JP2008288075A - Method of manufacturing display device, and display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device which can improve a display quality by promoting a complete removal of a portion formed on an auxiliary electrode of an organic layer, and to provide a display device. <P>SOLUTION: A portion formed on an auxiliary electrode 14 of the first organic layer 16A and a second organic layer 16B is removed selectively by irradiating a laser beam LB on a first organic layer 16A. When the laser beam LB is irradiated, the first organic layer 16A sublimates and adhesiveness between the auxiliary electrode 14 and the first organic layer 16A is reduced remarkably, the second organic layer 16B formed on the first organic layer 16A is removed together with the first organic layer 16A. The first organic layer 16A is preferably composed of a material of a lower melting point than that of the auxiliary electrode 14, and is preferably composed of a sublimating material, namely, a material which sublimates by a laser beam irradiation. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a display device including an organic light emitting element and the display device.

  As this type of display device, for example, as shown in FIG. 20, a first electrode 813 is formed on a substrate 811 for each organic light emitting element, and an organic layer 816 including a light emitting layer and a second electrode are formed thereon. The thing which laminated | stacked 817 in order is known. Here, since the second electrode 817 is a thin film-like common electrode, the resistance value is high, and the voltage drop differs depending on the distance from the power source (not shown) to each organic light emitting element, thereby causing the luminance in the screen. There is a risk of variation. In order to suppress such variation in luminance, a relatively thick auxiliary electrode 814 may be provided in a region between the first electrodes 813, and the auxiliary electrode 814 and the second electrode 817 may be electrically connected. is there.

  In order to electrically connect the second electrode 817 and the auxiliary electrode 814, it is necessary to remove the portion formed on the auxiliary electrode 814 of the organic layer 816 before forming the second electrode 817. . The organic layer 816 may be formed only on the first electrode 813 using a mask or the like, or may be formed on almost the entire display area of the substrate 810. In either case, the auxiliary electrode 814 is formed. This is because the organic layer 816 may be covered.

Conventionally, for example, Patent Document 1 describes that a light absorption layer is provided on an auxiliary electrode, laser light is thermally converted by this light absorption layer, and a portion formed on the auxiliary electrode of the organic layer is collectively removed. Yes.
JP 2007-52966 A

  However, depending on the material of the organic layer in contact with the auxiliary electrode, the adhesion between the auxiliary electrode and the organic layer may be strong, or the organic layer may contain a material having a high melting point. Could occur. Further, when the organic layer is thick, there is a possibility that unremoved residue is generated. As a result, there is a problem that the electrical connection between the auxiliary electrode and the second electrode is deteriorated and the display quality is remarkably deteriorated.

  In such a case, a strong laser intensity is required to prevent the removal residue. However, when the laser intensity is increased, there is a problem that the auxiliary electrode itself is damaged, or the heat at the time of laser irradiation becomes too high, causing the adjacent element to be damaged and the characteristics of the organic light emitting element to deteriorate. .

  The present invention has been made in view of such a problem, and an object thereof is to promote the complete removal of the portion formed on the auxiliary electrode of the organic layer, and to improve the display quality and the display device manufacturing method. It is to provide a display device.

The manufacturing method of the display apparatus by this invention manufactures the display apparatus which has a some organic light emitting element in a board | substrate, Comprising: The process of the following (A)-(E) is included.
(A) Forming a plurality of first electrodes, an auxiliary electrode in a region between the plurality of first electrodes, and an insulating film in a region between the plurality of first electrodes and the auxiliary electrode on the substrate (B) Step (C) of forming a first organic layer covering the auxiliary electrode (D) Step of forming a second organic layer including the light emitting layer and covering the plurality of first electrodes, the insulating film, and the first organic layer (D) (E) a step of selectively removing a portion formed on the auxiliary electrode of the first organic layer and the second organic layer by irradiating the first organic layer with laser light; Forming a second electrode on the auxiliary electrode;

  In the display device manufacturing method of the present invention, since the first organic layer is provided between the auxiliary electrode and the second organic layer, when the laser beam is irradiated, the first organic layer is sublimated to assist The adhesion between the electrode and the first organic layer is greatly reduced. Therefore, the second organic layer formed on the first organic layer is removed together with the removal of the first organic layer. Thus, the first organic layer serves to facilitate complete removal of the second organic layer.

