JP2010108878A - Conductive film for touch panel, conductive film forming photosensitive material, conductive material, and conductive film - Google Patents

Conductive film for touch panel, conductive film forming photosensitive material, conductive material, and conductive film Download PDF

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JP2010108878A
JP2010108878A JP2008282372A JP2008282372A JP2010108878A JP 2010108878 A JP2010108878 A JP 2010108878A JP 2008282372 A JP2008282372 A JP 2008282372A JP 2008282372 A JP2008282372 A JP 2008282372A JP 2010108878 A JP2010108878 A JP 2010108878A
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conductive
conductive film
layer
touch panel
fine particles
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JP2010108878A5 (en
JP5469849B2 (en
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Tsukasa Tokunaga
司 徳永
Akira Ichiki
晃 一木
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Fujifilm Corp
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Priority to KR1020090104098A priority patent/KR20100048932A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/045Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0026Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal

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  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
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  • Metallurgy (AREA)
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  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Position Input By Displaying (AREA)
  • Non-Insulated Conductors (AREA)
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a conductive film for a touch panel having suitable conductivity, and improved touch panel characteristics by sufficiently reducing moire. <P>SOLUTION: The conductive film 10 for the touch panel includes a conductive layer 14 containing silver, which is formed by exposing and developing a silver salt emulsion layer 16 on a support 12. The silver salt emulsion layer 16 includes a silver application amount of 1.5-3.1 g/m<SP>2</SP>. The conductive layer 14 is formed in a mesh pattern having a pitch of 600-800 μm, and the conductive layer has a surface resistance of 200-800 Ω/sq. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、導電膜に関し、さらに詳しくは、タッチパネルに搭載されるタッチパネル用導電膜、導電膜形成用感光材料、導電性材料及び導電膜に関する。   The present invention relates to a conductive film, and more particularly to a conductive film for a touch panel mounted on a touch panel, a photosensitive material for forming a conductive film, a conductive material, and a conductive film.

近年、様々な製造方法による導電性フィルムが検討されている(例えば、特許文献1〜5参照)。この中で、ハロゲン化銀乳剤層を塗布し、該ハロゲン化銀乳剤層を、導電性のための銀の導電部と透明性の確保のための開口部とを有するパターン形状となるようにパターン露光することにより、導電性フィルムとして製造される銀塩方式の導電性フィルムがある(例えば、特許文献6〜11参照)。この銀塩方式の導電性フィルムは、電磁波シールドへの用途が目的とされており、一般的に、表面抵抗が低いものが求められており、また、めっき等の手段により表面抵抗を低減している。   In recent years, conductive films by various production methods have been studied (for example, see Patent Documents 1 to 5). In this, a silver halide emulsion layer is applied, and the silver halide emulsion layer is patterned so as to have a pattern shape having a conductive portion of silver for conductivity and an opening portion for ensuring transparency. There is a silver salt type conductive film manufactured as a conductive film by exposure (for example, see Patent Documents 6 to 11). This silver salt type conductive film is intended for use as an electromagnetic shield, and generally has a low surface resistance. In addition, the surface resistance is reduced by means such as plating. Yes.

特開2000−13088号公報JP 2000-13088 A 特開平10−340629号公報Japanese Patent Laid-Open No. 10-340629 特開平10−41682号公報Japanese Patent Laid-Open No. 10-41682 特公昭42−23746号公報Japanese Patent Publication No.42-23746 特開2006−228649号公報JP 2006-228649 A 特開2004−221564号公報JP 2004-221564 A 特開2004−221565号公報JP 2004-221565 A 特開2007−95408号公報JP 2007-95408 A 特開2006−228469号公報JP 2006-228469 A 特開2006−332459号公報JP 2006-332459 A 特開2008−244067号公報JP 2008-244067 A

一方、導電性フィルムは種々の用途が検討されており、本発明者らはタッチパネル用の電極としての利用に着目して研究してきた。   On the other hand, various uses of the conductive film have been studied, and the present inventors have studied focusing on the use as an electrode for a touch panel.

本発明の目的は、タッチパネル用導電膜として好適な導電性を有し、モアレが十分に低減され、タッチパネル特性に優れるタッチパネル用導電膜、導電膜形成用感光材料、導電性材料及び導電膜を提供することにある。   An object of the present invention is to provide a conductive film for a touch panel, a conductive material for forming a conductive film, a conductive material, and a conductive film that have conductivity suitable as a conductive film for a touch panel, have sufficiently reduced moire, and have excellent touch panel characteristics. There is to do.

本発明者らは、鋭意検討を行った結果、銀塩乳剤層の塗布銀量を調整するとと共に、ピッチを調整することで、上記課題を解決し得ることを見い出し、本発明を完成するに至った。   As a result of intensive studies, the present inventors have found that the above problems can be solved by adjusting the amount of silver applied to the silver salt emulsion layer and adjusting the pitch, and have completed the present invention. It was.

すなわち、以下の発明により上記課題を解決できる。
[1] 第1の本発明に係るタッチパネル用導電膜は、支持体上に銀塩乳剤層を露光現像して形成された銀を含有する導電層を有するタッチパネル用導電膜であって、前記銀塩乳剤層の塗布銀量が1.5〜3.1g/m2であり、前記導電層がピッチ600μm以上800μm以下のメッシュパターンに形成され、表面抵抗が200〜800オーム/sq.であることを特徴とする。
[2] 第1の本発明において、前記銀塩乳剤層の銀/バインダーの体積比率が1/4以上であることを特徴とする。
[3] 第1の本発明において、前記銀塩乳剤層の銀/バインダーの体積比率が1/2以上1/0.7以下であることを特徴とする。
[4] 第1の本発明において、前記導電層の線幅が5〜10μmであることを特徴とする。
[5] 第1の本発明において、さらに透明導電層を備え、前記透明導電層は、導電性微粒子及びバインダーを含有し、前記導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)が1/3〜2/1であることを特徴とする。
[6] 次に、第2の本発明に係る導電膜形成用感光材料は、銀塩乳剤層を有する導電膜形成用感光材料において、前記銀塩乳剤層の塗布銀量が1.5〜3.1g/m2であり、さらに、透明導電層を有し、前記透明導電層は、導電性微粒子及びバインダーを含有し、前記導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)が1/3〜2/1であることを特徴とする。
[7] 第2の本発明において、前記銀塩乳剤層が前記導電性微粒子を含有して、前記透明導電層を兼用し、前記導電性微粒子の含有量が、0.15〜0.5g/m2であることを特徴とする。
[8] 第2の本発明において、前記透明導電層は前記銀塩乳剤層の上層側に位置し、前記透明導電層の前記導電性微粒子の含有量が、0.2〜0.4g/m2であることを特徴とする。
[9] 第2の本発明において、前記透明導電層は前記銀塩乳剤層の下層側に位置し、前記透明導電層の前記導電性微粒子の含有量が、0.15〜0.5g/m2であることを特徴とする。
[10] 第2の本発明において、前記導電性微粒子が球状のときは、平均粒子径が0.085〜0.12μmであり、前記導電性微粒子が針状のときは、平均軸長が長軸0.2〜20μm、短軸0.01〜0.02μmであることを特徴とする。
[11] 次に、第3の本発明に係る導電性材料は、上述した第2の本発明に係る導電膜形成用感光材料をパターン露光し、現像処理して得られることを特徴とする。
[12] 次に、第4の本発明に係る導電膜は、支持体上に導電層を有する導電膜であって、前記導電層又は前記導電層とは別の層が、導電性微粒子及びバインダーを含有し、前記導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)が1/3〜2/1であることを特徴とする。
That is, the following problems can be solved by the following invention.
[1] The conductive film for a touch panel according to the first aspect of the present invention is a conductive film for a touch panel having a conductive layer containing silver formed by exposing and developing a silver salt emulsion layer on a support. The coated silver amount of the salt emulsion layer is 1.5 to 3.1 g / m 2 , the conductive layer is formed in a mesh pattern with a pitch of 600 μm to 800 μm, and the surface resistance is 200 to 800 ohm / sq. It is characterized by being.
[2] In the first invention, the silver / binder volume ratio of the silver salt emulsion layer is ¼ or more.
[3] In the first invention, the silver / binder volume ratio of the silver salt emulsion layer is ½ or more and 1 / 0.7 or less.
[4] In the first aspect of the present invention, the conductive layer has a line width of 5 to 10 μm.
[5] In the first aspect of the present invention, the transparent conductive layer further includes a conductive fine particle and a binder, and a mass ratio of the conductive fine particle to the binder (conductive fine particle / binder) is 1. / 3 to 2/1.
[6] Next, the conductive film-forming photosensitive material according to the second aspect of the present invention is the conductive film-forming photosensitive material having a silver salt emulsion layer, wherein the silver salt emulsion layer has a coating silver amount of 1.5-3. 0.1 g / m 2 , further having a transparent conductive layer, the transparent conductive layer containing conductive fine particles and a binder, and a mass ratio of the conductive fine particles to the binder (conductive fine particles / binder) is 1. / 3 to 2/1.
[7] In the second aspect of the present invention, the silver salt emulsion layer contains the conductive fine particles and also serves as the transparent conductive layer, and the content of the conductive fine particles is 0.15 to 0.5 g / characterized in that it is a m 2.
[8] In the second aspect of the present invention, the transparent conductive layer is located on an upper layer side of the silver salt emulsion layer, and the content of the conductive fine particles in the transparent conductive layer is 0.2 to 0.4 g / m. characterized in that it is a 2.
[9] In the second invention, the transparent conductive layer is located on a lower layer side of the silver salt emulsion layer, and the content of the conductive fine particles in the transparent conductive layer is 0.15 to 0.5 g / m. characterized in that it is a 2.
[10] In the second aspect of the present invention, when the conductive fine particles are spherical, the average particle diameter is 0.085 to 0.12 μm, and when the conductive fine particles are needle-shaped, the average axial length is long. The axis is 0.2 to 20 μm, and the minor axis is 0.01 to 0.02 μm.
[11] Next, the conductive material according to the third aspect of the present invention is obtained by subjecting the above-described photosensitive material for forming a conductive film according to the second aspect of the present invention to pattern exposure and development processing.
[12] Next, the conductive film according to the fourth aspect of the present invention is a conductive film having a conductive layer on a support, and the conductive layer or a layer different from the conductive layer is formed of conductive fine particles and a binder. And the mass ratio of the conductive fine particles to the binder (conductive fine particles / binder) is 1/3 to 2/1.

