DE68924132D1 - Halbleiterbauteil und Verfahren zur dessen Herstellung. - Google Patents

Halbleiterbauteil und Verfahren zur dessen Herstellung.

Info

Publication number
DE68924132D1
DE68924132D1 DE68924132T DE68924132T DE68924132D1 DE 68924132 D1 DE68924132 D1 DE 68924132D1 DE 68924132 T DE68924132 T DE 68924132T DE 68924132 T DE68924132 T DE 68924132T DE 68924132 D1 DE68924132 D1 DE 68924132D1
Authority
DE
Germany
Prior art keywords
production
semiconductor component
semiconductor
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68924132T
Other languages
English (en)
Other versions
DE68924132T2 (de
Inventor
Haruyoshi Suehiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE68924132D1 publication Critical patent/DE68924132D1/de
Application granted granted Critical
Publication of DE68924132T2 publication Critical patent/DE68924132T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66446—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
    • H01L29/66462—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H01L21/30612—Etching of AIIIBV compounds
    • H01L21/30621—Vapour phase etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/8252—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using III-V technology
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/095—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being Schottky barrier gate field-effect transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
    • H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/812—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Junction Field-Effect Transistors (AREA)
DE68924132T 1988-11-29 1989-11-22 Halbleiterbauteil und Verfahren zur dessen Herstellung. Expired - Fee Related DE68924132T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63299559A JPH02148740A (ja) 1988-11-29 1988-11-29 半導体装置及びその製造方法

Publications (2)

Publication Number Publication Date
DE68924132D1 true DE68924132D1 (de) 1995-10-12
DE68924132T2 DE68924132T2 (de) 1996-02-01

Family

ID=17874193

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68924132T Expired - Fee Related DE68924132T2 (de) 1988-11-29 1989-11-22 Halbleiterbauteil und Verfahren zur dessen Herstellung.

Country Status (5)

