JP2001164291A - Cleaning liquid composition for wax and pitch - Google Patents
Cleaning liquid composition for wax and pitchInfo
- Publication number
- JP2001164291A JP2001164291A JP34964599A JP34964599A JP2001164291A JP 2001164291 A JP2001164291 A JP 2001164291A JP 34964599 A JP34964599 A JP 34964599A JP 34964599 A JP34964599 A JP 34964599A JP 2001164291 A JP2001164291 A JP 2001164291A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- cleaning
- liquid composition
- wax
- pitch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Detergent Compositions (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電気・電子部品、光学
部品などの精密部品に付着したワックス・ピッチを洗浄
するために用いられる洗浄液組成物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning liquid composition used for cleaning wax pitch adhered to precision parts such as electric / electronic parts and optical parts.
【０００２】[0002]
【従来の技術】電気・電子部品、光学部品などの精密部
品の製造においては、加工途中の部品の保護や固定など
のためにワックス・ピッチが用いられている。そのた
め、製造工程においては、精密部品表面に付着したワッ
クス・ピッチを除去するために、その洗浄工程が必要と
なる。従来、このような洗浄には、フロン系溶剤、ある
いはトリクロロエタン等の塩素系溶剤が洗浄剤として使
用されている。しかし、これらの化合物はオゾン層を破
壊する物質として、1995年末にその製造が禁止され、更
に塩素系溶剤は毒性が強く、水質汚染を防止するため、
その法規制も厳しい。2. Description of the Related Art In the production of precision parts such as electric / electronic parts and optical parts, wax pitch is used for protecting and fixing parts during processing. Therefore, in the manufacturing process, a cleaning process is required in order to remove the wax pitch attached to the surface of the precision component. Conventionally, for such cleaning, a chlorofluorocarbon solvent or a chlorine solvent such as trichloroethane has been used as a cleaning agent. However, these compounds were banned at the end of 1995 as substances that destroy the ozone layer, and chlorine-based solvents are highly toxic and prevent water pollution.
The regulations are strict.
【０００３】また、界面活性剤や無機アルカリを添加し
た水系洗浄剤、リン酸塩類等の水溶液系洗浄剤の利用も
検討されるが、洗浄力が乏しく、かつ排水処理設備に大
きなスペースを必要とし経済性の面から好ましくない。
炭化水素系洗浄剤も検討されているが、洗浄特性が十分
でない、また、引火性などの点から取り扱いが難しい。
さらに、エーテルなどの極性化合物も検討されている
が、精密部品自体に与える影響が大きかったり、化合物
自体が高価であるなどの課題を抱えている。[0003] In addition, the use of an aqueous detergent containing a surfactant or an inorganic alkali, or an aqueous detergent such as phosphates has been considered, but it has poor detergency and requires a large space for wastewater treatment equipment. It is not preferable in terms of economy.
Although hydrocarbon-based cleaning agents have been studied, they are difficult to handle due to insufficient cleaning properties and flammability.
Furthermore, polar compounds such as ethers have been studied, but they have problems such as having a large effect on precision parts themselves and being expensive.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、このような
課題を解決するもので、ワックス・ピッチが付着した精
密部品を洗浄する洗浄液であって、環境に与える影響が
少なく、取り扱い上の規制も少なく、かつ、十分な洗浄
性を有し、加えて、精密部品を構成する材料自体に対す
る攻撃性のない洗浄液組成物を提供するものである。SUMMARY OF THE INVENTION The present invention solves the above problems and is a cleaning liquid for cleaning precision parts to which wax and pitch are attached. Another object of the present invention is to provide a cleaning liquid composition having a small amount of water and having sufficient detergency, and in addition, having no aggressiveness against a material constituting a precision part.