以上説明したように、本発明に係るタッチパネル用導電膜は、タッチパネル用導電膜として好適な導電性を有し、モアレが十分に低減され、タッチパネル特性に優れる。本発明のタッチパネル用導電膜は、導電層の表面抵抗が1000〜2500オーム/sq.であることから、タッチパネル(特に静電容量式)の信号特性に優れ、ノイズが十分に低減される。また、メッシュパターンのピッチを1400μm以下とすることで、導電層のメッシュパターンが目立たなくなり、見た目が良好となる。従って、タッチパネルを通じての文字や画像等の表示が見やすくなり、視認性に優れる。また、本発明のタッチパネル用導電膜は、精度が要求されるペン入力での直線性に優れ、表面抵抗のばらつきが十分に低減されていることから、タッチパネル側での過度の設定、例えば直線性や抵抗のばらつきを補正するための過度の設定を不要にすることができる。   As described above, the conductive film for a touch panel according to the present invention has conductivity suitable as a conductive film for a touch panel, moire is sufficiently reduced, and the touch panel characteristics are excellent. In the conductive film for a touch panel of the present invention, the surface resistance of the conductive layer is 1000 to 2500 ohm / sq. Therefore, the signal characteristics of the touch panel (particularly the capacitance type) are excellent, and noise is sufficiently reduced. Further, by setting the mesh pattern pitch to 1400 μm or less, the mesh pattern of the conductive layer becomes inconspicuous and the appearance is improved. Therefore, the display of characters, images, and the like through the touch panel is easy to see, and the visibility is excellent. In addition, the conductive film for touch panel of the present invention has excellent linearity at the time of pen input requiring accuracy, and variation in surface resistance is sufficiently reduced, so that excessive setting on the touch panel side, for example, linearity And excessive setting for correcting variation in resistance can be eliminated.

また、本発明に係る導電膜形成用感光材料、導電材料及び導電膜は、上述した効果を有するタッチパネル用導電膜を作製することができる。   Moreover, the photosensitive material for conductive film formation, the conductive material, and the conductive film according to the present invention can produce a conductive film for a touch panel having the above-described effects.

以下、本発明に係るタッチパネル用導電膜、導電膜形成用感光材料、導電材料及び導電膜を例えばタッチパネルに適用した実施の形態例を図1〜図3を参照しながら説明する。   Hereinafter, an embodiment in which a conductive film for a touch panel, a photosensitive material for forming a conductive film, a conductive material, and a conductive film according to the present invention are applied to, for example, a touch panel will be described with reference to FIGS.

本実施の形態に係るタッチパネル用導電膜10は、図1に示すように、支持体12上に銀を含有する2つの導電層14を有する。2つの導電層14は、ギャップ23を挟んで対向するように積層されている。これら導電層14は、銀塩乳剤層16を露光現像して形成され、銀塩乳剤層16の塗布銀量は1.5〜3.1g/m2である。 As shown in FIG. 1, the conductive film 10 for a touch panel according to the present embodiment has two conductive layers 14 containing silver on a support 12. The two conductive layers 14 are laminated so as to face each other with the gap 23 interposed therebetween. These conductive layers 14 are formed by exposing and developing the silver salt emulsion layer 16, and the coated silver amount of the silver salt emulsion layer 16 is 1.5 to 3.1 g / m 2 .

また、導電層14は、図2に示すように、ピッチPaが600μm以上800μm以下のメッシュパターン18に形成され、その表面抵抗は200〜800オーム/sq.である。導電層14は、メッシュ状に形成された導電部分20とそれ以外の開口部22とを含む層である。なお、タッチパネル用導電膜10には透明導電層を設ける場合があるが、その場合でも透明導電層の表面抵抗は導電層14の表面抵抗と比較して大きいため、導電層14の表面抵抗がタッチパネル用導電膜10の表面抵抗となる。   Further, as shown in FIG. 2, the conductive layer 14 is formed in a mesh pattern 18 having a pitch Pa of 600 μm or more and 800 μm or less, and its surface resistance is 200 to 800 ohm / sq. It is. The conductive layer 14 is a layer including the conductive portion 20 formed in a mesh shape and the other opening 22. In some cases, a transparent conductive layer is provided on the conductive film 10 for the touch panel, but even in that case, the surface resistance of the transparent conductive layer 14 is larger than the surface resistance of the conductive layer 14. It becomes the surface resistance of the conductive film 10.

このような本実施の形態に係るタッチパネル用導電膜10は、以下に詳述する特定のハロゲン化銀感光材料である銀塩乳剤層16に特定形状のメッシュパターン18を露光現像することで得られる。   Such a conductive film 10 for a touch panel according to this embodiment can be obtained by exposing and developing a mesh pattern 18 having a specific shape on a silver salt emulsion layer 16 which is a specific silver halide photosensitive material described in detail below. .

なお、支持体12と導電層14との間に図示しない透明導電層が介在されてもよいし、導電層14とタッチパネルの表面層との間に透明導電層が介在されてもよい。   Note that a transparent conductive layer (not shown) may be interposed between the support 12 and the conductive layer 14, or a transparent conductive layer may be interposed between the conductive layer 14 and the surface layer of the touch panel.

ここで、本実施の形態に係るタッチパネル用導電膜10の各層の構成について、以下に詳細に説明する。   Here, the configuration of each layer of the conductive film for touch panel 10 according to the present embodiment will be described in detail below.

[支持体12]
本実施の形態に係るタッチパネル用導電膜10に用いられる支持体12としては、プラスチックフィルム、プラスチック板、ガラス板等を挙げることができる。
[Support 12]
Examples of the support 12 used in the conductive film 10 for a touch panel according to the present embodiment include a plastic film, a plastic plate, and a glass plate.

上記プラスチックフィルム及びプラスチック板の原料としては、例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)等のポリエステル類;ポリエチレン(PE)、ポリプロピレン(PP)、ポリスチレン、EVA等のポリオレフィン類;ビニル系樹脂;その他、ポリカーボネート(PC)、ポリアミド、ポリイミド、アクリル樹脂、トリアセチルセルロース(TAC)等を用いることができる。   Examples of the raw material for the plastic film and plastic plate include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); polyolefins such as polyethylene (PE), polypropylene (PP), polystyrene, and EVA; Resin; In addition, polycarbonate (PC), polyamide, polyimide, acrylic resin, triacetyl cellulose (TAC) and the like can be used.

支持体12としては、PET(融点:258℃)、PEN(融点:269℃)、PE(融点:135℃)、PP(融点:163℃)、ポリスチレン(融点:230℃)、ポリ塩化ビニル(融点:180℃)、ポリ塩化ビニリデン(融点:212℃)やTAC(融点:290℃)等の融点が約290℃以下であるプラスチックフィルム、又はプラスチック板が好ましく、特に、光透過性や加工性等の観点から、PETが好ましい。タッチパネル用導電膜10のような透明導電性フィルムは透明性が要求されるため、支持体12の透明度は高いことが好ましい。   Examples of the support 12 include PET (melting point: 258 ° C.), PEN (melting point: 269 ° C.), PE (melting point: 135 ° C.), PP (melting point: 163 ° C.), polystyrene (melting point: 230 ° C.), polyvinyl chloride ( A plastic film or a plastic plate having a melting point of about 290 ° C. or less, such as polyvinylidene chloride (melting point: 212 ° C.) or TAC (melting point: 290 ° C.), is preferred, particularly light transmittance and workability. From these viewpoints, PET is preferable. Since the transparent conductive film such as the conductive film 10 for the touch panel is required to be transparent, the support 12 is preferably highly transparent.

[銀塩乳剤層16]
タッチパネル用導電膜10の導電層14となる銀塩乳剤層16は、銀塩とバインダーの他、溶媒や染料等の添加剤を含有する。
[Silver Emulsion Layer 16]
The silver salt emulsion layer 16 which becomes the conductive layer 14 of the conductive film 10 for touch panel contains additives such as a solvent and a dye in addition to the silver salt and the binder.

本実施の形態に用いられる銀塩としては、ハロゲン化銀等の無機銀塩及び酢酸銀等の有機銀塩が挙げられる。本実施の形態においては、光センサーとしての特性に優れるハロゲン化銀を用いることが好ましい。   Examples of the silver salt used in the present embodiment include inorganic silver salts such as silver halide and organic silver salts such as silver acetate. In the present embodiment, it is preferable to use silver halide having excellent characteristics as an optical sensor.

銀塩乳剤層16の塗布銀量(銀塩の塗布量)は銀に換算して1.5〜3.1g/m2である。この塗布銀量が上記範囲を満たさない場合には、タッチパネル用導電膜10とした場合に所望の表面抵抗を得られなくなる。 The coating silver amount (silver salt coating amount) of the silver salt emulsion layer 16 is 1.5 to 3.1 g / m 2 in terms of silver. When the amount of coated silver does not satisfy the above range, a desired surface resistance cannot be obtained when the conductive film 10 for touch panel is used.

本実施の形態に用いられるバインダーとしては、例えば、ゼラチン、ポリビニルアルコール(PVA)、ポリビニルピロリドン(PVP)、澱粉等の多糖類、セルロース及びその誘導体、ポリエチレンオキサイド、ポリビニルアミン、キトサン、ポリリジン、ポリアクリル酸、ポリアルギン酸、ポリヒアルロン酸、カルボキシセルロース等が挙げられる。これらは、官能基のイオン性によって中性、陰イオン性、陽イオン性の性質を有する。   Examples of the binder used in the present embodiment include gelatin, polyvinyl alcohol (PVA), polyvinyl pyrrolidone (PVP), starch and other polysaccharides, cellulose and derivatives thereof, polyethylene oxide, polyvinyl amine, chitosan, polylysine, and polyacryl. Examples include acid, polyalginic acid, polyhyaluronic acid, carboxycellulose and the like. These have neutral, anionic, and cationic properties depending on the ionicity of the functional group.

本実施の形態の銀塩乳剤層16中に含有されるバインダーの含有量は、特に限定されず、分散性と密着性を発揮し得る範囲で適宜決定することができる。銀塩乳剤層16中のバインダーの含有量は、Ag/バインダー体積比で1/4以上が好ましく、1/2以上がより好ましい。Ag/バインダー体積比は、100/1以下が好ましく、50/1以下がより好ましい。また、Ag/バインダー体積比は1/2〜2/1であることがさらに好ましい。1/2〜0.7/1であることが最も好ましい。銀塩乳剤層16中のAg/バインダー体積比をこの範囲にすることで、塗布銀量を調整した場合でも抵抗値のばらつきを抑制し、均一な表面抵抗を有するタッチパネル用導電膜10を得ることができる。   The content of the binder contained in the silver salt emulsion layer 16 of the present embodiment is not particularly limited, and can be appropriately determined as long as dispersibility and adhesion can be exhibited. The content of the binder in the silver salt emulsion layer 16 is preferably 1/4 or more and more preferably 1/2 or more in terms of Ag / binder volume ratio. The Ag / binder volume ratio is preferably 100/1 or less, and more preferably 50/1 or less. The Ag / binder volume ratio is more preferably 1/2 to 2/1. Most preferably, it is 1/2 to 0.7 / 1. By setting the Ag / binder volume ratio in the silver salt emulsion layer 16 within this range, even when the amount of coated silver is adjusted, variation in resistance value is suppressed, and the conductive film 10 for a touch panel having uniform surface resistance is obtained. Can do.

<溶媒>
銀塩乳剤層16の形成に用いられる溶媒は、特に限定されるものではないが、例えば、水、有機溶媒(例えば、メタノール等のアルコール類、アセトン等のケトン類、ホルムアミド等のアミド類、ジメチルスルホキシド等のスルホキシド類、酢酸エチル等のエステル類、エーテル類等)、イオン性液体、及びこれらの混合溶媒を挙げることができる。
<Solvent>
The solvent used for forming the silver salt emulsion layer 16 is not particularly limited. For example, water, organic solvents (for example, alcohols such as methanol, ketones such as acetone, amides such as formamide, dimethyl, etc. Sulfoxides such as sulfoxide, esters such as ethyl acetate, ethers, etc.), ionic liquids, and mixed solvents thereof.