The display device according to the present invention has a plurality of organic light-emitting elements on a substrate and has the following constituents (A) to (E).
(A) A plurality of first electrodes provided on the substrate (B) An auxiliary electrode provided in a region between the plurality of first electrodes (C) Provided in a region between the plurality of first electrodes and the auxiliary electrode Insulating film (D) includes a light emitting layer, covers the plurality of first electrodes and the insulating film, and has a thickness D1 formed on the plurality of first electrodes, and a thickness D2 formed on the insulating film. Is an organic layer satisfying D1 <D2 (E) Second electrode provided on the organic layer and the auxiliary electrode

  According to the method for manufacturing a display device of the present invention, after forming the first organic layer covering the auxiliary electrode and the insulating film, the first organic layer covering the plurality of first electrodes, the insulating film, and the first organic layer is formed. Forming the second organic layer and irradiating the first organic layer with laser light to selectively remove the portion formed on the auxiliary electrode of the first organic layer and the second organic layer. Therefore, the first organic layer can promote complete removal of the portion formed on the auxiliary electrode of the second organic layer. According to the method for manufacturing a display device of the present invention, the display device of the present invention can be easily manufactured, and the display quality can be improved.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 shows a configuration of a display device according to an embodiment of the present invention. This display device is used as an ultra-thin organic light emitting color display device. For example, a plurality of organic light emitting elements 10R, 10G, and 10B described later are arranged in a matrix on a substrate 11 made of glass. And a signal line driving circuit 120 and a scanning line driving circuit 130, which are drivers for displaying images, are formed around the display area 110.

  A pixel drive circuit 140 is formed in the display area 110. FIG. 2 illustrates an example of the pixel driving circuit 140. The pixel driving circuit 140 is formed below the first electrode 15 described later, and includes a driving transistor Tr1 and a writing transistor Tr2, a capacitor (holding capacitor) Cs therebetween, a first power supply line (Vcc), and a second power source line (Vcc). This is an active drive circuit having an organic light emitting element 10R (or 10G, 10B) connected in series to the drive transistor Tr1 between power supply lines (GND). The driving transistor Tr1 and the writing transistor Tr2 are configured by a general thin film transistor (TFT (Thin Film Transistor)), and the configuration may be, for example, an inverted staggered structure (so-called bottom gate type) or a staggered structure (top gate type). There is no particular limitation.

  In the pixel driving circuit 140, a plurality of signal lines 120A are arranged in the column direction, and a plurality of scanning lines 130A are arranged in the row direction. An intersection between each signal line 120A and each scanning line 130A corresponds to one of the organic light emitting elements 10R, 10G, and 10B (sub pixel). Each signal line 120A is connected to the signal line drive circuit 120, and an image signal is supplied from the signal line drive circuit 120 to the source electrode of the write transistor Tr2 via the signal line 120A. Each scanning line 130A is connected to the scanning line driving circuit 130, and a scanning signal is sequentially supplied from the scanning line driving circuit 130 to the gate electrode of the writing transistor Tr2 via the scanning line 130A.

  FIG. 3 illustrates an example of a planar configuration of the display area 110. In the display area 110, an organic light emitting element 10R that generates red light, an organic light emitting element 10G that generates green light, and an organic light emitting element 10B that generates blue light are sequentially formed in a matrix. Has been. The organic light emitting elements 10R, 10G, and 10B have a rectangular planar shape, and a combination of adjacent organic light emitting elements 10R, 10G, and 10B constitutes one pixel.

  FIG. 4 illustrates a cross-sectional configuration of the organic light emitting devices 10R, 10G, and 10B illustrated in FIG. The organic light emitting devices 10R, 10G, and 10B are respectively arranged from the substrate 11 side from the driving transistor Tr1 of the pixel driving circuit 140, the planarization insulating film 12, the first electrode 13 as the anode, the auxiliary electrode 14, and the insulating film 15. The organic layer 16 including a light emitting layer, which will be described later, and the second electrode 17 as a cathode are stacked in this order.

  Such organic light emitting devices 10R, 10G, and 10B are covered with a protective film (not shown) such as silicon nitride (SiN) or silicon oxide (SiO) as necessary, and further, a thermal film is formed on the protective film. A sealing substrate (not shown) made of glass or the like is bonded across the entire surface with an adhesive layer (not shown) such as a curable resin or an ultraviolet curable resin in between.

  The drive transistor Tr1 is electrically connected to the first electrode 13 through a connection hole 12A provided in the planarization insulating film 12.

The planarization insulating film 12 is for planarizing the surface of the substrate 11 on which the pixel driving circuit 140 is formed, and is formed of a material having a high pattern accuracy because a fine connection hole 12A is formed. Is preferred. Examples of the constituent material of the planarization insulating film 12 include an organic material such as polyimide or an inorganic material such as silicon oxide (SiO ₂ ).

