CN112799161A - Metal cylindrical grating and manufacturing process thereof - Google Patents
Metal cylindrical grating and manufacturing process thereof Download PDFInfo
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- CN112799161A CN112799161A CN202110139793.5A CN202110139793A CN112799161A CN 112799161 A CN112799161 A CN 112799161A CN 202110139793 A CN202110139793 A CN 202110139793A CN 112799161 A CN112799161 A CN 112799161A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 26
- 239000002184 metal Substances 0.000 title claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 38
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000010936 titanium Substances 0.000 claims abstract description 26
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 26
- 238000004043 dyeing Methods 0.000 claims abstract description 17
- 238000001259 photo etching Methods 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052802 copper Inorganic materials 0.000 claims abstract description 8
- 239000010949 copper Substances 0.000 claims abstract description 8
- 238000003754 machining Methods 0.000 claims abstract description 7
- 239000011159 matrix material Substances 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 238000000746 purification Methods 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 12
- 239000000463 material Substances 0.000 abstract description 10
- 230000007613 environmental effect Effects 0.000 abstract description 6
- 230000008901 benefit Effects 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000006073 displacement reaction Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000009434 installation Methods 0.000 description 5
- 239000011295 pitch Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical group C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005536 corrosion prevention Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Transform (AREA)
Abstract
The application provides a metal cylindrical grating and a manufacturing process thereof, and the metal cylindrical grating comprises a copper substrate, wherein a black dyeing layer is arranged on the outer side surface of the substrate, a titanium film layer is arranged on the surface of the black dyeing layer, a grating line part is laser-etched on the surface of the titanium film layer, a laser beam penetrates through the titanium film layer to form dark grains of the grating line part on the black dyeing layer, and bright grains of the grating line part are formed between adjacent dark grains; the grating line part comprises a main grating and zero position gratings on the upper side and the lower side of the main grating, dark lines and bright lines of the main grating are arranged in equal width and are uniformly distributed along the circumferential direction of the side surface of the substrate at intervals; the phase positions of the zero position gratings positioned at the upper side and the lower side of the main grating are the same, and the patterns of the dark stripes and the bright stripes at the corresponding positions are opposite. The beneficial effect of this application is: the high-hardness copper material is adopted as the base material, so that the machining is more convenient, the manufacturing cost is reduced, the machining efficiency is improved, and the grating measurement positioning precision can be improved by photoetching the zero grating on the base; the grating manufacturing process has the advantages of advanced technical method, good environmental protection benefit and the like.
Description
Technical Field
The disclosure relates to the technical field of metal cylindrical surface gratings and manufacturing processes thereof, in particular to a metal cylindrical surface grating and a manufacturing process thereof.
Background
The metal cylindrical grating is an advanced modern optical element for high-precision angle displacement measurement and control, and forms an open type metal cylindrical grating angle displacement sensor (also called as a built-in bearing-free angle encoder) together with a reflecting type cylindrical grating reading head, compared with other non-cylindrical grating angle measurement elements, the metal cylindrical grating has the remarkable characteristics of high measurement and control precision, wide appearance size, shock resistance, vibration resistance, accurate and fast installation, wide application and the like, and the metal cylindrical grating is used as a high-precision angle displacement measurement and control key reference element and is widely applied to various high-grade numerical control processing and measurement equipment.
With the rapid development of modern science and technology, the requirements of many high-grade numerical control equipment on the reliability and accuracy of measurement and positioning of the operation position of the equipment are higher and higher; with the ever-increasing market demand and the expanding application range of metal cylindrical grating products, with the development of the industry in China, China also sets a series of corresponding environmental protection laws and regulations, and the laws and regulations set forth new requirements for the performance and the cost of the metal cylindrical grating, particularly for the manufacturing process method and the like.
