GB2220951A - Cleaning and drying of electronic assemblies - Google Patents

Cleaning and drying of electronic assemblies Download PDF

Info

Publication number
GB2220951A
GB2220951A GB8915464A GB8915464A GB2220951A GB 2220951 A GB2220951 A GB 2220951A GB 8915464 A GB8915464 A GB 8915464A GB 8915464 A GB8915464 A GB 8915464A GB 2220951 A GB2220951 A GB 2220951A
Authority
GB
United Kingdom
Prior art keywords
organic solvent
vapour
fluorinated compound
highly fluorinated
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB8915464A
Other versions
GB8915464D0 (en
GB2220951B (en
Inventor
David Stanley Lloyd Slinn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ISC Chemicals Ltd
Original Assignee
ISC Chemicals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB888816343A external-priority patent/GB8816343D0/en
Priority claimed from GB898902280A external-priority patent/GB8902280D0/en
Application filed by ISC Chemicals Ltd filed Critical ISC Chemicals Ltd
Publication of GB8915464D0 publication Critical patent/GB8915464D0/en
Publication of GB2220951A publication Critical patent/GB2220951A/en
Application granted granted Critical
Publication of GB2220951B publication Critical patent/GB2220951B/en
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5013Organic solvents containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5018Halogenated solvents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04Apparatus
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/28Organic compounds containing halogen
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/32Organic compounds containing nitrogen
    • C11D7/3209Amines or imines with one to four nitrogen atoms; Quaternized amines
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0104Properties and characteristics in general
    • H05K2201/012Flame-retardant; Preventing of inflammation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08Treatments involving gases
    • H05K2203/088Using a vapour or mist, e.g. cleaning using water vapor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15Position of the PCB during processing
    • H05K2203/1518Vertically held PCB
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00Cleaning and liquid contact with solids
    • Y10S134/902Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Emergency Medicine (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

Components, especially of an electronic or electrical type, are cleaned by contact with a flammable liquid organic solvent (21), especially an alcohol. The surface of the solvent is covered with a non-flammable highly fluorinated compound vapour blanket (26), which vapour may also be used to transfer heat to the organic solvent. Both highly fluorinated compound and organic solvent are condensed and re-cycled. <IMAGE>

