JP2001061269A - Motor device, stage device, and aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a stage device which is capable of a noncontact drive of a stage, while simplifying the constitution of the stage. SOLUTION: Cylindrical magnets which are magnetized axially are arranged in the order in the axial direction to constitute a magnetic pole unit. Supporting force for supporting floating is generated together with an axial drive force, by supplying a cylindrical armature coil 45 arranged in the density distribution of magnetic fluxes generated by this magnetic pole unit with a current where a current for axial drive and a current for diametrical drive are superposed. Moreover, supporting force for supporting floating is generated by arranging magnetic guide devices 70a and 70b for generating diametrical magnetic force in the density distribution of magnetic fluxes generated by the magnetic pole unit.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a motor device, a stage device, and an exposure device, and more particularly, to a motor device having a mover and a stator and driving the mover one-dimensionally or two-dimensionally. The present invention relates to a stage device including a moving body to which a mover of the motor device is integrally attached, and an exposure apparatus including the stage device.

[0002]

2. Description of the Related Art Conventionally, in a lithography process for manufacturing a semiconductor device, a liquid crystal display device, or the like, a pattern formed on a mask or a reticle (hereinafter, collectively referred to as a “reticle”) is resisted through a projection optical system. There is used an exposure apparatus that transfers an image onto a substrate such as a wafer or a glass plate (hereinafter, appropriately referred to as a “substrate” or a “wafer”) coated with a substrate. As such an exposure apparatus, a stationary exposure type projection exposure apparatus such as a so-called stepper and a scanning exposure type projection exposure apparatus such as a so-called scanning stepper are mainly used. In these types of exposure equipment,
Since the pattern formed on the reticle needs to be sequentially transferred to a plurality of shot areas on the wafer,
A stage device capable of moving in a dimension is provided.

In such a stage apparatus, it is required to accurately position the wafer for high-precision exposure, and to move the wafer at high speed to improve throughput. Accordingly, in recent years, the wafer is moved at a higher speed, and the position is controlled with high accuracy without being affected by the accuracy of the mechanical guide surface, etc., and the life is extended by avoiding mechanical friction. For this reason, a stage device that controls the position of the wafer by driving the stage on which the wafer is mounted in a non-contact manner has been developed. As a stage drive source in such a non-contact drive stage device, a motor device such as a linear motor device or a planar motor device employing a variable reluctance drive method or an electromagnetic force drive method using Lorentz force is used.

[0004]

In the above-described stage device, a floating support device such as an air guide device or the like is completely separate from a driving motor device in order to stably and non-contactly support the stage in driving the stage. Was used. In addition, for high-precision exposure, the focus position control and leveling control are performed separately from the drive motor device so that the image plane of the mask pattern by the projection optical system and the exposure area on the substrate match as much as possible. Focus
A leveling device (so-called Zθ stage device) was also required.

The levitation support device and the focus leveling device need to move together with the stage due to the functions to be performed, and this has caused an increase in the weight and volume of the driven object.

Further, when an air guide device having excellent stability as a floating support device and capable of realizing a non-contact state with high rigidity is employed, exposure can be performed only in an environment close to the atmosphere. Was.

The present invention has been made under such circumstances, and a first object of the present invention is to enable a movable element to be supported in a non-contact manner with respect to a stator with a simple structure and to provide a movable element. An object of the present invention is to provide a motor device capable of position control with high accuracy.

A second object of the present invention is to provide a stage device capable of simplifying the structure of the stage and reducing the size and weight.

A third object of the present invention is to provide an exposure apparatus capable of improving exposure accuracy and throughput.

[0010]

According to a first aspect of the present invention, there is provided a first motor device having a cylindrical shape having a predetermined axis as a central axis, the plurality of motors being disposed along an axial direction of the predetermined axis. Magnet (34
R, 34N, 34L, 34S), and a magnetic pole unit (38) for generating a magnetic flux density along the axial direction, in which a radial component and an axial component about the predetermined axis change at mutually different phases. An armature unit (49) including a plurality of armature coils (45) arranged along the axial direction of a predetermined axis; and controlling each of the armature coils by controlling a current supplied to each of the armature coils. A first current control device (50, 5) that controls the radial Lorentz force and the axial Lorentz force generated in the current path of the coil;
1) is provided.

According to this, the magnetic pole unit generates a magnetic flux density in which the axial components change at different phases along the axial direction of the predetermined axis and along the radial direction with respect to the predetermined axis. Under such an environment of the magnetic flux density, when a current flowing around a predetermined axis is supplied to the armature coil constituting the armature unit, the armature coil is given a predetermined axis by the current and the radial component of the magnetic flux density. Along with the generation of the Lorentz force in the axial direction, the current and the axial component of the magnetic flux density generate the Lorentz force in the radial direction of a predetermined axis.
That is, a translational driving force in the axial direction of the predetermined shaft and a supporting force in the radial direction are simultaneously generated.

Since the axial component and the radial component of the magnetic flux density have different phases of change along the axial direction, the current supplied to each of the plurality of armature coils is adjusted by the first current controller. Thereby, a translation driving force in the desired axial direction and a supporting force in the radial direction can be generated. In particular, when the phase difference is 90 °, the translation driving force and the supporting force can be generated independently.

Therefore, the magnetic pole unit and the armature unit are maintained in a non-contact manner without separately providing an air guide device or the like which is a completely different resource from the resources for the axial drive for the non-contact support. In addition, the magnetic pole unit and the armature unit can be relatively moved with good position control. In addition, even if a floating support device such as an air guide device is provided, the size of the device may be small enough to reinforce the support force in the radial direction due to the Lorentz force. Can be.

In the first motor device of the present invention, the magnetic pole unit has a cylindrical shape having the predetermined axis as a central axis, is magnetized in the axial direction of the predetermined axis, and is magnetized in the axial direction. A plurality of first magnets (34R, 34R,
34L); a plurality of cylinders having a cylindrical shape with the predetermined axis as a central axis, magnetized in the radial direction, and arranged between the adjacent first magnets in the arrangement of the first magnets; And the second magnets (34N, 34S).

In such a case, the first magnetized in the axial direction
Since the magnet and the second magnet magnetized in the radial direction are alternately arranged along the axial direction, the outflow position of the magnetic flux from the magnetic pole unit to the surrounding space or the magnetic flux inflow position to the magnetic pole unit from the surrounding space is And a sufficiently wide area over the entire magnetic pole face of the second magnet. For this reason, the distribution of the magnetic flux density in the axial direction in the vicinity of the magnetic pole unit changes gently, and the contained harmonic components become smaller. That is, in the vicinity of the magnetic pole unit, the radial component of the magnetic flux density is large and the axial distribution of the magnetic flux density gradually changes, so that the axial driving force can be generated efficiently and with good controllability. .

Further, since a large repulsive force generated when magnetic pole surfaces having the same polarity are joined to each other can be avoided, it is easy to assemble the magnetic pole unit and eventually the motor device.

In the first motor device of the present invention, the magnetization directions of the adjacent first magnets in the arrangement of the plurality of first magnets are opposite to each other, and the magnetization directions of the adjacent second magnets in the arrangement of the plurality of second magnets are opposite to each other. The second magnets may be configured so that the magnetization directions of the second magnets are opposite to each other. In such a case, for each second magnet, a magnetic flux corresponding to the sum of the magnetomotive force of the second magnet and the magnetomotive force of two first magnets adjacent to the second magnet is generated by the second magnet. Since the magnetic flux can be emitted from one magnetic pole surface or flow into one magnetic pole surface of the second magnet, a magnetic flux density that changes periodically along the axial direction can be efficiently generated, and continuous high precision can be achieved. Can be easily controlled.

Here, the polarity of the pole face of the first magnet is
A configuration in which the magnetic pole surface has the same polarity as the magnetic pole surface of the cylindrical outer surface of the second magnet opposed to the armature unit, and the armature unit is disposed radially outside the first magnet and the second magnet; can do. In such a case, a magnetic flux density that changes periodically along the axial direction can be efficiently generated radially outside the magnetic pole unit where the armature unit is arranged, so that the current path of the armature unit is By supplying a current, Lorentz force can be efficiently generated.

Further, in the first motor device of the present invention, the magnetic flux density generated by the magnetic pole unit changes periodically in the axial direction, and the plurality of armature coils generate the magnetic flux generated by the magnetic pole unit. The arrangement may be made along the axial direction at an arrangement cycle of 1 / N (N is an integer of 2 or more) of the change cycle of the density in the axial direction. In such a case, a constant translation driving force and a constant supporting force are continuously provided by supplying currents having the same amplitude different by (2π / N) to the armature coils arranged in order along the axial direction. Can occur.

Further, in the first motor device of the present invention, the armature unit is provided on at least one end in the axial direction of the armature unit, and the diameter of the armature unit is increased by a magnetic interaction with the magnetic pole unit in accordance with a supplied current. It may be configured to further include a magnetic guide device (70a, 70b) including an electromagnet that generates a directional force. In such a case, any radial force can be generated by the electromagnet,
When the magnetic pole unit or the armature unit included in the mover is eccentric, the eccentricity can be quickly corrected. The electromagnets are desirably provided at both ends in the axial direction of the armature unit. In such a case, the eccentricity can be corrected with good controllability. In addition, since a desired magnitude of supporting force can be generated in a desired radial direction, an air guide mechanism for floating support is not required at all, and operation in a vacuum atmosphere is possible. Further, the electromagnet enables three-dimensional driving with five degrees of freedom excluding rotation driving around a predetermined axis.

The second motor device of the present invention has a cylindrical shape having a predetermined axis as a center axis, and a plurality of magnets (34R, 34N) arranged along the axial direction of the predetermined axis. , 34
L, 34S), and a magnetic pole unit (38) for generating a magnetic flux density whose radial component with respect to the predetermined axis changes along the axial direction; and disposed along the axial direction of the predetermined axis. An armature unit (49) including a plurality of armature coils (45); provided on both ends in the axial direction of the armature unit;
A magnetic guide device (70a, 70b) including an electromagnet (71) for generating the radial force by magnetic interaction with the magnetic pole unit; and controlling each current supplied to each armature coil to control each of the armature coils. A motor device comprising: a first current control device (50, 51) for controlling the axial Lorentz force generated in a current path of an armature coil.

According to this, in an environment where the magnetic pole unit generates a magnetic flux density in which a radial component with respect to a predetermined axis changes along the axial direction, the armature coil constituting the armature unit has a predetermined magnetic flux density. When a current flowing around the axis is supplied, the current and the radial component of the magnetic flux density generate a Lorentz force in the axial direction of a predetermined axis in the armature coil, and this Lorentz force or a reaction force of the Lorentz force is generated. Is the driving force in the axial direction. Further, a radial magnetic force is generated between the magnetic pole unit and each of the electromagnets, and this magnetic force becomes a supporting force for supporting the armature unit in a non-contact manner with respect to the magnetic pole unit. Therefore, the magnetic pole unit and the armature unit are maintained in a non-contact manner without separately providing an air guide device or the like which is a completely different resource from the resources for the axial driving for the non-contact support. And the armature unit can be relatively moved with good position control.

