JP2002049051A - Substrate for liquid crystal display device and liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate for a liquid crystal display device which is a color filter for a liquid crystal display element and in which it is reduced to bring about lowering of a yield and display quality caused by static electricity mainly generated on a rubbing step, liquid drip cleaning and so on in the case of producing the liquid crystal display element and a liquid crystal display device. SOLUTION: Having a column outside a display surface and having a conductive layer formed on the column and/or on the periphery of the column characterized substrate for the liquid crystal display device.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display used as a home, office, or industrial information display terminal, and a liquid crystal using a liquid crystal used as an information processing device in the field of optical communication and optical information processing. The present invention relates to a display device substrate and a liquid crystal display device.

[0002]

2. Description of the Related Art In a conventional liquid crystal display device, a color filter substrate in which pixels are formed by a colored layer and a substrate in which drive electrodes and the like are formed are bonded to each other. (TN method) or more (STN method).

[0003] In both the TN method and the STN method, a transparent conductive film is formed as an electrode in a display region on a color layer of a color filter substrate. In these types of liquid crystal display devices, poor alignment may occur due to surface irregularities of the color filter substrate, and display defects such as light leakage and afterimages may occur. Further, as the driving voltage of the liquid crystal decreases, display defects may be caused by the influence of pigment impurities remaining on the surface of the color filter. In recent years, as a measure against these display defects, a transparent electrode is often formed after a transparent protective film is provided on a colored layer for the purpose of improving surface flatness and forming a protective layer for protecting liquid crystal molecules from minute impurities. Have been.

Further, conventional liquid crystal display devices of the TN mode and the STN mode have good display characteristics when viewed from the front, but have the disadvantage that the contrast is significantly reduced when viewed obliquely. In order to solve this drawback, an in-plane switching (IPS) type liquid crystal display device has recently been developed. In this type of liquid crystal display device, the liquid crystal is oriented in parallel between two liquid crystal display device substrates.
Unlike the conventional case, switching is performed by an electric field applied in a direction parallel to the substrate. Therefore, no driving transparent electrode is formed on the surface of one of the substrates on the side in contact with the liquid crystal. Further, in order not to disturb the direction of the electric field applied in the horizontal direction, a resin in which a light-shielding agent such as a black pigment is dispersed is often used as a material of the light-shielding layer, instead of a metal thin film such as Cr. Further, in the IPS method, since the flatness of the surface is more required, a transparent protective film is often provided.

In forming these liquid crystal display devices, it is necessary to align liquid crystal molecules in any method. Normally, a thin film made of a polyimide resin is formed on the surface of two substrates forming a liquid crystal display device, and a rubbing process is performed by rubbing the thin film in one direction with a blanket such as rayon or cotton to remove the liquid crystal. Orientation. In this rubbing step, very large static electricity is generated.

In recent years, as the size of substrates for liquid crystal display devices has increased, the amount of charge generated on the substrates for liquid crystal display devices due to the transfer of the substrates, spin drying of the substrates, and the like has also increased.

In addition, recently, not only glass substrates,
Lighter plastic sheets and plastic films are used in some liquid crystal display devices. In plastic, compared to a glass substrate, a charged charge is less likely to escape, and static electricity tends to accumulate.

[0008] Charging occurs when a dielectric region such as a glass substrate, plastic or a transparent protective film is rubbed. In particular,
When the surface is made of plastic or a transparent protective film, the amount of static electricity increases.Therefore, when a plastic sheet or film is used, or when a transparent protective film is provided on a liquid crystal display device substrate to improve display quality. , It is more susceptible to this static electricity.

In order to eliminate static electricity generated on the substrate, a method of providing a static eliminator using soft X-rays or plasma in a process, a method of controlling humidity in order to reduce static electricity, and the like are being studied. However, it was not possible to completely eliminate the generated static electricity and completely eliminate its influence. In particular, it was very difficult to remove electricity from a locally charged portion.

[0010] The static electricity generated in the process of manufacturing a substrate for a liquid crystal display device and / or a liquid crystal display device causes
(1) Adhesion of dust and dirt on the substrate, (2) Discharge of circuits and resin films (such as alignment films and transparent protective films) occur.

That is, the following problem has occurred. (1)
Dust or dust causes poor liquid crystal alignment at that location, resulting in poor display. Further, if rubbing was carried out in a state in which dust was bitten, a large scratch was generated on the alignment film, causing display failure. (2) Driving of the liquid crystal becomes unstable due to the destruction of the circuit due to discharge. (3) Discharge deterioration of resin such as alignment film and transparent protective film causes local change of pre-tilt and anchoring energy of liquid crystal, and impurities that change display characteristics from the discharge-degraded part elute into liquid crystal. By that
The display became uneven.

[0012]

SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and an object of the present invention is to provide a liquid crystal display device substrate and a liquid crystal display device with high yield and high reliability. .

[0013]

Means for Solving the Problems The present inventors have achieved a liquid crystal panel according to the present invention which achieves the above-mentioned object and has the following constitution. (1) A substrate for a liquid crystal display device having a column outside a screen, and a conductive film formed on and / or around the column.

(2) A substrate for a liquid crystal display device, wherein columns are formed on a conductive film formed outside a screen.

(3) Any one of (1) and (2), wherein a transparent protective film is formed under the conductive film.
13. The substrate for a liquid crystal display device according to item 13.

(4) The liquid crystal display device according to any one of (1) to (3), wherein a pillar is formed in a region cut off when manufacturing the liquid crystal display device outside the screen. substrate.

(5) The liquid crystal display according to any one of (1) to (4), wherein the conductive film is formed both in the display area of the substrate for a liquid crystal display device and outside the screen. Equipment substrate.

(6) The substrate for a liquid crystal display device according to any one of (1) to (4), wherein the conductive film is not formed in the display region.

(7) Any one of (1) to (6), wherein the height of the pillar is 2 μm or more and 10 μm or less.
13. The substrate for a liquid crystal display device according to item 13.

(8) The substrate for a liquid crystal display device according to any one of (1) to (7), wherein the area of the pillar is 50 μm ² or more and 1 mm ² or less.

(9) The substrate for a liquid crystal display device according to any one of (1) to (8), wherein the pillars have a dot shape.

(10) The substrate for a liquid crystal display device according to any one of (1) to (9), wherein the columns are periodically arranged.

(11) The substrate for a liquid crystal display device according to any one of (1) to (10), wherein the conductive film is an ITO film.

(12) The substrate for a liquid crystal display device according to any one of (1) to (11), wherein the pillar is formed on a light shielding film.

(13) The substrate for a liquid crystal display device according to (12), wherein the light shielding film is a resin containing a light shielding agent.

(14) The substrate for a liquid crystal display device according to any one of (1) to (13), wherein the substrate is a color filter having pixels formed by a plurality of colored layers.

(15) The substrate for a liquid crystal display device according to (14), wherein the pillars are formed by laminating colored layers of two and / or three colors of pixels.

(16) The substrate for a liquid crystal display device according to any one of (1) to (15), wherein a substrate spacing support member is formed in the screen.

(17) A substrate spacing support member is formed in the screen, and the constituent material of the substrate spacing support member in the screen and a part of the constituent material of columns outside the screen are identical. The substrate for a liquid crystal display device according to any one of (1) to (16).

(18) In a liquid crystal display device comprising a liquid crystal sandwiched between two liquid crystal display device substrates, at least one of the liquid crystal display device substrates is described in any one of (1) to (17). A liquid crystal display device characterized by using the substrate for a liquid crystal display device according to (1).

(19) The liquid crystal display device according to (18), wherein the column outside the screen and / or the conductive film around the column is not electrically connected to the display region in the same substrate.

In the present invention, high yield and reliability can be obtained by the liquid crystal display substrate and the liquid crystal display device.

[0033]

Embodiments of the present invention will be described below.

The liquid crystal display device has a structure in which liquid crystal is sandwiched between two substrates for a liquid crystal display device. Examples of the substrate for a liquid crystal display device include a color filter having a plurality of colored pixels, a monochrome color filter having no colored pixels, a substrate on which a driving electrode and a thin film transistor (TFT) are formed, and the like.

The substrate used in the present invention is not particularly limited, but inorganic glass such as quartz glass, borosilicate glass, aluminosilicate glass, soda lime glass having a silica-coated surface, a plastic film or A transparent substrate such as a sheet is preferably used.

The substrate for a liquid crystal display device of the present invention has columns formed outside the screen. The term “outside the screen” refers to an area outside the frame (light-shielding portion around the display screen area) on the liquid crystal display device substrate. When a liquid crystal display device is manufactured, it is preferable to form it also on a portion to be cut off.

FIG. 1 is a schematic diagram for explaining the outside of the screen and the frame. In the substrate 1 for a liquid crystal display, 2 indicates the outside of the screen, 3 indicates the display area, 4 indicates the frame, and 5 indicates the inside of the screen. . The inside 5 of the screen is roughly divided into a display area 3 and a frame 4. The display area is usually partitioned in a matrix by a black matrix. When the liquid crystal display device is manufactured, the substrate for the liquid crystal display device is cut off along the cutout line 9 so as not to cover the display area. The cut-off line 9 may or may not be actually patterned on the substrate. The substrate may be cut on the frame 4.

FIGS. 2A to 2D show an example of a region of a conductive film formed on a substrate. In each case, the conductive film is formed outside the screen. It is generally preferable to form conductive films on all sides of the screen. However, when the screen is close to the edge of the substrate and it is difficult to form a conductive film, the method is not limited to this, and the film may be formed as shown in FIGS. 2B and 2D.