Description

CLEANING AND DRYING OF ELECTRONIC ASSEMBLIES This invention relates to the cleaning and drying of electronic assemblies. and especially to a method and apparatus for cleaning and drying components, by which is meant both electronic and electrical components.
There is a need, within the electronics industry, for a solvent which can remove flux residues, other soils and water from printed-circuit boards and from other electronic components and assemblies, the water being removed by solubilization.
An ideal solvent for such a purpose should have the following properties: TABLE 1 (1) It should be non-toxic (2) It should be non-flammable (3) It should not attack plastics materials (4) It should have high penetrating power (5) It should be thermally stable (6) It should be able to dissolve both polar and non-polar soils (7) It should have excellent dielectric properties (8) It should not be too expensive.
For many years l.l.2-trichloro-trifluoroethane has been the preferred solvent although it has often been necessary to blend it with minor proportions of polar organic solvents (especially lower aliphatic alcohols) to increase its solvent power. Also the solvent action will normally be aided by agitation, e.g. by means of spraying. boiling. sparging or ultrasonic vibration.
Typical formulations are to be found, for example, in UK patent specification nos. GB-A-1,330,534. 1,377,156, 1.469.264. 1,495,327 and 1,534,734.
In more recent years, and especially since 1980, the chlorofluorocarbons (CFC's) generally have become subject to suspicion that they may possibly contribute to depletion of the ozone layer in the upper atmosphere. There is therefore a move to reduce and eventually to phase-out the release of chlorofluorocarbons into the earth's atmosphere. It is therefore desirable to phase out CFC's from uses where there is likely to be appreciable escape of CFC's into the atmosphere.
The present invention provides an alternative method of cleaning and drying especially for electronic assemblies and components in which a highly fluorinated organic compound not containing chlorine or bromine (HFO) is used in conjunction with a solvent (usually a polar organic solvent) of higher solvent power than the highly fluorinated compound. HFO's have. in general, very poor solvent power and are only partially miscible with most other solvents. However HFO's are inert chemically and have very good compatibility with plastics materials.
The functional hydrocarbon organic solvents such as aliphatic alcohols, ketones. nitriles, nitro-alkanes and acetals have relatively high solvent power especially with respect to polar soils. but they are almost invariably flammable. If the chlorofluorocarbons are removed from consideration then the chlorinated and brominated solvents remain but they do not have the required low toxicity and compatibility with plastics materials.
By "HFO" we mean an organic compound which contains predominantly carbon and fluorine atoms but possibly a minor proportion of hydrogen atoms with or without oxygen or nitrogen atoms.
This invention seeks to provide a cleaning and drying method and apparatus, especially for electronic assemblies/components, wherein a flammable liquid of relatively greater solvent power than a HFO is used in combination with a fluorinated organic compound, thus reducing the flammability hazards to a minimum.
The present invention in one aspect provides a method of cleaning and drying components using a hydrogen-containing flammable. liquid organic solvent in a container. wherein the solvent surface is covered by a vapour layer rich in a highly fluorinated organic compound (as herein defined), which transfers heat to the organic solvent, and the component to be cleaned is contacted with the liquid organic solvent, removed therefrom. vapour-rinsed or dried in the highly fluorinated compound-rich vapour layer and then removed from the cleaning environment.
Preferred organic solvents are lower aliphatic alcohols having 1 to 5 carbon atoms (e.g. ethanol, iso-propanol) although other functional solvents such as ketones, nitrides, and nitro-alkanes may be used. It should be understood that the organic solvent can contain highly fluorinated compound up to the saturation concentration (saturation solubility) of that compound in the organic solvent.
For electronic component cleaning the preferred HFO compounds are perfluoro-n-alkanes, perfluoro-alicyclic compounds. perfluoro-amines and perfluoro-ethers with a preferred boiling range between +300 and +1000C. In other cleaning or de-greasing applications these temperatures may be exceeded and typically may be between 1000 and 250 C. However, such HFO compounds need not be completely fluorinated. The compound is most preferably a perfluoro (alkyl- or polyalkyl-cyclohexane).
Particularly suitable hydrogen-containing fluorinated organic compounds include: Perfluoro-l-hydro-n-pentane Bpt.450C Perfluoro-l-hydro-n-hexane Bpt.700C Perfluoro-1.3-dihydro-cyclohexane Bpt.78 C The organic solvent layer may contain water up to the azeotropic composition of the water/organic solvent system.
To avoid losses it will be necessary to separate and to conserve solvent and fluorinated compound by means of cooling/condensation/recycling means known to the art.
Thus, in a second aspect, the invention provides apparatus for cleaning and drying components. comprising a highly fluorinated compound reservoir. means for heating and evaporating highly fluorinated compound from said reservoir. means for conducting highly fluorinated compound vapour to a cleaning chamber to cover an organic liquid in said chamber, means for conducting components to be cleaned in and out of said chamber and means for condensing and re-cycling highly fluorinated compound and organic solvent to their respective reservoirs.
Preferably the heating means is an electrical element or heating coil.
The highly fluorinated compound vapour is preferably passed to the cleaning chamber wherein it directly heats the organic liquid.
The condensing means are suitably cooling coils.
There may be a plurality of cleaning compartments, interconnected at their bases by ducts, which are at least partially filled with liquid highly fluorinated compound. thus preventing mixing of solvent in the different compartments at their bases. Ducts may be connected to the highly fluorinated compound reservoir via a fluorinated compound/organic solvent separator which is vented to the vapour space above the organic solvent.
The invention will be further described. by way of example only, with reference to the accompanying drawings, wherein each of Figures 1 to 4 is a schematic view of an apparatus according to the invention.
In the following description reference to perfluoro compounds are to be taken to include reference to highly fluorinated organic compounds as defined above.
The method and a relatively simple form of apparatus according to the invention will now be described with reference to Figure 1.