In the first and second motor devices of the present invention,
The change in the magnetic flux density generated by the magnetic pole unit with respect to the axial direction is periodic, and the electromagnet has a structure in which two magnetic pole faces face the magnetic pole unit and a midpoint between the two magnetic pole faces in the axial direction. The distance is substantially equal to the change period of the magnetic flux density generated by the magnetic pole unit in the axial direction.
/ 2. In such cases,
Since the two magnetic pole faces of the electromagnet having the opposite polarities can be present in the magnetic flux in the opposite directions, the radial magnetic force can be efficiently generated.

Here, the number of the electromagnets is an even number, the electromagnets are arranged around the predetermined axis, and the positions of the two electromagnets adjacent to each other around the predetermined axis in the axial direction are the magnetic poles. The configuration may be such that the magnetic flux density generated by the unit is shifted by about 1/4 of the change period in the axial direction. In such a case, in generating the radial supporting force, the electromagnets adjacent to each other around the axis of the predetermined axis can play a complementary role, so that the radial supporting force can be stably generated. .

Further, in the motor device of the present invention including the magnetic guide device, the magnetic guide device includes a detecting device (80a, 80b) for detecting a positional relationship between the magnetic pole unit and the armature unit in the radial direction. A second current control device (50, 51) for controlling a current supplied to the electromagnet based on a detection result by the detection device. In such cases,
The second current control device controls the direction and magnitude of the current supplied to each electromagnet based on the positional relationship in the radial direction between the magnetic pole unit and the armature unit detected by the detection device. Adjust the magnetic force between the electromagnet. Therefore, the positional relationship in the radial direction between the magnetic pole unit and the armature unit can be controlled to a desired positional relationship.

The stage apparatus of the present invention comprises a moving body (11) having a mounting surface; and a motor device (20XA, 20XB, 20YA, 20YB) for moving the moving body. The motor device is characterized in that: According to this, the moving body, and hence the object placed on the mounting surface of the moving body, are moved by driving the motor device of the present invention, but the motor device is one of the resources for moving the moving body. Parts are shared, and an electromagnetic or magnetic support mechanism for supporting the stator and the mover in a non-contact manner is provided, so that the need to provide a support mechanism such as an air guide mechanism can be eliminated or simplified. it can. For this reason,
The structure of the moving object can be simplified and the size and weight can be reduced while securing the high-precision position control function and attitude control function of the moving object. Can be moved.

[0027] In the stage device of the present invention, the moving body may be moved by the motor device in a first axial direction and a second axial direction different from the first axial direction. In such a case, the moving body can be moved along an arbitrary two-dimensional direction by combining the movement along the first axis direction and the movement along the second axis direction.

Further, in the stage device of the present invention, the motor device may be configured to move the movable body in a direction inclined with respect to a reference plane. In such a case, since the motor device moves the moving body in the direction of inclination with respect to the reference plane, the inclination of the mounting surface of the moving body with respect to the reference plane can be adjusted.

The exposure apparatus of the present invention comprises a stage device (WS
An exposure apparatus for transferring a predetermined pattern onto a substrate while the moving body included in T) is moving, is characterized by including the stage device of the present invention as the stage device.

According to this, while moving the moving body at high speed while controlling the position of the moving body with high precision, the predetermined pattern is transferred to the substrate, so that the exposure accuracy and the throughput can be improved. Note that the moving body can be, for example, a substrate stage for holding a substrate or a mask stage for holding a mask on which a predetermined pattern is formed.

In the exposure apparatus according to the present invention, the motor device may be configured to cancel the deformation caused by the movement of the center of gravity caused by the movement of the moving body. In such a case, deformation due to the movement of the center of gravity due to the integral movement of the moving body and the mover of the motor device, for example, the orthogonality of the moving direction of the stator in the motor device and the mover non-contact supported by the stator. The deformation such as a change in the positional relationship in the plane is canceled by the above-described support force by the Lorentz electromagnetic force, the magnetic guide device, or the like. Therefore, the moving body can be driven without being adversely affected by the movement of the center of gravity due to the movement of the moving body, so that the exposure accuracy can be improved.

[0032]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. FIG. 1 schematically shows the overall configuration of an exposure apparatus 100 according to the present embodiment. The exposure apparatus 100 is a projection exposure apparatus of a so-called step-and-scan exposure system.

The exposure apparatus 100 includes an illumination system IOP, a reticle stage RST for holding a reticle R, a projection optical system PL, a wafer stage device WST as a stage device for driving a wafer W in XY two-dimensional directions within an XY plane,
And a control system for them.

The illumination system IOP includes a light source unit, an illuminance uniforming optical system including a fly-eye lens, a relay lens, a variable ND filter, a reticle blind, a dichroic mirror, and the like (all not shown). I have. The configuration of such an illumination system IOP is disclosed in, for example, Japanese Patent Application Laid-Open No. H10-112433. The illumination light IL emitted from the illumination system IOP is reflected by the bending mirror M, and then is slit-shaped (rectangular or arc-shaped) illumination defined by a reticle blind on a reticle R on which a circuit pattern or the like is drawn. The area is illuminated with substantially uniform illuminance.

A reticle R is fixed on the reticle stage RST by, for example, vacuum suction or electrostatic suction. The reticle stage RST controls the position of the reticle R by a reticle stage drive unit (not shown) composed of a two-dimensional actuator or the like constituted by a magnetic levitation type linear motor using Lorentz force or reactance force on a reticle base (not shown). Therefore, it can be finely driven in an XY plane perpendicular to the optical axis IX of the illumination system IOP (coincident with the optical axis AX of the projection optical system PL described later) and has a predetermined scanning direction (here, the Y direction). Can be driven at the scanning speed specified in the above. Further, in the present embodiment, the magnetic levitation type two-dimensional linear actuator includes a Z drive coil in addition to the X drive coil and the Y drive coil, and thus can be minutely driven in the Z direction.

On this reticle stage RST, a reticle laser interferometer (hereinafter, referred to as “reticle interferometer”) 5
A movable mirror 52 for reflecting the laser beam from the reticle stage 3 is fixed.
It is always detected with a resolution of about nm. Position information of reticle stage RST from reticle interferometer 53 is sent to stage control system 51 and main controller 50 via the same, and in response to an instruction from main controller 50, position control of reticle stage RST is performed. The reticle stage RST is driven via a reticle driving unit (not shown) based on the information.

The projection optical system PL is arranged below the reticle stage RST in FIG. 1, and its optical axis AX
The direction (corresponding to the optical axis IX of the illumination optical system) is the Z-axis direction. As the projection optical system PL, for example, a refraction optical system including a plurality of lens elements arranged at predetermined intervals along the optical axis AX direction so as to be telecentric on both sides is used. The projection optical system PL is a reduction optical system having a predetermined projection magnification, for example, 1/5 (or 1/4, 1/6). Therefore, when the illumination area of the reticle R is illuminated by the illumination light IL from the illumination optical system, the illumination light IL that has passed through the reticle R causes the circuit of the reticle R in the illumination area to pass through the projection optical system PL. A reduced image (partially inverted image) of the pattern is formed on an exposed area conjugate to the illumination area on wafer W having a surface coated with photoresist.

The wafer stage device WST includes a driving device 10 and a substrate table 11 as a moving body having a mounting surface on which the wafer W is mounted. The configuration of the driving device 10 will be described later.

A wafer W is fixed on the substrate table 11 by, for example, vacuum suction or electrostatic suction.
A wafer laser interferometer (hereinafter, referred to as a “wafer interferometer”) as a position detecting device is provided on the substrate table 11.
A movable mirror 54 for reflecting the laser beam from the laser beam 55 is fixed, and the position of the substrate table 11 in the XY plane is, for example, 0.5 to 1 by the wafer interferometer 55 disposed outside.
It is always detected with a resolution of about nm. Here, as shown in FIG. 2, actually, the movable mirror 54 </ b> Y having a reflection surface orthogonal to the Y-axis direction, which is the scanning direction, is orthogonal to the X-axis direction, which is the non-scanning direction, on the substrate table 11. A movable mirror 54X having a reflection surface is provided, and these are representatively shown as the movable mirror 54 in FIG. Further, as shown in FIG. 2, a one-axis wafer interferometer 55X is provided in the scanning direction and a two-axis wafer interferometer is provided in the non-scanning direction. Shown as interferometer 55. The position information (or speed information) of the substrate table 11 is sent to the stage control system 51 and the main controller 50 via the stage control system 51.
Then, the movement of the substrate table 18 is controlled via the driving device 10 based on the position information (or the speed information) in response to an instruction from the main controller 50.

Further, on the substrate table 11, various reference marks for measuring a baseline from the detection center of the off-axis type alignment detection system (not shown) to the optical axis of the projection optical system PL are provided. The formed reference mark plate (not shown) is fixed.

Further, in the exposure apparatus 100 shown in FIG. 1, an oblique incident light type focus detection for detecting the position in the exposure area on the surface of the wafer W and the area in the vicinity thereof in the Z direction (optical axis AX direction). A multipoint focus position detection system, which is one of the systems (focus detection system), is provided. This multipoint focus position detection system includes an irradiation optical system and a light receiving optical system (not shown). For a detailed configuration of the multi-point focus position detection system, see, for example,
No. 6,009,036.

Next, the structure and operation of the driving device 10 will be described with reference to FIGS.

As shown in FIG. 2, the driving device 10 includes a surface plate 12 and an X moving body 15 movable in the X-axis direction.
And linear motors 20XA and 20XB as motor devices for driving the X moving body 15 in the X direction.

As the surface plate 12, for example, a rectangular or square plate made of alumina ceramic which is lighter and harder to be damaged than iron is used in plan view.

The linear motor 20XA is disposed at an end in the −Y direction on the surface plate 12, and the linear motor
0XB is arranged at the end in the + Y direction on the surface plate 12.

As shown in FIG. 3, the linear motor 20XA has an outer diameter D1 and a cylindrical stator 30XA extending in the X-axis direction, and a diameter slightly larger than the outer diameter D1 of the stator 30XA. D2 having a hollow portion, through which the stator 30XA penetrates, the stator 30X
And a mover 40 </ b> XA arranged outside of A.
The outer diameter of the mover 40XA is D3 on the vertically lower side,
It has a semi-cylindrical outer shape with an inner diameter of D2, and its vertically upper portion has a rectangular parallelepiped shape having an upper surface substantially parallel to the XY plane.

Both ends of the stator 30XA are supported by the support members 22a and 22b. As shown clearly in FIG. 3, the support members 22a and 22b each have a columnar recess into which the end of the stator 30XA is inserted. Then, after the stator 30XA is passed through the hollow portion of the mover 40XA, the support members 22a and 22b and the stator 30XA are firmly fixed by screwing or the like, whereby the linear motor 20A is assembled. The support member 22
As shown in FIG. 2, a and 22b are firmly fixed to the upper surface of the platen 12 by screws or the like.

The stator 30XA has an inner diameter D4 and an outer diameter D5 as shown in FIG. 4 (A) and FIG. 4 (B) which is a sectional view taken along the line CC in FIG. 4 (A). A cylindrical magnet support member 32 extending in the axial direction and having a stopper portion 32S having an outer diameter D1 at one end, and an outer diameter D1, an inner diameter D5, and a length in the X-axis direction fixed to the magnet support member 31. L, and a predetermined number of permanent magnets 34R, 34N, 34L, made of a high-performance machinable magnet material such as MnAl.
34S, and a permanent magnet 34LC fixed to the other end of the magnet support member 31. Permanent magnet 34R, 34
N, 34L, and 34S are arranged in this order along the X direction, and after the permanent magnet 34S in the arrangement,
Further, the arrangement in the order of the permanent magnets 34R, 34N, 34L, 34S is repeated. Here, a predetermined number of permanent magnets 34R, 34N, 34L, 34S and permanent magnets 34L
The magnetic pole unit 38 is constituted by C.

