DE69630554D1 - Mikrobearbeitungsgerät und -verfahren - Google Patents

Mikrobearbeitungsgerät und -verfahren

Info

Publication number: DE69630554D1
Authority: DE; Germany
Prior art keywords: micromachining device; micromachining
Prior art date: 1995-03-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69630554T

Other languages

English (en)

Other versions

DE69630554T2 (de

Inventor

Masahiro Hatakeyama

Katsunori Ichiki

Takao Kato

Masaaki Kajiyama

Takashi Tsuzuki

Yotaro Hatamura

Masayuki Nakao

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Ebara Corp

Original Assignee

Ebara Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1995-03-30

Filing date

1996-03-29

Publication date

2003-12-11

1995-03-30 Priority claimed from JP09793395A external-priority patent/JP3346672B2/ja

1995-03-30 Priority claimed from JP7097932A external-priority patent/JPH08267257A/ja

1996-02-08 Priority claimed from JP04663296A external-priority patent/JP3343188B2/ja

1996-03-29 Application filed by Ebara Corp filed Critical Ebara Corp

2003-12-11 Application granted granted Critical

2003-12-11 Publication of DE69630554D1 publication Critical patent/DE69630554D1/de

2004-09-23 Publication of DE69630554T2 publication Critical patent/DE69630554T2/de

2016-03-30 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000000034 method Methods 0.000 title 1
238000005459 micromachining Methods 0.000 title 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3005—Observing the objects or the point of impact on the object
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Welding Or Cutting Using Electron Beams (AREA)
Machine Tool Sensing Apparatuses (AREA)

DE69630554T 1995-03-30 1996-03-29 Mikrobearbeitungsgerät und -verfahren Expired - Fee Related DE69630554T2 (de)

Applications Claiming Priority (8)

Application Number	Priority Date	Filing Date	Title
JP9793395		1995-03-30
JP9793295		1995-03-30
JP9793495		1995-03-30
JP09793395A JP3346672B2 (ja)	1995-03-30	1995-03-30	エネルギービームによる加工装置
JP9793495		1995-03-30
JP7097932A JPH08267257A (ja)	1995-03-30	1995-03-30	微細被加工物の作業装置及び作業方法
JP04663296A JP3343188B2 (ja)	1995-03-30	1996-02-08	微小部品用パレット及びそれを用いた作業装置
JP4663296		1996-02-08

Publications (2)

Publication Number	Publication Date
DE69630554D1 true DE69630554D1 (de)	2003-12-11
DE69630554T2 DE69630554T2 (de)	2004-09-23

Family

ID=27461904

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69630554T Expired - Fee Related DE69630554T2 (de)	1995-03-30	1996-03-29	Mikrobearbeitungsgerät und -verfahren

Country Status (3)

Country	Link
US (1)	US5852298A (de)
EP (1)	EP0735564B1 (de)
DE (1)	DE69630554T2 (de)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0731490A3 (de) *	1995-03-02	1998-03-11	Ebara Corporation	Ultrafeines Mikroherstellungsverfahren unter Verwendung eines Energiebündel
US5905266A (en) *	1996-12-19	1999-05-18	Schlumberger Technologies, Inc.	Charged particle beam system with optical microscope
US6828566B2 (en) *	1997-07-22	2004-12-07	Hitachi Ltd	Method and apparatus for specimen fabrication
EP0927880A4 (de) *	1997-07-22	2010-11-17	Hitachi Ltd	Vorrichtung und verfahren zur probenvorbereitung
AU1691899A (en) *	1997-12-26	1999-07-19	Nikon Corporation	Exposure apparatus, method of producing the apparatus, and exposure method, and device and method of manufacturing the device
US6473553B1 (en)	1998-04-17	2002-10-29	Seagate Technology Llc	Apparatus for holding and engaging micro-machined objects and method for making same
US6049650A (en) *	1998-04-17	2000-04-11	Seagate Technology, Inc.	Structure for micro-machine optical tooling and method for making and using
JP2001015056A (ja) *	1999-04-28	2001-01-19	Canon Inc	試料ホルダーおよび該試料ホルダーに用いるスペーサー
JP2001088100A (ja) *	1999-09-24	2001-04-03	Japan Science & Technology Corp	マイクロマニピュレーション方法
RU2164718C1 (ru) *	2000-07-04	2001-03-27	Общество с ограниченной ответственностью "Агентство маркетинга научных разработок"	Установка для формирования наноструктур на поверхности полупроводниковых пластин ионными пучками
JP4178741B2 (ja) *	2000-11-02	2008-11-12	株式会社日立製作所	荷電粒子線装置および試料作製装置
DE60144508D1 (de) *	2000-11-06	2011-06-09	Hitachi Ltd	Verfahren zur Herstellung von Proben
US20040257561A1 (en) *	2000-11-24	2004-12-23	Takao Nakagawa	Apparatus and method for sampling
US6630668B1 (en) *	2001-10-04	2003-10-07	The United States Of America As Represented By The United States Department Of Energy	Remote control of a scanning electron microscope aperture and gun alignment
DE102004010535B4 (de) *	2003-11-10	2006-04-27	Jaroslav Jan Hatle	Bewegungsantrieb für eine Ionenstrahlbearbeitungsanlage
DE10352842B4 (de) *	2003-11-10	2006-03-09	Jaroslav Jan Hatle	Bewegungsantrieb für eine Ionenstrahlbearbeitungsanlage
US7164128B2 (en) *	2003-11-25	2007-01-16	Hitachi High-Technologies Corporation	Method and apparatus for observing a specimen
JP2005310757A (ja) *	2004-03-23	2005-11-04	Sii Nanotechnology Inc	微細３次元構造物作製装置及び方法
JP2006059701A (ja) *	2004-08-20	2006-03-02	Sii Nanotechnology Inc	荷電粒子ビーム装置およびそれを用いた狭ギャップ電極形成方法
DE102005039483A1 (de) *	2005-08-18	2007-02-22	Carl Zeiss Smt Ag	Vorrichtung und Verfahren zur Bearbeitung eines optischen Elements mit einer Teilchenstrahlquelle
JP4700692B2 (ja) *	2005-09-05	2011-06-15	パイオニア株式会社	被エッチング材の製造方法
US7301157B2 (en) *	2005-09-28	2007-11-27	Fei Company	Cluster tool for microscopic processing of samples
EP1780764A1 (de) *	2005-11-01	2007-05-02	FEI Company	Bühnenanordnung, teilchenoptische Vorrichtung mit einer derartigen Anordnung und Verfahren zur Behandlung einer Probe in einer derartigen Vorrichtung
JP4685627B2 (ja) *	2005-12-28	2011-05-18	株式会社日立ハイテクノロジーズ	試料加工方法
JP4789260B2 (ja) *	2006-08-23	2011-10-12	エスアイアイ・ナノテクノロジー株式会社	荷電粒子ビーム装置及びアパーチャの軸調整方法
US7834315B2 (en) *	2007-04-23	2010-11-16	Omniprobe, Inc.	Method for STEM sample inspection in a charged particle beam instrument
DE102007048559B4 (de) *	2007-10-09	2009-10-01	Ntg Neue Technologien Gmbh & Co Kg	Vorrichtung zur Strahlbearbeitung von Werkstücken, Ionenstrahlbearbeitungsanlage
USRE43925E1 (en) *	2008-11-21	2013-01-15	Industrial Technology Research Institute	Three dimensional profile inspecting apparatus
TWI387721B (zh) *	2008-11-21	2013-03-01	Ind Tech Res Inst	三維形貌檢測裝置
TWI392864B (zh) *	2009-04-03	2013-04-11	Ind Tech Res Inst	光學檢測裝置
WO2011013311A1 (ja) *	2009-07-30	2011-02-03	株式会社日立ハイテクノロジーズ	イオンミリング装置
SG177823A1 (en) *	2010-07-06	2012-02-28	Camtek Ltd	Method and system for preparing a lamella
SG177822A1 (en) *	2010-07-06	2012-02-28	Camtek Ltd	Method and system for preparing a sample
WO2014133530A1 (en) *	2013-02-28	2014-09-04	Freitas Robert A Jr	Mechanosynthesis trajectories
CN103341750B (zh) *	2013-07-12	2015-11-18	中国科学院自动化研究所	一种用于柔性微零件的装配系统与方法
WO2015130913A1 (en)	2014-02-26	2015-09-03	Brigham And Women's Hospital, Inc.	System and method for cell levitation and monitoring
DE102014009269B4 (de) *	2014-06-25	2017-06-08	Thyssenkrupp Ag	Vorrichtung zur räumlichen Ausrichtung eines berührungslosen Messkopfes
CN105225910B (zh) *	2015-09-25	2017-11-28	苏州大学	基于扫描电子显微镜的微操作系统
US10242842B2 (en) *	2016-03-25	2019-03-26	Hitachi High-Tech Science Corporation	Method for cross-section processing and observation and apparatus therefor
WO2018089578A1 (en) *	2016-11-10	2018-05-17	President And Fellows Of Harvard College	Gridtape imaging stage
CN107363492B (zh) *	2017-06-26	2019-07-05	江苏密斯欧智能科技有限公司	一种自动装配线上提高装配精度的方法
EP3432338B1 (de)	2017-07-20	2019-10-23	FEI Company	Probenherstellung und untersuchung in einem doppelstrahlladungsträgerteilchenmikroskop
CZ309656B6 (cs) *	2018-10-10	2023-06-21	Tescan Brno, S.R.O.	Zařízení s alespoň jedním polohovatelným držákem vzorků a způsob změny úhlu náklonu držáku a způsob přípravy lamely
CN113547468B (zh) *	2021-07-29	2023-01-06	中国科学院长春光学精密机械与物理研究所	预倾斜样品夹具及样品加工方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5818850A (ja) *	1981-07-24	1983-02-03	Hitachi Ltd	試料移動装置
US4843563A (en) *	1985-03-25	1989-06-27	Canon Kabushiki Kaisha	Step-and-repeat alignment and exposure method and apparatus
US4639301B2 (en) *	1985-04-24	1999-05-04	Micrion Corp	Focused ion beam processing
JPS61287229A (ja) *	1985-06-14	1986-12-17	Nippon Kogaku Kk <Nikon>	露光装置、及び該露光装置を用いた回路パターン製造方法
US4663511A (en) *	1986-05-02	1987-05-05	The United States Of America As Represented By The United States Department Of Energy	Stereoscopic optical viewing system
JP2653056B2 (ja) *	1987-07-28	1997-09-10	日新電機株式会社	表面解析装置
DE3802598C1 (de) *	1988-01-29	1989-04-13	Karl Heinz 3057 Neustadt De Stellmann
JP2523177B2 (ja) *	1989-04-28	1996-08-07	日本写真印刷株式会社	位置決めテ―ブル
JP2909828B2 (ja) *	1989-07-05	1999-06-23	セイコーインスツルメンツ株式会社	複合走査型トンネル顕微鏡
US5229607A (en) *	1990-04-19	1993-07-20	Hitachi, Ltd.	Combination apparatus having a scanning electron microscope therein
JP2965739B2 (ja) *	1991-03-28	1999-10-18	大日本印刷株式会社	集束イオンビーム装置
JP2774884B2 (ja) *	1991-08-22	1998-07-09	株式会社日立製作所	試料の分離方法及びこの分離方法で得た分離試料の分析方法
JPH07122468A (ja) *	1993-10-28	1995-05-12	Mitsubishi Electric Corp	電子ビーム描画装置およびその装置を用いた描画方法

1996
- 1996-03-26 US US08/621,990 patent/US5852298A/en not_active Expired - Fee Related
- 1996-03-29 DE DE69630554T patent/DE69630554T2/de not_active Expired - Fee Related
- 1996-03-29 EP EP96105077A patent/EP0735564B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
US5852298A (en)	1998-12-22
DE69630554T2 (de)	2004-09-23
EP0735564B1 (de)	2003-11-05
EP0735564A2 (de)	1996-10-02
EP0735564A3 (de)	1998-01-14

Legal Events

Date	Code	Title	Description
2004-12-02	8364	No opposition during term of opposition
2008-01-17	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE69630554D1 (de)	2003-12-11	Mikrobearbeitungsgerät und -verfahren
DE69527353D1 (de)	2002-08-14	Beschichtungsverfahren und -vorrichtung
DE69632555D1 (de)	2004-07-01	Aufzeichnungsgerät und -verfahren
DE69628956D1 (de)	2003-08-07	Abtastvorrichtung und -verfahren
DE69523670D1 (de)	2001-12-13	Anzeigeverfahren und -gerät
BR9608138A (pt)	1999-02-09	Dispositivo e método de filtragem de ar
DK0910065T3 (da)	2003-10-27	Talehastighedsændringsfremgangsmåde og -anordning
DE69631928D1 (de)	2004-04-29	Bilderzeugungsgerät und -verfahren
DE69612942D1 (de)	2001-06-28	Haltegerät und dessen Installationsmethode
FI973378A0 (fi)	1997-08-18	Laite ja menetelmä
EE9700318A (et)	1998-06-15	Optiline seade ja meetod
DE69622999D1 (de)	2002-09-19	Pultrusionsvorrichtung und verfahren
DE69624873D1 (de)	2003-01-02	Bilderzeugungsgerät und -verfahren
FI954309A (fi)	1997-03-15	Poralaite ja porausmenetelmä
DE69614654D1 (de)	2001-09-27	Verschlüsselungsgerät und -verfahren
KR960013620A (ko)	1996-05-22	성형 방법 및 성형 장치
DE69527170D1 (de)	2002-08-01	Navigationsvorrichtung und -verfahren
DE69618636D1 (de)	2002-02-28	Druckverfahren und -vorrichtung
DE19681593T1 (de)	1998-10-08	Gravierverfahren und -vorrichtung
DE69628873D1 (de)	2003-08-07	Ausrichtgerät und -verfahren
DE69535201D1 (de)	2006-10-12	Positionsbestimmungsgerät und -verfahren
DE69518183D1 (de)	2000-09-07	Beschichtungsvorrichtung und -verfahren
FI962103A0 (fi)	1996-05-17	Höyrystyslaite ja menetelmä
DE69630906D1 (de)	2004-01-08	Druckvorrichtung und Verfahren
DE69602808D1 (de)	1999-07-15	Ziehverfahren und Ziehvorrichtung