At present, the existing domestic and foreign metal cylindrical surface gratings and the manufacturing process thereof have the following defects: firstly, the zero grating (also called as absolute zero) of the existing metal cylindrical grating has low positioning precision and weak anti-interference capability, and cannot meet the requirement of accurate positioning of the running position of high-grade numerical control equipment; those skilled in the art will appreciate that: the accuracy of the initial position of numerical control machining and measuring equipment is crucial; secondly, the existing metal cylindrical grating substrate is made of stainless steel material, and the skilled person can know that: the processing of the stainless steel material is complex, vacuum condition is needed for quenching, the processing needs to be finished by a grinding machine and a bench worker in addition to a lathe, and the requirements of the base body can be met, so that the manufacturing cost is inevitably increased, and the cylindrical grating of the stainless steel base body cannot be used in the environment requiring antimagnetic performance; thirdly, the structural shape design of the inner hole of the existing metal cylindrical grating is not optimized, and the effect of reducing the installation error cannot be fully achieved due to the fact that the contact surface of the existing metal cylindrical grating with an outer equipment rotating shaft is too large during installation; fourth, the manufacturing process of the prior art is similar to the manufacturing process of semiconductor very large scale integrated circuits and chips, and those skilled in the art can understand that: the manufacturing process method in the prior art has the processes of photosensitive film coating, developing and corroding, which are toxic, harmful and environment-polluting processes, and the processes are complex and time-consuming, and have low manufacturing efficiency.
Disclosure of Invention
The present application is directed to the above problems and provides a metal cylindrical grating and a manufacturing process thereof.
The first aspect of the invention provides a metal cylindrical grating, which comprises a copper substrate, wherein a black dyeing layer is arranged on the outer side surface of the substrate, a titanium film layer is arranged on the surface of the black dyeing layer, a grating line part is formed on the surface of the titanium film layer through laser photoetching, dark grains of the grating line part are formed on the black dyeing layer after a laser beam penetrates through the titanium film layer, and bright grains of the grating line part are formed between adjacent dark grains; the grating line part comprises a main grating and zero position gratings on the upper side and the lower side of the main grating, dark lines and bright lines of the main grating are arranged in the same width and are uniformly distributed along the circumferential direction of the side surface of the substrate at intervals; the phase positions of the zero position gratings positioned at the upper side and the lower side of the main grating are the same, and the patterns of the dark stripes and the bright stripes at the corresponding positions are opposite.
According to the technical scheme provided by the embodiment of the application, the center of the base body is provided with an inner hole, and three conical contact structures which are uniformly distributed in the circumferential direction are arranged on the inner hole.
According to the technical scheme provided by the embodiment of the application, the number of dark stripes on the zero grating is at least 1.
According to the technical scheme provided by the embodiment of the application, the color of the titanium film layer is golden yellow, yellow green or light blue.
In a second aspect, the present application provides a manufacturing process of a metal cylindrical grating, including the following steps:
machining and manufacturing a base body;
performing black dyeing anticorrosion treatment on the outer side surface of the matrix;
carrying out oil stain treatment on the matrix;
drying and purifying the matrix at high temperature;
plating a titanium film on the outer side surface of the matrix in vacuum;
directly etching a grating line part on the outer side surface of the substrate by laser;
carrying out surface purification treatment on the matrix;
carrying out line precision detection on the outer side surface of the matrix;
and preparing a protective film on the substrate.
The invention has the beneficial effects that: the application provides a metal cylinder grating and manufacturing process thereof, compares in prior art this scheme and has following advantage:
1. the high-hardness copper material is adopted as the base material, so that the difficulty in machining the base is reduced, the production efficiency is improved, and the manufacturing cost of the base is saved;
2. the zero grating is photoetched on the upper side and the lower side of the main grating besides the main grating is photoetched on the substrate, so that the positioning accuracy of grating measurement can be improved, and the anti-interference capability is strong;
3. the process manufacturing method has advanced technology and high manufacturing efficiency and has good environmental protection benefit.
Drawings
FIG. 1 is a schematic structural diagram of a first embodiment of the present application;
FIG. 2 is a schematic structural diagram of a grating pattern portion according to a first embodiment of the present disclosure;
FIG. 3 is a schematic view of the structure of the inner hole of the base body in the first embodiment of the present application;
FIG. 4 is a flow chart of a second embodiment of the present application;
FIG. 5 is a schematic block diagram of a second embodiment of the present application;
the text labels in the figures are represented as: 1. a substrate; 2. dark lines; 3. bright lines; 4. a main grating; 5. a null grating; 6. an inner bore; 7. a tapered contact structure.
Detailed Description
In order that those skilled in the art will better understand the technical solutions of the present invention, the following detailed description of the present invention is provided in conjunction with the accompanying drawings, and the description of the present section is only exemplary and explanatory, and should not be construed as limiting the scope of the present invention in any way.