【０００５】[0005]
【課題を解決するための手段】本発明の第１の態様によ
るワックス・ピッチ用洗浄液組成物は、炭素数１０〜１
８の２環芳香族化合物を７０重量％以上含有する洗浄液
組成物であり、洗浄液組成物の蒸留性状における５％留
出温度と９５％留出温度の差が１０℃以下であることを
特徴とするものである。本発明の第２の態様によるワッ
クス・ピッチ用洗浄液組成物は、炭素数１０〜１８の２
環芳香族化合物を４０〜９５重量％含有し、Ｎ−メチル
−２−ピロリドン、γ−ブチルラクトン、シクロヘキサ
ノン、１，３−ジメチル−２−イミダゾリジノンから選
ばれる化合物を合計で６０〜５重量％含有することを特
徴とするものである。According to a first aspect of the present invention, there is provided a cleaning solution for wax and pitch comprising 10 to 1 carbon atoms.
8. A cleaning liquid composition containing the bicyclic aromatic compound of No. 8 in an amount of 70% by weight or more, wherein the difference between the 5% distillation temperature and the 95% distillation temperature in the distillation properties of the cleaning liquid composition is 10 ° C. or less. Is what you do. The cleaning liquid composition for wax and pitch according to the second aspect of the present invention is a cleaning liquid composition having 10 to 18 carbon atoms.
A ring aromatic compound is contained in an amount of 40 to 95% by weight, and a compound selected from N-methyl-2-pyrrolidone, γ-butyl lactone, cyclohexanone, and 1,3-dimethyl-2-imidazolidinone is added in a total amount of 60 to 5% by weight. %.
【０００６】[0006]
【発明の実施の形態】本発明の洗浄液組成物において、
炭素数１０〜１８の２環芳香族化合物は、ナフタレンお
よびアルキル置換ナフタレンを含むものであり、例え
ば、メチルナフタレン、ジメチルナフタレン、ジメチル
イソプロピルナフタレンなどを挙げることができる。ま
た、これらを単独で用いても必要に応じて２種以上を混
合して用いても差し支えない。また、この２環芳香族化
合物を含有する石油留分などを用いることもできる。BEST MODE FOR CARRYING OUT THE INVENTION In the cleaning solution composition of the present invention,
The bicyclic aromatic compound having 10 to 18 carbon atoms includes naphthalene and alkyl-substituted naphthalene, and examples thereof include methylnaphthalene, dimethylnaphthalene, and dimethylisopropylnaphthalene. These may be used alone or, if necessary, in combination of two or more. A petroleum fraction containing the bicyclic aromatic compound can also be used.
【０００７】本発明の第１の態様による洗浄液組成物に
含まれる炭素数１０〜１８の２環芳香族化合物の含有量
は７０重量％以上であるが、好ましい洗浄特性を得るた
めには９０％重量以上、さらに好ましくは９５重量％以
上である。また、含有される芳香族化合物の炭素数は、
１１〜１６，特には１１〜１４であることが洗浄能力の
点から好ましい。[0007] The content of the bicyclic aromatic compound having 10 to 18 carbon atoms contained in the cleaning liquid composition according to the first aspect of the present invention is 70% by weight or more. It is at least 95% by weight, more preferably at least 95% by weight. Also, the carbon number of the aromatic compound contained is
It is preferably from 11 to 16, particularly from 11 to 14, from the viewpoint of the cleaning ability.
【０００８】本発明の第１の態様による洗浄液組物の蒸
留性状における５％留出温度と９５％留出温度の差が１
０℃以下であり、洗浄液の蒸留再生性をさらに高めるた
めにはこの差を８℃以下とする。この差が１０℃を超え
る場合には、使用済みの洗浄液を蒸留により再生する際
に、洗浄液の組成変化を起こしやすく、繰り返し再生し
ている間に重質分又は軽質分が次第に多くなり、その結
果、洗浄液の性質が変化するため好ましくない。The difference between the 5% distillation temperature and the 95% distillation temperature in the distillation properties of the cleaning liquid composition according to the first aspect of the present invention is 1
It is 0 ° C. or lower, and this difference is set to 8 ° C. or lower in order to further enhance the distillation regenerating property of the washing liquid. When this difference exceeds 10 ° C., when the used washing liquid is regenerated by distillation, the composition of the washing liquid is likely to change, and the amount of heavy or light components gradually increases during repeated regeneration, As a result, the properties of the cleaning liquid change, which is not preferable.
