liquid crystal device according to the present embodiment operates. The data line 6 to which the image signal is supplied is electrically connected to the source region of the TFT 30. Image signals S1, S2,..., Sn to be written to the data lines 6 may be supplied line-sequentially in this order, or may be supplied for each group to a plurality of adjacent data lines 6. Good.

  The scanning line 11 is electrically connected to the gate of the TFT 30, and the liquid crystal device according to the present embodiment applies the scanning signals G1, G2,..., Gm to the scanning line 11 in a pulsed manner at a predetermined timing. It is configured to apply in a line sequential order. The pixel electrode 9 is electrically connected to the drain of the TFT 30, and the image signal S1, S2,..., Sn supplied from the data line 6 is obtained by closing the switch of the TFT 30 serving as a switching element for a certain period. It is written at a predetermined timing. A predetermined level of image signals S1, S2,..., Sn written to the liquid crystal via the pixel electrode 9 is constant between the counter electrode 21 (see FIG. 2) formed on the counter substrate 20 (see FIG. 2). Hold for a period.

  The liquid crystal constituting the liquid crystal layer 50 (see FIG. 2) modulates light and enables gradation display by changing the orientation and order of the molecular assembly depending on the applied voltage level. In the normally white mode, the transmittance for incident light is reduced according to the voltage applied in units of each pixel, and in the normally black mode, the light is incident according to the voltage applied in units of each pixel. The transmittance for light is increased, and light having a contrast corresponding to an image signal is emitted from the liquid crystal device as a whole.

  In order to prevent the image signal held here from leaking, a storage capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9 and the counter electrode 21 (see FIG. 2). Has been.

  Next, with reference to FIG. 4, a specific laminated structure related to the light shielding film and the interlayer insulating film in the image display region 10a of the liquid crystal device according to the present embodiment will be described in detail. FIG. 4 is a schematic cross-sectional view showing the interlayer insulating film having a high refractive index in the present embodiment, extracted with an optical path of oblique light. In the cross section of FIG. 4, the display of the electronic elements such as the TFT 30, the wiring, the alignment film, etc. is omitted for convenience of explanation or does not appear on the cross section.

  As shown in FIG. 4, the liquid crystal device includes a light shielding film 401 on the TFT array substrate 10 that at least partially defines an opening area of each pixel. The light shielding film 401 may also be used as the data line 6, the scanning line 11, the capacitor line 300 shown in FIG. 3, or a patterned conductive film having other functions such as a capacitor electrode, a relay electrode, and a shield line. It may be a dedicated light-shielding film that is conductive or non-metallic, or conductive or non-conductive. The light shielding film 401 is formed of a material having low light transmittance, for example, formed of various light reflective materials such as Al, or various materials excellent in light reflectance and light absorption such as TiN, W, or silicide thereof. Is done. An opaque semiconductor layer, a polysilicon film, or the like can also be used.

  A lattice-shaped non-opening region is defined by the light shielding film 401 built in the TFT array substrate 10 and the light shielding film 23 built in the counter substrate 20. Therefore, for example, the light shielding film 401 may be a light shielding film extending in a stripe shape in the first direction, and the light shielding film 23 may be a light shielding film extending in a stripe shape in a second direction intersecting the first direction. . On the TFT array substrate 10, the interlayer insulating film 501 is provided between the pixel electrode 9 and the light shielding film 401. The interlayer insulating film 401 is composed of a silicon oxide film, a silicon nitride film, a transparent resin film or the like having a higher refractive index than the liquid crystal layer 50. The refractive index of the interlayer insulating film 501 has a high value of 1.5 to 2.0 or more, for example. The layer thickness of the interlayer insulating film 501 is, for example, 0.2 μm to 1.0 μm.

  On the other hand, on the counter substrate 20, the interlayer insulating film 502 is provided between the light shielding film 23 and the counter electrode 21.

  In FIG. 4, wirings, electrodes, elements, and the like shown in FIG. 3 are constructed from various conductive layers, semiconductor layers, and interlayer insulating films at the layer portion 402 or an interlayer position corresponding thereto.

  In FIG. 4, during the operation of the liquid crystal device, the liquid crystal layer 50 has an alignment that causes “light omission” that is a white spot when a voltage is applied in a normally white mode or a black spot when a voltage is applied in a normally black mode. A defective portion 50d is generated. For example, when a vertical electric field is assumed to be driven for liquid crystal driving between the pixel electrode 9 and the counter electrode 21, the misalignment portion 50d is generated corresponding to voltage inversion in the inversion driving between adjacent pixel electrodes. This is caused by the horizontal electric field generated or by the horizontal electric field generated corresponding to the potential difference of the image signal between adjacent pixel electrodes. Therefore, the alignment defect portion 50d is remarkably generated in the vicinity of the boundary region corresponding to the gap between the pixel electrodes 9.

  If no countermeasure is taken here, when the misalignment portion 50d occurs, the oblique light L0 included in the display light passes through the misalignment portion 50d and is emitted from the liquid crystal device as the passing light Lx. And mixed in the display light modulated in accordance with the image signal. That is, light leakage is caused and the contrast ratio is lowered.

  However, in the present embodiment, when the oblique light L0 is mixed with the display light and travels obliquely in the gap between the pixel electrodes 9, a difference between the liquid crystal layer 50 and the interlayer insulating film 501 causes a boundary or interface between them or The oblique light L0 is bent toward the side where the light-shielding film 401 exists due to a refraction phenomenon when passing between both of the other films. That is, the light becomes oblique light L1 due to refraction. Further, the oblique light L1 is absorbed by the light shielding film 401 or reflected by the surface of the light shielding film 401 to be reflected light L2 or scattered. In any case, since the oblique light L0 becomes the oblique light Lx, it is effectively prevented from being mixed with the display light and emitted outside the liquid crystal device.

  In FIG. 4, the alignment film 16 (see FIG. 2) (not shown) is strictly interposed between the liquid crystal layer 50 and the interlayer insulating film 501, but the alignment film 16 is almost or completely practical with the liquid crystal layer 50. 4, the alignment film 16 may be optically included in the liquid crystal layer 50 in FIG. 4.

  As described above, the oblique light L1 that is bent by refraction and reaches the light shielding film 401 among the oblique light L0 increases as compared with the case where the high-refractive-index interlayer insulating film 501 is not provided. In other words, the oblique light L0 that tries to travel through the side of the light shielding film 401 in the vicinity of the boundary region is guided to the surface of the light shielding film 401, so that the oblique light Lx that constitutes light leakage near the boundary region is generated. It can be effectively reduced.

  Furthermore, as is clear from FIG. 4, it is not necessary to form the light shielding film 401 that defines the non-opening region unnecessarily wide. In other words, the brightness of the essential image can be maintained by suppressing the ratio at which the display light that travels straight is blocked by the light shielding film 401. As for the laminated structure on the TFT array substrate 10, the interlayer insulating film 501 may be constructed as an interlayer insulating film necessary for interlayer insulation between the pixel electrode 9 and the light shielding film 401 having a function such as wiring. A relatively simple one is sufficient.

<Modification>
Next, various modified examples of the present embodiment will be described with reference to FIGS. 4 and 5 to 7. Here, FIGS. 5 to 7 are schematic sectional views having the same concept as in FIG. 4 in various modifications.

  As shown in FIG. 5, in the liquid crystal device according to one modification, the interlayer insulating film 501 includes a first portion 501a having a high refractive index similar to that of the interlayer insulating film 501 in the embodiment shown in FIG. The second embodiment is different from the above-described embodiment in that the second portion 501b has a higher refractive index than the first portion 501a. Since the points other than this point are the same as those in the above-described embodiment, the description thereof is omitted here.

