JP2003222877A - Liquid crystal display device and method of manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display device which has an excellent display grade without increasing a manufacturing cost. <P>SOLUTION: The liquid crystal display device has a liquid crystal display panel 10 holding a liquid crystal composition 300 between a pair of substrates 100 and 200. The array substrate 100 has a plurality of color filter layers 24 (R, G and B) arranged by each of pixels in a display region 102 for displaying images and columnar spacers 31 (A, B and C) for forming a prescribed gap between a pair of the substrates. The device has also light shielding layers SP formed by a resin resist having light shieldability. Over-coating layers 35 are arranged on the upper layers of the columnar spacers 31 (A, B and C). <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method for manufacturing the liquid crystal display device, and more particularly to a color liquid crystal display device having columnar spacers in a display area for displaying an image.

[0002]

2. Description of the Related Art At present, a liquid crystal display device of active matrix drive which is generally used is, for example, a thin film transistor (TFT) having a semiconductor layer of amorphous silicon (a-Si) and a pixel electrode connected to the TFT. And an opposing substrate provided with a counter electrode arranged to face the array substrate, a color filter layer, and the like, and a liquid crystal composition is sandwiched between the two substrates. Has been done.

The array substrate and the counter substrate are fixed around their periphery by an adhesive applied except for the liquid crystal sealing port. The liquid crystal filling port is sealed with a sealant. Among them, the liquid crystal display device for color display is a red (R), green (G), blue () arranged on each pixel of one of the two glass substrates in a display area for displaying an image. The color filter layer is formed of the colored resin layer of B).

In these liquid crystal display devices, a light shielding layer is provided in a light shielding area around the display area. This light shielding layer is often provided on the same substrate as the substrate provided with the color filter layer. In particular, by providing both the color filter layer and the light-shielding layer on the array substrate, the aperture ratio of the pixel portion can be improved, and a liquid crystal display device with a high aperture ratio can be obtained.

In such a liquid crystal display device, a structure has been proposed in which a columnar spacer is provided on at least one of the substrates to maintain a constant gap between the array substrate and the counter substrate.

[0006]

However, since the columnar spacer formed by laminating a plurality of color filter layers has different leveling characteristics depending on the laminating conditions at the forming position, the leveling characteristics are high. Variation occurs. When the columnar spacer having such a structure is formed in the display region, it becomes difficult to maintain a constant gap, and display defects such as display unevenness may occur.

Therefore, the present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a liquid crystal display device having excellent display quality and a method for manufacturing the liquid crystal display device without increasing the manufacturing cost. To provide.

[0008]

A liquid crystal display device according to a first aspect of the present invention is a liquid crystal display device in which a liquid crystal composition is sandwiched between a pair of substrates. The substrate is provided with a color filter layer arranged for each pixel in a display region for displaying an image, and a columnar spacer forming a predetermined gap between the pair of substrates,
A light-shielding region formed along the outer periphery of the display region is provided with a light-shielding layer formed of a resin resist having a light-shielding property, and an overcoat layer is disposed above the columnar spacers.

A method of manufacturing a liquid crystal display device according to a second aspect of the present invention is the method of manufacturing a liquid crystal display device in which a liquid crystal composition is sandwiched between a pair of substrates. A columnar spacer for arranging a color filter layer for each pixel in the display area for displaying an image on one substrate and stacking the color filter layers of a plurality of colors to form a predetermined gap between the pair of substrates is provided. A step of forming and a step of disposing a light shielding layer formed of a resin resist having a light shielding property in a light shielding area arranged along the outer periphery of the display area, and disposing an overcoat layer on the columnar spacer. And are provided.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION A liquid crystal display device according to an embodiment of the present invention will be described below with reference to the drawings.

A liquid crystal display device according to an embodiment of the present invention, for example, an active matrix type liquid crystal display device includes a liquid crystal display panel.

(First Embodiment) That is, a liquid crystal display panel 10 according to the first embodiment includes an array substrate 100 and an array substrate 10 as shown in FIGS.
Counter substrate 200 and array substrate 10 which are arranged to face each other.
0 and the liquid crystal composition 30 disposed between the counter substrate 200
It has 0 and. In such a liquid crystal display panel 10, the display area 102 for displaying an image is the array substrate 1
00 and the counter substrate 200 are formed in a region surrounded by the outer edge seal member 106. A peripheral region 104 arranged along the outer periphery of the display region 102
Has a light-shielding region formed in a frame shape.

In the display area 102, the array substrate 10
0 is m arranged in a matrix as shown in FIG.
× n pixel electrodes 151, m scanning lines Y1 to Ym formed along the row direction of these pixel electrodes 151, and n signal lines X1 to X1 formed along the column direction of these pixel electrodes 151. Xn, m × n thin film transistors, that is, pixel TFTs 121 arranged as switching elements near the intersections of the scanning lines Y1 to Ym and the signal lines X1 to Xn, corresponding to the m × n pixel electrodes 151. .

