JP2005062545A - Mask for exposure processing, substrate for liquid crystal alignment and method for manufacturing substrate for the liquid crystal alignment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mask for exposing a liquid crystal alignment layer for obtaining a hydrophilic region having a uniform degree of hydrophilicity. <P>SOLUTION: The mask 1 is used in the processing of bringing a mask body 11 having a mask pattern 13 into contact with a hydrophobic region 2 which can be converted into hydrophilic by exposure, to thereby expose the hydrophobic region 2 along the figure of the mask pattern. The surface of the mask body 11 which is to be in contact with the hydrophobic region is provided with a spacer 15 which controls the gap from the hydrophobic region 2. The spacer 15 is preferably formed on the mask pattern 13. The spacer 15 is preferably formed by photolithography, printing, or by using an adhesive tape or film. The spacer 15 is preferably made of a light-transmitting material which allows light to transmit. The gap is preferably 5 μm to 20 μm. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to an exposure processing mask, a liquid crystal alignment substrate, and a method for manufacturing a liquid crystal alignment substrate used for exposing a hydrophobic region of a liquid crystal display device to form a hydrophilic region.

  Since liquid crystal display devices can be thinned and driven at a low voltage, they are widely used as various display devices. In particular, a TN liquid crystal display device in which an active switch element such as a TFT (thin film transistor) is incorporated in each pixel exhibits display performance similar to that of a CRT, and is used for a display of a personal computer, a television, or the like. However, the TN liquid crystal display device has the disadvantages that the response speed is slow and the viewing angle is narrow. Various research and development have been conducted so far to solve the drawbacks of the TN type liquid crystal display device. On the other hand, a vertical alignment type liquid crystal display device in which directors of liquid crystal molecules are aligned in the normal direction of the substrate. Has also been researched and developed.

  The vertical alignment type liquid crystal display device has an advantage that it has excellent front contrast and does not require a rubbing process in the manufacturing process, and various research and developments are actively conducted. Also in this vertical alignment type liquid crystal display device, there is a demand for improvement in viewing angle characteristics and response speed, as in the above-described TN type liquid crystal display device.

In response to such a requirement, a technique for controlling the liquid crystal molecules to have a plurality of tilt directions within one pixel, that is, a multi-domain technique has been proposed. As a multi-domain technology, it has been proposed to arrange a protruding structure at an arbitrary position on the base of the alignment film (see, for example, Non-Patent Document 1). According to this multi-domain technology, when the voltage is off, the liquid crystal molecules tilt slightly along the slope of the structure, and when the voltage is on, the slightly tilted liquid crystal molecules first appear along the tilt direction. The liquid crystal molecules other than the structure start to tilt, and are sequentially tilted in the same direction under the influence of the liquid crystal molecules. That is, the alignment of the liquid crystal molecules is controlled starting from the structure.
Fujitsu FIND, Vol.19, No.5, 2001

  In the above-described orientation control using the protruding structure, the manufacturing process is complicated to form the structure, which may cause a problem in yield reduction and cost increase.

  For this reason, a hydrophobic alignment film that can be hydrophilized is formed on the substrate, and this alignment film is exposed with a mask having a photocatalyst layer, so that the exposed alignment film is hydrophilized and liquid crystal It has been proposed to form a hydrophilic region in which molecular directors are arranged with an inclination relative to the substrate normal direction.

  Specifically, for example, as shown in FIG. 4, in the exposure process, a mask structure (mask) 40 in which a mask pattern 42 having a predetermined shape and a photocatalyst layer 43 are provided on an exposure process substrate 41 is replaced with a substrate 45. The film is left on the alignment film 46 by hand (soft contact) (FIG. 4B). That is, the photocatalyst layer 43 of the mask structure 40 is brought into contact with the alignment film 46. After the contact, the alignment film 46 is irradiated with exposure light (for example, UV light) 48 through the mask structure 40 (FIG. 4C), so that the exposed alignment film is hydrophilized and has a predetermined shape. A hydrophilic region 49 will be formed (FIG. 4D).

