JP2009136848A - Heat radiation coated metal plate - Google Patents

Heat radiation coated metal plate Download PDF

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JP2009136848A
JP2009136848A JP2007319157A JP2007319157A JP2009136848A JP 2009136848 A JP2009136848 A JP 2009136848A JP 2007319157 A JP2007319157 A JP 2007319157A JP 2007319157 A JP2007319157 A JP 2007319157A JP 2009136848 A JP2009136848 A JP 2009136848A
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heat
organic resin
resin film
metal plate
film
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Toshiki Maezono
利樹 前園
Masaji Saito
正次 斉藤
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Furukawa Sky KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a heat radiation coated metal plate which efficiently conducts heat from a heat generation source to a face at which heat radiation is performed, efficiently performs heat radiation in the face at which heat radiation is performed, and has satisfactory workability. <P>SOLUTION: A chemical film 3 is formed on the surface of a metal plate 4, the face of a part of the chemical film surface 3 is provided with a thermally conductive organic resin film 5 containing a heat conductive filler of 5 to 80 vol% and having a film thickness of 1 to 50 μm, and further, the surface of a part of the chemical film surface is provided with a heat radiative organic resin film 1 comprising a heat radiative filler 2, thus a heat radiation coated metal plate 7 having high thermal conductivity, heat radiability and workability can be obtained. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、一般電子機器の発熱部位からの放熱又は、プラズマディスプレイパネルや液晶バックライト、有機ELパネル、インバーター等の発熱部位からの放熱を目的とした放熱塗装板に関する。   The present invention relates to a heat-dissipating coated plate for the purpose of heat dissipation from a heat generating part of a general electronic device or heat generation from a heat generating part such as a plasma display panel, a liquid crystal backlight, an organic EL panel, an inverter.

近年、各種電子機器等に使用されているIC等の電子部品はその集積度が向上し、更に電子機器等の小型化の要求に対応するため、IC等の電子部品を小さなスペースに高密度に配置することにより、筐体内での発熱に対する放熱対策が大きな問題となっている。すなわち、IC等の電子部品は、温度が上昇すると電子部品の特性が変動して機器の誤作動の原因になったり電子部品自体が故障したりする。   In recent years, electronic components such as ICs used in various electronic devices have been highly integrated, and in order to meet the demand for miniaturization of electronic devices, etc., electronic components such as ICs are densely packed in a small space. By disposing, heat dissipation measures against heat generation in the housing are a big problem. In other words, when the temperature rises, the characteristics of the electronic component such as an IC may change the characteristics of the electronic component and cause malfunction of the device, or the electronic component itself may fail.

一方で、高速化が進むCPUをはじめとする半導体デバイス等から発生する発熱量が増大しているのに対し、各種電子機器等は、その装置の小型軽量化及び薄型化が進展している為、その性能および機能を維持するには、発生した熱を十分除去する必要があり、効率の良い放熱システムが要求されている。   On the other hand, while the amount of heat generated from semiconductor devices such as CPUs, which are increasing in speed, is increasing, various types of electronic devices are becoming smaller and lighter and thinner. In order to maintain its performance and function, it is necessary to sufficiently remove the generated heat, and an efficient heat dissipation system is required.

この目的のために従来より、電子機器等の使用中に電子部品の温度上昇を抑えるために放熱板が使用されることがある。この放熱板は、発熱部位に接触させ発生する熱を放熱板へ伝導させることにより電子部品の放熱を行うものであり、一般的には銅又はアルミニウム等の熱伝導率の大きい材料により構成させる。しかしながら、IC等の電子部品から発生した熱を、単に熱伝導により外部に逃がす方法では、発熱量が大きくなったときには放熱板を強制的に冷却する必要があり、その手段としては例えば放熱板の表面積を大きくさせるヒートシンク型や、ファンモータを用いて発熱部分を強制的に冷却する方法がある。このような方法では前記のような装置の小型軽量化および薄肉化は困難であった。   For this purpose, conventionally, a heat sink is sometimes used to suppress the temperature rise of the electronic component during use of the electronic device or the like. This heat radiating plate radiates heat from the electronic component by conducting heat generated by contacting the heat generating portion to the heat radiating plate, and is generally made of a material having high thermal conductivity such as copper or aluminum. However, in a method in which heat generated from electronic components such as ICs is simply released to the outside by heat conduction, it is necessary to forcibly cool the heat sink when the amount of heat generation becomes large. There are a heat sink type that increases the surface area, and a method of forcibly cooling the heat generating portion using a fan motor. With such a method, it has been difficult to reduce the size and weight of the apparatus as described above.