  The first electrode 13 is formed corresponding to each of the organic light emitting elements 10R, 10G, and 10B. In addition, the first electrode 13 has a function as a reflective electrode that reflects light generated in the light emitting layer, and it is desirable that the first electrode 13 has a reflectance as high as possible in order to increase the light emission efficiency. For example, the first electrode 13 has a thickness of 100 nm or more and 1000 nm or less, and is silver (Ag), aluminum (Al), chromium (Cr), titanium (Ti), iron (Fe), cobalt (Co), nickel (Ni ), Molybdenum (Mo), copper (Cu), tantalum (Ta), tungsten (W), platinum (Pt), gold (Au), or the like.

  The auxiliary electrode 14 prevents a large difference in voltage drop depending on the distance from the power source (not shown) to the individual organic light emitting devices 10R, 10G, and 10B, thereby suppressing variations in luminance within the screen. It is formed in a region between the first electrodes 13. The auxiliary electrode 14 is electrically insulated from the first electrode 13 by the insulating film 15 and is electrically connected to the second electrode 17. That is, the upper surface of the auxiliary electrode 14 is not covered with the organic layer 16, and this exposed portion serves as a contact region with the second electrode 17. The auxiliary electrode 14 is desirably electrically connected to the second electrode 17 on the entire upper surface, but may be electrically connected to the second electrode 17 on at least a part of the upper surface.

  The auxiliary electrode 14 is made of, for example, silver (Ag), aluminum (Al), chromium (Cr), titanium (Ti), iron (Fe), cobalt (Co), nickel (Ni), molybdenum (Mo), copper (Cu ), Tantalum (Ta), tungsten (W), platinum (Pt), gold (Au), or the like. The auxiliary electrode 14 may be made of the same material as the first electrode 13 or may be made of a different material. Further, it is desirable that the auxiliary electrode 14 is made of a material having high absorbability with respect to laser light to be described later.

The insulating film 15 is formed in a region between the first electrode 13 and the auxiliary electrode 14 to ensure insulation between the first electrode 13, the auxiliary electrode 14, and the second electrode 17 and to accurately set a light emitting region. It has a function as an interelectrode insulating film for forming a shape. The insulating film 15 is made of, for example, an organic material such as polyimide or an inorganic insulating material such as silicon oxide (SiO ₂ ), and has an opening corresponding to the light emitting region of the first electrode 13 and the auxiliary electrode 14. is doing. The organic layer 16 and the second electrode 17 may be continuously provided not only on the light emitting region but also on the insulating film 15, but light emission occurs corresponding to the first electrode 13 of the insulating film 15. It is only an opening to be made.

  The organic layer 16 covers the first electrode 13 and the insulating film 15, and the thickness D1 of the portion formed on the first electrode 13 and the thickness D2 of the portion formed on the insulating film 15 satisfy D1 <D2. Satisfies. As will be described later, the organic layer 16 includes a light emitting layer and a first electrode 13, the insulating film 15, and the first organic layer after forming the first organic layer 16 </ b> A covering the auxiliary electrode 14 and the insulating film 15. A second organic layer 16B covering 16A is formed, and the first organic layer 16A is irradiated with laser light, thereby being formed on the auxiliary electrode 14 of the first organic layer 16A and the second organic layer 16B. This is formed by selectively removing the portions. Since the portion formed on the insulating film 15 of the first organic layer 16A remains after the laser light irradiation, the thickness D2 of the portion formed on the insulating film 15 of the organic layer 16 remains. The thickness of the portion formed on the first electrode 13 is larger than the thickness D1 of the first organic layer 16A. Further, a step 16C is generated at the end of the first organic layer 16A due to the remaining first organic layer 16A.

  The first organic layer 16A is a peeling auxiliary layer for facilitating removal of the portions formed on the auxiliary electrode 14 of the first organic layer 16A and the second organic layer 16B when the laser beam is irradiated. It has the function as. For this purpose, the first organic layer 16 </ b> A is preferably made of a material having a melting point lower than that of the auxiliary electrode 14. This is because the energy of the laser beam can be lowered and damage to the auxiliary electrode 14 or the adjacent element can be suppressed. The first organic layer 16A is preferably made of a sublimable material, that is, a material that sublimes when irradiated with laser light. This is because the laser beam is not melted by irradiation and contamination of adjacent elements can be suppressed.