FIGS. 2A and 2B show an example in which a conductive film is not formed in the display region, but is formed outside the screen. In particular, it is suitably used for color filters for in-plane switching. FIGS. 2C and 2D illustrate an example in which a conductive film is formed in a display region and outside a screen. Especially T
It is suitably used for a color filter for N and a color filter for MVA. The conductive film in the display region and the conductive film outside the screen may be formed at the same time, or may be formed in separate steps. However, it is preferable to form them simultaneously from the viewpoint of reducing the number of steps.

On the other hand, FIGS. 14A and 14B show a conventional substrate for a liquid crystal display device in which a conductive film is not formed outside the screen.

The pattern shape of the conductive film formed outside the screen is not particularly limited, but it is preferable that the corner of the pattern is rounded. A sharp corner is not preferred because local discharge is likely to occur from that point. When a conductive film is formed in a display area in a screen, an extraction electrode is usually provided, and it is preferable to round the pattern angle also in the extraction electrode.

The material of the conductive film is not particularly limited, but aluminum, chromium (Cr, CrOx), silver, indium tin oxide (ITO), zinc oxide, tin oxide, and alloys thereof can be used. In particular, ITO is preferable in terms of reliability and productivity in a liquid crystal display device. The thickness of such a conductive film is preferably 0.01 to 1 μm, more preferably 0.03 to 0.5 μm.

In the present invention, a pillar is provided outside the screen.
A conductive film formed on and / or around the pillar
is there. Column density in the area where the conductive film outside the screen was formed
Is 4cm in order to perform static neutralization^TwoOne or more per
Preferably 1cm ^TwoOne or more per
Is more preferable. In the area where the conductive film outside the screen is formed
The number of pillars depends on the area of the area outside the screen, but effective
In order to perform effective static elimination, it is preferable to provide 20 or more.
No. If the density of the columns is low or the number is small, one
The amount of electricity removed from the pillar increases, and the electricity is removed evenly
And discharge deterioration occurs in and around the pillar
There is. Conversely, if the density of the columns is too high, they will collect in one column
Since the charge amount decreases and the charge removal effect decreases,
mm^Two1 or less is preferable, and 0.1 mm^TwoPer
More preferably one or less.

The height of the columns is preferably 2 μm or more and 10 μm or less. The height of the column is the height from the substrate surface to the top of the column. When a transparent protective film or the like is formed on the entire surface of the substrate, the height is from the surface of the transparent protective film on the substrate to the top of the pillar. When the height is less than 2 μm, it is difficult to collect electric charges on the pillar portions, which is not preferable. The maximum column height is
The thickness is preferably 10 μm or less, though it depends on the gap between the liquid crystal layers of the liquid crystal display device and the unevenness at the position where the column of the opposing substrate faces.

The column may or may not contact the opposing substrate, but if it does, the column acts as a substrate spacing support member and the cell gap can be kept more uniform. Therefore, it is more preferable to make the contact.

The area of the pillar is 50 μm, depending on the density of the pillar.
^It is preferably from ^{2 to} 1 mm ² . For more effective neutralization is preferably 50 [mu] m ² or more 100000 ² below.

The shape of the pillar is preferably a dot shape. This is because the dot shape is easier to form. In addition, the periphery of the column is likely to be neutralized on average.

It is preferable that the columns are arranged periodically. This is because the static electricity can be uniformly removed by arranging the electrodes periodically.

The height and shape of the columns are not limited to one type, and a plurality of types may be formed. The number of layers constituting the pillar is not limited.

In the formation of the pillar, it is preferable to form the pillar even in a region outside the screen which is cut off when manufacturing the liquid crystal display device. It is important to provide a liquid crystal display device substrate and a liquid crystal display device with high yield and high reliability to eliminate static electricity even in a region to be cut off. For example, if the area to be cut off is charged, charged substrate fragments generated at the time of cutting off tend to remain on the liquid crystal display device, causing a defect. In addition, the shard stage that is cut off in the charged state (stage of the cutting process)
Even if it is scattered upward, (1) the column creates a gap between the debris and the stage, preventing the substrate from adhering, and (2) the conductive film weakens the electrical attraction between the debris and the stage. And the accompanying defects are reduced.

It is preferable to form columns also in a region outside the screen where no conductive film is formed. The pillars in the region where the conductive film outside the screen is not formed are the pillars in the region where the conductive film outside the screen is formed,
The shape (height, area, etc.), arrangement period, and material may be the same or different.

For the pillar, it is preferable to use resin from the viewpoint of ease of processing and design freedom.

As the material of the pillar, photosensitive or non-photosensitive materials such as polyimide resin, epoxy resin, acrylic resin, urethane resin, polyester resin, polyolefin resin and novolak resin are preferably used. However, the present invention is not limited to these.

There are two types of photosensitive resin (photoresist), that is, a positive type and a negative type. The resin column in the present invention may be either type.

As the positive resist which can be used in the present invention, a mixture of a novolak resin and naphthoquinonediadisulfonate is preferably used.
It is considered that the alkali-soluble portion is eluted by light irradiation, and the remaining portion is used as a resin pillar (see, for example, Chapter 1, "Resistant Material Processing Technology", published by the Technical Information Association, 1991).

On the other hand, as a negative type photoresist,
(1) Cyclic rubber-bis azide type (2) phenol resin-azide type (3) acrylic resin (4) Chemical sensitization type and the like (see the above literature).

As the non-photosensitive resin, those which can be developed with the above-mentioned various polymers are preferably used. However, the non-photosensitive resin should be able to withstand the heat in the process of forming the transparent conductive layer and the process of manufacturing the liquid crystal display device. A resin having excellent heat resistance is preferable, and a resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display device is preferable, and a polyimide resin is particularly preferable.

The polyimide resin preferably used for the resin pillar is not particularly limited, but usually, a polyimide precursor having a structural unit represented by the following general formula (1) as a main component is heated or appropriately heated. Those imidized by a suitable catalyst are preferably used.

[0059]

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Here, n in the general formula (1) is a number of 1 or 2. R ₁ represents an acid component residue, R ₁ Is at least 2
Represents a trivalent or tetravalent organic group having three carbon atoms.
In terms of heat resistance, R ₁ Is preferably a trivalent or tetravalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring and having 6 to 30 carbon atoms. R ₁ Examples of phenyl, biphenyl, terphenyl, naphthalene, perylene, diphenylether, diphenylsulfone, diphenylpropane, benzophenone, biphenyltrifluoropropane, cyclobutyl, cyclopentyl, etc. Groups, but are not limited to these.

R ₂ represents a divalent organic group having at least two carbon atoms. From the viewpoint of heat resistance, R ₂ is preferably a divalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring and having 6 to 30 carbon atoms. Examples of R ₂ include phenyl, biphenyl, terphenyl, naphthalene, perylene, diphenylether, diphenylsulfone, diphenylpropane, benzophenone, biphenyltrifluoropropane, diphenylmethane, cyclohexylmethane, and the like. Derived groups include, but are not limited to.
In the polymer having the structural unit represented by the general formula (1) as a main component, R ₁ and R ₂ may each be composed of one of these, or may be composed of two or more of each. It may be united.

An acrylic resin is also preferably used as the resin pillar. Acrylic resin uses acrylic acid, methacrylic acid, methyl acrylate, alkyl acrylate or alkyl methacrylate such as methyl methacrylate, cyclic acrylate or methacrylate, hydroxyethyl acrylate or methacrylate, and the like. It is preferable to use a resin polymerized to a molecular weight of about 5,000 to 200,000. When including acrylic resin,
Whether the resin composition of the resin pillar is photosensitive or non-photosensitive is not limited, but a photosensitive material is preferably used from the viewpoint of ease of fine processing of the resin pillar. In the case of a photosensitive resin, a composition comprising an acrylic resin, a photopolymerizable monomer, and a photopolymerization initiator is preferably used.

As photopolymerizable monomers for acrylic resins, there are bifunctional, trifunctional and polyfunctional monomers. As the bifunctional monomers, 1,6-hexanediol diacrylate,
Ethylene glycol diacrylate, neopentyl glycol diacrylate, triethylene glycol acrylate, and the like. Trifunctional monomers include trimethylolpropane triacrylate, pentaerythritol triacrylate, tris (2-hydroxyethyl) isocyanate, and the like. Examples include ditrimethylolpropane tetraacrylate, dipentaerythritol penta, and hexaacrylate. As the photopolymerization initiator, benzophenone, thioxanthone, imidazole, triazine and the like are used alone or in combination.

Commercially available acrylic resins include J
SR made Optmer NN700 series and Optmer NN
800 series, Nippon Steel Chemical's V-259PA, and the like are preferred as column resins.

Another resin preferably used as the resin pillar is an epoxy resin. Specific examples of the epoxy resin include a phenol novolak type epoxy resin, a cresol novolak type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a cycloaliphatic epoxy resin, an aliphatic polyglycidyl ether, and the like. Can be used.

As another resin preferably used as the resin pillar, a novolak resin can be mentioned. The novolak resin is used as a positive resist mixed with naphthoquinonediadisulfonate.

For the pillars, organic pigments, inorganic pigments, dyes, and the like can be suitably used, and various additives such as an ultraviolet absorber, a dispersant, and a leveling agent may be added.
As organic pigments, phthalocyanine-based, azilake-based,
Condensed azo, quinacridone, anthraquinone, perylene and perinone are preferably used. Black metal oxide powders such as carbon black, titanium black and manganese oxide, metal sulfide powders, and metal powder mixtures can also be used.

When it is desired to impart high conductivity to the pillar itself, it is preferable to add a conductive material. Although the conductive material is not particularly limited, metal particles and the like are preferable. Examples include carbon black and ITO particles. Among them, carbon black is preferred from the viewpoint of dispersibility in resin and ease of handling.

