GB2323855B - Method and apparatus for depositing a coating on a conductive substrate - Google Patents

Method and apparatus for depositing a coating on a conductive substrate

Info

Publication number
GB2323855B
GB2323855B GB9706538A GB9706538A GB2323855B GB 2323855 B GB2323855 B GB 2323855B GB 9706538 A GB9706538 A GB 9706538A GB 9706538 A GB9706538 A GB 9706538A GB 2323855 B GB2323855 B GB 2323855B
Authority
GB
United Kingdom
Prior art keywords
depositing
coating
conductive substrate
conductive
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB9706538A
Other versions
GB2323855A (en
GB9706538D0 (en
Inventor
Allan Matthews
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ION COAT Ltd
Original Assignee
ION COAT Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ION COAT Ltd filed Critical ION COAT Ltd
Priority to GB9706538A priority Critical patent/GB2323855B/en
Publication of GB9706538D0 publication Critical patent/GB9706538D0/en
Publication of GB2323855A publication Critical patent/GB2323855A/en
Application granted granted Critical
Publication of GB2323855B publication Critical patent/GB2323855B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB9706538A 1997-04-01 1997-04-01 Method and apparatus for depositing a coating on a conductive substrate Expired - Lifetime GB2323855B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9706538A GB2323855B (en) 1997-04-01 1997-04-01 Method and apparatus for depositing a coating on a conductive substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9706538A GB2323855B (en) 1997-04-01 1997-04-01 Method and apparatus for depositing a coating on a conductive substrate

Publications (3)

Publication Number Publication Date
GB9706538D0 GB9706538D0 (en) 1997-05-21
GB2323855A GB2323855A (en) 1998-10-07
GB2323855B true GB2323855B (en) 2002-06-05

Family

ID=10810066

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9706538A Expired - Lifetime GB2323855B (en) 1997-04-01 1997-04-01 Method and apparatus for depositing a coating on a conductive substrate

Country Status (1)

Country Link
GB (1) GB2323855B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59901000D1 (en) 1998-10-21 2002-04-18 Siemens Ag METHOD AND DEVICE FOR CLEANING A PRODUCT
US6548104B2 (en) 2000-03-21 2003-04-15 Michael J. Pappas Apparatus and method for coating prosthetic components
WO2005100631A1 (en) * 2004-04-15 2005-10-27 Bestcoating S.A.R.L. Method for coating a base body, device for carrying out said method, and coated base body
US8328945B2 (en) * 2010-03-12 2012-12-11 United Technologies Corporation Coating apparatus and method with indirect thermal stabilization
RU2451770C2 (en) * 2010-05-21 2012-05-27 Открытое акционерное общество "Научно-производственное объединение Энергомаш имени академика В.П. Глушко" Method for vacuum ion-plasma coating application
JP5689051B2 (en) * 2011-11-25 2015-03-25 株式会社神戸製鋼所 Ion bombardment equipment

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4269137A (en) * 1979-03-19 1981-05-26 Xerox Corporation Pretreatment of substrates prior to thin film deposition
WO1989005361A1 (en) * 1987-12-04 1989-06-15 National Research Development Corporation Deposition of materials in a desired pattern on to substrates
US4941430A (en) * 1987-05-01 1990-07-17 Nihon Sinku Gijutsu Kabusiki Kaisha Apparatus for forming reactive deposition film
EP0387904A2 (en) * 1989-03-17 1990-09-19 Matsushita Electric Industrial Co., Ltd. Method of producing thin film
GB2261226A (en) * 1991-11-08 1993-05-12 Univ Hull Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD
US5436035A (en) * 1991-12-05 1995-07-25 Alusuisse-Lonza Services Ltd. Coating a substrate surface with a permeation barrier
US5487922A (en) * 1992-08-14 1996-01-30 Hughes Aircraft Company Surface preparation and deposition method for titanium nitride onto carbon-containing materials
EP0725161A1 (en) * 1995-01-06 1996-08-07 METAPLAS IONON Oberflächenveredelungstechnik GmbH Method for plasma treating of worked articles
WO1996024703A1 (en) * 1995-02-10 1996-08-15 Jet Process Corporation An electron jet vapor deposition system

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4269137A (en) * 1979-03-19 1981-05-26 Xerox Corporation Pretreatment of substrates prior to thin film deposition
US4941430A (en) * 1987-05-01 1990-07-17 Nihon Sinku Gijutsu Kabusiki Kaisha Apparatus for forming reactive deposition film
WO1989005361A1 (en) * 1987-12-04 1989-06-15 National Research Development Corporation Deposition of materials in a desired pattern on to substrates
EP0387904A2 (en) * 1989-03-17 1990-09-19 Matsushita Electric Industrial Co., Ltd. Method of producing thin film
GB2261226A (en) * 1991-11-08 1993-05-12 Univ Hull Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD
US5436035A (en) * 1991-12-05 1995-07-25 Alusuisse-Lonza Services Ltd. Coating a substrate surface with a permeation barrier
US5487922A (en) * 1992-08-14 1996-01-30 Hughes Aircraft Company Surface preparation and deposition method for titanium nitride onto carbon-containing materials
EP0725161A1 (en) * 1995-01-06 1996-08-07 METAPLAS IONON Oberflächenveredelungstechnik GmbH Method for plasma treating of worked articles
WO1996024703A1 (en) * 1995-02-10 1996-08-15 Jet Process Corporation An electron jet vapor deposition system

Also Published As

Publication number Publication date
GB2323855A (en) 1998-10-07
GB9706538D0 (en) 1997-05-21

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Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Expiry date: 20170331