The first organic layer 16A has, for example, a thickness of 5 nm to 100 nm and is made of a sublimable dye or 8≡hydroxyquinoline aluminum (Alq ₃ ). Since these materials do not have a function as a hole injection layer or a hole transport layer, the first organic layer 16A is limited to a region other than the first electrode 13, for example, the auxiliary electrode 14 and the insulating film 15A. It is preferable that it is formed so as to cover.

  The second organic layer 16B covers the first electrode 13, the insulating film 15, and the first organic layer 16B. For example, in order from the first electrode 13 side, a hole injection layer, a hole transport layer, a light emitting layer, and Although it has the structure which laminated | stacked the electron carrying layer (all are not shown), what is necessary is just to provide layers other than a light emitting layer among these as needed. Further, the second organic layer 16B may have a different configuration depending on the emission color of the organic light emitting elements 10R, 10G, and 10B. The hole injection layer is a buffer layer for improving hole injection efficiency and preventing leakage. The hole transport layer is for increasing the efficiency of transporting holes to the light emitting layer. In the light emitting layer, recombination of electrons and holes occurs when an electric field is applied to generate light. The electron transport layer is for increasing the efficiency of electron transport to the light emitting layer. The second organic layer 16B is desirably made of a material having a high transmittance with respect to the laser beam so that the laser beam sufficiently reaches the first organic layer 16A in a manufacturing process described later. However, since the second organic layer 16B sufficiently transmits laser light as long as it is a normal use film thickness, it is not necessary to be limited to a material having a particularly high transmittance with respect to the laser light.

As a constituent material of the hole injection layer of the organic light emitting device 10R, for example, 4,4 ′, 4 ″ -tris (3-methylphenylphenylamino) triphenylamine (m-MTDATA) or 4,4 ′, 4 ″ is used. -Tris (2-naphthylphenylamino) triphenylamine (2-TNATA) is exemplified, and the constituent material of the hole transport layer of the organic light emitting device 10R is, for example, bis [(N-naphthyl) -N-phenyl]. Benzidine (α-NPD) is exemplified, and examples of the constituent material of the light emitting layer of the organic light emitting device 10R include 9,10-di- (2-naphthyl) anthracene (ADN) and 2,6≡bis [4′≡. Methoxydiphenylamino) styryl] ≡1,5≡dicyanonaphthalene (BSN) mixed at 30% by weight, and constituent material of the electron transport layer of the organic light emitting device 10R The, for example, Alq _3.

Examples of the constituent material of the hole injection layer of the organic light emitting element 10G include m-MTDATA or 2-TNATA. Examples of the constituent material of the hole transport layer of the organic light emitting element 10G include α-NPD. As a constituent material of the light emitting layer of the organic light emitting element 10G, for example, a material in which 5% by volume of Coumarin 6 is mixed with ADN can be used. As a constituent material of the electron transport layer of the organic light emitting element 10G, for example, , it includes Alq _3.

Examples of the constituent material of the hole injection layer of the organic light emitting element 10B include m-MTDATA or 2-TNATA. Examples of the constituent material of the hole transport layer of the organic light emitting element 10B include α-NPD. As a constituent material of the light emitting layer of the organic light emitting device 10B, for example, 4,4′≡bis [2≡ {4≡ (N, N≡diphenylamino) phenyl} vinyl] biphenyl (DPAVBi) is added to ADN. Examples of the constituent material of the electron transport layer of the organic light emitting device 10B include Alq ₃ .

  For example, the second electrode 17 has a thickness of 5 nm or more and 50 nm or less, and is made of a simple substance or an alloy of a metal element such as aluminum (Al), magnesium (Mg), calcium (Ca), or sodium (Na). Among these, an alloy of magnesium and silver (MgAg alloy) or an alloy of aluminum (Al) and lithium (Li) (AlLi alloy) is preferable. The second electrode 17 may be made of ITO (indium / tin composite oxide) or IZO (indium / zinc composite oxide).

  This display device can be manufactured, for example, as follows.

  5 to 10 show the manufacturing method of this display device in the order of steps. First, as shown in FIG. 5, a substrate 11 made of the above-described material is prepared, a pixel driving circuit 140 including a driving transistor Tr <b> 1 is formed on the substrate 11, and then a photosensitive resin is applied to the entire surface. Then, the planarizing insulating film 12 is formed by patterning, and the planarizing insulating film 12 is patterned into a predetermined shape by exposure and development, and a connection hole 12A is formed and baked.