In the peripheral region 104, the array substrate 100 includes the scanning line driving circuit 18 for driving the scanning lines Y1 to Ym and the signal line driving circuit 1 for driving the signal lines X1 to Xn.
9 and so on.

As shown in FIG. 2, the liquid crystal capacitance CL is formed by the pixel electrode 151, the counter electrode 204, and the liquid crystal layer 300 sandwiched between these electrodes. Further, the auxiliary capacitance Cs is electrically formed in parallel with the liquid crystal capacitance CL. The auxiliary capacitance Cs is formed by a pair of electrodes, which are opposed to each other via an insulating film, that is, the auxiliary capacitance electrode 61 having the same potential as the pixel electrode 151, and the auxiliary capacitance line 52 set to a predetermined potential. .

As shown in FIG. 3, the liquid crystal display device includes a liquid crystal composition 30 between the array substrate 100 and the counter substrate 200.
A transmission type liquid crystal display panel 10 sandwiching 0 and a backlight unit 400 for illuminating the liquid crystal display panel 10 from the back side are provided.

Array substrate 100 of liquid crystal display panel 10
Is a pixel TF formed in the display region 102 on a transparent insulating substrate 11 such as a glass substrate corresponding to a plurality of pixels arranged in a matrix.
T121, a color filter layer 24 (R, G, B) formed so as to cover the display region 102 including the pixel TFT 121,
Pixel electrodes 151 arranged for each pixel on the color filter layer 24, a plurality of columnar spacers 31 arranged on the color filter layer 24 and forming a predetermined gap between the array substrate 100 and the counter substrate 200, And the alignment film 1 formed so as to cover the entire plurality of pixel electrodes 151.
It has 3A.

The array substrate 100 has a peripheral region 10
4, the columnar spacers 31 surrounding the outer periphery of the display area 102 and arranged in the light shielding area 41 of the insulating substrate 11
And a light-shielding layer SP made of the same material.

The color filter layer 24 is, for example, about 3.2.
It has a thickness of μm and is arranged for each pixel of green (G), blue (B), and red (R). These color filter layers 24 are composed of colored resin resists of three colors that respectively transmit light of respective color components of green, blue, and red.

The pixel electrode 151 is made of ITO (Indium Tin Oxide) formed on the color filter layers 24G, 24B and 24R assigned to each pixel.
It is formed of a light-transmissive conductive member such as. The pixel electrode 151 has the color filter layers 24 (R, G,
Pixel TFT1 through through hole 26 penetrating B)
21 are respectively connected.

Each pixel TFT 121 is connected to a scanning line Y formed along a row of pixel electrodes 151 and a signal line X formed along a column of pixel electrodes 151, and is turned on by a drive voltage from the scanning line Y. Then, the signal voltage is applied to the pixel electrode 151.

As shown in more detail in FIG. 4, in the array substrate 100, the scanning lines Y formed along the rows of the pixel electrodes 151 and the signal lines X formed along the columns of the pixel electrodes 151. The pixel TFT 121 is provided near the intersection of the scanning line Y and the signal line X corresponding to the pixel electrode 151.

Further, the array substrate 100 has a liquid crystal capacitance C.
An auxiliary capacitance electrode 61 having the same potential as the pixel electrode 151, which is arranged to face the pixel electrode 151 in order to form an auxiliary capacitance CS electrically parallel to L, and an auxiliary capacitance line 52 set to a predetermined potential. It has and.

The signal line X is arranged so as to be substantially orthogonal to the scanning line Y and the auxiliary capacitance line 52 via the interlayer insulating film 76. The auxiliary capacitance line 52 is formed of the same material in the same layer as the scanning line Y and is formed substantially parallel to the scanning line Y. A part of the auxiliary capacitance line 52 is arranged to face the auxiliary capacitance electrode 61 via the gate insulating film 62. The auxiliary capacitance electrode 61 is formed of an impurity-doped polysilicon film.

Wiring portions such as the signal lines X, the scanning lines Y, and the auxiliary capacitance lines 52 are formed of a light-shielding low resistance material such as aluminum or molybdenum-tungsten. In this embodiment, the scanning line Y and the auxiliary capacitance line 52 are made of molybdenum-tungsten, and the signal line X is mainly made of aluminum.

The pixel TFT 121 has a semiconductor layer 11 formed of a polysilicon film in the same layer as the auxiliary capacitance electrode 61.
Have two. The semiconductor layer 112 is the glass substrate 1
Drain region 112 that is formed on the undercoating layer 60 that is formed on the first region and is formed by doping impurities on both sides of the channel region 112C.
It has a D and a source region 112S. This pixel TF
T121 is the semiconductor layer 112 via the gate insulating film 62.
Of the gate electrode 63 integrated with the scanning line Y arranged to face
Is equipped with.