The magnet support member 32 is made of, for example, stainless steel, and the other end is formed with a male screw whose outer diameter is substantially the same as D5. The support members 22a, 22
The fixing of the stator 30 to the supporting members 2a, 22b
The magnet support member 32 is screwed to the magnet support member 32. Screw holes (not shown) for screwing the magnet support member 32 are formed on both end surfaces of the magnet support member 32.

The permanent magnet 34R is a magnet magnetized in the X-axis direction. The end face on the −X direction side is an S pole face, and the end face on the + X direction side is an N pole face. Further, the permanent magnet 34
L is a magnet magnetized in the X-axis direction. The end face on the −X direction side is an N pole face, and the end face on the + X direction side is an S pole face. That is, the permanent magnet 34R and the permanent magnet 34L are arranged such that the directions of the magnetic moments of the same permanent magnet are opposite to each other. The permanent magnet 34L
C has the same magnetic properties as the permanent magnet 34L,
On the inner surface of the cylinder, a female screw is formed which is screwed with a male screw formed on the other end of the magnet support member 32.

The permanent magnet 34N is a magnet which is magnetized in the radial direction. The radially outer cylindrical side surface is an N pole surface, and the radially inner cylindrical side surface is an S pole surface. Further, the permanent magnet 34S is a magnet magnetized in the radial direction, the radially outer cylindrical side surface being an S pole surface, and the radially inner cylindrical side surface being an N pole surface.

The stator 30XA is connected to the permanent magnets 34R, 34 from the other end of the magnet support member 32 on which the male screw is formed.
N, 34L, and 34S are sequentially press-fitted, and finally, the female screw formed on the inner surface of the cylinder of the permanent magnet 34LC is screwed into the male screw of the magnet support member 32 to assemble. Thus, the stator 30XA having high rigidity is assembled.

The mover 40XA is shown in FIG. 5 which is an XZ sectional view, FIG. 6 (A) which is a left side view in FIG. 5, and FIG. 6 (B) which is a DD sectional view (YZ sectional view) in FIG. ),
And Figure 5 E-E sectional view in as shown by comprehensively Figure 7 is a (YZ sectional view), a center axis the axis X _A, to form a hollow extending in the X-axis direction of the diameter D2, the cylindrical Container body member 41 having an internal space of
A lid member 42 fixed to the end in the Z direction and closing the cylindrical internal space together with the container main body member 41 is provided. The cylindrical inner space of the container main body member 41, so that the axis X _A is the central axis, the cylindrical coil support member 43 is disposed, around the coil support member 43, the axis X _A
The plurality of coils 45 ₁ to 45 _6N conductive wire in the direction of rotation is wound diameter 2R are arranged along the X-axis direction about axis. Here, each coil 45 _i (i = 1
To 6N) are formed by winding a conductive wire having a rectangular cross section to improve the current space density. Here, the armature unit 49 is constituted by a plurality of coils 45 ₁ to 45 _6N. In the following description,
The armature unit 49 is also referred to as a coil array 49.

A magnetic guide device 70a is attached to the end of the coil support member 43 in the −X direction.
A magnetic guide device 70b is attached to the end in the direction. The magnetic guide devices 70a and 70b will be described later.

As shown in FIG. 8, the coil supporting member 43 has a notch at its end, and through the notch, a space outside the coil supporting member 43 in the radial direction and a space inside the coil supporting member 43 in the radial direction are formed. Are communicating. Note that the coil support member 43 is fixed to the container main body member 41 by screwing or the like.

[0056] Further, the container main body member 41, FIG as 5 shown in, the refrigerant inlet 48 ₁ and the coolant outlet 48 ₂
Doo is provided, the refrigerant (e.g., fluorine-based inert liquid) from chiller 74 shown in FIG. 1 inlet 48 ₁
And heat is exchanged between the coil _45i and the coil support member 43 when passing through the internal space. By such heat exchange, current heat generated in the coil 45 _i is the heat removal as a result of being supplied.
Here, the inner wall surfaces of the container body member 41 and the lid member 42 are smoothed, so that turbulence is hardly generated.
For this reason, the heat absorbed from the coil 45 _i and the coil support member 43 does not easily reach the container body member 41 or the lid member 42. In the present embodiment, heat is applied to the container body member 4.
Before reaching the first or lid member 42, the refrigerant flows out of the outlet 48 ₂
The flow rate of the refrigerant is set so that the refrigerant is discharged from the refrigerant. Thus, the refrigerant discharged through the outlet port 48 ₂ is returned to the chiller 74 via the refrigerant passage is adapted to be fed into the internal space from the inlet 48 ₁ where it is cooled again.

As shown in FIG. 5, FIG. 7, and FIG. 8, the magnetic guide device 70a is arranged at equal intervals on the same circumferential region on the outer surface at the end in the −X direction of the coil support member 43. in is disposed, the center angle in the X direction as viewed has a 60 degrees or less sector-shaped (see FIG. 9) electromagnets 71 _1, 71 _3, 71
_5, so as not to overlap the electromagnets 71 _1, 71 _3, 71 ₅ in the X direction as viewed, electromagnets 71 _1, 71 _3, 71 spaced in the -X direction by a distance L from the ₅ circumferential region arranged arranged at equal intervals on the same circumference area on a central angle in the X-direction as viewed has an electromagnet 71 _2, 71 _4, 71 ₆ with 60 degrees or less fan-shaped. Here, the electromagnets 71 ₁ , 71 ₂ , 71 ₃ , 7
1 _4, 71 _5, 71 ₆ is constructed similarly, FIGS an FIGS. 9 (A) and 9 F-F sectional view in FIG. 9 (A) is a XZ cross section (YZ cross section) 9 (B) At the electromagnet 71
_As representatively shown in FIG. ₁ , it has an inverted U-shaped XZ cross section, a central portion in the X-axis direction is narrower than both end portions, and a fan shape having a central angle of less than 60 degrees when viewed in the X direction. And a conductive coil 73 wound around the center of the magnetic member 72 in the X-axis direction. That is,
Electromagnets 71 _1, 71 _2, 71 _3, 71 _4, 71 _5, 71 ₆ (hereinafter, collectively referred to as "electromagnet 71"), respectively, is configured as a cored coil, X-axis direction of the magnetic member 72 Opposite surfaces of both ends to the stator 30XA are magnetic pole surfaces, and the magnetic pole surfaces are fixed to the coil support member 43. The distance between the centers of the two magnetic pole surfaces in the X-axis direction is 2L.
It has been. The magnetic guide 70b has the same configuration as the magnetic guide 70a. When a current is supplied to the conductive wire coil 73 constituting each electromagnet 71 of the magnetic guides 70a and 70b, each electromagnet acts as a magnet. Then, the magnetic pole unit and the magnetic interaction constituting the stator 30XA, generates a magnetic force in the radial direction around axis the axis X _A. Details of the magnetic force will be described later.

As shown in FIG. 5 and FIG. 6A, the end surface of the mover 40XA on the −X direction side is the YZ of the stator 30XA and the mover 40XA at the end surface.
A gap detection system 80a as a detection device for detecting a relative positional relationship in the plane is fixed, and a +
A gap detection system 80b as a detection device for detecting a relative positional relationship between the stator 30XA and the mover 40XA in the YZ plane on the end surface on the X direction side is fixed. The gap detection systems 80a and 80b have the same configuration, and are provided on the + Z direction side of the hollow portion of the mover 40XA through which the stator 30XA penetrates, as shown in the gap detection system 80a in FIG. And a gap sensor 81Y provided in the + Y direction of the hollow portion of the mover 40XA.

The gap sensor 81Z detects a gap interval in the Z-axis direction between the gap sensor 81Z and the outer surface of the stator 20XA.
Y detects a gap interval in the Y-axis direction between the gap sensor 81Y and the outer surface of the stator 20XA. The gap interval information detected by the gap sensors 80Z and 80Y is sent to the stage control system 51 and to the main controller 50 via the stage control system 51. The stage control system 51 responds to an instruction from the main controller 50 and outputs the signal to the stator 30XA. Mover 4
The current supplied to each of the conductive coils 73 of the magnetic guide devices 70a and 70b is adjusted based on the gap interval information with respect to 0XA to move the mover 40XA in the Z-axis direction, the Z-axis direction, and the Y-axis direction. Drive.

The linear motor 20XB has the same configuration as the above-described linear motor 20XA, as shown in FIG. 2 and FIG. 10 which is a sectional view taken along the line AA in FIG. That is, the linear motor 20XB is
The stator 30XB and the mover 4
The mover 40XB has the same configuration as the mover 40XB. The linear motor 20XB is a linear motor 20XB.
XA is assembled in the same manner as XA, and the linear motor 20X is supported via the support members 22a and 22b for the linear motor 20XB.
A, the stator 30XB and the magnetic member 24X
B is fixed to the surface plate 12. In addition, mover 40XB
A mover 40 is provided at the end of the coil support member 43 in the X-axis direction.
As in the case of XA, the magnetic guide devices 70a and 70b are fixed. Further, similarly to the case of the mover 40XA, gap detection systems 80a and 80b are fixed to both end surfaces in the X-axis direction of the mover 40XB, and the gap interval information detected by the gap sensors 80Z and 80Y is: Stage control system 51 and main controller 5 via this
0 has been sent.

The X moving body 15 includes a linear motor 20X.
A linear motor 20Y bridged between the upper surface of the mover 40XA of A and the upper surface of the mover 40XB of the linear motor 20XB
A and the linear motor 20YB and the linear motor 20Y
A, and the above-described substrate table 11 which moves in the Y-axis direction by driving by 20YB.

The linear motor 20YA has the same configuration as the above-described linear motor 20XA. That is,
The linear motor 20YA is configured similarly to the stator 30XA, and includes a stator 30YA extending in the Y-axis direction,
The movable element 40YA is configured similarly to the XA and moves in the Y-axis direction along the stator 40YA. The linear motor 20YA is assembled similarly to the linear motor 20XA. Then, the bearing member 23 ₁ and the shaft holding member 23 ₂
Motor 20XA via a support member 23a made of
Is fixed to the upper surface of the mover 40XA of the linear motor 20XB via a support member 23b configured similarly to the support member 23a.

The coil support member 4 of the mover 40YA
Magnetic guide devices 70a and 70b are fixed to the end of Y in the Y-axis direction, similarly to the case of the mover 40XA.
Further, the gap detection systems 80a and 80a are provided on both end surfaces in the Y-axis direction of the mover 40YA, as in the case of the mover 40XA.
0b is fixed. In the linear motor 20YA, the gap detection systems 80a and 80b
A gap sensor 81Z provided on the + Z direction side of the hollow portion of the mover 40YA through which 0YA penetrates;
Sensor 81X provided in the + X direction in the hollow portion of
(Not shown), and the gap sensors 80Z, 8
The gap interval information detected by 0X is sent to the stage control system 51 and the main controller 50 via the stage control system 51. In the stage control system 51, the main controller 50
The linear motor 20 is controlled based on the gap distance information between the stator 30YA and the mover 40YA
The current supplied to the conductive coils 73 of the magnetic guide devices 70a and 70b is adjusted to drive the mover 40YA in the Z-axis direction, the Z-axis direction, and the X-axis direction.