  Next, as shown in FIG. 5 also, the first electrode 13 made of the above-described material is formed by, for example, sputtering, and formed into a predetermined shape by, for example, etching. Further, the auxiliary electrode 14 described above is formed by, for example, sputtering, and is formed into a predetermined shape by, for example, etching. The first electrode 13 and the auxiliary electrode 14 may be formed by film formation and etching in the same process. Further, the auxiliary electrode 14 may be formed by a film different from the first electrode 13 and formed by etching in a separate process.

  Subsequently, similarly as shown in FIG. 5, the insulating film 15 made of the above-described material is formed by, for example, photolithography. At this time, an opening is provided corresponding to the light emitting region of the first electrode 13 and the auxiliary electrode 14.

After that, as shown in FIG. 6, the first organic layer 16A made of the above-described sublimable dye or Alq ₃ is formed. Since the sublimable dye or Alq ₃ does not have a hole injecting property and a hole transporting property, a printing method, an ink jet method, a transfer method, a vapor deposition method using a separate mask, or the like is used as a film forming method. The organic layer 16 </ b> A is formed on the auxiliary electrode 14 and the insulating film 15 while avoiding the first electrode 13.

  After the formation of the first organic layer 16A, as shown in FIG. 7, a general process such as a vapor deposition method, a CVD (Chemical Vapor Deposition) method, a printing method, an ink jet method or a transfer method is used. A second organic layer 16B that covers the first electrode 13 and the auxiliary electrode 14 is formed by a film method. The second organic layer 16B does not necessarily have to be formed so as to cover the entire surface of the substrate 11, and may be formed as a pattern for each of the organic light emitting elements 10R, 10G, and 10B. However, since the second organic layer 16B needs to completely cover the upper surface of the first electrode 13, even if the second organic layer 16B is patterned, the second organic layer 16B is an insulating film. 15 and the auxiliary electrode 14.

  After forming the second organic layer 16B, as shown in FIG. 8, the first organic layer 16A is irradiated with the laser beam LB, thereby forming the first organic layer 16A and the second organic layer 16B. The portion formed on the auxiliary electrode 14 is selectively removed to expose the auxiliary electrode 14 as shown in FIG.

  At this time, since the first organic layer 16A is provided between the auxiliary electrode 14 and the second organic layer 16B, the first organic layer 16A sublimates when irradiated with the laser beam LB, The adhesion between the auxiliary electrode 14 and the first organic layer 16A is greatly reduced. Therefore, along with the removal of the first organic layer 16A, the second organic layer 16B formed on the first organic layer 16A is also removed together. Thus, the first organic layer 16A helps to promote complete removal of the second organic layer 16B. Therefore, even when the second organic layer 16B includes a layer having strong adhesion to the auxiliary electrode 14 or a layer made of a material having a high melting point, the first organic layer 16A and the second organic layer 16B The layer 16B is reliably removed, and the remaining removal is prevented. Further, even when the thickness of the second organic layer 16B is thick, the removal residue is prevented.

  Further, since it is not necessary to increase the energy of the laser beam LB in order to prevent the removal residue, the auxiliary electrode 14 itself is not damaged by the irradiation of the laser beam LB, and the adjacent element is thermally damaged. It is possible to suppress the deterioration of the characteristics of the organic light emitting elements 10R, 10G, and 10B.

  Furthermore, since the second organic layer 16B is removed from the auxiliary electrode 14 together with the first organic layer 16A made of a material that sublimes when irradiated with the laser beam LB, the generation of scattered matter and the organic light emitting elements 10R and 10G are eliminated. , 10B is prevented from being reattached, leading to a high yield.

  As a method of irradiating the laser beam LB, when a laser irradiation apparatus (not shown) has a precise alignment mechanism, a part or all of the auxiliary electrode 14 is selectively irradiated with the laser beam LB to assist the laser beam LB. A state is formed in which the surface of the electrode 14 is exposed from the first organic layer 16A and the second organic layer 16B.

  On the other hand, when the laser irradiation apparatus (not shown) does not have a precise alignment mechanism, a mask (not shown) having an opening corresponding to the region irradiated with the laser beam LB is used on the substrate 11 in advance. The position of the first organic layer 16A and the opening of the mask are preferably overlapped with high accuracy. This is because there is no need to irradiate the laser beam LB with high accuracy, and the laser beam LB can be irradiated in a lump.

  Although the step of irradiating the laser beam LB can be performed in the air, it is preferable to perform it in a vacuum atmosphere in order to maintain device characteristics.