When a pillar is obtained by patterning, the shape may be distorted or the pillar may remain in an unnecessary area. In order to improve the patterning property, various additives such as a light-shielding agent, a coloring agent, a dispersing agent, a leveling agent, and a surfactant used in a resin black matrix and a coloring layer described later may be added. Specifically, for example, silica, barium sulfate, barium carbonate, calcium carbonate,
An extender such as talc, a coloring pigment such as black, red, blue, and green, a ceramic powder such as alumina, zirconia, magnesia, beryllia, mullite, and cordierite, and a glass-ceramic composite powder are used. Among the extender pigments, barite, barium sulfate, calcium carbonate, silica and talc are preferred, and among them, barium sulfate is preferred from the viewpoint of improving the dimensional stability of the columns.

The method of applying the pillar material on the substrate is as follows.
A dip method, a roll coater method, a spinner method, a die coating method, a wire bar coating method, and the like are preferably used, but a die coating method is preferable from the viewpoint of forming a shape having a uniform height, and a reduction in capital investment is required. From the viewpoint, the roll coater method is preferable. Thereafter, heat drying is performed using an oven or a hot plate. The heating and drying conditions are
It depends on the resin used, solvent, and amount of resin solution applied,
Usually, it is preferable to heat at 60 to 200 ° C. for 1 to 60 minutes. After heating and drying, if the resin is a non-photosensitive resin,
After a photoresist film is formed thereon, and when the resin is a photosensitive resin, exposure or development is performed as it is or after forming an oxygen blocking film. If necessary, the photoresist film or the oxygen barrier film is removed, and the film is heated and dried again. The heating and drying conditions vary greatly depending on the type of resin. When a polyimide-based resin is obtained from a polyimide precursor, the amount varies slightly depending on the coating amount, but is usually 200 to 3
It is common to heat at 00C for 1 to 60 minutes. In the case of an acrylic resin, after processing, it is general to heat and cure at 150 to 300 ° C. for 1 to 60 minutes. Through the above process, columns are formed on the surface of the liquid crystal display device substrate.

The pillar may be formed by a transfer method. That is, a transfer substrate in which a pillar material is formed on a base material in advance is prepared, this is superimposed on the substrate while applying heat or pressure as necessary, exposed and developed, and then the base material is peeled off and the pillar is removed. Is formed on the surface of the substrate for a liquid crystal display device, or a column is formed on a transfer substrate in advance by photolithography, and then the column is transferred onto the substrate for a liquid crystal display device by applying heat or pressure.

In a substrate for a liquid crystal display device having a transparent protective film, a configuration in which the pillar and the conductive film of the present invention are formed outside the screen is preferably used. The transparent protective film is a transparent film for preventing elution of impurities from under the transparent protective film and flattening irregularities of a pattern under the transparent protective film. However, the transparent protective film is difficult to impart conductivity while maintaining the barrier property and the planarizing ability of elution of impurities, and particularly its transparency, so that it is easily charged and easily discharged. Therefore,
In the case of a substrate for a liquid crystal display device having a transparent protective film, it is particularly preferable to form the columns and the conductive film of the present invention outside the screen. The transparent protective film is preferably a resin film of acrylic, epoxy, polyimide or the like.

The pillar is preferably formed on the light shielding film. By forming on the light-shielding film, it is easy to increase the height of the column by the thickness of the light-shielding film. In particular, when the light-shielding film is a resin containing a light-shielding agent, it is particularly preferable because the height of the pillar can be adjusted by the thickness of the light-shielding film, so that the degree of freedom of design is expanded. Above all, when carbon black is contained as a light-shielding agent, the conductivity of carbon black allows charges to be more easily concentrated on the pillars,
preferable.

In order to keep the distance between the two substrates for the liquid crystal display device constituting the liquid crystal display device constant, a spherical spacer arranged by spraying may be interposed or a substrate distance patterned by photolithography or the like may be used. The support member may be interposed. The substrate spacing support member is a patterned resin layer that keeps the space between the substrates constant by coming into contact with the opposing substrate and serves as a spacer.
Japanese Patent Application Laid-Open No. 62-9062 discloses an example of a substrate spacing support member.
There is one described in Japanese Patent Publication No. However, since the spherical spacers are arranged by spraying, the arrangement positions are arbitrary. If the spherical spacer is disposed on a column outside the screen, there arises a problem that the distance between the substrates becomes locally large. Therefore, it is more preferable to form the substrate spacing support member in the screen without using the spherical spacer. FIGS. 3 and 4 show examples of the configuration of the substrate spacing support member.

FIG. 3 is a cross-sectional view of a substrate for a liquid crystal display device manufactured by using a process for forming a substrate spacing support member separately from formation of a black matrix and a colored layer. FIG.
As shown in (B) to (D), a transparent conductive film 17 and a transparent protective film 18 may be formed between the colored layer 13 and the substrate spacing support member 12 as necessary.

FIG. 4 is a sectional view of a substrate for a liquid crystal display device in which a substrate supporting member is formed by laminating colored layers. As shown in FIGS. 4B to 4D, the transparent conductive film 17 and the transparent protective film 18 may be formed so as to cover the stacked body of the colored layers.

The substrate spacing support member formed in the screen is
The same material as the column outside the screen or a different material may be used. However, from the viewpoint of productivity, it is preferable to use the same material and form them simultaneously. By adjusting the height and shape of the pillar formed outside the screen, the pillar may be brought into contact with the opposing substrate to function as a substrate spacing support member.

The following two embodiments are preferable as the substrate for a liquid crystal display device of the present invention. That is, (1) a resin pillar is provided outside the screen, and a conductive film is formed on and / or around the resin pillar. (2) A conductive film is formed outside the screen. , Forming a resin column.
Examples of the embodiments (1) and (2) are shown in FIGS.
Shown in By providing the columns having the configurations (1) and (2), the charges on the substrate are easily collected on the columns, and the charge is easily removed.

FIG. 5 is a cross-sectional view of a pillar on which a conductive film is formed after the pillar resin layer is formed. In FIG. 5A, a pillar resin layer is formed directly on a glass or plastic substrate. FIG.
(B) to (E) are cross-sectional views of columns having a configuration in which a conductive film is provided after a column resin layer is formed on a single layer or a stacked layer of a coloring layer or a black matrix layer.

FIGS. 6A to 6D are sectional views of columns having a structure in which a conductive film is provided on a single layer or a stacked layer of a coloring layer or a black matrix layer.

FIG. 7 is a sectional view of a column having a structure in which a transparent protective film is formed before forming a transparent conductive film in FIGS. 5A to 5E.

FIG. 8 is a sectional view of a column having a structure in which a transparent protective film is formed before forming a transparent conductive film in FIGS. 6A to 6D.

FIG. 9 is a cross-sectional view of a column having a configuration in which a columnar resin layer is formed after forming a transparent protective film and a transparent conductive film is formed.

FIG. 10 is a sectional view of a pillar having a structure in which a transparent protective film and a transparent conductive film are formed, and then a pillar resin layer is formed.

FIG. 11 is a sectional view of a column having a configuration in which a columnar resin layer is formed after a transparent conductive film is formed.

It is also preferable to combine a plurality of columns in accordance with the amount of charge generated on the substrate.

In addition, in the embodiments (1) and (2), a conductive film may or may not be provided at a position where the column abuts on the opposing liquid crystal display device substrate. By forming the conductive film at the abutting portion, discharge generated when two substrates for a liquid crystal display device are bonded to each other can be controlled. However, after the unnecessary portion of the bonded substrate is cut off, in the liquid crystal display device, columns and / or
Alternatively, it is preferable that the peripheral conductive film and the display region in the same substrate are not electrically connected. This is because, when the liquid crystal display device is driven, the display may become unstable due to electric noise generated by columns outside the screen.

The same material as the liquid crystal alignment film formed inside the screen may be formed outside the screen. The liquid crystal alignment film may serve as a barrier layer for elution of impurities from the substrate. By forming the liquid crystal alignment film not only inside the screen but also outside the screen,
Elution of impurities from the substrate outside the screen can be prevented. As a region formed outside the screen, a pillar part outside the screen and / or a conductive film part around the pillar part is preferable.

It is preferable that the upper areas of the substrate spacing support members and the columns are smaller than the lower areas. Upper area 25, lower area 26
Is shown in FIG. If the upper area 25 is large, the substrate spacing support member and the column may be destroyed by electric discharge during static elimination. Further, dust and the like easily accumulate, which may cause display unevenness.

Next, the case where the liquid crystal display substrate is a color filter will be described.

Here, as a normal manufacturing process of a color filter, for example, as shown in Japanese Patent Publication No. 2-1311, first, a black matrix is formed on a substrate, then red (R), green (G), blue The pixel (B) is formed, and an overcoat film is formed thereon as necessary. Thereafter, if necessary, a conductive film is formed to drive the liquid crystal by an electric field.

The light-shielding layer constituting the black matrix may be formed of a metal such as chromium or nickel or an oxide thereof, but the use of a resin black matrix composed of a resin and a light-shielding agent makes it difficult to reduce the production cost and waste. It is preferable from the viewpoint of processing cost. In addition, the resin black matrix layer can be formed with a thickness in the range of 0.5 μm to 2.0 μm while maintaining light-shielding performance that does not cause a problem in display of the liquid crystal panel body. Therefore, in the case where the substrate spacing support member is formed on the black matrix layer or the case where the substrate spacing support member is abutted against the black matrix layer, the substrate spacing can be adjusted by the thickness of the black matrix layer. From this viewpoint, it is preferable to use a resin black matrix. The resin used for the resin black matrix is not particularly limited, but may be an epoxy resin, an acrylic resin, a urethane resin, a polyester resin,
A photosensitive or non-photosensitive material such as a polyimide resin, a polyolefin resin, and gelatin is preferably used. The resin for the black matrix is preferably a resin having higher heat resistance than the resin used for the coloring layer or the protective film of the color filter, and a resin having resistance to the organic solvent used in the step after the formation of the black matrix is preferable. For this reason, a polyimide resin is particularly preferably used.