The linear motor 20YB is constructed and operates in the same manner as the above-described linear motor 20YA, as generally shown in FIG. 2 and FIG. 11, which is a sectional view taken along the line BB in FIG. That is, the linear motor 2
0YB includes a stator 30YB configured in the same manner as the stator 30YA and extending in the Y-axis direction, and a movable element 40YB configured in the same manner as the movable element 40YA and moving in the Y-axis direction along the stator 40YB. ing. And linear motor 2
0YB is assembled in the same manner as the linear motor 20YA,
Like the linear motor 20YA, the linear motor 20XA is fixed to the upper surface of the mover 40XA of the linear motor 20XA via the support member 23a, and is fixed to the upper surface of the mover 40XA of the linear motor 20XB via the support member 23b. Magnetic guide devices 70a and 70b are fixed to the end of the coil support member 43 of the mover 40YB in the Y-axis direction, as in the case of the mover 40YA. Furthermore, the mover 4
As in the case of the mover 40YA, gap detection systems 80a and 80b are fixed to both end surfaces in the Y-axis direction of 0YB.

Next, each of the linear motors 20XA, 20X
B, 20YA, 20YB, magnetic guide device 70
The floating support of the mover with respect to the stator by a and 70b will be described using the linear motor 20XA as an example.

[0066] In the magnetic flux density in the environment of a magnetic pole unit constituting the stator 30XA occurs, the magnetic guide device 70a of the electromagnet 71 _1-71 each coil 73 of ₆ and the magnetic guide device 7
When current is supplied to the coils 73 of the electromagnet 71 _{1-71 6} = 0b, the magnetic force in the radial direction is generated between each electromagnet 71 and the magnetic pole unit 38. By controlling the magnetic force generated in this way by controlling the current supplied to each electromagnet,
The mover 40XA is levitated and supported by the stator 30XA.

The absolute value of the generated magnetic force increases as the distance between the magnetic pole surface of the electromagnet and the outer surface of the magnetic pole unit decreases. For this reason, in order to stably support the movable element 40XA by levitating with respect to the stator 30XA, the stator 30XA and the movable element 40XA are stably supported by the specific supply current pattern. When displacement occurs, current is supplied to each coil 73 so that a repulsive force acting to return to the original stable position is generated between the stator 30XA and the mover 40XA.

The floating support in this embodiment is shown in FIG.
In (A) as shown representatively for the magnetic guiding apparatus 70a, the magnetic guide device electromagnet 71 in 70a _1, 71 _3, 71 ₅ magnetic repulsion F ₁ between the respective magnetic pole units 38, F _3, and F _5, 12
As shown (B), the carried out by the resultant force of the magnetic repulsive force F _2, F _4, F ₆ between the electromagnet 71 _2, 71 _4, 71 _6, respectively and the magnetic pole unit 38 in the magnetic guide device 70a . For example, the mover 30XA and the X movable body 1 are opposed to the weight of the mover 30XA and the X movable body 15.
In the case where 5 is levitated and supported in the + Z direction, the resultant force of the magnetic forces acting on each electromagnet 71 has the same magnitude as the gravitational force acting on the mover 30XA and the X moving body 15 and faces in the + Z direction. The current supplied to each coil 73 is controlled. The magnetic guide device 70b operates similarly to the magnetic guide device 70a.

When the above-described floating support force is generated, the magnetic guide devices 70a and 70 that generate the floating support force
b are symmetrically arranged at both ends in the X-axis direction of the mover 40XA. Therefore, the magnetic guide device 70a and the magnetic guide device 7
By generating a symmetrical floating support force with 0b, it is possible to prevent a rotational moment from acting on the mover 40XA.

[0070] Further, X-axis direction distance between the centers of the two pole faces of each electromagnet 71 _{1-71 6,} the permanent magnet 34R in the pole unit 38, 34N, 34L, the arrangement period of the 34S of (= 4L) 1/2 (= 2L). Therefore, when a current is supplied to each of the electromagnets 71 ₁ to 71 _6, the two pole faces of the electromagnet 71 _{1-71 6} different polarities, the same force will act, the electromagnets 71 the force acting on _{1-71 6} can be efficiently generated.

The electromagnet 71₁, 71_Three, 71_FiveAnd electromagnetic
Stone 71_Two, 71_Four, 71₆Are magnetic poles along the X-axis direction
The permanent magnets 34R, 34N, 34 in the unit 38
Displaced by 1/4 (= L) of the array period of L and 34S
Have been. Therefore, the electromagnet 71₁, 71_Three, 71_Fiveof
The magnetic pole faces correspond to the permanent magnets 34L and 34R of the magnetic pole unit 38.
Opposite, generates a small magnetic force even with a slightly large supply current
When it is not possible to_Two, 71_Four, 7
1₆Is opposed to the permanent magnets 34N and 34S and has a small power supply.
A large magnetic force can be generated by the flow. On the other hand, electromagnetic
Stone 71_Two, 71_Four, 71₆Of the magnetic pole unit 38
Slightly larger supply current facing permanent magnets 34L and 34R
But when only a small magnetic force can be generated
Is the electromagnet 71 ₁, 71_Three, 71_FiveIs a permanent magnet 34N, 3
Opposite to 4S, generates large magnetic force with small supply current
Can be That is, it acts as a floating support force
When the magnetic force is generated, the electromagnet 71₁, 71_Three, 71_Five
And electromagnet 71_Two, 71_Four, 71₆Works complementarily to
It is arranged as follows. Therefore, it is supplied to the electromagnet 71.
Stabilize radial magnetic force while reducing the total amount of current
Can occur.

As described above, the magnetic guide devices 70a and 70a
By using 0b and adjusting the current supplied to each coil 73, the movable element 40XA can be levitated and supported in a non-contact manner with respect to the stator 30XA. Since the magnetic guide device 70a and the magnetic guide device 70b can be controlled independently, the magnetic guide devices 70a and 70b can be controlled independently.
The floating support position at each of the arrangement positions of b can be different radial positions. That is, by using the magnetic guide devices 70a and 70b and adjusting the current supplied to each coil 73, the mover 40XA can be moved in the Z-axis direction.
It can be driven in the direction around the Z axis and the direction around the Y axis, and can be levitated and supported at any position.

In the driving or floating support, the stator 30XA and the movable element 40XA on the end surface in the X-axis direction of the movable element 40XA by the gap detection systems 80a and 80b.
The positional relationship between the stator 30XA and the mover 40XA in the X-axis direction obtained from the detection result of the positional relationship (positional relationship in the YZ plane) with respect to the X-axis direction obtained from the detection result of the X position of the substrate table 11 by the wafer interferometer 55X. The main control device 50 controls the current supplied to each coil 73 of the magnetic guide devices 70a and 70b via the stage control system 51 based on the above. Such a stator 30
Mover 4 based on the positional relationship between XA and mover 40XA
The floating support of the stator 30XA with respect to 0XA is a highly rigid floating support.

In the linear motor 20XB, similarly to the above-described linear motor 20XA, the linear motor 20XB is used.
The mover 40XB is fixed to the stator 3 by the XB magnetic guide devices 70a and 70b and the gap detection systems 80a and 80b.
Floating supported for 0XB. In addition, the linear motor 2
In 0YA and 20YB, except that the X-axis direction is the Y-axis direction, as in the case of the linear motors 20XA and 20XB, the respective magnetic guide devices 70a and 70b
And the movable element 4 by the gap detection systems 80a and 80b.
0YA and YB are levitated and supported by the stators 30YA and YB.

[0075] Next, the driving of the armature unit 49 by the Lorentz force generated by the interaction of the current flowing through the armature coil 45 _i of the magnetic flux density and the armature unit 49 the magnetic pole unit 38 is generated, and thus the movable element 40XA The driving will be described. In the following description, the mover 40XA is moved by the magnetic guide devices 70a and 70b so that the center axis of the cylindrical magnetic pole unit 38 and the center axis of the cylindrical armature unit 49 match. It is assumed that the stator 30XA is supported by floating.

Hereinafter, the linear motors 20XA, 20XB, 20Y during the movement of the wafer W in this embodiment will be described.
The operation of A, 20YB will be described. First, an outline of the driving principle of the mover 40XA of the linear motor 20XA in the movement of the wafer W in the X-axis direction in the present embodiment will be described with reference to FIGS.

In the linear motor 20XA, as described above, the permanent magnets 34L, 34R, 34N, 34S, 34L
C forms a magnetic pole unit 38. This magnetic pole unit 38, as shown typically in solid arrows for some XY section in FIG. 13 (A), the permanent magnet 34N is directed radially outwardly about the central axis X _A of each permanent magnet direction (hereinafter, referred to as "+ r direction") generates a magnetic flux, also the permanent magnet group 34S is, the direction radially inward about the axis X _a (hereinafter, "- r direction"
) Is generated.

From the N pole surface of the permanent magnet 34N, + r
Focusing on the magnetic flux traveling in the direction, while traveling in space,
The + r direction component gradually decreases, and the permanent magnet 34S closest to the magnetic flux, that is, the X-axis direction component gradually increases. Then, at the midpoint between the permanent magnet 34N and the permanent magnet 34S in the X-axis direction, the + r direction component is zero, and only the X-axis direction component is present. Then, in the subsequent traveling in the space, the component in the −r direction gradually increases, and the component in the X axis direction gradually decreases. Then, it reaches the magnetic pole surface of the permanent magnet 34S. Thus, the magnetic flux reaching the S pole surface of the permanent magnet 34S is transmitted to the permanent magnet 3S adjacent to the permanent magnet 34S.
4L or the S pole of the permanent magnet 34R,
After passing through the L or permanent magnet 34R, it travels through its N pole face to the permanent magnet 34N. Thereafter, the magnetic flux reaches the N pole surface of the permanent magnet 34N.

Thus, the permanent magnet 34N, the permanent magnet 34
A magnetic circuit sequentially circulating through S and the permanent magnet 34L and a magnetic circuit circulating sequentially through the permanent magnet 34N, the permanent magnet 34S, and the permanent magnet 34R are formed. The permanent magnet 34L
C plays a role equivalent to that of the permanent magnet 34L in forming a magnetic circuit.

The above-described magnetic circuit is generated.
The magnetic flux density in the space outside the magnetic pole unit 38 is, as described above, a + r direction component that changes along the X axis direction (in the case of a −r direction component, the component value is smaller than the cylindrically symmetric shape of the magnetic pole unit). (Expressed as negative) and + X direction component (−X
In the case of the direction component, the component value is represented as negative). Further, the magnetic flux density is determined by the permanent magnets 34R, 34N,
34L, 34S, 34LC have a cylindrical shape with the central axis of the shaft X _A, and, since the magnetic member 24XA has a cylindrical shape with the central axis of the shaft X _A, the axis X _A cylindrical coordinate system centered axis (r, theta, X) (r: distance from the axis X _a, θ: X-axis rotational angle of rotation) when expressed in is independent of the variable theta, variable r And a function that changes only in response to a change in the variable X. That is, the magnetic flux density is represented as B (r, X), and when the component is expressed, (B
r (r, X), BX (r, X)).