  After selectively removing the portions of the first organic layer 16A and the second organic layer 16B formed on the auxiliary electrode 14, as shown in FIG. 10, for example, a vapor deposition method, a sputtering method, or a CVD method. Thus, the second electrode 17 is formed on the second organic layer 16 </ b> B and the auxiliary electrode 14. Thereby, the auxiliary electrode 14 and the second electrode 17 are electrically connected at the exposed portion of the auxiliary electrode 14. After that, a protective film made of the above-described material is formed on the second electrode 17 as necessary, for example, by vapor deposition, sputtering, or CVD, and an adhesive layer is placed on the protective film. A sealing substrate is bonded together. Thus, the display device shown in FIG. 1 is completed.

  In this display device, a scanning signal is supplied to each pixel from the scanning line driving circuit 130 via the gate electrode of the writing transistor Tr2, and an image signal is supplied from the signal line driving circuit 120 via the writing transistor Tr2. Held in Cs. That is, the driving transistor Tr1 is controlled to be turned on / off in accordance with the signal held in the holding capacitor Cs, whereby the driving current Id is injected into each of the organic light emitting elements 10R, 10G, and 10B, so that holes, electrons, Recombine to emit light. This light is extracted through the second electrode 17, the protective film, and the sealing substrate. Here, in the manufacturing process, after forming the first organic layer 16A covering the auxiliary electrode 14 and the insulating film 15, the second organic layer 16B covering the first electrode 13, the insulating film 15 and the first organic layer 16A. Since the first organic layer 16A is irradiated with the laser beam LB, the portions of the first organic layer 16A and the second organic layer 16B formed on the auxiliary electrode 14 are removed. The remaining removal is reduced, and the electrical connection between the auxiliary electrode 14 and the second electrode 17 is good. Therefore, the current supplied from the power source (not shown) does not cause a large difference in voltage drop and flows to each of the organic light emitting elements 10R, 10G, and 10B through the auxiliary electrode 14, and as a result, uniform luminance over the entire screen. Is displayed.

  Thus, according to the present embodiment, after forming the first organic layer 16A covering the auxiliary electrode 14 and the insulating film 15, the second electrode covering the first electrode 13, the insulating film 15 and the first organic layer 16A. The portion formed on the auxiliary electrode 14 of the first organic layer 16A and the second organic layer 16B is selected by forming the organic layer 16B and irradiating the first organic layer 16A with the laser beam LB. Therefore, the first organic layer 16A can promote complete removal of the portion formed on the auxiliary electrode 14 of the second organic layer 16B. Therefore, according to this display device manufacturing method, the display device of the present embodiment can be easily manufactured, and the display quality can be improved.

In the above embodiment, the first organic layer 16A is made of a material that does not have a hole injection property and a hole transport property, for example, a sublimation dye or Alq _3, and is limited to a region other than the first electrode 13. The case where it is formed is described. However, the first organic layer 16A may be a layer having a function as a hole injection layer or a hole transport layer. Examples of such a material include α-NPD used for a hole transport layer. In this case, as shown in FIG. 11, the first organic layer 16 </ b> A can be formed on the first electrode 13 and the auxiliary electrode 14 by evaporation, and is formed on the first electrode 13. The portion formed on the auxiliary electrode 14 functions as a hole transport layer, and the portion formed on the auxiliary electrode 14 functions as a peeling assist layer. Further, it is not necessary to form the first organic layer 16 </ b> A in a region other than the first electrode 13, and the step of coating the organic layer between the first electrode 13 and the auxiliary electrode 14 is not necessary, and the film formation process Can be simplified. In this case, the hole injection layer or the hole transport layer of the second organic layer 16B may be omitted, or may be formed again separately from the first organic layer 16A.

  Further, in the above embodiment, the case where the first organic layer 16A is formed so as to cover the entire upper surface of the auxiliary electrode 14 and the insulating film 15 has been described. However, as shown in FIG. The organic layer 16 </ b> A may be formed on a part of the upper surface of the auxiliary electrode 14.

  In the above embodiment, the case where the first electrode 13 and the auxiliary electrode 14 are formed on the planarization insulating film 12 has been described. However, as shown in FIG. Similarly to the pixel driving circuit 140 including the pixel driving circuit 140, the pixel driving circuit 140 may be formed on the substrate 11 and connected to the second electrode 17 through a connection hole 12 </ b> B provided in the planarization insulating film 12.

(Modules and application examples)
Hereinafter, application examples of the display device described in the above embodiment will be described. The display device according to the above embodiment is an image signal that is input from the outside or is generated internally, such as a television device, a digital camera, a notebook personal computer, a mobile terminal device such as a mobile phone, or a video camera. Alternatively, the present invention can be applied to display devices for electronic devices in various fields that display images.

