JP2003174124A - Method of forming external electrode of semiconductor device - Google Patents
Method of forming external electrode of semiconductor deviceInfo
- Publication number
- JP2003174124A JP2003174124A JP2001370598A JP2001370598A JP2003174124A JP 2003174124 A JP2003174124 A JP 2003174124A JP 2001370598 A JP2001370598 A JP 2001370598A JP 2001370598 A JP2001370598 A JP 2001370598A JP 2003174124 A JP2003174124 A JP 2003174124A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- electrode
- protruding electrode
- mold
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体装置の外部
電極形成方法に関するものであり、特に、ボールグリッ
ドアレイ(以下、BGAと略称する)の作製や三次元実
装に有利な外部電極を形成するための方法に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an external electrode of a semiconductor device, and more particularly to forming an external electrode advantageous for manufacturing a ball grid array (hereinafter abbreviated as BGA) and for three-dimensional mounting. It is about the method for.
【0002】[0002]
【従来の技術】従来、半導体素子を樹脂封止してなる半
導体装置の樹脂封止面に外部電極を形成するための各種
の方法が提案されている。例えば、半導体装置を積層し
て三次元実装する場合のスルー電極を形成する方法とし
ては、基板上の突起電極全体を半導体素子と共に樹脂封
止した後に、突起電極が露出するまで樹脂表面を研削す
る方法が存在している。このように形成された半導体装
置においては、研削後に露出した突起電極にハンダボー
ルを載置することによりBGAを作製することもでき
る。2. Description of the Related Art Conventionally, various methods have been proposed for forming external electrodes on a resin-sealed surface of a semiconductor device obtained by sealing a semiconductor element with a resin. For example, as a method of forming a through electrode in a case where semiconductor devices are stacked and three-dimensionally mounted, the entire protruding electrode on the substrate is resin-sealed together with the semiconductor element, and then the resin surface is ground until the protruding electrode is exposed. There is a way. In the semiconductor device thus formed, a BGA can be manufactured by placing solder balls on the protruding electrodes exposed after grinding.
【0003】また、図8は、従来方法で作製されたE−
BGAの一例を示す説明図であり、図9は図8のX矢視
図である。図8に示すように、多層基板41と、多層基
板41に金ワイヤ42で接続された半導体素子43とを
枠体44で支持してなる被成形品45は、その半導体素
子43が樹脂46によって樹脂封止された後、多層基板
41の配線パターン上にハンダボール47が載置されて
いる。この場合、半導体素子43の樹脂封止の際には、
多層基板41の最外層の配線パターンを露出させるため
にその内側部分のみを液状樹脂のポッティングによって
樹脂封止している。また、m−BGAを作製する場合に
も、同様に基板の配線パターンを露出させる必要から、
ポッティングによる樹脂封止を行っている。Further, FIG. 8 shows an E-type device manufactured by a conventional method.
It is explanatory drawing which shows an example of BGA, and FIG. 9 is a X arrow line view of FIG. As shown in FIG. 8, a molded article 45 in which a multi-layer substrate 41 and a semiconductor element 43 connected to the multi-layer substrate 41 with a gold wire 42 are supported by a frame body 44 has a semiconductor element 43 formed by a resin 46. After resin sealing, the solder balls 47 are placed on the wiring pattern of the multilayer substrate 41. In this case, when the semiconductor element 43 is sealed with resin,
In order to expose the wiring pattern of the outermost layer of the multilayer substrate 41, only the inner portion is resin-sealed by potting a liquid resin. Also, when manufacturing an m-BGA, it is necessary to similarly expose the wiring pattern of the substrate,
The resin is sealed by potting.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、以上の
ような従来の半導体装置の外部電極製造方法には、次の
ような問題点がある。However, the above-described conventional method for manufacturing an external electrode of a semiconductor device has the following problems.
【0005】まず、突起電極全体を樹脂封止する方法に
おいては、封止後の樹脂表面全体を均一に研削する工程
が必要であり、その分だけ製造効率が低下するという問
題がある。また、樹脂と突起電極という異種材料を同時
に研削しなければならないという技術的な問題や、研削
時に発生する熱ストレスなどに起因する反りの問題もあ
る。これらの問題を解決するために突起電極の表面すれ
すれに樹脂封止しようとしても、突起電極の高さにばら
つきがあるため、突起電極が露出しない部分があり、そ
れを例えばレーザなどで除去する必要がある。First, in the method of sealing the entire protruding electrode with resin, a step of uniformly grinding the entire resin surface after sealing is required, and there is a problem that the manufacturing efficiency is reduced by that much. In addition, there are technical problems that different kinds of materials such as resin and protruding electrodes must be ground at the same time, and there is a problem of warpage due to thermal stress generated during grinding. Even if an attempt is made to seal the surface of the bump electrode with resin in order to solve these problems, there is a portion where the bump electrode is not exposed because the height of the bump electrode varies, and it is necessary to remove it with, for example, a laser. There is.
【0006】また、E−BGAやm−BGAを作製する
場合には、ポッティング等の樹脂封止を行う関係から、
個々の半導体装置単位での樹脂封止しかできず、複数の
半導体装置を一括的に樹脂封止することはできない。し
たがって、多数の半導体装置を製造する場合の製造効率
の向上に限界がある。In the case of manufacturing E-BGA and m-BGA, because of resin sealing such as potting,
Only the individual semiconductor devices can be resin-sealed, and a plurality of semiconductor devices cannot be collectively resin-sealed. Therefore, there is a limit to improving the manufacturing efficiency when manufacturing a large number of semiconductor devices.