As shown in fig. 1 and fig. 2, a schematic diagram of a first embodiment of the present application includes a copper substrate 1, a black dye layer is disposed on an outer side surface of the substrate 1, a titanium film layer is disposed on a surface of the black dye layer, a grating line portion is laser-etched on the surface of the titanium film layer, a dark pattern 2 of the grating line portion is formed on the black dye layer after a laser beam penetrates through the titanium film layer, and a bright pattern 3 of the grating line portion is formed between adjacent dark patterns 2; the grating line part comprises a main grating 4 and zero position gratings 5 on the upper side and the lower side of the main grating 4, the dark lines 2 and the bright lines 3 of the main grating 4 are arranged in the same width and are uniformly distributed along the circumferential direction of the side surface of the substrate 1 at intervals; the phases of the zero position gratings 5 positioned at the upper side and the lower side of the main grating 4 are the same, and the patterns of the dark stripes 2 and the bright stripes 3 at the corresponding positions are opposite.
In this embodiment, the cylindrical grating substrate 1 is made of a high-hardness copper material and also includes a high-hardness copper alloy material, and the substrate 1 is manufactured and formed by a precision high-speed lathe or a slow-speed wire cutting machine. The substrate 1 adopts a black dyeing treatment to form a black dyeing layer for surface corrosion prevention, and a titanium film layer suitable for photoetching is plated on the outer surface of the black dyeing layer by adopting vacuum sputtering in order to ensure that the grating bright lines 3 have higher reflectivity, wear resistance and corrosion resistance to incident light. In order to realize environment-friendly and efficient photoetching process for manufacturing a high-precision, high-quality and fine grating line part, a precise laser direct-etching photoetching machine is adopted to manufacture grating line patterns, and the main principle is that a titanium film layer plated on a substrate 1 is subjected to gasification etching by adopting a laser beam, a relatively coarse black-dyed layer is exposed, a non-reflective dark line 2 is formed, and a reflective bright line 3 is formed without a photoetching titanium film layer. Preferably, the color of the titanium film layer is golden yellow, yellow green or light blue. In other preferred embodiments, the color of the titanium film layer can be set to other colors with higher reflectivity to infrared light.
In this embodiment, the main grating 4 is photoetched on the outer side surface of the substrate 1, the widths of the bright lines 3 and the dark lines 2 are equal, the bright lines 3 and the dark lines 2 are alternately distributed around the whole circumference of the cylinder of the substrate 1, the sum of the widths of the bright lines 3 and the dark lines 2 is called as a grating pitch or a grating constant, that is, the grating pitches of the main grating 4 are equal, and the grating pitch value and the grating pitch number are selected mainly according to the measurement resolution of the cylindrical grating angular displacement sensor, the measurement precision requirement and the signal pickup capability of the grating reading head.
In this embodiment, the null grating 5 is designed into 2 groups, which are respectively located above and below the main grating 4, the two groups of null gratings 5 have the same pattern and the same phase, and the line arrangement position and the geometric size corresponding to them are also the same, except that the line dark stripes 2 and the bright stripes 3 corresponding to them are opposite, that is, if the dark stripes 2 are engraved on the null grating 5 above a certain position of the main grating 4, the pattern corresponding to the null grating 5 below the position is the bright stripes 3. When the incident light irradiates the lines and the lines corresponding to the incident light, if the light irradiates the bright lines 3 (titanium film layers), the light can be reflected, and if the light irradiates the dark lines 2, the light can be absorbed and diffused. In the two groups of zero-position gratings 5, the number of the lines, the width of each line and the arrangement sequence of the lines are selected, and the number, the width and the arrangement sequence of the lines are determined by the grating pitch of the main grating 4, the grating signal pickup capability of the reflective cylindrical grating reading head and the measurement positioning precision required by the cylindrical grating angular displacement sensor. According to the two groups of zero-position gratings 5 designed according to the content, the two groups of zero-position gratings 5 are respectively picked up by the reflecting cylindrical grating reading head, and then the two picked-up zero-position signals are subjected to differential processing to finally become the zero-position signal of the cylindrical grating angular displacement sensor, wherein the signal is a pulse signal, and the pulse width, the time frequency and the maximum amplitude allowed by the signal can meet the requirement of accurate measurement and positioning of the cylindrical grating angular displacement sensor. The dark lines and the bright lines in the line pattern of the zero grating 5 have equal width and unequal width, and the minimum number of the dark lines 2 on the zero grating 5 is 1 selected later. Those skilled in the art will appreciate that: the starting position of the operation of high-grade manufacturing equipment, particularly numerical control equipment, is crucial, and the accuracy of the starting position of the equipment is mainly determined by the positioning accuracy and the anti-interference capability of the zero grating 5. By adopting the design scheme of the zero grating 5, the measuring and positioning accuracy and the anti-interference capability of the whole cylindrical grating angular displacement sensor are improved.