Figure 1 shows a tank 4 containing a heavy perfluorocarbon layer 9 and a flammable solvent layer 5. These remain separate layers because the two liquids are mostly immiscible. A heater 8 is fixed to the bottom of tank 4 and cooling coils 2 are located inside the upper part of the tank. When the heater 8 is actuated, fluorocarbon vapour bubbles 10 rise through the flammable solvent layer 5 and form a perfluorocarbon-rich vapour blanket 3. The vapour level 11 is controlled by cooling coils 2 which condense the vapour and the resultant liquid returns by gravity into solvent layer when it then sinks back into the perfluorocarbon layer 9. Loss of perfluorocarbon from the tank gradually occurs, the rate depending on the design of suitable recovery systems.Because of this loss, the perfluorocarbon layer 9 reduces in level and may finally result in a hazardous situation, should the perfluorocarbon be lost. To prevent this, a float switch 6 is connected to a power supply 7 so that power is automatically switched-off in the event of excessive perfluorocarbon loss.
Any suitable perfluoro-compound/organic solvent combination may be used, provided that sufficient perfluoro-compound is present in the vapour space above the solvent to render the vapour non-flammable.
In the case of the apparatus shown in Figure 1 the boiling point of the perfluoro-compound needs to be below about 600C, where lower aliphatic alcohols are used as solvent.
Still with reference to Figure 1. the cleaning sequence for a component to be cleaned is as follows: The component to be cleaned is lowered into the solvent layer 5 for an appropriate time. The component is then raised into the freeboard zone 1 and allowed to remain there for sufficient time for cooling to take place.
The cooled component is then lowered into vapour zone 3 causing condensation of vapour on the component which thus comprises a rinse in perfluoro-compound fluid where residual alcohol is removed. together with traces of contami-na'nts. After the vapour rinse the component is steadily raised again and out of the vapour layer 3 and drying occurs almost immediately as the component emerges from the vapour. The component thus finishes the process in a dry clean state in contrast to cleaning in alcohol alone where flammable alcohol residues remain on the component after cleaning. This example would be suitable for perfluorocarbons with boiling points up to about 600C combined with ethyl or iso-propyl alcohols.
A more sophisticated and safer apparatus embodiment for carrying out the method according to the invention will now be described. by reference to Figure 2.
Figure 2 shows a boiling chamber 24 containing perfluoro-carbon 23 heated by means of heater 22.
Vapour from the chamber is led via conduit 25 into tank 12 where it forms a vapour blanket 26 above the flammable solvent layer 21 which comprises an alcohol layer. The level of the blanket is controlled by cooling coils 13 whilst cooling coils 17 maintain the temperature of the alcohol layer 21 below that of the vapour 26. During the course of operation, vapour condenses on cooling coils 13 and on surface 15. The heavy, largely immiscible condensate sinks to the bottom of tank 12 and is then transported by means of a pump 20 through filter 19 to a gravity separator 14. After separation, the perfluorocarbon returns by gravity to boiler 24 and the alcohol returns to tank 12 via lines 18 and 16 respectively.
The cleaning sequence using this apparatus is as follows The component is lowered into the cool solvent layer 21 where removal of contaminants take place. Solvent 21 can be agitated by stirrer. ultrasonics or some other means if necessary. After immersion of the component in solvent 21 it is then raised into vapour layer 26.
Since the component is lower in temperature than the vapour layer. condensation occurs on the component surface thus giving a rinse in freshly distilled fluid.
After the condensate rinse, the component is raised steadily out of the tank and drying occurs as the component passes through the vapour/air interface 27.
In a third embodiment, which will be described with reference to Figure 3, provision is made for safe and continuous flammable solvent distillation. which thus prolongs the useful life of the solvent and reduces the necessary frequency of clean-out of the apparatus thus reducing disposal problems.
With reference to Figure 3, tank 31 comprises an offset compartment 47, containing the organic solvent 53 to be distilled, and compartment 44 containing the solvent 45 used for cleaning. A separate, sealed boiling compartment 48 contains perfluorocarbon 50 heated by means of heater 49. When the perfluorocarbon boils, vapour passes through conduit 51 into the solvent 53.
The entry of conduit 51 is situated to one side of compartment 47 thus causing a rolling action of solvent 53 in the direction shown by the arrows. During the solvent warming-up period, vapour condenses in solvent 53 as small droplets. These are carried by the rolling action to gauze 46 where coalescence occurs. The larger droplets then sink to the base of compartment 47. Pump 42 continuously circulates the liquid mixture from compartment 47 through filter 40 into separator 34. The solvent is then returned by gravity via line 36 to compartment 47 and the perfluorocarbon returns by gravity to boiler 48 via line 38.
When the solvent in compartment 47 heats-up to the boiling point of the particular fluorocarbon in boiler 48 the condensation of perfluorocarbon in solvent 53 practically ceases, to a rate dictated by small heat losses through insulation 52 on compartment 47. At the same time. the evaporation rate of the solvent 53 increases.
The evaporation rate is enhanced by the fact that perfluorocarbon/solvent mixtures have higher vapour pressures than either component alone, resulting in a reduction of boiling point giving an effect similar to steam distillation. The perfluorocarbon/solvent vapour rises to a level 57 controlled by cooling coils 32.
Condensation takes place both on coils 32 and on solvent 45 surface, the latter being maintained cool by means of coils 39. Perfluorocarbon/solvent mixture condensing on coils 32 is collected in annular trough 56 from whence it flows by gravity to separator 33. Perfluorocarbon condensing on the surface of solvent 45 falls to the base of compartment 44 from where it is continually removed by means of pump 43. through filter 41 to separator 33. After the separation of both feed streams in separator 33, solvent is returned by gravity to compartment 44 via line 37. Similarly, the separated perfluorocarbon is returned to the boiler via lines 35.38. Both separators 33,34 need to be at sufficient height to overcome back-pressure in boiler 48 equivalent to the height of liquid 53 in compartment 47.
A situation thus exists where freshly distilled solvent is continuously fed into compartment 44 thus providing a continuous purification facility. Also, solvent flows over weir 54 back into compartment 47 at a rate equivalent to the solvent distillation rate from compartment 47. Dissolved contaminants such as flux and oil thus concentrate in compartment 47 whilst the solvent 45 in compartment 44, in which the components are immersed, is continuously purified.
The cleaning sequence is as follows: Components to be cleaned are lowered into cool solvent 45 contained in compartment 44. Contaminants, such as flux, dissolve and this may be assisted by stirring, pressure jets. ultrasonic agitation etc. if so required. The component is then raised into the vapour layer 55 where condensate forms on the component providing a rinse in pure fluid. The component is then raised steadily out of the vapour and drying occurs as the component emerges at the vapour/air interface 57.
This embodiment is suitable for use with perfluorocarbons boiling up to about 600C.