【0007】本発明は、以上のような従来技術の問題点
を解決するために提案されたものであり、その目的は、
樹脂封止面から露出する外部電極を容易に形成可能な半
導体装置の外部電極形成方法を提供することであり、そ
れによって、BGAの作製や三次元実装における製造効
率の向上を実現することである。The present invention has been proposed in order to solve the above problems of the prior art, and its purpose is to:
An object of the present invention is to provide a method of forming an external electrode of a semiconductor device capable of easily forming an external electrode exposed from a resin sealing surface, thereby realizing improvement of manufacturing efficiency in BGA manufacturing and three-dimensional mounting. .
【0008】[0008]
【課題を解決するための手段】上記の目的を達成するた
め、本発明の半導体装置の外部電極形成方法は、樹脂封
止時に突起電極を押し潰すことにより、突起電極を樹脂
表面から確実に露出させるようにしたものである。In order to achieve the above object, in the method of forming an external electrode of a semiconductor device of the present invention, the protruding electrode is crushed at the time of resin sealing so that the protruding electrode is reliably exposed from the resin surface. It was made to let.
【0009】請求項1の発明は、半導体素子と接続さ
れ、外部電極形成用の突起電極を有する基板を樹脂封止
してなる半導体装置の外部電極形成方法において、樹脂
封止時に、樹脂封止用金型で突起電極を圧縮して押し潰
すことにより樹脂封止後に突起電極を樹脂表面から露出
させることを特徴としている。According to a first aspect of the present invention, there is provided a method of forming an external electrode of a semiconductor device, which is formed by resin-sealing a substrate having a protruding electrode for forming an external electrode, which is connected to a semiconductor element. It is characterized in that the projecting electrodes are exposed from the resin surface after resin sealing by compressing and crushing the projecting electrodes with a metal mold.
【0010】この特徴によれば、樹脂封止時に樹脂封止
用金型で突起電極を圧縮して押し潰すことにより、押し
潰された突起電極の先端面を樹脂封止用金型に十分に密
着させた状態で、この部分に樹脂が付着することなしに
樹脂成形を行うことができる。したがって、樹脂封止後
には突起電極の先端面を樹脂表面から確実に露出させる
ことができる。また、樹脂封止時に樹脂封止用金型を利
用して突起電極を押し潰すことは、特別な手段を要する
こともなく容易に実現可能である。According to this feature, the protruding electrode is compressed and crushed by the resin-sealing mold during resin sealing, so that the tip end surface of the crushed protruding electrode can be sufficiently moved to the resin-sealing mold. In the state of being in close contact, resin molding can be performed without the resin adhering to this portion. Therefore, the tip end surface of the bump electrode can be surely exposed from the resin surface after the resin sealing. Further, it is possible to easily crush the protruding electrodes by using the resin-sealing mold at the time of resin-sealing without requiring any special means.
【0011】請求項2の発明は、請求項1の半導体装置
の外部電極形成方法において、樹脂封止時に、樹脂封止
用金型の間に突起電極を含む被成形品と樹脂を配置して
突起電極および樹脂に圧縮力を加えることにより突起電
極を押し潰しながら樹脂成形を行うことを特徴としてい
る。この特徴によれば、樹脂の圧縮成形時に樹脂封止用
金型によって突起電極を押し潰しながら同時に樹脂成形
を行うことができるため、突起電極を押し潰すだけの工
程が不要である。According to a second aspect of the present invention, in the method of forming an external electrode of a semiconductor device according to the first aspect, a molded article including a protruding electrode and a resin are arranged between resin molding dies during resin sealing. The present invention is characterized in that resin molding is performed while pressing the protruding electrodes by compressing the protruding electrodes and the resin. According to this feature, since it is possible to simultaneously perform resin molding while crushing the projecting electrodes by the resin sealing mold during compression molding of the resin, it is not necessary to crush the projecting electrodes.
【0012】請求項3の発明は、請求項1の半導体装置
の外部電極形成方法において、樹脂封止時に、樹脂封止
用金型の間に突起電極を含む被成形品を配置して突起電
極に圧縮力を加えることにより突起電極を押し潰し、突
起電極を押し潰した樹脂封止用金型と被成形品の基板と
の間に形成されるキャビティ内に樹脂を供給して樹脂成
形を行うことを特徴としている。この特徴によれば、突
起電極を押し潰して樹脂封止用金型に確実に密着させた
後に樹脂を供給することにより、突起電極の形成時の高
さにある程度のばらつきがある場合でも、形成時の高さ
の低い突起電極の先端面に樹脂が付着することはないた
め、突起電極形成時の高さの精度を緩和できる。According to a third aspect of the present invention, in the method of forming an external electrode of a semiconductor device according to the first aspect, a molded product including a protruding electrode is disposed between resin molding dies during resin sealing to form a protruding electrode. The protruding electrode is crushed by applying a compressive force to the resin, and the resin is supplied by supplying the resin into the cavity formed between the resin-sealing die that crushed the protruding electrode and the substrate of the molding target. It is characterized by that. According to this feature, the bump electrode is crushed to be surely brought into close contact with the resin sealing mold, and then the resin is supplied, so that the bump electrode can be formed even if there is some variation in height during formation. Since the resin does not adhere to the tip surface of the protruding electrode having a low height, the accuracy of the height when forming the protruding electrode can be relaxed.
