IT949790B - Procedimento per preparare sottili strati di tantalio - Google Patents
Procedimento per preparare sottili strati di tantalioInfo
- Publication number
- IT949790B IT949790B IT21293/72A IT2129372A IT949790B IT 949790 B IT949790 B IT 949790B IT 21293/72 A IT21293/72 A IT 21293/72A IT 2129372 A IT2129372 A IT 2129372A IT 949790 B IT949790 B IT 949790B
- Authority
- IT
- Italy
- Prior art keywords
- tantalum
- procedure
- thin layers
- preparing thin
- preparing
- Prior art date
Links
- 229910052715 tantalum Inorganic materials 0.000 title 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2110987A DE2110987B2 (de) | 1971-03-08 | 1971-03-08 | Verfahren zum Herstellen von dünnen Schichten aus Tantal |
Publications (1)
Publication Number | Publication Date |
---|---|
IT949790B true IT949790B (it) | 1973-06-11 |
Family
ID=5800841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT21293/72A IT949790B (it) | 1971-03-08 | 1972-03-02 | Procedimento per preparare sottili strati di tantalio |
Country Status (7)
Country | Link |
---|---|
US (1) | US3808109A (it) |
BE (1) | BE780373A (it) |
DE (1) | DE2110987B2 (it) |
FR (1) | FR2128643B1 (it) |
GB (1) | GB1349833A (it) |
IT (1) | IT949790B (it) |
NL (1) | NL7202035A (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4046712A (en) * | 1972-11-30 | 1977-09-06 | United Kingdom Atomic Energy Authority | Catalysts sputtered on substantially nonporous low surface area particulate supports |
US3874922A (en) * | 1973-08-16 | 1975-04-01 | Boeing Co | Tantalum thin film resistors by reactive evaporation |
US4036708A (en) * | 1976-05-13 | 1977-07-19 | Bell Telephone Laboratories, Incorporated | Technique for nucleating b.c.c. tantalum films on insulating substrates |
JPS5671821A (en) | 1979-11-14 | 1981-06-15 | Hitachi Ltd | Substrate for magnetic disc and its manufacture |
EP0582387B1 (en) * | 1992-08-05 | 1999-05-26 | Sharp Kabushiki Kaisha | Metallic wiring board and method for producing the same |
MXPA06010834A (es) * | 2004-03-24 | 2007-03-23 | Starck H C Inc | Metodos de formar peliculas de tantalo alfa y beta con microestructuras nuevas y controladas. |
WO2007143962A1 (de) * | 2006-06-16 | 2007-12-21 | Siemens Aktiengesellschaft | Thermisch beanspruchbares bauteil mit einer korrosionsschicht und verfahren zu dessen herstellung |
CN113235060B (zh) * | 2021-05-12 | 2023-01-06 | 中国兵器工业第五九研究所 | 一种全α相钽涂层的制备方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1665571B1 (de) * | 1966-03-08 | 1971-09-09 | Siemens Ag | Verfahren zur herstellung von duennschichtbaugruppen der elektronik |
-
1971
- 1971-03-08 DE DE2110987A patent/DE2110987B2/de not_active Withdrawn
-
1972
- 1972-02-16 NL NL7202035A patent/NL7202035A/xx not_active Application Discontinuation
- 1972-02-18 GB GB755772A patent/GB1349833A/en not_active Expired
- 1972-03-02 IT IT21293/72A patent/IT949790B/it active
- 1972-03-06 FR FR7207645A patent/FR2128643B1/fr not_active Expired
- 1972-03-07 US US00232373A patent/US3808109A/en not_active Expired - Lifetime
- 1972-03-08 BE BE780373A patent/BE780373A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
FR2128643A1 (it) | 1972-10-20 |
DE2110987B2 (de) | 1978-11-16 |
BE780373A (fr) | 1972-07-03 |
DE2110987A1 (de) | 1972-09-14 |
FR2128643B1 (it) | 1977-04-01 |
US3808109A (en) | 1974-04-30 |
NL7202035A (it) | 1972-09-12 |
GB1349833A (en) | 1974-04-10 |
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