CN111752091B - Habi类混合光引发剂在uvled光固化中的应用 - Google Patents
Habi类混合光引发剂在uvled光固化中的应用 Download PDFInfo
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- CN111752091B CN111752091B CN201910248385.6A CN201910248385A CN111752091B CN 111752091 B CN111752091 B CN 111752091B CN 201910248385 A CN201910248385 A CN 201910248385A CN 111752091 B CN111752091 B CN 111752091B
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- Prior art keywords
- meth
- habi
- acrylate
- compound
- bis
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- 238000000016 photochemical curing Methods 0.000 title claims abstract description 13
- GMIUUCWUOPOETN-UHFFFAOYSA-N 2,4,5-triphenyl-1-(2,4,5-triphenylimidazol-2-yl)imidazole Chemical compound C1=CC=CC=C1C1=NC(N2C(=C(N=C2C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C=CC=CC=2)(C=2C=CC=CC=2)N=C1C1=CC=CC=C1 GMIUUCWUOPOETN-UHFFFAOYSA-N 0.000 title claims abstract 11
- 239000011342 resin composition Substances 0.000 claims abstract description 24
- -1 bisimidazole compound Chemical class 0.000 claims description 103
- 150000001875 compounds Chemical class 0.000 claims description 43
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 33
- 125000003118 aryl group Chemical group 0.000 claims description 30
- 125000001424 substituent group Chemical group 0.000 claims description 24
- 239000000852 hydrogen donor Substances 0.000 claims description 17
- 150000002460 imidazoles Chemical class 0.000 claims description 14
- 238000010168 coupling process Methods 0.000 claims description 11
- 238000005859 coupling reaction Methods 0.000 claims description 11
- 150000001412 amines Chemical group 0.000 claims description 10
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 9
- 230000008878 coupling Effects 0.000 claims description 9
- 230000008033 biological extinction Effects 0.000 claims description 8
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 claims description 4
- WQECNJBUYKDLGS-UHFFFAOYSA-N 2-(2-methyl-2-sulfanylpropanoyl)oxyethyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(C)(S)C(=O)OCCOC(=O)C(C)(C)S WQECNJBUYKDLGS-UHFFFAOYSA-N 0.000 claims description 3
- ZUWFDHPIBGDTSU-UHFFFAOYSA-N 2-(2-methyl-2-sulfanylpropanoyl)oxypropyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(S)(C)C(=O)OC(C)COC(=O)C(C)(C)S ZUWFDHPIBGDTSU-UHFFFAOYSA-N 0.000 claims description 3
- TXJZAWRTHMZECY-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)ethyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCOC(=O)CC(C)S TXJZAWRTHMZECY-UHFFFAOYSA-N 0.000 claims description 3
- KQBUONNTLMDRIE-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)propyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(C)OC(=O)CC(C)S KQBUONNTLMDRIE-UHFFFAOYSA-N 0.000 claims description 3
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 claims description 3
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 claims description 3
- 239000008199 coating composition Substances 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
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- WYWZRNAHINYAEF-UHFFFAOYSA-N Padimate O Chemical compound CCCCC(CC)COC(=O)C1=CC=C(N(C)C)C=C1 WYWZRNAHINYAEF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 239000003999 initiator Substances 0.000 abstract description 10
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- 206010034960 Photophobia Diseases 0.000 abstract description 2
- 208000013469 light sensitivity Diseases 0.000 abstract description 2
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- 239000000047 product Substances 0.000 description 26
- 239000001294 propane Substances 0.000 description 25
- 125000003762 3,4-dimethoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- 239000007983 Tris buffer Substances 0.000 description 17
- 238000012360 testing method Methods 0.000 description 14
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- 239000002904 solvent Substances 0.000 description 10
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 10
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 9
- AZUHIVLOSAPWDM-UHFFFAOYSA-N 2-(1h-imidazol-2-yl)-1h-imidazole Chemical compound C1=CNC(C=2NC=CN=2)=N1 AZUHIVLOSAPWDM-UHFFFAOYSA-N 0.000 description 8
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000001723 curing Methods 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
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- 244000028419 Styrax benzoin Species 0.000 description 6
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- 235000008411 Sumatra benzointree Nutrition 0.000 description 6
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 6
- 229960002130 benzoin Drugs 0.000 description 6
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- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 6
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- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 5
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- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
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Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
Description
Claims (15)
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CN201910248385.6A CN111752091B (zh) | 2019-03-29 | 2019-03-29 | Habi类混合光引发剂在uvled光固化中的应用 |
JP2021557999A JP7223456B2 (ja) | 2019-03-29 | 2020-03-26 | Habi類混合光開始剤のuvled光硬化への応用 |
PCT/CN2020/081292 WO2020200019A1 (zh) | 2019-03-29 | 2020-03-26 | Habi类混合光引发剂在uvled光固化中的应用 |
KR1020217035062A KR102648080B1 (ko) | 2019-03-29 | 2020-03-26 | Habi계 혼합 광개시제의 uvled 광경화에서의 응용 |
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CN112062721B (zh) * | 2019-05-23 | 2023-06-30 | 常州正洁智造科技有限公司 | 能够提升体系稳定性的habi类光引发剂及其应用 |
CN115128899A (zh) * | 2021-03-26 | 2022-09-30 | 常州正洁智造科技有限公司 | 一种具有提升的体系色相稳定性的感光性树脂组合物 |
CN113121726A (zh) * | 2021-04-20 | 2021-07-16 | 优缔贸易(上海)有限公司 | 含有双咪唑类光引发剂的组合物及其应用 |
CN116014313A (zh) | 2021-10-22 | 2023-04-25 | 株式会社Lg新能源 | 圆筒形电池、包括它的电池组及汽车 |
CN114349886B (zh) * | 2022-01-13 | 2022-11-08 | 苏州大学 | 一种基于分子开关的光控自由基聚合方法 |
CN114751861B (zh) * | 2022-04-07 | 2023-10-20 | 浙江扬帆新材料股份有限公司 | 一种含有吡唑啉和n,n-二烷基苯甲酸酯的分子内敏化大分子光引发剂及制备方法和用途 |
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JP2022528234A (ja) | 2022-06-09 |
KR20210142189A (ko) | 2021-11-24 |
CN111752091A (zh) | 2020-10-09 |
WO2020200019A1 (zh) | 2020-10-08 |
JP7223456B2 (ja) | 2023-02-16 |
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