【０００９】通常、この洗浄液組成物の蒸留性状は、５
％留出温度が２１０℃以上、好ましくは２２０℃以上、
９５％留出温度が３２０℃以下、好ましくは２８０℃以
下である。５％留出温度が２１０℃未満では、引火点が
低くなり取扱い上好ましくない。また、９５％留出温度
が２８０℃を越えると、洗浄後の溶剤を乾燥により除去
することが困難になる。なお、本明細書における蒸留性
状は、蒸留試験はＪＩＳ Ｋ ２２５４(石油製品−蒸
留試験方法）に準拠して測定するものである。[0009] Usually, the distillation properties of this cleaning liquid composition are 5
% Distillation temperature is 210 ° C. or higher, preferably 220 ° C. or higher,
The 95% distillation temperature is 320 ° C or lower, preferably 280 ° C or lower. If the 5% distillation temperature is lower than 210 ° C., the flash point becomes low, which is not preferable in handling. When the 95% distillation temperature exceeds 280 ° C., it becomes difficult to remove the solvent after washing by drying. In addition, the distillation property in this specification measures a distillation test based on JISK2254 (petroleum product-distillation test method).
【００１０】本発明の第２の態様による洗浄液組成物
は、２環芳香族化合物を４０〜９５重量％、好ましくは
５０〜８０重量％含有し、Ｎ−メチル−２−ピロリド
ン、γ−ブチルラクトン、シクロヘキサノン、１，３−
ジメチル−２−イミダゾリジノンから選ばれる化合物を
合計で６０〜５重量％、好ましく５０〜２０重量％含有
する。これらの化合物は、１種類のみでもよいし、２種
類以上を混合して用いてもよいが、特に、Ｎ−メチル−
２−ピロリドンが好ましく用いられる。これらの化合物
の含有率の合計が、この範囲を超えると、洗浄対象の精
密部品を構成する材料自体が影響を受ける場合がある。The cleaning liquid composition according to the second aspect of the present invention contains 40 to 95% by weight, preferably 50 to 80% by weight of a bicyclic aromatic compound, and comprises N-methyl-2-pyrrolidone, γ-butyl lactone. , Cyclohexanone, 1,3-
It contains a compound selected from dimethyl-2-imidazolidinone in a total amount of 60 to 5% by weight, preferably 50 to 20% by weight. These compounds may be used alone or as a mixture of two or more. Particularly, N-methyl-
2-Pyrrolidone is preferably used. If the total content of these compounds exceeds this range, the materials constituting the precision parts to be cleaned may be affected.
【００１１】本発明の洗浄液組成物には、本発明の目的
を損なわない範囲で、他の炭化水素類、エステル類、ア
ルコール類、ケトン類等の配合成分や、界面活性剤、酸
化防止剤、紫外線吸収剤、防錆剤等の慣用の添加剤を含
めることができる。界面活性剤としては非イオン性界面
活性剤が好ましく、例えば高級アルコールエチレンオキ
サイド付加物、アルキルフェノールエチレンオキサイド
付加物、脂肪酸エチレンオキサイド付加物、高級アルキ
ルアミンエチレンオキサイド付加物、ソルビトール及び
ソルビタンの脂肪酸エステル、ショ糖脂肪酸エステル、
シリコン系、フッ素系等いずれのものも使用できる。The cleaning liquid composition of the present invention contains other components such as hydrocarbons, esters, alcohols, and ketones, a surfactant, an antioxidant, and the like, as long as the object of the present invention is not impaired. Conventional additives such as UV absorbers and rust inhibitors can be included. As the surfactant, a nonionic surfactant is preferable. For example, higher alcohol ethylene oxide adduct, alkylphenol ethylene oxide adduct, fatty acid ethylene oxide adduct, higher alkylamine ethylene oxide adduct, fatty acid ester of sorbitol and sorbitan, Sugar fatty acid esters,
Any of silicon type, fluorine type and the like can be used.
