FR2848335B1 - PROCESS FOR THE PREPARATION OF HIGH-CONDUCTIVITY N-TYPE DIAMOND DIAMOND - Google Patents
PROCESS FOR THE PREPARATION OF HIGH-CONDUCTIVITY N-TYPE DIAMOND DIAMONDInfo
- Publication number
- FR2848335B1 FR2848335B1 FR0215453A FR0215453A FR2848335B1 FR 2848335 B1 FR2848335 B1 FR 2848335B1 FR 0215453 A FR0215453 A FR 0215453A FR 0215453 A FR0215453 A FR 0215453A FR 2848335 B1 FR2848335 B1 FR 2848335B1
- Authority
- FR
- France
- Prior art keywords
- diamond
- conductivity
- preparation
- type
- type diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910003460 diamond Inorganic materials 0.000 title 2
- 239000010432 diamond Substances 0.000 title 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
- H01L21/2236—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase from or into a plasma phase
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0405—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0405—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
- H01L21/041—Making n- or p-doped regions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0215453A FR2848335B1 (en) | 2002-12-06 | 2002-12-06 | PROCESS FOR THE PREPARATION OF HIGH-CONDUCTIVITY N-TYPE DIAMOND DIAMOND |
JP2004558172A JP4823523B2 (en) | 2002-12-06 | 2003-12-04 | Method for producing n-type diamond having high electrical conductivity |
PCT/FR2003/003592 WO2004053960A1 (en) | 2002-12-06 | 2003-12-04 | Method of producing an n-type diamond with high electrical conductivity |
EP03796163A EP1568072A1 (en) | 2002-12-06 | 2003-12-04 | Method of producing an n-type diamond with high electrical conductivity |
AU2003298415A AU2003298415A1 (en) | 2002-12-06 | 2003-12-04 | Method of producing an n-type diamond with high electrical conductivity |
US11/144,279 US7368317B2 (en) | 2002-12-06 | 2005-06-03 | Method of producing an N-type diamond with high electrical conductivity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0215453A FR2848335B1 (en) | 2002-12-06 | 2002-12-06 | PROCESS FOR THE PREPARATION OF HIGH-CONDUCTIVITY N-TYPE DIAMOND DIAMOND |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2848335A1 FR2848335A1 (en) | 2004-06-11 |
FR2848335B1 true FR2848335B1 (en) | 2005-10-07 |
Family
ID=32320061
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0215453A Expired - Fee Related FR2848335B1 (en) | 2002-12-06 | 2002-12-06 | PROCESS FOR THE PREPARATION OF HIGH-CONDUCTIVITY N-TYPE DIAMOND DIAMOND |
Country Status (6)
Country | Link |
---|---|
US (1) | US7368317B2 (en) |
EP (1) | EP1568072A1 (en) |
JP (1) | JP4823523B2 (en) |
AU (1) | AU2003298415A1 (en) |
FR (1) | FR2848335B1 (en) |
WO (1) | WO2004053960A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CZ301547B6 (en) * | 2008-08-29 | 2010-04-14 | Fyzikální ústav AV CR, v.v.i. | Method of doping diamond by transfer of charge from organic dyestuffs |
US8111724B2 (en) * | 2009-07-07 | 2012-02-07 | International Business Machines Corporation | Temperature control device for optoelectronic devices |
SG179318A1 (en) * | 2010-09-27 | 2012-04-27 | Gemesis Company S Pte Ltd | Method for growing white color diamonds by using diborane and nitrogen in combination in a microwave plasma chemical vapor deposition system |
GB201021870D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021913D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | Microwave plasma reactors and substrates for synthetic diamond manufacture |
GB2486778B (en) | 2010-12-23 | 2013-10-23 | Element Six Ltd | Controlling doping of synthetic diamond material |
GB201021865D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021860D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for diamond synthesis |
GB201021853D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021855D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | Microwave power delivery system for plasma reactors |
US20130026492A1 (en) * | 2011-07-30 | 2013-01-31 | Akhan Technologies Inc. | Diamond Semiconductor System and Method |
US8933462B2 (en) | 2011-12-21 | 2015-01-13 | Akhan Semiconductor, Inc. | Method of fabricating diamond semiconductor and diamond semiconductor formed according to the method |
SG10201505413VA (en) | 2015-01-14 | 2016-08-30 | Iia Technologies Pte Ltd | Electronic device grade single crystal diamonds and method of producing the same |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0543392A3 (en) * | 1991-11-21 | 1993-10-20 | Canon Kk | Diamond semiconductor device and method of producing the same |
JPH05139889A (en) * | 1991-11-21 | 1993-06-08 | Canon Inc | Diamond crystal |
JP3165536B2 (en) * | 1992-11-12 | 2001-05-14 | 松下電器産業株式会社 | Method and apparatus for forming semiconductor diamond |
JP3334286B2 (en) * | 1993-09-30 | 2002-10-15 | ソニー株式会社 | Manufacturing method of diamond semiconductor |
JP3232470B2 (en) * | 1995-07-02 | 2001-11-26 | 科学技術振興事業団 | Synthesis method of single crystal diamond using hydrogenated amorphous carbon |
US5653800A (en) * | 1995-08-03 | 1997-08-05 | Eneco, Inc. | Method for producing N-type semiconducting diamond |
JP3893710B2 (en) | 1997-02-12 | 2007-03-14 | 東レ株式会社 | Method for forming oil thin film and method for producing vapor-deposited product using the thin film |
JPH10247624A (en) | 1997-03-05 | 1998-09-14 | Asahi Chem Ind Co Ltd | N-type single crystal diamond, manufacture thereof and manufacture of artificial diamond |
JP3568394B2 (en) * | 1998-07-07 | 2004-09-22 | 独立行政法人 科学技術振興機構 | Method for synthesizing low-resistance n-type diamond |
-
2002
- 2002-12-06 FR FR0215453A patent/FR2848335B1/en not_active Expired - Fee Related
-
2003
- 2003-12-04 AU AU2003298415A patent/AU2003298415A1/en not_active Abandoned
- 2003-12-04 EP EP03796163A patent/EP1568072A1/en not_active Withdrawn
- 2003-12-04 WO PCT/FR2003/003592 patent/WO2004053960A1/en active Application Filing
- 2003-12-04 JP JP2004558172A patent/JP4823523B2/en not_active Expired - Fee Related
-
2005
- 2005-06-03 US US11/144,279 patent/US7368317B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU2003298415A8 (en) | 2004-06-30 |
US20050266606A1 (en) | 2005-12-01 |
JP4823523B2 (en) | 2011-11-24 |
EP1568072A1 (en) | 2005-08-31 |
FR2848335A1 (en) | 2004-06-11 |
US7368317B2 (en) | 2008-05-06 |
JP2006508887A (en) | 2006-03-16 |
WO2004053960A1 (en) | 2004-06-24 |
AU2003298415A1 (en) | 2004-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TQ | Partial transmission of property | ||
ST | Notification of lapse |
Effective date: 20140829 |