The polyimide resin is not particularly limited, but usually a polyimide precursor (n = 1 to 2) having a structural unit represented by the following general formula (2) as a main component is heated or heated by an appropriate catalyst. Those imidized are preferably used.

[0094]

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The polyimide resin may contain a bond other than an imide bond such as an amide bond, a sulfone bond, an ether bond, and a carbonyl bond in addition to the imide bond.

In the general formula (2), R ₃ is at least 2
A trivalent or tetravalent organic group having at least two carbon atoms. From the viewpoint of heat resistance, R ₃ contains a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring, and has 3 to 6 carbon atoms.
A valent or tetravalent group is preferred. Examples of R ₃ include a phenyl group, a biphenyl group, a terphenyl group, a naphthalene group, a perylene group, a diphenylether group, a diphenylsulfone group, a diphenylpropane group, a benzophenone group,
Biphenyl trifluoropropane group, cyclobutyl group,
Examples include, but are not limited to, cyclopentyl groups.

R_Four Has at least two carbon atoms
Is a divalent organic group, but from the viewpoint of heat resistance, R_Four Is a ring
Containing a hydrocarbon, an aromatic ring or an aromatic heterocycle, and
A divalent group having 6 to 30 carbon atoms is preferable. R_Four As an example
Phenyl, biphenyl, terphenyl, naph
Talene group, perylene group, diphenyl ether group, diphe
Nyl sulfone group, diphenylpropane group, benzopheno
Group, biphenyltrifluoropropane group, diphenyl
Methane group, dicyclohexylmethane group, etc.
However, it is not limited to these. Structural unit (2) as main component
Polymer is R _Three , R_Four Is from one of each of these
It may be composed of two or more types.
It may be a copolymer. Furthermore, it improves adhesion to the substrate.
Diamine as long as heat resistance is not reduced.
As a component, bis (3-amino) having a siloxane structure
Propyl) tetramethyldisiloxane
Is preferred.

Specific examples of the polymer having the structural unit (2) as a main component include pyromellitic dianhydride, 3, 3
', 4,4'-benzophenonetetracarboxylic dianhydride, 3,3', 4,4'-biphenyltrifluoropropanetetracarboxylic dianhydride, 3,3 ', 4,4'-
Biphenylsulfonetetracarboxylic dianhydride, 2,
At least one carboxylic acid dianhydride selected from the group consisting of 3,5, -tricarboxycyclopentylacetic acid dianhydride and the like, and paraphenylenediamine, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether 3,4 'diaminodiphenyl ether, 3,3
Polyimide synthesized from one or more diamines selected from the group of '-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodicyclohexylmethane, 4,4'-diaminodiphenylmethane Precursors, but are not limited thereto.
These polyimide precursors are synthesized by a known method, that is, by selectively combining tetracarboxylic dianhydride and diamine and reacting them in a solvent.

As a light shielding agent for a black matrix,
Metal oxide powders such as carbon black, titanium black and iron tetroxide, metal sulfide powders, metal powders, pigments, and mixtures thereof can be used. Among them, especially carbon black and titanium black have excellent light-shielding properties,
Particularly preferred. Since carbon black having a good dispersion and a small particle diameter mainly exhibits a brownish color tone, it is preferable to mix a pigment of a complementary color to the carbon black to obtain an achromatic color. When using titanium black for the black matrix, titanium black is TiNxOy (however,
It is preferable that the composition is such that 0 ≦ x <1.5 and 0.1 <y <1.8).

When the resin for the black matrix is polyimide, the black paste solvent is usually N-methyl-2-pyrrolidone, N, N-dimethylacetamide,
Amide polar solvents such as N, N-dimethylformamide and lactone polar solvents such as γ-butyrolactone are preferably used.

As a method for dispersing a light-shielding agent such as a complementary color pigment in carbon black or carbon black,
For example, there is a method in which a light-shielding agent, a dispersant, and the like are mixed in the polyimide precursor solution and then dispersed in a disperser such as a three-roll mill, a sand grinder, and a ball mill, but the method is not particularly limited. In addition, various additives may be added for improving the dispersibility of carbon black, or for improving applicability and leveling property.

The method for producing the resin black matrix is as follows.
For example, after applying and drying a black resin composition on a substrate,
There is a method of performing patterning. As a method of applying the black resin composition, a dipping method, a roll coater method,
A spinner method, a die coating method, a method using a wire bar, or the like is suitably used, and thereafter, heating and drying are performed using an oven or a hot plate. The semi-cure condition is
It depends on the resin used, solvent and paste application amount,
Usually, it is preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

In the case where the resin is a non-photosensitive resin, the coating of the black resin composition thus obtained is formed after forming a photoresist coating thereon. In this case, exposure and development are performed as they are or after forming an oxygen barrier film. If necessary,
The photoresist or the oxygen barrier film is removed, and the film is dried by heating. The heating and drying conditions are slightly different depending on the coating amount when a polyimide resin is obtained from the precursor.
It is general to heat at 00 to 300 ° C. for 1 to 60 minutes. Through the above process, a black matrix layer is formed on the substrate.

The light shielding property of the black matrix is O
It is represented by D value (common logarithm of reciprocal of transmittance). In order to improve the display quality of the liquid crystal display device, the OD value is preferably 2.0 or more, more preferably 2.5 or more.
More preferably, it is 3.0 or more. The preferred range of the thickness of the resin black matrix has been described above, but the upper limit of the OD value should be determined in relation to this. The OD value was measured using a microspectrophotometer MCPD manufactured by Otsuka Electronics Co., Ltd.
Using 2000, a substrate without a black matrix was measured as a reference.

The reflectance of the black matrix is represented by a reflectance (Y value) obtained by correcting the visibility in the visible region of 400 to 700 nm in order to reduce the influence of the reflected light and improve the display quality of the liquid crystal display device. % Or less, more preferably 1% or less. The reflectance was measured by using a microspectroscopic light MCPD2000 manufactured by Otsuka Electronics Co., Ltd. using an aluminum thin film as a reference.

Between the black matrices in the display screen,
Usually, an opening of (20 to 200) μm × (20 to 300) μm is provided, but pixels of three primary colors are provided at positions corresponding to one of the pair of substrates constituting the liquid crystal panel body. Are arranged in a plurality.

The coloring layers forming the pixels include at least three primary colors. That is, when performing color display by the additive color method, three primary colors of red (R), green (G), and blue (B) are selected. When performing color display by the subtractive color method, cyan (C) and magenta are used. (M) and three primary colors of yellow (Y) are selected. Generally, a picture element for color display can be formed by using an element including these three primary colors as one unit. For the coloring layer, a resin colored with a coloring agent is used. In a so-called monochrome color filter, a color display cannot be performed because a resin colored with a coloring agent is not used in a display area, but it is suitably used for a display device for applications requiring image resolution.

As the coloring agent used in the coloring layer, organic pigments, inorganic pigments, dyes, and the like can be preferably used.
Further, various additives such as an ultraviolet absorber, a dispersant, and a leveling agent may be added. As the organic pigment, phthalocyanine-based, aziraki-based, condensed azo-based, quinacridone-based, anthraquinone-based, perylene-based, and perinone-based pigments are preferably used.

As the resin used for the colored layer, photosensitive or non-photosensitive materials such as epoxy resin, acrylic resin, urethane resin, polyester resin, polyimide resin, polyolefin resin and gelatin are preferably used. It is preferable to disperse or dissolve the colorant in these resins for coloring. As the photosensitive resin, there are types such as a photodecomposable resin, a photocrosslinkable resin and a photopolymerizable resin, and in particular, a monomer, an oligomer or a polymer having an ethylenically unsaturated bond and an initiator which generates a radical by ultraviolet rays. A photosensitive composition, a photosensitive polyamic acid composition, and the like are preferably used. As the non-photosensitive resin, those which can be developed with the above-mentioned various polymers are preferably used. However, heat-resistant resins capable of withstanding such heat in the process of forming a transparent conductive film and the process of manufacturing a liquid crystal display device are preferably used. Is preferable, and a resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display device is preferable. Therefore, a polyimide resin is particularly preferably used.

As a method for forming a colored layer, for example,
There is a method of patterning after applying and drying the colored resin composition on the substrate. Examples of a method of obtaining a colored resin composition by dispersing or dissolving a colorant include a method in which a resin and a colorant are mixed in a solvent and then dispersed in a dispersing machine such as a three-roll, sand grinder, and ball mill. However, the method is not particularly limited.

As a method for applying the colored resin composition,
As in the case of the black resin composition, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are suitably used, and thereafter, heating and drying are performed using an oven or a hot plate. The heating and drying conditions vary depending on the resin used, the solvent, and the amount of the resin composition applied, but it is usually preferable to heat at 60 to 200 ° C for 1 to 60 minutes. In the case where the resin is a non-photosensitive resin, the coating of the colored resin composition thus obtained is formed after forming a photoresist coating thereon, or when the resin is a photosensitive resin. Is exposed or developed as it is or after forming an oxygen barrier film such as polyvinyl alcohol. If necessary, the photoresist or the oxygen blocking film is removed, and the film is dried by heating. The heating and drying conditions vary depending on the resin, but when a polyimide-based resin is obtained from a precursor, it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a patterned colored layer is formed on the substrate.

When the substrate for a liquid crystal display device is a color filter having pixels formed of colored layers of a plurality of colors, colored layers of two and / or three colors of the pixels may be laminated to form columns. . In addition, a colored layer of one color and / or two colors and / or three colors of pixels is laminated on a base made of the same material as the black matrix layer,
It may be a pillar.

