CN207779344U - A kind of modular construction for improving super thin metal measured thin film sensitivity - Google Patents

A kind of modular construction for improving super thin metal measured thin film sensitivity Download PDF

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Publication number
CN207779344U
CN207779344U CN201820017141.8U CN201820017141U CN207779344U CN 207779344 U CN207779344 U CN 207779344U CN 201820017141 U CN201820017141 U CN 201820017141U CN 207779344 U CN207779344 U CN 207779344U
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China
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prism
thin metal
film
modular construction
super thin
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CN201820017141.8U
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Chinese (zh)
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孟彦龙
檀珺
金尚忠
金国君
王玲莉
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China Jiliang University
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China Jiliang University
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Abstract

The utility model proposes a kind of modular constructions for improving super thin metal measured thin film sensitivity.The prism that the component is made of high-index material, and it is deposited on the low refractive index dielectric film composition of prism surfaces.Dielectric film face and super thin metal film contacts can will be coated with when test in the component, other two face of prism is end face and the outgoing end face of light incidence, when prism apex angle and elliptical polarization angle of light meet certain condition, incident light in prism can be totally reflected on the end face for be coated with dielectric film, to form evanescent wave in certain thickness dielectric film, when wave vector meets surface plasma shooting condition, evanescent wave can excite the plasma of metal surface, improve sensitivity of the elliptically polarized light reflected light to phase change, the final measurement sensitivity improved when testing super thin metal thickness.The modular construction is simple and convenient for being applied in traditional ellipsometer test system, avoiding traditional Otto structured testings needs constantly mobile prism to find the deficiency of suitable void layer, be advantageous to quickly to measure super thin metal film and metallic film atomic level thickness change.

Description

A kind of modular construction for improving super thin metal measured thin film sensitivity
Technical field
It is especially a kind of to super thin metal film the utility model is related to a kind of super thin metal measured thin film modular construction The measurement structure of thickness change sensitivity.
Background technology
Measuring the optical constant of film and the method for thickness at present has very much, and non-optical method mainly has probe measurement, profit The variation of film surface is perceived in film surface movement with a high-precision Mechanical stylus, what step instrument used is exactly probe Mensuration, but sonde method can only measure the thickness of film.It need to expose film substrate when measuring film thickness with sonde method, it be to thin Film carries out secondary operation, and probe has film when film surface moves certain damage.
Film Optics parameter and the method for thickness can be measured in optical means simultaneously mainly spectroscopic methodology and elliptical polarization Method.The principle of spectroscopic methodology is that the reflection of film glazing causes the interference effect of dual-beam or multiple beam, the film of different characteristics to have Different spectral reflectivities, the Calculation of Spectral by measuring film obtains the thickness and optical constant of film.It is oval inclined The basic principle for method of shaking is had an effect with film using the polarised light of a branch of known polarization state, and the polarization of its reflected light is measured State, the mutation analysis for comparing light polarization obtain the optical property and thickness of film.The advantages of ellipsometry is the inclined of reflected light The variation for state of shaking is very sensitive to the thickness change of film therefore has very high measurement sensitivity and precision.Film thickness is got over Greatly, measuring accuracy is higher.When film thickness is smaller, and the refractive index of film is close with substrate refractive index, measured with ellipsometer The thickness and optical constant of film differ larger with practical, have larger deviation, therefore, ellipsometry measures super thin metal film Precision is inadequate.
For this purpose, it is proposed that a kind of super thin metal measured thin film component based on metal surface plasma oscillation body, leads to It crosses the component and measures the sensitivity that super thin metal thin layer can improve the measurement accuracy of film and atomic-level thickness changes.Metal In there are a large amount of free electrons, these free electrons can be moved in a metal by the effect of electric field force.Metal or semiconductor Surface electronic behavior is similar to free electron gas, and the surface phasmon on surface is excited by borderline extraneous electric fields generates table The collective oscillation of surface charge, i.e. surface phasmon vibrate.This oscillation is equivalent to a kind of wave propagated at interface, so also referred to as For surface plasma wave.Surface plasma wave cannot with plane electromagnetic wave direct-coupling, and when light wave from optically denser medium to Fast subwave is generated when optically thinner medium is totally reflected to couple with surface plasmon wave resonance.
Traditional Otto constructional devices press prism, and air, the sequence of metal, light enters air from prism, when incidence angle is big Total reflection occurs when the cirtical angle of total reflection and generates fast subwave and metal surface plasma bulk wave resonance coupling.Based on Otto structures The surface plasma resonance optical spectrum ellipsometer of device can be used for measuring the optical constant and thickness of ultrathin membrane.By change into Optical wavelength is penetrated, the thickness of the air gap obtains the angle of polarization of the reflected light caused by super thin metal film surface plasma resonance The change curve of (ψ) and phase shift (Δ), are fitted the change curve of ψ and Δ, and thickness and the optics for obtaining super thin metal film are normal Number.
Isosceles prism, dielectric film, super thin metal film can be regarded as multiple-level stack on the glass substrate.It is incident Material is isosceles prism, and outgoing material is substrate of glass.Then there is every layer of eigenmatrix calculating as follows:
(1) every layer of eigenmatrix is under TE waves (S polarization):
Ma=
(2) in TEM waves(P polarizes)Under every layer of eigenmatrix be:
Ma=
Wherein, n, z,,Respectively wave number, refractive index, thickness dielectric constant, between magnetic conductivity and light and layer Incidence angle, overlapping layer eigenmatrix are calculated as with standard type:
M=……=, small tenon 123 ... ..a indicates sequence number from top to bottom,
The reflectivity of TE waves is:=,
The reflectivity of TEM waves is:=,
WhereinWithThe respectively dielectric constant and magnetic conductivity of incident material and outgoing material, then compound folding Penetrate rate=
Patent CN106403830A between the prism and metallic film to be measured of traditional Otto structures also it is proposed that increase by one A convex lens is realized the control to the air gap using the curvature edge of convex lens, is improved to super thin metal films test with this Sensitivity, this method is although easy to implement, but the disadvantages of this method is to need to seek by constantly movement during the test Suitable position is looked for be tested, and the thickness of the air gap is difficult to precisely measure by experiment.
Utility model content
The utility model proposes a kind of modular constructions for improving super thin metal measured thin film sensitivity, in isosceles three Dielectric film substitution the air gap is coated on prism, by changing the thickness of incident wavelength and dielectric film, realization is led to ultra-thin The preliminary surveying of conductive film optical constant and thickness related data.Its feature is the stable structure, easy to operate, dielectric film Thickness be easy to control and precision is high, do not interfere with the accuracy of measurement data below.
The technical solution adopted in the utility model is:
A kind of modular construction for improving super thin metal measured thin film sensitivity.It is characterized in that:The component knot Structure is by refractive indexIsosceles prism, refractive index isDielectric film and substrate of glass composition.When test, surface is coated with The isosceles prism of dielectric film is placed on metallic film, and adjustment ellipsometer polarizer end and analyzer end are with respect to the horizontal plane The angle of normalWith.Incident light by isosceles prism and after forming total reflection close to the end face of dielectric film from trigone Another face of mirror is emitted, and the plasmon coupling of the evanescent wave and metal surface that are totally reflected initiation improves phase after light reflection The sensitivity of variation, reflected light are received by ellipsometer analyzer and analyze emergent light and incident light s polarizations and p-polarization luminance factor Value, to obtain the relevant information of metallic film.
The isosceles prism refractive indexNot less than 1.5.
The isosceles prism apex angleNo more than 45 °.
The dielectric film refractive indexNo more than 1.4.
The dielectric film thickness for being plated on isosceles prism surface is not more than 1um.
Via the polarization angle of light of the polarizer incidence prism when the described test
The incident beam size that the slave ellipsometer polarizer end is sent out is 63um × 70um.
A kind of modular construction for improving super thin metal measured thin film sensitivity, experimental procedure are as follows:
(1) tri- isosceles prisms of A, B, C are selected, are coated with the medium of different-thickness on three isosceles prisms respectively The thickness of film, three groups of dielectric films is no more than 1um;
(2) above-mentioned isosceles prism A is selected, the angle of the ellipsometer polarizer is first chosenAngle, adjust analyzer folder AngleAngle, so that emergent ray is incident on just in analyzer and optical signal made to reach maximum.Then incident light is selected Ranging from 300nm to the 1200nm of wavelength, surveyed every 1nm it is primary, obtain reflected light the angle of polarization (ψ) and phase shift (Δ) with entering Penetrate the curve of optical wavelength variation;
(3) three different polarization angles of light are chosen, repeat step (2);
(4) above-mentioned isosceles prism B, C are selected, repeats step (2), (3), finally obtain reflected light the angle of polarization (ψ) and Phase shift (Δ) is with incident wavelength, the curve of incidence angle and dielectric film thickness change.It is fitted the change curve of ψ and Δ, is obtained The thickness and optical constant of super thin metal film.
The utility model has the beneficial effects that:Measuring device is stablized, and easy to operate, high certainty of measurement is thin to super thin metal Film is without destructiveness.
Description of the drawings
Fig. 1 is the modular construction schematic diagram of the utility model.
Fig. 2 is the structural schematic diagram when component of the utility model is used to test.1- isosceles prisms in figure, 2- media are thin Film, 3- metallic films, 4- substrate of glass, 5- ellipsometer polarizers end, 6- ellipsometer analyzers end.
Specific implementation mode
Below with reference to shown in attached drawing and this practicability is described in detail in specific implementation mode.
A kind of component for improving super thin metal films test sensitivity, isosceles prism (1) are by refractive index 1.5168 BK7 glass is made, apex angle α be 60 ° of apex angles, dielectric film (2) byIt is made.
A kind of modular construction for improving super thin metal measured thin film sensitivity is as follows:
(1) select tri- isosceles prisms of A, B, C, be coated on three isosceles prisms respectively thickness be 100nm, The dielectric film of 200nm, 400nm;
(2) above-mentioned isosceles prism A is selected, the angle of the ellipsometer polarizer is first chosenIt is 66 °, adjusts analyzer folder AngleAngle, so that emergent ray is incident on just in analyzer and optical signal made to reach maximum.Then incident light is selected Ranging from 300nm to the 1200nm of wavelength, surveyed every 1nm it is primary, obtain reflected light the angle of polarization (ψ) and phase shift (Δ) with entering Penetrate the curve of optical wavelength variation;
(3) three different polarization angles of light are chosenRespectively 70 °, 74 °, 78 °, repeat step (2);
(4) above-mentioned isosceles prism B, C are selected, repeats step (2), (3) finally obtain the angle of polarization (Δ) of reflected light With phase shift (Δ) with incident wavelength, the curve of incidence angle and dielectric film thickness change.It is fitted the change curve of ψ and Δ, is obtained To the thickness and optical constant of super thin metal film.

Claims (7)

1. a kind of modular construction for improving super thin metal measured thin film sensitivity, it is characterised in that:The modular construction It is n by refractive index1Isosceles prism (1), refractive index n2Dielectric film (2) and substrate of glass (4) composition;When test, table The isosceles prism that face is coated with dielectric film is placed on metallic film, adjustment ellipsometer polarizer end and analyzer end relative to The angle theta of horizontal plane normal1And θ2;Incident light is by isosceles prism and after forming total reflection close to the end face of dielectric film It is emitted from another face of prism, the plasmon coupling of the evanescent wave and metal surface that are totally reflected initiation improves light reflection The sensitivity of phase change afterwards, reflected light receives and analyze emergent light by ellipsometer analyzer and incident light s polarizations are anti-with p-polarization Rate ratio is penetrated, to obtain the relevant information of metallic film.
2. a kind of modular construction for improving super thin metal measured thin film sensitivity according to claim 1, feature It is:Described isosceles prism (1) the refractive index n1Not less than 1.5.
3. a kind of modular construction for improving super thin metal measured thin film sensitivity according to claim 1, feature It is:Described isosceles prism (1) apex angle α is not more than 45 °.
4. a kind of modular construction for improving super thin metal measured thin film sensitivity according to claim 1, feature It is described dielectric film (2) the refractive index θ2No more than 1.4.
5. a kind of modular construction for improving super thin metal measured thin film sensitivity according to claim 1, feature It is:Dielectric film (2) thickness for being plated on isosceles prism (1) surface is not more than 1um.
6. a kind of modular construction for improving super thin metal measured thin film sensitivity according to claim 1, feature It is:Via the polarization angle of light of the polarizer incidence prism when test
7. a kind of modular construction for improving super thin metal measured thin film sensitivity according to claim 1, feature It is:The incident beam size that the slave ellipsometer polarizer end is sent out is 63um × 70um.
CN201820017141.8U 2018-01-05 2018-01-05 A kind of modular construction for improving super thin metal measured thin film sensitivity Expired - Fee Related CN207779344U (en)

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CN207779344U true CN207779344U (en) 2018-08-28

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