  Thus, by forming the hydrophilic region 49, the liquid crystal molecules on the hydrophilic region 49 are inclined with respect to the normal direction of the substrate. Since the liquid crystal molecules are easily tilted, the other liquid crystal molecules are tilted all at once from the liquid crystal molecules. As a result, the response time of the liquid crystal can be shortened. Therefore, the orientation can be controlled without forming a structure or the like, and the manufacturing process can be simplified.

  By the way, when performing the exposure process, the photocatalyst layer 43 is brought into contact with the alignment film 46 to perform exposure. However, the width of the exposure gap between the photocatalyst layer 43 and the alignment film 46 may vary. That is, when the photocatalyst layer 43 is brought into contact with the alignment film 46, the photocatalyst layer 43 is hardly brought into direct contact with the alignment film 46 because the surface of the photocatalyst layer 43 is in contact with the surface of the alignment film 46. For example, an air layer of 10 μm to 20 μm is interposed between 43 and the alignment film 46. For this reason, the width of the exposure gap between the photocatalyst layer 43 and the alignment film 46 may vary, and the degree of hydrophilicity of the exposed alignment film 46 may not be uniform.

  The present invention has been made in order to solve the above-described problems, and includes an exposure processing mask, a liquid crystal alignment substrate, and a method for manufacturing a liquid crystal alignment substrate that can obtain a hydrophilic region having a uniform degree of hydrophilicity. It is for the purpose of provision.

  In order to achieve the above object, the mask for exposure processing of the present invention has a mask body having a mask pattern brought into contact with a hydrophobic region that can be hydrophilized by exposure processing, and the hydrophobic region is exposed to a mask pattern shape. A spacer for controlling a gap with the hydrophobic region is provided on the surface of the mask body on the hydrophobic region contact side.

  According to this invention, since the spacer is provided in the mask body to control the gap between the mask body and the hydrophobic region, when the mask body is brought into contact with the hydrophobic region, the space between the mask body and the hydrophobic region is uniform. Gap width. For this reason, the hydrophobic region can be uniformly exposed, and a hydrophilic region having a uniform degree of hydrophilicity can be obtained.

  The mask body is formed by forming the mask pattern on the hydrophobic region contact side surface of the mask substrate, and forming a catalyst layer covering the mask pattern on the hydrophobic region contact side surface of the mask substrate. preferable.

  It is preferable that the spacer is formed on the mask pattern.

  Thereby, since the spacer does not affect the exposure process of the hydrophobic region, the exposure process of the hydrophobic region can be performed with higher accuracy.

  The spacer is preferably formed by photolithography or printing.

  It is preferable that the spacer is formed of an adhesive tape or a film.

  It is preferable that the spacer is formed of a light transmitting material that transmits light.

  The gap is preferably 5 μm to 20 μm.

  In addition, the substrate for aligning liquid crystal of the present invention is obtained by forming a hydrophobic region that can be hydrophilized by exposure treatment on the substrate, and subjecting part of the hydrophobic region to exposure treatment using the mask for exposure treatment. The formed hydrophilic region is formed.

  According to this invention, since the spacer is provided in the mask body to control the gap between the mask body and the hydrophobic region, when the mask body is brought into contact with the hydrophobic region, the space between the mask body and the hydrophobic region is uniform. Gap width. For this reason, the hydrophobic region can be uniformly exposed, and a liquid crystal alignment substrate having a hydrophilic region with a uniform degree of hydrophilization can be obtained.

  Further, the method for producing a substrate for liquid crystal alignment according to the present invention comprises forming a hydrophobic region that can be hydrophilized by exposure treatment on the substrate, and exposing the hydrophobic region using the mask for liquid crystal alignment film exposure processing. Then, a hydrophilic region is formed in a part of the hydrophobic region to produce a liquid crystal alignment substrate.