この問題に対して、熱放射率が大きい材料からなるシートと、熱伝導率の大きい材料からなるシートの積層品を発熱部位に取り付け放熱を行う方法が提案されている。(特許文献1)
この方法においては、強制的に冷却する代わりに、熱放射率が大きい材料からなるシートの側から、幾分かの熱が放射されるために、装置の小型化を計る上において有効である。しかしながら、前記のようにCPU等の高速化およびIC等の電子部品の高集積化の要求、及び装置の小型軽量化や薄肉化が一層進んで来ている状況において、その放熱性能は十分とは言えず更に効率の良い放熱システムが求められていた。

特開平8−167682号公報
In order to solve this problem, a method of dissipating heat by attaching a sheet made of a material having a high thermal emissivity and a laminated product of a sheet made of a material having a high thermal conductivity to a heat generating portion has been proposed. (Patent Document 1)
In this method, instead of forcibly cooling, some heat is radiated from the side of a sheet made of a material having a high thermal emissivity, which is effective in miniaturizing the apparatus. However, as described above, in the situation where the speed of the CPU and the like and the high integration of the electronic parts such as the IC are required, and the device is becoming smaller and lighter and thinner, the heat dissipation performance is sufficient. There was a need for a more efficient heat dissipation system.

JP-A-8-167682

また、前記の問題を解決して電子部品から発生する熱を効率良く外部に導き、更にその熱を熱放射により放熱するための、各種電子機器の小型軽量化及び薄型化に対応した放熱シートが提案されている。(特許文献2)
しかし、前記放熱シートは熱放射プレコート材と熱伝導性粘着剤層用シートをラミネートしたもので、非常に高価であるという問題が発生している。また、熱伝導性粘着剤層が実施例に記載された400μm程度に厚い場合、熱抵抗が大きくなり放熱効果が十分でない問題がある。また、熱伝導性粘着剤層用シートが柔らかいことや熱放射プレコート材との密着性が十分ではないため、プレス成形を行った場合、厳しい加工ができない場合があったり、加工できた場合でも、加工部の耐食性が劣るという品質問題、また大きな粘着剤層の割れや傷の場合、商品価値が無くなるため生産性が低下し、コスト上昇を招くなどの問題が発生している。

特開2005−101025号公報
In addition, there is a heat radiating sheet corresponding to the reduction in size and weight of various electronic devices for solving the above-mentioned problems and efficiently guiding the heat generated from the electronic components to the outside and further radiating the heat by heat radiation. Proposed. (Patent Document 2)
However, the heat-dissipating sheet is a laminate of a heat-radiating precoat material and a heat-conducting pressure-sensitive adhesive layer sheet, which causes a problem that it is very expensive. Moreover, when a heat conductive adhesive layer is as thick as about 400 micrometers described in the Example, there exists a problem that heat resistance becomes large and the heat dissipation effect is not enough. Also, because the heat conductive adhesive layer sheet is soft and the adhesiveness with the heat radiation precoat material is not sufficient, when press molding, there are cases where severe processing may not be possible, even if it can be processed, In the case of a quality problem that the corrosion resistance of the processed part is inferior, and in the case of a crack or scratch of a large pressure-sensitive adhesive layer, there is a problem that the product value is lost and the productivity is lowered and the cost is increased.

JP 2005-101025 A

本発明は、低コストで良好な熱伝導性、放熱性、成形性を具備する放熱塗装金属板を得ることを目的とするものである。   An object of the present invention is to obtain a heat-dissipation-coated metal plate having good thermal conductivity, heat dissipation, and formability at low cost.

本発明者らは鋭意研究の結果、金属板上に化成皮膜を設け、表面の一部に、熱伝導性フィラーを含有する熱伝導性有機樹脂皮膜を設け、さらに、表面の一部に、熱放射性フィラーを含有する熱放射性有機樹脂皮膜を設けることにより、低コストで成形性と放熱性を向上し得ることを見出した。そして、さらに実験を重ねてそれらの適正量を見出し本発明を完成させるに至った。   As a result of intensive research, the present inventors have provided a chemical conversion film on a metal plate, provided a part of the surface with a heat conductive organic resin film containing a heat conductive filler, and further provided a part of the surface with a heat conductive film. It has been found that by providing a heat-radiating organic resin film containing a radioactive filler, moldability and heat dissipation can be improved at low cost. And further experiment was repeated, and those appropriate amounts were found and it came to complete this invention.