The drain electrode 88 of the pixel TFT 121 is
It is formed integrally with the signal line X and is electrically connected to the drain region 112D of the semiconductor layer 112 via a contact hole 77 penetrating the gate insulating film 62 and the interlayer insulating film 76. The source electrode 89 of the pixel TFT 121 has a source region 112 of the semiconductor layer 112 via a contact hole 78 penetrating the gate insulating film 62 and the interlayer insulating film 76.
It is electrically connected to S.

The color filter layers 24 (R, G, B) colored red (R), green (G), and blue (B) respectively are arranged on the interlayer insulating film 76. The pixel electrode 151 is
The source electrode 89 of the pixel TFT 121 is disposed on the color filter layer 24 (R, G, B) and through the through hole 26 formed in the color filter layer 24 (R, G, B).
Electrically connected to.

The auxiliary capacitance electrode 61 is electrically connected to a contact electrode 80 made of the same material as the signal line X via a contact hole 79 penetrating the gate insulating film 62 and the interlayer insulating film 76. Pixel electrode 151
Are electrically connected to the contact electrode 80 through a contact hole 81 penetrating the color filter layer 24. Thereby, the source electrode 8 of the pixel TFT 121
9, the pixel electrode 151, and the auxiliary capacitance electrode 61 have the same potential.

As shown in FIG. 3, in the first embodiment, the columnar spacers 31A, 31B, 31C are formed by laminating a plurality of colored resin resists. That is, this columnar spacer 31 (A, B, C)
Are, for example, a red color filter layer 24R, a green color filter layer 24G, and a blue color filter layer 24B.
Are formed in this order from the main surface side of the array substrate 100.

The columnar spacers 31 (A, B, C) are
For example, the height is about 4.9 μm. Since the columnar spacers 31 (A, B, C) do not reduce the aperture ratio in the display region 40, the wiring portion having a light shielding property (for example, the scanning line or the auxiliary capacitor formed of a molybdenum-tungsten alloy film). Lines and signal lines made of aluminum, etc.).

In the light-shielding region 41 provided in a frame shape along the outer periphery of the display region 102, the light-shielding layer SP is formed of a black resin resist having a light-shielding property.

Further, in this embodiment, the overcoat layer 35 is arranged on the columnar spacers 31 (A, B, C). The overcoat layer 35 is formed of the same material as the light shielding layer SP.

The alignment film 13A aligns liquid crystal molecules contained in the liquid crystal composition 300 with respect to the array substrate 100 in a predetermined direction.

The counter substrate 200 has a counter electrode 204 arranged on a transparent insulating substrate 21 such as a glass substrate, and an alignment film 13B covering the counter electrode 204.

The counter electrode 204 is arranged to face all the pixel electrodes 151 on the array substrate 110 side.
It is formed of a light-transmissive conductive member such as O. The alignment film 13B aligns liquid crystal molecules contained in the liquid crystal composition 300 in a predetermined direction with respect to the counter substrate 200.

Array substrate 1 in liquid crystal display panel 10
A polarizing plate PL1 is provided on the surface of 00, and a polarizing plate PL2 is provided on the surface of the counter substrate 200.

In such a liquid crystal display device, the light emitted from the backlight unit 400 illuminates the liquid crystal display panel 10 from the back side of the array substrate 100. The light that has passed through the polarizing plate PL1 on the array substrate 100 side of the liquid crystal display panel 10 and enters the inside of the liquid crystal display panel 10 is modulated through the liquid crystal composition 300, and the counter substrate 2
It is selectively transmitted by the polarizing plate PL2 on the 00 side. As a result, a color image is displayed.

The columnar spacers 31 (A, B, C) formed by laminating the color filter layers 24 (R, G, B) of a plurality of colors as described above depend on the laminating conditions at the forming position. Height will vary. This phenomenon will be described with reference to the drawings. Here, here, the red color filter layer 24R and the green color filter layer 24
G and the blue color filter layer 24B are laminated in this order.

That is, as shown in FIG. 5, first, a red color resin resist of the first color is formed and patterned to form a red color filter layer 24R.

Then, a second color green resin resist is formed. At this time, the green resin resist is laminated on the red color filter layer 24R on the one hand, but flows into the valleys of the red color filter layer 24R on the other hand and is leveled. Therefore, when the film thickness of the green resin resist flowing into the valley is made equal to that of the red color filter layer 24R, the film thickness of the green resin resist laminated on the red color filter layer 24R becomes smaller than that of the red color filter 24R. . The green color filter layer 24G is formed by patterning such a green resin resist.

Subsequently, a blue resin resist for the third color is formed. At this time, the blue resin resist flows on the red color filter layer 24R on the one hand, and on the other hand, on the green color filter layer 24G and in the valleys between the green color filter layer 24G and the adjacent red color filter layer 24R, and leveling is performed. To be done. Therefore, the film thickness of the blue resin resist flowing into the valley is set to the red color filter layer 24R.
When it is made equal to the green color filter layer 24G, the film thickness of the blue resin resist laminated on the green color filter layer 24G becomes thinner than that of the green color filter 24G. The blue color filter layer 24B is formed by patterning such a blue resin resist.