In the present invention, a conductive film necessary for driving the liquid crystal may be formed on the substrate as needed.
The conductive film is manufactured through a method such as dipping, chemical vapor deposition, vacuum evaporation, sputtering, or ion plating. As the conductive film used in the present invention, those having a low resistance value, high transparency, and which do not impair color display characteristics are preferable. As a specific example of a typical transparent conductive film, indium tin oxide (ITO), zinc oxide, tin oxide, an alloy thereof, and the like can be used. The thickness of such a transparent conductive film is 0.01 to 1 μm
And more preferably 0.03 to
0.5 μm. There is no particular limitation on the order in which the conductive films are formed. However, in the case where a conductive film is formed over a substrate having a substrate spacing support member, it is preferable that the liquid crystal be driven before the formation of the substrate spacing support member.

Usually, the transparent electrode is formed only in the display area of the LCD, but in the present invention, the conductive film is also formed outside the screen. Further, in the IPS type LCD characterized by a wide viewing angle characteristic, which has begun to be widely adopted in recent years, since a transparent electrode is not provided in a display region, a conductive film is provided only in a non-display region in the present invention. Become. The conductive film outside the screen in the present invention may be formed simultaneously with or separately from the conductive film in the display region.

A transparent protective film may be provided on the colored layer on the substrate and / or on the black matrix layer.
The formation of the transparent protective film, when forming a transparent electrode on the color filter, to reduce the loss of driving voltage,
Before the formation of the transparent electrode is preferred.

The coloring layer and the black matrix of the present invention may have a thin film transistor (TFT) element,
A thin film diode (TFD) element, a scan line, a signal line, and the like may be provided.

An example of a method for manufacturing a substrate provided with a thin film transistor element will be described below.

A chromium thin film is formed on an alkali-free glass substrate by sputtering, and the gate electrode is patterned by photolithography. Next, plasma CVD
Thereby, a silicon nitride film, an amorphous silicon film as an insulating film, and a silicon nitride film as an etching stopper are continuously formed. Next, the silicon nitride film serving as an etching stopper is patterned by photolithography. An n + amorphous silicon film is formed and patterned for the TFT terminal to make an ohmic contact with the metal electrode, and an ITO film to be a display electrode is formed and patterned. Further, aluminum is applied as a wiring material by sputtering, and signal wiring and a metal electrode of a TFT are formed by photolithography. Using the drain electrode and the source electrode as masks, the n + amorphous silicon film in the channel portion is removed by etching to obtain an electrode substrate provided with a TFT element. In the case of a reflective liquid crystal display element, the display electrode is made of a material having a high reflectance such as aluminum or silver.

Next, the liquid crystal display will be described. FIGS. 13A and 13B show an example of the liquid crystal display device of the present invention. FIG. 13A illustrates an example in which a pillar abuts on an opposing substrate, and FIG. 13B illustrates an example in which a pillar does not abut an opposing substrate. By forming the pillar so as to be in contact with the opposing substrate as shown in FIG. 13A, the column can function as a substrate spacing support member. The column may or may not be brought into contact with the opposing substrate depending on the design of the opposing portion. The pillar 12, the substrate spacing support member 20, the coloring layer 14,
A liquid crystal display device substrate (color filter) on which the black matrix layer 16 and the liquid crystal display device 19 are formed is bonded to a facing liquid crystal display device substrate. On the opposing substrate for a liquid crystal display device, a thin film transistor (TFT) element, a gate electrode 30, a signal line, and the like are provided in addition to the storage capacitor and the pixel electrodes 29 and 32. A liquid crystal alignment film 28 is provided on a pair of substrates for a liquid crystal display device, and is subjected to an alignment process such as rubbing. After the alignment treatment, the color filter and the opposing substrate are attached to each other using the sealant 38, and the liquid crystal 27 is injected from an injection port provided in the seal portion.
Seal the inlet. A liquid crystal panel is completed by mounting an IC driver or the like after attaching the polarizing plate to the outside of the substrate.

The liquid crystal to be used is not particularly limited, but more preferably a nematic liquid crystal or a smectic liquid crystal is used for obtaining a good display. The smectic liquid crystal includes a ferroelectric liquid crystal, an antiferroelectric liquid crystal, a thresholdless antiferroelectric liquid crystal, and the like.

Similarly, there is no particular limitation on the display method. For example, display methods using a nematic liquid crystal include a twisted nematic type (TN), a super twisted nematic type (STN), a vertical alignment type (VA), an in-plane switching type (IPS), and the like. Is raised. A system in which these liquid crystals are divided into alignments, for example, a display system in which vertical alignment is divided, for example, a so-called multi-domain vertical alignment type system (MVA) (for example, (1) MV
A Alignment control technology in liquid crystal displays, P117
EKISHO Vol. 3 No. 2 1999, (2)
SID2000 25.3: An Ultra-hig
h-quality MVA-LCD Using a
NewMulti-Layer CF Resin
Spacer and Black-Matrix,
(3) SID2000 23.1: Fast-Switc
hing LCD with Multi-Domai
n Vertical Alignment Drive
en by an Oblique Electric
Field, (4) Japanese Patent No. 2947350) and the like.

The color filter of the present invention and the color liquid crystal display device using the same are used for display screens of personal computers, word processors, engineering workstations, navigation systems, liquid crystal televisions, videos, etc. It is preferably used. Further, in the field of optical communication and optical information processing, it is suitably used as a spatial modulation element using a liquid crystal. A spatial modulation element modulates the intensity, phase, deflection direction, etc. of light incident on the element according to an input signal to the element, and is used for real-time holography, a spatial filter, incoherent / coherent conversion, and the like. It is.

[0123]

Hereinafter, the present invention will be described in more detail with reference to preferred embodiments, but the efficacy of the present invention is not limited by the embodiments used.

[Example 1] (1. Preparation of color filter) (Preparation of resin black matrix) 3, 3 ', 4, 4'
-Biphenyltetracarboxylic dianhydride, 4,4'-diaminodiphenyl ether, and bis (3-aminopropyl) tetramethyldisiloxane with N-methyl-2
The reaction was carried out using pyrrolidone as a solvent to obtain a polyimide precursor (polyamic acid) solution.

A carbon black mill base having the following composition was dispersed at 7000 rpm for 30 minutes using a homogenizer, and the glass beads were filtered to prepare a black paste.

Carbon black mill base Carbon black (MA100, manufactured by Mitsubishi Kasei Corporation): 4.6 parts Polyimide precursor solution: 24.0 parts N-methylpyrrolidone: 61.4 parts Glass beads: 90.0 parts 300 × A black paste is applied on a 350 mm-sized non-alkali glass (OA-2, manufactured by NEC Corporation) substrate using a spinner, and placed in an oven at 135 ° C.
For 20 minutes. Subsequently, a positive resist (Shipley “Micropost” RC100)
30 cp) with a spinner and dried at 90 ° C. for 10 minutes. The resist film thickness was 1.5 μm. Using an exposure machine PLA-501F manufactured by Canon Inc., exposure was performed through a photomask having a pattern of a black matrix portion, a frame portion, and a part of a column (base portion). Next, using a 23 ° C. aqueous solution containing 2% by weight of tetramethylammonium hydroxide (TMAH) as a developing solution, the substrate was dipped in the developing solution, and simultaneously the substrate was swung so as to make a 10 cm width reciprocation once in 5 seconds. Then, the development of the positive resist and the etching of the polyimide precursor were performed simultaneously. The development time was 60 seconds. After that, the positive resist was stripped with methyl cellosolve acetate,
After curing for 0 minute, a resin black matrix substrate having a pattern of a black matrix portion, a frame portion, and a base portion was obtained. The thickness of the resin black matrix is 0.90 μm
And the OD value was 3.0. Further, the reflectance at the interface between the resin black matrix and the glass substrate (Y
Value) was 1.2%. The area of the base of the pillar by the resin black matrix outside the screen was about 50,000 μm ² . The pillar base is also formed in a region that is cut off when the liquid crystal display device is formed outside the screen. ^They were periodically arranged at equal intervals of about one piece per 1 cm ² .

(Preparation of Colored Layer) Next, as a red, green, and blue pigment, Color index Nos. 65300
Pigment Red 177, a colorant of Color Index No. 74
Pigment Green 36, a phthalocyanine green-based pigment, Color Inde
x No. 74160 Pigment Blue 1
A phthalocyanine blue pigment represented by 5-4 was prepared. The pigments were mixed and dispersed in a polyimide precursor solution to obtain three kinds of colored pastes of red, green and blue. First, a blue paste was applied on a substrate, dried with hot air at 80 ° C. for 10 minutes, and semi-cured at 120 ° C. for 20 minutes. Thereafter, a positive resist (Shipley "Microposi") is used.
t ”RC100 30cp) with a spinner,
It was dried at 80 ° C for 20 minutes. Exposure is performed using a mask, and an alkali developer (Shipley "Microposi")
At t ″ 351), the substrate was dipped, and simultaneously, while simultaneously swinging the substrate, development of the positive resist and etching of the polyimide precursor were performed. Thereafter, the positive resist was peeled off with methyl cellosolve acetate. Curing was performed at 300 ° C. for 30 minutes, and the thickness of the colored pixel portion was 1.7 μm.With this patterning, the blue pixel was formed and the base of the blue colored layer was further formed on the frame, on the base of the black matrix outside the screen. area of the base of the blue color layers of the formed. offscreen area of the base of the blue color layers on about 25000Myuemu ² edge was about 500 [mu] m ^2.
After washing with water, red pixels were formed in the same manner.
No new pillar base was formed. The thickness of the red pixel portion was 1.8 μm. After washing with water, green pixels were formed in the same manner. The pillar base did not form.
The thickness of the green pixel portion was 1.5 μm. Next, as shown in FIG.
An O film was formed as a mask. A film was formed also in an area cut off outside the screen. The thickness of the ITO film was 150 nm, and the surface resistance was 20 Ω / □. After washing with water, a resin layer for the pillar and the substrate spacing support member was laminated. The polyimide precursor solution described above was used for the resin layer. Apply the polyimide precursor solution, dry with hot air at 90 ° C for 15 minutes,
Semi-cure at 125 ° C. for 20 minutes. Thereafter, a positive resist (Shipley “Micropost” R)
C100 30 cp) was applied with a spinner and dried at 80 ° C. for 20 minutes. Exposure is performed using a mask, and an alkali developer (Shipley “Micropost” 35)
In 1), the substrate was dipped, and simultaneously the developing of the positive resist and the etching of the polyimide precursor were simultaneously performed while rocking the substrate. After that, the positive resist is peeled off with methylcellosolve acetate, and further, 300
Cure at 30 ° C. for 30 minutes. The thickness of the resin layer was 5.2 μm. By this patterning, pillars and substrate spacing support members were formed in the screen and on the frame, and on the base of the black matrix outside the screen.