すなわち、金属板の表面に化成皮膜を形成し、該化成皮膜表面の一部に、熱伝導性フィラーを5〜80vol%含有し、膜厚1〜50μmとなる熱伝導性有機樹脂皮膜を設け、さらに、該化成皮膜表面の一部に、熱放射性フィラーを含有する熱放射性有機樹脂皮膜を設けたことを特徴とする、放熱塗装金属板。   That is, a chemical conversion film is formed on the surface of the metal plate, and a part of the chemical conversion film surface is provided with a heat conductive organic resin film containing 5 to 80 vol% of a heat conductive filler and having a film thickness of 1 to 50 μm. Furthermore, a heat-radiating organic resin film containing a heat-radiating filler is provided on a part of the surface of the chemical conversion film.

熱伝導性有機樹脂皮膜の表面粗さ(Ra)が、1μm以下であることを特徴とする、前記の放熱塗装金属板。   The heat-dissipation-coated metal plate described above, wherein the heat conductive organic resin film has a surface roughness (Ra) of 1 μm or less.

熱伝導性有機樹脂皮膜のガラス転移温度(Tg)が、60℃以下であることを特徴とする前記の放熱金属板。   The heat-dissipating metal plate described above, wherein the glass transition temperature (Tg) of the thermally conductive organic resin film is 60 ° C. or less.

熱伝導性有機樹脂皮膜に、窒化ホウ素、窒化アルミ、窒化ケイ素、炭化ケイ素、アルミナ、ジルコニア、水酸化マグネシウム、水酸化アルミニウムからなる熱伝導性フィラーのうち、1種以上を含有することを特徴とする前記の放熱塗装金属板。   The heat conductive organic resin film contains at least one of heat conductive fillers composed of boron nitride, aluminum nitride, silicon nitride, silicon carbide, alumina, zirconia, magnesium hydroxide, and aluminum hydroxide. The heat-dissipation-coated metal plate.

熱放射性有機樹脂皮膜に、酸化チタン、カーボンブラック、黒鉛、炭素繊維からなる熱放射性フィラーのうち、1種以上を含有することを特徴とする前記の放熱塗装金属板。   The heat-dissipating coated metal sheet, wherein the heat-radiating organic resin film contains one or more of heat-radiating fillers composed of titanium oxide, carbon black, graphite, and carbon fibers.

本発明の放熱塗装金属板は、低コストで良好な放熱性を有し、かつ成形性にも優れたものなので、特に従来にない小スペースで、電子部品から発生する熱を飛躍的に効率良く外部に逃がす放熱塗装金属板として好適に使用される。   The heat-dissipation-coated metal sheet of the present invention has good heat dissipation at low cost and has excellent moldability, so that heat generated from electronic components can be dramatically improved especially in a small space that has not been available in the past. It is suitably used as a heat-dissipating painted metal plate that escapes to the outside.

本発明において、基材の金属板は特に限定されるものではなく、例えばアルミニウム板、ステンレス鋼板、低炭素鋼、高炭素鋼、高張力鋼板等に使用される低合金鋼からなる鋼板、あるいは、これらの鋼板を母材としてその表面にめっきを施しためっき鋼板などが用いられる。特に、放熱部材を形成・保持するに足る強度を有し、また絞り加工、曲げ加工時において充分な成形加工性を有し、かつ内部で発生した熱をより速やかに外部に発散させることができる熱伝導性に優れる1000系、3000系、5000系のアルミニウム板が好ましい。   In the present invention, the base metal plate is not particularly limited, for example, an aluminum plate, a stainless steel plate, a low carbon steel, a high carbon steel, a steel plate made of a low alloy steel used for a high tensile steel plate, or the like, or A plated steel sheet having a surface plated with these steel sheets as a base material is used. In particular, it has sufficient strength to form and hold a heat radiating member, has sufficient moldability during drawing and bending, and can dissipate heat generated inside more quickly to the outside. 1000 series, 3000 series, and 5000 series aluminum plates having excellent thermal conductivity are preferred.