In this way, the color filter layer 24 (R,
Columnar spacers 31 (A, G, B) formed by stacking G, B)
The heights of B and C) are different due to their leveling characteristics. That is, as shown in FIGS. 6A and 6B, when the second green color filter layer 24G is laminated on the first red color filter layer 24R, the green resin resist is It just flows into the valley in the direction.

On the other hand, as shown in FIG. 6C, when the second green color filter layer 24G is laminated on the first island-shaped red color filter layer 24R, the green resin The resist flows into the valleys in both directions. As a result, tension is applied to the green resin resist laminated on the red color filter layer 24R toward the valleys in both directions, and the thickness of the green resin resist is reduced. Therefore, the film thickness of the second layer of the structure shown in FIG. 6C is smaller than the film thickness of the second layer of the structure shown in FIGS. 6A and 6B.

As shown in FIG. 6A, when the third blue color filter layer 24B is laminated on the second green color filter layer 24G, the blue resin resist is 1 in both directions. Red color filter layer 24R of the second layer
And only flows into the green color filter layer 24G.

On the other hand, as shown in FIGS. 6B and 6C, the third blue color filter layer 2 is formed near the position where the first blue color filter layer 24B is formed.
When 4B are stacked, the blue resin resist may have a valley between the red color filter layer 24R and the green color filter layer 24G in one direction ((b) of FIG. 6) or a valley of the red color filter layer 24R (see FIG. 6). (C)). As a result, a strong tension is generated in one direction with respect to the blue resin resist, that is, a direction with a large step, and a tension is generated in the other direction, that is, a direction with a relatively small step, so that the blue resin resist film is formed. The thickness becomes thin. Therefore, the film thickness of the third layer of the structure shown in FIGS. 6B and 6C is smaller than the film thickness of the third layer of the structure shown in FIG.

Considering the film thicknesses of the second layer and the third layer, the columnar spacer 31 of the structural example shown in FIG.
The height of A is the highest, the height of the columnar spacer 31B of the structural example shown in FIG. 6B is continuously high, and the height of the columnar spacer 31C of the structural example shown in FIG. The lowest.

In the liquid crystal display device according to the first embodiment described above, the array substrate 100, as shown in FIG.
In the display area 102, columnar spacers 31 (A, B, C) having a laminated structure in which color filter layers 24 (R, G, B) of a plurality of colors are laminated are provided. At this time, as described above, each columnar spacer 31 (A, B, C) has a variation in height depending on the stacking condition at the arrangement position.

Therefore, each columnar spacer 31 (A, B,
C) is covered with an overcoat layer 35 formed of a resin resist having a high leveling property. The degree of leveling when forming the overcoat layer 35 is larger when the height of the columnar spacers 31 (A, B, C) is higher. Therefore, the film thickness of the overcoat layer 35 is thinner as the height of the columnar spacers 31 (A, B, C) is higher, and is thicker as the height of the columnar spacers 31 (A, B, C) is lower.

As a result, the columnar spacers 31 (A, B,
The height nonuniformity of C) can be reduced, and the uniformity of the gap between the substrates can be improved.

Therefore, it is possible to provide a liquid crystal display device having excellent display quality.

Further, the columnar spacers 31 (A, B, C) arranged in the display area 102 are provided in each color filter layer 2.
4 (R, G, B) can be formed at the same time. Further, the overcoat layer 35 can be formed simultaneously with the light shielding layer SP arranged in the light shielding region 41. For this reason,
It is possible to prevent an increase in manufacturing cost without increasing the number of manufacturing steps.

Next, a method of manufacturing the above-mentioned liquid crystal display panel 10 will be described.

In the manufacturing process of the array substrate 100, first,
A silicon nitride film and a silicon oxide film are successively formed on the insulating substrate 11 having a thickness of 0.7 mm by the CVD method to form an undercoating layer 60 having a two-layer structure.

Then, an amorphous silicon film is formed on the undercoating layer 60 by the CVD method or the like. Then, this amorphous silicon film is irradiated with an excimer laser beam and annealed to be polycrystallized. After that, the polycrystallized silicon film, that is, the polysilicon film 112 is patterned by a photolithography process to form a semiconductor layer of the TFT 121 and an auxiliary capacitance electrode 61.

Then, a silicon oxide film is formed on the entire surface by the CVD method to form a gate insulating film 62. Then, tantalum (Ta), chromium (Cr), aluminum (Al), molybdenum (Mo), tungsten (W), and the like are formed on the entire surface of the gate insulating film 62 by a sputtering method.
A simple substance such as copper (Cu), a laminated film of these, or an alloy film thereof (in this embodiment, Mo-W).
An alloy film) is formed and patterned into a predetermined shape by a photolithography process. As a result, the scanning line Y, the auxiliary capacitance line 52, and the gate electrode 63 integrated with the scanning line Y are formed.
And various wirings are formed.