The upper area of the resin substrate supporting member in the screen is about 120 μm ² , and the lower area of the resin layer is about 130 μm.
m ² . An upper area of about 120 μm ² and a lower area of about 130 μm ² were also formed on the frame. The area above the resin pillar outside the screen is about 10,000 μm ² (size 10
0 × 100 μm), and the area under the resin layer is about 12,000.
μm ² (size 110 × 110 μm). The column height was 6 μm. It should be noted that one substrate spacing support member in the screen was provided for every three pixels (one pixel: 100 μm × 300 μm). (2. Production of Color Liquid Crystal Display Device) A polyimide-based alignment film was provided on the above color filter, and rubbing treatment was performed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. After bonding the color filter provided with the alignment film and the transparent electrode substrate provided with the thin film transistor element using a sealant, unnecessary regions outside the screen were cut off. Next, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device had no short circuit between the color filter substrate and the opposing substrate, could secure a uniform cell gap, and had good display quality.

[Embodiment 2] Similar to Embodiment 1, formation of black matrix, picture frame, red, blue, and green pixels, part of pillar and substrate spacing support member outside the screen and on picture frame (base) Is formed on the substrate, hydrolyzate of γ-aminopropylmethyldiethoxysilane (1 molar equivalent) and p-phenylenediamine (0.5 molar equivalent)
A solution of a curable composition (polyimide siloxane precursor) obtained by reacting with 3 ′, 4,4′-biphenyltetracarboxylic dianhydride (1 molar equivalent) is spin-coated, and the solution is treated at 280 ° C. for 40 minutes. Heat treatment was performed to form a 0.5 μm thick transparent protective film made of polyimidesiloxane. Thereafter, as in the case of Example 1, the formation of the ITO film inside and outside the screen, the lamination of the resin layer for the pillar and the substrate gap supporting member, and the like were performed. Using this color filter substrate, a color liquid crystal display device was manufactured. In the obtained liquid crystal display device, there is no short circuit between the color filter substrate and the opposing substrate, a sufficient cell gap can be secured, and the overcoat film (transparent protective film) reduces the inclination around the spacer. In this case, poor display did not easily occur and the display quality was good.

Example 3 As in Example 2, formation of a black matrix, a frame, pixels of red, blue, and green, and formation of pillars and a part (base) of a substrate spacing support member were performed.
However, the base of the colored layer was not formed on the frame. Next, a transparent protective film was formed in the same manner as in Example 2, and an IT
An O film was formed, and a column resin layer was formed. Substrate spacing support members were formed inside the screen and columns were formed outside the screen. A liquid crystal display device was manufactured using the above color filters. A polyimide-based alignment film was provided on the color filter and rubbed. Further, a counter substrate with a transparent electrode provided with a low-temperature polysilicon type thin film transistor element was prepared, and a polyimide-based alignment film was similarly provided, followed by rubbing treatment. A color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant. A rod-shaped spacer was mixed in the sealing material. Next, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device had no short circuit between the color filter substrate and the opposing substrate, could secure a uniform cell gap, and had good display quality.

Example 4 As in Example 3, formation of a black matrix, a picture frame, pixels of red, blue, and green, and formation of pillars and a part (base) of a substrate spacing support member were performed.
No base of colored layer was formed on the picture frame. The base outside the screen was not formed of a black matrix, but formed only of a colored layer. Next, in the same manner as in Example 2, a transparent protective film was formed, an ITO film was formed inside and outside the screen, and a resin layer for supporting members for supporting columns and substrates was formed. Pillars were formed inside and outside the screen. A liquid crystal display device was manufactured using the above color filters. A polyimide-based alignment film was provided on the color filter and rubbed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. In the counter substrate with the transparent electrode, a driving wiring pattern different from that of the third embodiment is formed in a column abutting portion outside the screen. A color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant.
A rod-shaped spacer was mixed in the sealing material. Next, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device had no short circuit between the color filter substrate and the opposing substrate, could secure a uniform cell gap, and had good display quality.

[Embodiment 5] Similar to Embodiment 1, formation of black matrix, picture frame, red, blue, and green pixels, and formation of a part (base) of a pillar and a substrate spacing support member outside the picture and on the picture frame. The formation was performed. However, different from Example 1, a light-shielding film in which a chromium-based metal was formed on a black matrix was used. Also, no transparent protective film was provided. Thereafter, as in the case of Example 1, the formation of the ITO film inside and outside the screen, the lamination of the resin layer for the pillar and the substrate gap supporting member, and the like were performed. Using this color filter substrate, a color liquid crystal display device was manufactured. The obtained liquid crystal display device had no short circuit between the color filter substrate and the opposing substrate, a sufficient cell gap was secured, and had a good display quality.

[Sixth Embodiment] Similar to the first embodiment, the black matrix, the frame, the formation of the pixels of red, blue and green, and the part of the pillar and the substrate interval supporting member outside the screen and on the frame (base)
Was formed. Next, an acrylic transparent protective film was formed, a transparent conductive film (ITO film) was formed outside the screen, and a column resin layer was laminated. A photosensitive negative acrylic material was used as the resin material. No ITO film was formed on the screen. A color liquid crystal display device was manufactured using this color filter substrate. As the substrate on the side opposite to the color filter, a substrate having a comb-shaped electrode of a pixel electrode and a common electrode and a thin film transistor was used. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device which does not have a common electrode on the color filter substrate side. The obtained liquid crystal display had good display quality.

[Embodiment 7] In the same manner as in Embodiment 1, the formation of the black matrix, the picture frame, the pixels of red, blue, and green, and the formation of the pillar and a part of the substrate spacing support member (base) on the picture frame are performed. Was. After forming an epoxy-based transparent protective film, an ITO film was formed inside and outside of the screen, and then a column and a resin layer for a substrate-interval support member were laminated. A photosensitive negative acrylic material was used as the resin material. A color liquid crystal display device was manufactured using this color filter substrate. In the obtained liquid crystal display device, there is no short circuit between the color filter substrate and the opposing substrate, a sufficient cell gap can be secured, and the overcoat film (transparent protective film) reduces the inclination around the spacer. In this case, poor display did not easily occur and the display quality was good.

[Eighth Embodiment] Similar to the first embodiment, the black matrix, the picture frame, the formation of the pixels of red, blue and green, and the part of the pillar and the substrate spacing support member outside the screen and on the picture frame (base)
Was formed. After forming the acrylic transparent protective film, a transparent conductive film (ITO film) was formed inside and outside the screen. Thereafter, lamination of the pillar and the resin layer for the substrate spacing support member was performed inside the screen, on the frame, and outside the screen. Photosensitive JSR as resin material
Negative type acrylic material (NN810 or NN70)
0) or V-259PA manufactured by Nippon Steel Chemical Co., Ltd. was used.
For example, in NN700, pillar patterning was performed as follows. First, NN700 was applied on a substrate by a slit die coater, and then prebaked on a hot plate at 80 ° C. for 3 minutes for contacts. Next, an exposure machine (canon P
150, 200, 250, 3 using LA-501F).
Irradiation was performed at 00 mJ / cm ² (i-line). After exposure, TMA
Developed with H aqueous solution (0.15%). Next, the exposed product having the best shape after development is rinsed with ultrapure water for 60 seconds, and post-baked (220 ° C., 6 ° C. in a clean oven).
0 min). Through the above steps, the pillar and the substrate spacing support member are formed. NN810 and V-259PA
Also, by optimizing the exposure condition, the pre-bake temperature, etc., the columns and the substrate spacing support members were formed on the color filters.
A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a pixel electrode, a thin film transistor, and the like. The present color liquid crystal display device is a so-called TN liquid crystal display device.
The obtained liquid crystal display device includes a device using NN810,
Both the one using NN700 and the one using V-259PA ensured a sufficient cell gap, and had good display quality with uniform cell gap accuracy.

[Embodiment 9] Similar to Embodiment 1, formation of black matrix, picture frame, red, blue, and green pixels, and part of column and substrate spacing support members outside the screen and on the picture frame (base)
Was formed. However, the base of the colored layer outside the screen and on the frame was formed of a red colored layer instead of a blue colored layer. After forming the acrylic transparent protective film, a transparent conductive film (ITO film) was formed inside and outside the screen. Thereafter, lamination of the pillar and the resin layer for the substrate spacing support member was performed inside the screen, on the frame, and outside the screen. As the column resin material, a photosensitive JSR negative type acrylic material (NN810 or NN700) or Nippon Steel Chemical's V-259PA was used. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has pixel electrodes, thin film transistors, and the like, but has an array structure different from that of the eighth embodiment. For example, the height and material of the portion where the column on the color filter side is abutted are different from those of the eighth embodiment. The present color liquid crystal display device is a so-called TN liquid crystal display device. As for the obtained liquid crystal display devices, those using NN810, those using NN700 and those using V-259PA were of good display quality.