【００１２】また、紫外線吸収剤及び酸化防止剤として
は、洗浄液の長期保存等における安定性の向上に役立
ち、紫外線吸収剤としては例えばベンゾトリアゾール
系、ベンゾフェノン系、ヒンダードアミン系等を使用で
き、酸化防止剤としては例えばフェノール系、アミン
系、硫黄系、リン系等、本発明の洗浄液組成物に溶解す
るものはいずれも使用できる。フェノール系酸化防止剤
を、１００〜１０００ｐｐｍ添加することが特に好まし
い。The UV absorber and antioxidant are useful for improving the stability of the cleaning solution during long-term storage and the like. As the UV absorber, for example, benzotriazole, benzophenone, hindered amine and the like can be used. As the agent, any agent that dissolves in the cleaning liquid composition of the present invention, such as a phenol-based, amine-based, sulfur-based, and phosphorus-based agent, can be used. It is particularly preferred to add 100 to 1000 ppm of a phenolic antioxidant.
【００１３】本発明の洗浄方法において、洗浄液組成物
と接触させる方法自体は特に制限はなく、公知のいずれ
の方法も使用できる。例えば、洗浄液組成物を含浸した
スポンジ等による拭き取り、洗浄液組成物への浸漬及び
／又はスプレー等により実施することが好ましい。浸漬
による洗浄においては、洗浄効果を高めるために、同時
に攪拌、揺動、超音波又はエアバブリング等を組み合わ
せることが更に好ましい。この場合、超音波の使用条件
は、例えば発振周波数２０〜１００ｋＨｚ、発振出力１
０〜２００Ｗ／ｌが好ましい。エアバブリングでは、微
細な気泡を、好ましくは空気：洗浄液の体積比１：１乃
至５：１程度で通気することにより、洗浄液組成物に不
溶性の汚れを気泡と共に上昇させ、不溶性の汚れをも分
離することができる。スプレーによる洗浄において、そ
の圧力は、例えば０．５〜１０ｋｇ／ｃｍ2 Ｇが好まし
い。いずれの場合も洗浄時間は、好ましくは１５秒間〜
２時間、特に好ましくは３０秒間〜２０分間である。上
記範囲未満では洗浄が不十分で、付着した汚れを十分に
除去し得ず、一方、上記範囲を超えても洗浄効果は格別
向上しない。洗浄温度は、好ましくは２０〜１２０℃で
ある。上記洗浄において、より高温で処理することによ
り洗浄効果を著しく上昇させることができる。上記範囲
未満では、洗浄が不十分となり易い。In the cleaning method of the present invention, the method of contacting with the cleaning liquid composition itself is not particularly limited, and any known method can be used. For example, wiping with a sponge or the like impregnated with the cleaning liquid composition, immersion in the cleaning liquid composition and / or spraying is preferably performed. In cleaning by immersion, it is more preferable to combine stirring, rocking, ultrasonic waves, air bubbling, and the like at the same time to enhance the cleaning effect. In this case, the use conditions of the ultrasonic wave are, for example, an oscillation frequency of 20 to 100 kHz, an oscillation output of 1
0 to 200 W / l is preferred. In the air bubbling, fine bubbles are preferably ventilated at a volume ratio of air: cleaning liquid of about 1: 1 to 5: 1 to raise insoluble dirt in the cleaning liquid composition together with air bubbles and separate insoluble dirt. can do. In cleaning by spraying, the pressure is preferably, for example, 0.5 to 10 kg / cm 2 G. In any case, the washing time is preferably from 15 seconds to
It is 2 hours, particularly preferably 30 seconds to 20 minutes. If the amount is less than the above range, the washing is insufficient, and the adhered dirt cannot be sufficiently removed. On the other hand, if the amount exceeds the above range, the cleaning effect is not particularly improved. The washing temperature is preferably from 20 to 120C. In the above-mentioned washing, the treatment at a higher temperature can significantly increase the washing effect. If it is less than the above range, the cleaning tends to be insufficient.
【００１４】本発明の洗浄液組成物は、精密部品に付着
したワックス・ピッチを洗浄するために用いられる。こ
のような精密部品は製造の工程において、部品表面の保
護、固定などの目的でワックス・ピッチを用いることが
あり、表面に付着したワックス・ピッチは洗浄により除
去される。The cleaning liquid composition of the present invention is used for cleaning wax and pitch adhered to precision parts. In such a manufacturing process, wax pitch may be used in the manufacturing process for the purpose of protecting and fixing the surface of the component, and the wax pitch adhering to the surface is removed by washing.