Higher-boiling perfluorocarbons may be used if the vapour inlet 51 is divided so that a proportion of the vapour goes directly into vapour space 55.
The above three examples have been given for illustrative purposes and. obviously, further modifications and improvements could be envisaged. for example. a spray rinse stage could be incorporated within the vapour layer of each of the examples given.
Also. the schemes shown would require efficient fluid recovery systems to be fitted in order to remain economical.
In a fourth embodiment, which will be described with reference to Figure 4, provision is made for safe and continuous distillation without the need for pumps to transfer liquid to separators, as is required for Figure 3.
With reference to Figure 4 a main tank 62 contains compartments 75.76.77 at the base, each filled with a flammable organic liquid such as alcohol. Compartments 75.76.77 are connected to outlet tubes 88,89,90 respectively via filters 81,82,83. The tubes 88,89 and 90 are each partly filled with the flammable liquid and partly filled with perfluorocarbon liquid defined by the interphase 85,86.87 respectively. Outlet tubes 88.89.90 are connected via tube 91, which is also filled with perfluorocarbon, to perfluorocarbon filled separator 78 containing liquid at height 80 controlled by outlet tube 79.A situation thus exists where dense perfluorocarbon of height 79 balances columns of perfluorocarbon/alcohol in compartment/outlet tube combinations 75,88; 76,89 and 77.90 of higher levels. e.g. 72 in compartment 75. The respective levels 85,86,87 automatically adjust during operation.
During operation. perfluorocarbon liquid in container 92 is boiled by means of heater 93 causing vapour to emerge via tube 84 from where it is injected into compartment 75 via outlet nozzles 74. The perfluorocarbon-rich vapour 68 thus formed is controlled at level 67 by cooling coils 65. Condensate thus formed is collected in trough 71 and returned via tube 73 to compartment 77. Excess flammable organic liquid in compartment 77 flows over insulated weir 70 into compartment 76 and from thence over weir 69 into compartment 75 where evaporation recommences. By this means, any soluble contaminants entering the organic solvent are concentrated in compartment 75 whilst compartments 76 and 77 are continuously cleansed.Perfluorocarbon liquid entering any of the compartments 75,76,77 sinks to the bottom and separates to flow through tubes 88.89.90 and 91 back through separator 78, outlet 79, line 94 to boiler 92 where the cycle recommences. A pressure balancing line 66 is interconnected to separator 78 and boiler return line 94. This has two purposes: (a) To prevent air being trdpped in the top of separator 78 thereby adversely affecting pressure balancing and levels in the separator; and (b) To avoid suck-back of flammable solvent into the boiler via line 84, i.e. when boiler 93 cools, the vapour in vapour space 95 condenses and causes a partial vacuum which can be relieved via line 94 providing that the hydrostatic head in line 94 is less than that necessary to raise the liquid entering line 84 from compartment 75 to level 63.
Fluid conservation is assisted by a penetrable screen 64, such as elongated brush seals, and refrigerated coils 61 wound around the upper section of tank 62. The screen 64 prevents external air currents from disturbing the vapour air interface 67. The refrigerated coils 61 cause a cool layer of air, denser than the external surroundings. which remains in tank 62 thus minimising any fluid emission from the tank.
Components to be cleaned are lowered through screen 64 into compartment 76 which might include ultrasonic agitation or pressurised liquid jetting. After a suitable time in compartment 76 the component is raised into vapour space 68 during which time a condensate rinse may occur depending on the temperature of the liquid in compartment 76. The component is then immersed for a suitable time in cooled compartment 77 and then again raised into vapour space 68 where another condensate rinse occurs. The component is then removed from the tank via the penetrable screen 64. Other cleaning sequences could be used, for example the heated and agitated liquid in compartment 75 could be used as the first immersion stage.
In performing the invention, any highly fluorinated compound, particularly any perfluorinated organic compound (pfc). having a suitable boiling point would be suitable as a non-flammable vapour layer. These would generally be compounds comprising fluorine and carbon only in the molecule or those which include a hetero atom such as oxygen or nitrogen. Thus, perfluorinated ethers and amines are possible. Because of the poor solvency of perfluorocarbons and the need to provide an effective rinse in the vapour condensation stages of the above examples. the preferred perfluorocarbons would be those which show maximum solubility in the chosen organic solvent. However, in the liquid phase it is desirable that the organic solvent and the pfc remain as immiscible as possible for the following reasons: 1.To promote as complete separation of the two liquids as possible to avoid loss of expensive pfc with discarded organic liquid.
2. To minimize contaminants dissolved in the pfc since organic solvents mixed with pfc will increase the concentration of dissolved contaminant.
Typically suitable perfluoro-compound/organic solvent pairs are given in examples 1-5 in Table 2 below: TABLE 2 Perfluorocarbon Flammable Solvent 1. Perfluoro(methylcyclohexane) Ethyl alcohol (Bpt.760C) (Bpt.780C) 2. Perfluoro(methylcyclohexane) Isopropyl alcohol (Bpt.760C) (Bpt.820C) 3. Perfluoro(dimethylcyclohexane) n-propyl alcohol (Bpt. l000C) (Bpt.970C) 4. Perfluoro(n-hexane) n-propyl alcohol (Bpt. 570C) (Bpt.97 C) 5. Perfluoro(methycyclopentane) n-propyl alcohol (Bpt. 470C) (Bpt.970C) A preferred method of reducing the mutual miscibility of the alcohol/pfc is to add a proportion of water. A further advantage of water addition is to increase the solubility of polar contaminants in the alcohol phase.
The proportion of added water preferably should not exceed the azeotropic composition of water in the appropriate organic solvent.
Also, since compatability is a function of temperature, a minimum perfluorocarbon boiling point is chosen compatible with effective cleaning, which normally improves with temperature. Generally, perfluorocarbon boiling points in the range 400C to 1000C are most widely useful. Where continuous solvent distillation is required those perfluorocarbons having a boiling point close to that of the solvent are most useful. Reference to Table 3 will show that perfluoromethylcyclohexane (PP2) and isopropyl alcohol are a particularly useful pair for the following reasons: TABLE 3 AsPect Advantage Boiling points similar Alcohol evaporates at a rate sufficient for efficient alcohol purification.
19% w/w solubility of PP2 in alcohol at 250C 1. Flammability risk reduced if solvent leaks from Joints.
2. Better solubility of polar contaminants in the fluid mixture condensing from the vapour phase.
0.4% solubility of alcohol in PP2 Advantage After separation, fluid returning to the boiler is substantially perfluorocarbon.
760 boiling point of PP2 1. Similar to that of isopropanol alcohol.
2. Alcohol distills at a suitable rate for purification by distillation.
3. Boiling point low enough to give good compatibility and minimal thermal damage.
4. Boiling point high enough to impart good solvency to isopropyl alcohol.