(module)
The display device according to the above-described embodiment is incorporated into various electronic devices such as application examples 1 to 5 described later, for example, as a module illustrated in FIG. In this module, for example, a region 210 exposed from the sealing substrate 30 and the adhesive layer 20 is provided on one side of the substrate 11, and wirings of the signal line driving circuit 120 and the scanning line driving circuit 130 are provided in the exposed region 210. An external connection terminal (not shown) is formed by extending. The external connection terminal may be provided with a flexible printed circuit (FPC) 220 for signal input / output.

(Application example 1)
FIG. 15 illustrates an appearance of a television device to which the display device of the above embodiment is applied. This television apparatus has, for example, a video display screen unit 300 including a front panel 310 and a filter glass 320, and the video display screen unit 300 is configured by the display device according to the above embodiment.

(Application example 2)
FIG. 16 shows the appearance of a digital camera to which the display device of the above embodiment is applied. The digital camera includes, for example, a flash light emitting unit 410, a display unit 420, a menu switch 430, and a shutter button 440, and the display unit 420 is configured by the display device according to the above embodiment. .

(Application example 3)
FIG. 17 illustrates the appearance of a notebook personal computer to which the display device of the above embodiment is applied. The notebook personal computer has, for example, a main body 510, a keyboard 520 for inputting characters and the like, and a display unit 530 for displaying an image. The display unit 530 is a display device according to the above embodiment. It is comprised by.

(Application example 4)
FIG. 18 shows the appearance of a video camera to which the display device of the above embodiment is applied. This video camera has, for example, a main body 610, a subject photographing lens 620 provided on the front side surface of the main body 610, a start / stop switch 630 at the time of photographing, and a display 640. Reference numeral 640 denotes the display device according to the above embodiment.

(Application example 5)
FIG. 19 illustrates an appearance of a mobile phone to which the display device of the above embodiment is applied. For example, the mobile phone is obtained by connecting an upper housing 710 and a lower housing 720 with a connecting portion (hinge portion) 730, and includes a display 740, a sub-display 750, a picture light 760, and a camera 770. Yes. The display 740 or the sub-display 750 is configured by the display device according to the above embodiment.

  While the present invention has been described with reference to the embodiment, the present invention is not limited to the above embodiment, and various modifications can be made. For example, the material and thickness of each layer described in the above embodiment, or the film formation method, film formation conditions, laser light irradiation conditions, and the like are not limited, and may be other materials and thicknesses, or other The film forming method, film forming conditions, and irradiation conditions may be used. For example, the first electrode 13 may be made of ITO or IZO (indium / zinc composite oxide). The first electrode 13 can also have a dielectric multilayer film.

  In addition, for example, in the above-described embodiment, the first electrode 13, the organic layer 16, and the second electrode 17 are sequentially stacked on the substrate 11 from the substrate 11 side, and light is emitted from the sealing substrate side. Although the case where it was made to take out was demonstrated, the lamination | stacking order was reversed and the 2nd electrode 17, the organic layer 16, and the 1st electrode 13 were laminated | stacked in order from the substrate 11 side on the board | substrate 11, and the board | substrate 11 side It is also possible to extract light from the light source.

  Furthermore, for example, in the above embodiment, the case where the first electrode 13 is an anode and the second electrode 17 is a cathode has been described. However, the anode and the cathode are reversed, and the first electrode 13 is the cathode and the second electrode. 17 may be an anode. Further, the first electrode 13 is a cathode, the second electrode 17 is an anode, and the second electrode 17, the organic layer 16, and the first electrode 13 are sequentially stacked on the substrate 11 from the substrate 11 side. It is also possible to extract light from the side.

In addition, in the above-described embodiment, the configuration of the organic light emitting elements 10R, 10G, and 10B has been specifically described. However, it is not necessary to include all layers, and other layers may be further included. Good. For example, between the first electrode 13 and the organic layer 16, chromium oxide (III) (Cr ₂ O ₃ ), ITO (Indium-Tin Oxide: mixed oxide film of indium (In) and tin (Sn)), etc. A hole injecting thin film layer may be provided.

  Furthermore, in the above-described embodiment, the case where the second electrode 17 is configured by a semi-transmissive electrode and light generated in the light emitting layer is extracted from the second electrode 17 side has been described. You may make it take out from the 13th side. In this case, it is desirable to increase the luminous efficiency so that the second electrode 17 has as high a reflectance as possible.