[0081] On the other hand, the current flowing through the armature coil 45 around the axis X _A, it is considered that flowing circumferentially over the radius R, the magnetic flux density B in the current path of the armature coils 45
The + r direction component of (R, X) is Br (R, X) (hereinafter, referred to as
"Flux density B _R (X)") and depends only on the X position. This magnetic flux density B _R (X) is
It contributes to the driving of the XA, and has a distribution as shown in FIG.

[0082] That is, the magnetic flux density B _R (X) is a permanent magnet 34N, the absolute value of the magnetic flux density B _R (X) at the position corresponding to the center position in the X-axis direction 34S is maximized, X axis from the point The further away in the direction, the smaller the absolute value of the magnetic flux density B _R (X). The magnetic flux density B _R (X) becomes zero at a position corresponding to the center position of the permanent magnet 34L in the X-axis direction and at a position corresponding to the center position of the permanent magnet 34R in the X-axis direction. The distribution of the magnetic flux density B _R (X) indicates that the permanent magnet 3
4N, 34S are symmetrical in the ± X direction about a position corresponding to the center position in the X-axis direction, and have a period of 4L.
The shape is such that good approximation is performed by the sine function (or cosine function).

From the above, the magnetic flux density B _R (X) is a good approximation of B _R (X) = B _R0 · cos ｛(π / (2L)) · X + φ｝ (1) Here, B _R0 and φ are constants. In FIG. 13B, the value of the magnetic flux density B _R (X) is positive when the magnetic flux direction has a + r component, and the magnetic flux density B _R when the magnetic flux direction has a −r component.
The value of _R (X) is negative.

The + X direction component of the magnetic flux density B (R, X) in the current path of the armature coil 45 is BX (R,
X) (hereinafter referred to as “magnetic flux density B _X (X)”),
It depends only on the X position. This magnetic flux density B _X (X)
Contribute to the floating support of the mover 40XA, and have a distribution as shown in FIG.

That is, the absolute value of the magnetic flux density B _X (X) becomes maximum at a position corresponding to the midpoint of the permanent magnets 34L, 34R in the X-axis direction, and from this position, the permanent magnet groups 34N, 34S
As the position approaches the position corresponding to the midpoint in the X-axis direction, the magnetic flux density B
The absolute value of _X (X) becomes smaller, and the permanent magnet group 34N, 3
The magnetic flux density B at a position corresponding to the midpoint of the 4S in the X-axis direction
_X (X) becomes zero. Further, the distribution of the magnetic flux density B _X (X) is symmetric about ± X directions around a position corresponding to the midpoint of the permanent magnets 34L, 34R in the X-axis direction, and the magnetic flux density B _X (X) Has a shape in which good approximation is performed by a sine function (or cosine function).

From the above, the magnetic flux density B _X (X) is given by: B _X (X) = B _X0 · cos {(π / (2L)) · X + φ− (π / 2)} = B _X0 · sin ｛(π / (2L)) · X + φ｝ (2)

As can be seen by comparing the above equations (1) and (2), the magnetic flux density B _R (X) and the magnetic flux density B _X (X) have the same period of change in the X-axis direction. Yes, the phases are shifted by 1/4 cycle. In FIG. 13C,
When the direction of the magnetic flux is in the + X direction, the value of the magnetic flux density B _X (X) is positive, and when the direction of the magnetic flux is in the −X direction, the magnetic flux density B _X
The value of (X) is negative.

The magnetic flux densities Br (r, X) and BX (r, X) of the distributions shown in FIGS.
When the current in the armature coils 45 _i in the environment is supplied in X), the Lorentz force is generated in the armature coil 45 _i.

[0089] As a premise, and the terminals of the armature coils 45 _i is supplied with current i _i. Here, when each armature coil 45 _i is considered to be a one-turn coil, as shown by the XY section in FIG.
_i (= F · i _i , F: the number of turns of each armature coil 45 _i ) is assumed to be equivalent. Hereinafter, each armature coil 45 _i will be described as a single-turn coil to which the current I _i is supplied. Further, the current direction is the positive current value when a verso direction as viewed in the + Y direction side of the axis X _A, the current value when the current direction is the reverse direction is assumed to be negative. In the present embodiment, I _i = (− 1) ^j I _{i + 3j} (3), and a so-called three-phase armature unit, which is a coil array composed of the armature coils 45 _i (i = 1 to N). It is assumed that current is being supplied.

In the following description, I _i = I _U , I _{i + 1} = I _V , I _{i + 2} = I _W (4). FIG. 14B shows an XY cross section of the current distribution by expressing the current. In addition,
In FIG. 14B, the current is indicated on the XY cross section of the coil 45.

The coil array having the above-described current distribution corresponds to the space where the magnetic flux densities B _R (X) and B _X (X) shown in FIGS. 13A to 13C are generated. , A Lorentz force FX in the X-axis direction is generated in the current path of each armature coil 45 _i due to the electromagnetic interaction between the current I _i and the magnetic flux density B _R (X). _Due to the electromagnetic interaction between _i and the magnetic flux density B _X (X), each part of the current path of each armature coil 45 _i (the length in the circumferential direction is R ·
dθ), a Lorentz force FR in the radial direction (+ r direction or −r direction) is generated. Incidentally, the Lorentz force FX orientation (are either Lorentz force FX is the + X direction of the force or the -X direction is a force, the direction of current (direction orbiting the axis X _A)
And the direction of the magnetic flux density B _R (X) at the X position of the current (ie, whether the magnetic flux density B _R (X) is positive or negative). Also, whether the orientation (Lorentz force FR is + r direction -r force or a force of Lorentz force FR, the magnetic flux density in the X position of the orientation (orientation orbiting axis X _A) and the current of the current B _X (X) direction (ie, whether magnetic flux density B _X (X) is positive or negative)
Depends on The magnitudes of the Lorentz forces FX and FR are determined by the magnitude of the current I _i supplied to each armature coil 45 _i and the magnetic flux densities B _R (X) and B _X (X) in the current path.
Depends on the size of. Therefore, the armature coil 4
Also the direction and magnitude of 5 _i to supply current I _i is the same, the positional relationship between the X-axis direction between the magnetic pole unit 38 and the coil array 49, Ya direction of the Lorentz force generated in the armature coil 45 _i The size will be different.

[0092] When considered such Lorentz electromagnetic force, firstly, the position of the positional relationship between the magnetic pole unit and the coil array is, as shown in FIG. 15, the armature coils 45 _i and the permanent magnets 34N, 34S, 34L, and 34R Suppose they are in a relationship. That is, the central position in the X direction of a region through which current I _U is, as the origin the center position in the X direction of the permanent magnet 34N, and in the coordinates X.

In the present embodiment, in such an arrangement relationship, as shown in FIGS. 16A and 16B,
As a component for generating a thrust in the X direction of the current I _U (hereinafter referred to as “current for X thrust”) I _UX , I _UX = I _X0 cos ｛(π / 2L) · X｝ (5) _As a component for generating a supporting force of _U (hereinafter, referred to as a “current for supporting force”) I _Ur , I _Ur = I _r0 sin ｛(π / 2L) · X｝ (6) Supplying.

Further, as the X thrust current I _VX of the current I _V , I _VX = I _X0 cos {(π / 2L) × X + π / 3} (7), and the supporting force current I _{Vr of the} current _{IV Is} supplied to the corresponding armature coil 45 as follows: I _Vr = I _r0 sin {(π / 2L) × X + π / 3} (8)

[0095] Further, as the X-thrust current I _WX current _{I W, I WX = I X0} cos {(π / 2L) · X + 2π / 3} ... (9) the current I _W of the support force generating I _Wr I _Wr = I _r0 sin {(π / 2L) · X + 2π / 3} (10) is supplied to the corresponding armature coil 45.

It should be noted that the current I _U (= I _UX + I _Ur ), I superimposed on the X thrust current and the Z thrust current as described above.
_{V (= I VX + I Vr} ), I W (= I WX + I Wr) is 16
As shown in (C), the variable is a cosine (sine) function having a period of 4L with X as a variable.

Under the above conditions, first, the interaction between the X thrust currents I _UX , I _VX , I _WX and the magnetic flux density B _R (X) will be considered. Due to this electromagnetic interaction, each armature coil 45
_The Lorentz force generated in _i is a force in the X-axis direction according to Fleming's left-hand rule.

At this time, the thrust current I_UXIn the area where
From the center position in the X direction to Δ in the X direction.
Lore per unit length, generated at a position separated by X
Force fX_U(X, ΔX) is the current I_UXX-axis direction
Current density per unit width_UX(X) (= I
_UX(X) / (2L / 3)), fX_U(X, ΔX) = J_UX(X) ・ B_R(X + ΔX) = J_X0・ B_R0Cos ｛(π / (2L)) ・ X｝ cos ｛(π / (2L)) ・ (X + ΔX)｝ (11) Where J_X0(= I_X0/ (2L / 3)) is fixed
Is a number. Therefore, the current I_UXThe whole area where one flows
As a body, Lorentz force FX per unit length
_U(X) is FX_U(X) = C₀・ Cos^Two{(Π / (2L)) · X} (12) Where C₀Is a constant.

The region where the current I _VX flows and the current I _WX
In the region where flows, the Lorentz forces FX _V (X) and FX _W (X) per unit length are FX _V (X) = C ₀ · cos ² ｛(π / (2L)) · X + π / 3 … (13) FX _W (X) = C ₀ · cos ² ｛(π / (2L)) ・ X + 2π / 3｝ (14)

Next, the interaction between the supporting currents I _Ur , I _Vr , I _Wr and the magnetic flux density B _R (X) will be considered. The Lorentz force generated in each armature coil 45 _i due to this electromagnetic interaction is a force in the X-axis direction according to Fleming's left-hand rule.

At this time, the Lorentz force per unit length gX _U (X, ΔX) generated at a position ΔX away from the center position in the X direction in the region where the supporting force current I _Ur flows in the X direction is: , The current density per unit width in the X-axis direction of the current I _Ur is J _Ur (X) (= I
_Ur (X) / (2L / 3)), gX _U (X, ΔX) = J _Ur (X) · BX _r (X + ΔX) = J _r0 · _Br0 · sin {(π / 2L) · X} cos {(π / 2L) · (X + ΔX)} (15) J _r0 (= I _r0 / 2L) is a constant. Therefore, for one entire region in which the current I _Ur flows, the Lorentz force GX _U (X) per unit length is as follows: GX _U (X) = C ₁ · sin {(π / 2L) · X｝ · cos ｛ (Π / 2L) · X｝ (16) Here, C ₁ is a constant.

The region where the current I _Vr flows and the current I _Wr
GX _V (X) and GX _W (X) per unit length in the region where the gas flows are GX _V (X) = C ₁ · sin {(π / 2L) · X + π / 3} · cos {(Π / 2L) · X + π / 3} (17) GX _W (X) = C ₁ · sin {(π / 2L) · X + 2π / 3} • cos ｛(π / 2L) · X + 2π / 3} (18)

Therefore, the Lorentz force in the X-axis direction, ie, the driving force in the X-axis direction, generated in one region where the current I _U flows, one region where the current I _V flows, and one region where the current I _W flows. FX (X) is FX (X) = FX _U (X) + FX _V (X) + FX _W (X) + GX _U (X) + GX _V (X) + GX _W (X) (19) By the way, cos ² θ + cos ² (θ + π / 3) + cos ² (θ + 2π / 3) = 3/2 (20) sin θ · cos θ + sin (θ + π / 3) · cos (θ + π / 3) + sin (θ + 2π / 3) · cos ( θ + 2π / 3) = 0 (21) Therefore, FX (X) = FX _U (X) + FX _V (X) + FX _W (X) = FX ₀ (22) Therefore, the mover 40XA moves in the X-axis direction,
That is, even if the variable X changes, as shown in FIG. 17, the driving force FX (X) in the X-axis direction has a constant value (= F
X ₀ ).