Claims (14)

1. A method of cleaning and drying components by contact with a hydrogen-containing flammable, liquid organic solvent in a container , characterized in that the solvent surface is covered by a vapour layer rich in a highly fluorinates ganic compound (as herein defined), which transfers heat to the organic solvent. and in that the component to be cleaned is contacted with the liquid organic solvent, removed therefrom. vapour-rinsed or dried in the highly fluorinated compound-rich vapour layer and then removed from the cleaning environment.
2. A method as claimed in claim 1, characterized in that in the organic solvent is a lower aliphatic (C1-C5) alcohol.
3. A method as claimed in claim 1 or 2, characterized in that the component is an electronic or electrical component and the highly fluorinated compound is selected from perfluoroalkanes, perfluoro-alicyclic compounds, perfluoro-amines and perfluoro-ethers.
boiling between 300 and 1000C.
4. A method as claimed in claim 3. characterized in that in the highly fluorinated compound is a perfluoro(alkyl-or polyalkyl-cyclohexane).
5. A method as claimed in claim 1, 2 or 3.
characterized in that the organic solvent contains a highly fluorinated compound up to the saturation solubility of that compound in the organic solvent.
6. A method as claimed in any of claims 1 to 5, characterized in that the organic solvent layer contains water up to the azeotropic composition of the water/organic solvent system.
7. Apparatus for cleaning and drying components, comprising a highly fluorinated compound reservoir means for heating and evaporating highly fluorinated compound from said reservoir, means for conducting highly fluorinated compound vapour to a cleaning chamber to cover an organic liquid in said chamber, means for conducting components to be cleaned in and out of said chamber, and means for condensing and re-cycling highly fluorinated compound and organic solvent to their respective reservoirs.
8. Apparatus as claimed in claim 7, characterized in that in the heating means is an electrical element (22) or heating coil.
9. Apparatus as claimed in claim 7 or 8. characterized by means for passing the highly fluorinated compound vapour to the cleaning chamber for directly heating the organic liquid.
10. Apparatus as claimed in any of claims 7 to 9.
characterized in that the condensing means are cooling coils
11. Apparatus as claimed in any of claims 7 to 10, characterized in that there are a plurality of cleaning compartments , interconnected at their bases by ducts , which are at least partially filled with liquid highly fluorinated compound, thus preventing mixing of solvent in the different compartments, at their bases.
12. Apparatus as claimed in claim 11, characterized in that the ducts are connected to the highly fluorinated compound reservoir via a fluorinated compound/organic solvent separator which is vented to the vapour space above the organic solvent.
13. A method according to claim 1 of cleaning and drying components, substantially as herein described with reference to any of figures 1 to 4 of the accompanying drawings.
14. Apparatus according to claim 7 for cleaning and drying components, substantially as herein described with reference to, and as shown in, any of figures 1 to 4 of the accompanying drawings.
GB8915464A 1988-07-08 1989-07-06 Cleaning and drying of electronic assemblies Revoked GB2220951B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB888816343A GB8816343D0 (en) 1988-07-08 1988-07-08 Cleaning & drying of electronic assemblies
GB898902280A GB8902280D0 (en) 1989-02-02 1989-02-02 Cleaning and drying of electronic assemblies

Publications (3)

Publication Number Publication Date
GB8915464D0 GB8915464D0 (en) 1989-08-23
GB2220951A true GB2220951A (en) 1990-01-24
GB2220951B GB2220951B (en) 1992-09-16

Family

ID=26294140

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8915464A Revoked GB2220951B (en) 1988-07-08 1989-07-06 Cleaning and drying of electronic assemblies

Country Status (8)

Country Link
US (1) US5055138A (en)
EP (1) EP0350316B1 (en)
JP (1) JP2768743B2 (en)
AT (1) ATE152487T1 (en)
DE (1) DE68928010T2 (en)
ES (1) ES2103705T3 (en)
GB (1) GB2220951B (en)
GR (1) GR3023937T3 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0454109A1 (en) * 1990-04-26 1991-10-30 Hoechst Aktiengesellschaft New azeotropic or azeotrope-like mixture of 2,2,2-trifluoroethyl-1,1,2,2-tetrafluoroethylether and ethanol, and its use
US5089152A (en) * 1991-04-19 1992-02-18 Minnesota Mining And Manufacturing Company Water displacement composition
JPH07275812A (en) * 1990-03-16 1995-10-24 Toshiba Corp Cleaning method
US5503681A (en) * 1990-03-16 1996-04-02 Kabushiki Kaisha Toshiba Method of cleaning an object
US5679175A (en) * 1991-06-14 1997-10-21 Petroferm Inc. Cleaning process including use of solvating and rinsing agents
GB2346953A (en) * 1999-02-16 2000-08-23 Stephen Rodger Henly Removing water from articles
US6187729B1 (en) * 1993-12-14 2001-02-13 Petroferm Inc. Cleaning composition comprising solvating agent and rinsing agent
US6355113B1 (en) 1991-12-02 2002-03-12 3M Innovative Properties Company Multiple solvent cleaning system