本実施の形態の銀塩乳剤層16に用いられる溶媒の含有量は、銀塩乳剤層16に含まれる銀塩、バインダー等の合計の質量に対して30〜90質量%の範囲であり、50〜80質量%の範囲であることが好ましい。   Content of the solvent used for the silver salt emulsion layer 16 of this Embodiment is the range of 30-90 mass% with respect to the total mass of the silver salt, binder, etc. which are contained in the silver salt emulsion layer 16, 50 It is preferable to be in the range of ˜80 mass%.

<その他の添加剤>
本実施の形態に用いられる各種添加剤に関しては、特に制限は無く、公知のものを好ましく用いることができる。
<Other additives>
There are no particular restrictions on the various additives used in the present embodiment, and known ones can be preferably used.

[その他の層構成]
銀塩乳剤層16の上に図示しない保護層を設けてもよい。本実施の形態において「保護層」とは、ゼラチンや高分子ポリマーといったバインダーからなる層を意味し、擦り傷防止や力学特性を改良する効果を発現するために感光性を有する銀塩乳剤層16上に形成される。その厚みは0.2μm以下が好ましい。保護層の塗布方法及び形成方法は特に限定されず、公知の塗布方法及び形成方法を適宜選択することができる。
[Other layer structure]
A protective layer (not shown) may be provided on the silver salt emulsion layer 16. In the present embodiment, the “protective layer” means a layer made of a binder such as gelatin or a high molecular polymer, on the silver salt emulsion layer 16 having photosensitivity in order to exhibit the effect of preventing scratches and improving mechanical properties. Formed. The thickness is preferably 0.2 μm or less. The coating method and forming method of the protective layer are not particularly limited, and a known coating method and forming method can be appropriately selected.

また、銀塩乳剤層16よりも下に、例えば下塗り層を設けることもできる。   An undercoat layer, for example, can be provided below the silver salt emulsion layer 16.

[導電性ポリマー層、導電性微粒子層]
本実施の形態に係るタッチパネル用導電膜10は、PEDOT等の導電性ポリマーを含有する導電性ポリマー層や導電性微粒子を含有する導電性微粒子層をさらに有してもよい。この導電性ポリマー層や導電性微粒子層は、1.0×107オーム/sq.以上という導電性の低い、高抵抗な透明導電層である。このような高抵抗な透明導電層を設けることでタッチパネル用導電膜10を形成した場合に表面抵抗の面内ばらつきを均一にすることができ、ペン入力した場合の直線性が向上する。このような高抵抗な透明導電層は、タッチパネル用導電膜10を製造した後に、導電層14と電気的に導通する位置にあればよく、例えば高抵抗な透明導電層は、製造時に銀塩乳剤層16(導電層14)に隣接して形成されることが好ましい。
[Conductive polymer layer, conductive fine particle layer]
The conductive film 10 for a touch panel according to the present embodiment may further include a conductive polymer layer containing a conductive polymer such as PEDOT or a conductive fine particle layer containing conductive fine particles. The conductive polymer layer and the conductive fine particle layer have a size of 1.0 × 10 7 ohm / sq. This is a highly conductive transparent conductive layer with low conductivity. By providing such a high-resistance transparent conductive layer, in-plane variation in surface resistance can be made uniform when the conductive film for touch panel 10 is formed, and linearity when pen input is performed is improved. Such a high-resistance transparent conductive layer may be in a position where it is electrically connected to the conductive layer 14 after the conductive film 10 for a touch panel is manufactured. For example, the high-resistance transparent conductive layer is a silver salt emulsion at the time of manufacture. It is preferably formed adjacent to the layer 16 (conductive layer 14).

導電性微粒子層は、銀塩乳剤層16自体、あるいは銀塩乳剤層16に隣接した位置に形成された層、あるいは銀塩乳剤層16と表面層との間に介在する層、あるいは表面層自体、あるいは支持体12と銀塩乳剤層16との間に介在する層に、導電性微粒子及びバインダーを含有させて形成される。導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)は、1/3〜2/1であることが好ましく、1/3〜1/1であることがより好ましい。銀塩乳剤層16自体に導電性微粒子及びバインダーを含有させた場合は、導電層14のメッシュパターン18の開口部22に導電性微粒子層が形成された形態となる。すなわち、メッシュパターン18の開口部22は、導電性微粒子が分散された光透過部として機能することになる。   The conductive fine particle layer is the silver salt emulsion layer 16 itself, a layer formed at a position adjacent to the silver salt emulsion layer 16, a layer interposed between the silver salt emulsion layer 16 and the surface layer, or the surface layer itself. Alternatively, it is formed by containing conductive fine particles and a binder in a layer interposed between the support 12 and the silver salt emulsion layer 16. The mass ratio of the conductive fine particles and the binder (conductive fine particles / binder) is preferably 1/3 to 2/1, and more preferably 1/3 to 1/1. When the silver salt emulsion layer 16 itself contains conductive fine particles and a binder, the conductive fine particle layer is formed in the openings 22 of the mesh pattern 18 of the conductive layer 14. That is, the opening 22 of the mesh pattern 18 functions as a light transmission part in which conductive fine particles are dispersed.

導電性微粒子層を銀塩乳剤層16とは別の位置に形成する場合、導電性微粒子層は、銀塩乳剤層16に隣接する位置に形成されることが好ましいが、銀塩乳剤層16と支持体12の間に形成されることが好ましい。なお、導電性微粒子層が銀塩乳剤層16と表面層との間に介在する場合、あるいは表面層自体である場合は、タッチパネル用導電膜10の製造工程で導電性微粒子が反応してタッチパネル用導電膜10の透明性が低減する虞がある。   When the conductive fine particle layer is formed at a position different from the silver salt emulsion layer 16, the conductive fine particle layer is preferably formed at a position adjacent to the silver salt emulsion layer 16. Preferably, it is formed between the supports 12. When the conductive fine particle layer is interposed between the silver salt emulsion layer 16 and the surface layer, or when it is the surface layer itself, the conductive fine particle reacts in the manufacturing process of the conductive film for touch panel 10 and is used for the touch panel. There is a possibility that the transparency of the conductive film 10 may be reduced.

<導電性微粒子とバインダー>
導電性微粒子は、SnO2、ZnO、TiO2、Al23、In23、MgO、BaO及びMoO3等の金属酸化物並びにこれらの複合酸化物(2種類以上の金属イオンを含む酸化物)、そして、これらの金属酸化物にさらに異種原子を含む金属酸化物の粒子を挙げることができる。金属酸化物としては、SnO2、nO、TiO2、Al23、In23、MgOが好ましく、SnO2が特に好ましい。
<Conductive fine particles and binder>
The conductive fine particles include metal oxides such as SnO 2 , ZnO, TiO 2 , Al 2 O 3 , In 2 O 3 , MgO, BaO and MoO 3 , and composite oxides thereof (an oxidation containing two or more kinds of metal ions). And metal oxide particles further containing different atoms in these metal oxides. As the metal oxide, SnO 2 , nO, TiO 2 , Al 2 O 3 , In 2 O 3 and MgO are preferable, and SnO 2 is particularly preferable.

本実施の形態に用いる導電性微粒子の形状については特に制限はなく、粒状、針状等が挙げられる。また、その大きさは、球形の粒子では平均粒子径0.085〜0.12μmが好ましい。針状の場合は平均軸長が、長軸0.2〜20μm、短軸0.01〜0.02μmが好ましい。   There is no restriction | limiting in particular about the shape of the electroconductive fine particles used for this Embodiment, A granular form, needle shape, etc. are mentioned. The size of the spherical particles is preferably 0.085 to 0.12 μm. In the case of needles, the average axial length is preferably 0.2-20 μm in the long axis and 0.01-0.02 μm in the short axis.

銀塩乳剤層16に導電性微粒子とバインダーを含有させる場合、導電性微粒子の塗布量が0.15〜0.5/m2であることが好ましい。導電性微粒子層を、銀塩乳剤層16よりも上層側に位置させる場合は、導電性微粒子の塗布量が0.2〜0.4g/m2であることが好ましい。導電性微粒子層を、銀塩乳剤層16よりも下層側に位置させる場合は、導電性微粒子の塗布量が0.15〜0.5g/m2であることが好ましい。 When the conductive fine particles and the binder are contained in the silver salt emulsion layer 16, the coating amount of the conductive fine particles is preferably 0.15 to 0.5 / m 2 . When the conductive fine particle layer is positioned above the silver salt emulsion layer 16, the coating amount of the conductive fine particles is preferably 0.2 to 0.4 g / m 2 . When the conductive fine particle layer is positioned on the lower layer side than the silver salt emulsion layer 16, the coating amount of the conductive fine particles is preferably 0.15 to 0.5 g / m 2 .

導電性微粒子層には、導電性微粒子を支持体12に密着させる目的でバインダーが付加的に用いられる。このようなバインダーとしては、水溶性ポリマーを用いることが好ましい。   In the conductive fine particle layer, a binder is additionally used for the purpose of bringing the conductive fine particles into close contact with the support 12. As such a binder, it is preferable to use a water-soluble polymer.

上記バインダーとしては、例えば、ゼラチン、カラギナン、ポリビニルアルコール(PVA)、ポリビニルピロリドン(PVP)、澱粉等の多糖類、セルロース及びその誘導体、ポリエチレンオキサイド、ポリサッカライド、ポリビニルアミン、キトサン、ポリリジン、ポリアクリル酸、ポリアルギン酸、ポリヒアルロン酸、カルボキシセルロース、アラビアゴム、アルギン酸ナトリウム等が挙げられる。これらは、官能基のイオン性によって中性、陰イオン性、陽イオン性の性質を有する。   Examples of the binder include polysaccharides such as gelatin, carrageenan, polyvinyl alcohol (PVA), polyvinyl pyrrolidone (PVP), starch, cellulose and derivatives thereof, polyethylene oxide, polysaccharides, polyvinylamine, chitosan, polylysine, and polyacrylic acid. , Polyalginic acid, polyhyaluronic acid, carboxycellulose, gum arabic, sodium alginate and the like. These have neutral, anionic, and cationic properties depending on the ionicity of the functional group.

また、ゼラチンとしては石灰処理ゼラチンの他、酸処理ゼラチンを用いてもよく、ゼラチンの加水分解物、ゼラチン酵素分解物、その他アミノ基、カルボキシル基を修飾したゼラチン(フタル化ゼラチン、アセチル化ゼラチン)を使用することができる。   In addition to lime-processed gelatin, acid-processed gelatin may be used as gelatin. Hydrolyzate of gelatin, enzyme-decomposed gelatin, other gelatin modified with amino group and carboxyl group (phthalated gelatin, acetylated gelatin) Can be used.

[タッチパネル用導電膜10]
本実施の形態に係るタッチパネル用導電膜10は、支持体12上に形成された銀塩乳剤層16をメッシュ状にパターン露光し、現像処理することにより得られる。
[Touch panel conductive film 10]
The conductive film 10 for a touch panel according to the present embodiment can be obtained by pattern-exposing the silver salt emulsion layer 16 formed on the support 12 in a mesh shape and developing it.

