JP2000107754A - Liquid treatment apparatus by plasma - Google Patents
Liquid treatment apparatus by plasmaInfo
- Publication number
- JP2000107754A JP2000107754A JP10312677A JP31267798A JP2000107754A JP 2000107754 A JP2000107754 A JP 2000107754A JP 10312677 A JP10312677 A JP 10312677A JP 31267798 A JP31267798 A JP 31267798A JP 2000107754 A JP2000107754 A JP 2000107754A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- liquid
- liquid film
- pipe
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Food Preservation Except Freezing, Refrigeration, And Drying (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Water Treatments (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】この発明は、放電プラズマに
より上下水や牛乳等飲料などの液体を酸化浄化・殺菌処
理する装置に係わる。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for oxidizing, purifying and sterilizing liquids such as water and sewage and drinks such as milk using discharge plasma.
【0002】[0002]
【従来の技術】近年、大気圧の下で電極間に高周波のパ
ルス状電圧を印加して放電により発生するプラズマによ
って汚染物を処理する技術が各種提案されているが、こ
の種の技術の中に、同心円状の隙間から水を自由落下さ
せて中空円筒状の水流を形成せしめ、この水流の内外面
に設けた電極間に高周波のパルス状電圧を印加して電極
間に発生する放電プラズマで水中の汚染・細菌を酸化・
無害化する方式がある。これは1996年にミュンヘン
で開催された国際見本市IFATで紹介されたが、構成
がコンパクトであり、プラズマにより発生する紫外線・
オゾン・遊離基などの強力な酸化因子が水流に有効に作
用するので、上下水や牛乳等飲料などの液体の浄化・殺
菌処理装置として注目された。2. Description of the Related Art In recent years, there have been proposed various techniques for treating contaminants with plasma generated by discharge by applying a high-frequency pulsed voltage between electrodes under atmospheric pressure. Then, water is allowed to fall freely from the concentric gaps to form a hollow cylindrical water flow, and a high-frequency pulsed voltage is applied between the electrodes provided on the inner and outer surfaces of this water flow to generate discharge plasma between the electrodes. Oxidizes water pollution and bacteria
There is a detoxifying method. This was introduced at the international trade fair IFAT held in Munich in 1996, but its configuration is compact and the ultraviolet and
Since strong oxidizing factors such as ozone and free radicals effectively act on water streams, they have been attracting attention as purification and sterilization treatment devices for liquids such as water and sewage and drinks such as milk.
【0003】[0003]
【発明が解決しようとする課題】しかしながら被処理液
が水の場合は導電性があり、水流と電極との間隙が極端
に狭まると局部的に短絡してコロナ放電から火花放電に
移行するので、前記方式で安定した放電プラズマを維持
するためには放電電極と水流との間隙を一定に維持する
必要がある。しかし自由落下させた中空円筒状水流の寸
法形状を正確に制御することは難しいので、この要求を
満たして安定なプラズマを維持することは必ずしも容易
ではない。However, if the liquid to be treated is water, it is conductive. If the gap between the water flow and the electrode becomes extremely narrow, a local short circuit occurs, causing a transition from corona discharge to spark discharge. In order to maintain stable discharge plasma by the above method, it is necessary to maintain a constant gap between the discharge electrode and the water flow. However, since it is difficult to accurately control the size and shape of the hollow cylindrical water flow that has been freely dropped, it is not always easy to satisfy this requirement and maintain stable plasma.
【0004】[0004]
【課題を解決するための手段】上記課題を解決し、なお
且つさらにプラズマの作用効果を向上せしめるため、発
明者はさきに出願した特開平6−238266「液体へ
の電磁波照射方法及び装置」の方法、すなわち「垂直管
の内壁を伝わって流下せしめた液膜に内側から電磁波を
照射する方法」を援用した。Means for Solving the Problems In order to solve the above-mentioned problems and to further improve the action and effect of the plasma, the inventor of the Japanese Patent Application Laid-Open No. 6-238266, entitled "Method and Apparatus for Irradiating Electromagnetic Wave to Liquid", was filed earlier. The method, that is, “a method of irradiating the liquid film flowing down the inner wall of the vertical tube with the electromagnetic wave from the inside” was used.
【0005】すなわち請求項1に記載の発明は、垂直管
と該垂直管の中心に設けた同心円筒との間に高周波のパ
ルス状電圧を印加して放電により発生するプラズマを、
垂直管の内壁を伝わって流下する液膜に作用させること
を特徴とする、プラズマによる液体処理装置である。That is, according to the first aspect of the present invention, a plasma generated by discharge by applying a high-frequency pulsed voltage between a vertical tube and a concentric cylinder provided at the center of the vertical tube is provided.
A plasma-based liquid processing apparatus characterized by acting on a liquid film flowing down an inner wall of a vertical tube.