Then, using the gate electrode 63 as a mask,
Impurities are implanted into the polysilicon film 112 by an ion implantation method or an ion doping method. As a result, the TFT 12
One drain region 112D and one source region 112S are formed. Then, the entire substrate is annealed to activate the impurities.

Subsequently, a silicon oxide film is formed on the entire surface by the CVD method to form an interlayer insulating film 76.

Then, by a photolithography process,
The TFT penetrates through the gate insulating film 62 and the interlayer insulating film 76.
The contact hole 77 reaching the drain region 112D of 121 and the contact hole 7 reaching the source region 112S.
8 and a contact hole 79 reaching the auxiliary capacitance electrode 61
And form.

Then, Ta, Cr, Al, Mo, W, C are formed on the entire surface of the interlayer insulating film 76 by the sputtering method.
A simple substance such as u, a laminated film of these, or an alloy film of these (a laminated film of Mo—Al in this embodiment) is formed and patterned into a predetermined shape by a photolithography process. As a result, the signal line X is formed and the drain electrode 88 of the TFT 121 is formed integrally with the signal line X. At the same time, the source electrode 89 of the TFT 121 and the contact electrode 80 that contacts the auxiliary capacitance electrode 61 are formed.

Subsequently, a UV curable acrylic resin resist CR-2 in which a red pigment was dispersed by a spinner was used.
000 (manufactured by Fuji Film Orin Co., Ltd.) is applied to the entire surface of the substrate. Then, this resist film is exposed with a light exposure amount of 100 mJ / cm ² at a wavelength of 365 nm through a photomask that irradiates the portion corresponding to the red pixel with light. Then, the resist film is developed with a 1% KOH aqueous solution for 20 seconds, washed with water, and then baked. As a result, the red color filter layer 24R is formed.

Then, by the same process, a UV-curable acrylic resin resist CG-2 in which a green pigment is dispersed is prepared.
UV curable acrylic resin resist CB in which a green color filter layer 24G of 000 (manufactured by Fuji Film Orin Co., Ltd.) is formed and a blue pigment is further dispersed
A blue color filter layer 24B made of -2000 (manufactured by Fuji Film Orin Co., Ltd.) is formed.

In the step of forming the red color filter layer 24R, the same red resin resist is formed in a predetermined area of the display area 41 to form the first layer of the columnar spacers 31 (A, B, C). The first layer is formed to have the same film thickness as the color filter layer 24R in the red pixel area. The first layer has a size of, for example, 30 μm × 30 μm.

In the step of forming the green color filter layer 24G, the same green resin resist is laminated on the first layer to form the second layer of the columnar spacers 31 (A, B, C). This second layer is thinner than the first layer. Also,
The second layer has a size of, for example, 26 μm × 26 μm.

In the step of forming the blue color filter layer 24B, the same blue resin resist is laminated on the second layer to form the third layer of the columnar spacers 31 (A, B, C). This third layer is thinner than the second layer. Also,
The third layer is formed to have a size of 22 μm × 22 μm, for example.

As a result, as shown in FIG. 3, in the display area 102, the columnar spacers 31 (A,
B, C) are formed.

In the process of forming these color filter layers 24, the through holes 26 that contact the switching elements 121 and the pixel electrodes 151, and the pixel electrodes 151.
A contact hole 81 for making contact with the contact electrode 80 is also formed simultaneously.

Subsequently, ITO is formed into a film having a thickness of 1500 angstroms on the color filter layer 24 (R, G, B) by a sputtering method, and a predetermined pixel pattern is patterned by a photolithography process to perform switching. A pixel electrode 151 that contacts the element 121 is formed.

Subsequently, a black photosensitive acrylic resin resist NN700 (manufactured by JSR Corporation) having a light shielding property is applied to the surface of the substrate by a spinner. Then, after drying this black resin resist at 90 ° C. for 10 minutes,
365 nm using a photomask with a predetermined pattern
Exposure with an exposure dose of 300 mJ / cm ² . Then, this resin resist is developed with an alkaline aqueous solution having a pH of 11.5 and baked at 200 ° C. for 60 minutes to form the light shielding layer SP in the light shielding region 41, and at the same time, the columnar spacers 31 (A, A in the display region 102). An overcoat layer 35 is formed to cover B and C).

As a result, as shown in FIG. 3, the height of each columnar spacer 31 (A, B, C) in the display region 102, including the thickness of the overcoat layer 35, is as follows. That is, the columnar spacer 31A has 4.8.
3 ± 0.12 μm, the columnar spacer 31B is 4.87 ±
0.19 μm, the columnar spacer 31C has a width of 4.85 ± 0.
It became 18 μm. In this way, each columnar spacer 31
The heights of (A, B, C) became almost equal.