The above magnetic flux density B _R (X) and current I _U ,
The relationship between I _V and I _W is based on the magnetic flux density B _R (X) and the current (−
_I.sub.U ), ( _-I.sub.V ), and ( _-I.sub.W ). _{Also, B R (X + 2L)} = - because it is _{B R (X) ... (23} ), the current (-I _U) is one region flowing,
One region where the current (−I _V ) flows, and the current (−I _W )
The sum of the driving force in the X-axis direction generated in one region flowing is the same as the above-mentioned force FX _0.

Therefore, the currents I _U , I _V , I _W , (−I _U ), (−I _U ), (−I _V ) of the above-described cosine waveform depend on the positional relationship between the magnetic pole unit 38 and the coil array 49. By supplying a current to each armature coil 45 _i so that the regions through which −I _W ) flow are sequentially arranged, even if the mover 40 </ b> XA moves in the X-axis direction, the mover 40 </ b> XA can be moved with a constant driving force. It can be driven by driving force. Then, the X thrust current I
By controlling the amplitude I _X0 of _UX , I _VX , I _WX, the magnitude of the driving force acting on the mover 40XA in the X-axis direction can be controlled, and the X thrust currents I _UX , I _VX , I XX can be controlled. By changing the phase of _WX by ± π, the direction of the driving force can be controlled.

Next, the interaction between the supporting currents I _Ur , I _Vr , I _Wr and the magnetic flux density B _X (X) will be considered.

At this time, in the region where the current I _Ur flows, each part of the current path (circumferential length dS (= R · dθ)) is generated at a position separated by ΔX in the X direction from the center position in the X direction. ), The radial Lorentz force fR _U (X, ΔX) is: fR _U (X, ΔX) = J _Ur (X) · B _X (X + ΔX) · R · dθ = J _r0 · B _X0 · sin ｛ (Π / 2L) · X｝ · sin {(π / 2L) · (X + ΔX)} · dS (24) Therefore, in the entire region in the X-axis direction in one region in which the current I _Ur flows, the circumferential length R ·
Lorentz force FR _U in the radial direction acting on the current region of dθ
(X) becomes _{FR U (X) = C 2} · sin 2 {(π / 2L) · X} · dS ... (25). Here, C ₂ is a constant, the constant C ₂ is attractive force acts in the case of positive, repulsive force acts when the constant C ₂ is negative. In the present embodiment, the mover 40XA is
When displaced relative XA, because the by the supporting force and restoring force to return to the original position, as the constant C ₂ is negative, and selects the phase of the I _UX.

The region where the current I _Vr flows and the current I _Wr
The radial Lorentz forces FR _V (X) and FR _W (X) acting on the current region having a length R · dθ in the circumferential direction in the entire region in the X-axis direction in the region where the gas flows are FR _V (X) = C ₂ · sin ² ｛(π / 2L) · X + π / 3｝ · dS (26) FR _W (X) = C ₂ · sin ² ｛(π / 2L) · X + 2π / 3｝ · dS (27 ).

Next, the interaction between the X thrust currents I _UX , I _VX , I _WX and the magnetic flux density B _X (X) will be considered.

At this time, the current I_UIn the area where the air flows
ΔX in the X direction from the center position in the X direction
The parts of the current path that occur at separated positions (in the circumferential direction)
Lorentz force gR in the radial direction generated at length dS)
_U(X, ΔX) is gR_U(X, ΔX) = J_UX(X) ・ B_X(X + ΔX) · dS = J_X0・ B_X0Cos ｛(π / 2L) ・ X｝ sin ｛(π / 2L) ・ (X + ΔX)｝ dS (28) Therefore, the current I_UOne area where the flow
Is the length dS in the circumferential direction over the entire region in the X-axis direction at
Lorentz force GR acting on the current region of
_U(X) is GR_U(X) = C₃Cos ｛(π / 2L) ・ X｝ sin ｛(π / 2L) ・ X｝ dS (29) Where C₃Is a constant. In addition, Lorentz
Power GR_UWhether (X) is positive or negative, that is, attraction
Or the repulsive force is determined by the constant C from equation (31). ₃Mark
It is not decided only by the number, the stator 30XA and the mover 40XA
With the value of the variable X.

The current I_VAnd the current I_WBut
Circumferential direction for the whole area in the X-axis direction in the flow area
Lorentz force acting on the current region of length dS
GR _V(X), GR_W(X) is GR_V(X) = C₃· Cos ｛(π / 2L) ・ X + π / 3｝ · sin ｛(π / 2L) ・ X + π / 3｝ dS (30) GR_W(X) = C₃Cos {(π / 2L) X + 2π / 3} sin {(π / 2L) X + 2π / 3} dS (32)

Accordingly, in one region where the current I _U flows, one region where the current I _V flows, and one region where the current I _W flows, the entire current in the X-axis direction has a length dS in the circumferential direction. the sum of the Lorentz forces in the radial direction that acts on the area, i.e. the radial direction of the support forces Fr (X) _{is, FR (X) = FR U} (X) + FR V (X) + FR W (X) + GR U (X) + GR _V (X) + GR _W (X) (33) By the way, from the equation: sin ² θ + sin ² (θ + π / 3) + sin ² (θ + 2π / 3) = 3/2 (34), and from equation (21), FR (X) = FR _U (X) + FR _V ( X) + FR _W (X) = FR ₀ (35) That is, even if the magnetic pole unit 38 moves in the X-axis direction, that is, the variable X changes, the radial supporting force is maintained constant as shown in FIG.

The magnetic flux density B _X (X) and the current I _U ,
The relationship between I _V and I _W is based on the relationship between the magnetic flux density B _X (X) and the current (−
_I.sub.U ), ( _-I.sub.V ), and ( _-I.sub.W ). _{Also, B X (X + 2L)} = - B X (X) ... since it is (36), the current (-I _U) is one region flowing,
One region where the current (−I _V ) flows, and the current (−I _W )
The sum of the radial Lorentz forces acting on the current region having the length dS in the circumferential direction, that is, the radial supporting force is the same as the above-mentioned force FR ₀ over the entire region in the X-axis direction in the entire region where the air flows. Becomes

Therefore, the stator 30XA and the mover 40
Depending on the positional relationship between XA, current I _U of the cosine waveform as described _{above, I V, I W, (} - I U), (- I V), (- I W) sequentially arranged such that the flow area in by supplying current to each armature coil 45 _i, even if the movable element 40XA is moved in the X-axis direction, as shown in Figure 18, the movable element 40XA stator 30XA at a constant radial supporting force Can be supported against. The supporting currents I _Ur , I _Vr , I
By controlling the amplitude I _r0 of _wr, it is possible to control the magnitude of the supporting force. The support by the Lorentz force is lower in rigidity than the support by the magnetic guide devices 70a and 70b described above.

Thus, in the linear motor 20XA, the magnetic interaction between the magnetic guide devices 70a and 70b and the magnetic pole unit 38 constituting the stator, and the magnetic pole unit 38
Magnetic flux density B _X (X) generated in the X-axis direction and a supporting current supplied to each armature coil by an electromagnetic interaction, the magnetic pole while floatingly supporting the movable element 40XA with respect to the stator 30XA. The mover 40XA is driven in the X-axis direction by the electromagnetic interaction between the radial magnetic flux density B _r (X) generated by the unit 38 and the X thrust current supplied to each armature coil. In response to the generation of the supporting force and the driving force in the X-axis direction, the main controller 50 controls the stator 30XA detected by the gap detection systems 80a, 80b and the wafer interferometer 55X via the stage control system 51. Mover 40
According to the positional relationship with XA, the magnetic guide devices 70a and 70a
A current supplied to each electromagnet 71 constituting the 0b, by controlling the current supplied to each armature coil 45 _i constituting the armature unit 49 in the stator 40XA, the mover 40XA in the X-axis direction Drive at desired speed or acceleration.

In the linear motor 20XB, similarly to the above-described linear motor 20XA, the movable element 40XB is supported by the stator 30XB while floating.
A driving force in the X-axis direction is applied to B. That is, the inside of the mover 40XB disposed in a space where a cylindrically symmetric magnetic flux density distribution is generated by the magnetic pole unit including the permanent magnets 34L, 34R, 34N, 34S, and 34LC, which are components of the stator 30XB of the linear motor 20XB. By controlling the current supplied to each electromagnet 71 and each armature coil 45 as described above according to the positional relationship with the magnetic pole unit, the movable element 40XB can be floated and supported in the X-axis direction. Drive at speed or acceleration.

Thus, the X moving body 15 fixed to the mover 40XA and the mover 40XB is moved in the X-axis direction by the driving force applied to the mover 30XA of the linear motor 20XA and the mover 40XB of the linear motor 20XB. Drive with driving force. Thus, the X moving body 15 can be driven at a desired speed or acceleration in the X-axis direction.

The linear motor 20XA or the linear motor 20XB alone cannot drive the mover around the X axis. However, the drive amount of the mover 40XA in the Z-axis direction in the linear motor 20XA and the linear motor 2XA
By adjusting the driving amount of the mover 40XB in the Z-axis direction at 0XB, the X movable body 15 and thus the substrate table 11 can be driven around the X axis.

In the linear motors 30YA and 30B,
In the same manner as the linear motors 20XA and 20YB described above,
The movers 40YA, 4 are fixed to the stators 30YA, 30YB.
A driving force in the Y-axis direction is applied to the movers 40YA and 40YB while floating and supporting 0YB. That is, the permanent magnets 34L, 34R, 34N, and 34 that are components of the stators 30YA and 30YB of the linear motors 20YA and 20YB.
The current supplied to each electromagnet 71 and each armature coil 45 in the movers 40YA and 40YB arranged in a space where a magnetic flux density distribution having a cylindrical symmetry is generated by the magnetic pole unit 38 composed of S and 34LC is supplied to the magnetic pole unit 38. By controlling the movable elements 40YA and 40YB in the Y-axis direction at a desired speed or acceleration while controlling the movable elements 40YA and 40YB in a floating manner by controlling as described above according to the positional relationship between the movable elements 40YA and 40YB.

The linear motor 20YA or the linear motor 20YB alone cannot drive the mover around the Y axis. However, the linear motor 20YA is similar to the linear motor 20XA and the linear motor 20XB.
By adjusting the amount of drive of the mover 40YA in the Z-axis direction in (2) and the amount of drive of the mover 40YB in the linear motor 20YB in the Z-axis direction, the substrate table 11 can be driven around the Y-axis.

In the stage device WST of this embodiment, the linear motor 20XA and the linear motor 20
By driving the X moving body 15 including the substrate table 11 in the X-axis direction by XB and driving the substrate table 11 in the Y-axis direction by the linear motors 20YA and 20YB, the substrate table 11, and thus the wafer W, can be arbitrarily moved to XY2. It can be moved at a desired speed or acceleration in the dimensional direction. The linear motor 20XA, the linear motor 20
The floating support of the movers 30XA and 30XB by XB (that is, the floating support of the X moving body 15), and the linear motor 2
0YA, mover 30YA by linear motor 20YB,
By the 30YB floating support (that is, the floating support of the substrate table 11), the wafer W can be moved at a desired speed or acceleration in an arbitrary XY two-dimensional direction without a mechanical contact surface.