  According to this invention, since the spacer is provided in the mask body to control the gap between the mask body and the hydrophobic region, when the mask body is brought into contact with the hydrophobic region, the space between the mask body and the hydrophobic region is uniform. Gap width. For this reason, the hydrophobic region can be uniformly exposed, and a liquid crystal alignment substrate having a hydrophilic region with a uniform degree of hydrophilization can be obtained.

  By providing a spacer that controls the gap between the alignment film on the alignment film contact side surface of the mask body, the gap width between the mask body and the alignment film is uniform. An alignment film having a uniform hydrophilic region can be obtained.

  Hereinafter, an exposure processing mask, a liquid crystal alignment substrate, and a method for manufacturing a liquid crystal alignment substrate of the present invention will be described with reference to the drawings.

  1 and 2 are views showing an example of manufacturing a liquid crystal alignment substrate using the exposure processing mask of the present invention.

  As shown in FIGS. 1 and 2, the exposure processing mask of the present invention is used to form a hydrophilic region 3 by exposing a hydrophobic region 2 of a liquid crystal display device.

  The mask body 11 is used in contact with the hydrophobic region 2 and may be any type, for example, an optically transparent mask substrate 12 and formed on the contact surface of the mask substrate 12. The mask pattern 13 includes a catalyst layer 14 formed on the contact surface of the mask substrate 12 and covering the mask pattern 13.

  The mask substrate 12 may be any optically transparent substrate that transmits light such as visible light, ultraviolet rays, and X-rays that are generally used for exposure processing. For example, a quartz glass substrate or soda may be used. Examples include a lime glass substrate, a sapphire substrate, and a synthetic resin film.

  The mask pattern 13 is formed in a desired shape using, for example, a chromium thin film. The material of the mask pattern 13 may be any material that is generally used as a mask pattern, that is, a material that does not transmit light, X-rays, or the like. For example, a chromium-based material such as chromium or chromium oxide may be used. Can be mentioned.

  The method for forming the mask pattern 13 is not particularly limited, and examples thereof include a sputtering method and a vacuum film forming method.

  The catalyst layer 14 is considered to activate, for example, light that irradiates the hydrophobic region 2 to form the hydrophilic region 3, and is, for example, a photocatalyst layer.

  The photocatalyst layer 14 is, for example, a layer containing a photocatalyst, and may be a layer such as a thin film made of only a photocatalyst or a layer containing a photocatalyst in a binder.

  Although it does not specifically limit as a photocatalyst, Metal oxides, such as a titanium oxide, a zinc oxide, a tin oxide, strontium titanate, a tungsten oxide, a bismuth oxide, an iron oxide, etc. can be mentioned, A titanium oxide is especially preferable.

  Titanium oxide is chemically stable, non-toxic and easily available. As the titanium oxide, both anatase type and rutile type can be used, and anatase type titanium oxide is preferable. The average particle size of the anatase-type titanium oxide is not particularly limited, but the smaller particle size is preferable because the photocatalytic reaction occurs efficiently. For example, the average particle size is preferably 50 nm or less, and particularly preferably 20 nm or less. Specific examples of titanium oxide include hydrochloric acid peptizer type anatase titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd., average crystallite diameter 7 nm), nitrate peptizer type anatase titania sol (Nissan Chemical, TA-15, Average crystallite diameter of 12 nm).

  Anatase type titanium has an excitation wavelength of 380 nm or less, and in the case of such a photocatalyst, it is necessary to excite the photocatalyst by ultraviolet rays.

  Mercury lamps, metal halide lamps, xenon lamps, excimer lamps, excimer lasers, YAG lasers, and other ultraviolet light sources can be used to emit ultraviolet rays. By changing the illuminance, irradiation amount, etc., wetting the film surface Sex can be changed.

  As the binder, any binder may be used as long as it is generally used when forming a mask pattern. For example, a silicone resin such as a silicone resin having a main skeleton having a siloxane bond (-Si-O-), Examples include amorphous silica precursors.