  In addition, in each of the above embodiments, the case of an active matrix display device has been described. However, the present invention can also be applied to a passive matrix display device. Furthermore, the configuration of the pixel driving circuit for active matrix driving is not limited to that described in each of the above embodiments, and a capacitor or a transistor may be added as necessary. In that case, a necessary driving circuit may be added in addition to the signal line driving circuit 120 and the scanning line driving circuit 130 described above in accordance with the change of the pixel driving circuit.

It is a figure showing the structure of the display apparatus which concerns on one embodiment of this invention. It is a figure showing an example of the pixel drive circuit shown in FIG. It is a top view showing the structure of the display area shown in FIG. It is sectional drawing showing the structure of the organic light emitting element shown in FIG. FIG. 2 is a cross-sectional view illustrating a method of manufacturing the display device illustrated in FIG. It is a figure for demonstrating an example of the process following FIG. It is a figure for demonstrating an example of the process following FIG. It is a figure for demonstrating an example of the process following FIG. It is a figure for demonstrating an example of the process following FIG. It is a figure for demonstrating an example of the process following FIG. It is sectional drawing showing the other structure of the organic light emitting element shown in FIG. It is sectional drawing showing the further another structure of the organic light emitting element shown in FIG. It is sectional drawing showing the further another structure of the organic light emitting element shown in FIG. It is a top view showing schematic structure of the module containing the display apparatus of the said embodiment. It is a perspective view showing the external appearance of the application example 1 of the display apparatus of the said embodiment. (A) is a perspective view showing the external appearance seen from the front side of the application example 2, (B) is a perspective view showing the external appearance seen from the back side. 12 is a perspective view illustrating an appearance of application example 3. FIG. 14 is a perspective view illustrating an appearance of application example 4. FIG. (A) is a front view of the application example 5 in an open state, (B) is a side view thereof, (C) is a front view in a closed state, (D) is a left side view, and (E) is a right side view, (F) is a top view and (G) is a bottom view. It is a top view showing the structure of the display apparatus which has the conventional organic light emitting element.

Explanation of symbols

  10R, 10G, 10B ... organic light emitting element, 11 ... substrate, 12 ... flattened insulating film, 13 ... first electrode, 14 ... auxiliary electrode, 15 ... insulating film, 16 ... organic layer, 17 ... second electrode

Claims (8)

A manufacturing method of a display device having a plurality of organic light emitting elements on a substrate,
Forming a plurality of first electrodes, an auxiliary electrode in a region between the plurality of first electrodes, and an insulating film in a region between the plurality of first electrodes and the auxiliary electrode on a substrate;
Forming a first organic layer covering the auxiliary electrode;
Forming a second organic layer including a light emitting layer and covering the plurality of first electrodes, the insulating film, and the first organic layer;
Irradiating the first organic layer with laser light to selectively remove portions of the first organic layer and the second organic layer formed on the auxiliary electrode;
Forming a second electrode on the second organic layer and the auxiliary electrode. A method for manufacturing a display device, comprising: The method for manufacturing a display device according to claim 1, wherein the first organic layer is made of a material having a melting point lower than that of the auxiliary electrode. The method for manufacturing a display device according to claim 1, wherein the first organic layer is made of a material that sublimes when irradiated with laser light. The method for manufacturing a display device according to claim 1, wherein the first organic layer is formed so as to cover the auxiliary electrode and the insulating film. A display device having a plurality of organic light emitting elements on a substrate,
A plurality of first electrodes provided on the substrate;
An auxiliary electrode provided in a region between the plurality of first electrodes;
An insulating film provided in a region between the plurality of first electrodes and the auxiliary electrode;
A thickness D1 of a portion including the light emitting layer and covering the plurality of first electrodes and the insulating film and formed on the plurality of first electrodes, and a thickness D2 of the portion formed on the insulating film are D1. <An organic layer satisfying D2;
A display device comprising: a second electrode provided on the organic layer and the auxiliary electrode. The organic layer forms a first organic layer that covers the auxiliary electrode and the insulating film, and then includes a light emitting layer and a second electrode that covers the plurality of first electrodes, the insulating film, and the first organic layer. And forming a portion of the first organic layer and the second organic layer on the auxiliary electrode selectively by irradiating the first organic layer with laser light. The display device according to claim 5, wherein the display device is formed by removing the display device. The display device according to claim 6, wherein the first organic layer is made of a material having a melting point lower than that of the auxiliary electrode. The display device according to claim 6, wherein the first organic layer is made of a material that sublimes when irradiated with laser light.

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