【0006】また、請求項2に記載の発明はさらにプラ
ズマの作用効果を向上せしめるために垂直管の存在を有
効に利用するもので、請求項1に記載のプラズマによる
液体処理装置において、垂直管の内壁に細かい凹凸を設
けたことを特徴とする。Further, the invention according to claim 2 effectively utilizes the existence of a vertical tube in order to further enhance the effect of the plasma. In the liquid processing apparatus using plasma according to claim 1, the vertical tube is used. Is characterized by providing fine irregularities on the inner wall.
【0007】[0007]
【発明の実施の形態】以下、本発明の実施形態例を図面
に基ずいて説明する。図1は本発明の形態例の縦断面
図、図2は図1の視矢X−X図、図3は図1のP部の詳
細図、図4は他の形態例の縦断面図、図5は図4の視矢
Y−Y図、をそれぞれ示す。なお、図中同一の符号を付
した部分は同一または相当部分を示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings. 1 is a longitudinal sectional view of an embodiment of the present invention, FIG. 2 is a view taken along the line XX of FIG. 1, FIG. 3 is a detailed view of a portion P in FIG. 1, FIG. FIG. 5 is a view taken along the line YY in FIG. 4. In the drawings, the same reference numerals denote the same or corresponding parts.
【0008】図1〜図3によって実施形態例を説明する
と、上下水や牛乳等飲料などの被処理液1は、上部保液
槽2から垂下された垂直管3の頂部4を溢流して該垂直
管3の内壁を膜状になって流下するように流量制御され
て上部保液槽2に供給され、下部液槽5を経て浄化液6
となって流出するように構成されている。しかして垂直
管3の内壁には、ここを流下する液膜の表面積を増やし
且つ液中に渦流7を生ぜしめて液表面を絶えず入れ変え
る目的で、図示のように細かい凹凸が設けられている。
一方、上部保液槽2の頂部からは周知の高周波パルス状
電圧発生装置8と連結した陽電極棒9が垂下され、該陽
電極棒9には導電性円筒10が垂直管3と同心円状に導
電性支持材11で結合されており、該円筒10の外周に
は導電性円板状フィン12が等間隔に垂直管3の外周と
間隙G−1を保って設けてある。Referring to FIGS. 1 to 3, an embodiment of the present invention will be described. A liquid 1 to be treated, such as water and sewage and a drink such as milk, overflows a top 4 of a vertical pipe 3 suspended from an upper liquid retaining tank 2. The flow rate is controlled so that the inner wall of the vertical pipe 3 flows down in a film form and is supplied to the upper liquid holding tank 2, and the purified liquid 6 is passed through the lower liquid tank 5.
It is configured to flow out. The inner wall of the vertical tube 3 is provided with fine irregularities as shown in the figure for the purpose of increasing the surface area of the liquid film flowing down therethrough and generating a vortex 7 in the liquid to constantly change the liquid surface.
On the other hand, a positive electrode rod 9 connected to a well-known high-frequency pulsed voltage generator 8 hangs from the top of the upper liquid holding tank 2, and a conductive cylinder 10 is concentrically formed on the positive electrode rod 9 with the vertical tube 3. Conductive support members 11 are connected to each other, and conductive disc-shaped fins 12 are provided on the outer periphery of the cylinder 10 at equal intervals while maintaining a gap G-1 with the outer periphery of the vertical tube 3.
【0009】以上の構成において、高周波パルス状電圧
発生装置8によって陽電極棒9と接地された垂直管3と
の間に高周波パルス状電圧を印加すると、円板状フィン
12(陽極)と垂直管3(陰極)との間隙G−1ないし
被処理液1の導電性如何によっては垂直管3と被処理液
1との間隙G−2、印加電圧およびその周波数、などの
特定条件下において、両極間で高周波コロナ放電を開始
して継続的にプラズマが発生し、このプラズマで生ずる
紫外線・オゾン・遊離基などの強力な酸化因子が被処理
液1に作用して、酸化浄化・殺菌処理などが行われる。
なお、一回の処理で浄化不十分の場合は再循環して繰り
返し処理を行えばよい。In the above configuration, when a high-frequency pulse voltage is applied between the positive electrode rod 9 and the grounded vertical tube 3 by the high-frequency pulse voltage generator 8, the disk-shaped fin 12 (anode) and the vertical tube Under specific conditions, such as the gap G-1 to the cathode 3 and the gap G-2 between the vertical tube 3 and the liquid 1 to be processed, the applied voltage and its frequency, depending on the conductivity of the liquid 1 to be processed. A high-frequency corona discharge is started between the plasmas to continuously generate plasma, and strong oxidizing factors such as ultraviolet rays, ozone, and free radicals generated by the plasma act on the liquid 1 to be processed to perform oxidation purification, sterilization, and the like. Done.
In addition, when the purification is insufficient by one treatment, the treatment may be repeated and repeated.