【0013】請求項4の発明は、請求項1から3のいず
れか1項の半導体装置の外部電極形成方法において、樹
脂封止時に、突起電極の高さを形成時の高さの5%以上
減少させるように突起電極を押し潰すことを特徴とす
る。この特徴によれば、突起電極を十分に押し潰すこと
によりその押し潰された先端面を樹脂封止用金型に確実
に密着させることができる。According to a fourth aspect of the present invention, in the method of forming an external electrode of a semiconductor device according to any one of the first to third aspects, the height of the protruding electrode at the time of resin sealing is 5% or more of the height at the time of formation. It is characterized in that the protruding electrodes are crushed so as to reduce the number. According to this feature, by sufficiently crushing the protruding electrode, the crushed tip surface can be surely brought into close contact with the resin sealing mold.
【0014】[0014]
【発明の実施の形態】以下には、本発明を適用した実施
の形態として、樹脂成形時に半導体装置に外部電極を形
成する具体的な方法について図面を参照して具体的に説
明する。BEST MODE FOR CARRYING OUT THE INVENTION A specific method of forming an external electrode on a semiconductor device during resin molding will be specifically described below as an embodiment to which the present invention is applied with reference to the drawings.
【0015】[第1の実施の形態]図1〜図3は、本発
明を適用した第1の実施の形態として、圧縮成形時に突
起電極を押し潰す場合の樹脂封止工程の一例を示す図で
あり、図1は、金型の間に被成形品を配置した状態を示
す説明図、図2は被成形品を拡大して示す説明図、図3
は、図1の状態後に被成形品を圧縮した状態を示す説明
図である。[First Embodiment] FIGS. 1 to 3 are views showing an example of a resin encapsulation process for crushing a protruding electrode during compression molding, as a first embodiment to which the present invention is applied. FIG. 1 is an explanatory view showing a state in which a molded product is arranged between molds, FIG. 2 is an explanatory view showing an enlarged molded product, and FIG.
[Fig. 2] is an explanatory view showing a state in which the article to be molded is compressed after the state of Fig. 1.
【0016】図2に示すように、本実施の形態において
は、圧縮成形される被成形品として、回路基板1と、こ
の回路基板1上にフリップチップ接続された半導体素子
2と、回路基板1上における半導体素子2の周辺に形成
された突起電極3とからなる被成形品4が示されてい
る。ここで、突起電極3は、ワイヤボンダで作製された
金バンプを半導体素子2より高く積み上げることで形成
されている。As shown in FIG. 2, in the present embodiment, a circuit board 1, a semiconductor element 2 flip-chip connected to the circuit board 1, and a circuit board 1 are molded products to be compression-molded. A molded product 4 including the protruding electrodes 3 formed around the semiconductor element 2 is shown. Here, the bump electrode 3 is formed by stacking gold bumps manufactured by a wire bonder higher than the semiconductor element 2.
【0017】図1に示すように、本実施の形態において
は、このような被成形品4を圧縮成形するための樹脂封
止用金型として、枠状の固定下型11とその内部を移動
する可動下型12からなる下型13、および上型14か
らなる金型15を使用する。なお、金型15には、樹脂
材料を加熱溶融させるための図示しないヒータが内蔵さ
れている。また、下型13は図示していない昇降機構に
よって上型14に対して昇降するようになっている。本
実施の形態においては、この金型15により、次のよう
にして被成形品4の樹脂封止を行う。As shown in FIG. 1, in the present embodiment, a frame-shaped fixed lower mold 11 and its inside are moved as a resin-sealing mold for compression-molding such a molded product 4. A lower mold 13 including a movable lower mold 12 and a mold 15 including an upper mold 14 are used. The mold 15 has a built-in heater (not shown) for heating and melting the resin material. The lower die 13 is moved up and down with respect to the upper die 14 by an elevator mechanism (not shown). In the present embodiment, the mold 15 is used to seal the molded product 4 with resin as follows.
【0018】[樹脂封止工程]まず、図1に示すよう
に、上型14と下型13とを対向して配置した状態で、
可動下型12の上面に樹脂材料5を載置すると共に、上
型14と下型13との間に、被成形品4の半導体素子2
や突起電極3の配置された中央部分が可動下型12上に
位置し、かつ、被成形品4の周縁部が固定下型11上に
位置するように被成形品4を配置する。この状態で、金
型15に内蔵した図示しないヒータにより樹脂材料5を
加熱し溶融状態にする。[Resin Encapsulation Step] First, as shown in FIG. 1, with the upper mold 14 and the lower mold 13 facing each other,
The resin material 5 is placed on the upper surface of the movable lower die 12, and the semiconductor element 2 of the molding target 4 is placed between the upper die 14 and the lower die 13.
The molded product 4 is arranged such that the central portion where the projecting electrodes 3 and the protruding electrodes 3 are arranged is located on the movable lower mold 12, and the peripheral edge of the molded product 4 is located on the fixed lower mold 11. In this state, the resin material 5 is heated to a molten state by a heater (not shown) built in the mold 15.