In a preferred embodiment, as shown in fig. 3, the base body 1 is provided with an inner hole 6 at the center, and three conical contact structures 7 are uniformly distributed on the inner hole 6 in the circumferential direction. In the preferred embodiment, the conical contact structures 7 and the external rotating shaft only have three contact areas, and the three conical contact structures 7 are uniformly distributed at an angle of 120 degrees in the circumferential direction, so that the installation error of the cylindrical grating during installation can be reduced, and the positioning accuracy of the grating is improved.
As shown in fig. 4 and 5, which are a flowchart and a schematic block diagram of a second embodiment of the present application, this embodiment is a manufacturing process of a cylindrical grating of the first embodiment, and includes the following steps:
and S1, machining and manufacturing the substrate.
In the embodiment, the substrate is made of a high-hardness copper material and also comprises a high-hardness copper alloy material, and the substrate is manufactured and formed by a precise high-speed lathe or a slow-speed wire cutting machine.
And S2, performing black dyeing and anticorrosion treatment on the outer side surface of the substrate.
The substrate is treated by black dyeing to form a black dyeing layer for surface corrosion prevention.
And S3, performing oil stain treatment on the substrate.
And S4, drying and purifying the substrate at high temperature.
And S5, performing vacuum plating on the outer side surface of the substrate to form a titanium film.
In order to ensure that the grating bright lines have higher reflectivity, abrasion resistance and corrosion resistance to incident light, a titanium film layer suitable for photoetching is plated on the outer surface of the black dye layer by vacuum sputtering.
And S6, directly etching a grating line part on the outer side surface of the substrate by laser.
The precise laser direct-etching photoetching machine is adopted to manufacture grating line patterns, and the main principle is that a titanium film layer plated on a substrate is evaporated and etched by adopting a laser beam, a relatively coarse black-dyed layer is exposed to form non-reflective dark lines, and reflective bright lines are formed without the photoetching titanium film layer.
And S7, performing surface purification treatment on the substrate.
And cleaning the photoetched cylindrical grating by using clean high-pressure gas.
And S8, detecting the line precision of the outer side surface of the substrate.
Adopt high accuracy cylinder grating detection machine and cylinder grating observation microscope to carry out precision and line quality detection to it, main environmental condition requirement when photoetching and detection, except that the room temperature of strict anti-vibration and 20 ℃ plus or minus 1 ℃, to environmental condition's such as humidity, air current shake requirement is more loose, because photoetching and adopting when detecting is not the laser wave to measure, but adopts the vice produced moire fringe of circle grating as measuring reference signal, the personage in the industry can know: the photolithographic manufacturing errors of the circular grating and the cylindrical grating are closed within 360 degrees, that is to say: the self errors of the reference grating signals have closed-loop characteristics, and the linear expansion amount of the base material changes due to the change of the environmental temperature, so that the errors of the pickup and the output of the reference grating signals cannot be caused.
And S9, preparing a protective film on the substrate.
The transparent protective film is prepared on the surface of the cylindrical grating, and can be prepared by adopting a vacuum coating machine or an environment-friendly resin material spraying mode.
The principles and embodiments of the present application are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts of the present application. The foregoing is only a preferred embodiment of the present application, and it should be noted that there are objectively infinite specific structures due to the limited character expressions, and it will be apparent to those skilled in the art that a plurality of modifications, decorations or changes may be made without departing from the principle of the present application, and the technical features described above may be combined in a suitable manner; such modifications, variations, combinations, or adaptations of the invention using its spirit and scope, as defined by the claims, may be directed to other uses and embodiments, or may be learned by practice of the invention.
Claims (5)
1. A metal cylindrical grating is characterized by comprising a copper substrate, wherein a black dyeing layer is arranged on the outer side surface of the substrate, a titanium film layer is arranged on the surface of the black dyeing layer, a grating line part is formed on the surface of the titanium film layer through laser photoetching, dark grains of the grating line part are formed on the black dyeing layer after laser beams penetrate through the titanium film layer, and bright grains of the grating line part are formed between adjacent dark grains;
the grating line part comprises a main grating and zero position gratings on the upper side and the lower side of the main grating, dark lines and bright lines of the main grating are arranged in the same width and are uniformly distributed along the circumferential direction of the side surface of the substrate at intervals;
the line phases of the zero main gratings at the upper and lower sides of the main grating are the same, and the patterns of the dark and bright lines at the corresponding positions are opposite.