Subsequently, an alignment film material such as polyimide is applied to the entire surface of the substrate to a thickness of 600 angstroms and baked to form an alignment film 13A.

As a result, the array substrate 100 is formed.

On the other hand, in the manufacturing process of the counter substrate 200, first, ITO is formed into a film having a thickness of 1500 angstrom on the insulating substrate 21 having a thickness of 0.7 mm by the sputtering method to form the counter electrode 204. . Then, an alignment film material such as polyimide having a film thickness of 500 angstrom is applied to the entire surface of the insulating substrate 21 so as to cover the counter electrode 204, and is baked to form the alignment film 13B.

As a result, the counter substrate 200 is formed.

In the manufacturing process of the liquid crystal display panel 10, the outer edge seal member 106 is printed and applied along the outer edge of the array substrate 100 so as to surround the liquid crystal accommodation space while leaving the liquid crystal inlet 32, and further, the counter electrode is applied from the array substrate 100. An electrode transition material for applying a voltage to the outer peripheral sealing member 106
It is formed on the electrode transfer electrode around the electrode. Then, the alignment film 13 A of the array substrate 100 and the alignment film 13 of the counter substrate 200
The array substrate 100 and the counter substrate 200 are arranged such that B and B face each other, and the outer edge sealing member 106 is cured by heating to bond the both substrates. Outer edge sealing member 10
6 is, for example, a thermosetting epoxy adhesive.

Subsequently, the liquid crystal composition 300 is applied to the liquid crystal injection port 3
Then, the liquid crystal injection port 32 is sealed with an injection port sealing member 33 which is an ultraviolet curing epoxy adhesive.

The liquid crystal display panel 10 is manufactured by the above manufacturing method.

The active matrix type color liquid crystal display device manufactured as described above has a cell gap of 4.78.
The uniformity was as high as ± 0.15 μm, and no display defect was confirmed. In addition, the color filter layer 24 (R, G,
Since B) is formed on the array substrate, the aperture ratio is about 5% compared to the case where the color filter layer is formed on the counter substrate side.
Improved.

The present invention is not limited to the above-mentioned embodiments, but various modifications can be made. Other embodiments of the present invention will be described below.

(Second Embodiment) As shown in FIG. 7, the liquid crystal display device according to the second embodiment has an array substrate 1
00 and a counter substrate 200 sandwiching a liquid crystal composition 300, and a backlight unit 400 for illuminating the liquid crystal display panel 10 from the back side.
And are equipped with.

Array substrate 100 of liquid crystal display panel 10
Are pixel TFTs 121 formed on the transparent insulating substrate 11 such as a glass substrate in the display region 102 so as to respectively correspond to a plurality of pixels arranged in a matrix.
The organic insulating layer 25 formed so as to cover the display region 102 including the pixel TFT 121, the pixel electrode 151 arranged for each pixel on the organic insulating layer 25, arranged on the organic insulating layer 25 and facing the array substrate 100. A plurality of columnar spacers 31 that form a predetermined gap with the substrate 200,
And an alignment film 13A formed so as to cover the entire plurality of pixel electrodes 151.

The pixel electrode 151 is the organic insulating layer 2 for each pixel.
5 is formed of a light-transmissive conductive member such as ITO (Indium Tin Oxide) formed on each of the electrodes 5, and is connected to the pixel TFT 121 via a through hole 26 penetrating the organic insulating layer 25.

The counter substrate 200 is a color filter layer 24 formed by being assigned to each pixel in the display area 102 on the transparent insulating substrate 21 such as a glass substrate.
(R, G, B). In addition, the counter substrate 200
Has a counter electrode 204 common to all pixels formed on the color filter layer 24 (R, G, B), and an alignment film 13B covering the counter electrode 204.

The counter substrate 200 has a display area 102.
In, the color filter layers 24 (R, G,
The columnar spacers 31 (A, B, C) are formed by laminating the same colored resin resist as in B).

Further, the counter substrate 200 has the peripheral region 10
4, a light shielding layer SP is provided which surrounds the outer periphery of the display region 102 and is arranged in the light shielding region 41 of the insulating substrate 21. The light shielding layer SP is formed of a colored resin resist, for example, a black resin resist, in order to block the transmission of light.

In this embodiment, the red color filter layer 24R, the green color filter layer 24G and the blue color filter layer 24B are formed in this order. Pillar spacer 31
(A, B, C) are red color filter layers 24R, green color filter layers 24G, from the main surface side of the counter substrate 200.
It is formed by stacking the blue color filter layer 24B in this order. In addition, in this embodiment, the columnar spacers 31 (A, B, C) are arranged on a predetermined region such as a wiring portion having a light shielding property.

Further, each columnar spacer 31 (A, B, C)
Are covered with the overcoat layer 35 as in the first embodiment described above. This overcoat layer 35
Is formed of, for example, a black resin resist made of the same material as the light shielding layer SP. By providing the overcoat layer 35 formed of such a material having a high leveling property, it becomes possible to reduce the variation in height of the columnar spacers 31 (A, B, C).

As a result, as shown in FIG. 7, in the display area 102, the height of each columnar spacer 31 (A, B, C) including the thickness of the overcoat layer 35 is as follows. That is, the columnar spacer 31A is 4.9.
2 ± 0.20 μm, the columnar spacer 31B is 4.93 ±
0.19 μm, the columnar spacer 31C has a thickness of 4.92 ± 0.
It became 12 μm. In this way, each columnar spacer 31
The heights of (A, B, C) became almost equal.

The color display type active matrix liquid crystal display device having such a structure has a cell gap of 4.85 ±.
The uniformity was very high at 0.20 μm, and no display defect was confirmed.

(Third Embodiment) The liquid crystal display device according to the third embodiment is, as shown in FIG.
00 and a counter substrate 200 sandwiching a liquid crystal composition 300, and a backlight unit 400 for illuminating the liquid crystal display panel 10 from the back side.
And are equipped with.

The array substrate 100 and the counter substrate 200 of the liquid crystal display panel 10 are basically the same as those in the second embodiment described above. The columnar spacers 31 (A, B, C) provided in the display area 102 of the counter substrate 200 are the color filter layers 24 (R, R) formed by being assigned to each pixel.
G, B) is formed by the resin resist 36 disposed on the above.

The resin resist 36 is formed of, for example, a photosensitive transparent acrylic resin resist NN600. Such columnar spacers 31 (A, B, C) are
It is formed as follows. That is, a transparent acrylic resin resist is applied onto the color filter layer 24 (R, G, B) by a spinner. Then, after drying this transparent acrylic resin resist at 90 ° C. for 10 minutes,
365 nm using a photomask with a predetermined pattern
Exposure with an exposure dose of 100 mJ / cm ² . Then, this resin resist is developed with an alkaline aqueous solution having a pH of 11.5 and baked at 200 ° C. for 60 minutes. As a result, the columnar spacers 31 (A, B,
C) is formed.

Further, each columnar spacer 31 (A, B, C)
Is covered with the overcoat layer 35 as in the second embodiment described above. This overcoat layer 35
Is formed of, for example, a black resin resist made of the same material as the light shielding layer SP. By providing the overcoat layer 35 formed of such a material having a high leveling property, it becomes possible to reduce the variation in height of the columnar spacers 31 (A, B, C).

The color display type active matrix liquid crystal display device having such a structure has a cell gap of 4.80 ±.
The uniformity was very high at 0.12 μm, and no display defect was confirmed.

In the color display type active matrix liquid crystal display device having such a structure, the uniformity of the cell gap was very high, and no display defect was confirmed. In addition, this liquid crystal display device has a high temperature and high humidity (temperature: 60 ° C., humidity: 80
%), A continuous lighting test was performed for 1000 hours. As a result, there was no occurrence of display unevenness, and good display quality could be secured.

(Comparative Example 1) A liquid crystal display device according to the second embodiment is manufactured in exactly the same manner except that the overcoat layer 35 is not arranged on the columnar spacers 31 (A, B, C). did. Each columnar spacer 31 (A,
When the height of (B, C) was measured, the columnar spacer 31A
Has a height of 4.94 ± 0.15 μm, the height of the columnar spacer 31B is 4.77 ± 0.20 μm, and the height of the columnar spacer 31C is 4.48 ± 0.17 μm. Thus, there was a difference in height depending on the arrangement position of the columnar spacers.

The color display type active matrix liquid crystal display device having such a structure has a cell gap of 4.75.
The uniformity was extremely low at ± 0.52 μm, and a defective display due to uneven gap occurred at a ratio of 2 out of 100.

(Comparative Example 2) A liquid crystal display device according to the first embodiment is manufactured in exactly the same manner except that the overcoat layer 35 is not arranged on the columnar spacers 31 (A, B, C). did. Each columnar spacer 31 (A,
When the height of (B, C) was measured, the columnar spacer 31A
Has a height of 4.91 ± 0.14 μm, the height of the columnar spacer 31B is 4.72 ± 0.20 μm, and the height of the columnar spacer 31C is 4.47 ± 0.16 μm. Thus, there was a difference in height depending on the arrangement position of the columnar spacers.

The color display type active matrix liquid crystal display device having such a structure has a cell gap of 4.73.
The uniformity was ± 0.52 μm, which was extremely low. In addition, this liquid crystal display device has a high temperature and high humidity (temperature: 60 ° C., humidity: 80
%), A continuous lighting test was performed for 1000 hours. As a result, display defects due to cell gap unevenness occurred at a rate of 6 out of 10.

As described above, according to the liquid crystal display device of this embodiment, the colored resin resists of the same material as the color filter layer are laminated in the display area. It is configured by arranging columnar spacers having a laminated structure. The columnar spacer is covered with an overcoat layer formed of a resin resist having a high leveling property. The film thickness of the overcoat layer is thinner as the height of the columnar spacer is higher, and is thicker as the height of the columnar spacer is lower.

As a result, it is possible to eliminate variations in the height of the columnar spacers and improve the uniformity of the cell gap between the substrates. Therefore, it is possible to prevent the occurrence of display defects due to the cell gap unevenness.

Therefore, it becomes possible to provide a liquid crystal display device having excellent display quality.

Further, according to the liquid crystal display device of this embodiment, the columnar spacers arranged in the display area can be formed simultaneously with the respective color filter layers. Further, the overcoat layer can be formed simultaneously with the light-shielding layer arranged in the light-shielding region. Therefore, the number of manufacturing steps does not increase, and it is possible to prevent an increase in manufacturing cost.

[0104]

As described above, according to the present invention, it is possible to provide a liquid crystal display device having excellent display quality without increasing the manufacturing cost.

[Brief description of drawings]

FIG. 1 is a diagram schematically showing a structure of a liquid crystal display panel applied to a liquid crystal display device according to an embodiment of the present invention.

FIG. 2 is a circuit block diagram schematically showing a configuration of the liquid crystal display panel shown in FIG.

FIG. 3 is a cross-sectional view schematically showing the structure of the liquid crystal display device according to the first embodiment of the present invention.

4 is a cross-sectional view schematically showing a structure of an array substrate which constitutes the liquid crystal display panel shown in FIG.

FIG. 5 is a diagram for explaining a difference in film thickness due to a difference in leveling characteristics of laminated resin resists.

6 (a) to 6 (c) are views showing a difference in height due to a difference in the arrangement position of the columnar spacers.

FIG. 7 is a sectional view schematically showing a structure of a liquid crystal display device according to a second embodiment of the present invention.

FIG. 8 is a sectional view schematically showing a structure of a liquid crystal display device according to a third embodiment of the present invention.

[Explanation of symbols]

10 ... Liquid crystal display panel 24 (R, G, B) ... Color filter layer 31 (A, B, C) ... Columnar spacer 35 ... Overcoat layer 41 ... Shading area 100 ... Array substrate 102 ... Display area 104 ... peripheral area 121 ... Switching element 151 ... Pixel electrode 200 ... Counter substrate 204 ... Counter electrode 300 ... Liquid crystal composition SP ... Shading layer

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Norihiro Yoshida             2 shares, 1-9-1 Harara-cho, Fukaya City, Saitama Prefecture             Company Toshiba Fukaya Factory F-term (reference) 2H042 AA09 AA15 AA26                 2H048 BA11 BA45 BA48 BB02 BB07                       BB08 BB37 BB44                 2H089 LA09 QA16 TA01 TA09 TA12                       TA13 TA18                 2H091 FA02Y FA34Y FA41Z FD06                       GA01 GA13 LA12                 2H092 GA29 JA24 JA34 JA37 JA46                       JB22 JB61 KA04 KA05 KA10                       KB25 MA05 MA07 MA13 MA27                       NA25 PA08 PA09 PA13

Claims (7)

[Claims] 1. A liquid crystal display device constituted by sandwiching a liquid crystal composition between a pair of substrates, wherein one of the pair of substrates is arranged for each pixel in a display area for displaying an image. A light shield formed of a resin resist having a light-shielding property, which comprises a color filter layer and a columnar spacer that forms a predetermined gap between the pair of substrates, and a light-shielding region arranged along the outer periphery of the display region. A liquid crystal display device comprising a layer, and an overcoat layer disposed on the columnar spacer. 2. The liquid crystal display device according to claim 1, wherein the columnar spacer has a laminated structure in which the color filter layers of a plurality of colors are laminated. 3. The liquid crystal display device according to claim 1, wherein the columnar spacers are formed of a transparent resin resist. 4. The liquid crystal display device according to claim 1, wherein the overcoat layer is formed of the same material as the light shielding layer. 5. The one substrate includes scanning lines arranged in a row direction, signal lines arranged in a column direction, and switching elements arranged near an intersection of the scanning line and the signal line. The liquid crystal display device according to claim 1, further comprising: a pixel electrode connected to the switching element and formed in a matrix. 6. The liquid crystal display device according to claim 1, wherein the one substrate is provided with a counter electrode common to all pixels. 7. A method of manufacturing a liquid crystal display device, comprising a liquid crystal composition sandwiched between a pair of substrates, wherein a color is provided for each pixel in a display area for displaying an image on one of the pair of substrates. A step of arranging a filter layer and a step of stacking the color filter layers of a plurality of colors to form a columnar spacer forming a predetermined gap between the pair of substrates; and a step of arranging along the outer periphery of the display area. A method of manufacturing a liquid crystal display device, comprising: disposing a light shielding layer formed of a resin resist having a light shielding property in a light shielding region, and disposing an overcoat layer on an upper layer of the columnar spacer. .