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02261583A (en) * 1989-03-31 1990-10-24 Yoshihide Shibano Ultrasonic cleaning and deburring device
US5240018A (en) * 1989-08-30 1993-08-31 Vitronics Corporation Apparatus for cleaning mechanical devices using terpene compounds
MY114292A (en) * 1989-10-26 2002-09-30 Momentive Performance Mat Jp Method for removing residual liquid cleaning agent using a rinsing composition containing a polyorganosiloxane
US5142873A (en) * 1990-02-15 1992-09-01 E. I. Du Pont De Nemours And Company Vapor control system for vapor degreasing/defluxing equipment
GB9009504D0 (en) * 1990-04-27 1990-06-20 Isc Chemicals Ltd Reduced flammability mixture based on isopropanol
JPH0490878A (en) * 1990-08-03 1992-03-24 Japan Field Kk Method and apparatus for washing article to be washed using combustible solvent
JPH0632795B2 (en) * 1990-08-10 1994-05-02 ジャパン・フィールド株式会社 Method and apparatus for cleaning object to be cleaned using flammable solvent
US5593507A (en) * 1990-08-22 1997-01-14 Kabushiki Kaisha Toshiba Cleaning method and cleaning apparatus
JPH0632797B2 (en) * 1990-08-30 1994-05-02 ジャパン・フィールド株式会社 Cleaning method and apparatus using alcohol
JP3105271B2 (en) * 1991-01-21 2000-10-30 ジャパン・フィールド株式会社 Method and apparatus for rinsing and cleaning an object to be cleaned
RU2095162C1 (en) * 1990-08-22 1997-11-10 Кабусики Кайся Тосиба Method of cleansing parts
US5082503A (en) * 1990-10-22 1992-01-21 Baxter International Inc. Method for removing contaminants from the surfaces of articles
JPH04161280A (en) * 1990-10-23 1992-06-04 Sumitomo 3M Ltd Method for washing and drying article
JPH04173899A (en) * 1990-11-05 1992-06-22 Japan Field Kk Method for rinsing and washing material to be washed
JPH04270799A (en) * 1991-02-25 1992-09-28 Arakawa Chem Ind Co Ltd Cleansing of article with non-halogenated industrial defatting cleanser
EP0519432A3 (en) * 1991-06-21 1993-05-05 Hoechst Aktiengesellschaft Azeotrope-like mixture of 2-propanol and 1h-perfluorohexane
DE59208347D1 (en) * 1991-06-21 1997-05-22 Solvay Azeotrope-like mixture of methanol and 1H-perfluorohexane
US5182042A (en) * 1991-10-21 1993-01-26 Allied-Signal Inc. Azeotrope-like compositions of 1,1,1-trifluorohexane and perfluoromethylcyclohexane
JPH05123657A (en) * 1991-11-05 1993-05-21 Japan Field Kk Method for cleaning body to be cleaned
MX9206771A (en) * 1991-12-02 1993-06-01 Allied Signal Inc IMPROVEMENTS IN MULTIPLE SOLVENT CLEANING SYSTEM
US5259983A (en) * 1992-04-27 1993-11-09 Allied Signal Inc. Azeotrope-like compositions of 1-H-perfluorohexane and trifluoroethanol or n-propanol
US5304322A (en) * 1992-05-15 1994-04-19 The Boeing Company Cleaning solvent for aircraft hydraulic fluid
FR2701872B1 (en) * 1993-02-23 1995-04-07 Air Liquide Method for treating objects using a volatile flammable liquid.
US5494601A (en) * 1993-04-01 1996-02-27 Minnesota Mining And Manufacturing Company Azeotropic compositions
US5401429A (en) * 1993-04-01 1995-03-28 Minnesota Mining And Manufacturing Company Azeotropic compositions containing perfluorinated cycloaminoether
US5339843A (en) * 1993-04-16 1994-08-23 Martin Marietta Corporation Controlled agitation cleaning system
WO1994026864A1 (en) * 1993-05-17 1994-11-24 Kabushiki Kaisha Toshiba Cleaning agent, cleaning method and cleaning apparatus
AU693453B2 (en) * 1993-06-01 1998-07-02 Minnesota Mining And Manufacturing Company Multiple solvent cleaning system
US5534078A (en) * 1994-01-27 1996-07-09 Breunsbach; Rex Method for cleaning electronic assemblies
US5827454A (en) * 1994-05-19 1998-10-27 Ag Technology Co., Ltd. Mixed solvent composition
US5476974A (en) * 1994-05-20 1995-12-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5658962A (en) * 1994-05-20 1997-08-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5660642A (en) * 1995-05-26 1997-08-26 The Regents Of The University Of California Moving zone Marangoni drying of wet objects using naturally evaporated solvent vapor
US5715612A (en) * 1995-08-17 1998-02-10 Schwenkler; Robert S. Method for precision drying surfaces
US5752532A (en) * 1995-08-17 1998-05-19 Schwenkler; Robert S. Method for the precision cleaning and drying surfaces
US5616549A (en) 1995-12-29 1997-04-01 Clark; Lawrence A. Molecular level cleaning of contaminates from parts utilizing an envronmentally safe solvent
US20050034745A1 (en) * 1997-05-09 2005-02-17 Semitool, Inc. Processing a workpiece with ozone and a halogenated additive
US7163588B2 (en) * 1997-05-09 2007-01-16 Semitool, Inc. Processing a workpiece using water, a base, and ozone
US7378355B2 (en) * 1997-05-09 2008-05-27 Semitool, Inc. System and methods for polishing a wafer
US20020157686A1 (en) * 1997-05-09 2002-10-31 Semitool, Inc. Process and apparatus for treating a workpiece such as a semiconductor wafer
US6240933B1 (en) * 1997-05-09 2001-06-05 Semitool, Inc. Methods for cleaning semiconductor surfaces
US6701941B1 (en) 1997-05-09 2004-03-09 Semitool, Inc. Method for treating the surface of a workpiece
US6869487B1 (en) * 1997-05-09 2005-03-22 Semitool, Inc. Process and apparatus for treating a workpiece such as a semiconductor wafer
US7264680B2 (en) * 1997-05-09 2007-09-04 Semitool, Inc. Process and apparatus for treating a workpiece using ozone
US7404863B2 (en) * 1997-05-09 2008-07-29 Semitool, Inc. Methods of thinning a silicon wafer using HF and ozone
US20050215063A1 (en) * 1997-05-09 2005-09-29 Bergman Eric J System and methods for etching a silicon wafer using HF and ozone
US7416611B2 (en) * 1997-05-09 2008-08-26 Semitool, Inc. Process and apparatus for treating a workpiece with gases
DE1100630T1 (en) * 1998-04-16 2001-09-06 Semitool, Inc. METHOD AND DEVICE FOR TREATING A WORKPIECE LIKE A SEMICONDUCTOR WAXER
TWI250206B (en) * 2000-06-01 2006-03-01 Asahi Kasei Corp Cleaning agent, cleaning method and cleaning apparatus
EP1290720A1 (en) 2000-06-16 2003-03-12 Applied Materials, Inc. Configurable single substrate wet-dry integrated cluster cleaner
US6692579B2 (en) 2001-01-19 2004-02-17 Chartered Semiconductor Manufacturing Ltd. Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence
US6899111B2 (en) * 2001-06-15 2005-05-31 Applied Materials, Inc. Configurable single substrate wet-dry integrated cluster cleaner
US6398875B1 (en) 2001-06-27 2002-06-04 International Business Machines Corporation Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
US20040031167A1 (en) 2002-06-13 2004-02-19 Stein Nathan D. Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knife
CA2510922A1 (en) * 2002-12-17 2004-07-22 Gary Knopeck Compositions and methods for cleaning contaminated articles
US20070098646A1 (en) 2005-11-01 2007-05-03 Nappa Mario J Aerosol propellants comprising unsaturated fluorocarbons
EP3567092A1 (en) * 2005-11-01 2019-11-13 The Chemours Company FC, LLC Solvent compositions comprising unsaturated fluorinated hydrocarbons
EP1989285A2 (en) * 2006-02-28 2008-11-12 E.I. Du Pont De Nemours And Company Azeotropic compositions comprising fluorinated compounds for cleaning applications
CN102604145B (en) 2007-04-27 2015-02-18 纳幕尔杜邦公司 Azeotropic and azeotrope-like compositions of z-1,1,1,4,4,4-hexafluoro-2-butene
BR122018074407B1 (en) 2007-06-12 2019-03-19 E. I. Du Pont De Nemours And Company COMPOSITION AND PROCESS TO PRODUCE COOLING
US8632703B2 (en) 2007-09-06 2014-01-21 E I Du Pont De Nemours And Company Azeotropic and azeotrope-like compositions of E-1,1,1,4,4,5,5,5-octafluoro-2-pentene
MX2010005757A (en) 2007-11-29 2010-06-09 Du Pont Compositions and use of cis-1,1,1,4,4,4-hexafluoro-2-butene foam-forming composition in the preparation of polyisocyanate-based foams.
ES2553269T3 (en) 2007-12-19 2015-12-07 E. I. Du Pont De Nemours And Company Foam-forming compositions containing an azeotropic or azeotrope-like mixture containing cis-1,1,1,4,4,4-hexafluoro-2-butene and cyclopentane and their uses in the preparation of polyisocyanate-based foams
JP5238278B2 (en) * 2008-02-13 2013-07-17 光治郎 大川 Two-component cleaning device
JP5077031B2 (en) * 2008-04-10 2012-11-21 東ソー株式会社 Cleaning agent recovery method
US8821749B2 (en) 2010-04-26 2014-09-02 E I Du Pont De Nemours And Company Azeotrope-like compositions of E-1,1,1,4,4,4-hexafluoro-2-butene and 1-chloro-3,3,3-trifluoropropene
CN102709157B (en) * 2012-05-30 2014-07-09 常州佳讯光电产业发展有限公司 Diode cleaning process and cleaning equipment
US20140048103A1 (en) * 2012-08-20 2014-02-20 Kyle J. Doyel Method and apparatus for continuous separation of cleaning solvent from rinse fluid in a dual-solvent vapor degreasing system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB456821A (en) * 1935-05-16 1936-11-16 Norman Roy Hood Improvements in or relating to apparatus for degreasing by means of volatile solvents
CH485035A (en) * 1967-04-14 1970-01-31 Elga S A Pour La Galvanoplasti Cleaning device, in particular for workpieces
FR2229436B1 (en) * 1973-05-16 1976-05-28 Rhone Progil
US3923541A (en) * 1973-06-20 1975-12-02 Litton Systems Inc Vapor degreasing system
US4186032A (en) * 1976-09-23 1980-01-29 Rca Corp. Method for cleaning and drying semiconductors
US4414067A (en) * 1981-12-24 1983-11-08 Mccord James W Vapor condensate return means in a vapor generating and recovery apparatus
US4486239A (en) * 1983-04-22 1984-12-04 California Institute Of Technology Vapor degreasing system
JPS60108162A (en) * 1983-11-16 1985-06-13 Hitachi Ltd Vapor vessel
EP0194589B1 (en) * 1985-03-11 1989-11-15 AlliedSignal Inc. Apparatus and method for cleaning and drying surfaces of non-absorbent articles
JPS63229185A (en) * 1987-03-18 1988-09-26 三井・デユポンフロロケミカル株式会社 Washing method and washer