2. The metal cylinder grating as in claim 1, wherein the base body has an inner hole in the center thereof, and three conical contact structures are uniformly distributed in the circumferential direction on the inner hole.
3. The metal cylinder grating of claim 1, wherein the number of dark stripes on the null grating is at least 1.
4. The metal cylinder grating of claim 1, wherein the titanium film layer is provided in a color of gold, yellow-green, or light blue.
5. A process for manufacturing a metal cylinder grating as claimed in any one of claims 1 to 4, comprising the steps of:
machining and manufacturing a base body;
performing black dyeing anticorrosion treatment on the outer side surface of the matrix;
carrying out oil stain treatment on the matrix;
drying and purifying the matrix at high temperature;
plating a titanium film on the outer side surface of the matrix in vacuum;
directly etching a grating line part on the outer side surface of the substrate by laser;
carrying out surface purification treatment on the matrix;
carrying out line precision detection on the outer side surface of the matrix;
and preparing a protective film on the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110139793.5A CN112799161A (en) | 2021-02-02 | 2021-02-02 | Metal cylindrical grating and manufacturing process thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110139793.5A CN112799161A (en) | 2021-02-02 | 2021-02-02 | Metal cylindrical grating and manufacturing process thereof |
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| CN112799161A true CN112799161A (en) | 2021-05-14 |
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|---|---|---|---|---|
| WO2000006973A1 (en) * | 1998-07-24 | 2000-02-10 | Bishop Innovation Pty. Limited | Angle encoder |
| CN1477372A (en) * | 2002-08-21 | 2004-02-25 | 中国科学院长春光学精密机械与物理研 | Cylindrical grating shaft interference encoder |
| CN1648611A (en) * | 2004-01-26 | 2005-08-03 | 三丰株式会社 | Photoelectric encoder and method of manufacturing scales |
| CN1841097A (en) * | 2005-03-28 | 2006-10-04 | 松下电工株式会社 | Laser surface treatment |
| CN201331353Y (en) * | 2008-12-31 | 2009-10-21 | 乐凯集团第二胶片厂 | Optical coded disk |
| CN101995810A (en) * | 2009-08-19 | 2011-03-30 | 易联招 | Technology for directly etching holographic grating on metal surface with pulse laser |
| CN105953824A (en) * | 2016-06-08 | 2016-09-21 | 珠海格力节能环保制冷技术研究中心有限公司 | Photoelectric encoding disc and encoder |
| CN108688583A (en) * | 2017-03-29 | 2018-10-23 | 得立鼎工业株式会社 | Decorative element and its manufacturing method |
| CN214409369U (en) * | 2021-02-02 | 2021-10-15 | 廊坊市莱格光电仪器有限公司 | Metal cylindrical grating |
-
2021
- 2021-02-02 CN CN202110139793.5A patent/CN112799161A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000006973A1 (en) * | 1998-07-24 | 2000-02-10 | Bishop Innovation Pty. Limited | Angle encoder |
| CN1477372A (en) * | 2002-08-21 | 2004-02-25 | 中国科学院长春光学精密机械与物理研 | Cylindrical grating shaft interference encoder |
| CN1648611A (en) * | 2004-01-26 | 2005-08-03 | 三丰株式会社 | Photoelectric encoder and method of manufacturing scales |
| CN1841097A (en) * | 2005-03-28 | 2006-10-04 | 松下电工株式会社 | Laser surface treatment |
| CN201331353Y (en) * | 2008-12-31 | 2009-10-21 | 乐凯集团第二胶片厂 | Optical coded disk |
| CN101995810A (en) * | 2009-08-19 | 2011-03-30 | 易联招 | Technology for directly etching holographic grating on metal surface with pulse laser |
| CN105953824A (en) * | 2016-06-08 | 2016-09-21 | 珠海格力节能环保制冷技术研究中心有限公司 | Photoelectric encoding disc and encoder |
| CN108688583A (en) * | 2017-03-29 | 2018-10-23 | 得立鼎工业株式会社 | Decorative element and its manufacturing method |
| CN214409369U (en) * | 2021-02-02 | 2021-10-15 | 廊坊市莱格光电仪器有限公司 | Metal cylindrical grating |
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