本実施の形態において、パターン露光・現像処理によって形成されるメッシュパターン18は、図2に示すように、メッシュ状で、且つ、直線が略直交した形態の直線格子パターン、図3に示すように、交差部24間の導電部分20が少なくとも1つの湾曲を有する波線格子パターン等がある。本実施の形態では、導電層14のメッシュパターン18のピッチPa(導電部分20の線幅Waと開口部22の幅Wbの合計)が600μm以上800μm以下であることが好ましい。   In the present embodiment, the mesh pattern 18 formed by the pattern exposure / development process is a linear lattice pattern having a mesh shape and substantially straight lines as shown in FIG. 2, as shown in FIG. There is a wavy grid pattern in which the conductive portion 20 between the intersecting portions 24 has at least one curve. In the present embodiment, the pitch Pa (the total of the line width Wa of the conductive portion 20 and the width Wb of the opening 22) of the mesh pattern 18 of the conductive layer 14 is preferably 600 μm or more and 800 μm or less.

また、本実施の形態では、導電層14上にさらに導電性ポリマーを塗布することにより、さらに高抵抗の透明導電層を形成してもよい。   In the present embodiment, a transparent conductive layer having a higher resistance may be formed by further applying a conductive polymer on the conductive layer 14.

[露光]
銀塩乳剤層16をパターン状に露光する方法は、フォトマスクを利用した面露光で行ってもよいし、レーザービームによる走査露光で行ってもよい。この際、レンズを用いた屈折式露光でも反射鏡を用いた反射式露光でもよく、コンタクト露光、プロキシミティー露光、縮小投影露光、反射投影露光等の露光方式を用いることができる。
[exposure]
A method of exposing the silver salt emulsion layer 16 in a pattern may be performed by surface exposure using a photomask or by scanning exposure using a laser beam. At this time, refractive exposure using a lens or reflection exposure using a reflecting mirror may be used, and exposure methods such as contact exposure, proximity exposure, reduced projection exposure, and reflection projection exposure can be used.

[現像処理]
銀塩乳剤層16は、上述したように、パターン露光がなされた後、さらに現像処理が施される。現像処理は、銀塩写真フィルムや印画紙、印刷製版用フィルム、フォトマスク用エマルジョンマスク等に用いられる通常の現像処理の技術を用いることができる。
[Development processing]
The silver salt emulsion layer 16 is further subjected to development processing after pattern exposure as described above. The development processing can be performed by a normal development processing technique used for silver salt photographic film, photographic paper, printing plate-making film, photomask emulsion mask, and the like.

本実施の形態では、上述のパターン露光及び現像処理を行うことによって、露光部分にメッシュパターン状の導電部分20(金属銀部)が形成されると共に、未露光部に開口部22(光透過性部)が形成される。   In the present embodiment, by performing the above-described pattern exposure and development process, a mesh pattern-shaped conductive portion 20 (metal silver portion) is formed in the exposed portion, and an opening portion 22 (light-transmitting property) in the unexposed portion. Part) is formed.

銀塩乳剤層16への現像処理は、未露光部分の銀塩を除去して安定化させる目的で行われる定着処理を含むことができる。銀塩乳剤層16に対する定着処理は、銀塩写真フィルムや印画紙、印刷製版用フィルム、フォトマスク用エマルジョンマスク等に用いられる定着処理の技術を用いることができる。   The development processing on the silver salt emulsion layer 16 can include a fixing processing performed for the purpose of removing and stabilizing the silver salt in an unexposed portion. The fixing process for the silver salt emulsion layer 16 may be a fixing process technique used for silver salt photographic film, photographic paper, printing plate making film, emulsion mask for photomask, and the like.

このようにして得られた本実施の形態に係るタッチパネル用導電膜10の導電層14は、銀塩乳剤層16に導電性微粒子が入っている場合には、銀塩が抜けた開口部22(光透過部)に導電性微粒子が分散し、導電部分20(金属銀部)よりも高抵抗の透明導電層が形成されることとなる。   The conductive layer 14 of the conductive film 10 for the touch panel according to the present embodiment thus obtained has an opening 22 (from which the silver salt is removed when the silver salt emulsion layer 16 contains conductive fine particles. The conductive fine particles are dispersed in the light transmitting portion), and a transparent conductive layer having a higher resistance than that of the conductive portion 20 (metal silver portion) is formed.

また、銀塩乳剤層16以外の位置に導電性微粒子層を形成することで、導電性微粒子層のうち、導電層14の開口部22に対応した部分が、上述と同様に、導電性微粒子が分散した光透過部として機能することになる。   Further, by forming the conductive fine particle layer at a position other than the silver salt emulsion layer 16, the portion of the conductive fine particle layer corresponding to the opening 22 of the conductive layer 14 is the same as described above. It will function as a dispersed light transmission part.

なお、本実施の形態に係るタッチパネル用導電膜10の製造方法では、めっき等の工程が不要である。本実施の形態に係るタッチパネル用導電膜10の製造方法では銀塩乳剤層16の塗布銀量、銀/バインダー比を調整することで所望の表面抵抗を得ることができるからである。なお、必要に応じてカレンダー処理等を行ってもよい。   In addition, in the manufacturing method of the electrically conductive film 10 for touchscreens concerning this Embodiment, processes, such as plating, are unnecessary. This is because in the method for manufacturing the conductive film 10 for the touch panel according to the present embodiment, a desired surface resistance can be obtained by adjusting the coating silver amount and the silver / binder ratio of the silver salt emulsion layer 16. In addition, you may perform a calendar process etc. as needed.

(現像処理後の硬膜処理)
銀塩乳剤層16に対して現像処理を行った後に、硬膜剤に浸漬して硬膜処理を行うことが好ましい。硬膜剤としては、例えば、グルタルアルデヒド、アジポアルデヒド、2,3−ジヒドロキシ−1,4−ジオキサン等のジアルデヒド類及びほう酸等の特開平2−141279号に記載のものを挙げることができる。
(Hardening after development)
After the silver salt emulsion layer 16 is developed, it is preferably immersed in a hardener to perform the hardening process. Examples of the hardener include dialdehydes such as glutaraldehyde, adipaldehyde, 2,3-dihydroxy-1,4-dioxane, and those described in JP-A-2-141279 such as boric acid. .

以上、上述した本実施の形態の銀塩乳剤層16や導電性材料は、以下に列挙する公知文献に開示の技術を適宜組合わせて使用することができる。   As described above, the silver salt emulsion layer 16 and the conductive material of the present embodiment described above can be used by appropriately combining the techniques disclosed in the publicly known documents listed below.

特開2004−221564号公報、特開2004−221565号公報、特開2007−200922号公報、特開2006−352073号公報、国際公開第2006/001461号パンフレット、特開2007−129205号公報、特開2007−235115号公報、特開2007−207987号公報、特開2006−012935号公報、特開2006−010795号公報、特開2006−228469号公報、特開2006−332459号公報、特開2007−207987号公報、特開2007−226215号公報、国際公開第2006/088059号パンフレット、特開2006−261315号公報、特開2007−072171号公報、特開2007−102200号公報、特開2006−228473号公報、特開2006−269795号公報、特開2006−267635号公報、特開2006−267627号公報、国際公開第2006/098333号パンフレット、特開2006−324203号公報、特開2006−228478号公報、特開2006−228836号公報、特開2006−228480号公報、国際公開第2006/098336号パンフレット、国際公開第2006/098338号パンフレット、特開2007−009326号公報、特開2006−336057号公報、特開2006−339287号公報、特開2006−336090号公報、特開2006−336099号公報、特開2007−039738号公報、特開2007−039739号公報、特開2007−039740号公報、特開2007−002296号公報、特開2007−084886号公報、特開2007−092146号公報、特開2007−162118号公報、特開2007−200872号公報、特開2007−197809号公報、特開2007−270353号公報、特開2007−308761号公報、特開2006−286410号公報、特開2006−283133号公報、特開2006−283137号公報、特開2006−348351号公報、特開2007−270321号公報、特開2007−270322号公報、国際公開第2006/098335号パンフレット、特開2007−088218号公報、特開2007−201378号公報、特開2007−335729号公報、国際公開第2006/098334号パンフレット、特開2007−134439号公報、特開2007−149760号公報、特開2007−208133号公報、特開2007−178915号公報、特開2007−334325号公報、特開2007−310091号公報、特開2007−311646号公報、特開2007−013130号公報、特開2006−339526号公報、特開2007−116137号公報、特開2007−088219号公報、特開2007−207883号公報、特開2007−207893号公報、特開2007−207910号公報、特開2007−013130号公報、国際公開第2007/001008号パンフレット、特開2005−302508号公報、特開2005−197234号公報。   JP 2004-221564 A, JP 2004-221565 A, JP 2007-200902 A, JP 2006-352073 A, International Publication No. 2006/001461 pamphlet, JP 2007-129205 A, JP 2007-235115, JP 2007-207987, JP 2006-012935, JP 2006-0110795, JP 2006-228469, JP 2006-332459, JP 2007. JP-A-207987, JP-A-2007-226215, WO2006 / 088059, JP-A-2006-261315, JP-A-2007-072171, JP-A-2007-102200, JP-A-2006. 228473 Gazette, JP-A-2006-26997, JP-A-2006-267635, JP-A-2006-267627, pamphlet of International Publication No. 2006/098333, JP-A-2006-324203, JP-A-2006-228478 JP 2006-228836 A, JP 2006-228480 A, WO 2006/098336 pamphlet, WO 2006/098338 pamphlet, JP 2007-009326 A, and JP 2006-336057 A. JP, 2006-339287, JP, 2006-336090, JP, 2006-336099, JP, 2007-039738, JP, 2007-039739, JP, 2007-039740, Open No. 007-002296, JP 2007-088886, JP 2007-092146, JP 2007-162118, JP 2007-200902, JP 2007-197809, JP 2007-. No. 270353, No. 2007-308761, No. 2006-286410, No. 2006-283133, No. 2006-283137, No. 2006-348351, No. 2007-270321. JP, 2007-270322, WO 2006/098335 pamphlet, JP 2007-088218, JP 2007-201378, JP 2007-335729, WO 2006/098334. Pamphlet JP, 2007-134439, JP, 2007-149760, JP, 2007-208133, JP, 2007-178915, JP, 2007-334325, JP, 2007-310091, JP 2007-311646, JP 2007-013130, JP 2006-339526, JP 2007-116137, JP 2007-088219, JP 2007-207883, JP 2007. JP-A-207893, JP-A-2007-207910, JP-A-2007-013130, WO 2007/001008, JP-A 2005-302508, JP-A-2005-197234.

[下塗り層]
支持体12から導電層14がはがれることを防止するために、支持体12上に下塗り層を設けることが好ましい。下塗り層の素材としては、アクリル酸エステル共重合体、ポリ塩化ビニリデン、スチレン−ブタジエンゴム、ポリエステル等を用いることができる。下塗り層の厚さは、0.05〜0.5μmであることが好ましい。
[Undercoat layer]
In order to prevent the conductive layer 14 from peeling from the support 12, it is preferable to provide an undercoat layer on the support 12. As the material for the undercoat layer, acrylic acid ester copolymer, polyvinylidene chloride, styrene-butadiene rubber, polyester, and the like can be used. The thickness of the undercoat layer is preferably 0.05 to 0.5 μm.