【0019】続いて、図示しない昇降機構により、固定
下型11および可動下型12を上昇させて、固定下型1
1の上面と上型14の下面とで被成形品4の周縁部をク
ランプする。この状態で、図3に示すように、可動下型
12のみをさらに上昇させて突起電極3および溶融した
樹脂材料5に圧縮力を加える。これにより、突起電極3
を所定の高さまで押し潰しながら、これと並行して、被
成形品4の回路基板1と固定下型11および可動下型1
2によって形成されるキャビティ内に溶融した樹脂材料
5を充満させて樹脂成形を行う。この場合、突起電極3
の形成時における高さの5〜50%程度減少させるよう
にして突起電極3を押し潰す。なお、回路基板1の表面
からの高さを考えた場合、突起電極3の形成時における
高さA、半導体素子2の高さB、押し潰した後(樹脂封
止後)の突起電極3の高さC、の関係は、A>C≧B、
となる。Subsequently, the fixed lower mold 11 and the movable lower mold 12 are raised by an elevator mechanism (not shown) to move the fixed lower mold 1
The peripheral edge of the molded product 4 is clamped by the upper surface of 1 and the lower surface of the upper mold 14. In this state, as shown in FIG. 3, only the movable lower die 12 is further raised to apply a compressive force to the protruding electrode 3 and the molten resin material 5. Thereby, the protruding electrode 3
While squeezing to a predetermined height, in parallel with this, the circuit board 1 of the article to be molded 4, the fixed lower mold 11 and the movable lower mold 1
The cavity formed by 2 is filled with the molten resin material 5 to perform resin molding. In this case, the protruding electrode 3
The protruding electrode 3 is crushed so as to be reduced by about 5 to 50% of the height at the time of forming. When considering the height from the surface of the circuit board 1, the height A when the protruding electrode 3 is formed, the height B of the semiconductor element 2, and the protruding electrode 3 after being crushed (after resin sealing) The relation of height C is A> C ≧ B,
Becomes
【0020】[作用効果]以上のような樹脂封止工程で
外部電極形成を行った場合の作用効果について、次に説
明する。[Function and Effect] The function and effect when the external electrodes are formed in the resin sealing process as described above will be described below.
【0021】まず、樹脂封止工程時に樹脂封止用の金型
15で突起電極3を圧縮して押し潰すことにより、押し
潰された突起電極3の先端面を金型15に十分に密着さ
せた状態で、この部分に樹脂が付着することなしに樹脂
成形を行うことができる。特に、突起電極3の形成時に
おける高さの5〜50%程度減少させるようにして突起
電極3を十分に押し潰すことによりその押し潰された先
端面を樹脂封止用金型に確実に密着させることができ
る。First, in the resin sealing step, the protruding electrode 3 is compressed and crushed by the resin sealing mold 15 so that the tip surface of the crushed protruding electrode 3 is sufficiently adhered to the mold 15. In this state, resin molding can be performed without the resin adhering to this portion. In particular, by sufficiently crushing the protruding electrode 3 by reducing it by about 5 to 50% of the height at the time of forming the protruding electrode 3, the crushed tip surface is surely brought into close contact with the resin sealing mold. Can be made.
【0022】したがって、樹脂封止後には突起電極3の
先端面を樹脂表面から確実に露出させることができる。
例えば、直径70μmで高さが50μmの金バンプを3
段積み上げて高さが150μmの突起電極3を形成し、
この突起電極3を樹脂封止時に高さが100μmとなる
まで押し潰した場合には、積み上げられた金バンプが潰
れ、樹脂表面には直径100μm程度の金バンプすなわ
ち突起電極3の先端面が露出する。Therefore, the tip end surface of the protruding electrode 3 can be surely exposed from the resin surface after the resin sealing.
For example, 3 gold bumps with a diameter of 70 μm and a height of 50 μm are used.
Stacked to form a protruding electrode 3 having a height of 150 μm,
When the bump electrode 3 is crushed to a height of 100 μm during resin sealing, the stacked gold bumps are crushed, and the gold bump having a diameter of about 100 μm, that is, the tip surface of the bump electrode 3 is exposed on the resin surface. To do.
【0023】このように、樹脂封止時に使用する金型を
そのまま利用して突起電極を押し潰すことは、特別な手
段を要することもなく容易に実現可能であり、この方法
により、突起電極3の先端面を樹脂表面から確実に露出
させることができる。したがって、突起電極を樹脂中に
埋没させて樹脂封止する従来技術に比べて、半導体素子
の表面全体を均一に研削する必要がない分だけ半導体装
置の製造効率を向上することができる。As described above, it is possible to easily use the mold used for resin sealing to crush the protruding electrodes without any special means. By this method, the protruding electrodes 3 can be formed. It is possible to reliably expose the tip end surface of the resin from the resin surface. Therefore, the manufacturing efficiency of the semiconductor device can be improved as compared with the conventional technique in which the protruding electrode is buried in the resin and sealed with the resin, because it is not necessary to uniformly grind the entire surface of the semiconductor element.