【0010】次に、図4、5は処理規模の大きい場合の
他の形態例を示し、上部保液槽2から垂下された多数の
垂直管3と、各垂直管3に対応して設けられた多数の陽
電極棒9、導電性円筒10、導電性円板状フィン12、
およびこれらに共通な高周波パルス状電圧発生装置8、
などで構成されており、各垂直管3の内壁を流下して形
成される液膜に対する処理様態は前記と同様である。FIGS. 4 and 5 show another embodiment in which the processing scale is large. A large number of vertical tubes 3 suspended from the upper liquid holding tank 2 and a plurality of vertical tubes 3 are provided corresponding to the vertical tubes 3. A large number of positive electrode rods 9, conductive cylinders 10, conductive disc-shaped fins 12,
And a high frequency pulse voltage generator 8 common to them,
The processing mode for the liquid film formed by flowing down the inner wall of each vertical tube 3 is the same as described above.
【0011】[0011]
【発明の効果】以上の説明で明らかなように請求項1に
記載の発明によれば、液流は自由落下ではなく垂直管の
内壁を伝わって流下するので、液流が安定し、液膜面と
電極間の距離を確実に一定に維持できる。したがって、
導電性のある水処理の場合においても水流と電極との間
隙が極端に狭まって局部的な短絡を生じて火花放電に移
行することなく、より安定した放電プラズマを維持する
ことができる。As is apparent from the above description, according to the first aspect of the present invention, the liquid flow is not free falling but flows down the inner wall of the vertical tube, so that the liquid flow is stabilized and the liquid film is formed. The distance between the surface and the electrode can be reliably kept constant. Therefore,
Even in the case of the conductive water treatment, the gap between the water flow and the electrode is extremely narrowed, and a local short circuit occurs, so that a more stable discharge plasma can be maintained without shifting to spark discharge.
【0012】また、請求項2に記載の発明によれば、垂
直管の内壁に設けた細かい凹凸によって、液膜の表面
積が増え、液膜に渦流を生じて液表面が絶えず入れ代
わるなどの作用で、プラズマで発生する紫外線・オゾン
・遊離基などの強力な酸化因子と液との接触面積が実質
的に増加するので、プラズマの作用効果を上げることが
できる。According to the second aspect of the present invention, the fine irregularities provided on the inner wall of the vertical tube increase the surface area of the liquid film, generate a vortex in the liquid film, and constantly replace the liquid surface. Since the contact area between the strong oxidizing factors such as ultraviolet rays, ozone, and free radicals generated by the plasma and the liquid is substantially increased, the effect of the plasma can be enhanced.
【図1】本発明の形態例の縦断面図を示す。FIG. 1 shows a longitudinal sectional view of an embodiment of the present invention.
【図2】図1の視矢X−X図を示す。FIG. 2 shows a view taken along the line XX of FIG.
【図3】図1のP部の詳細図を示す。FIG. 3 shows a detailed view of a part P in FIG. 1;
【図4】本発明の他の形態例の縦断面図を示す。FIG. 4 shows a longitudinal sectional view of another embodiment of the present invention.
【図5】図4の視矢Y−Y図を示す。FIG. 5 shows a view taken along the line YY of FIG. 4;
1 被処理液 2 上部保液槽 3 垂直管 5 下部液槽 6 浄化液 7 渦流 8 高周波パルス状電圧発生装置 9 陽電極棒 10 導電性円筒 11 導電性支持材 12 導電性円板状フィン DESCRIPTION OF SYMBOLS 1 To-be-processed liquid 2 Upper liquid storage tank 3 Vertical pipe 5 Lower liquid tank 6 Purification liquid 7 Eddy current 8 High frequency pulsed voltage generator 9 Positive electrode rod 10 Conductive cylinder 11 Conductive support material 12 Conductive disk-shaped fin
Claims (2)
膜に電磁波を照射する方式において、垂直管と該垂直管
の中心に設けた同心円筒との間に高周波のパルス状電圧
を印加して放電により発生するプラズマを、垂直管の内
壁を伝わって流下する液膜に作用させることを特徴とす
る、プラズマによる液体処理装置。In a method of irradiating a liquid film flowing down the inner wall of a vertical tube with an electromagnetic wave, a high-frequency pulsed voltage is applied between the vertical tube and a concentric cylinder provided at the center of the vertical tube. A plasma generated by the electric discharge to act on a liquid film flowing down the inner wall of the vertical tube.
を特徴とする、請求項1に記載のプラズマによる液体処
理装置。2. The plasma-based liquid processing apparatus according to claim 1, wherein fine irregularities are provided on the inner wall of the vertical tube.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31267798A JP3501961B2 (en) | 1998-09-29 | 1998-09-29 | Liquid processing equipment using plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31267798A JP3501961B2 (en) | 1998-09-29 | 1998-09-29 | Liquid processing equipment using plasma |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000107754A true JP2000107754A (en) | 2000-04-18 |
JP3501961B2 JP3501961B2 (en) | 2004-03-02 |
Family
ID=18032106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31267798A Expired - Fee Related JP3501961B2 (en) | 1998-09-29 | 1998-09-29 | Liquid processing equipment using plasma |
Country Status (1)
Country | Link |
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JP (1) | JP3501961B2 (en) |
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JPWO2009041049A1 (en) * | 2007-09-27 | 2011-01-20 | 聡 井川 | Sterilization method and apparatus |
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