CN1202550C - Cathode ray tube device - Google Patents
Cathode ray tube device Download PDFInfo
- Publication number
- CN1202550C CN1202550C CNB011209879A CN01120987A CN1202550C CN 1202550 C CN1202550 C CN 1202550C CN B011209879 A CNB011209879 A CN B011209879A CN 01120987 A CN01120987 A CN 01120987A CN 1202550 C CN1202550 C CN 1202550C
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- Prior art keywords
- electrode
- electron beam
- grid
- lens
- dynamic focus
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4803—Electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/48—Electron guns
- H01J2229/4834—Electrical arrangements coupled to electrodes, e.g. potentials
- H01J2229/4837—Electrical arrangements coupled to electrodes, e.g. potentials characterised by the potentials applied
- H01J2229/4841—Dynamic potentials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/56—Correction of beam optics
- H01J2229/563—Aberrations by type
- H01J2229/5635—Astigmatism
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/58—Electron beam control inside the vessel
- H01J2229/583—Electron beam control inside the vessel at the source
- H01J2229/5835—Electron beam control inside the vessel at the source cooperating with the electron gun
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Video Image Reproduction Devices For Color Tv Systems (AREA)
Abstract
The invention provides a CRT device. A main lens section of an electron gun assembly includes a focus electrode supplied with a focus voltage of a first level, a dynamic focus electrode supplied with a dynamic focus voltage obtained by superimposing an AC component, which varies in synchronism with deflection magnetic fields, upon a reference voltage close to the first level, and an anode supplied with an anode voltage with a second level higher than the first level. The electron gun assembly further includes at least two auxiliary electrodes disposed between the focus electrode and the dynamic focus electrode, and these at least two auxiliary electrodes are connected via a resistor disposed near the electron gun assembly.
Description
Technical field
The present invention relates to cathode ray tube device, relate to the color cathode-ray tube apparatus that the electron gun that carries out dynamic astigmatism (dynamicastigmatism) correction is housed especially.
Background technology
In recent years, a kind of 3 beam electrons bundles that will form a line of extensive use carry out the auto-convergence mode coaxial type color cathode-ray tube apparatus of auto-convergence in fluoroscopic All Ranges.In such color cathode-ray tube apparatus, the electron beam by anisotropy field is subjected to deflection aberration.Electron beam for example is subjected to power because of pincushion horizontal deflection magnetic field 11 shown in Figure 1A like that on arrow 13 directions.Thus, shown in Figure 1B, the electron-baem spot (beam spot) 12 that deflects into the electron beam of phosphor screen marginal portion distorts, the problem that exists definition obviously to descend.
The deflection aberration that electron beam is subjected to enlarges electron beam overconverged in vertical direction simultaneously in the horizontal direction.Thus, form the halo part 15 that enlarges on the core 14 damaged in the horizontal because of high brightness and the vertical direction at the electron-baem spot of phosphor screen marginal portion in low-light level.
As the means that solve this definition deterioration, can exemplify the spy and open clear 61-99249 communique, the spy opens clear 61-250934 communique and the special structure that is disclosed in the flat 2-72546 communique of opening.That is, these electron guns all possess the 1st grid to the 5 grids, the electron beam generating part branch along the formation of electron beam direct of travel, four utmost points (quadrupole) lens basically, reach main lens.The 3rd grid and the 4th grid that constitute quadrupole lens and disposed adjacent have vertical length and 3 laterally long non-circular electron beam through-holes respectively on the subtend face.
Fig. 2 represents that of equal valuely these carry out the optical model that deflection aberration is proofreaied and correct by electron gun.When quadrupole lens was not played a role, shown in dotted line, electron beam 800 was by main lens 803 and magnetic deflection field 804.Fully do not focus in the horizontal direction to the electron beam 800 of phosphor screen marginal portion 805 deflections, and overconverged in vertical direction.Thus, make the obvious deterioration of definition.
When quadrupole lens 802 is played a role, shown in solid line, alleviated the influence of the deflection aberration of magnetic deflection field 804.The electron beam 801 of deflection phosphor screen marginal portion 805 forms and suppresses the electron-baem spot that halo partly produces.
Yet, even if be provided with such means for correcting,, promptly allow to the halo part of cancellation electron-baem spot because the deflection aberration that magnetic deflection field is brought is very big, still can not correction kernel horizontal damage phenomenon partly.This is mainly due to due to the incidence angle difference of the horizontal direction of the fluoroscopic electron beam of directive and vertical direction.
Be electron beam since quadrupole lens and magnetic deflection field in the horizontal direction and vertical direction be subjected to different effects.Thus, horizontal direction incidence angle ax＜＜vertical direction incidence angle ay.The result is according to Lagrange-Helmholz (Lagrange-Helmholtz) rule, horizontal direction multiplying power Mx＞＞vertical direction multiplying power My.Thus, the electron-baem spot generation that focuses on the electron beam of phosphor screen marginal portion laterally damages.