[Embodiment 10] Similar to Embodiment 1, formation of black matrix, picture frame, red, blue and green pixels and part of column and substrate spacing support members outside the screen and on the picture frame (base)
Was formed. However, by changing the photomask, the base outside the screen and on the picture frame is divided into two parts: (1) where the red coloring layer is laminated on the black matrix and (2) where the green coloring layer is laminated on the black matrix. is there. Then, after forming an acrylic transparent protective film, a transparent conductive film (I
(TO film). After that, the lamination of the resin layer for pillars was (1)
It was formed at the point (2). The column material used had the same composition as in Example 9. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has pixel electrodes, thin film transistors, and the like, but has an array structure different from that of the eighth embodiment. Embodiment 9 is different from Embodiment 9 in the configuration of the location where the column on the color filter side is abutted.

According to the height, electrical characteristics, and mechanical characteristics of the place where the column is abutted, the density distribution between the configuration in which the column is formed on (1) and the configuration in which the column is formed on (2) is different. Is different. The present color liquid crystal display device is a so-called TN liquid crystal display device. The obtained liquid crystal display device is NN810
And NN700, V-25
9PA sufficient cell gap was ensured, and the cell gap accuracy was uniform and good display quality was obtained.

Example 11 In the same manner as in Example 8, the formation of the black matrix, the picture frame, the pixels of red, blue, and green, and the formation of the pillars and a part (base) of the substrate spacing support member were performed. However, using a photomask different from that in Example 8,
No foundation was formed on the picture frame. The base outside the screen was not formed of a black matrix, but formed only of a colored layer. Acrylic transparent protective film formation, IT similar to Example 8,
An O film is formed and a negative type acrylic material (NN81 manufactured by JSR) is formed.
0 or NN700) or Nippon Steel Chemical V-259P
A was used to form a column resin layer. Pillars were formed inside and outside the screen. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a pixel electrode, a thin film transistor, and the like, but has a structure different from that of the eighth embodiment. The present color liquid crystal display device is a so-called TN liquid crystal display device.
The obtained liquid crystal display device had a sufficient cell gap and a good display quality with uniform cell gap accuracy.

Example 12 In each of Examples 8 to 11, a color filter substrate was produced using an epoxy-based transparent protective film or a polyimidesiloxane transparent protective film instead of an acrylic-based transparent protective film. Using this color filter substrate, a color liquid crystal display was produced. The present color liquid crystal display device is a so-called TN type liquid crystal display device.
The obtained liquid crystal display had good display quality.

[Thirteenth Embodiment] Similar to the first embodiment, the black matrix, the picture frame, the formation of the pixels of red, blue and green, and the formation of a part (base) of the pillar and the substrate spacing supporting member outside the screen and on the picture frame are provided. The formation was performed. However, different from Example 1, a light-shielding film in which a chromium-based metal was formed on a black matrix was used. A photosensitive acrylic resin was used as a material for the colored layer. Also, no transparent protective film was provided. Thereafter, as in Example 1, an ITO film was formed inside and outside the screen, and a column resin layer was laminated. Using this color filter substrate,
A color liquid crystal display device was manufactured. The present color liquid crystal display device is a so-called TN type liquid crystal display device. The obtained liquid crystal display had good display quality.

Example 14 As in Example 6, formation of a black matrix, a picture frame, pixels of red, blue, and green, and formation of a part of a pillar (base) outside the screen were performed. However, the base of the substrate spacing support member was not formed on the frame. After forming an acrylic transparent protective film, lamination of a pillar resin layer and the like were performed. As the column resin material, a photosensitive negative type acrylic material (Optomer NN700 and NN810 manufactured by JSR) or V-259PA manufactured by Nippon Steel Chemical was used. No ITO film was formed in the display area in the screen. A color liquid crystal display device was manufactured using this color filter substrate.
As the substrate on the side opposite to the color filter, a substrate having a comb-shaped electrode of a pixel electrode and a common electrode and a thin film transistor was used. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device which does not have a common electrode on the color filter substrate side. Both those using NN700 and those using NN800 series
The liquid crystal display device obtained using -259PA also had good display quality.

[Embodiment 15] Similarly to Embodiment 6, the black matrix, the picture frame, the formation of the pixels of red, blue, and green, and the part (base) of the pillar and the substrate interval supporting member on the outside of the picture and on the picture frame are provided. The formation was performed. An acrylic transparent protective film was formed. After forming a transparent conductive film (ITO film) outside the screen, the lamination of the column and the resin layer for the substrate spacing support member is performed within the screen, on the frame,
Went off the screen. As the resin material, a photosensitive JSR negative type acrylic material (NN810 or NN700) or Nippon Steel Chemical's V-259PA was used. A color liquid crystal display device was manufactured using this color filter substrate. A common electrode is provided on the substrate on the opposite side of the color filter,
It has a pixel electrode, a thin film transistor, and the like. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. The obtained liquid crystal display device is NN
810 and NN700, V
The sample using -259PA also had good display quality.

[Sixteenth Embodiment] As in the sixth embodiment, the formation of the black matrix, the frame, the pixels of red, blue, and green, and the formation of a part (base) of the pillar and the substrate spacing support member outside the screen and on the frame. The formation was performed. However, the base of the colored layer outside the screen and on the frame was formed of a red colored layer instead of a blue colored layer. After forming the acrylic transparent protective film, an ITO film was formed in the screen, and the resin layers for the pillars and the substrate spacing support member were laminated in the screen, on the frame, and outside the screen. As the resin material for the column and substrate spacing support member, a photosensitive JSR negative acrylic material (NN810 or NN700) or Nippon Steel Chemical V
-259PA was used. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a common electrode, a pixel electrode, a thin film transistor, and the like, but has an array structure different from that of the fifteenth embodiment. For example, the height and the material (electrical characteristics, mechanical characteristics, and the like) of the portion where the column on the color filter side is abutted are different from those in Example 15. This color liquid crystal display device
This is a so-called in-plane switching type liquid crystal display device. As for the obtained liquid crystal display devices, those using NN810, those using NN700 and those using V-259PA were of good display quality.

[Embodiment 17] As in Embodiment 6, the formation of black matrix, picture frame, red, blue, and green pixels and the base of the substrate nucleus support member on the picture frame and a part of the pillar outside the screen (base) ) Was formed. However, due to the change of the photomask, the base outside the screen and on the picture frame is divided into two parts: (1) where the red coloring layer is laminated on the black matrix and (2) where the green coloring layer is laminated on the black matrix. is there. Thereafter, an acrylic transparent protective film is formed, an ITO film is formed outside the screen, and the resin layer for the pillars and the substrate spacing support member is laminated (1).
And (2). The material used had the same composition as in Example 9. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the side opposite to the color filter has a common electrode, a pixel electrode, a thin film transistor, and the like, but differs from Example 16 in the configuration of the location where the column on the color filter side abuts. Depending on the height, electrical characteristics, and mechanical characteristics of the place where the column is struck, the density distribution of the configuration with the column formed on (1) and the configuration with the column formed on (2) is different . The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. Regarding the obtained liquid crystal display device, both the one using NN810 and the one using NN700
The sample using A was also of good display quality.

[Embodiment 18] In the same manner as in Embodiment 6, formation of a black matrix, a frame, pixels of red, blue, and green, and formation of a part (base) of a pillar were performed. However, a photomask different from that of Example 6 was used, and no base was formed on the frame. The base outside the screen was not formed of a black matrix, but formed only of a colored layer. An acrylic transparent protective film was formed in the same manner as in Example 6, and an ITO film was formed outside the screen. Next, a negative type acrylic material (NN810 or N
N700), a substrate spacing support member and a pillar were formed using V-259PA manufactured by Nippon Steel Chemical. Substrate spacing support members were formed inside the screen, and columns were formed outside the screen. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a common electrode, a thin film transistor, a pixel electrode, and the like, but has a structure different from that of the seventeenth embodiment. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. In the obtained liquid crystal display device, the one using NN810
Both those using N700 and those using V-259PA were of good display quality.

[Embodiment 19] In each of Embodiments 15 to 18, a color filter substrate was manufactured using an epoxy-based transparent protective film or a polyimidesiloxane transparent protective film instead of an acrylic-based transparent protective film, and an ITO film was formed outside the screen. After the film, a color liquid crystal display device was manufactured using the film. The substrate on the opposite side of the color filter has a common electrode, a thin film transistor, a pixel electrode, and the like, but has a structure different from that of the seventeenth embodiment. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device.
The obtained liquid crystal display device was of good display quality both using an epoxy-based transparent protective film and using a polyimidesiloxane-based transparent protective film.

Example 20 In the same manner as in Example 5, a part (base) of a pillar was formed of a black matrix outside of a black matrix, a picture frame, and a screen using a chromium-based BM. Next, using an acrylic colored resin, a red pixel, a blue pixel, and a green pixel were formed, and a colored layer of a blue pixel was laminated on the base of the black matrix outside the screen. After that, a transparent conductive film (ITO film) is formed inside and outside the screen, and then, using an acrylic column material (NN700 or NN810 manufactured by JSR) or V-259PA manufactured by Nippon Steel Chemical Co., Ltd. Was formed on the base inside and outside the screen. Using this color filter substrate, a color liquid crystal display device was produced. The present color liquid crystal display device is a so-called TN type liquid crystal display device. As for the obtained liquid crystal display devices, those using NN700, those using NN810 and those using V-259PA were of good display quality.