  A photocatalyst and a binder can be dispersed in a solvent to prepare a coating solution for coating. Examples of the solvent that can be used include alcohol-based organic solvents such as ethanol and isopropanol. Titanium-based, aluminum-based, zirconium-based, and chromium-based coupling agents can also be used.

  The coating solution containing the photocatalyst can be applied to the substrate by a method such as spray coating, dip coating, roll coating, or bead coating. Further, in the case where an ultraviolet curable component is contained as a binder, a layer of a composition containing a photocatalyst can be formed on a substrate by irradiating with ultraviolet rays and performing a curing treatment. The photocatalyst layer 14 may be formed by other methods such as a sol-gel method.

  A spacer 15 for controlling a gap with the hydrophobic region 2 is provided on the contact side surface of the mask main body 11 (mask substrate 12).

  The spacer 15 is preferably made of an optical transmission material (light transmission material) that transmits light, X-rays, or the like. Examples of the light transmitting material include PET, NN780 manufactured by JSR Corporation, polycarbonate, polystyrene, and the like.

  The method for forming the spacer 15 is not particularly limited as long as the gap with the hydrophobic region 2 to be exposed can be controlled. For example, photolithography performed using a photosensitive resin composition, various printing means, and the like can be used. For example, it is formed on the mask substrate 12 or on the mask pattern 13 as shown in FIG.

  Examples of the photosensitive resin composition include known negative photosensitive resin compositions and positive photosensitive resin compositions. Specifically, for example, a photopolymerization initiator that generates a radical component by at least ultraviolet irradiation, a component that has an acrylic group of C═C in the molecule, and that undergoes a cleavage polymerization reaction with the generated radical component and cures, Examples thereof include an acrylic negative photosensitive resin composition composed of a functional group that can dissolve an unexposed portion by development (for example, a component having an acidic group in the case of development with an alkaline solution).

  Among the components having an acrylic group, examples of relatively low molecular weight polyfunctional acrylic molecules include dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), and tetramethylpentatriacrylate (YMPTA). .

  Examples of the high molecular weight polyfunctional acrylic molecule include a polymer in which an acrylic group is introduced into a part of a carboxylic acid group of a styrene-acrylic acid-benzyl methacrylate copolymer via a spacer.

  The spacer may be a photosensitive resin composition alone or may contain a conductive powder in the photosensitive resin composition. For example, a negative photosensitive resin composition or a positive photosensitive resin containing a conductive powder. It can be formed by patterning by photolithography using a functional resin composition.

  The spacer 15 may be formed using an adhesive tape, a film, or the like. In this case, for example, as shown in FIG. 2, it is preferable to form the spacer 15 on the photocatalyst layer 14 on the mask pattern 13. .

  Although it does not specifically limit as a film, Preferably PET film etc. are mentioned.

  The formation position of the spacer 15 is not particularly limited when the spacer 15 is formed of a light transmitting material, but is preferably on the mask pattern 13. The spacer 15 is formed on the mask pattern 13 when the spacer 15 is not formed of a light transmitting material. Therefore, the spacer 15 is preferably formed on the mask pattern 13 regardless of the material, as shown in FIGS. Thus, by forming the spacer 15 on the mask pattern 13, the spacer 15 does not affect the exposure processing of the hydrophobic region 2, so that the exposure processing of the hydrophobic region 2 can be performed with high accuracy. .

  The shape of the spacer 15 is not particularly limited, and the linear or broken line along the mask pattern 13 or the vicinity of the peripheral edge of the contact side surface of the mask body 11 (mask substrate 12) (so as to surround the contact side surface). (B) The line may be a straight line or a broken line, and the tip surface contacting the hydrophobic region may be a triangle, a circle, a rectangle, a polygon, an ellipse or the like. May be. In addition, the spacer 15 may be formed in any shape such as a curved shape with a protruding tip, a pyramid shape, or a conical shape, and a cross section in the height direction may be formed in any shape such as a semicircle, a trapezoid, or a triangle. May be.