The color cathode-ray tube apparatus of proofreading and correct above-mentioned horizontal damage phenomenon such as the spy open flat 3-93135 communique, spy open in the flat 3-95835 communique announcement.The electron gun that is applicable to these cathode ray tube devices possesses the 1st grid～the 7th grid basically, and forms along the electron beam direct of travel, has electron beam and produces part, the 1st quadrupole lens, the 2nd quadrupole lens, main lens.The 1st quadrupole lens leans against the 3rd adjacent respectively grid and the 4th grid subtend face separately and is provided with horizontal length and vertically long 3 non-circular electron beam through-holes and forms.The 2nd quadrupole lens leans against the 5th adjacent respectively grid and the 6th grid subtend face separately and is provided with horizontal length and vertically long 3 non-circular electron beam through-holes and forms.
The 1st quadrupole lens changes the picture multiplying power of proofreading and correct the electron beam that incides main lens synchronously by the variation of its lensing and magnetic deflection field.Again, the 2nd quadrupole lens and main lens change synchronously by the variation of its lensing and magnetic deflection field, and the electron beam that deflects into the phosphor screen marginal portion at last is subjected to the deflection aberration of magnetic deflection field and the part that produces obvious distortion is proofreaied and correct.
Fig. 3 represents that of equal valuely above-mentioned electron gun carries out the optical model that deflection aberration is proofreaied and correct.The picture multiplying power of the electron beam 900 of main lens 903 is incided in i.e. the 1st quadrupole lens 901 controls.The 2nd quadrupole lens 902 makes electron beam 900 focus on phosphor screen marginal portion 905 by the deflection aberration that the focus state that changes main lens 903 comes correction deflector magnetic field 904 to cause.Thus, compare, solved the phenomenon of horizontal damage, make electron beam can focus on the phosphor screen marginal portion more rightly with the dynamic focusing electron gun body of in the past 1 quadrupole lens.
Yet by introducing the structure of dual quadrupole lens as described above, in the horizontal direction, its incidence angle that incides the main lens part of electron beam that focuses on the phosphor screen marginal portion becomes big, the easier influence that is subjected to the spherical aberration of main lens.That is, the electron-baem spot on the phosphor screen marginal portion is the shape that has the halo part in the horizontal direction.
Again, as shown in Figure 3, dispose the structure of dual quadrupole lens at the leading portion of main lens and compare with the structure at the leading portion configuration quadrupole lens of main lens as shown in Figure 2, the track of electron beam all changes on horizontal direction and the vertical direction.Therefore, must make that the shape of the 1st quadrupole lens is the most suitable, make that the shape of the 2nd quadrupole lens is the most suitable, must the redesign main lens system.
Moreover usually the dynamic focusing electron gun body focuses on adjustment by adjusting external voltage.Under the situation of structure shown in Figure 2, though can carry out the adjustment of the suitableeest focusing by the quadrupole lens 802 and the variation of main lens 803, and under the situation of structure shown in Figure 3, focus on to adjust the influence of the variation that is subjected to the 1st quadrupole lens the 901, the 2nd quadrupole lens 902 and main lens 903, cause lens action to become complicated and be difficult to set the suitableeest focus voltage.
Again, under the situation of structure shown in Figure 3, each electrode that forms the 1st quadrupole lens shape of formed electron beam through-hole thereon is different with other.In the operation of assembling electron gun, the center bar 52,53,54 of electron gun assembly fixture 51 may not be chimeric in the electron beam through-hole of these electrodes shown in Figure 4 must redesign assembly fixture.
Summary of the invention
The present invention in view of the above problems, its purpose is to provide a kind of cathode ray tube device that possesses electron gun, it can easily focus on adjusts and can obtain the preferable image characteristic on whole phosphor screen zone.
In order to address the above problem and to achieve the above object, the cathode ray tube device of the present invention the 1st aspect, possess and have the electron beam that forms electron beam and form part and will form electron gun that electron beam that part produces focus on the main lens part on the phosphor screen, and produce and make the electron beam that penetrates from described electron gun in the horizontal direction and the deflecting coil of the magnetic deflection field of vertical direction upper deflecting scanning from described electron beam, its characteristics are that described electron gun comprises: with at least 2 non-axial symmetrical lens of the synchronous change of magnetic deflection field; To form the electron beam that partly penetrates from above-mentioned electron beam and finally focus on fluoroscopic final main focusing lens, in described at least 2 non-axial symmetrical lens, synchronous and near the 1st non-axial symmetrical lens of described final main focusing lens and above-mentioned magnetic deflection field along with the horizontal direction that is increased in of magnetic deflection field has focussing force, have disperse function in vertical direction, play a role as condenser lens near the vertical direction that is increased in of described electron beam formation the 2nd non-axial symmetrical lens partly along with magnetic deflection field, have in the horizontal direction than the lensing a little less than the lensing of vertical direction.