Country Link
US (1) US5021857A (de)
EP (1) EP0371686B1 (de)
JP (1) JPH02148740A (de)
KR (1) KR920010674B1 (de)
DE (1) DE68924132T2 (de)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
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JPH03292744A (ja) * 1990-01-24 1991-12-24 Toshiba Corp 化合物半導体装置およびその製造方法
JP2513887B2 (ja) * 1990-02-14 1996-07-03 株式会社東芝 半導体集積回路装置
JPH0414314A (ja) * 1990-05-08 1992-01-20 Toshiba Corp ソース電極結合形論理回路
JPH0444328A (ja) * 1990-06-11 1992-02-14 Mitsubishi Electric Corp 半導体装置及びその製造方法
JPH04260338A (ja) * 1991-02-14 1992-09-16 Mitsubishi Electric Corp 半導体装置の製造方法
KR100356883B1 (ko) * 1991-06-12 2003-01-08 텍사스 인스트루먼츠 인코포레이티드 프리차지트리거링방법,프리차지트리거드디지탈디바이스,프리차지트리거드펑션스테이지,및동기식파이프라인시스템
US5352909A (en) * 1991-12-19 1994-10-04 Nec Corporation Field effect transistor and method for manufacturing the same
US5508535A (en) * 1992-01-09 1996-04-16 Mitsubishi Denki Kabushiki Kaisha Compound semiconductor devices
US5192698A (en) * 1992-03-17 1993-03-09 The United State Of America As Represented By The Secretary Of The Air Force Making staggered complementary heterostructure FET
FR2690276A1 (fr) * 1992-04-15 1993-10-22 Picogiga Sa Circuit intégré à transistors complémentaires à effet de champ à hétérojonction.
JP3286920B2 (ja) * 1992-07-10 2002-05-27 富士通株式会社 半導体装置の製造方法
US5254492A (en) * 1992-11-10 1993-10-19 Texas Instruments Incorporated Method of fabricating an integrated circuit for providing low-noise and high-power microwave operation
US5552330A (en) * 1994-03-11 1996-09-03 Motorola Resonant tunneling fet and methods of fabrication
US5514605A (en) * 1994-08-24 1996-05-07 Nec Corporation Fabrication process for compound semiconductor device
US5739557A (en) * 1995-02-06 1998-04-14 Motorola, Inc. Refractory gate heterostructure field effect transistor
JPH09321063A (ja) * 1996-05-31 1997-12-12 Nec Corp 半導体装置およびその製造方法
US5698900A (en) * 1996-07-22 1997-12-16 The United States Of America As Represented By The Secretary Of The Air Force Field effect transistor device with single layer integrated metal and retained semiconductor masking
JP2891204B2 (ja) * 1996-09-27 1999-05-17 日本電気株式会社 半導体装置の製造方法
JP3147009B2 (ja) 1996-10-30 2001-03-19 日本電気株式会社 電界効果トランジスタ及びその製造方法
US6054355A (en) * 1997-06-30 2000-04-25 Kabushiki Kaisha Toshiba Method of manufacturing a semiconductor device which includes forming a dummy gate
US6242293B1 (en) * 1998-06-30 2001-06-05 The Whitaker Corporation Process for fabricating double recess pseudomorphic high electron mobility transistor structures
US6060402A (en) * 1998-07-23 2000-05-09 The Whitaker Corporation Process for selective recess etching of epitaxial field effect transistors with a novel etch-stop layer
US6307221B1 (en) 1998-11-18 2001-10-23 The Whitaker Corporation InxGa1-xP etch stop layer for double recess pseudomorphic high electron mobility transistor structures
US6703638B2 (en) * 2001-05-21 2004-03-09 Tyco Electronics Corporation Enhancement and depletion-mode phemt device having two ingap etch-stop layers
EP1421626A2 (de) * 2001-08-07 2004-05-26 Jan Kuzmik Bauelemente mit hoher elektronenbeweglichkeit
JP4009106B2 (ja) * 2001-12-27 2007-11-14 浜松ホトニクス株式会社 半導体受光素子、及びその製造方法
US6838325B2 (en) * 2002-10-24 2005-01-04 Raytheon Company Method of forming a self-aligned, selectively etched, double recess high electron mobility transistor
JP2004356570A (ja) 2003-05-30 2004-12-16 Sony Corp 電界効果型トランジスタ及び同電界効果型トランジスタを搭載した半導体装置
JP4109159B2 (ja) * 2003-06-13 2008-07-02 浜松ホトニクス株式会社 半導体受光素子
JP4230370B2 (ja) * 2004-01-16 2009-02-25 ユーディナデバイス株式会社 半導体装置及びその製造方法
US7183592B2 (en) * 2004-05-26 2007-02-27 Raytheon Company Field effect transistor
JP4284254B2 (ja) * 2004-09-07 2009-06-24 富士通株式会社 電界効果型半導体装置
EP1821578A3 (de) * 2006-02-21 2010-07-07 Semiconductor Energy Laboratory Co., Ltd. Lichtemittierende Vorrichtung
KR100849923B1 (ko) * 2006-12-06 2008-08-04 한국전자통신연구원 화합물 반도체소자의 제작방법
KR100894810B1 (ko) 2007-09-19 2009-04-24 전자부품연구원 고전자 이동도 트랜지스터 및 그 제조방법
JP2009224605A (ja) * 2008-03-17 2009-10-01 Panasonic Corp 半導体装置およびその製造方法
US7755107B2 (en) * 2008-09-24 2010-07-13 Skyworks Solutions, Inc. Bipolar/dual FET structure including enhancement and depletion mode FETs with isolated channels
KR101243836B1 (ko) * 2009-09-04 2013-03-20 한국전자통신연구원 반도체 소자 및 그 형성 방법
ITTO20120675A1 (it) 2011-08-01 2013-02-02 Selex Sistemi Integrati Spa Dispositivo phemt ad arricchimento/svuotamento e relativo metodo di fabbricazione
EP2768027B1 (de) 2013-02-15 2019-10-30 AZUR SPACE Solar Power GmbH Schichtstruktur für einen selbstsperrenden Gruppe-III-Nitridtransistor
US20150372096A1 (en) * 2014-06-20 2015-12-24 Ishiang Shih High Electron Mobility Transistors and Integrated Circuits with Improved Feature Uniformity and Reduced defects for Microwave and Millimetre Wave Applications
ITUB20155536A1 (it) * 2015-11-12 2017-05-12 St Microelectronics Srl Transistore hemt di tipo normalmente spento includente una trincea contenente una regione di gate e formante almeno un gradino, e relativo procedimento di fabbricazione
US9722065B1 (en) * 2016-02-03 2017-08-01 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor device
US11309412B1 (en) * 2017-05-17 2022-04-19 Northrop Grumman Systems Corporation Shifting the pinch-off voltage of an InP high electron mobility transistor with a metal ring
US10811407B2 (en) * 2019-02-04 2020-10-20 Win Semiconductor Corp. Monolithic integration of enhancement mode and depletion mode field effect transistors
KR102571200B1 (ko) * 2021-03-24 2023-08-28 한국수력원자력 주식회사 펌프 및 밸브의 비정상 운전에 대한 영향 평가 방법

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Publication number Priority date Publication date Assignee Title
JPS59168677A (ja) * 1983-03-14 1984-09-22 Fujitsu Ltd 半導体装置及びその製造方法
EP0143656B1 (de) * 1983-11-29 1989-02-22 Fujitsu Limited Halbleiteranordnung mit Verbindungshalbleiter und Verfahren zu dessen Herstellung
FR2558647B1 (fr) * 1984-01-23 1986-05-09 Labo Electronique Physique Transistor a effet de champ de type schottky pour applications hyperfrequences et procede de realisation permettant d'obtenir un tel transistor
JPS60231368A (ja) * 1984-05-01 1985-11-16 Fujitsu Ltd 半導体装置の製造方法
US4615102A (en) * 1984-05-01 1986-10-07 Fujitsu Limited Method of producing enhancement mode and depletion mode FETs
DE3706274A1 (de) * 1986-02-28 1987-09-03 Hitachi Ltd Halbleiterelement und verfahren zu dessen herstellung
JPS62202564A (ja) * 1986-03-03 1987-09-07 Agency Of Ind Science & Technol ヘテロ接合電界効果トランジスタ

Also Published As

Publication number Publication date
KR900008663A (ko) 1990-06-04
EP0371686A1 (de) 1990-06-06
US5021857A (en) 1991-06-04
JPH02148740A (ja) 1990-06-07
EP0371686B1 (de) 1995-09-06
DE68924132T2 (de) 1996-02-01
KR920010674B1 (ko) 1992-12-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee