JP2001302807A - Method for producing resin paste, and resin paste - Google Patents
Method for producing resin paste, and resin pasteInfo
- Publication number
- JP2001302807A JP2001302807A JP2000116526A JP2000116526A JP2001302807A JP 2001302807 A JP2001302807 A JP 2001302807A JP 2000116526 A JP2000116526 A JP 2000116526A JP 2000116526 A JP2000116526 A JP 2000116526A JP 2001302807 A JP2001302807 A JP 2001302807A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- solution
- resin paste
- filler
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 65
- 239000011347 resin Substances 0.000 title claims abstract description 65
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 239000000945 filler Substances 0.000 claims abstract description 27
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000007822 coupling agent Substances 0.000 claims abstract description 21
- 229920006015 heat resistant resin Polymers 0.000 claims abstract description 20
- 239000002904 solvent Substances 0.000 claims abstract description 13
- 239000004962 Polyamide-imide Substances 0.000 claims description 11
- 229920002312 polyamide-imide Polymers 0.000 claims description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 229920006122 polyamide resin Polymers 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 239000009719 polyimide resin Substances 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 125000000524 functional group Chemical group 0.000 claims description 3
- 125000001165 hydrophobic group Chemical group 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 238000013329 compounding Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 13
- 239000002966 varnish Substances 0.000 description 10
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- 238000007650 screen-printing Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- PPQREHKVAOVYBT-UHFFFAOYSA-H dialuminum;tricarbonate Chemical compound [Al+3].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O PPQREHKVAOVYBT-UHFFFAOYSA-H 0.000 description 4
- 239000002518 antifoaming agent Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010445 mica Substances 0.000 description 3
- 229910052618 mica group Inorganic materials 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000454 talc Substances 0.000 description 3
- 229910052623 talc Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229940118662 aluminum carbonate Drugs 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 239000002783 friction material Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 2
- 229910052919 magnesium silicate Inorganic materials 0.000 description 2
- 239000000391 magnesium silicate Substances 0.000 description 2
- 235000019792 magnesium silicate Nutrition 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910002019 Aerosil® 380 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 101100219325 Phaseolus vulgaris BA13 gene Proteins 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、スクリーン印刷
機、ディスペンサ、スピンコータなどの塗布方法に適し
た樹脂ペーストの製造法及び樹脂ペーストに関し、特に
スクリーン印刷用に適した樹脂ペーストの製造法及び樹
脂ペーストに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a resin paste and a resin paste suitable for a coating method of a screen printing machine, a dispenser, a spin coater, etc., and more particularly to a method for producing a resin paste and a resin paste suitable for screen printing. About.
【0002】[0002]
【従来の技術】近年、電子部品の分野においては、小型
化、薄型化、高速化への対応から、耐熱性、電気特性及
び耐湿性に優れる樹脂としてエポキシ樹脂に代わり、ポ
リイミド樹脂、ポリアミドイミド樹脂及びポリアミド樹
脂が使用されている。これらの樹脂は、樹脂構造が剛直
であり薄膜基材に用いた場合、硬化後の基材が大きく反
り、硬化膜は柔軟性に欠け、屈曲性に劣る問題がある。2. Description of the Related Art In recent years, in the field of electronic components, polyimide resins and polyamide-imide resins have been used instead of epoxy resins as resins having excellent heat resistance, electrical properties and moisture resistance in order to respond to miniaturization, thinning and high speed. And a polyamide resin. These resins have a rigid resin structure and, when used as a thin film substrate, have a problem that the substrate after curing is greatly warped, and the cured film lacks flexibility and is inferior in flexibility.
【0003】そこで、低反り性、柔軟性を改善するため
に、樹脂を可とう化及び低弾性率化した変性されたポリ
アミドイミド樹脂(特開昭62−106960号公報、
特開平8−12763号公報、特開平7−196798
号公報等)が提案されている。これらの樹脂に、更に耐
熱性を付与させるために高分子量エポキシ樹脂を配合し
たり塗布時の作業性及び塗布後の形状保持性を付与する
ためフィラーを分散させることにより、印刷性を付与さ
せ、基板上に直接スクリーン印刷法を用いて絶縁膜及び
絶縁層を形成している。しかし、スクリーン印刷法を用
いて直接基板上に絶縁膜及び絶縁層を形成した場合、基
板上の配線回路とスクリーン版が直接接触するため配線
回路にキズや断線等の発生の問題がある。また、近年の
小型化、薄型化に伴い配線間距離も小さくなり配線間に
発生する印刷ペーストの流れ出しが大きくなり、印刷性
を付与するためにフィラーを分散させるため製造工程と
してプラネタリーミキサ、三本ロール、らいかい機等の
機械的分散工程が必要で製造時間やコストの点で問題が
ある。Therefore, in order to improve low warpage and flexibility, a modified polyamideimide resin obtained by making a resin flexible and having a low elastic modulus (Japanese Patent Application Laid-Open No. 62-106960,
JP-A-8-12763, JP-A-7-196798
And the like) have been proposed. To these resins, by adding a high molecular weight epoxy resin to further impart heat resistance or by dispersing a filler to impart workability during application and shape retention after application, to impart printability, An insulating film and an insulating layer are formed directly on a substrate by a screen printing method. However, when an insulating film and an insulating layer are directly formed on a substrate by using a screen printing method, the wiring circuit on the substrate comes into direct contact with the screen plate, so that there is a problem that the wiring circuit is damaged or disconnected. In addition, with the recent miniaturization and thinning, the distance between the wirings has been reduced, the flow of the printing paste generated between the wirings has been increased, and a planetary mixer, A mechanical dispersing process such as a roll and a mill is required, and there is a problem in terms of manufacturing time and cost.
【0004】[0004]
【発明が解決しようとする課題】本発明は、フィラーの
分散性を向上させ、製造工程を簡略化した樹脂ペースト
の製造法及び樹脂ペーストに関する。SUMMARY OF THE INVENTION The present invention relates to a resin paste manufacturing method and a resin paste in which the dispersibility of a filler is improved and the manufacturing process is simplified.
【0005】[0005]
【課題を解決するための手段】本発明は下記の発明に関
する。耐熱性樹脂、溶剤、フィラー及びチタネート系カ
ップリング剤を配合した溶液Aに耐熱性樹脂、溶剤及び
フィラーを配合した溶液Bを配合する樹脂ペーストの製
造法。Means for Solving the Problems The present invention relates to the following inventions. A method for producing a resin paste in which a solution A containing a heat-resistant resin, a solvent and a filler is mixed with a solution A containing a heat-resistant resin, a solvent, a filler and a titanate coupling agent.
【0006】溶液A及び溶液Bの耐熱性樹脂が、可とう
化及び低弾性率化成分で変性されたポリイミド樹脂、ポ
リアミドイミド樹脂又はポリアミド樹脂である上記の樹
脂ペーストの製造法。[0006] A method for producing the above resin paste, wherein the heat-resistant resin of the solution A and the solution B is a polyimide resin, a polyamideimide resin or a polyamide resin modified with a flexible and low modulus component.
【0007】溶液Aのフィラーの平均表面積が50m2
/g以上である上記の樹脂ペーストの製造法。The average surface area of the filler in the solution A is 50 m 2.
/ G or more.
【0008】溶液Bのフィラーの平均表面積が50m2
/g以下である上記の樹脂ペーストの製造法。The average surface area of the filler in the solution B is 50 m 2.
/ G or less.
【0009】溶液Aのチタネート系カップリング剤がそ
の疎水基の側鎖有機官能基にリン酸分子を含むチタネー
ト系カップリング剤である上記の樹脂ペーストの製造
法。[0009] The method for producing a resin paste as described above, wherein the titanate-based coupling agent of the solution A is a titanate-based coupling agent containing a phosphoric acid molecule in a side chain organic functional group of the hydrophobic group.
【0010】溶液Aのチタネート系カップリング剤の配
合量が、耐熱性樹脂100重量部に対して0.1重量部
〜5重量部である上記の樹脂ペーストの製造法。The method for producing a resin paste as described above, wherein the amount of the titanate-based coupling agent in the solution A is 0.1 to 5 parts by weight based on 100 parts by weight of the heat-resistant resin.
【0011】上記のいずれかの製造法により得られる樹
脂ペースト。[0011] A resin paste obtained by any of the above production methods.
【0012】[0012]
【発明の実施の形態】本発明の樹脂ペーストは、耐熱性
樹脂、溶剤、フィラー及びチタネート系カップリング剤
を配合した溶液Aと耐熱性樹脂、溶剤及びフィラーを配
合した溶液Bを配合して得られる。BEST MODE FOR CARRYING OUT THE INVENTION The resin paste of the present invention is obtained by mixing a solution A containing a heat-resistant resin, a solvent, a filler and a titanate coupling agent and a solution B containing a heat-resistant resin, a solvent and a filler. Can be
【0013】本発明の樹脂ペーストに用いられる耐熱性
樹脂としては、可とう化及び低弾性率化成分で変性され
たポリイミド樹脂、ポリアミドイミド樹脂及びポリアミ
ド樹脂が好適に用いられる。変性された樹脂としては各
種の公知の変性がされたものであれば特に制限はなく、
例えば、シリコーン樹脂で変性されたもの、ポリカーボ
ネート樹脂で変性されたもの、ポリブタジエンで変性さ
れたものなどを挙げることができる。中でも、ポリカー
ボネート樹脂で変性されたポリアミドイミド樹脂が好ま
しいものとして挙げられる。As the heat-resistant resin used in the resin paste of the present invention, a polyimide resin, a polyamide-imide resin and a polyamide resin modified with a flexible and low-modulus component are preferably used. The modified resin is not particularly limited as long as it has been subjected to various known modifications.
For example, those modified with a silicone resin, those modified with a polycarbonate resin, those modified with polybutadiene, and the like can be given. Among them, a polyamide imide resin modified with a polycarbonate resin is preferred.
【0014】可とう化及び低弾性率化成分で変性された
耐熱性樹脂は、例えば、ポリカーボネート樹脂で変性さ
れたポリアミドイミド樹脂の場合、通常、可とう化及び
低弾性率化成分である1,6−ヘキサンジオール系ポリ
カーボネートジオール等をカルボン酸とを反応させて得
られたジカルボン酸と、ポリイソシアネート及び酸無水
物基を有する3価のカルボン酸又はその誘導体とを反応
させて得られる。The heat-resistant resin modified with a flexible and low-modulus component is, for example, a polyamideimide resin modified with a polycarbonate resin. It is obtained by reacting a dicarboxylic acid obtained by reacting a 6-hexanediol-based polycarbonate diol or the like with a carboxylic acid, a polyisocyanate and a trivalent carboxylic acid having an acid anhydride group or a derivative thereof.
【0015】本発明における溶液A及びBは、上記の樹
脂をγ−ブチロラクトン等の比較的高沸点の溶剤に、樹
脂分が好ましくは30〜55重量%になるように溶解し
た溶液が用いられる。As the solutions A and B in the present invention, solutions obtained by dissolving the above resin in a solvent having a relatively high boiling point such as γ-butyrolactone so that the resin content is preferably 30 to 55% by weight are used.
【0016】本発明の溶液Aに用いられる好ましくは平
均表面積が50m2 /g以上のフィラーとしては、前述
の耐熱性樹脂と溶剤を含む溶液に分散し、ペーストを形
成するものであれば特に制限なく、各種のものが用いら
れる。例えば、タルク、炭酸カルシウム、アルミナ、酸
化チタン、マイカ、炭酸アルミニウム、水酸化アルミニ
ウム、ケイ酸マグネシウム、シリカ、硫酸バリウムなど
が挙げられる。The filler having an average surface area of 50 m 2 / g or more, which is preferably used in the solution A of the present invention, is not particularly limited as long as it can be dispersed in a solution containing the above-mentioned heat-resistant resin and a solvent to form a paste. Instead, various types are used. Examples include talc, calcium carbonate, alumina, titanium oxide, mica, aluminum carbonate, aluminum hydroxide, magnesium silicate, silica, barium sulfate, and the like.
【0017】前記フィラーを単独で使用してもよいが、
数種類を併用してもよい。The above filler may be used alone,
Several types may be used in combination.
【0018】本発明の溶液Bに用いられる平均表面積が
50m2 /g以下のフィラーとしては、前述の耐熱性樹
脂と溶剤を含む溶液に分散し、ペーストを形成するもの
であれば特に制限なく、各種のものが用いられる。例え
ば、タルク、炭酸カルシウム、アルミナ、酸化チタン、
マイカ、炭酸アルミニウム、水酸化アルミニウム、ケイ
酸マグネシウム、シリカ、硫酸バリウム、ガラス短繊維
やホウ酸アルミニウムや炭化ケイ素等の各種ウィスカな
どが挙げられる。The filler having an average surface area of 50 m 2 / g or less used in the solution B of the present invention is not particularly limited as long as it can be dispersed in the above-mentioned solution containing a heat-resistant resin and a solvent to form a paste. Various things are used. For example, talc, calcium carbonate, alumina, titanium oxide,
Examples include mica, aluminum carbonate, aluminum hydroxide, magnesium silicate, silica, barium sulfate, short glass fibers, and various whiskers such as aluminum borate and silicon carbide.
【0019】前記フィラーを単独で使用してもよいが、
数種類を併用してもよい。The above filler may be used alone,
Several types may be used in combination.
【0020】本発明におけるフィラーとしては、フィラ
ーの平均表面積が1m2 /g以上の粒子特性を持つもの
が用いられる。平均表面積が1m2 /g未満になると、
樹脂ペーストの流動性が高くなり形状保持性が低下する
傾向がある。上限は特に制限はないが通常400m2 /
g以下とされる。As the filler in the present invention, a filler having an average surface area of 1 m 2 / g or more is used. When the average surface area is less than 1 m 2 / g,
The fluidity of the resin paste tends to be high, and the shape retention tends to be low. The upper limit is not particularly limited, but is usually 400 m 2 /
g or less.
【0021】本発明におけるフィラーの溶液A及び溶液
Bの全体の使用量は、溶液A及びBの耐熱性樹脂100
重量部に対し5〜50重量部とすることが好ましい。5
重量部未満であると形状保持性が低下する傾向があり、
50重量部を超えるとレベリング性や消泡性が低下する
傾向がある。In the present invention, the total amount of the solution A and the solution B of the filler used is 100
It is preferable that the amount be 5 to 50 parts by weight based on parts by weight. 5
If it is less than parts by weight, shape retention tends to decrease,
If it exceeds 50 parts by weight, the leveling property and the defoaming property tend to decrease.
【0022】本発明における溶液Aのフィラーの使用量
は耐熱性樹脂100重量部に対し200重量部以下とす
ることが好ましい。200重量部を超えると粘度が上昇
し分散性が低下する傾向がある。The amount of the filler of the solution A in the present invention is preferably 200 parts by weight or less based on 100 parts by weight of the heat-resistant resin. If it exceeds 200 parts by weight, the viscosity tends to increase and the dispersibility tends to decrease.
【0023】本発明における溶液Bのフィラーの使用量
は耐熱性樹脂100重量部に対し300重量部以下とす
ることが好ましい。300重量部を超えると粘度が上昇
し分散性が低下する傾向がある。The amount of the filler of the solution B in the present invention is preferably 300 parts by weight or less based on 100 parts by weight of the heat-resistant resin. If it exceeds 300 parts by weight, the viscosity tends to increase and the dispersibility tends to decrease.
【0024】本発明に用いられるチタネート系カップリ
ング剤としては、耐熱性樹脂と溶剤を含む溶液に配合し
た場合、ゲル化などを起こさないものであれば特に制限
はないが、樹脂の種類やフィラーの種類により適宜選択
される。例えば、変性されたポリイミド樹脂、ポリアミ
ドイミド樹脂又はポリアミド樹脂に使用する場合、疎水
基の側鎖有機官能基にリン酸分子を含むチタネート系カ
ップリング剤が好適に使用される。The titanate coupling agent used in the present invention is not particularly limited as long as it does not cause gelation when mixed with a solution containing a heat-resistant resin and a solvent. Is appropriately selected depending on the type of For example, when used for a modified polyimide resin, polyamideimide resin or polyamide resin, a titanate-based coupling agent containing a phosphoric acid molecule in a side chain organic functional group of a hydrophobic group is preferably used.
【0025】可とう化及び低弾性率化成分で変性された
ポリイミド樹脂、ポリアミドイミド樹脂又はポリアミド
樹脂においては、例えば、KR38S(味の素(株):
商品名)、KR138S(味の素(株):商品名)、K
R238S(味の素(株):商品名)、338X(味の
素(株):商品名)等のチタネート系カップリング剤が
好適に使用される。チタネート系カップリング剤は単独
で使用してもよいが数種類を併用してもよい。In the case of a polyimide resin, a polyamideimide resin or a polyamide resin modified with a flexible and low modulus component, for example, KR38S (Ajinomoto Co., Ltd.)
(Product name), KR138S (Ajinomoto Co., Ltd .: trade name), K
Titanate-based coupling agents such as R238S (Ajinomoto Co., Ltd .: trade name) and 338X (Ajinomoto Co., Ltd .: trade name) are preferably used. The titanate-based coupling agent may be used alone or in combination of several types.
【0026】チタネート系カップリング剤の配合量は、
分散性や粘度を考慮して、耐熱性樹脂100重量部に対
して0.1〜5重量部とすることが好ましい。この配合
量が0.1重量部未満であると分散性が低下し、5重量
部を超えると樹脂組成物の耐熱性や耐湿性などの特性が
低下する傾向がある。The content of the titanate coupling agent is as follows:
In consideration of dispersibility and viscosity, the content is preferably 0.1 to 5 parts by weight based on 100 parts by weight of the heat-resistant resin. If the amount is less than 0.1 part by weight, the dispersibility tends to decrease, and if it exceeds 5 parts by weight, properties such as heat resistance and moisture resistance of the resin composition tend to decrease.
【0027】また、樹脂ペーストには、塗工時の作業性
及び皮膜形成前後の膜特性を向上させるため、エポキシ
樹脂、フェノール樹脂、染料又は顔料等の着色剤類、熱
安定剤、酸化防止剤、難燃剤、滑剤、消泡剤、レベリン
グ剤等を添加することもできる。In order to improve workability at the time of coating and film properties before and after film formation, a colorant such as an epoxy resin, a phenol resin, a dye or a pigment, a heat stabilizer, and an antioxidant are added to the resin paste. , A flame retardant, a lubricant, an antifoaming agent, a leveling agent, and the like.
【0028】なかでもエポキシ樹脂を併用すると、基材
との密着性や耐湿性の点で好ましい。エポキシ樹脂を併
用する場合、その添加量としては、耐熱性樹脂100重
量部に対して、1〜50重量部とすることが密着性の点
で好ましい。Of these, the use of an epoxy resin is preferred in terms of adhesion to a substrate and moisture resistance. When an epoxy resin is used in combination, the addition amount is preferably 1 to 50 parts by weight based on 100 parts by weight of the heat-resistant resin from the viewpoint of adhesion.
【0029】本発明の樹脂ペーストは、各種電気製品や
電子部品の皮膜形成材料としてスクリーン印刷、ディス
ペンサ、スピンコートなどの塗布方法に好適に用いられ
る。特にスクリーン印刷に好適に用いられる。The resin paste of the present invention is suitably used as a film forming material for various electric products and electronic parts in coating methods such as screen printing, dispenser, and spin coating. Particularly, it is suitably used for screen printing.
【0030】本発明になる樹脂ペーストは、例えば、半
導体素子、プリント基板分野などの電子部品用オーバー
コート材、液状封止材、層間絶縁膜、表面保護膜、ソル
ダレジスト層、接着層などとして好適に用いられる。ま
た、エナメル線用ワニス、電気絶縁用含浸ワニス、注型
ワニス、マイカ、ガラスクロス等の基材と組み合わせた
シート用ワニス、MCL積層板用ワニス、摩擦材料用ワ
ニス、などにも使用できる。The resin paste according to the present invention is suitable, for example, as an overcoat material for electronic components in the field of semiconductor devices and printed circuit boards, a liquid sealing material, an interlayer insulating film, a surface protective film, a solder resist layer, an adhesive layer, and the like. Used for It can also be used for varnishes for enameled wires, impregnated varnishes for electrical insulation, cast varnishes, varnishes for sheets combined with substrates such as mica, glass cloth, varnishes for MCL laminates, varnishes for friction materials, and the like.
【0031】[0031]
【実施例】以下、本発明を実施例により説明するが本発
明はこれらに限定されるものではない。EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples.
【0032】実施例1 攪拌機、油分分離機付冷却管、窒素導入管及び温度計を
備えた3リットルの四つ口フラスコに、プラクセルCD
−220(ダイセル化学工業(株)製、1,6−ヘキサ
ンジオール系ポリカーボネートジオールの商品名)20
00.0g(100モル)、アジピン酸292.0g
(2.00モル)及びキシレン114.6gを仕込み、
途中、副生してくる縮合水を除去しながら200℃まで
昇温した。200℃で2時間反応させ、酸価49.7K
OHmg/gのジカルボン酸Aを得た。Example 1 Plaxel CD was placed in a 3 liter four-necked flask equipped with a stirrer, a condenser equipped with an oil separator, a nitrogen inlet and a thermometer.
-220 (trade name of 1,6-hexanediol-based polycarbonate diol, manufactured by Daicel Chemical Industries, Ltd.) 20
00.0 g (100 mol), adipic acid 292.0 g
(2.00 mol) and 114.6 g of xylene,
On the way, the temperature was raised to 200 ° C. while removing by-product condensed water. Reaction at 200 ° C for 2 hours, acid value 49.7K
OH mg / g of dicarboxylic acid A was obtained.
【0033】ついで、攪拌機、冷却管、窒素導入管及び
温度計を備えた2リットルの四つ口フラスコに、4,
4′−ジフェニルメタンジイソシアネート150.0g
(0.60モル)、無水トリメリット酸69.12g
(0.36モル)及び前記合成で得られたジカルボン酸
A541.44g(0.24モル)及びγ−ブチロラク
トン60.56gを仕込み、160℃まで昇温した後、
3時間反応させて、数平均分子量12,000の樹脂を
得た。得られた樹脂をγ−ブチロラクトンで希釈し、不
揮発分40重量%のポリカーボネート変性ポリアミドイ
ミド樹脂溶液を得た。なお、無水トリメリット酸/ジカ
ルボン酸Aのモル比は、0.6/0.4であった。Then, 4,4-liter flask equipped with a stirrer, a cooling tube, a nitrogen inlet tube and a thermometer was charged with 4,
40.0 g of 4'-diphenylmethane diisocyanate
(0.60 mol), 69.12 g of trimellitic anhydride
(0.36 mol) and 541.44 g (0.24 mol) of the dicarboxylic acid A obtained in the above synthesis and 60.56 g of γ-butyrolactone were added, and the temperature was raised to 160 ° C.
After reacting for 3 hours, a resin having a number average molecular weight of 12,000 was obtained. The obtained resin was diluted with γ-butyrolactone to obtain a polycarbonate-modified polyamideimide resin solution having a nonvolatile content of 40% by weight. The molar ratio of trimellitic anhydride / dicarboxylic acid A was 0.6 / 0.4.
【0034】得られた樹脂溶液の固形分100重量部に
対してチタネート系カップリング剤KR138S(味の
素(株):商品名)を0.1重量部、消泡剤としてKS
−603(信越化学工業(株):商品名)を0.1重量
部、フィラーとしてアエロジル380(日本アエロジル
(株):商品名、平均表面積:380m2 /g)を15
0重量部、希釈溶剤としてガンマブチロラクトン50重
量部を配合して攪拌機で1時間攪拌して溶液Aを得た。0.1 part by weight of a titanate-based coupling agent KR138S (trade name of Ajinomoto Co., Inc.) based on 100 parts by weight of the solid content of the obtained resin solution, and KS as an antifoaming agent
0.1 parts by weight of -603 (Shin-Etsu Chemical Co., Ltd .: trade name) and 15 of Aerosil 380 (Nippon Aerosil Co., Ltd., trade name, average surface area: 380 m 2 / g) as a filler.
