FR2232613A1 - Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates - Google Patents

Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates

Info

Publication number
FR2232613A1
FR2232613A1 FR7320724A FR7320724A FR2232613A1 FR 2232613 A1 FR2232613 A1 FR 2232613A1 FR 7320724 A FR7320724 A FR 7320724A FR 7320724 A FR7320724 A FR 7320724A FR 2232613 A1 FR2232613 A1 FR 2232613A1
Authority
FR
France
Prior art keywords
obtd
carbon
vapour phase
deposition
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7320724A
Other languages
French (fr)
Other versions
FR2232613B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societe Nationale des Poudres et Explosifs
Original Assignee
Societe Nationale des Poudres et Explosifs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Societe Nationale des Poudres et Explosifs filed Critical Societe Nationale des Poudres et Explosifs
Priority to FR7320724A priority Critical patent/FR2232613A1/en
Publication of FR2232613A1 publication Critical patent/FR2232613A1/en
Application granted granted Critical
Publication of FR2232613B1 publication Critical patent/FR2232613B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/28—Deposition of only one other non-metal element
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

A process where a solid deposit is obtd. on a substrate by decompsn. or redn. in the gaseous or vapour phase, the novelty being that the energy for the reaction is provided by a carbon dioxide laser which emits a wavelength which is absorbed by the single gaseous phase. When the substrate is a conductor, an electric field is pref. applied between the substrate and the walls of the reactor. Pref. substrates are filaments or fibres of SiO2, carbon or tungsten wire, while pref. coatings are (a) B obtd. from redn. of BCl3 in H2; (b) boron carbide obtd. from BCl3, a hydrocarbon and H2, (c) BN obtd. from BCl3 and NH3. The process is suitable for coating parts subjected to violent mechanical stress.
FR7320724A 1973-06-07 1973-06-07 Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates Granted FR2232613A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7320724A FR2232613A1 (en) 1973-06-07 1973-06-07 Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7320724A FR2232613A1 (en) 1973-06-07 1973-06-07 Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates

Publications (2)

Publication Number Publication Date
FR2232613A1 true FR2232613A1 (en) 1975-01-03
FR2232613B1 FR2232613B1 (en) 1976-04-23

Family

ID=9120641

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7320724A Granted FR2232613A1 (en) 1973-06-07 1973-06-07 Deposition from vapour phase using laser heating - boron cpds. obtd. on silica, carbon or tungsten substrates

Country Status (1)

Country Link
FR (1) FR2232613A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3013679A1 (en) * 1979-05-07 1980-11-13 Perkin Elmer Corp METHOD AND DEVICE FOR CHEMICAL TREATING WORKPIECES
WO1981001529A1 (en) * 1979-11-30 1981-06-11 Brasilia Telecom Chemical vapour deposition process with lazer heating
FR2519351A1 (en) * 1982-01-04 1983-07-08 Hochvakuum Dresden Veb Vacuum deposition of hard layers - is carried out using beam activation
FR2548218A1 (en) * 1983-06-29 1985-01-04 Pauleau Yves Process for deposition of thin layers by gas phase chemical reaction employing two different radiations
EP0211948A1 (en) * 1985-02-12 1987-03-04 The Dow Chemical Company Process for the preparation of submicron-sized boron carbide powders
EP0318506A1 (en) * 1986-08-18 1989-06-07 E.I. Du Pont De Nemours And Company Laser assisted fiber growth

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1401821A (en) * 1963-07-18 1965-06-04 Plessey Uk Ltd Semiconductor device manufacturing process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1401821A (en) * 1963-07-18 1965-06-04 Plessey Uk Ltd Semiconductor device manufacturing process

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3013679A1 (en) * 1979-05-07 1980-11-13 Perkin Elmer Corp METHOD AND DEVICE FOR CHEMICAL TREATING WORKPIECES
FR2456145A1 (en) * 1979-05-07 1980-12-05 Perkin Elmer Corp METHOD AND APPARATUS FOR CHEMICALLY TREATING PARTS WITH A GASEOUS PHASE PRODUCED BY DISSOCIATION BY MEANS OF A LASER
WO1981001529A1 (en) * 1979-11-30 1981-06-11 Brasilia Telecom Chemical vapour deposition process with lazer heating
FR2519351A1 (en) * 1982-01-04 1983-07-08 Hochvakuum Dresden Veb Vacuum deposition of hard layers - is carried out using beam activation
FR2548218A1 (en) * 1983-06-29 1985-01-04 Pauleau Yves Process for deposition of thin layers by gas phase chemical reaction employing two different radiations
EP0211948A1 (en) * 1985-02-12 1987-03-04 The Dow Chemical Company Process for the preparation of submicron-sized boron carbide powders
EP0211948A4 (en) * 1985-02-12 1988-01-21 Dow Chemical Co Process for the preparation of submicron-sized boron carbide powders.
EP0318506A1 (en) * 1986-08-18 1989-06-07 E.I. Du Pont De Nemours And Company Laser assisted fiber growth
EP0318506A4 (en) * 1986-08-18 1992-02-26 Ceramic Research, Inc. Laser assisted fiber growth

Also Published As

Publication number Publication date
FR2232613B1 (en) 1976-04-23

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