  According to this modification, when passing through the boundary or interface between the first portion 501a and the second portion 501b, the oblique light L0 is bent to the side away from the display area due to the refraction phenomenon, and the oblique light Ly (Bent in the counterclockwise direction in the figure). That is, as compared with the case where there is no refraction phenomenon at the boundary or interface between the first portion 501a and the second portion 501b, the oblique light Ly that is bent by refraction out of the oblique light L0 and deviates from the display area increases. If it is removed from the display area, even if the oblique light Ly exists as an asserted light omission, it does not actually become a light component that constitutes an omission in the display light. That is, although the light use efficiency is lowered, the light does not escape to lower the contrast ratio.

  As described above, according to the modification shown in FIG. 5, light leakage near the boundary region can be further reduced as compared with the case of the above-described embodiment.

  Next, another modification will be described with reference to FIG. 4 again.

  The liquid crystal device according to this modification is different from the above-described embodiment in that the interlayer insulating film 502 has the same high refractive index as the interlayer insulating film 501 in the embodiment shown in FIG. The refractive index of the interlayer insulating film 501 may be lower or higher than that of the liquid crystal layer 50. Since the points other than this point are the same as those in the above-described embodiment, the description thereof is omitted here.

  According to this modification, when the oblique light travels obliquely through the gap between the pixel electrodes 9, the boundary or interface between them or another film due to the difference in refractive index between the interlayer insulating film 502 and the liquid crystal layer 50. The ratio of reaching the light-shielding film 23 or the light-shielding film 401 is increased by being bent due to a refraction phenomenon when passing between both of them. As a result, a situation in which the light is mixed with the display light and emitted outside the liquid crystal device is effectively prevented.

  In this case, the interlayer insulating film 501 may also have a higher refractive index than the liquid crystal layer 50. Alternatively, the interlayer insulating film 501 may have a refractive index lower than that of the liquid crystal layer 50. If both the interlayer insulating films 501 and 502 are configured to have a high refractive index, it is advantageous because light leakage can be reduced by refraction at the upper and lower boundary surfaces of the liquid crystal layer 50 in FIG.

  Next, as shown in FIG. 6, in a liquid crystal device according to another modification, the interlayer insulating film 502 includes two first portions 502a separated in the same manner as the interlayer insulating film 501 in the modification shown in FIG. It differs from the above-mentioned embodiment in that it has 502b and has a high refractive index. The second portion 502b has a higher refractive index than the first portion 502a. Since the points other than these points are the same as those in the above-described embodiment, the description thereof is omitted here.

  According to this modification, when the oblique light travels obliquely through the gap between the pixel electrodes 9, the boundary or interface between them or another film due to the difference in refractive index between the interlayer insulating film 502 and the liquid crystal layer 50. The ratio of reaching the light-shielding film 23 or the light-shielding film 401 is increased by being bent due to a refraction phenomenon when passing between both of them. Furthermore, the amount of light that is bent out of the display area among the oblique light is also increased by refraction at the boundary or interface between the first portion 502a and the second portion 502b having a higher refractive index. As a result, a situation where the light is mixed with the display light and emitted outside the liquid crystal device is very effectively prevented.

  Next, as shown in FIG. 7, in the liquid crystal device according to another modification, the interlayer insulating film 502 is divided into two parts, the first part 502 a, similar to the interlayer insulating film 501 in the modification shown in FIG. 5. 5 and 502b, and is different from the modification of FIG. 5 in that it has a high refractive index. Since the points other than these points are the same as those in the modification shown in FIG. 5, the description thereof is omitted here.

  According to this modification, the oblique light is refracted at the interface between the liquid crystal layer 50 and the interlayer insulating film on the TFT array substrate 10 side and the counter substrate 20 side, and at the interface between the two divided interlayer insulating films, respectively. Due to the refraction, the rate of reaching the light shielding film 23 or the light shielding film 401 is increased, and the amount of light that is bent out of the display area in the oblique light is also increased. As a result, a situation where the light is mixed with the display light and emitted outside the liquid crystal device is very effectively prevented.

<Electronic equipment>
Next, the case where the liquid crystal device which is the above-described electro-optical device is applied to various electronic devices will be described.