<タッチパネル>
本実施の形態に係るタッチパネル用導電膜10は、例えば抵抗膜式のタッチパネルに用いて好適である。
<Touch panel>
The conductive film 10 for a touch panel according to the present embodiment is suitable for use in, for example, a resistive film type touch panel.

抵抗膜式のタッチパネルは、タッチパネルの表面に指先を押し当てることで、その部分の導電層14同士が接触し、2つの導電層14間で電流が流れることから、2つの導電層14間に発生する電圧を検出することによって、指先の座標を求めるものである。   A resistive film type touch panel is generated between two conductive layers 14 because the conductive layers 14 of the part are in contact with each other when a fingertip is pressed against the surface of the touch panel, and current flows between the two conductive layers 14. The coordinates of the fingertip are obtained by detecting the voltage to be applied.

特に、本実施の形態に係るタッチパネル用導電膜10は、表面抵抗が200〜800オーム/sq.であることから、抵抗膜式のタッチパネルでの信号特性に優れ、ノイズを十分に低減することが可能となり、これにより、精度が高く、且つ、応答速度の高い位置検出を実現することができる。   In particular, the conductive film 10 for a touch panel according to the present embodiment has a surface resistance of 200 to 800 ohm / sq. Therefore, the signal characteristics of the resistive touch panel are excellent, and noise can be sufficiently reduced. This makes it possible to realize position detection with high accuracy and high response speed.

また、導電層14のメッシュパターン18のピッチPaを600μm以上としているため、モアレが十分に低減され、しかも、ピッチPaを800μm以下としていることから、導電層14のメッシュパターン18が目立たなくなり、見た目が良好となる。従って、タッチパネルを通じての文字や画像等の表示が見やすくなり、視認性に優れたタッチパネルを提供することができる。   Further, since the pitch Pa of the mesh pattern 18 of the conductive layer 14 is 600 μm or more, moire is sufficiently reduced, and since the pitch Pa is 800 μm or less, the mesh pattern 18 of the conductive layer 14 becomes inconspicuous and looks Becomes better. Therefore, it is easy to see the display of characters and images through the touch panel, and a touch panel with excellent visibility can be provided.

さらに、導電層14の開口部22や導電層14とは別の位置に導電性微粒子層や導電性ポリマー層等の透明導電層を形成したので、タッチパネル用導電膜10の全面において導電性を持たせることができ、ペン入力に忠実に追従した座標検知を行うことが可能となり、例えばペン入力した場合の直線性を向上させることができる。   Furthermore, since the transparent conductive layer such as the conductive fine particle layer or the conductive polymer layer is formed at a position different from the opening 22 or the conductive layer 14 of the conductive layer 14, the entire surface of the conductive film 10 for the touch panel has conductivity. It is possible to perform coordinate detection that faithfully follows pen input, and for example, it is possible to improve linearity when pen input is performed.

また、支持体12上に下塗り層を形成し、さらに、銀塩乳剤層16を現像処理した後、硬膜剤に浸漬して硬膜処理したので、タッチパネルの摺動性が向上し、特に、端子付近に対するペンの摺動においても導電層が断線したりすることがなく、局部的に表面抵抗が上昇するという事態を回避することができる。   In addition, since an undercoat layer is formed on the support 12 and the silver salt emulsion layer 16 is further developed, it is dipped in a hardener and hardened, so that the slidability of the touch panel is improved. Even when the pen slides with respect to the vicinity of the terminal, the conductive layer is not disconnected, and a situation in which the surface resistance is locally increased can be avoided.

以下に本発明を実施例に基づき詳細に説明するが、本発明はこれらに限定されるものではない。   Hereinafter, the present invention will be described in detail based on examples, but the present invention is not limited thereto.

[実施例1]:表1参照
(乳剤Aの調製)
・1液:
水 750ml
ゼラチン(フタル化処理ゼラチン) 8g
塩化ナトリウム 3g
1,3−ジメチルイミダゾリジン−2−チオン 20mg
ベンゼンチオスルホン酸ナトリウム 10mg
クエン酸 0.7g
・2液
水 300ml
硝酸銀 150g
・3液
水 300ml
塩化ナトリウム 38g
臭化カリウム 32g
ヘキサクロロイリジウム(III)酸カリウム
(0.005%KCl 20%水溶液) 5ml
ヘキサクロロロジウム酸アンモニウム
(0.001%NaCl 20%水溶液) 7ml
[Example 1]: See Table 1 (Preparation of Emulsion A)
・ 1 liquid:
750 ml of water
Gelatin (phthalated gelatin) 8g
Sodium chloride 3g
1,3-Dimethylimidazolidine-2-thione 20mg
Sodium benzenethiosulfonate 10mg
Citric acid 0.7g
・ Two liquids 300ml
150 g silver nitrate
・ 3 liquid water 300ml
Sodium chloride 38g
Potassium bromide 32g
Hexachloroiridium (III) potassium salt
(0.005% KCl 20% aqueous solution) 5 ml
Ammonium hexachlororhodate
(0.001% NaCl 20% aqueous solution) 7 ml

3液に用いるヘキサクロロイリジウム(III)酸カリウム(0.005%KCl 20%水溶液)及びヘキサクロロロジウム酸アンモニウム(0.001%NaCl 20%水溶液)は、それぞれの錯体粉末をそれぞれKCl20%水溶液、NaCl20%水溶液に溶解し、40℃で120分間加熱して調製した。   Potassium hexachloroiridium (III) (0.005% KCl 20% aqueous solution) and ammonium hexachlororhodate (0.001% NaCl 20% aqueous solution) used in the three liquids were mixed with their respective complex powders, KCl 20% aqueous solution and NaCl 20%, respectively. It was dissolved in an aqueous solution and prepared by heating at 40 ° C. for 120 minutes.

38℃、pH4.5に保たれた1液に、2液と3液の各々90%に相当する量を攪拌しながら同時に20分間にわたって加え、0.16μmの核粒子を形成した。続いて下記4液、5液を8分間にわたって加え、さらに、2液と3液の残りの10%の量を2分間にわたって加え、0.21μmまで成長させた。さらに、ヨウ化カリウム0.15gを加え5分間熟成し粒子形成を終了した。   To 1 liquid maintained at 38 ° C. and pH 4.5, 90% of the 2 and 3 liquids were simultaneously added over 20 minutes while stirring to form 0.16 μm core particles. Subsequently, the following 4th and 5th liquids were added over 8 minutes, and the remaining 10% of the 2nd and 3rd liquids were added over 2 minutes to grow to 0.21 μm. Further, 0.15 g of potassium iodide was added and ripened for 5 minutes to complete grain formation.

・4液
水 100ml
硝酸銀 50g
・5液
水 100ml
塩化ナトリウム 13g
臭化カリウム 11g
黄血塩 5mg
・ 4 liquid water 100ml
Silver nitrate 50g
・ 5 liquid 100ml
Sodium chloride 13g
Potassium bromide 11g
Yellow blood salt 5mg

その後、常法に従ってフロキュレーション法によって水洗した。具体的には、温度を35℃に下げ、硫酸を用いてハロゲン化銀が沈降するまでpHを下げた(pH3.6±0.2の範囲であった)。   Then, it washed with water by the flocculation method according to a conventional method. Specifically, the temperature was lowered to 35 ° C., and the pH was lowered using sulfuric acid until the silver halide precipitated (the pH was in the range of 3.6 ± 0.2).

次に、上澄み液を約3リットル除去した(第一水洗)。さらに3リットルの蒸留水を加えてから、ハロゲン化銀が沈降するまで硫酸を加えた。再度、上澄み液を3リットル除去した(第二水洗)。第二水洗と同じ操作をさらに1回繰り返して(第三水洗)、水洗・脱塩行程を終了した。   Next, about 3 liters of the supernatant was removed (first water washing). Further, 3 liters of distilled water was added, and sulfuric acid was added until the silver halide settled. Again, 3 liters of the supernatant was removed (second water wash). The same operation as the second water washing was further repeated once (third water washing) to complete the water washing / desalting process.

水洗・脱塩後の乳剤をpH6.4、pAg7.5に調整し、ベンゼンチオスルホン酸ナトリウム10mg、ベンゼンチオスルフィン酸ナトリウム3mg、チオ硫酸ナトリウム15mgと塩化金酸10mgを加え55℃にて最適感度を得るように化学増感を施し、安定剤として1,3,3a,7−テトラアザインデン100mg、防腐剤としてプロキセル(商品名、ICI Co.,Ltd.製)100mgを加えた。最終的に塩化銀を70モル%、沃化銀を0.08モル%含む平均粒子径0.22μm、変動係数9%のヨウ塩臭化銀立方体粒子乳剤を得た。最終的に乳剤として、pH=6.4、pAg=7.5、電導度=40μS/m、密度=1.2×103kg/m3、粘度=60mPa・sとなった。 The emulsion after washing and desalting is adjusted to pH 6.4 and pAg 7.5, and 10 mg of sodium benzenethiosulfonate, 3 mg of sodium benzenethiosulfinate, 15 mg of sodium thiosulfate and 10 mg of chloroauric acid are added. And 1,3,3a, 7-tetraazaindene (100 mg) as a stabilizer and 100 mg of proxel (trade name, manufactured by ICI Co., Ltd.) as a preservative were added. Finally, a silver iodochlorobromide cubic grain emulsion containing 70 mol% of silver chloride and 0.08 mol% of silver iodide and having an average grain diameter of 0.22 μm and a coefficient of variation of 9% was obtained. The final emulsion was pH = 6.4, pAg = 7.5, conductivity = 40 μS / m, density = 1.2 × 10 3 kg / m 3 , and viscosity = 60 mPa · s.

(塗布液の調製)
上記乳剤Aに増感色素(SD−1)5.7×10-4モル/モルAgを加えて分光増感を施した。さらにKBr3.4×10-4モル/モルAg、化合物(Cpd−3)8.0×10-4モル/モルAgを加え、よく混合した。
(Preparation of coating solution)
The emulsion A was subjected to spectral sensitization by adding sensitizing dye (SD-1) 5.7 × 10 −4 mol / mol Ag. Further KBr3.4 × 10 -4 mol / mol Ag, Compound (Cpd-3) 8.0 × 10 -4 mol / mol Ag was added and mixed well.