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2763270B2 (en) 1990-03-16 1998-06-11 株式会社東芝 Cleaning method, cleaning apparatus, cleaning composition and steam-dried composition
US5503681A (en) * 1990-03-16 1996-04-02 Kabushiki Kaisha Toshiba Method of cleaning an object
US5888312A (en) * 1990-03-16 1999-03-30 Toshiba Silicone Co., Ltd. Cleaning method
JPH07275812A (en) * 1990-03-16 1995-10-24 Toshiba Corp Cleaning method
US5833761A (en) * 1990-03-16 1998-11-10 Toshiba Silicone Co., Ltd. Method of cleaning an object including a cleaning step and a vapor drying step
US5538024A (en) * 1990-03-16 1996-07-23 Kabushiki Kaisha Toshiba Cleaning method and cleaning apparatus
US5772781A (en) * 1990-03-16 1998-06-30 Kabushiki Kaisha Toshiba Method for cleaning an object using an agent that includes a polyorganosiloxane or isoparaffin
US5769962A (en) * 1990-03-16 1998-06-23 Kabushiki Kaisha Toshiba Cleaning method
EP0454109A1 (en) * 1990-04-26 1991-10-30 Hoechst Aktiengesellschaft New azeotropic or azeotrope-like mixture of 2,2,2-trifluoroethyl-1,1,2,2-tetrafluoroethylether and ethanol, and its use
US5087383A (en) * 1990-04-26 1992-02-11 Hoechst Aktiengesellschaft Novel azeotropic or azeotrope-like mixture of 2,2,2-trifluoroethyl 1,1,2,2-tetrafluoroethyl ether and ethanol, and its use
US5089152A (en) * 1991-04-19 1992-02-18 Minnesota Mining And Manufacturing Company Water displacement composition
US5679175A (en) * 1991-06-14 1997-10-21 Petroferm Inc. Cleaning process including use of solvating and rinsing agents
US5716457A (en) * 1991-06-14 1998-02-10 Petroferm Inc. Cleaning with solvating and rinsing agents
US6355113B1 (en) 1991-12-02 2002-03-12 3M Innovative Properties Company Multiple solvent cleaning system
US6187729B1 (en) * 1993-12-14 2001-02-13 Petroferm Inc. Cleaning composition comprising solvating agent and rinsing agent
GB2346953A (en) * 1999-02-16 2000-08-23 Stephen Rodger Henly Removing water from articles