  The height of the spacer 15 (the gap between the mask body 11 and the hydrophobic region 2) is not particularly limited, but it is preferably a dimension that can easily generate active oxygen species and the like generated by the photocatalyst in the gap. For example, it is preferable that it is 5 micrometers-20 micrometers.

  The hydrophobic region 2 exposed by using the mask 1 is used for a liquid crystal display device.

  There are two types of liquid crystal display devices, a horizontal alignment method and a vertical alignment method. Either method may be used, and what is subjected to exposure processing is not particularly limited. For example, the liquid crystal display device is an alignment film for controlling the alignment of liquid crystals. . In this embodiment mode, a case where an alignment film of a vertical alignment liquid crystal device is subjected to exposure treatment will be described.

  The vertical alignment type liquid crystal display device includes a first substrate 21, a second substrate 22, and liquid crystal injected between the opposing substrates 21 and 22.

  The liquid crystal is not particularly limited as long as it has a negative dielectric anisotropy that is currently used in a vertical alignment type liquid crystal display device. Specifically, for example, MLC-6608 manufactured by Merck Ltd., MLC-2037, MLC-2038, MLC-2039, etc. are mentioned.

  Electrodes (a pair of electrodes) 23 and 24 are provided on the liquid crystal side surface (opposing surface) of the first substrate 21 and the liquid crystal side surface (opposing surface) of the second substrate 22, respectively. The electrodes 23 and 24 differ depending on the substrate, and are transparent electrodes when they are color filter substrates, and pixel electrodes when they are device substrates. Examples of the constituent material of the electrodes 23 and 24 include indium tin oxide (ITO), zinc oxide, tin oxide, indium oxide, and indium zinc oxide (IZO). The electrodes 23 and 24 can be formed by various general methods and are not particularly limited. For example, the electrodes 23 and 24 can be formed by various printing means, a sputtering method, a vacuum deposition method, a CVD method, or the like. The thickness of the electrodes 23 and 24 is preferably about 100 nm to 150 nm.

  On the electrodes 23 and 24, there are provided alignment films (hydrophobic regions) 2 for aligning directors of liquid crystal molecules along the normal direction of the substrate when the power is turned off.

For example, the alignment film 2 is preferably a hydrophobic film (polymer film) having a long side chain, and is preferably a film that is originally hydrophobic but can be rendered hydrophilic by a hydrophilization treatment. , for example, the side chain is _{- (CH 2) n- (CF} 2) m-CF 3 (n is an integer of 2 or more for example 2, m is an integer of seven or more, for example, 7 each represent) for hydrophobic film forming represented by fluorine based silicone resin, side chain _{- (CH 2) n- (CF} 2) m-CF 3 vertical (n is an integer greater than or equal to 2 for example 2, m is an integer of seven or more, for example, 7 each represent) represented by Examples thereof include a polyimide resin for forming an alignment film. Examples of the fluorine-based silicone resin for forming a hydrophobic film include commercially available photosensitive resins such as a fluorine-based silicone resin for forming a water-repellent film made of Toshiba Silicone. Examples of the polyimide resin for forming the vertical alignment film include commercially available photosensitive resins such as JALS-688 made by Nippon Synthetic Rubber, which is a polyimide resin for vertical alignment.

  The thickness of the alignment film 2 is not particularly limited, but is preferably 10 nm to 100 nm, for example. The alignment film 2 is formed by applying a material for forming an alignment film over the entire surface of the substrate by a coating means such as spin coating or various printing means.

  A hydrophilic region 3 in which directors of liquid crystal molecules are arranged to be inclined with respect to the substrate normal direction is formed in a part of the alignment film 2 of the first substrate 21 and / or the alignment film 2 of the second substrate 22. Has been. This hydrophilic region 3 is formed using the mask 1 of the present invention.