次いで1,3,3a,7−テトラアザインデン1.2×10-4モル/モルAg、ハイドロキノン1.2×10-2モル/モルAg、クエン酸3.0×10-4モル/モルAg、2,4−ジクロロ−6−ヒドロキシ−1,3,5−トリアジンナトリウム塩を90mg/m2、ゼラチンに対して15wt%の粒径10μmのコロイダルシリカ、水性ラテックス(aqL−6)を50mg/m2、ポリエチルアクリレートラテックスを100mg/m2、メチルアクリレートと2−アクリルアミド−2−メチルプロパンスルホン酸ナトリウム塩と2−アセトキシエチルメタクリレートのラテックス共重合体(質量比88:5:7)を100mg/m2、コアシェル型ラテックスコア:スチレン/ブタジエン共重合体(質量比37/63)、シェル:スチレン/2−アセトキシエチルアクリレート(質量比84/16、コア/シェル比=50/50)を100mg/m2、ゼラチンに対し4wt%の化合物(Cpd−7)を添加し、クエン酸を用いて塗布液pHを5.6に調整した。 Then, 1,3,3a, 7-tetraazaindene 1.2 × 10 −4 mol / mol Ag, hydroquinone 1.2 × 10 −2 mol / mol Ag, citric acid 3.0 × 10 −4 mol / mol Ag 2,4-dichloro-6-hydroxy-1,3,5-triazine sodium salt at 90 mg / m 2 , colloidal silica having a particle size of 10 μm of 15 wt% based on gelatin, and aqueous latex (aqL-6) at 50 mg / m 2 m 2 , 100 mg / m 2 of polyethyl acrylate latex, 100 mg of latex copolymer (mass ratio 88: 5: 7) of methyl acrylate, 2-acrylamido-2-methylpropanesulfonic acid sodium salt and 2-acetoxyethyl methacrylate / m 2, the core-shell latex core: styrene / butadiene copolymer (weight ratio 37/63), shell: styrene / 2-acetoxyethyl acrylate (weight ratio 84/16, core / shell ratio = 50/50) was added 100 mg / m 2, 4 wt% of the compound to gelatin (Cpd-7), coated with citric acid The liquid pH was adjusted to 5.6.

(下塗り層)
下記のようにして支持体上に下塗り層を設けた(支持体としては、ポリエチレンテレフタレート(PET)(厚さ100μm)を用いた。PETにはあらかじめ表面親水化処理したものを用いた)。下記の説明により形成するハロゲン化銀乳剤層の下塗り層として、ゼラチン0.195g/m2になるように設けた。この下塗り層は透明導電層としても兼務する。
・1液:
水 410ml
ゼラチン 11.4g
Sbドープ酸化スズ(石原産業社製、商品名 SN100P) 19.5g
下塗り層には、写真技術で公知の表面活性剤等を添加してもよい。
(Undercoat layer)
An undercoat layer was provided on the support as described below (polyethylene terephthalate (PET) (thickness: 100 μm) was used as the support. The surface was hydrophilized in advance). As an undercoat layer of a silver halide emulsion layer formed according to the following description, gelatin was provided at 0.195 g / m 2 . This undercoat layer also serves as a transparent conductive layer.
・ 1 liquid:
410ml water
11.4g of gelatin
Sb-doped tin oxide (trade name SN100P, manufactured by Ishihara Sangyo Co., Ltd.) 19.5g
A surface active agent known in the photographic art may be added to the undercoat layer.

(ハロゲン化銀乳剤層)
乳剤Aを用いて、上記のように調製した乳剤層塗布液を上記下塗り層上にAg1.5g/m2、ゼラチン0.21g/m2になるように塗布した。すなわち、Agとゼラチン(バインダー)との比が1/1.1(体積比)となるように塗布した。
(Silver halide emulsion layer)
With emulsion A, it was coated an emulsion layer coating liquid prepared as described above so that on Ag1.5g / m 2, gelatin 0.21 g / m 2 for the undercoat layer. That is, coating was performed so that the ratio of Ag to gelatin (binder) was 1 / 1.1 (volume ratio).

(保護層)
ハロゲン化銀乳剤層の上に保護層を設けた。
・1液:
水 985ml
ゼラチン 15g
その他適宜、写真技術で公知の界面活性剤、防腐剤、ph調節剤を添加した。
(Protective layer)
A protective layer was provided on the silver halide emulsion layer.
・ 1 liquid:
985 ml of water
15g gelatin
In addition, surfactants, preservatives, and ph regulators known in the photographic art were added as appropriate.

このようにして得られた塗布品を乾燥後、試料Aとする。透明導電層(下塗り層)に導電性微粒子が0.3354g/m2で、導電性微粒子/バインダー比は1.71/1(質量比)で導電性微粒子を塗布している。なお、導電性微粒子単独の抵抗(開口部の表面抵抗)を調べるために、この試料Aを露光・現像処理せず、定着処理のみ行い、ハロゲン化銀を抜いて表面抵抗を測定したところ、1.5×109オーム/sq.であった。 The coated product thus obtained is dried and used as sample A. The conductive fine particles are applied to the transparent conductive layer (undercoat layer) with conductive fine particles of 0.3354 g / m 2 and a conductive fine particle / binder ratio of 1.71 / 1 (mass ratio). In order to investigate the resistance (surface resistance of the opening) of the conductive fine particles alone, this sample A was not subjected to exposure / development processing, but only fixed, and the surface resistance was measured by removing silver halide. .5 × 10 9 ohm / sq. Met.

Figure 2010108878
Figure 2010108878

(露光・現像処理)
次いで、前記で調製した試料Aにライン/スペース=8μm/692μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=692μm/8μm(ピッチ700μm)の、スペースが格子状であるフォトマスクを介して高圧水銀ランプを光源とした平行光を用いて露光し、下記の現像液で現像し、さらに定着液(商品名:CN16X用N3X−R:富士フイルム社製)を用いて現像処理を行った後、純水でリンスし、実施例1に係るタッチパネル用導電膜を得た。
(Exposure and development processing)
Next, a photomask having a grid-like space with a grid-like photomask line / space = 692 μm / 8 μm (pitch 700 μm) capable of giving a developed silver image of line / space = 8 μm / 692 μm to the sample A prepared above. Then, it is exposed using parallel light using a high-pressure mercury lamp as a light source, developed with the following developer, and further developed with a fixer (trade name: N3X-R for CN16X: manufactured by Fujifilm). After that, rinsing with pure water was performed to obtain a conductive film for a touch panel according to Example 1.

[現像液の組成]
現像液1リットル中に、以下の化合物が含まれる。
ハイドロキノン 0.037mol/L
N−メチルアミノフェノール 0.016mol/L
メタホウ酸ナトリウム 0.140mol/L
水酸化ナトリウム 0.360mol/L
臭化ナトリウム 0.031mol/L
メタ重亜硫酸カリウム 0.187mol/L
[Developer composition]
The following compounds are contained in 1 liter of developer.
Hydroquinone 0.037mol / L
N-methylaminophenol 0.016 mol / L
Sodium metaborate 0.140 mol / L
Sodium hydroxide 0.360 mol / L
Sodium bromide 0.031 mol / L
Potassium metabisulfite 0.187 mol / L

[現像後の硬膜処理]
現像後にグルタルアルデヒド水溶液に浸漬を行い、硬膜処理を行った。
[Hardening after development]
After development, the film was dipped in a glutaraldehyde aqueous solution and subjected to hardening.

[実施例2]:表1参照
ハロゲン化銀乳剤層の塗布液をAg1.7g/m2になるように塗布した点以外は、実施例1と同様にして、実施例2に係るタッチパネル用導電膜を得た。
[Example 2]: See Table 1 The conductive film for a touch panel according to Example 2 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 1.7 g / m 2. A membrane was obtained.

[実施例3]:表1参照
ハロゲン化銀乳剤層の塗布液をAg1.9g/m2になるように塗布した点以外は、実施例1と同様にして、実施例3に係るタッチパネル用導電膜を得た。
[Example 3]: See Table 1 The conductive film for a touch panel according to Example 3 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 1.9 g / m 2. A membrane was obtained.

[実施例4]:表1参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点以外は、実施例1と同様にして、実施例4に係るタッチパネル用導電膜を得た。
[Example 4]: See Table 1 The conductive film for a touch panel according to Example 4 is the same as Example 1 except that the coating solution for the silver halide emulsion layer is applied to have an Ag of 2.1 g / m 2. A membrane was obtained.

[実施例5]:表1参照
ハロゲン化銀乳剤層の塗布液をAg2.3g/m2になるように塗布した点以外は、実施例1と同様にして、実施例5に係るタッチパネル用導電膜を得た。
[Example 5]: See Table 1 The conductive film for a touch panel according to Example 5 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 2.3 g / m 2. A membrane was obtained.

[実施例6]:表1参照
ハロゲン化銀乳剤層の塗布液をAg2.5g/m2になるように塗布した点以外は、実施例1と同様にして、実施例6に係るタッチパネル用導電膜を得た。
[Example 6]: See Table 1 The conductive film for a touch panel according to Example 6 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied to have an Ag of 2.5 g / m 2. A membrane was obtained.

[実施例7]:表1参照
ハロゲン化銀乳剤層の塗布液をAg2.7g/m2になるように塗布した点以外は、実施例1と同様にして、実施例7に係るタッチパネル用導電膜を得た。
[Example 7]: See Table 1. The conductive film for a touch panel according to Example 7 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 2.7 g / m 2. A membrane was obtained.

[実施例8]:表2参照
ハロゲン化銀乳剤層の塗布液をAg2.9g/m2になるように塗布した点以外は、実施例1と同様にして、実施例8に係るタッチパネル用導電膜を得た。
[Example 8]: See Table 2 The conductive film for a touch panel according to Example 8 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 2.9 g / m 2. A membrane was obtained.

[実施例9]:表2参照
ハロゲン化銀乳剤層の塗布液をAg3.1g/m2になるように塗布した点以外は、実施例1と同様にして、実施例9に係るタッチパネル用導電膜を得た。
[Example 9]: See Table 2. The conductive film for a touch panel according to Example 9 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 3.1 g / m 2. A membrane was obtained.

[実施例10]:表2参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、ライン/スペース=8μm/592μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=592μm/8μm(ピッチ600μm)の、スペースが格子状であるフォトマスクを介して露光した点以外は、実施例1と同様にして、実施例10に係るタッチパネル用導電膜を得た。
[Example 10]: Refer to Table 2. A point where a silver halide emulsion layer coating solution was applied so as to have an Ag of 2.1 g / m 2 , and a lattice-like photo capable of giving a developed silver image of line / space = 8 μm / 592 μm A conductive film for a touch panel according to Example 10 is obtained in the same manner as in Example 1 except that the mask line / space = 592 μm / 8 μm (pitch 600 μm) is exposed through a photomask having a grid-like space. It was.

[実施例11]:表2参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、ライン/スペース=8μm/792μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=792μm/8μm(ピッチ800μm)の、スペースが格子状であるフォトマスクを介して露光した点以外は、実施例1と同様にして、実施例11に係るタッチパネル用導電膜を得た。
[Example 11]: Refer to Table 2. The point where the coating solution of the silver halide emulsion layer was applied so as to be Ag 2.1 g / m 2, and the lattice-like photo capable of giving a developed silver image of line / space = 8 μm / 792 μm A conductive film for a touch panel according to Example 11 is obtained in the same manner as in Example 1 except that the mask line / space = 792 μm / 8 μm (pitch 800 μm) is exposed through a photomask having a grid-like space. It was.

[実施例12]:表2参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、支持体上に表面親水化処理をしなかった点以外は、実施例1と同様にして、実施例12に係るタッチパネル用導電膜を得た。
[Example 12]: See Table 2. Example except that the coating solution of the silver halide emulsion layer was applied to Ag 2.1 g / m 2 and the support was not surface hydrophilized. In the same manner as in Example 1, a conductive film for a touch panel according to Example 12 was obtained.

[実施例13]:表2参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、、現像処理後にグルタルアルデヒド水溶液浸漬による硬膜処理を施さなかった点以外は、実施例1と同様にして、実施例13に係るタッチパネル用導電膜を得た。
[Example 13]: See Table 2 Other than the point that the coating solution of the silver halide emulsion layer was applied so as to be Ag 2.1 g / m 2 , and the film hardening treatment by immersion in glutaraldehyde aqueous solution was not performed after the development processing. Obtained the conductive film for touchscreens which concerns on Example 13 like Example 1. FIG.