前記金属板上に設ける化成皮膜は、金属板の表面と有機樹脂皮膜との間に介在して両者の密着性を高めるものであれば特に限定されるものでない。具体的には塗布型と反応型があり、特に制限されないが、主に金属板と樹脂皮膜の両方に密着性が良好な反応型化成皮膜が用いられる。反応型化成皮膜とは、具体的にはリン酸クロメート、クロム酸クロメート、リン酸ジルコニウム、リン酸チタニウムなどの処理液で形成される皮膜である。特にリン酸クロメート処理皮膜が、コスト、汎用性の点で好ましい。このような化成皮膜は、アルミニウム板に所定の化成処理液をスプレーしたり、合金板を処理液中に所定の温度で所定時間浸漬したりすることによって施される。なお、化成皮膜を設ける前に、金属表面の汚れを除去したり表面性状を調整したりするために、金属板を、硫酸、硝酸、リン酸等による酸処理(洗浄)、或いは、カセイソーダ、リン酸ソーダ、ケイ酸ソーダ等によるアルカリ処理(洗浄)を行うことが望ましい。このような洗浄による表面処理も、金属板に所定の表面処理液をスプレーしたり、金属板を処理液中に所定温度で所定時間浸漬したりすることによって施される。   The chemical conversion film provided on the metal plate is not particularly limited as long as it is interposed between the surface of the metal plate and the organic resin film to enhance the adhesion between them. Specifically, there are a coating type and a reactive type, and there is no particular limitation, but a reactive chemical conversion film having good adhesion is mainly used for both the metal plate and the resin film. The reactive chemical conversion film is specifically a film formed with a treatment liquid such as phosphate chromate, chromate chromate, zirconium phosphate, and titanium phosphate. In particular, a phosphoric acid chromate-treated film is preferable in terms of cost and versatility. Such a chemical conversion film is applied by spraying a predetermined chemical conversion treatment liquid on the aluminum plate or immersing the alloy plate in the treatment liquid at a predetermined temperature for a predetermined time. In addition, in order to remove dirt on the metal surface or adjust the surface properties before providing the chemical conversion film, the metal plate may be acid-treated (washed) with sulfuric acid, nitric acid, phosphoric acid, etc., or caustic soda, phosphorus It is desirable to perform alkali treatment (washing) with acid soda, sodium silicate, or the like. Surface treatment by such cleaning is also performed by spraying a predetermined surface treatment liquid on the metal plate or immersing the metal plate in the treatment liquid at a predetermined temperature for a predetermined time.

次いで、前記化成皮膜表面に熱伝導性有機樹脂皮膜及び、熱放射性有機樹脂皮膜を形成する。前記樹脂皮膜が形成される面は、熱伝導性が必要とされる面に熱伝導性有機樹脂皮膜が、熱放射性が必要とされる面に熱放射性有機樹脂皮膜が、適宜に形成されていれば良い。   Next, a heat conductive organic resin film and a heat radiation organic resin film are formed on the chemical conversion film surface. As for the surface on which the resin film is formed, a heat conductive organic resin film is appropriately formed on a surface where heat conductivity is required, and a heat radiation organic resin film is appropriately formed on a surface where heat radiation is required. It ’s fine.

前記熱伝導性有機樹脂皮膜は、ベース樹脂、熱伝導性フィラーを必須成分として含有させ、適当な溶剤にこれらを溶解、分散させた塗料を焼付け塗装して形成され、前記熱放射性有機樹脂皮膜は、ベース樹脂、熱放射性フィラーを必須成分として含有させ、適当な溶剤にこれらを溶解、分散させた塗料を焼付け塗装して形成される。   The heat conductive organic resin film is formed by baking a paint containing a base resin and a heat conductive filler as essential components, and dissolving and dispersing them in a suitable solvent. The base resin and the thermal radiation filler are contained as essential components, and a paint in which these are dissolved and dispersed in an appropriate solvent is baked and applied.

前記熱伝導性有機樹脂皮膜及び、前記熱放射性有機樹脂皮膜を塗布、焼付けする方法としては、塗料をロールコーターやバーコーター等によって化成皮膜表面に直接塗布し、所定温度のオーブン中で所定時間処理して焼付け乾燥させるのが適当である。   As a method of applying and baking the thermally conductive organic resin film and the thermally radiative organic resin film, a paint is directly applied to the surface of the chemical film by a roll coater or a bar coater, and is processed in an oven at a predetermined temperature for a predetermined time. It is appropriate to bake and dry.

前記化成皮膜表面に設ける熱伝導性有機樹脂皮膜及び熱放射性有機樹脂皮膜のベース樹脂は、一般的にプレコートメタルに使用されるエポキシ系樹脂、フッ素系樹脂、アクリル系樹脂、ポリエステル系樹脂、シリコンポリエステル系樹脂などがあり特に制限されないが、エポキシ系樹脂、アクリル系樹脂、ポリエステル系樹脂などが、コスト、汎用性の点で好ましい。   The base resin of the heat conductive organic resin film and the heat radiation organic resin film provided on the surface of the chemical film is an epoxy resin, a fluorine resin, an acrylic resin, a polyester resin, or a silicon polyester generally used for a pre-coated metal. An epoxy resin, an acrylic resin, a polyester resin, and the like are preferable in terms of cost and versatility.