  That is, as shown in FIGS. 1 and 2, the mask 1 is opposed to the alignment film 2 of the substrates 21 and 22 (FIGS. 1A and 2A), and the mask 1 is placed on the substrate via the spacer 15. The alignment films 2 and 22 are brought into contact with each other (FIGS. 1B and 2B). At this time, the portion of the spacer 15 in contact with the alignment film 2 is smaller than when the photocatalyst layer 14 is in surface contact with the alignment film 2, so that an air layer is interposed between the spacer 15 and the alignment film 2. Since the spacer 15 directly contacts the alignment film 2, the gap between the mask and the alignment film 2 is controlled (held) by the spacer 15 at a constant level.

  Further, since the mask 1 does not contact the alignment film 2 but the spacer 15 contacts the alignment film 2, the mask pattern 13 and the photocatalyst layer 14 resulting from the exposure process do not contact the alignment film 2. The dust is not attached to the mask pattern 13 or the photocatalyst layer 14, and the surface is not damaged by scratches or the like, so that the exposure process can always be performed stably.

  After contact, a part of the alignment film (hydrophobic region) 2 is obtained by irradiating the alignment film 2 with exposure light (for example, UV light) 16 through the mask 1 (FIGS. 1C and 2C). Changes to the hydrophilic region 3 (FIG. 1 (d) and FIG. 2 (d)). That is, when the photocatalyst layer 14 is irradiated with, for example, ultraviolet light 16 of about 390 nm or less when the photocatalyst is titanium dioxide, active oxygen radicals are generated from the surface of the photocatalyst, and the photocatalyst layer 14 is exposed to the active oxygen radicals. It is considered that the side chain of the hydrophobic alignment film 2 is substituted with —OH group. As a result, the alignment film 2 can be changed to the hydrophilic region 3.

  FIG. 3 is an explanatory diagram showing an example of a surface reaction in which a part of the hydrophobic alignment film changes to a hydrophilic region. FIG. 3 (a) shows a state in which reactive oxygen species and the like attack the side chain on the surface of the hydrophobic alignment film, and break the bond of the side difference. FIG. 3 (b) shows the cut site. It shows a state in which a hydroxyl group is bonded to and changes to hydrophilicity.

  In the treatment for causing the surface reaction in FIG. 3, it is preferable to dispose the hydrophobic alignment film and the mask having the photocatalyst layer at a predetermined interval (for example, 5 μm to 20 μm). By disposing the hydrophobic alignment film and the mask having the photocatalyst layer at a predetermined interval, active oxygen species and the like generated by the photocatalytic reaction can be easily generated in the gap. Examples of the active oxygen species include active oxygen or active hydroxyl group generated based on the photoelectrochemical reaction in the photocatalyst particles, and these active oxygen species are side chains (for example, alkyl side chains) shown in FIG. ) And the lateral bond is broken. The active oxygen species and the like are exchanged and bonded to the portion where the side chain is cut, and the hydrophilicity shown in FIG.

  Thus, since the spacer 15 is provided in the mask body 11 to control the gap between the mask body 11 and the alignment film (hydrophobic region) 2, when the mask body 11 is brought into contact with the alignment film 2, The gap width between the alignment films 2 is uniform. For this reason, the alignment film 2 can be uniformly exposed, and a liquid crystal alignment substrate having a hydrophilic region 3 having a uniform degree of hydrophilicity can be obtained.

  In addition, the hydrophilic region 3 in which the directors of the liquid crystal molecules are arranged to be inclined with respect to the normal direction of the substrate can be formed in a part of the alignment film (hydrophobic region) 2 by an extremely easy process. An alignment substrate can be efficiently manufactured, yield reduction can be prevented, and cost can be reduced.