[比較例1]:表3参照
ハロゲン化銀乳剤層の塗布液をAg1.4g/m2になるように塗布した点以外は、実施例1と同様にして、比較例1に係るタッチパネル用導電膜を得た。
[Comparative Example 1]: See Table 3. The conductive film for a touch panel according to Comparative Example 1 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to be Ag 1.4 g / m 2. A membrane was obtained.

[比較例2]:表3参照
ハロゲン化銀乳剤層の塗布液をAg3.2g/m2になるように塗布した点以外は、実施例1と同様にして、比較例2に係るタッチパネル用導電膜を得た。
[Comparative Example 2]: See Table 3 The conductive film for a touch panel according to Comparative Example 2 is the same as Example 1 except that the coating solution of the silver halide emulsion layer is applied so as to have an Ag of 3.2 g / m 2. A membrane was obtained.

[比較例3]:表3参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、ライン/スペース=8μm/492μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=492μm/8μm(ピッチ500μm)の、スペースが格子状であるフォトマスクを介して露光した点以外は、実施例1と同様にして、比較例3に係るタッチパネル用導電膜を得た。
[Comparative Example 3]: Refer to Table 3. Lattice-shaped photo that can give a developed silver image of line / space = 8 μm / 492 μm, in which the silver halide emulsion layer coating solution was applied to Ag 2.1 g / m 2. A conductive film for a touch panel according to Comparative Example 3 is obtained in the same manner as in Example 1 except that the mask line / space is 492 μm / 8 μm (pitch: 500 μm), and is exposed through a photomask having a grid-like space. It was.

[比較例4]:表3参照
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、ライン/スペース=8μm/892μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=892μm/8μm(ピッチ900μm)の、スペースが格子状であるフォトマスクを介して露光した点以外は、実施例1と同様にして、比較例4に係るタッチパネル用導電膜を得た。
[Comparative Example 4]: Refer to Table 3. A point where a silver halide emulsion layer coating solution was applied to give an Ag of 2.1 g / m 2 , a line / space = 8 μm / 892 μm lattice-like photo capable of giving a developed silver image A conductive film for a touch panel according to Comparative Example 4 is obtained in the same manner as in Example 1 except that the mask line / space = 892 μm / 8 μm (pitch 900 μm) is exposed through a photomask in which the space is a grid. It was.

[比較例5]
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、ライン/スペース=8μm/592μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=592μm/8μm(ピッチ600μm)の、スペースが格子状であるフォトマスクを介して露光した点、透明導電層を形成しなかった点以外は、実施例1と同様にして、比較例5に係るタッチパネル用導電膜を得た。
[Comparative Example 5]
Lattice-shaped photomask lines / spaces = 592 μm / 8 μm (line / space = 8 μm / 592 μm) that can give a developed silver image at a point where the silver halide emulsion layer coating solution was applied to Ag 2.1 g / m 2. The conductive film for a touch panel according to Comparative Example 5 was prepared in the same manner as in Example 1 except that the space was exposed through a photomask having a pitch of 600 μm and the transparent conductive layer was not formed. Obtained.

[比較例6]
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、透明導電層を形成しなかった点以外は、実施例1と同様にして、比較例6に係るタッチパネル用導電膜を得た。
[Comparative Example 6]
For the touch panel according to Comparative Example 6, except that the silver halide emulsion layer coating solution was applied to Ag 2.1 g / m 2 and the transparent conductive layer was not formed. A conductive film was obtained.

[比較例7]
ハロゲン化銀乳剤層の塗布液をAg2.1g/m2になるように塗布した点、ライン/スペース=8μm/792μmの現像銀像を与え得る格子状のフォトマスクライン/スペース=792μm/8μm(ピッチ800μm)の、スペースが格子状であるフォトマスクを介して露光した点、透明導電層を形成しなかった点以外は、実施例1と同様にして、比較例7に係るタッチパネル用導電膜を得た。
[Comparative Example 7]
A point where the silver halide emulsion layer coating solution was applied to have an Ag of 2.1 g / m 2 , and a lattice-like photomask line / space = 792 μm / 8 μm (line / space = 8 μm / 792 μm). A conductive film for a touch panel according to Comparative Example 7 was prepared in the same manner as in Example 1 except that the exposure was performed through a photomask having a pitch of 800 μm) and the transparent conductive layer was not formed. Obtained.

[評価]
(表面抵抗の測定及び表面抵抗のばらつきの評価)
導電層14の表面抵抗は、コペル電子株式会社製非接触抵抗計717B(H)にて測定した。また、開口部22の表面抵抗は、ADVANTEST社製デジタル超高抵抗(SR計)R8340Aにて測定した。
[Evaluation]
(Measurement of surface resistance and evaluation of variation in surface resistance)
The surface resistance of the conductive layer 14 was measured with a non-contact resistance meter 717B (H) manufactured by Coper Electronics Co., Ltd. The surface resistance of the opening 22 was measured with a digital super high resistance (SR meter) R8340A manufactured by ADVANTEST.

(モアレの評価)
表面の電磁波シールドフイルムを外した松下電器製PDP(TH−42PX300)を準備し、その上に作製したタッチパネル用導電膜を設置するための回転盤を配置する。回転盤は厚さ5mmのガラスでできており、PDP前面板を模している。さらに、角度目盛がついており、設置したタッチパネル用導電膜のバイアス角がわかるようになっている。PDPに電源を入れ、PDPのHDMI端子とパターンジェネレータ(ASTROVG828D)を接続する。パターンジェネレータから出力値最大の白色255信号をPDPへ送る。タッチパネル用導電膜が撓まないようにテープで回転盤の上に固定する。部屋を暗室にし、回転盤をバイアス角−45°〜+45°の間で回転し、モアレの目視観察・評価を行った。モアレの視認性はPDPの正面から観察距離1.5mで行い、モアレが顕在化しなかった場合を◎、モアレが問題のないレベルでほんの少し見られた場合を○、モアレが顕在化した場合を×として、各バイアス角度を評価した。総合評点として、◎となる角度範囲が15°以上の場合を○5、◎となる角度範囲が15°未満、10°以上の場合は○4、◎となる角度範囲が10°未満の場合は△3、◎となる角度範囲が無く×となる角度範囲が10°未満の場合は△2、◎となる角度範囲が無く×となる角度範囲が10°以上ある場合を×1とした。
(Evaluation of moire)
A Matsushita Electric PDP (TH-42PX300) from which the electromagnetic shielding film on the surface has been removed is prepared, and a rotating disk for installing the conductive film for the touch panel prepared thereon is disposed thereon. The turntable is made of glass having a thickness of 5 mm and imitates a PDP front plate. Furthermore, an angle scale is provided so that the bias angle of the installed conductive film for touch panel can be seen. The PDP is powered on, and the PDP HDMI terminal is connected to the pattern generator (ASTROVG828D). The white color signal with the maximum output value is sent from the pattern generator to the PDP. Fix the conductive film for touch panel on the turntable with tape so that it does not bend. The room was set as a dark room, and the rotating disk was rotated between a bias angle of −45 ° and + 45 °, and visual observation and evaluation of moire were performed. Visibility of moire is observed at a distance of 1.5 m from the front of the PDP, ◎ when moire does not appear, ◎ when moire is seen only at a level where there is no problem, ○ when moire appears. Each bias angle was evaluated as x. The overall score is ○ 5 when the angle range that is ◎ is 15 ° or more, ○ 4 when the angle range that is ◎ is less than 15 °, 10 ° or more, and when the angle range that is ◎ is less than 10 ° When there is no angle range that is Δ3 and ◎ and the angle range that is × is less than 10 °, Δ2 is that there is no angle range that is Δ2 and ◎ and there is an angle range that is × 10 ° or more.

(見た目の評価)
モアレの評価で用いたPDPの表示を黒から白に徐々に変化させ、肉眼で見たときに、タッチパネル用導電膜のメッシュパターンが目立った時点のグレー階調を5段階に正規化して評価した。このとき、メッシュパターンが黒に近い階調で目だった場合は「×1」、白に近い階調で目立った場合、あるいは全く目立たない場合は「○5」というように評価し、その間の階調で目立った場合は、白に近い方から黒に向かって順番に「○4」、「△3」、「△2」というように割り当てた。
(Evaluation of appearance)
The display of the PDP used in the moire evaluation was gradually changed from black to white, and when viewed with the naked eye, the gray gradation at the time when the mesh pattern of the conductive film for the touch panel was conspicuous was normalized and evaluated. . At this time, when the mesh pattern is conspicuous with a gradation close to black, it is evaluated as “× 1”, when it is conspicuous with a gradation close to white, or when it is not conspicuous at all, “○ 5” is evaluated. When it was conspicuous in the key, it was assigned in the order of “◯ 4”, “Δ3”, “Δ2” in order from the side closer to white toward black.

(直線性の評価)
タッチパネルに対して一辺が5cmの正方形をペンで入力し、そのときに描かれる正方形の各辺に断線や乱れ(細かい凹凸)が存在するかどうかを目視にて確認した。そして、4辺とも断線や乱れがない場合に○5、いずれか1辺に断線や乱れがあった場合に○4、いずれか2辺に断線や乱れがあった場合に△3、いずれか3辺に断線や乱れがあった場合に×2、全ての辺に断線や乱れがあった場合に×1と評価した。
(Evaluation of linearity)
A square with a side of 5 cm was input to the touch panel with a pen, and it was visually confirmed whether or not there was a break or disorder (fine irregularities) on each side of the square drawn. And, when there is no disconnection or disorder on all four sides, ○ 5, when there is a disconnection or disorder on any one side, ○ 4, when any two sides have disconnection or disorder, Δ3, either 3 When the side was disconnected or disturbed, it was evaluated as x2, and when all the sides were disconnected or disordered, it was evaluated as x1.

(摺動性の評価)
長尺のタッチパネル用導電膜の一端を固定し、タッチパネル用導電膜のうち、固定箇所から0.5mmの部分を、0.8Rのポリアセタール製のペン先で摺動させた。ペン先には500gの荷重をかけ、摺動速度5回/秒で、摺動長さ20mとした。ペン先による摺動後、タッチパネル用導電膜の表面抵抗を上述のロレスターGP(型番MCP−T610)直列4探針プローブ(ASP)にて測定し、初期の表面抵抗に対する上昇率をみた。上昇率が1.5未満であれば○、1.5以上2.0未満であれば△、2,0以上であれば×と評価した。
(Slidability evaluation)
One end of the long conductive film for a touch panel was fixed, and a 0.5 mm portion of the conductive film for the touch panel was slid with a 0.8 R polyacetal nib. A load of 500 g was applied to the pen tip, the sliding speed was 5 times / second, and the sliding length was 20 m. After sliding with the pen tip, the surface resistance of the conductive film for the touch panel was measured with the above-mentioned Lorester GP (model number MCP-T610) series 4-probe probe (ASP), and the rate of increase with respect to the initial surface resistance was observed. When the rate of increase was less than 1.5, it was evaluated as ◯, when it was 1.5 or more and less than 2.0, Δ, and when it was 2,000 or more, it was evaluated as x.