0 parts by weight and 50 parts by weight of gamma butyrolactone as a diluting solvent were mixed and stirred with a stirrer for 1 hour to obtain a solution A.
【0035】得られた樹脂溶液の固形分100重量部に
対して消泡剤としてKS−603(信越化学工業
(株):商品名)を0.1重量部、フィラーとしてLM
S300(富士タルク工業(株):商品名、平均表面
積:5m2 /g)を20重量部配合して攪拌機で1時間
攪拌して溶液Bを得た。0.1 part by weight of KS-603 (Shin-Etsu Chemical Co., Ltd .: trade name) as an antifoaming agent and LM as a filler are based on 100 parts by weight of the solid content of the obtained resin solution.
20 parts by weight of S300 (Fuji Talc Kogyo Co., Ltd., trade name, average surface area: 5 m 2 / g) was mixed and stirred with a stirrer for 1 hour to obtain a solution B.
【0036】得られた溶液Aと溶液BをA:Bの重量比
が1:10で混合し、樹脂溶液の固形分100重量部に
対してEp−1004(油化シェルエポキシ(株):商
品名、ビスフェノールA型エポキシ樹脂)を20重量部
加え、1時間攪拌して樹脂ペーストを得た。The obtained solution A and solution B were mixed at a weight ratio of A: B of 1:10, and Ep-1004 (Yuika Shell Epoxy Co., Ltd .: commercial product) was added to 100 parts by weight of the solid content of the resin solution. (Name, bisphenol A type epoxy resin) was added and stirred for 1 hour to obtain a resin paste.
【0037】実施例2 実施例1においてチタネート系カップリング剤KR13
8S(味の素(株):商品名)を1重量部とした以外
は、実施例1と全く同様の操作を行い樹脂ペーストを得
た。Example 2 In Example 1, the titanate coupling agent KR13 was used.
A resin paste was obtained in exactly the same manner as in Example 1, except that 1S by weight was used for 8S (Ajinomoto Co., Ltd.).
【0038】実施例3 実施例1においてチタネート系カップリング剤KR13
8S(味の素(株):商品名)を3重量部とした以外
は、実施例1と全く同様の操作を行い樹脂ペーストを得
た。Example 3 In Example 1, the titanate coupling agent KR13 was used.
A resin paste was obtained in exactly the same manner as in Example 1, except that 8S (Ajinomoto Co., Ltd .: trade name) was used in an amount of 3 parts by weight.
【0039】実施例4 実施例1においてチタネート系カップリング剤KR13
8S(味の素(株):商品名)を5重量部とした以外
は、実施例1と全く同様の操作を行い樹脂ペーストを得
た。Example 4 In Example 1, the titanate coupling agent KR13 was used.
Except that 8S (Ajinomoto Co., Ltd .: trade name) was 5 parts by weight, the same operation as in Example 1 was performed to obtain a resin paste.
【0040】比較例1 実施例1においてチタネート系カップリング剤を添加し
ない以外は、実施例1と全く同様の操作を行い樹脂ペー
ストを得た。Comparative Example 1 A resin paste was obtained in the same manner as in Example 1, except that no titanate coupling agent was added.
【0041】比較例2 比較例1と同様の操作を行い得られたポリアミドイミド
樹脂ペーストを三本ロール(送りロールギャップ:10
0μm、仕上げロールギャップ:30μm)を1回通し
て樹脂ペーストを得た。Comparative Example 2 A polyamide-imide resin paste obtained by performing the same operation as in Comparative Example 1 was rolled with three rolls (feed roll gap: 10).
(0 μm, finish roll gap: 30 μm) once to obtain a resin paste.
【0042】上記の実施例及び比較例で得られた樹脂ペ
ースト及び樹脂組成物の特性を下記の方法で測定し、結
果を表に示した。The properties of the resin pastes and resin compositions obtained in the above Examples and Comparative Examples were measured by the following methods, and the results are shown in the table.
【0043】(1)分散性 粒ゲージ(ヨシミツ精機(株)製、25μm〜0μm)
を用いて、連続した10mm以上の線が2本以上そろい
始めた所を分散粒子径の値として値が10μm以下を
0.10μmを超えるものを×とした。(1) Dispersibility Grain gauge (manufactured by Yoshimitsu Seiki Co., Ltd., 25 μm to 0 μm)
The point where two or more continuous lines of 10 mm or more began to be aligned was used as the value of the dispersed particle diameter, and those having a value of 10 μm or less and exceeding 0.10 μm were evaluated as x.