If the electron gun of above-mentioned structure is further improved, then can also have do not need to design main lens system again, the effect of the assembly fixture when not needing to design the electron gun assembling again.
Other examples of the present invention and advantage are described below, wherein can or implement the present invention and come further clear and definite the present invention by following explanation.Can realize each example of the present invention and advantage by the combination of various means and following content.
Description of drawings
With reference to the accompanying drawing in this explanation, be elaborated for example of the present invention, by explaining principle of the present invention in conjunction with the detailed description of above-mentioned general remark and following example.
Figure 1A is used to illustrate that electron beam is subjected to the power of anisotropy field.
The distortion of the electron-baem spot that Figure 1B is used to illustrate that anisotropy field causes.
Fig. 2 represents the optical model of the electron gun that carries out the dynamic astigmatism correction in the past.
Fig. 3 represents the optical model of the electron gun with dual quadrupole lens structure in the past.
The assembly fixture that is suitable for when Fig. 4 represents to assemble electron gun visually.
Fig. 5 is a horizontal cross of summarily representing its structure of color cathode-ray tube apparatus of cathode ray tube device one example of the present invention.
Fig. 6 is a horizontal cross of summarily representing to be applicable to its structure of electron gun of cathode ray tube device shown in Figure 5.
Fig. 7 is the vertical sectional view of the electron beam through-hole shape of position relation and each grid between the 3rd grid～the 6th grid of expression electron gun shown in Figure 6.
Fig. 8 is a horizontal cross of summarily representing to be applicable to other structures of cathode ray tube device electron gun shown in Figure 5.
Fig. 9 represents the optical model with dual quadrupole lens structure electron gun shown in Figure 6.
Symbol description
1: panel
2: the glass awl
3: phosphor screen (target)
4: shadow mask
5: neck
6G: center electron beam
6B: secondary electron beam
6R: secondary electron beam
7: electron gun
8: deflecting coil
10: shell
11: horizontal deflection magnetic field
12: electron-baem spot
13: arrow
14: the core
15: the halo part
51: the electron gun assembly fixture
52: center bar
53: center bar
54: center bar
800: electron beam
801: the electron beam that deflects into the phosphor screen marginal portion
802: quadrupole lens
803: main lens
804: magnetic deflection field
805: the phosphor screen marginal portion
900: electron beam
901: the 1 quadrupole lenss
902: the 2 quadrupole lenss
903: main lens
904: magnetic deflection field
905: the phosphor screen marginal portion
1000: electron beam
1001: the 2 quadrupole lenss
1002: the 1 quadrupole lenss
1003: main lens
1004: magnetic deflection field
1005: phosphor screen
Z: tube axial direction
X: horizontal direction
Y: vertical direction
K: negative electrode
G1: the 1st grid
G2: the 2nd grid
G3: the 3rd grid (the 2nd dynamic focus electrode)
G4: the 4th grid (the 1st auxiliary electrode)
G5: the 5th grid (the 2nd auxiliary electrode)
G6: the 6th grid (focusing electrode)
G7: the 7th grid (the 1st dynamic focus electrode)
GM: target
G8: the 8th grid (anode electrode)
G9: assemble cover
R1: resistance
A a: end of resistance R 1
B: the mid portion of resistance R 1
C: the other end of resistance R 1
R2: resistance
L: from the G4 subtend face of G3 to the electrode gap the G5 subtend face of G6
Embodiment
Below, describe for cathode ray tube device one example of the present invention with reference to accompanying drawing.
As shown in Figure 5, cathode ray tube device of the present invention for example color cathode-ray tube apparatus have panel 1, neck 5 and by making this panel 1 engage all-in-one-piece glass awl 2 shells that form 10 with neck 5.Panel 1 possesses the phosphor screen 3 (target) that 3 look fluorescence coatings of the strip that sends indigo plant (B), green (G), red (R) light that is configured in its inner face or point-like form.With this phosphor screen 3 subtends ground shadow mask 4 is installed.This shadow mask 4 side within it has a plurality of holes.
Coaxial type electron gun 7 is configured in the inside of neck 5.This coaxial type electron gun 7 penetrates the center electron beam 6G by same horizontal plane and is arranged in 3 beam electrons bundle 6B, 6G, 6R on the horizontal direction H by what a pair of secondary electron beam 6B, the 6R of its both sides formed to tube axial direction Z.Again, the center of the secondary electron beam through-hole of the grid of the grid of the low voltage side of this coaxial type electron gun 7 by make constituting the main lens part and high-voltage side takes place eccentricly to make the middle body of 3 beam electrons bundles on phosphor screen 3 carry out auto-convergence (selfconvergence).