Example 21 In the same manner as in Example 1, a black matrix layer and a colored layer were formed, and simultaneously, a black matrix layer and colored layers of G and B were laminated outside the screen. After forming the transparent protective film, a transparent conductive film was formed inside and outside the screen. Without laminating a new resin layer,
A laminated body of a black matrix layer, a colored layer, and a transparent protective film was used as a pillar. A polyimide alignment film was provided on the color filter, and a rubbing treatment was performed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. After a color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device has no short circuit between the color filter substrate and the counter substrate,
In addition, a uniform cell gap was secured, and the display quality was good.

Example 22 In the same manner as in Example 1, a black matrix layer and a colored layer were formed, and simultaneously, a black matrix layer and colored layers of G, B, and R were laminated outside the screen. After forming the transparent protective film, a transparent conductive film was formed inside and outside the screen. Without stacking a new resin layer, a stacked body of the black matrix layer and the colored layer was used as a pillar. A polyimide alignment film was provided on the color filter, and a rubbing treatment was performed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. After a color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device is
There was no short circuit between the color filter substrate and the opposing substrate, a uniform cell gap was secured, and the display quality was good.

Embodiment 23 Embodiments 1, 2, 3, 4,
5, 7, 8, 9, 10, 11, 12, 13, 20, 2,
A color filter was prepared in exactly the same manner as in Examples 1 and 22, except that the distance between the display area and the non-display area of the ITO pattern was widened to 11, 20, and 25 mm, and a liquid crystal display device was manufactured. As a result of lighting this panel with a panel lighting device and observing it, as in Example 1, no display unevenness was observed, and good display characteristics were exhibited. As a result of disassembling the panel and observing the surface of the color filter as in Comparative Example 1, no abnormality such as a scratch was observed.

[Embodiment 24] In Embodiment 23, ITO was used.
A color filter was created in exactly the same manner except that the distance between the pattern display area and the non-display area was increased to 30 mm,
Further, a liquid crystal display device was produced. As a result of lighting this panel with a panel lighting device and observing it, as in Example 1, no display unevenness was observed, and good display characteristics were exhibited. Comparative Example 1
As a result of disassembling the panel and observing the surface of the color filter, very slight scratches were confirmed.

Comparative Example 1 (1. Production of Color Filter) In the same manner as in Example 1, the formation of the black matrix, the picture frame, the formation of the red, blue, and green pixels, and the formation of some of the pillars and the substrate spacing support member were performed. went. Next, an ITO film was formed only in the screen as shown in FIG. Next, a resin layer for pillars and substrate spacing support members was formed inside the screen, on the frame, and outside the screen. (2. Production of Color Liquid Crystal Display) A liquid crystal display was produced in the same manner as in Example 1 using the above color filters. The obtained liquid crystal display device is 2-3 m parallel to the rubbing direction.
Streaky light and dark display unevenness with m pitches occurred. After disassembling the panel and washing off the liquid crystal, the surface of the color filter substrate was observed with a strong light, and streaky unevenness in the same direction and pitch as the unevenness was observed on the surface of the alignment film.

[Comparative Example 2] Examples 6, 14, 15, 1
In 6, 17, 18, and 19, an in-plane switching type liquid crystal display device was prepared in the same manner except that an ITO electrode was not formed outside the screen after forming a transparent protective film. The panel was lit by a panel lighting device, and as a result of observation, slight display unevenness parallel to the rubbing direction was observed. After dismantling this panel and washing out the liquid crystal,
When the surface of the color filter substrate was observed with a strong light, streaky unevenness in the same direction as the unevenness was observed on the surface of the alignment film.

[0155]

When a liquid crystal display device is manufactured by providing a conductive film outside the screen of a liquid crystal display device substrate, the liquid crystal display device occurs when a non-display area and a rubbing cloth come into contact in a rubbing step in a liquid crystal display device manufacturing process. It is possible to suppress static electricity and local electrification generated when the substrate is drained and dried.
As a result, it is possible to reduce defects caused by static electricity, for example, display defects due to foreign matter defects due to attracting particles and display unevenness due to partial deterioration of the substrate surface due to abnormal discharge.

[Brief description of the drawings]

FIG. 1 is a schematic view showing an example of a liquid crystal display substrate for explaining a frame outside a screen according to the present invention.

FIGS. 2A to 2D are schematic diagrams illustrating an example of a region of a conductive film formed over a substrate.

FIGS. 3A to 3D are schematic cross-sectional views illustrating an example of a substrate spacing support member formed in a screen.

FIGS. 4A to 4D are schematic cross-sectional views showing an example of a substrate spacing support member formed in a screen.

FIGS. 5A to 5E are schematic cross-sectional views showing an example of a pillar formed outside the screen.

FIGS. 6A to 6D are schematic cross-sectional views illustrating an example of a pillar formed outside the screen.

FIGS. 7A to 7E are schematic cross-sectional views showing examples of columns formed outside the screen.

FIGS. 8A to 8D are schematic cross-sectional views illustrating an example of a pillar formed outside the screen.

FIGS. 9A to 9D are schematic cross-sectional views illustrating an example of a pillar formed outside the screen.

FIGS. 10A to 10E are schematic cross-sectional views showing an example of a pillar formed outside the screen.

FIGS. 11A to 11D are schematic cross-sectional views illustrating an example of a pillar formed outside a screen.

FIG. 12 is an oblique projection view showing an upper area and a lower area of a substrate spacing support member and columns.

FIG. 13 is a schematic cross-sectional view showing one example of a liquid crystal display device manufactured using the liquid crystal display device substrate of the present invention.

FIG. 14 is an example of a conventional substrate for a liquid crystal display device in which a conductive film is not formed outside a screen.

[Explanation of symbols]

1: substrate for liquid crystal display device 2: outside the screen 3: display area 4: frame 5: inside the screen 6: inner peripheral edge of the frame 7: outer peripheral edge of the frame 8: area cut off when manufacturing the liquid crystal display device 9: Cut-off line 10: Conductive film outside screen 11: Conductive film inside screen 12: Substrate spacing support member 13: Colored layer (1) 14: Colored layer (2) 15: Glass substrate or plastic substrate 16: Black matrix 17: Transparent Conductive film 18: Transparent protective film 19: Colored layer (3) 20: Column 21: Column resin layer 22: Conductive film 23: Part of column (for example, black matrix layer, colored layer) 24: Column (for example, black matrix layer) , Colored layer) 25: area above pillar 26: area below pillar 27: liquid crystal 28: alignment film 29: pixel electrode 30: gate electrode 31: interlayer insulating film 32: pixel electrode 33: part of pillar (for example, Rack matrix layer, colored layer) 34: Column (for example, black matrix layer, a colored layer) 35: pole area 36: pillar area under 37: LCD 38: sealing material 39: pillar abutment portion

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Tomohiko Hatano 1-1-1 Sonoyama, Otsu-shi, Shiga F-term in the Shiga Plant of Toray Industries Co., Ltd. (Reference) 2H048 BA11 BB01 2H089 LA02 LA09 LA10 LA12 LA16 MA03X PA04 QA10 QA16 TA02 TA04 TA12 TA13 2H091 FA02Y FA35Y FD06 GA06 GA08 LA07 2H092 HA04 NA14 PA02 PA03 PA08 PA09 5C094 AA03 AA42 AA43 BA03 BA43 CA19 CA24 DA13 DA15 ED02 ED15 JA08

Claims (19)

[Claims] The present invention has a column outside a screen, and the column and / or
Alternatively, a substrate for a liquid crystal display device, wherein a conductive film is formed around the pillar. 2. A substrate for a liquid crystal display device, wherein a pillar is formed on a conductive film formed outside a screen. 3. The substrate for a liquid crystal display device according to claim 1, wherein a transparent protective film is formed under the conductive film. 4. The substrate for a liquid crystal display device according to claim 1, wherein a pillar is formed in a region cut off when manufacturing the liquid crystal display device outside the screen. 5. The substrate for a liquid crystal display device according to claim 1, wherein the conductive film is formed both in a display area of the substrate for a liquid crystal display device and outside the screen. . 6. The substrate for a liquid crystal display device according to claim 1, wherein a conductive film is not formed in the display region. 7. The substrate for a liquid crystal display device according to claim 1, wherein the height of the columns is 2 μm or more and 10 μm or less. 8. The substrate for a liquid crystal display device according to claim 1, wherein the area of the pillar is 50 μm ² or more and 1 mm ² or less. 9. The substrate for a liquid crystal display device according to claim 1, wherein the pillars have a dot shape. 10. The substrate for a liquid crystal display device according to claim 1, wherein the columns are periodically arranged. 11. A substrate for a liquid crystal display device according to claim 1, wherein the conductive film is an ITO film. 12. The substrate for a liquid crystal display device according to claim 1, wherein the pillar is formed on a light shielding film. 13. The liquid crystal display device substrate according to claim 12, wherein the light shielding film is a resin containing a light shielding agent. 14. A substrate for a liquid crystal display device according to claim 1, wherein the substrate is a color filter having pixels formed by colored layers of a plurality of colors. 15. The method according to claim 15, wherein the columns are two and / or three of the pixels.
The substrate for a liquid crystal display device according to claim 14, wherein the substrate is formed by laminating colored layers of colors. 16. The substrate for a liquid crystal display device according to claim 1, wherein a substrate spacing support member is formed in the screen. 17. A substrate spacing support member is formed in a screen,
17. The substrate for a liquid crystal display device according to claim 1, wherein a constituent material of a substrate spacing supporting member in the screen and a part of constituent materials of columns outside the screen are identical. . 18. A liquid crystal display device in which liquid crystal is sandwiched between two substrates for a liquid crystal display device, wherein at least one of the substrates for a liquid crystal display device has the liquid crystal display according to any one of claims 1 to 17. A liquid crystal display device using a device substrate. 19. The liquid crystal display device according to claim 18, wherein the column outside the screen and / or the conductive film around the column is not electrically connected to the display region in the same substrate.