前記熱伝導性有機樹脂皮膜は、熱伝導性フィラーを皮膜中に5〜80vol%含有する。熱伝導性フィラーが5vol%未満では、熱伝導性フィラーの絶対量が少なく放熱性が低下する。また、80vol%を超えると、バインダーとなる樹脂成分の割合が低く皮膜が脆くなり、加工性が低下する。   The said heat conductive organic resin film | membrane contains 5-80 vol% of heat conductive fillers in a film | membrane. When the heat conductive filler is less than 5 vol%, the absolute amount of the heat conductive filler is small, and the heat dissipation is reduced. Moreover, when it exceeds 80 vol%, the ratio of the resin component used as a binder will be low, and a film | membrane will become weak, and workability will fall.

前記熱伝導性有機樹脂皮膜の膜厚は1〜50μmとする。膜厚が1μm未満では、素材が熱伝導性有機樹脂皮膜から部分的に露出したり、露出しないまでも非常に薄い部分が多くなり加工性が低下する。また、50μmを超えると、皮膜の熱抵抗が大きくなり放熱性が低下する。また、曲げ加工性が低下する。   The film thickness of the heat conductive organic resin film is 1 to 50 μm. When the film thickness is less than 1 μm, the material is partially exposed from the thermally conductive organic resin film, or even if it is not exposed, a very thin portion increases and the workability deteriorates. On the other hand, if it exceeds 50 μm, the thermal resistance of the film increases and the heat dissipation performance decreases. Moreover, bending workability falls.

前記熱伝導性有機樹脂皮膜の表面粗さ(Ra)は1μm以下であることが好ましい。表面粗さ(Ra)を1μm以下とすることにより、発熱部位との密着性が向上し、発熱部位からの熱伝導がスムーズになるため放熱性が向上する。   The surface roughness (Ra) of the thermally conductive organic resin film is preferably 1 μm or less. By setting the surface roughness (Ra) to 1 μm or less, the adhesion with the heat generating part is improved, and the heat conduction from the heat generating part becomes smooth, so that the heat dissipation is improved.

前記熱伝導性有機樹脂皮膜のガラス転移温度(Tg)を60℃以下であることが好ましい。ガラス転移温度(Tg)を60℃以下とすることにより、前記熱伝導性有機樹脂皮膜の柔軟性・変形性が向上し、その結果発熱部位との密着性が向上し、発熱部位からの熱伝導がスムーズになるため放熱性が向上する。   The glass transition temperature (Tg) of the thermally conductive organic resin film is preferably 60 ° C. or lower. By setting the glass transition temperature (Tg) to 60 ° C. or lower, flexibility and deformability of the heat conductive organic resin film are improved, and as a result, adhesion to the heat generating portion is improved, and heat conduction from the heat generating portion. Improves the heat dissipation.

前記熱伝導性有機樹脂皮膜中に含有する熱伝導性フィラーは、好ましくは窒化ホウ素、窒化アルミ、窒化ケイ素、炭化ケイ素、アルミナ、ジルコニア、水酸化マグネシウム、水酸化アルミニウムの中から選ばれた少なくとも1種以上からなる。特に好ましくは、熱伝導性の点で窒化アルミ、コスト、汎用性の点でアルミナが好ましい。なお、一般的に有機樹脂の熱伝導率は0.1〜0.5W/m・K程度と非常に低く,熱伝導性を向上させるためには熱伝導率が数W/m・K〜数百W/m・Kと有機樹脂よりも高い高熱伝導性物質を添加する必要があり、この高熱伝導性物質を熱伝導性フィラーと言う。   The thermally conductive filler contained in the thermally conductive organic resin film is preferably at least one selected from boron nitride, aluminum nitride, silicon nitride, silicon carbide, alumina, zirconia, magnesium hydroxide, and aluminum hydroxide. It consists of more than seeds. Particularly preferably, aluminum nitride is preferable in terms of thermal conductivity, and alumina is preferable in terms of cost and versatility. In general, the thermal conductivity of organic resins is as low as about 0.1 to 0.5 W / m · K. In order to improve thermal conductivity, the thermal conductivity is several W / m · K to several It is necessary to add a material having a high thermal conductivity of 100 W / m · K and higher than that of the organic resin, and this high thermal conductivity material is referred to as a thermally conductive filler.