Deflecting coil 8 is installed in the outside of glass awl 2.This deflecting coil 8 produces and makes the 3 beam electrons bundle 6B that penetrate from electron gun 7,6G, the 6R anisotropic magnetic deflection field of H and vertical direction Y upper deflecting in the horizontal direction.This anisotropy magnetic deflection field is formed by the horizontal deflection magnetic field of pincushion and the vertical deflection magnetic field of cartridge type.
Make the 3 beam electrons bundle 6B that penetrate from electron gun 7,6G, 6R to phosphor screen 3 limit auto-convergences, the limit focuses on the fluorescence coating of correspondence of phosphor screen 3.Then, this 3 beam electrons bundle 6B, 6G, 6R are owing to horizontal direction H and the vertical direction Y enterprising line scanning of anisotropic magnetic deflection field at phosphor screen 3.Thus, color display.
The electron gun 7 that is applicable to this cathode ray tube device is equipped with filament (heater) and is configured to a row negative electrode K (R, G, B), the 1st grid G the 1, the 2nd grid G the 2, the 3rd grid G 3 (the 2nd dynamic focus electrode), the 4th grid G 4 (the 1st auxiliary electrode), the 5th grid G 5 (the 2nd auxiliary electrode), the 6th grid G 6 (focusing electrode), the 7th grid G 7 (the 1st dynamic focus electrode), target GM, the 8th grid G 8 (anode electrode) and assembles cover (convergence cup) G9 on the X in the horizontal direction as shown in Figure 6 in possessing respectively.3 negative electrode K and 9 grids are supported to fix with above-mentioned arranged in order and by insulation supporter (not diagram) along the electron beam direct of travel.Assemble cover G9 by fixing with 8 welding of the 8th grid G again.On this convergence cover G9, set up (four bow strip) and be used for the feasible internal conductive film electrically conducting that forms with bore 2 inner faces covering neck 5 inner faces from glass.
On 3 negative electrode K (R, G, B), apply the voltage about about 100～150V.The 1st grid G 1 ground connection (perhaps applying negative potential V1).On the 2nd grid G 2, apply the accelerating voltage of electronegative potential.This accelerating voltage for about 600V to about the 800V.
The 3rd grid G 3 is connected with the 7th grid G 7 in pipe, simultaneously can be from the outside dynamic focus voltage of supplying with of cathode ray tube.This dynamic focus voltage is with the voltage of the focus voltage about about 6～9KV as reference voltage and the alternating component that stack synchronously changes with magnetic deflection field on this reference voltage.
Can to the focus voltage that the 6th grid G 6 is supplied with about 6～9KV,, can supply with the cathode voltage about 25～30KV from the cathode ray tube outside) from the outside of cathode ray tube to the G8 and the convergence cover G9 of the 8th grid.
Near electron gun 7, possesses resistance R 1 as shown in Figure 6.One end A of this resistance R 1 with assemble that cover G9 is connected and its other end C and pipe outside carry out ground connection.Resistance R 1 part B therebetween upward is connected with target GM.Thus, supply with about 50%～70% voltage of the voltage offer the 8th grid G 8 to target GM.
The 5th grid G 5 is connected with target GM in pipe, similarly is supplied to about 50%～70% voltage of the voltage that offers the 8th grid G 8 with target GM.Near the resistance R 2 the electron gun is connected with the 5th grid G 5 the 4th grid G 4 in the pipe by being configured in, and supplies with and the 5th grid G 5 voltage much at one.
The negative electrode K (R, G, B) that disposes that forms a line respectively equally spaced disposes with interval of about 5mm.
The 1st grid G 1 and the 2nd grid G 2 are respectively lamellar electrode, and possess and pass the thin plate face and form the electron beam through-hole of diameter less than the thin footpath circle of 1mm.
The 3rd grid G 3 is formed by long cup-shape electrode at tube axial direction Z.Possess diameter with the end face of the cup-shape electrode of the 2nd grid G 2 subtends and be about 3 big slightly about 2mm electron beam through-holes.Have diameter as shown in Figure 7 with the end face of the cup-shape electrode of the 4th grid G 4 subtends and be about 3 bigger circular electron beam through holes of 3～6mm left and right sides diameter.
The 4th grid G 4 is formed by the thick plate-like electrode as shown in Figure 7.This plate electrode possesses diameter and is about larger-diameter 3 circular electron beam through holes about 3～6mm.