  FIG. 8 is a plan view showing a configuration example of the projector. Hereinafter, a projector using the liquid crystal device as a light valve will be described.

  As shown in FIG. 8, a projector 1100 includes a lamp unit 1102 made of a white light source such as a halogen lamp. The projection light emitted from the lamp unit 1102 is separated into three primary colors of RGB by four mirrors 1106 and two dichroic mirrors 1108 arranged in the light guide 1104, and serves as a light valve corresponding to each primary color. The light enters the liquid crystal panels 1110R, 1110B, and 1110G.

  The configurations of the liquid crystal panels 1110R, 1110B, and 1110G are the same as those of the liquid crystal device described above, and are driven by R, G, and B primary color signals supplied from the image signal processing circuit. The light modulated by these liquid crystal panels enters the dichroic prism 1112 from three directions. In the dichroic prism 1112, R and B light is refracted at 90 degrees, while G light travels straight. Therefore, as a result of the synthesis of the images of the respective colors, a color image is projected onto the screen or the like via the projection lens 1114.

  Here, paying attention to the display images by the liquid crystal panels 1110R, 1110B, and 1110G, the display image by the liquid crystal panel 1110G needs to be horizontally reversed with respect to the display images by the liquid crystal panels 1110R and 1110B.

  In addition, since light corresponding to each primary color of R, G, and B is incident on the liquid crystal panels 1110R, 1110B, and 1110G by the dichroic mirror 1108, it is not necessary to provide a color filter.

  In addition to the electronic device described with reference to FIG. 8, a mobile personal computer, a mobile phone, a liquid crystal television, a viewfinder type, a monitor direct-view type video tape recorder, a car navigation device, a pager, an electronic device Examples include a notebook, a calculator, a word processor, a workstation, a videophone, a POS terminal, and a device equipped with a touch panel. Needless to say, the present invention can be applied to these various electronic devices.

  In addition to the liquid crystal devices described in the above embodiments, the present invention includes a reflective liquid crystal device (LCOS), a plasma display (PDP), a field emission display (FED, SED), an organic EL display, and a digital micromirror device. (DMD), electrophoresis apparatus and the like are also applicable.

  The present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the spirit or concept of the invention that can be read from the claims and the entire specification. The manufacturing method and the electronic apparatus provided with the electro-optical device are also included in the technical scope of the present invention.

  9 pixel electrode, 10 TFT array substrate, 10a image display area, 20 counter substrate, 21 counter electrode, 30 TFT, 50 liquid crystal layer, 50d misalignment portion, 70 storage capacitor, 401 light shielding film, 501 high refractive index interlayer insulating film 501a First part of the interlayer insulating film, 501b Second part of the interlayer insulating film, 502 Interlayer insulating film

Claims (4)

An electro-optic material is sandwiched between a pair of substrates,
A pixel electrode provided corresponding to each pixel on one of the pair of substrates;
A light-shielding film that is provided on the one side and at least partially defines an opening region of each pixel when viewed in plan on the pair of substrates;
An interlayer insulating film provided between the pixel electrode and the light shielding film on the one side and having a refractive index higher than that of the electro-optic material at least in a portion facing the light shielding film. Electro-optic device. An electro-optic material is sandwiched between a pair of substrates,
A pixel electrode provided corresponding to each pixel on one of the pair of substrates;
A counter electrode provided on the other of the pair of substrates so as to face the pixel electrode;
A light-shielding film that is provided on the other and that at least partially defines an opening region of each pixel as viewed in plan on the pair of substrates;
An interlayer insulating film provided between the counter electrode and the light shielding film on the other, and having a refractive index higher than that of the electro-optic material at least in a portion facing the light shielding film. Electro-optic device.   3. The electro-optical device according to claim 1, wherein the interlayer insulating film has a higher refractive index in a portion not facing the light shielding film than in the facing portion.   An electronic apparatus comprising the electro-optical device according to any one of claims 1 to 3.

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