前記化成皮膜表面に設ける熱放射性有機樹脂皮膜は、熱放射性フィラーを含有する。熱放射性フィラーは、酸化チタン、カーボンブラック、黒鉛、炭素繊維の中から選ばれた少なくとも1種以上からなる。特に好ましくは、熱放射性の点でカーボンブラック、黒鉛が好ましい。なお、熱放射性フィラーとは、「熱伝導」とは異なる「熱放射」と言う放熱メカニズムで材料の温度を低下させる物質である。つまり、熱放射性フィラーは熱を吸収して温度が上昇すると、それを構成している分子や原子は励起状態になる。しかし励起状態は不安定な状態のため分子や原子はエネルギーを赤外線の形で放出し安定な状態に戻ろうとする。このときに放出されるエネルギーのために材料の温度が低下する。   The heat radiation organic resin film provided on the chemical conversion film surface contains a heat radiation filler. The thermal radiation filler is composed of at least one selected from titanium oxide, carbon black, graphite, and carbon fiber. Particularly preferred are carbon black and graphite from the viewpoint of thermal radiation. The thermal radiation filler is a substance that lowers the temperature of the material by a heat radiation mechanism called “thermal radiation” different from “thermal conduction”. That is, when the heat-radiating filler absorbs heat and the temperature rises, the molecules and atoms constituting it become excited. However, since the excited state is unstable, molecules and atoms try to return to a stable state by releasing energy in the form of infrared rays. Due to the energy released at this time, the temperature of the material decreases.

前記熱放射性フィラーは、有機樹脂成分100に対して1〜20質量部添加する。添加量が1質量部未満の場合、熱放射性フィラーの絶対量が少なく放熱性が低下する。また、20質量部を超える場合、添加量を増加しても熱放射性のさらなる向上は見られないため
コストアップとなる。
The thermal radioactive filler is added in an amount of 1 to 20 parts by mass with respect to the organic resin component 100. When the addition amount is less than 1 part by mass, the absolute amount of the heat-radiating filler is small and the heat dissipation is reduced. Moreover, when it exceeds 20 mass parts, since the further improvement of thermal radiation property is not seen even if the addition amount is increased, it becomes a cost increase.

前記熱伝導性有機樹脂皮膜及び、前記熱放射性有機樹脂皮膜へ、加工性をさらに向上させる目的で、潤滑付与成分を添加しても良い。添加量としては、有機樹脂100質量部に対して30質量部以下であることが好ましい。潤滑性付与成分が30質量部を超えると耐溶剤性、ブロッキング性の低下や加工時の塗膜カスの発生などが起こり、電子機器用材料として好適でなくなる。この際に使用される潤滑付与剤の種類としては、ポリエチレンワックス等のオレフィン系ワックス、PTFE(ポリテトラフルオロエチレン)等のフッ素系樹脂、パラフィン系ワックス、マイクロクリスタリンワックス、ミツロウ、ラノリン、カルナバワックス等が挙げられる。   A lubricity imparting component may be added to the heat conductive organic resin film and the heat radiating organic resin film for the purpose of further improving processability. As addition amount, it is preferable that it is 30 mass parts or less with respect to 100 mass parts of organic resins. When the lubricity-imparting component exceeds 30 parts by mass, the solvent resistance and blocking properties are reduced, and coating film residue is generated during processing, which is not suitable as a material for electronic equipment. The types of lubricity-imparting agents used at this time include olefinic waxes such as polyethylene wax, fluororesins such as PTFE (polytetrafluoroethylene), paraffinic wax, microcrystalline wax, beeswax, lanolin, carnauba wax, etc. Is mentioned.

前記熱伝導性有機樹脂皮膜及び、前記熱放射性有機樹脂皮膜へ、塗装性及びプレコート材としての一般性能を確保するために通常の塗料に使用される、溶剤、ツヤ消し剤、レベリング剤、顔料分散剤、ワキ防止剤等を適宜含有させても良い。   Solvent, matting agent, leveling agent, pigment dispersion used in ordinary paints to ensure the paintability and general performance as a precoat material to the heat conductive organic resin film and the heat radiation organic resin film An agent, an anti-bacterial agent, and the like may be appropriately contained.

以下に、本発明を実施例により詳細に説明する。アルミニウム板(材質:JIS A5052、板厚:0.5mm)に対し、市販のアルミニウム用脱脂剤にて脱脂処理を行い、水洗後、市販のリン酸クロメート処理液にて下地処理を行い、その上に表1に示す条件で塗料をロールコーターで両面に塗装し、PMT(最高到達板温度)200℃〜250℃にて焼付した。こうして図1に模式的に断面図を示す放熱塗装金属板を製造した。図中1は、熱伝導性有機樹脂皮膜、2は熱伝導性フィラー、3は化成皮膜、4はアルミニウム合金、5は熱放射性有機樹脂皮膜、6は熱放射性フィラー、7は放熱塗装金属板である。
得られた電子機器部品用放熱塗装金属板について下記の試験方法にて性能試験を行なった。
Hereinafter, the present invention will be described in detail with reference to examples. An aluminum plate (material: JIS A5052, plate thickness: 0.5 mm) is degreased with a commercially available aluminum degreasing agent, washed with water, and then treated with a commercially available phosphoric acid chromate treatment solution. The paint was applied on both sides with a roll coater under the conditions shown in Table 1, and baked at a PMT (maximum plate temperature) of 200 ° C to 250 ° C. Thus, a heat-dissipation-coated metal plate schematically shown in FIG. 1 was manufactured. In the figure, 1 is a heat conductive organic resin film, 2 is a heat conductive filler, 3 is a chemical conversion film, 4 is an aluminum alloy, 5 is a heat radiation organic resin film, 6 is a heat radiation filler, and 7 is a heat-dissipation coated metal plate. is there.
The obtained heat-dissipation-coated metal plate for electronic device parts was subjected to a performance test by the following test method.