Therefore, the stage device W of the present embodiment
According to ST, linear motors 20XA, 20XB, 20
In Y, the magnetic pole unit 38 is configured by arranging the magnets 34L (and 34LC) and 34R magnetized in the axial direction and the magnets 34N and 34S magnetized in the radial direction alternately along the axial direction. The magnetic flux density in the vicinity of the unit 38 changes along the axial direction. The armature unit 49 is arranged near the magnetic pole unit 38. Therefore, the wafer W can be efficiently stored by simple current control.
Can be moved dimensionally. Further, since a large repulsive force generated when magnetic pole surfaces of the same polarity are joined to each other can be avoided, the magnetic pole unit 38 and thus the stage device WST can be easily assembled.

The magnet 3 constituting the magnetic pole unit 38
The shape of the 4L (and 34LC), 34R, 34N, and 34S is cylindrical, and the armature coils that constitute the armature unit 49 are magnetized with the magnets 34L (and 34LC) and 34S.
Since the cylindrical shape is coaxial with R, 34N, and 34S, a cylindrically symmetric Lorentz force can be applied to the armature unit 49. Therefore, drive control can be easily performed.

Further, since a magnetic flux density that changes periodically in the driving direction is generated and the armature coils are periodically arranged according to the change cycle of the magnetic flux density, simple and continuous high-precision position control can be performed. It can be done easily.

The linear motors 20XA, 20XB,
20YA, 20YB mover 40XA, 40XB, 40
Since the supporting force current is superimposed on the driving thrust current and supplied to each armature coil of YA and 40YB,
The movable element can be levitated and supported on the stator by the supporting force having the restoring force.

The linear motors 20XA, 20XB,
20YA, 20YB mover 40XA, 40XB, 40
The magnetic guide devices 70a and 70Y are respectively provided for YA and 40YB.
b and the gap detection systems 80a and 80b are provided, and the magnetic support force of the magnetic guide devices 70a and 70b is controlled based on the detection results of the gap detection systems 80a and 80b, so that highly rigid support can be provided. .

Further, by adjusting the magnetic support force of the magnetic guide devices 70a and 70b, the linear motors 20XA and 20XB are driven in the Z-axis direction, the Z-axis direction, and the Y-axis direction, and Motor 20
In XA and 20XB, arbitrary driving can be performed in the Z-axis direction, the Z-axis direction, and the X-axis direction.
The substrate table 11 can be set to a desired Z position and posture.

Magnet 34L Constituting Magnetic Pole Unit 38
(And 34LC), 34R, 34N, and 34S are supported by the cylindrical magnet support member 22 that penetrates these hollow portions, so that the stators 30XA, 30XB, and 30Y.
Can be made highly rigid and lightweight.

Further, since the magnet 34LC having the female screw formed on the inner surface is screwed to the male screw formed on the outer surface of one end of the magnet support member 32, the magnetic pole unit 38 is firmly fixed to the magnet support member 22. In addition, a stable magnetic flux density can be generated up to the axial end position of the magnet support member 22 to which the magnet 34LC is screwed.

Further, since the armature coil 45 is housed in containers (41, 42) having smoothed inner walls and is cooled by supplying a coolant, the driving of the armature coil 45 accompanying the rise in temperature is performed. It is possible to reduce the change in the efficiency of generating force, the fluctuation of the surrounding atmosphere, and the generation of thermal expansion due to the transfer of heat to surrounding members and devices.

Since the linear motors 20XA and 20XB having a driving force in the X-axis direction and the linear motor 20Y having a driving force in the Y-axis direction are used in combination, the wafer W can be moved at a high speed in an arbitrary XY two-dimensional direction. With
Two-dimensional position control can be performed with high accuracy.

In the stage apparatus WST of this embodiment whose configuration has been described above, as described above, the substrate table 11 on which the wafer W is held via the wafer holder is moved at a desired speed or acceleration in a desired direction. In doing so, main controller 50 monitors the measurement value (position information or speed information) of wafer interferometer 55 via stage control system 51, detects the XY position of substrate table 11 at that time, and sets stator 30XA Relative position relationship between the stator and the mover 40XA in the X-axis direction, the stator 30XB and the mover 40X
B, relative positional relationship in the X-axis direction, stator 30YA
Relative positional relationship between the armature and the mover 40YA in the Y-axis direction,
Further, the relative positional relationship between the stator 30YB and the mover 40YB in the Y-axis direction is obtained. Then, main controller 50 determines the current value and the current direction of the X thrust current and the Y thrust current to be supplied to each armature coil 45 in accordance with the obtained relative positional relationship and the target position to drive substrate board 11. Is determined by calculation, and a command is given to the stage control system 51. Thereby, in the stage control system 51, the current value and the current direction given to each armature coil 45 in accordance with the command are
It is controlled via a current driving device (not shown). At this time, main controller 50 also controls the speed and acceleration of substrate table 11 according to the distance from the target position.

Here, main controller 50 determines the current value of the current supplied to each armature coil 45 based on the position information (or speed information) notified from wafer interferometer 55 at each time point of movement. It is also possible to determine the direction of the current, but if the control response cannot be sufficiently fast, the wafer W will have a desired trajectory and a desired speed during a certain period thereafter when the movement is started. The current value and the current direction of the current supplied to the armature coil 45 can also be obtained according to the passage of time, that is, the movement of the movers 40XA, 40XB, 40Y. In these cases,
Main controller 50 obtains a deviation from a desired trajectory based on the position information (or speed information) notified from wafer interferometer 55 at each time point of movement, and thereafter supplies the deviation to each armature coil 45. The current value and the current direction of the current are corrected, and the current value and the current direction of the current supplied to each armature coil 45 for a predetermined period after the corrected period are obtained in time series. And the stage control system 51
Current control for each armature coil 45 is performed based on the corrected information.

The main controller 50 detects the Z position and tilt of the exposure area on the wafer W by the above-described multi-point focus position detection system, and detects the gap detection systems 80a and 80b.
On the basis of the detection result and the measured values of the wafer interferometer 55, the linear motors 20XA, 20XB, 20YA, and 20YB for setting the substrate table 11 to the desired Z position and posture.
Of each coil 73 in the magnetic guide devices 70a and 70b
Is determined, and a command is sent to the stage control system 51. As a result, the stage control system 51 controls the current value and the current direction applied to each coil 73 in response to the command via the current driving device (not shown).

The flow of the exposure operation in exposure apparatus 100 of the present embodiment executed while controlling the position of substrate table 11, ie, wafer W, as described above will be briefly described.

First, a reticle R on which a pattern to be transferred is formed is loaded on a reticle stage RST by a reticle loader (not shown). Similarly, the wafer W to be exposed is set on the substrate table 11 by a wafer loader (not shown).
Is loaded.

At this time, the substrate table 11 is floated and supported in a base shape at a predetermined wafer loading position, and the main controller 50 controls the stage so that the substrate table 11 is stopped at the loading position for a predetermined time. Servo control is performed via the system 19. Therefore, during the waiting period in the loading position, the armature coil 45 of the driving device 10 and the coil 7 of the electromagnet 71
The main controller 50 uses a cooler 74 to cool the armature coil 45 and the coil 73 in order to prevent a temperature rise due to heat generation in the armature coil 45 and the propagation of heat to the surroundings. Cooling.

Next, the main controller 50 prepares for reticle alignment, baseline measurement, and the like using a reticle microscope (not shown), a reference mark plate (not shown) on the substrate table 18, and an alignment detection system (not shown). After performing the measurement according to a predetermined procedure, alignment measurement such as EGA (Enhanced Global Alignment) performed using a statistical method is performed using an alignment detection system. The details of the EGA measurement are described in, for example, JP-A-61-44429.

After the completion of the alignment measurement, the exposure operation of the step-and-scan method is performed as follows.

In this exposure operation, first, the wafer W
The substrate table 11 is moved so that the XY position of the substrate table becomes the scanning start position for exposing the first shot area (first shot) on the wafer W. This move
Each armature coil 45 constituting wafer stage apparatus WST by main controller 50 via stage control system 51.
By controlling the current as described above. At the same time, reticle stage RST is moved such that the XY position of reticle R becomes the scanning start position. This movement is performed by the main controller 50 via the stage control system 51 and a reticle driving unit (not shown).

Then, based on the XY position information of the reticle R measured by the reticle interferometer 53 and the XY position information of the wafer W measured as described above, the stage control system 51 Reticle R and wafer W are synchronously moved in the scanning direction (Y-axis direction) via wafer stage device WST. In such synchronous moving reticle R is illuminated by the illumination area of a rectangle (slit shape) having a longitudinal direction perpendicular to the scanning direction of the reticle R, the reticle R is scanned at a velocity V _R during exposure (scanning The projected illumination area (center substantially coincides with the optical axis AX) is projected onto the wafer W via the projection optical system PL, and a slit-shaped projection area conjugate to the illumination area, that is, an exposure area is formed. Since the wafer W is corresponding to an inverted imaging relationship to the reticle R, the wafer W is the direction of the velocity V _R is scanned at a speed V _W in synchronization with the reticle R in the opposite direction, the entire surface of the shot area SA on the wafer W Exposure is possible. The scanning speed ratio V _W / V _R accurately corresponds to the reduction magnification of the projection optical system PL, and the reticle R
Is accurately reduced and transferred onto the shot area on the wafer W. The width of the illumination region in the longitudinal direction is set so as to be wider than the pattern region on the reticle R and smaller than the maximum width of the light shielding region. By scanning the reticle R, the entire pattern region is illuminated. It is supposed to be.

During the synchronous movement between the reticle R and the wafer W, the Z position and the tilt of the exposure area in the shot area on the wafer W are detected by the above-mentioned multi-point focus position detection system. Based on the Z position information and the tilt information of the exposure area, main controller 50 transmits each of linear motors 20XA, 20XB,
By controlling the magnetic guide devices 70a and 70b of the 20YA and 20YB, the Z position and the posture of the substrate table 11 are adjusted so that the exposure area on the wafer W matches the imaging surface of the pattern of the reticle R by the projection optical system as much as possible. Control. In the present embodiment, in controlling the Z position and posture of the substrate table 11, first, the linear motors 20XA, 20X
When the B magnetic guide devices 70a and 70b are used, and the Z position and the attitude of the substrate table 11 cannot be controlled completely, the magnetic guide devices 70a and 70b of the linear motors 20YA and 20YB are used. Therefore, the control of the Z position and posture of the substrate table 11 is performed by the magnetic guide devices 70a, 70x of the linear motors 20XA, 20XB.
0b, the magnetic guide devices 70a, 70b of the linear motors 20YA, 20YB.
Are the stators 3 of the linear motors 20YA and 20YB based on the detection results of the gap detection systems 80a and 80b.
Central axes of 0YA and 30YB and movers 40YA and 40YB
Is used for control to make the center axis of the hollow portion coaxial.

When the transfer of the reticle pattern to one shot area is completed by the scanning exposure performed while being controlled as described above, the substrate table 11 is stepped, and the scanning exposure to the next shot area is performed. In this way, the stepping and the scanning exposure are sequentially repeated, and the required number of shot patterns are transferred onto the wafer W.