【0044】(2)耐湿性 銅箔上に、得られた樹脂ペーストを印刷機(ニューロン
グ株式会社製 商品名:LS−34GX)とメッシュ版
(株式会社ムラカミ製 150メッシュ)で印刷速度1
00mm/secで10mm角を印刷して乾燥前の印刷
膜を得た。得られた乾燥前の印刷膜を空気雰囲気中90
℃で30分乾燥後、空気雰囲気中160℃で60分加熱
硬化して得られた被膜を121℃、2気圧の飽和蒸気中
で100時間放置して被膜の表面を観察して剥離、膨れ
の有無を観察し、無いものを○、有るものを×とした。(2) Moisture resistance The obtained resin paste was printed on a copper foil with a printing machine (trade name: LS-34GX, manufactured by Neurong Co., Ltd.) and a mesh plate (150 mesh, manufactured by Murakami Co., Ltd.).
A 10 mm square was printed at 00 mm / sec to obtain a printed film before drying. The obtained printed film before drying is placed in an air atmosphere for 90 minutes.
After drying at 30 ° C. for 30 minutes, the coating obtained by heating and curing at 160 ° C. for 60 minutes in an air atmosphere was allowed to stand at 121 ° C. for 2 hours in saturated steam at 2 atm. The presence or absence was observed, and those without the sample were evaluated as ○ and those with the test were evaluated as ×.
【0045】[0045]
【表1】 [Table 1]
【0046】以上の結果から明らかなように、比較例と
比べて、チタネート系カップリング剤を添加した実施例
1〜4は、粒ゲージによる分散性が10μm以下で耐湿
性に優れる。また、実施例1〜4は、粒ゲージによる分
散性が10μm以下で三本ロールを一回通した比較例2
の樹脂ペーストと同等の分散性を示している。As is apparent from the above results, Examples 1 to 4 to which a titanate-based coupling agent was added were superior to the Comparative Examples in that the dispersibility by a grain gauge was 10 μm or less and the moisture resistance was excellent. Further, Examples 1 to 4 were Comparative Examples 2 in which the dispersibility by a grain gauge was 10 μm or less and three passes were performed once.
Shows the same dispersibility as that of the resin paste.
【0047】[0047]
【発明の効果】本発明の樹脂ペーストは、三本ロール等
の機械的分散工程を行うことなく良好なフィラーの分散
状態を得られる。本発明の樹脂ペーストは、上記の優れ
た特性を有し、電子部品用オーバーコート材、液状封止
材、エナメル線用ワニス電気絶縁用含浸ワニス、積層板
用ワニス、摩擦材料用ワニス、プリント基板分野などに
おける層間絶縁膜、表面保護膜、ソルダレジスト膜、接
着層などや、半導体素子などの電子部品に好適に用いら
れる。According to the resin paste of the present invention, a good filler dispersion state can be obtained without performing a mechanical dispersion step such as a three-roll process. The resin paste of the present invention has the above-mentioned excellent properties, and includes an overcoat material for an electronic component, a liquid sealing material, a varnish for an enameled wire, an impregnated varnish for electrical insulation, a varnish for a laminate, a varnish for a friction material, and a printed board. It is suitably used for an interlayer insulating film, a surface protective film, a solder resist film, an adhesive layer and the like in the field, and an electronic component such as a semiconductor element.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08L 79/08 C08L 79/08 C // C09D 11/00 C09D 11/00 177/00 177/00 179/08 179/08 Z B Fターム(参考) 4F070 AA54 AA55 AC23 AC67 CB03 CB04 CB11 4J002 CL011 CM041 DE136 DE146 DE236 DE246 DG046 DJ006 DJ016 DJ046 DJ056 DK006 DL006 EZ007 FA046 FD016 GH01 GQ05 HA08 4J038 DJ021 DJ051 GA01 GA02 GA15 HA216 HA286 HA296 HA376 HA446 HA456 HA476 HA486 HA536 HA546 JA23 JA70 JC23 KA06 KA08 KA19 KA20 LA06 MA07 MA10 4J039 AE08 AE09 BA13 BA16 BA18 BA21 BA22 BA23 BA24 BA25 BA30 BA32 BA35 BC07 BC31 BC56 BE01 BE12 BE33 CA08 DA02 EA44 GA10 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C08L 79/08 C08L 79/08 C // C09D 11/00 C09D 11/00 177/00 177/00 179 / 08 179/08 ZB F term (reference) 4F070 AA54 AA55 AC23 AC67 CB03 CB04 CB11 4J002 CL011 CM041 DE136 DE146 DE236 DE246 DG046 DJ006 DJ016 DJ046 DJ056 DK006 DL006 EZ007 FA046 FD016 GH01 GQ05 HA08 4J038 DJ021 GA296 GA051 GA051 HA456 HA476 HA486 HA536 HA546 JA23 JA70 JC23 KA06 KA08 KA19 KA20 LA06 MA07 MA10 4J039 AE08 AE09 BA13 BA16 BA18 BA21 BA22 BA23 BA24 BA25 BA30 BA32 BA35 BC07 BC31 BC56 BE01 BE12 BE33 CA08 DA02 EA44 GA10
Claims (7)
ート系カップリング剤を配合した溶液Aに耐熱性樹脂、
溶剤及びフィラーを配合した溶液Bを配合することを特
徴とする樹脂ペーストの製造法。1. A solution A containing a heat-resistant resin, a solvent, a filler and a titanate-based coupling agent,
A method for producing a resin paste, comprising mixing a solution B containing a solvent and a filler.
化及び低弾性率化成分で変性されたポリイミド樹脂、ポ
リアミドイミド樹脂又はポリアミド樹脂である請求項1
記載の樹脂ペーストの製造法。2. The heat-resistant resin of the solution A and the solution B is a polyimide resin, a polyamideimide resin or a polyamide resin modified with a flexible and low modulus component.
A method for producing the resin paste as described above.
2 /g以上である請求項1又は2記載の樹脂ペーストの
製造法。3. An average surface area of the filler of the solution A is 50 m.
3. The method for producing a resin paste according to claim 1, wherein the amount is 2 / g or more. 4.
2 /g以下である請求項1又は2記載の樹脂ペーストの
製造法。4. An average surface area of the filler of the solution B is 50 m.
The method for producing a resin paste according to claim 1 or 2, which is not more than 2 / g.
その疎水基の側鎖有機官能基にリン酸分子を含むチタネ
ート系カップリング剤である請求項1又は2記載の樹脂
ペーストの製造法。5. The method for producing a resin paste according to claim 1, wherein the titanate-based coupling agent of the solution A is a titanate-based coupling agent containing a phosphoric acid molecule in a side chain organic functional group of the hydrophobic group.
配合量が、耐熱性樹脂100重量部に対して0.1重量
部〜5重量部である請求項5記載の樹脂ペーストの製造
法。6. The method for producing a resin paste according to claim 5, wherein the amount of the titanate coupling agent in the solution A is 0.1 to 5 parts by weight based on 100 parts by weight of the heat-resistant resin.
得られる樹脂ペースト。7. A resin paste obtained by the production method according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000116526A JP4591730B2 (en) | 2000-04-18 | 2000-04-18 | Manufacturing method of resin paste |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000116526A JP4591730B2 (en) | 2000-04-18 | 2000-04-18 | Manufacturing method of resin paste |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001302807A true JP2001302807A (en) | 2001-10-31 |
JP4591730B2 JP4591730B2 (en) | 2010-12-01 |
Family
ID=18627980
Family Applications (1)
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JP2000116526A Expired - Lifetime JP4591730B2 (en) | 2000-04-18 | 2000-04-18 | Manufacturing method of resin paste |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002363424A (en) * | 2001-06-11 | 2002-12-18 | Hitachi Chem Co Ltd | Resin paste and method for producing the same |
JP2004149783A (en) * | 2002-10-09 | 2004-05-27 | Ube Ind Ltd | Ink capable of printing fine pattern and printed matter |
JP2007284468A (en) * | 2006-04-12 | 2007-11-01 | Hitachi Chem Co Ltd | Resin composition and film-forming material comprising the same |
CN101712845B (en) * | 2009-07-23 | 2011-12-28 | 常州银河电器有限公司 | Composite protective coating for passivating semiconductor mesa and preparation method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS559643A (en) * | 1978-07-07 | 1980-01-23 | Asahi Chem Ind Co Ltd | Production of heat-resistant resin paste |
JPH07330950A (en) * | 1994-06-01 | 1995-12-19 | Hitachi Chem Co Ltd | Paste composition and semiconductor device made by using the same |
WO2000011084A1 (en) * | 1998-08-21 | 2000-03-02 | Hitachi Chemical Company, Ltd. | Paste composition, and protective film and semiconductor device both obtained with the same |
-
2000
- 2000-04-18 JP JP2000116526A patent/JP4591730B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS559643A (en) * | 1978-07-07 | 1980-01-23 | Asahi Chem Ind Co Ltd | Production of heat-resistant resin paste |
JPH07330950A (en) * | 1994-06-01 | 1995-12-19 | Hitachi Chem Co Ltd | Paste composition and semiconductor device made by using the same |
WO2000011084A1 (en) * | 1998-08-21 | 2000-03-02 | Hitachi Chemical Company, Ltd. | Paste composition, and protective film and semiconductor device both obtained with the same |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002363424A (en) * | 2001-06-11 | 2002-12-18 | Hitachi Chem Co Ltd | Resin paste and method for producing the same |
JP2004149783A (en) * | 2002-10-09 | 2004-05-27 | Ube Ind Ltd | Ink capable of printing fine pattern and printed matter |
JP4599821B2 (en) * | 2002-10-09 | 2010-12-15 | 宇部興産株式会社 | Ink and printed matter that can print fine patterns |
JP2007284468A (en) * | 2006-04-12 | 2007-11-01 | Hitachi Chem Co Ltd | Resin composition and film-forming material comprising the same |
CN101712845B (en) * | 2009-07-23 | 2011-12-28 | 常州银河电器有限公司 | Composite protective coating for passivating semiconductor mesa and preparation method thereof |
Also Published As
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JP4591730B2 (en) | 2010-12-01 |
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