Figure 2010108878
Figure 2010108878

Figure 2010108878
Figure 2010108878

Figure 2010108878
Figure 2010108878

実施例1〜13においては、表面抵抗が200〜800オーム/sq.の範囲内にあり、例えば抵抗膜式のタッチパネルに用いて好適なタッチパネル用導電膜であることがわかる。しかも、導電層14のメッシュパターン18のピッチPaが600μm以上であることから、モアレが十分に低減されていることがわかる。また、メッシュパターン18のピッチPaが800μm以下であることから、導電層14のメッシュパターン18が目立たなくなり、見た目が良好となる。従って、特に、実施例1〜13は、タッチパネルを通じての文字や画像等の表示が見やすくなり、視認性に優れたタッチパネルを提供することができる。   In Examples 1 to 13, the surface resistance is 200 to 800 ohm / sq. It can be seen that it is a conductive film for a touch panel suitable for use in, for example, a resistive film type touch panel. Moreover, since the pitch Pa of the mesh pattern 18 of the conductive layer 14 is 600 μm or more, it can be seen that moire is sufficiently reduced. Further, since the pitch Pa of the mesh pattern 18 is 800 μm or less, the mesh pattern 18 of the conductive layer 14 becomes inconspicuous, and the appearance is good. Therefore, in particular, the first to thirteenth embodiments make it easy to see the display of characters and images through the touch panel, and can provide a touch panel with excellent visibility.

さらに、実施例1〜13は、導電層14とは別に導電性微粒子が分散された透明導電層を形成するようにしたので、ペン入力した場合の直線性が向上していることがわかる。また、実施例1〜11は、支持体上に下塗り層を形成し、さらに硬膜処理を行うようにした行ったので、摺動性が向上していることがわかる。なお、実施例12は下塗り層を形成しなかったため、評価は×であった。また、実施例13は硬膜処理を施さなかったため、評価は△であった。   Furthermore, since Examples 1-13 formed the transparent conductive layer in which the electroconductive fine particles were disperse | distributed separately from the conductive layer 14, it turns out that the linearity at the time of pen input is improving. In Examples 1 to 11, it was found that the slidability was improved because an undercoat layer was formed on the support and further the film hardening treatment was performed. Since Example 12 did not form an undercoat layer, the evaluation was x. Moreover, since Example 13 did not perform a hardening process, evaluation was (triangle | delta).

一方、比較例1及び2は、いずれも、表面抵抗が200〜800オーム/sq.の範囲から逸脱していた。また、比較例3は、ピッチが500μm(600μm未満)であったため、モアレが目立ち、評価は×2であった。反対に、比較例4は、ピッチが900μm(800μm超過)であったため、メッシュパターンが目立ち、評価は×2であった。比較例5〜7は、透明導電層を形成しなかったため、直線性が悪く、評価は共に×1であった。   On the other hand, Comparative Examples 1 and 2 both have a surface resistance of 200 to 800 ohm / sq. Deviated from the scope. In Comparative Example 3, since the pitch was 500 μm (less than 600 μm), moire was conspicuous and the evaluation was × 2. On the contrary, in Comparative Example 4, since the pitch was 900 μm (exceeding 800 μm), the mesh pattern was conspicuous and the evaluation was × 2. Since Comparative Examples 5-7 did not form a transparent conductive layer, the linearity was poor and the evaluations were both x1.

なお、本発明に係るタッチパネル用導電膜及びその製造方法は、上述の実施の形態に限らず、本発明の要旨を逸脱することなく、種々の構成を採り得ることはもちろんである。   In addition, the conductive film for touch panels and the manufacturing method thereof according to the present invention are not limited to the above-described embodiments, and it is needless to say that various configurations can be adopted without departing from the gist of the present invention.

本実施の形態に係るタッチパネル用導電膜を一部省略して示す断面図である。It is sectional drawing which abbreviate | omits and shows the electrically conductive film for touchscreens which concerns on this Embodiment. 導電層のメッシュパターンの一例(直線格子パターン)を示す平面図である。It is a top view which shows an example (linear lattice pattern) of the mesh pattern of a conductive layer. 導電層のメッシュパターンの他の例(波線格子パターン)を示す平面図である。It is a top view which shows the other example (a wavy lattice pattern) of the mesh pattern of a conductive layer.

符号の説明Explanation of symbols

10…タッチパネル用導電膜
12…支持体
14…導電層
16…銀塩乳剤層
18…メッシュパターン
20…導電部分
22…開口部
Pa…ピッチ
DESCRIPTION OF SYMBOLS 10 ... Conductive film 12 for touchscreen ... Support body 14 ... Conductive layer 16 ... Silver salt emulsion layer 18 ... Mesh pattern 20 ... Conductive part 22 ... Opening part Pa ... Pitch

Claims (12)

支持体上に銀塩乳剤層を露光現像して形成された銀を含有する導電層を有するタッチパネル用導電膜であって、
前記銀塩乳剤層の塗布銀量が1.5〜3.1g/m2であり、
前記導電層がピッチ600μm以上800μm以下のメッシュパターンに形成され、
表面抵抗が200〜800オーム/sq.であることを特徴とするタッチパネル用導電膜。
A conductive film for a touch panel having a conductive layer containing silver formed by exposing and developing a silver salt emulsion layer on a support,
Coated silver amount of the silver salt emulsion layer is 1.5~3.1g / m 2,
The conductive layer is formed in a mesh pattern having a pitch of 600 μm to 800 μm,
The surface resistance is 200 to 800 ohm / sq. A conductive film for a touch panel, characterized in that
請求項1記載のタッチパネル用導電膜において、
前記銀塩乳剤層の銀/バインダーの体積比率が1/4以上であることを特徴とするタッチパネル用導電膜。
The conductive film for a touch panel according to claim 1,
A conductive film for a touch panel, wherein the silver / binder volume ratio of the silver salt emulsion layer is 1/4 or more.
請求項1記載のタッチパネル用導電膜において、
前記銀塩乳剤層の銀/バインダーの体積比率が1/2以上1/0.7以下であることを特徴とするタッチパネル用導電膜。
The conductive film for a touch panel according to claim 1,
The conductive film for a touch panel, wherein the silver / binder volume ratio of the silver salt emulsion layer is from 1/2 to 1 / 0.7.
請求項1〜3のいずれか1項に記載のタッチパネル用導電膜において、
前記導電層の線幅が5〜10μmであることを特徴とするタッチパネル用導電膜。
In the electrically conductive film for touchscreens of any one of Claims 1-3,
A conductive film for a touch panel, wherein the conductive layer has a line width of 5 to 10 μm.
請求項1〜4のいずれか1項に記載のタッチパネル用導電膜において、
さらに透明導電層を備え、
前記透明導電層は、導電性微粒子及びバインダーを含有し、前記導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)が1/3〜2/1であることを特徴とするタッチパネル用導電膜。
In the electrically conductive film for touchscreens of any one of Claims 1-4,
Furthermore, a transparent conductive layer is provided,
The transparent conductive layer contains conductive fine particles and a binder, and a mass ratio of the conductive fine particles to the binder (conductive fine particles / binder) is 1/3 to 2/1. .
銀塩乳剤層を有する導電膜形成用感光材料において、
前記銀塩乳剤層の塗布銀量が1.5〜3.1g/m2であり、
さらに、透明導電層を有し、
前記透明導電層は、導電性微粒子及びバインダーを含有し、前記導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)が1/3〜2/1であることを特徴とする導電膜形成用感光材料。
In a photosensitive material for forming a conductive film having a silver salt emulsion layer,
The coating silver amount of the silver salt emulsion layer is 1.5 to 3.1 g / m 2 ,
Furthermore, it has a transparent conductive layer,
The transparent conductive layer contains conductive fine particles and a binder, and a mass ratio of the conductive fine particles to the binder (conductive fine particles / binder) is 1/3 to 2/1. Photosensitive material.
請求項6記載の導電膜形成用感光材料において、
前記銀塩乳剤層が前記導電性微粒子を含有して、前記透明導電層を兼用し、
前記導電性微粒子の含有量が、0.15〜0.5g/m2であることを特徴とする導電膜形成用感光材料。
In the photosensitive material for electrically conductive film formation of Claim 6,
The silver salt emulsion layer contains the conductive fine particles, and also serves as the transparent conductive layer,
Content of the said electroconductive fine particles is 0.15-0.5 g / m < 2 >, The photosensitive material for electrically conductive film formation characterized by the above-mentioned.
請求項6記載の導電膜形成用感光材料において、
前記透明導電層は前記銀塩乳剤層の上層側に位置し、
前記透明導電層の前記導電性微粒子の含有量が、0.2〜0.4g/m2であることを特徴とする導電膜形成用感光材料。
In the photosensitive material for electrically conductive film formation of Claim 6,
The transparent conductive layer is located on the upper side of the silver salt emulsion layer,
Content of the said electroconductive fine particles of the said transparent conductive layer is 0.2-0.4g / m < 2 >, The photosensitive material for electrically conductive film formation characterized by the above-mentioned.
請求項6記載の導電膜形成用感光材料において、
前記透明導電層は前記銀塩乳剤層の下層側に位置し、
前記透明導電層の前記導電性微粒子の含有量が、0.15〜0.5g/m2であることを特徴とする導電膜形成用感光材料。
In the photosensitive material for electrically conductive film formation of Claim 6,
The transparent conductive layer is located on the lower layer side of the silver salt emulsion layer,
The content of the conductive fine particles of the transparent conductive layer, the conductive film forming photosensitive material, which is a 0.15~0.5g / m 2.
請求項7〜9のいずれか1項に記載の導電膜形成用感光材料において、
前記導電性微粒子が球状のときは、平均粒子径が0.085〜0.12μmであり、
前記導電性微粒子が針状のときは、平均軸長が長軸0.2〜20μm,短軸0.01〜0.02μmであることを特徴とする導電膜形成用感光材料。
In the photosensitive material for electrically conductive film formation of any one of Claims 7-9,
When the conductive fine particles are spherical, the average particle size is 0.085 to 0.12 μm,
When the conductive fine particles are needle-shaped, an average axis length is 0.2 to 20 μm in the major axis and 0.01 to 0.02 μm in the minor axis, and a photosensitive material for forming a conductive film, characterized in that:
請求項6〜10のいずれか1項に記載の導電膜形成用感光材料をパターン露光し、現像処理して得られることを特徴とする導電性材料。   A conductive material obtained by subjecting the photosensitive material for forming a conductive film according to claim 6 to pattern exposure and development treatment. 支持体上に導電層を有する導電膜であって、
前記導電層又は前記導電層とは別の層が、導電性微粒子及びバインダーを含有し、
前記導電性微粒子及びバインダーの質量比(導電性微粒子/バインダー)が1/3〜2/1であることを特徴とする導電膜。
A conductive film having a conductive layer on a support,
The conductive layer or another layer different from the conductive layer contains conductive fine particles and a binder,
A conductive film having a mass ratio of the conductive fine particles to the binder (conductive fine particles / binder) of 1/3 to 2/1.
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KR20100048932A (en) 2010-05-11
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CN103456391A (en) 2013-12-18
JP5469849B2 (en) 2014-04-16
CN101728009B (en) 2013-09-18

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