放熱性は放熱塗装金属板の電子部品からの放熱能力を確認する評価方法である。下記の方法で10分後のパワートランジスタ温度を測定し、比較品との温度低下差を、◎:25℃以上、○:15℃以上〜25℃未満、△:5℃以上15℃未満、×:5℃未満で効果なく使用不可、の基準で評価した。なお、比較品は従来の放熱板を想定し上記実施例に用いたアルミニウム板に市販の熱伝導性シートを貼りつけて作製した。得られた放熱塗装金属板と比較品を30mm×30mmに切断し、図2に示したように支持体で直立させたパワートランジスタに取り付け、該電子部品に印加電力4Wを負荷して発熱させ、一定印加電力での10分後の温度を測定した。図中1は、熱伝導性有機樹脂皮膜、2は熱伝導性フィラー、3は化成皮膜、4はアルミニウム合金、5は熱放射性有機樹脂皮膜、6は熱放射性フィラー、7は放熱塗装金属板、8はパワートランジスタ、9は熱電対である。   The heat dissipation is an evaluation method for confirming the heat dissipation capability from the electronic parts of the heat-dissipated coated metal plate. The temperature of the power transistor after 10 minutes was measured by the following method, and the temperature drop difference from the comparative product was ◎: 25 ° C. or more, ○: 15 ° C. or more to less than 25 ° C., Δ: 5 ° C. or more to less than 15 ° C., × : Evaluation was made based on the standard of less than 5 ° C. and no effect. In addition, the comparative product assumed the conventional heat sink, and produced it by sticking a commercially available heat conductive sheet on the aluminum plate used for the said Example. The obtained heat-dissipation-coated metal plate and a comparative product were cut into 30 mm × 30 mm, attached to a power transistor upright with a support as shown in FIG. 2, and the electronic component was heated by applying an applied power of 4 W, The temperature after 10 minutes with a constant applied power was measured. In the figure, 1 is a heat conductive organic resin film, 2 is a heat conductive filler, 3 is a chemical conversion film, 4 is an aluminum alloy, 5 is a heat radiation organic resin film, 6 is a heat radiation filler, 7 is a heat-dissipation coated metal plate, 8 is a power transistor and 9 is a thermocouple.

曲げ加工性は熱伝導性有機樹脂皮膜面を外側にして180度3T曲げを行い、樹脂皮膜層の割れを目視で観察し、◎:塗膜の割れなし、○:非常に軽微な塗膜の割れあるが良好、△:小さな塗膜の割れあるが使用可能、×:大きな塗膜割れあり使用不可、の基準で評価した。
更に、割れ観察後、曲げ部にセロハンテープを密着させ、テープを急激に剥離した際の塗膜の剥れ具合を観察するテープ試験を行い、○:剥離なし、△:軽微の剥離あるが使用可能、×:剥離あり使用不可の基準で評価した。
得られた性能試験結果を表1に示す。

Figure 2009136848
Bending workability is 180 degree 3T bending with the heat conductive organic resin film surface outside, and the crack of the resin film layer is visually observed, ◎: No crack of coating film, ○: Very slight coating film Evaluation was made based on the criteria of cracking but good, Δ: cracking of a small coating film can be used, and x: not being usable with cracking of a large coating film.
Furthermore, after the crack was observed, a cellophane tape was adhered to the bent part, and a tape test was conducted to observe the degree of peeling of the coating film when the tape was peeled off rapidly. ○: No peeling, Δ: Minor peeling Possible, x: Evaluation was made based on the criteria for use with peeling.
The obtained performance test results are shown in Table 1.