【0024】さらに、本実施の形態に係る方法によれ
ば、樹脂の圧縮成形時に樹脂封止用の金型によって突起
電極を押し潰しながら同時に樹脂成形を行うことができ
るため、突起電極を押し潰すだけの工程が不要である。
さらにまた、本発明とは異なり、突起電極すれすれに樹
脂封止する場合には突起電極のばらつきを抑えないと樹
脂が突起電極表面に被ってしまうが、本発明のように突
起電極を確実に押し潰す方法では、突起電極の形成時の
高さに多少のばらつきがある場合でも、最も高い突起電
極から順次押し潰す形で均一化することができる。した
がって、突起電極形成時の高さの精度を緩和することが
できる。Further, according to the method of the present embodiment, since resin molding can be performed at the same time while crushing the protruding electrodes by the resin-sealing mold during resin compression molding, the protruding electrodes are crushed. Only the process is unnecessary.
Furthermore, unlike the present invention, in the case of resin sealing just before the protruding electrode, the resin will cover the surface of the protruding electrode unless the variation of the protruding electrode is suppressed, but as in the present invention, the protruding electrode is pressed securely. In the crushing method, even if there is some variation in height when forming the bump electrodes, the bump electrodes can be uniformly crushed in order from the highest bump electrode. Therefore, the accuracy of the height when forming the bump electrode can be relaxed.
【0025】また、本実施の形態に係る方法によって突
起電極を樹脂表面から露出させた半導体装置は、BGA
の作製や三次元実装における製造効率の向上に有用であ
る。すなわち、樹脂表面に露出した突起電極3にハンダ
ボールを載置することにより、BGAを容易に作製する
ことができる。また、本実施の形態に係る方法で作製さ
れた半導体装置の樹脂表面から露出する突起電極は、三
次元実装用のスルー電極としても利用可能である。The semiconductor device in which the protruding electrode is exposed from the resin surface by the method according to the present embodiment is BGA.
It is useful for manufacturing and for improving manufacturing efficiency in three-dimensional mounting. That is, the BGA can be easily manufactured by placing the solder balls on the protruding electrodes 3 exposed on the resin surface. In addition, the protruding electrode exposed from the resin surface of the semiconductor device manufactured by the method according to the present embodiment can also be used as a through electrode for three-dimensional mounting.
【0026】さらに、従来技術ではポッティング等によ
る個々の半導体装置単位での樹脂封止しかできなかった
E−BGAやm−BGAを、多数の半導体装置用である
大判の被成形品を作製、樹脂封止した後に分離する、等
の方法で一括的に効率よく製造可能となる。図4は、本
実施の形態に係る方法で作製されたE−BGAの一例を
示す説明図である。Further, in the prior art, E-BGA and m-BGA, which could only be resin-sealed in individual semiconductor device units by potting or the like, were used to prepare large-sized molded products for a large number of semiconductor devices. It becomes possible to efficiently manufacture them collectively by a method such as separating after sealing. FIG. 4 is an explanatory diagram showing an example of an E-BGA manufactured by the method according to this embodiment.
【0027】この図4に示すように、多層基板21と、
多層基板21に金ワイヤ22で接続された複数の半導体
素子23と、それらを支持する枠体24、多層基板21
の最外層に載置された金バンプ(突起電極)25からな
る、複数の半導体装置用である大判の被成形品26の全
面が、金バンプ25を押し潰して露出させるようにして
樹脂27によって樹脂封止されている。樹脂封止後の成
形品は、パッケージダイシングライン28によって分離
され、個々のE−BGAが作製される。As shown in FIG. 4, a multilayer substrate 21
A plurality of semiconductor elements 23 connected to the multi-layer substrate 21 by gold wires 22, a frame body 24 for supporting them, the multi-layer substrate 21.
Of the gold bumps (protruding electrodes) 25 placed on the outermost layer of the above, the entire surface of a large-sized molded object 26 for a plurality of semiconductor devices is crushed and exposed by the resin 27. It is resin-sealed. The molded products after resin sealing are separated by the package dicing line 28, and individual E-BGAs are manufactured.
【0028】この場合、一括的な樹脂封止により、複数
の半導体装置について、半導体素子23だけでなく多層
基板21の配線パターンも全て樹脂でカバーされ、金バ
ンプ25のみを露出させることができるため、ポッティ
ングにより個々の半導体装置の半導体素子を樹脂封止し
ていた従来技術に比べて格段に製造効率が高くなってい
る。また、図8に示すような従来のE−BGAでは、多
層基板にハンダボールを載置するための配線パターンを
出すためにレジストを塗る必要があったが、金バンプ2
5だけを露出させた図4のE−BGAにおいては、表面
の樹脂がレジストの代わりとなるため、レジストを塗る
必要もない。In this case, not only the semiconductor elements 23 but also the wiring patterns of the multilayer substrate 21 are covered with the resin in the plurality of semiconductor devices by the collective resin sealing, and only the gold bumps 25 can be exposed. The manufacturing efficiency is markedly higher than that of the prior art in which the semiconductor element of each semiconductor device is resin-sealed by potting. Further, in the conventional E-BGA as shown in FIG. 8, it was necessary to apply a resist in order to form a wiring pattern for mounting the solder balls on the multilayer substrate.
In the E-BGA of FIG. 4 in which only 5 is exposed, the resin on the surface serves as a substitute for the resist, so that it is not necessary to apply the resist.