The 5th grid G 5 is made of 1 lamellar electrode and 1 thick plate-like electrode as shown in Figure 7.Possess 3 non-circular electron beam through-holes that have the horizontal length of major axis on the X in the horizontal direction with the plate electrode of the 4th grid G 4 subtends.Roughly the same being about about 3～6mm of diameter of the horizontal direction diameter of above-mentioned 3 electron beam through-holes and the electron beam through-hole that on the 4th grid G 4, forms.Possess diameter with the plate electrode of the 6th grid G 6 subtends and be about larger-diameter 3 the circular electron beam through holes of 3～6mm degree.
The 6th grid G 6 is made of the long cup-shape electrode of tube axial direction Z.Possess diameter as shown in Figure 7 with the end face of the 5th grid G 5 subtends and be about larger-diameter 3 the circular electron beam through holes in 3～6mm left and right sides.Possess 3 non-circular electron beam through-holes of the shape of the vertical length that on vertical direction Y, has major axis with the end face of the 7th grid G 7 subtends.
The 7th grid G 7 is made of the long cup-shape electrode of tube axial direction Z.Possess 3 non-circular electron beam through-holes of the shape of the horizontal length that has major axis on the X in the horizontal direction with the end face of the 6th grid G 6 subtends.Possess diameter with the end face of target GM subtend and be about larger-diameter 3 the circular electron beam through holes in 3～6mm left and right sides.
Target GM is made of the thick plate-like electrode.This plate electrode possesses diameter and is about larger-diameter 3 the circular electron beam through holes in 3～6mm left and right sides.
The 8th grid G 8 is made of plate electrode.Has the electron beam through-hole that diameter is about larger-diameter 3 circles about 3～6mm with the thick plate-like electrode of target GM subtend.
Assemble cover G9 and 8 welding of the 8th grid G.The end face of assembling cover G9 possesses diameter and is about larger-diameter 3 the circular electron beam through holes in 3～6mm left and right sides.
The 1st grid G 1 and the 2nd grid G 2 are with the subtend configuration less than the very narrow interval of 0.5mm at interval.Again, the 2nd grid G 2 to the 8th grid G 8 are respectively with the interval subtend configuration about 0.5～1mm.
As shown in Figure 7, from the 3rd grid G 3 and subtend face the 4th grid G 4 to the electrode gap L of the subtend face of the 5th grid G 5 of the 6th grid G 6, at it subtend face of the 4th grid G 4 of the 5th grid G 5 is set roughly on the position intermediate.Promptly and the subtend face of the 4th grid G 4 of the 5th grid G 5 on the electric potential gradient that the alternating component that forms dynamic focus voltage is configured in 6 of the 3rd grid G 3 and the 6th grid G during for minimum level is almost 0 position.
As mentioned above, the subtend mask with the 4th grid G 4 of the 5th grid G 5 is equipped with horizontal electron beam through-hole.The electron beam through-hole that is formed on the electron beam through-hole on the subtend face with the 6th grid G 6 of the 5th grid G 5 and is formed on the subtend face of the 5th grid G 5 of the 6th grid G 6 is roughly the same.Again, with the subtend face of the 4th grid G 4 that is formed on the 3rd grid G 3 on electron beam through-hole and the electron beam through-hole shape that is formed on the subtend face of the 3rd grid G 3 of the 4th grid G 4 roughly the same.
In the electron gun 7 of above-mentioned structure, utilize negative electrode K, the 1st grid G 1 and the 2nd grid G 2 to constitute the electron beam that forms electron beam and form part.Between the 6th grid G 6 to the 8th grid G 8, constitute the main lens that finally focuses on the expansion electric field type on the electron beam phosphor screen.
When the electron beam deflecting is arrived fluoroscopic marginal portion, rely on the dynamic focus voltage that the 3rd grid G 3 and 7 supplies of the 7th grid G change along with the amount of deflection of electron beam, thus, forming the quadrupole lens that lensing dynamically changes between the 4th grid G 4 and the 5th grid G 5 and between the 6th grid G 6 and the 7th grid G 7.
That is,, between the 6th grid G 6 and the 7th grid G 7, form potential difference by supplying with dynamic focus voltage to the 7th grid G 7.Thus, by the asymmetrical electron beam through-hole that on the 6th grid G 6 and the 7th grid G 7, forms respectively, when lens strength dynamically changes, form horizontal direction X and go up i.e. the 1st quadrupole lens of the different non-axial symmetrical lens of lens strength with vertical direction Y.This non-axial symmetrical lens relatively relatively has disperse function and is having focussing force on the X in the horizontal direction on the vertical direction Y.
By electric capacity between electric capacity between the 3rd grid-the 4th grid and the 4th grid-the 5th grid and stack, a part of supplying with the dynamic focus voltage of the 3rd grid G 3 is supplied with the 4th grid G 4 again.Therefore, between the 4th grid G 4 and the 5th grid G 5, produce potential difference.Thus, by the asymmetric electronics Shu Tongkong that forms on the 4th grid G 4 and the 5th grid G 5 respectively, the non-axial symmetrical lens that horizontal direction X is different with the lens strength on the vertical direction Y when being formed on the lens strength dynamic change i.e. the 2nd quadrupole lens.