【００１５】このような精密部品としては、電子・電気
部品、光学部品、精密機械部品などがあげられる。対象
となる電気・電子部品としては、プリント配線基板、セ
ラミック配線基板などの配線基板、リードフレームなど
の半導体パッケージ部品、リレー、コネクターなどの接
点部材、液晶、プラズマディスプレイなどの表示部品、
ハードディスク記憶媒体、磁気ヘッドなどの磁気記憶部
品、水晶振動子などの圧電部品、モータ、ソレノイドな
どの電動機部品、センサー部品があげられる。光学部品
としては、めがね、カメラ用などのレンズ、その筐体が
あげられる。精密機械部品としては、ＶＴＲなどに用い
られる精密ベアリングなどの部品があげられる。Such precision parts include electronic / electric parts, optical parts, precision machine parts, and the like. Targeted electrical and electronic components include printed circuit boards, wiring boards such as ceramic wiring boards, semiconductor package components such as lead frames, contact members such as relays and connectors, display components such as liquid crystals and plasma displays,
Examples include hard disk storage media, magnetic storage components such as magnetic heads, piezoelectric components such as quartz oscillators, motor components such as motors and solenoids, and sensor components. Optical components include lenses for glasses, cameras and the like, and their housings. Examples of precision machine parts include parts such as precision bearings used in VTRs and the like.
【００１６】汚染物となるワックス・ピッチを具体的に
例示すれば、研磨用あるいは張付用ピッチとしてのスト
レートアスファルト系、ブローンアスファルト系、ウッ
ド系等のピッチが挙げられる。また、ワックスは金属、
ガラス等の仮止め接着剤として使用されている天然樹
脂、石油アスファルト、天然ワックス、石油系ワックス
等があげられる。Specific examples of wax pitches that become contaminants include straight asphalt-based, blown asphalt-based, and wood-based pitches as polishing or sticking pitches. Also, wax is metal,
Examples include natural resin, petroleum asphalt, natural wax, petroleum-based wax, etc. used as a temporary fixing adhesive for glass and the like.
【００１７】[0017]
【実施例】以下、本発明を実施例、比較例により更に詳
細に説明するが、本発明はこれら実施例により限定され
るものではない。EXAMPLES The present invention will be described in more detail with reference to examples and comparative examples, but the present invention is not limited to these examples.
【００１８】洗浄液として、芳香族系洗浄液１〜３、ナ
フテン系洗浄液、パラフィン系洗浄液を用いた。これら
の洗浄液の性状を表１に示す。なお、芳香族系洗浄液１
は、メチルナフタレンを６１重量％、ジメチルナフタレ
ンを１７重量％、エチルナフタレンを１５重量％含有す
る。芳香族系洗浄液２は、ジメチルナフタレンを３４重
量％、炭素数１３のアルキルナフタレンを４７重量％、
炭素数１４のアルキルナフタレンを４重量％含有する。
芳香族系洗浄液３は、ジイソプロピルナフタレンを９８
重量％含有する。As the cleaning liquid, aromatic cleaning liquids 1 to 3, naphthenic cleaning liquid and paraffin cleaning liquid were used. Table 1 shows the properties of these cleaning solutions. In addition, aromatic cleaning liquid 1
Contains 61% by weight of methylnaphthalene, 17% by weight of dimethylnaphthalene, and 15% by weight of ethylnaphthalene. The aromatic cleaning liquid 2 contains 34% by weight of dimethyl naphthalene, 47% by weight of alkyl naphthalene having 13 carbon atoms,
It contains 4% by weight of an alkylnaphthalene having 14 carbon atoms.
The aromatic cleaning liquid 3 contains 98 g of diisopropyl naphthalene.
% By weight.