Figure 2009136848

表1に示される結果から明らかなように、発明例No.1〜24は放熱性、曲げ加工性のいずれも良好である。
一方、比較例であるNo.25〜28、放熱性、曲げ加工性のいずれかが劣り、電子機器用放熱塗装金属板としては不適当である。すなわち、No.25は、熱伝導性有機樹脂皮膜の膜厚が薄く、熱伝導性フィラーが脱落し、曲げ加工性が劣る。No.26は、熱伝導性有機樹脂皮膜の膜厚が厚く、熱抵抗が大きくなり放熱性が劣り、曲げ加工性も劣る。No.27は、熱伝導性有機樹脂皮膜中の熱伝導性フィラーの絶対量が少ないため放熱性が劣る。No.28は、熱伝導性有機樹脂皮膜中の熱伝導性フィラーの絶対量が多いため曲げ加工性が劣る。
As is apparent from the results shown in Table 1, Invention Example No. As for 1-24, both heat dissipation and bending workability are favorable.
On the other hand, No. which is a comparative example. Any one of 25-28, heat dissipation, and bending workability is inferior, and it is unsuitable as a heat-radiation coating metal plate for electronic devices. That is, no. No. 25 has a thin film of the heat conductive organic resin film, the heat conductive filler falls off, and the bending workability is inferior. No. No. 26 has a thick thermally conductive organic resin film, a large thermal resistance, poor heat dissipation, and poor bending workability. No. No. 27 is inferior in heat dissipation because the absolute amount of the thermally conductive filler in the thermally conductive organic resin film is small. No. No. 28 is inferior in bending workability because the absolute amount of the heat conductive filler in the heat conductive organic resin film is large.

本発明の放熱塗装金属板を模式的に示す断面図である。It is sectional drawing which shows typically the thermal radiation coating metal plate of this invention. 本発明の放熱塗装金属板を使用した放熱性を評価する装置を模式 的に示す断面図である。It is sectional drawing which shows typically the apparatus which evaluates the heat dissipation using the heat-radiation coating metal plate of this invention.

符号の説明Explanation of symbols

1 熱伝導性有機樹脂皮膜
2 熱伝導性フィラー
3 化成皮膜
4 アルミニウム合金
5 熱放射性有機樹脂皮膜
6 熱放射性フィラー
7 放熱塗装金属板
8 パワートランジスタ
9 熱電対
DESCRIPTION OF SYMBOLS 1 Thermal conductive organic resin film 2 Thermal conductive filler 3 Chemical conversion film 4 Aluminum alloy 5 Thermal radiation organic resin film 6 Thermal radiation filler 7 Heat-dissipation coating metal plate 8 Power transistor 9 Thermocouple

Claims (5)

金属板の表面に化成皮膜を形成し、該化成皮膜表面の一部に、熱伝導性フィラーを5〜80vol%含有し、膜厚1〜50μmとなる熱伝導性有機樹脂皮膜を設け、さらに、該化成皮膜表面の一部に、熱放射性フィラーを含有する熱放射性有機樹脂皮膜を設けたことを特徴とする、放熱塗装金属板。 A chemical conversion film is formed on the surface of the metal plate, and a part of the chemical conversion film surface is provided with a heat conductive organic resin film containing 5 to 80 vol% of a heat conductive filler and having a film thickness of 1 to 50 μm. A heat-dissipating coated metal sheet, characterized in that a heat-radiating organic resin film containing a heat-radiating filler is provided on a part of the chemical film surface. 熱伝導性有機樹脂皮膜の表面粗さ(Ra)が、1μm以下であることを特徴とする、請求項1の放熱塗装金属板。 The heat-dissipating coated metal sheet according to claim 1, wherein the heat conductive organic resin film has a surface roughness (Ra) of 1 µm or less. 熱伝導性有機樹脂皮膜のガラス転移温度(Tg)が、60℃以下であることを特徴とする、請求項1の放熱金属板。 The heat-dissipating metal plate according to claim 1, wherein a glass transition temperature (Tg) of the thermally conductive organic resin film is 60 ° C or lower. 熱伝導性有機樹脂皮膜に、窒化ホウ素、窒化アルミ、窒化ケイ素、炭化ケイ素、アルミナ、ジルコニア、水酸化マグネシウム、水酸化アルミニウムからなる熱伝導性フィラーのうち、1種以上を含有することを特徴とする、請求項1の放熱塗装金属板。 The heat conductive organic resin film contains at least one of heat conductive fillers composed of boron nitride, aluminum nitride, silicon nitride, silicon carbide, alumina, zirconia, magnesium hydroxide, and aluminum hydroxide. The heat dissipating coated metal plate according to claim 1. 熱放射性有機樹脂皮膜に、酸化チタン、カーボンブラック、黒鉛、炭素繊維からなる熱放射性フィラーのうち、1種以上を含有することを特徴とする、請求項1の放熱塗装金属板。 The heat-radiating coated metal sheet according to claim 1, wherein the heat-radiating organic resin film contains at least one of heat-radiating fillers composed of titanium oxide, carbon black, graphite, and carbon fibers.
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