【0029】[第2の実施の形態]図5〜図7は、本発
明を適用した第2の実施の形態として、突起電極を押し
潰した後にトランスファ成形を行う場合の樹脂封止工程
の一例を示す説明図であり、図5は、金型の間に被成形
品を配置した状態、図6は、被成形品を圧縮した状態、
図7は、トランスファ成形を行った状態、をそれぞれ示
している。[Second Embodiment] FIGS. 5 to 7 show an example of a resin encapsulation process in the case where transfer molding is performed after the protruding electrodes are crushed, as a second embodiment to which the present invention is applied. FIG. 5 is a diagram illustrating a state in which a molded product is arranged between molds, FIG. 6 is a state in which the molded product is compressed,
FIG. 7 shows a state where transfer molding is performed.
【0030】本実施の形態において樹脂封止される被成
形品は、前述した第1の実施の形態と同様の、回路基板
1、半導体素子2、突起電極3からなる被成形品4であ
り、突起電極3は金バンプから形成されている。そし
て、図5に示すように、本実施の形態においては、この
ような被成形品4をトランスファ成形するための樹脂封
止用金型として、下型31と上型32からなる金型33
を使用する。金型33に、樹脂材料を加熱溶融させるた
めの図示しないヒータが内蔵されている点は第1の実施
の形態における金型15と同様である。また、本実施の
形態に係る金型33は、上型32が図示していない昇降
機構によって下型31に対して昇降するようになってい
る。The molded product to be resin-sealed in this embodiment is the molded product 4 including the circuit board 1, the semiconductor element 2 and the protruding electrode 3 similar to that of the first embodiment, The bump electrode 3 is formed of a gold bump. Then, as shown in FIG. 5, in the present embodiment, a metal mold 33 including a lower mold 31 and an upper mold 32 is used as a resin-sealing mold for transfer-molding such a molded product 4.
To use. The mold 33 is similar to the mold 15 in the first embodiment in that a heater (not shown) for heating and melting the resin material is built in the mold 33. Further, in the die 33 according to the present embodiment, the upper die 32 is moved up and down with respect to the lower die 31 by an elevator mechanism (not shown).
【0031】また、下型31には、樹脂投入用のポット
31aが形成され、このポット31aに樹脂加圧用のプ
ランジャ34が挿入されている。一方、上型32には、
樹脂成形用のキャビティ32aと、このキャビティ32
a内に樹脂を流入させるためのランナ32bおよびゲー
ト32cが形成されている。本実施の形態においては、
この金型33により、次のようにして被成形品4の樹脂
封止を行う。Further, a pot 31a for resin injection is formed in the lower mold 31, and a plunger 34 for resin pressurization is inserted into the pot 31a. On the other hand, in the upper mold 32,
Cavity 32a for resin molding and this cavity 32
A runner 32b and a gate 32c for allowing the resin to flow into a are formed. In the present embodiment,
With the mold 33, the molded product 4 is sealed with resin as follows.
【0032】[樹脂封止工程]まず、図1に示すよう
に、上型32と下型31とを対向して配置した状態で、
下型31のポット31a内にタブレット状の樹脂材料5
を投入すると共に、下型31の上面に、被成形品4の半
導体素子2や突起電極3の配置された中央部分が上型3
2のキャビティ32aに対向するように被成形品4を配
置する。[Resin Encapsulation Step] First, as shown in FIG. 1, with the upper die 32 and the lower die 31 arranged facing each other,
The tablet-shaped resin material 5 is placed in the pot 31a of the lower mold 31.
And the central portion of the lower die 31 on which the semiconductor element 2 and the protruding electrode 3 of the article to be molded 4 are arranged is located on the upper die 3.
The molded product 4 is arranged so as to face the two cavities 32a.
【0033】続いて、図6に示すように、図示しない昇
降機構により、上型32を下降させて、この上型32の
下面と下型31の上面とで被成形品4の周縁部をクラン
プすることにより、突起電極3に圧縮力を加えて所定の
高さまで押し潰す。すなわち、第1の実施の形態と同様
に、突起電極3の形成時における高さの5〜50%程度
減少させるようにして突起電極3を押し潰す。Subsequently, as shown in FIG. 6, the upper die 32 is lowered by an elevating mechanism (not shown), and the peripheral edge of the article 4 is clamped by the lower surface of the upper die 32 and the upper surface of the lower die 31. By doing so, a compressive force is applied to the protruding electrode 3 to crush it to a predetermined height. That is, similarly to the first embodiment, the protruding electrode 3 is crushed so as to be reduced by about 5 to 50% of the height when the protruding electrode 3 is formed.
【0034】この後、図7に示すように、下型31のポ
ット31aに投入されたタブレット状の樹脂材料5を、
金型33に内蔵した図示しないヒータによる加熱で溶融
しながら、プランジャ34の圧力により、ポット31a
からランナ32bおよびゲート32cを介してキャビテ
ィ32a内に流し込み、樹脂成形を行う。Thereafter, as shown in FIG. 7, the tablet-shaped resin material 5 put in the pot 31a of the lower die 31 is
While being melted by heating by a heater (not shown) built in the die 33, the pressure of the plunger 34 causes the pot 31a to melt.
Is poured into the cavity 32a through the runner 32b and the gate 32c to perform resin molding.