Also Published As

Publication number Publication date
GR3023937T3 (en) 1997-09-30
ATE152487T1 (en) 1997-05-15
DE68928010T2 (en) 1997-11-20
GB8915464D0 (en) 1989-08-23
EP0350316B1 (en) 1997-05-02
JP2768743B2 (en) 1998-06-25
EP0350316A1 (en) 1990-01-10
GB2220951B (en) 1992-09-16
DE68928010D1 (en) 1997-06-05
US5055138A (en) 1991-10-08
JPH02191581A (en) 1990-07-27
ES2103705T3 (en) 1997-10-01

Similar Documents

Publication Publication Date Title
US5055138A (en) Cleaning and drying of electronic assemblies
US5183067A (en) Cleaning and drying of electronic assemblies
JP2961924B2 (en) Solvent cleaning method for articles
EP0643780B1 (en) Multiple solvent cleaning system
US5679175A (en) Cleaning process including use of solvating and rinsing agents
TW201604325A (en) Solvent vapor phase degreasing and defluxing compositions, methods, devices and systems
KR20110116123A (en) Dewatering method
US6355113B1 (en) Multiple solvent cleaning system
KR20180021224A (en) An energy-efficient method for purifying and degreasing volatile compounds
KR101176392B1 (en) Method of dewatering and dewatering apparatus
AU693453B2 (en) Multiple solvent cleaning system
US6187729B1 (en) Cleaning composition comprising solvating agent and rinsing agent
USRE35975E (en) Cleaning and drying of electronic assemblies
US5733416A (en) Process for water displacement and component recycling
JPH01304194A (en) Azeotropic composition
US5114495A (en) Use of azeotropic compositions in vapor degreasing
JP4357014B2 (en) Drainer cleaning method and apparatus
RU2113921C1 (en) Cleaning liquid composition, variant thereof, and method of removing contaminations from substrate using cleaning composition
JP4322320B2 (en) Azeotropic composition, drained steam drying agent and drained steam drying method using the same
JP2011255353A (en) Draining/drying method and draining/drying system
TW201936998A (en) Fluorinated liquid regeneration method and regeneration apparatus using such method

Legal Events

Date Code Title Description
773K Patent revoked under sect. 73(2)/1977