Therefore, the exposure apparatus 100 of the present embodiment
According to the method, high-speed movement and high-precision position control of the wafer W can be performed, so that both throughput and exposure accuracy can be improved.

Each linear motor 20XA, 20X
In each of B, 20YA, and 20YB, the radial positional relationship between the stator and the mover is controlled by the magnetic supporting force of the magnetic guide devices 70a and 70b based on the detection results by the gap detection systems 80a and 80b. Therefore, it is possible to cancel the change in the radial positional relationship between the stator and the mover due to the movement of the center of gravity accompanying the movement of the wafer W. Therefore, exposure accuracy can be improved.

The apparatus 100 of the present embodiment assembles the reticle stage RST including a large number of mechanical parts, the projection optical system PL including a plurality of lenses, and the like. Drive unit 1
0 to assemble the wafer stage apparatus WST. Then, reticle stage RST, projection optical system P
L, the wafer stage device 30 and the like can be combined, and then the overall adjustment (electrical adjustment, optical adjustment, operation confirmation, etc.) can be performed. It is desirable that the exposure apparatus 100 be manufactured in a clean room in which temperature, cleanliness, and the like are controlled.

In the above embodiment, only the magnetic guide device is used for floating the mover from the stator, but it is also possible to use the air guide device together. For example, floating support in the Z direction is performed by an air guide device, and
Non-contact support in the direction can be provided by a magnetic guide device.

In the magnetic pole unit, an electromagnet equivalent to a permanent magnet can be used instead of a permanent magnet.

In the above embodiment, the so-called three-phase current is set to 1/6 of the change period of the magnetic flux density generated by the magnetic pole unit 38, and the so-called three-phase current is set to the armature coil 45 of the armature unit 49. However, it is also possible to arrange the armature coils 45 at another arrangement period and supply a current of the number of phases corresponding to the arrangement.

Further, in the above embodiment, the cooling liquid is used for cooling the armature coil, but a gaseous refrigerant can be used as long as the refrigerant is a fluid.

In the above embodiment, the mover has the armature unit and the stator has the magnetic pole unit. However, the mover has the magnetic pole unit, and the stator has the armature unit. You can also.

In the above-described embodiment, two linear motors for generating a driving force in the scanning direction (Y-axis direction) are used. However, as shown in FIG. it can. In such a case, the driving around the Y axis is performed only by the linear motors 20XA and 20XB.

The present invention also relates to a reduction projection exposure apparatus using ultraviolet light as a light source, a reduction projection exposure apparatus using soft X-rays having a wavelength of about 10 nm as a light source, an X-ray exposure apparatus using a light source having a wavelength of about 1 nm, an EB (electronic Beam exposure apparatus, and any wafer exposure apparatus such as an exposure apparatus using an ion beam, and a liquid crystal exposure apparatus. Also, it does not matter whether the apparatus is a step-and-repeat machine, a step-and-scan machine, or a step-and-stitching machine. However, a reduction projection exposure apparatus using a soft X-ray having a wavelength of about 10 nm as a light source, an X-ray exposure apparatus using a light source having a wavelength of about 1 nm, an EB (electron beam), an ion, etc. When the present invention is applied to a beam exposure apparatus or the like, it is desirable to employ a magnetic levitation mechanism or the like.

Further, the motor device of the present invention is not limited to application to a substrate stage device in an exposure apparatus, but can be applied to, for example, a reticle stage device in an exposure apparatus. However, the method can be applied when position control of the sample is required.

[0155]

As described above in detail, according to the motor device of the present invention, the motor device can be moved by Lorentz force or magnetic force by utilizing the magnetic flux density distribution generated by the magnetic pole unit used for one-dimensional driving. Since a supporting force for floatingly supporting the movable member with respect to the stator is generated, it is possible to provide a motor device capable of moving the movable member at high speed with a simple configuration and controlling the position of the movable member with high accuracy.

According to the stage device of the present invention, since the moving body is moved by using the motor device of the present invention, it is not necessary to provide a special device on the moving body for supporting the floating of the moving body. Thus, the configuration of the stage can be simplified and the size and weight can be reduced. Therefore, the object mounted on the mounting surface of the moving body can be moved at high speed, and the position control can be performed with high accuracy.

Further, according to the exposure apparatus of the present invention, the motor apparatus of the present invention can be applied to a substrate stage device for holding a substrate onto which a predetermined pattern is transferred or a mask stage device for holding a mask on which a predetermined pattern is formed. Is used, the substrate can be moved at a high speed with good controllability. Therefore, high-accuracy pattern transfer can be performed with improved throughput.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating a schematic configuration of an exposure apparatus according to an embodiment.

FIG. 2 is a perspective view showing a configuration around a wafer stage device of the exposure apparatus of FIG. 1;

FIG. 3 is a diagram showing a schematic configuration of the linear motor of FIG. 2;

FIGS. 4A and 4B are diagrams for explaining the configuration of the stator shown in FIG. 3;

FIG. 5 is a diagram (part 1) for describing the configuration of the mover of FIG. 3;

FIGS. 6A and 6B are diagrams (part 2) for explaining the configuration of the mover of FIG. 3;

FIG. 7 is a diagram (part 3) for describing the configuration of the mover of FIG. 3;

FIG. 8 is a diagram for explaining components arranged in an inner space of the mover.

FIGS. 9A and 9B are diagrams for explaining a configuration of an electromagnet arranged in an inner space of a mover.

FIG. 10 is a sectional view taken along line AA in FIG. 2;

FIG. 11 is a sectional view taken along the line BB in FIG. 2;

FIGS. 12A and 12B are diagrams for explaining the supporting force of the magnetic guide device.

13 (A) to 13 (C) are diagrams for explaining a magnetic circuit and a magnetic flux density distribution in the linear motor of FIG. 2;

14 (A) and 14 (B) are diagrams for explaining a current flowing through a coil in the linear motor of FIG. 2;

FIG. 15 is a view for explaining a positional relationship between a magnet and a coil in the linear motor of FIG. 2;

FIGS. 16A to 16C are graphs for explaining the current supplied to the armature coil.

FIG. 17 is a diagram for explaining a driving force and a supporting force of the mover.

FIG. 18 is a diagram for explaining a supporting force by Lorentz force.

FIG. 19 is a diagram illustrating a configuration of a modification of the present invention.

[Explanation of symbols]

11: substrate table (moving body), 20XA, 20XB,
20YA, 20YB, 20Y ... linear motor, 34L,
34LC, 34R: permanent magnet (first magnet), 34N, 3
4S: permanent magnet (second magnet), 38: magnetic pole unit, 4
5: armature coil, 49: armature unit, 50: main controller (part of first current controller, part of second current controller), 51: stage control system (one of first current controller) , A part of the second current control device), 70a, 70b: magnetic guide device, 71: electromagnet, 80a, 80b: gap detection system (detection device), W: wafer (substrate).

Claims (15)

[Claims] 1. A plurality of magnets each having a cylindrical shape having a predetermined axis as a central axis, the magnets being arranged along an axial direction of the predetermined axis, and including a plurality of magnets along the axial direction. A magnetic pole unit that generates a magnetic flux density in which a radial component and an axial component with respect to the axis change at mutually different phases; and an armature unit including a plurality of armature coils disposed along the axis of the predetermined axis. A first current control device for controlling the radial Lorentz force and the axial Lorentz force generated in a current path of each armature coil by controlling a current supplied to each armature coil; A motor device comprising: 2. The magnetic pole unit has a cylindrical shape with the predetermined axis as a central axis, is magnetized in the axial direction of the predetermined axis, and is disposed at a predetermined interval along the axial direction. A plurality of first magnets having a cylindrical shape having the predetermined axis as a central axis, magnetized in a radial direction, and disposed between the adjacent first magnets in the arrangement of the first magnets; The motor device according to claim 1, further comprising a plurality of second magnets. 3. The magnetization directions of the adjacent first magnets in the arrangement of the plurality of first magnets are opposite to each other,
The motor device according to claim 1, wherein the magnetization directions of the adjacent second magnets in the arrangement of the plurality of second magnets are opposite to each other. 4. The polarity of the magnetic pole surface of the first magnet is the same as the polarity of the magnetic pole surface of the cylindrical outer surface of the second magnet facing the magnetic pole surface, and the armature unit includes the first magnet. The motor device according to claim 3, wherein the motor device is disposed radially outside the second magnet. 5. The change in the magnetic flux density generated by the magnetic pole unit in the axial direction is periodic, and the plurality of armature coils have one of the axial change cycles of the magnetic flux density generated by the magnetic pole unit in the axial direction. The motor device according to any one of claims 1 to 4, wherein the motor device is arranged along the axial direction at an arrangement period of / N (N is an integer of 2 or more). 6. An electromagnet provided on at least one end in the axial direction of the armature unit, the electromagnet being configured to generate the radial force by magnetic interaction with the magnetic pole unit in accordance with a supplied current. The motor device according to any one of claims 1 to 5, further comprising a guide device. 7. A plurality of magnets having a cylindrical shape having a predetermined axis as a central axis, the magnets being arranged along an axial direction of the predetermined axis, and including a plurality of magnets arranged along the axial direction. A magnetic pole unit that generates a magnetic flux density whose radial component with respect to the axis changes; an armature unit including a plurality of armature coils disposed along the axial direction of the predetermined axis; A magnetic guide device including an electromagnet provided on at least one end in the axial direction and generating the radial force by magnetic interaction with the magnetic pole unit in accordance with the supplied current; And a first current control device that controls the axial Lorentz force generated in the current path of each of the armature coils by controlling the current that flows. 8. The electromagnet according to claim 8, wherein a change in a magnetic flux density generated by the magnetic pole unit with respect to the axial direction is periodic, and the electromagnet has two magnetic pole faces facing the magnetic pole unit and the two magnetic pole faces in the axial direction. 8. The motor device according to claim 6, wherein the distance between the center points is approximately １ ／ of a change period of the magnetic flux density generated by the magnetic pole unit in the axial direction. 9. 9. The number of the electromagnets is even, the electromagnets are arranged around the predetermined axis, and the positions of two electromagnets adjacent to each other around the predetermined axis in the axial direction are the magnetic pole units. The motor device according to claim 8, wherein the magnetic flux density generated is shifted by about 1/4 of a change period in the axial direction. 10. A detection device for detecting a positional relationship between the magnetic pole unit and the armature unit in the radial direction, wherein the magnetic guide device is supplied to the electromagnet based on a detection result by the detection device. The motor device according to any one of claims 6 to 9, further comprising a second current control device that controls a current. 11. A moving body having a mounting surface; and a motor device for moving the moving body, wherein the motor device is the motor device according to any one of claims 1 to 10. Characteristic stage device. 12. The stage apparatus according to claim 11, wherein the moving body is moved by the motor device in a first axis direction and a second axis direction different from the first axis direction. 13. The stage device according to claim 11, wherein the motor device moves the moving body in a direction inclined with respect to a reference plane. 14. An exposure apparatus for transferring a predetermined pattern onto a substrate while a moving body provided in a stage device is moving, wherein the stage device according to claim 11 is used as the stage device. An exposure apparatus comprising the apparatus. 15. The exposure apparatus according to claim 14, wherein the motor device cancels a deformation due to a movement of a center of gravity caused by the movement of the moving body.