【0035】[作用効果]以上のような樹脂封止工程で
外部電極形成を行った場合の作用効果について、次に説
明する。[Function and Effect] The function and effect when the external electrodes are formed in the resin sealing process as described above will be described below.
【0036】まず、樹脂封止工程時に樹脂封止用の金型
33で突起電極3を圧縮して押し潰すことにより、押し
潰された突起電極3の先端面を金型33に十分に密着さ
せた状態で、この部分に樹脂が付着することなしに樹脂
成形を行うことができるため、第1の実施の形態と同様
に、樹脂封止後には突起電極3の先端面を樹脂表面から
確実に露出させることができ、半導体装置の製造効率を
向上することができる。そして、この方法によって得ら
れた半導体装置もまた、第1の実施の形態に係る方法で
得られた半導体装置と同様に、BGAの作製や三次元実
装における製造効率の向上に有用である。First, in the resin sealing step, the protruding electrode 3 is compressed and crushed by the resin sealing mold 33 so that the tip surface of the crushed protruding electrode 3 is sufficiently adhered to the mold 33. Since the resin molding can be performed in this state without the resin adhering to this portion, the tip end surface of the protruding electrode 3 can be surely removed from the resin surface after the resin sealing as in the first embodiment. It can be exposed, and the manufacturing efficiency of the semiconductor device can be improved. The semiconductor device obtained by this method is also useful for manufacturing BGA and improving the manufacturing efficiency in three-dimensional mounting, like the semiconductor device obtained by the method according to the first embodiment.
【0037】以上のような作用効果に加えて、本実施の
形態に係る方法は、高さに拘わらず全ての突起電極を十
分に押し潰して金型に密着させた後に樹脂を供給するこ
とから、突起電極の形成時の高さにかなりのばらつきが
ある場合でも、高い突起電極を押し潰している間に低い
突起電極の先端面と金型との間に樹脂が入り込む等の不
都合を確実に防止することができる。したがって、突起
電極の形成時の高さにかなりのばらつきがある場合で
も、全ての突起電極を樹脂表面から確実に露出させるこ
とができるため、突起電極形成時の高さの精度をより一
層緩和できるという効果が得られる。In addition to the above-described effects, the method according to the present embodiment supplies the resin after all the protruding electrodes, regardless of height, are sufficiently crushed and brought into close contact with the mold. Even if there is considerable variation in the height of the bump electrodes when they are formed, it is possible to ensure that there is no inconvenience such as resin getting between the tip surface of the low bump electrodes and the mold while the high bump electrodes are crushed. Can be prevented. Therefore, even if there is a considerable variation in height when forming the protruding electrodes, all the protruding electrodes can be surely exposed from the resin surface, so the accuracy of the height when forming the protruding electrodes can be further relaxed. The effect is obtained.
【0038】[他の実施の形態]なお、本発明は、上記
のような実施の形態に限定されるものではなく、他にも
多種多様な形態が実施可能である。例えば、次のような
形態を包含するものである。[Other Embodiments] It should be noted that the present invention is not limited to the above-described embodiments, and various other forms can be implemented. For example, the following forms are included.
【0039】まず、前記実施の形態においては、上型と
下型の一方を昇降させて樹脂封止を行う場合について説
明したが、他方の型を昇降させるか、あるいは、上下両
型を反対方向に昇降させた場合でも同様の効果を得るこ
とができる。すなわち、本発明においては、樹脂封止用
の金型によって突起電極を押し潰す限り、使用する金型
本体の具体的な構成は適宜選択可能である。First, in the above-described embodiment, the case where one of the upper mold and the lower mold is moved up and down to perform the resin sealing has been described. However, the other mold is moved up or down, or the upper and lower molds are moved in opposite directions. The same effect can be obtained even when it is moved up and down. That is, in the present invention, the specific configuration of the die body used can be appropriately selected as long as the protruding electrodes are crushed by the resin sealing die.
【0040】また、前記実施の形態においては、突起電
極を金バンプの積み重ねによって形成した場合について
説明したが、突起電極の形成方法は自由に選択可能であ
り、例えば、ハンダボールやスタッド棒等によって突起
電極を形成することも可能である。In the above embodiment, the case where the bump electrodes are formed by stacking gold bumps has been described, but the method of forming the bump electrodes can be freely selected. For example, solder balls or stud rods can be used. It is also possible to form protruding electrodes.
【0041】[0041]
【発明の効果】以上説明したように、本発明によれば、
樹脂封止時に突起電極を押し潰すことにより、突起電極
を樹脂表面から確実に露出させることができるため、樹
脂封止面から露出する外部電極を容易に形成可能な半導
体装置の外部電極形成方法を提供することができる。そ
の結果、BGAの作製や三次元実装における製造効率の
向上を実現することができる。As described above, according to the present invention,
Since the protruding electrode can be surely exposed from the resin surface by crushing the protruding electrode during resin sealing, an external electrode forming method for a semiconductor device capable of easily forming an external electrode exposed from the resin sealing surface is provided. Can be provided. As a result, it is possible to improve the manufacturing efficiency of the BGA and the three-dimensional mounting.
【図1】本発明を適用した第1の実施の形態として、圧
縮成形時に突起電極を押し潰す場合の樹脂封止工程の一
例を示す図であり、金型の間に被成形品を配置した状態
を示す説明図である。FIG. 1 is a diagram showing an example of a resin sealing process when a protruding electrode is crushed during compression molding as a first embodiment to which the present invention is applied, in which a molded product is arranged between molds. It is explanatory drawing which shows a state.
【図2】図1に示す被成形品を拡大して示す説明図であ
る。FIG. 2 is an explanatory view showing an enlarged product to be molded shown in FIG.
【図3】図1に示す状態後に被成形品を圧縮した状態を
示す説明図である。FIG. 3 is an explanatory diagram showing a state in which the molded article is compressed after the state shown in FIG.
【図4】図1に示す樹脂封止工程で作製されたE−BG
Aの一例を示す説明図である。FIG. 4 is an E-BG produced in the resin sealing process shown in FIG.
It is an explanatory view showing an example of A.
【図5】本発明を適用した第2の実施の形態として、突
起電極を押し潰した後にトランスファ成形を行う場合の
樹脂封止工程の一例を示す図であり、金型の間に被成形
品を配置した状態を示す説明図である。FIG. 5 is a diagram showing an example of a resin sealing process when transfer molding is performed after the protruding electrodes are crushed as a second embodiment to which the present invention is applied. It is explanatory drawing which shows the state which has arrange | positioned.
【図6】図5に示す状態後に被成形品を圧縮した状態を
示す説明図である。FIG. 6 is an explanatory view showing a state in which the molded article is compressed after the state shown in FIG.
【図7】図6に示す状態後にトランスファ成形を行った
状態を示す説明図である。7 is an explanatory diagram showing a state where transfer molding is performed after the state shown in FIG.
【図8】従来方法で作製されたE−BGAの一例を示す
説明図である。FIG. 8 is an explanatory diagram showing an example of an E-BGA manufactured by a conventional method.
【図9】図8のX矢視図である。9 is a view taken in the direction of arrow X in FIG.
1…回路基板 2…半導体素子 3…突起電極 4…成形品 5…樹脂材料 11…固定下型 12…可動下型 13…下型 14…上型 15…金型 21…多層基板 22…金ワイヤ 23…半導体素子 24…枠体 25…被成形品 26…金バンプ 27…樹脂 28…パッケージダイシングライン 31…金型 31a…ポット 32…下型 32a…キャビティ 32b…ランナ 32c…ゲート 33…上型 34…プランジャ 1 ... Circuit board 2 ... Semiconductor element 3 ... Projection electrode 4 ... Molded product 5 ... Resin material 11 ... Fixed lower mold 12 ... Movable lower mold 13 ... Lower mold 14 ... Upper mold 15 ... Mold 21 ... Multilayer substrate 22 ... Gold wire 23 ... Semiconductor element 24 ... Frame body 25 ... Article to be molded 26 ... Gold bump 27 ... Resin 28 ... Package dicing line 31 ... Mold 31a ... pot 32 ... Lower mold 32a ... Cavity 32b ... runner 32c ... gate 33 ... Upper mold 34 ... Plunger
Claims (4)
の突起電極を有する基板を樹脂封止してなる半導体装置
の外部電極形成方法において、 前記樹脂封止時に、樹脂封止用金型で前記突起電極を圧
縮して押し潰すことにより樹脂封止後に突起電極を樹脂
表面から露出させる、ことを特徴とする半導体装置の外
部電極形成方法。1. A method of forming an external electrode of a semiconductor device, comprising a substrate connected to a semiconductor element and having a protruding electrode for forming an external electrode, which is resin-sealed. A method for forming an external electrode of a semiconductor device, comprising exposing the protruding electrode from the resin surface after resin sealing by compressing and crushing the protruding electrode.
と樹脂を配置して突起電極および樹脂に圧縮力を加える
ことにより突起電極を押し潰しながら樹脂成形を行う、
ことを特徴とする請求項1に記載の半導体装置の外部電
極形成方法。2. When the resin is sealed, a molded product including the protruding electrode and the resin are arranged between the resin sealing molds, and a compressive force is applied to the protruding electrode and the resin to push the protruding electrode. Perform resin molding while crushing,
The method for forming an external electrode of a semiconductor device according to claim 1, wherein:
を配置して突起電極に圧縮力を加えることにより突起電
極を押し潰し、 前記突起電極を押し潰した前記樹脂封止用金型と前記被
成形品の前記基板との間に形成されるキャビティ内に樹
脂を供給して樹脂成形を行う、ことを特徴とする請求項
1に記載の半導体装置の外部電極形成方法。3. At the time of the resin sealing, a molded product including the protruding electrode is arranged between the resin sealing molds, and the protruding electrode is crushed by applying a compressive force to the protruding electrode, The resin molding is performed by supplying a resin into a cavity formed between the resin-sealing mold in which the electrodes are crushed and the substrate of the molding target. Method for forming external electrodes of semiconductor device of.
を形成時の高さの5%以上減少させるように突起電極を
押し潰すことを特徴とする請求項1から3のいずれか1
項に記載の半導体装置の外部電極形成方法。4. The bump electrode is crushed so as to reduce the height of the bump electrode by 5% or more of the height at the time of the resin sealing.
Item 7. A method for forming an external electrode of a semiconductor device according to item.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
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