  When a liquid crystal display device is configured using this liquid crystal alignment substrate, since the hydrophilic region 3 is formed in a part of the alignment film (hydrophobic region) 2, the liquid crystal molecules on the hydrophilic region 3 are normal to the substrate. Since the liquid crystal molecules are arranged with an inclination with respect to the direction Y, the liquid crystal molecules on the hydrophilic region 3 are easily inclined when the power is turned on. As a result, other liquid crystal molecules on the alignment film 2 are simultaneously tilted starting from the liquid crystal molecules on the hydrophilic region 3, so that the response time of the liquid crystal can be shortened.

  As described above, since the liquid crystal display device can easily tilt the liquid crystal molecules on the hydrophilic region 3 when the power is turned on, other liquid crystal molecules can be tilted all at once from the liquid crystal molecules. The response time of the liquid crystal can be shortened. In addition, a plurality of liquid crystal domains in which the liquid crystal molecules in the hydrophilic region 3 are aligned in at least two directions are formed. As a result, the liquid crystal display device controlled in this way has a wide viewing angle. Further, since the alignment states are continuous with each other, no disclination is formed between the alignment films (hydrophobic regions) 2 (boundaries), and display quality does not deteriorate.

  Therefore, the liquid crystal display device and the liquid crystal alignment substrate of the present invention have the hydrophilic region 3 formed in a part of the hydrophobic alignment film 2, so that the alignment can be controlled without forming a structure or the like. It is possible to simplify the process and to have a wide viewing angle characteristic.

It is a schematic sectional drawing which shows an example which manufactures the liquid crystal aligning substrate of this invention. It is a schematic sectional drawing which shows the other example which manufactures the board | substrate for liquid crystal aligning of this invention. It is explanatory drawing which shows an example of the surface reaction which a hydrophobic alignment film changes to hydrophilicity. It is a schematic sectional drawing which shows the example which manufactures the board | substrate for liquid crystal alignment proposed previously.

Explanation of symbols

1 Mask 2 Alignment film (hydrophobic region)
DESCRIPTION OF SYMBOLS 3 Hydrophilic area | region 11 Mask main body 12 Mask board | substrate 13 Mask pattern 14 Photocatalyst layer 15 Spacer 16 Exposure light 21 1st board | substrate 22 2nd board | substrate 23 Electrode 24 Electrode

Claims (9)

  A mask for bringing a mask body having a mask pattern into contact with a hydrophobic region that can be hydrophilized by exposure processing, and exposing the hydrophobic region to a mask pattern shape, wherein the mask body is in contact with the hydrophobic region. A mask for exposure processing, characterized in that a spacer for controlling a gap with the hydrophobic region is provided on a side surface.   The mask body is formed by forming the mask pattern on the hydrophobic region contact side surface of the mask substrate, and forming a catalyst layer covering the mask pattern on the hydrophobic region contact side surface of the mask substrate. The exposure processing mask according to claim 1, wherein the mask is an exposure processing mask.   The mask for liquid crystal alignment film exposure processing according to claim 1, wherein the spacer is formed on the mask pattern.   The exposure processing mask according to any one of claims 1 to 3, wherein the spacer is formed by photolithography or printing.   The exposure processing mask according to claim 1, wherein the spacer is formed of an adhesive tape or a film.   6. The exposure processing mask according to claim 1, wherein the spacer is made of a light transmitting material that transmits light.   The mask for exposure processing according to claim 1, wherein the gap is 5 μm to 20 μm.   A hydrophobic region that can be hydrophilized by exposure processing is formed on the substrate, and exposure processing is performed on a part of the hydrophobic region using the mask for exposure processing according to any one of claims 1 to 7. A substrate for aligning liquid crystal, wherein the hydrophilic region obtained in the above is formed.   A method of manufacturing a liquid crystal alignment substrate by forming a hydrophobic region that can be hydrophilized by exposure treatment on the substrate, and exposing the hydrophobic region to a portion of the hydrophobic region to form a hydrophilic region. A method for manufacturing a liquid crystal alignment substrate, wherein the exposure process is performed using the exposure process mask according to any one of claims 1 to 7.

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