【００１９】また、芳香族系洗浄液１〜３にＮ−メチル
−２−ピロリドン（以下、ＮＭＰともいう）を配合し
て、複合洗浄液１〜５を調製した。その配合量を表２に
示す。芳香族系洗浄液１〜３にγ−ブチルラクトン、
１，３−ジメチルー２−イミダゾリジノン（以下、ＤＭ
Ｉともいう）またはシクロヘキサノンを配合して、複合
洗浄液６〜１０を調製した。その配合量を表３に示す。Further, N-methyl-2-pyrrolidone (hereinafter also referred to as NMP) was blended with the aromatic cleaning liquids 1 to 3 to prepare composite cleaning liquids 1 to 5. The amounts are shown in Table 2. Γ-butyl lactone in aromatic cleaning liquids 1 to 3,
1,3-dimethyl-2-imidazolidinone (hereinafter referred to as DM
I)) or cyclohexanone, to prepare complex cleaning solutions 6 to 10. The amounts are shown in Table 3.
【００２０】[0020]
【表１】 [Table 1]
【００２１】[0021]
【表２】 [Table 2]
【００２２】[0022]
【表３】 [Table 3]
【００２３】ピッチ洗浄性の評価では、ピッチ（九重電
気（株）製、Ｋ級３号）を溶解した３０％濃度トルエン
溶液に光学ガラスを浸し、室温で乾燥することで、均一
なピッチを付着させたものを洗浄対象物として用いた。
この洗浄対象物を洗浄液が充填された洗浄槽において液
温３０℃で超音波照射下に２分間洗浄を行った。洗浄槽
から取りだした洗浄対象物を、１０分間立てて静置後、
温風乾燥機で洗浄液を蒸散除去し乾燥した。洗浄後に、
肉眼によりピッチの痕跡が全く認められないものを〇、
微かに痕跡のあるものを△、明らかな痕跡のあるものを
×として評価し、表１、２、３に併せて示した。In the evaluation of the pitch cleaning property, the optical glass was immersed in a 30% strength toluene solution in which pitch (Kuju Electric Co., Ltd., K class No. 3) was dissolved, and dried at room temperature to attach a uniform pitch. The cleaned product was used as an object to be cleaned.
The object to be cleaned was cleaned in a cleaning tank filled with a cleaning liquid at a liquid temperature of 30 ° C. under ultrasonic irradiation for 2 minutes. After the object to be washed taken out of the washing tank is left standing for 10 minutes,
The washing liquid was removed by evaporation with a warm air dryer and dried. After washing,
If no trace of the pitch is recognized by the naked eye,
Those with slight traces were evaluated as Δ, and those with clear traces were evaluated as x, and are shown in Tables 1, 2, and 3.
【００２４】ワックス洗浄性の評価では、天然樹脂、石
油アスファルト、天然ワックスを成分とするリセスワッ
クス（九重電気（株）製、Ｎｏ．６）０．３ｇを光学ガ
ラス上に置き、８０℃に加熱し、１５分放置して溶融塗
布し、その後室温まで放冷したものものを洗浄対象物と
して用いた。この洗浄対象物を洗浄液が充填された洗浄
槽において液温３０℃で超音波照射下に1分間および２
分間洗浄を行った。洗浄槽から取りだした洗浄対象物
を、１０分間立てて静置後、温風乾燥機で洗浄液を蒸散
除去し乾燥した。１分間の洗浄により肉眼によりワック
スの痕跡が全く認められないものを◎、２分間の洗浄に
より肉眼によりワックスの痕跡が全く認められないもの
を〇、微かな痕跡のあるものを△、明らかに痕跡のある
ものを×として評価し、表１、２、３に併せて示した。In the evaluation of wax washability, 0.3 g of a recess wax (No. 6 manufactured by Kuju Denki Co., Ltd.) containing natural resin, petroleum asphalt and natural wax as components, was placed on an optical glass and heated to 80 ° C. Then, it was left to stand for 15 minutes, melt-coated, and then allowed to cool to room temperature, and used as a cleaning object. The object to be cleaned is placed in a cleaning tank filled with a cleaning liquid at a liquid temperature of 30 ° C. under ultrasonic irradiation for 1 minute and 2 minutes.
Washing was performed for minutes. After the object to be washed taken out of the washing tank was allowed to stand for 10 minutes and allowed to stand, the washing liquid was evaporated off with a warm air drier and dried. 1 minute wash shows no trace of wax by the naked eye. ◎ 2 minute wash shows no trace of wax by the naked eye. Δ shows fine trace. Those with a mark were evaluated as x, and are shown in Tables 1, 2, and 3.