The 5th grid G 5 with the 4th grid G 4 subtend faces on the electron beam through-hole that forms the comparing of the 4th grid G 4 that coexist with the electron beam through-hole that forms on the 5th grid G 5 subtend faces, the horizontal direction diameter is roughly the same and the vertical direction diameter is less.Therefore, relatively have focussing force on the vertical direction Y and do not having lensing on the X in the horizontal direction at the non-axial symmetrical lens that forms between these grids.In other words, the electron lens system that is made of the 3rd grid (the 2nd dynamic focus electrode) G3, the 4th grid (the 1st auxiliary electrode) G4, the 5th grid (the 2nd auxiliary electrode) G5 and the 6th grid (focusing electrode) G6 is on the 3rd grid G 3 that dynamic focus voltage is pressurizeed the time, along with magnetic deflection field increases, the lensing of its horizontal direction almost not have variation and the lensing of its vertical direction relatively becomes and has focussing force.
That is, shown in the optical model of Fig. 9, electron gun make the electron beam deflecting to the phosphor screen marginal portion the time, form the part side from electron beam and play phosphor screen 1005 and form the 2nd quadrupole lens the 1001, the 1st quadrupole lens 1002 and main lens 1003 successively.
Form the electron beam 1000 that part produces owing to be formed on the 2nd quadrupole lens 1001 between the 4th grid G 4 and the 5th grid G 5 from electron beam, be not subjected to lensing on the X in the horizontal direction and on vertical direction Y, be subjected to focussing force.This electron beam 1000 is subjected to disperse function owing to the 1st quadrupole lens 1002 that is formed on 7 of the 6th grid G 6 and the 7th grid G when being subjected to focussing force on the X in the horizontal direction on vertical direction Y.Moreover the main lens 1003 of this electron beam 1000 by being formed by the 6th grid G the 6, the 7th grid G 7, target GM and the 8th grid G 8 is subjected to focussing force on X and the vertical direction Y in the horizontal direction.
From the electron beam 1000 of electron gun outgoing because magnetic deflection field 1004 is subjected to focussing force at vertical direction Y when X is subjected to disperse function in the horizontal direction.
According to such structure, the leading portion of main lens 1003 can with the deflection current synchronous dynamic ground controlling electron beam 1000 of supplying with deflecting coil.Meanwhile,, compare, can solve the phenomenon of the horizontal damage of electron beam with dynamic focusing electron gun body in the past owing to can change the focus state of the 1st quadrupole lens 1002 that is configured in main lens 1003 leading portions.Thus, electron beam is focused in fluoroscopic marginal portion.Therefore, can suppress the generation of moire fringe etc. on the phosphor screen marginal portion and in whole phosphor screen zone, can obtain the good focusing characteristic.
Again, compare with 2 heavy quadrupole lens structures in the past shown in Figure 3, the electron beam that focuses on the phosphor screen marginal portion is not brought into play the lensing of its horizontal direction because of the 2nd quadrupole lens, so the diameter on the horizontal direction does not almost change, is difficult to be subjected to the influence of the spherical aberration of main lens.
Moreover, from shown in Figure 2 in the past structure and when further designing shown in Figure 3 in the past 2 heavy quadrupole lenss structures, making electron beam focus under the situation that the phosphor screen middle body do not deflect, because variation has all taken place in the diameter of horizontal direction and the diameter of vertical direction, be difficult to further design, and when being designed to the 2 weight quadrupole lenss of this example shown in Figure 9 further, under situation about not deflecting, the 2nd quadrupole lens is not had an effect, so can easily design.
Again, in 2 heavy quadrupole lens structures in the past shown in Figure 3, when focusing on adjustment, lens action becomes complicated and is difficult to set the most burnt focus voltage, in contrast to this, in shown in Figure 92 heavy quadrupole lenss structures and since the 2nd quadrupole lens in the horizontal direction lens be failure to actuate, so can easily set optimum focusing voltage.
Moreover, when the assembling electron gun, the assembly fixture that uses is identical with in the past electron gun with the telescoping part of electron beam through-hole on being formed on electrode, promptly owing to the diameter of electron beam through-hole horizontal direction on all electrodes much at one, there is no need to design once more assembly fixture.
Again, in above-mentioned example, as shown in Figure 6, connected target GM and the 5th grid G 5, yet be not limited only to this, for example, as shown in Figure 8, the shape that is formed on the electron beam through-hole on each grid is identical with example shown in Figure 6, even connect the 2nd grid G 2 and the 5th grid G 5, also can obtain identical effect.