【００２５】[0025]
【発明の効果】本発明の洗浄液によるワックス・ピッチ
が付着した精密部品の洗浄は、環境規制上使用が制限さ
れている化合物を用いることなく、引火性が高いことな
どにより使用・取り扱いが比較的容易であり、かつ、ワ
ックス・ピッチに対して十分な洗浄性を有し、加えて、
精密部品を構成する材料自体に対する攻撃性のない洗浄
が可能となる。The cleaning liquid of the present invention for cleaning precision parts to which wax and pitch have adhered is relatively easy to use and handle due to its high flammability without using compounds whose use is restricted by environmental regulations. It is easy and has sufficient cleaning properties for wax and pitch.
Cleaning without aggressiveness to the material itself that constitutes the precision part can be performed.
Claims (2)
７０重量％以上含有する洗浄液組成物であり、洗浄液組
成物の蒸留性状における５％留出温度と９５％留出温度
の差が１０℃以下であることを特徴とするワックス・ピ
ッチ用洗浄液組成物。1. A cleaning liquid composition containing a bicyclic aromatic compound having 10 to 18 carbon atoms in an amount of 70% by weight or more, wherein the difference between the 5% distillation temperature and the 95% distillation temperature in the distillation properties of the cleaning liquid composition is A cleaning liquid composition for wax and pitch, which is at most 10 ° C.
４０〜９５重量％含有し、Ｎ−メチル−２−ピロリド
ン、γ−ブチルラクトン、シクロヘキサノン、１，３−
ジメチル−２−イミダゾリジノンから選ばれる化合物を
合計で６０〜５重量％含有することを特徴とするワック
ス・ピッチ用洗浄液組成物。2. A composition comprising a bicyclic aromatic compound having 10 to 18 carbon atoms in an amount of 40 to 95% by weight, N-methyl-2-pyrrolidone, γ-butyllactone, cyclohexanone, 1,3-
A cleaning composition for wax pitch, comprising a total of 60 to 5% by weight of a compound selected from dimethyl-2-imidazolidinone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34964599A JP4530382B2 (en) | 1999-12-09 | 1999-12-09 | Washing liquid composition for wax and pitch |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34964599A JP4530382B2 (en) | 1999-12-09 | 1999-12-09 | Washing liquid composition for wax and pitch |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001164291A true JP2001164291A (en) | 2001-06-19 |
| JP4530382B2 JP4530382B2 (en) | 2010-08-25 |
Family
ID=18405146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34964599A Expired - Fee Related JP4530382B2 (en) | 1999-12-09 | 1999-12-09 | Washing liquid composition for wax and pitch |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4530382B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003027090A (en) * | 2001-07-16 | 2003-01-29 | Japan Energy Corp | Cleaning liquid composition |
| JP2003027091A (en) * | 2001-07-16 | 2003-01-29 | Japan Energy Corp | Cleaning liquid composition |
| JP2009074053A (en) * | 2007-08-24 | 2009-04-09 | Mitsubishi Gas Chem Co Inc | Washing agent and washing method for optical material composition including sulfur and selenium atoms |
| WO2009072352A1 (en) * | 2007-12-05 | 2009-06-11 | Tokyo Ohka Kogyo Co., Ltd. | Cleaning liquid and cleaning method |
| JP2010042362A (en) * | 2008-08-13 | 2010-02-25 | Japan Energy Corp | Hydrocarbon-based solvent composition |
| CN111205940A (en) * | 2019-12-31 | 2020-05-29 | 广东新球清洗科技股份有限公司 | Wax removal cleaning agent and preparation method and application thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02247293A (en) * | 1989-03-20 | 1990-10-03 | Nippon Mining Co Ltd | Production of high boiling point, high aromatic solvent |
| JPH06184777A (en) * | 1992-12-18 | 1994-07-05 | Nippon Petrochem Co Ltd | Detergent |
| JPH08253798A (en) * | 1995-03-16 | 1996-10-01 | Japan Energy Corp | Urethane detergent |
| JPH08254602A (en) * | 1995-03-16 | 1996-10-01 | Japan Energy Corp | Cleaning agent for optical component |
| JPH10298587A (en) * | 1997-04-28 | 1998-11-10 | Kao Corp | Cleaning agent composition for precision part and tools therefor |
-
1999
- 1999-12-09 JP JP34964599A patent/JP4530382B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02247293A (en) * | 1989-03-20 | 1990-10-03 | Nippon Mining Co Ltd | Production of high boiling point, high aromatic solvent |
| JPH06184777A (en) * | 1992-12-18 | 1994-07-05 | Nippon Petrochem Co Ltd | Detergent |