Again, as shown in Figure 7, the electron beam through-hole that forms on the 5th grid is made asymmetrical shape, by the electric potential gradient of the 4th gate configuration when not applying dynamic focus voltage being almost on 0 the position, and also can be so that the electron beam through-hole of the 4th grid is an asymmetrical shape.
Moreover, as shown in Figure 6, main lens constitutes the expansion electric field type by a target GM between configuration focusing electrode G6, dynamic focus electrode G7, anode electrode G8 and dynamic focus electrode G7 and the anode electrode G8, yet be not limited only to this, also can dispose the target more than 2, even if be that the electron gun the present invention with common biopotential type main lens, unipotential type main lens also can be suitable for.
As mentioned above, can provide a kind of cathode ray tube device that possesses electron gun according to example of the present invention, for the unnecessary main lens system that designs once more of this device, can easily focus on adjustment, assembly fixture when also not needing to design the electron gun assembling once again, and can obtain the preferable image characteristic in whole phosphor screen zone.
The technical staff in field of the present invention can easily realize other advantages of the present invention and modification.And the scope of the invention is not limited to above-mentioned detailed description and example.Therefore, on the basis that does not deviate from spirit of the present invention and claims, can carry out various conversion.
Claims (9)
1. cathode ray tube device, possess and have the electron beam that forms electron beam and form part and will form electron gun that electron beam that part produces focus on the main lens part on the phosphor screen, and produce and make the electron beam that penetrates from described electron gun in the horizontal direction and the deflecting coil of the magnetic deflection field of vertical direction upper deflecting scanning from described electron beam, it is characterized in that
Described electron gun comprises: with at least 2 non-axial symmetrical lens of the synchronous change of magnetic deflection field; To form the electron beam that partly penetrates from above-mentioned electron beam and finally focus on fluoroscopic final main focusing lens,
In described at least 2 non-axial symmetrical lens,, form the 2nd non-axial symmetrical lens partly near described electron beam and play a role, have in the horizontal direction as condenser lens synchronously and along with the horizontal direction that is increased in of magnetic deflection field has focussing force, has disperse function in vertical direction near the 1st non-axial symmetrical lens of described final main focusing lens and above-mentioned magnetic deflection field than the lensing a little less than the lensing of vertical direction along with the vertical direction that is increased in of magnetic deflection field.
2. cathode ray tube device as claimed in claim 1 is characterized in that,
Described electron gun comprises: be applied in the focus voltage of the 1st level and constitute described main lens focusing electrode partly; Be applied in stack and described magnetic deflection field near the reference voltage described the 1st level synchronously the alternating component of change dynamic focus voltage and constitute the 1st dynamic focus electrode of described main lens part; Be applied in described dynamic focus voltage and be configured in the 2nd dynamic focus electrode of the leading portion of described main lens part; Be applied in the anode electrode of the cathode voltage of 2nd level higher than described the 1st level,
Also have at least two be configured between described focusing electrode and described the 2nd dynamic focus electrode auxiliary electrode,
Described focusing electrode and described the 1st dynamic focus electrode adjoin each other.
3. cathode ray tube device as claimed in claim 2 is characterized in that,
Described at least two auxiliary electrodes connect by near the resistance that is positioned at the described electron gun.
4. cathode ray tube device as claimed in claim 2 is characterized in that,
In described at least two auxiliary electrodes, when at least 1 auxiliary electrode is minimum level in the alternating component that forms described dynamic focus voltage, is almost in the electric potential gradient between described focusing electrode and described dynamic focus electrode on 0 the position non-axial symmetrical lens formation means that form non-axial symmetrical lens are set.
5. cathode ray tube device as claimed in claim 4 is characterized in that,
Described auxiliary electrode is two,
1st auxiliary electrode adjacent with described dynamic focus electrode with the subtend face of described dynamic focus electrode on possess be formed on electron beam through-hole on described dynamic focus electrode and the subtend face the 1st auxiliary electrode roughly the same, be roughly circular electron beam through-hole
2nd auxiliary electrode adjacent with described dynamic focus electrode with the subtend face of described dynamic focus electrode on possess and the electron beam through-hole electron beam through-hole roughly the same, circular that is formed on described dynamic focus electrode and the subtend face the 2nd auxiliary electrode
Described non-axial symmetrical lens form means at least described the 1st auxiliary electrode and subtend face described the 2nd auxiliary electrode and described the 2nd auxiliary electrode and subtend face described the 1st auxiliary electrode both one of on form.
6. cathode ray tube device as claimed in claim 5 is characterized in that,
The non-axial symmetrical lens that utilizes described non-axial symmetrical lens formation means to form along with the increase of described magnetic deflection field, relatively has disperse function in the horizontal direction and has focussing force in vertical direction.
7. cathode ray tube device as claimed in claim 6 is characterized in that,
Described non-axial symmetrical lens formation means are to be made of the electron beam through-hole littler than horizontal direction of the aperture of vertical direction with on described the 1st auxiliary electrode subtend face that is formed on described the 2nd auxiliary electrode.
8. cathode ray tube device as claimed in claim 7 is characterized in that,
The non-axial symmetrical lens formation means that are formed on described the 2nd auxiliary electrode are configured in the subtend face of the 1st auxiliary electrode described dynamic focus electrode and described with on the roughly position intermediate between the subtend face of described focusing electrode and described the 2nd auxiliary electrode.
9. cathode ray tube device as claimed in claim 2 is characterized in that,
The electron lens system that is made of described dynamic focus electrode, described at least two auxiliary electrodes, described focusing electrode is when described dynamic focus electrode applies described dynamic focus voltage, along with the increase of described magnetic deflection field, the lensing of described electron lens system level direction does not have the lensing of much variations, vertical direction to change and relatively has focussing force.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP253882/2000 | 2000-08-24 | ||
| JP2000253882A JP2002075240A (en) | 2000-08-24 | 2000-08-24 | Cathode-ray tube device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1340843A CN1340843A (en) | 2002-03-20 |
| CN1202550C true CN1202550C (en) | 2005-05-18 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB011209879A Expired - Fee Related CN1202550C (en) | 2000-08-24 | 2001-08-21 | Cathode ray tube device |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6614156B2 (en) |
| JP (1) | JP2002075240A (en) |
| KR (1) | KR100418546B1 (en) |
| CN (1) | CN1202550C (en) |
| TW (1) | TWI282108B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001084922A (en) * | 1999-07-12 | 2001-03-30 | Toshiba Corp | Cathode-ray tube device |
| US6803584B2 (en) * | 2002-02-15 | 2004-10-12 | Dai Nippon Printing Co., Ltd. | Electron beam control device |
| US7049813B2 (en) * | 2004-01-09 | 2006-05-23 | Hr Textron Inc. | Motor state counting |
| US7315113B2 (en) * | 2004-10-12 | 2008-01-01 | Matsushita Toshiba Picture Display Co., Ltd. | Color cathode-ray tube and method for producing the same |
| CN109470732B (en) * | 2017-09-07 | 2020-11-24 | 中国科学院上海微系统与信息技术研究所 | Electronic optical system |
| CN109470731B (en) * | 2017-09-07 | 2020-10-20 | 中国科学院上海微系统与信息技术研究所 | Image type electron spin analyzer |
| CN110542700B (en) * | 2018-05-28 | 2022-01-28 | 中国科学院上海微系统与信息技术研究所 | Low-energy electron diffractometer |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3932786A (en) * | 1974-11-29 | 1976-01-13 | Rca Corporation | Electron gun with a multi-element electron lens |
| JPS60175343A (en) * | 1984-02-20 | 1985-09-09 | Toshiba Corp | Electron gun for cathode-ray tube |
| KR100319086B1 (en) * | 1994-12-31 | 2002-08-08 | 삼성에스디아이 주식회사 | Electron gun for color cathode ray tube |
| JPH09288984A (en) * | 1996-04-25 | 1997-11-04 | Nec Kansai Ltd | Color cathode-ray tube device |
| JP3635153B2 (en) * | 1996-05-28 | 2005-04-06 | 株式会社東芝 | Electron gun for cathode ray tube and cathode ray tube |
| JP3588248B2 (en) | 1997-04-04 | 2004-11-10 | 松下電器産業株式会社 | Color picture tube equipment |
| JPH10321157A (en) * | 1997-05-21 | 1998-12-04 | Toshiba Corp | Cathode-ray tube device |
| JPH11176348A (en) * | 1997-12-09 | 1999-07-02 | Toshiba Corp | Electron gun structure and color picture tube with electron gun structure |
-
2000
- 2000-08-24 JP JP2000253882A patent/JP2002075240A/en active Pending
-
2001
- 2001-08-20 KR KR10-2001-0049870A patent/KR100418546B1/en not_active IP Right Cessation
- 2001-08-21 CN CNB011209879A patent/CN1202550C/en not_active Expired - Fee Related
- 2001-08-23 US US09/934,857 patent/US6614156B2/en not_active Expired - Fee Related
- 2001-08-24 TW TW090120872A patent/TWI282108B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100418546B1 (en) | 2004-02-11 |
| JP2002075240A (en) | 2002-03-15 |
| TWI282108B (en) | 2007-06-01 |
| US6614156B2 (en) | 2003-09-02 |
| KR20020016518A (en) | 2002-03-04 |
| US20020024284A1 (en) | 2002-02-28 |
| CN1340843A (en) | 2002-03-20 |
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