| JPH08253798A (en) * | 1995-03-16 | 1996-10-01 | Japan Energy Corp | Urethane detergent |
| JPH08254602A (en) * | 1995-03-16 | 1996-10-01 | Japan Energy Corp | Cleaning agent for optical component |
| JPH10298587A (en) * | 1997-04-28 | 1998-11-10 | Kao Corp | Cleaning agent composition for precision part and tools therefor |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003027090A (en) * | 2001-07-16 | 2003-01-29 | Japan Energy Corp | Cleaning liquid composition |
| JP2003027091A (en) * | 2001-07-16 | 2003-01-29 | Japan Energy Corp | Cleaning liquid composition |
| JP2009074053A (en) * | 2007-08-24 | 2009-04-09 | Mitsubishi Gas Chem Co Inc | Washing agent and washing method for optical material composition including sulfur and selenium atoms |
| WO2009072352A1 (en) * | 2007-12-05 | 2009-06-11 | Tokyo Ohka Kogyo Co., Ltd. | Cleaning liquid and cleaning method |
| JP2010042362A (en) * | 2008-08-13 | 2010-02-25 | Japan Energy Corp | Hydrocarbon-based solvent composition |
| CN111205940A (en) * | 2019-12-31 | 2020-05-29 | 广东新球清洗科技股份有限公司 | Wax removal cleaning agent and preparation method and application thereof |
| CN111205940B (en) * | 2019-12-31 | 2021-05-25 | 广东新球清洗科技股份有限公司 | Wax removal cleaning agent and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4530382B2 (en) | 2010-08-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR0168486B1 (en) | Detergent, method and apparatus for cleaning | |
| JP6266983B2 (en) | Azeotropic and azeotrope-like compositions of methyl perfluoroheptene ether and trans-1,2-dichloroethylene and uses thereof | |
| JP2763270B2 (en) | Cleaning method, cleaning apparatus, cleaning composition and steam-dried composition | |
| CN1831099B (en) | Cleaning agent composition and cleaning method | |
| US20060135390A1 (en) | Cleaning and rinsing method | |
| JP2001164291A (en) | Cleaning liquid composition for wax and pitch | |
| KR20090045859A (en) | Stripping agent for polyimide | |
| JPH1036894A (en) | Cleaning method | |
| JPH03162496A (en) | Detergent composition | |
| JP2002256295A (en) | Cleaning method | |
| JP4265717B2 (en) | Cleaning solution composition for rosin | |
| JPH0362896A (en) | Detergent composition | |
| JP4530381B2 (en) | Cleaning liquid composition | |
| JP2001226700A (en) | Detergent liquid composition | |
| JP5546171B2 (en) | Quick-drying liquid composition and draining method using the same | |
| JP5000047B2 (en) | Cleaning liquid composition | |
| JP2015074777A (en) | Detergent liquid composition | |
| JPH0394082A (en) | Detergent composition | |
| JP4803779B2 (en) | Cleaning liquid composition | |
| KR102653027B1 (en) | Composition for removing polyimide | |
| JP4115790B2 (en) | Hydrocarbon cleaning liquid composition | |
| JPH07305097A (en) | Cleaning agent composition | |
| JP5048312B2 (en) | Cleaning liquid composition | |
| JP2002241794A (en) | Cleaning liquid composition for optical part | |
| JPH04130199A (en) | Detergent composition and method for cleaning |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20040209 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20040312 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060816 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20070725 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090529 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090616 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090804 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20090804 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100202 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100315 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100602 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100607 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4530382 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130618 Year of fee payment: 3 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130618 Year of fee payment: 3 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |