CN1093346A - 涂覆多层薄涂层的玻璃基体,及其在具有红外反射性能和/或太阳辐射领域内性能的窗玻璃上的运用 - Google Patents

涂覆多层薄涂层的玻璃基体,及其在具有红外反射性能和/或太阳辐射领域内性能的窗玻璃上的运用 Download PDF

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CN1093346A
CN1093346A CN94102759A CN94102759A CN1093346A CN 1093346 A CN1093346 A CN 1093346A CN 94102759 A CN94102759 A CN 94102759A CN 94102759 A CN94102759 A CN 94102759A CN 1093346 A CN1093346 A CN 1093346A
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M·S·科哈
M·V·龙多
J·P·布罗肖特
M·O·居塞林
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Saint Gobain Glass France SAS
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Abstract

本发明涉及透明的尤其是具有多层薄涂层的玻 璃基体(1),所述涂层中至少具有一层具有红外特性, 特别是低辐射性能的金属涂层(5),该金属涂层位于 两层介电材料基涂层之间,在具有红外特性的涂层 (5)的下面的涂层在靠近涂层(5)处至少具有一层润 湿层,它由氧化钽基或氧化铌基涂层(3)组成。

Description

本发明涉及透明的、特别是具有多层薄涂层的玻璃基体,这些涂层中至少具有一层能对太阳辐射以及一定波长的红外辐射起作用的金属涂层。
本发明涉及采用这种基体制造绝热和/或太阳保护窗玻璃。后者可用于装配建筑物及运输工具,用来降低空调成本和/或由不断增大乘客客车的玻璃窗表面而引起的过热。
已知的用来使基体具有特别低的辐射性能的薄涂层叠层由至少一层金属涂层,例如银层组成,该金属层位于两层介电材料层,如金属氧化物涂层之间。这种叠层通常通过使用连续真空沉积而成,例如通过任选辅助磁场的阴极溅射。
虽然银涂层基本上确定了与窗玻璃辐射性能特别有关的热特性,但该介电材料也履行着几项功能,因为它们首先会以干扰形式对该基体的光学性起作用。它们还可以使该银涂层避免化学和/或机械作用。
因此,欧洲专利申请EP-A-226993描述了一种具有在由混和的锡和锌氧化物组成的两层介电材料之间有一层银涂层的叠层。在该银涂层和每一层氧化物涂层之间的界面处,该叠层还有一层很薄的由金属,特别是由铜制成的所谓的“固定”或“成核”涂层,其目的在于增加彼此的粘接性能,从而增加该叠层的整体耐久性。
同样,为了增加该银涂层的耐蚀性,法国专利FR-B-2641271描述了一种叠层,其中在两层介电材料层之间有一层银涂层,每一层材料层由多层金属氧化物涂层组成,在该银层下面的涂层由三层上下叠放的氧化物涂层组成,其中包括氧化锡涂层,靠近银层的是氧化锌,且根据该文献,该氧化锌层用来保护银层,尤其是它将使银层不易受氧气的作用。但是,该锌层厚度是有限的,这是因为氧化锌具有较差的抵抗性,如果它过量存在,则会整个削弱整个叠层。法国专利FR-B-2641272(对应于美国专利U    S    5153054)的内容与上述法国专利十分相近,它也指出在覆盖银层的牺牲金属涂层上存在氧化锌涂层还可以对其进行保护使之免于氧化。
本发明的目的在于找到一种新型的具有功能涂层的叠层,这些功能涂层不仅具有合格的稳定性,而且它们还具有改进的热性能,特别是较低的辐射值,同时不会降低其光学性能。
本发明的另一目的(可任选与第一个目的相结合)是获得这种相同类型具有改进的光学性能,特别是高透光性的叠层,同时仍保持良好的热性能。
本发明的解决方案由透明的,特别是具有多层薄涂层组成,其中至少有一层金属涂层,该金属涂层具有太阳辐射和/或红外领域内的特性,特别是低辐射特性,该金属层位于两层介电材料层之间。根据本发明,所述的叠层设计成在该金属涂层之下的涂层中至少有一层“润湿”层,该润湿层可以由氧化钽基涂层组成,也可以由氧化铌基涂层组成,任选地该涂层可以被一层薄金属合金或金属基涂层,如镍-铬或锡覆盖。
根据本发明,具有太阳辐射和/或红外领域内性能的金属涂层优选地具有低辐射性能并且以银为基础。下文将其称为“功能涂层”。
将如上定义的叠层有关光学及热性能的特征与具有同样厚度、同样功能、但没有氧化钽或氧化铌基“润湿”涂层的叠层进行比较,可以看出本发明的叠层意外地具有较低的辐射性以及较高的透光性。因此,本发明的作者发现介电材料层,特别是在功能涂层下面的涂层的性能不仅影响保护该功能涂层的叠层的化学和/或物理稳定性,而且还影响其内在性能,例如其辐射值。
为了解释这种现象,我们可以提出一种假设,即氧化钽和氧化铌特别适于使金属涂层,例如银,适当成核并且产生较好的润湿性,即生长更为连续的涂层以及具有较少的表面间隔峰。这会使所述涂层获得特别的均匀性和更好的连续性,从而改善其操作性能。
因此,根据本发明,我们可以制备所有合适折衷方案的种类,如具有所用功能涂层的厚度和/或所需操作特征功能的类型,这是因为本发明可以在功能涂层厚度相同的情况下获得较低的辐射性,或者在厚度降低时保持辐射值不变。
本发明的主要优点在于这种折衷方案的出现不会损害与透光性特别有关的光学特性,特别是透光性,它对于建筑物及运动车辆均是很关键的。因此,在现有技术中,低辐射值只有通过增加功能涂层的厚度由此使透光性降低而获得。
优选地,与上述润湿层隔开并在功能涂层下面的涂层中有一层薄金属氧化物基涂层,如氧化锡或氧化钛,或氮化物,如氮化硅涂层。这种方案的优点如下所述。根据本发明,它可以采用一层相当薄的氧化钽或氧化钽涂层而获得所需的“润湿作用”。此外,必须确保整个下部涂层具有一定的厚度,从而保证其对功能涂层的光学干扰和保护作用。由于氧化钽或氧化铌的沉积速度不是特别高,特别是当采用阴极溅射法进行沉积时,因此应当在润湿层下面沉积一层具有很高沉积速度的介电涂层,例如氧化锡涂层。因此,可以在不将生产率明显降低的同时执行本发明,这样还会在起始物质的成本方面有所收获,因为由铌和钽制成的阴极溅射靶是比锡便宜得多的金属。
优选地,在该功能涂层上还可以沉积金属或金属合金基涂层,例如镍-铬,它被称着为“牺牲”,这是因为其作用在于当随后在其上沉积介电材料(通常采用反应性阴极溅射,即在氧气存在下)时保护该功能涂层使之免于氧化。在最终产品中,所述的牺牲涂层作为其厚度及沉积条件的一个函数被部分或完全氧化。
位于该功能涂层上面的介电材料层最好具有至少一层氧化锡基涂层和/或氧化钽基涂层和/或氮化硅涂层。由氧化锡涂层和覆盖于其上的另一种涂层,特别是氧化钽组成的结合其意义在于该氧化锡沉积速度相当高。此外,氧化钽是相当坚硬且致密的氧化物,它有效地保护整个叠层使之免遭腐蚀。因此,这样分成两层可以同时获得满意的生产速率以及十分稳定的终产物。
关于本发明的涂层及叠层的厚度,优选地是功能涂层厚度在7-12纳米之间,下部涂层的整个厚度在30-60纳米之间,在功能涂层上面的涂层的整个厚度在30-60纳米之间。
较为有利的是,形成部分“润湿”层的基于氧化钽或氧化铌的涂层的厚度为5-30纳米,优选地为5-20纳米,尤其平均为10纳米。该厚度范围适于在功能涂层的性能方面获得满意的效果。同样,牺牲涂层的厚度优选地在0.3-8纳米之间,特别是在1-3纳米之间,或甚至平均为6纳米。优选地,覆盖在润湿层中氧化钽或氧化铌涂层上的任选金属涂层应选择类似的厚度范围,尤其是在0.3-4纳米之间。
所有这些特征可以使我们制造辐射率等于或低于0.08且透光性较高并且对于双层窗玻璃其透光性达到或超过75%的窗玻璃,特别是多层密封窗玻璃。
显然,当在基体上采用多层功能涂层代替一层功能涂层,例如在三层介电材料层之间放置两层功能涂层时本发明的优点将更明显。根据本发明,较好地是对每一层功能涂层提供润湿涂层。
利用下列非限制性实施例并借助图1将对本发明的一些优点及细节作详细描述。
需要指出的是,在这些实施例中,连续薄涂层沉积均是采用磁场辅助型阴极溅射法来实现的,但此时可以采用其它任何一种采用真空并保证对所需涂层的厚度具有良好控制的方法来实现。用来沉积叠层的基体是4mm厚的钠-钙-硅玻璃基体。
在图1中,玻璃基体1被氧化钽或氧化铌涂层3覆盖,任选地该涂层可以放置在氧化锡涂层2之上,薄镍-铬合金或锡涂层4之下。随后是银基功能涂层5,其上覆盖以镍-铬基牺牲涂层6,其上是氧化锡涂层7和/或氧化钽涂层8。
沉积装置至少包括一个配有阴极的溅射室,其上配以由合适材料制成的靶,在该溅射室下面基体1连续通过。每一种涂层的沉积条件如下:
银基涂层5在8×10-3毫巴(0.8帕)压力下在氩气氛下,在银靶帮助下沉积而成。
SnO2基涂层2、7在8×10-3毫巴(0.8帕)压力下,在氧气体积,占36%的氩气/氧气气氛中、在锡靶帮助下通过反应性溅射沉积而成。
Ta2O5或Nb2O5基涂层3、8在8×10-3毫巴(0.8帕)压力下,在氧气体积约占10%的氩气/氧气气氛中,在钽靶或铌靶帮助下通过反应性溅射沉积而成。
NiCr或Sn基涂层4、6在相同压力下,在氩气气氛中在锡或镍-铬合金靶帮助下沉积而成。
基体的功率密度及传输速度以已知方式调节,以获得所需的涂层厚度。
第一批实施例涉及使用本发明的“润湿”涂层并引入氧化钽。
实施例1-6
这些实施例揭示了由本发明产生的有关低辐射特性的改进。
例1是对比例,因为它没有氧化钽润湿层。
下列表1综述每一种叠层的结构并且确定了每一涂层的厚度(纳米)。
表    1例1    例2    例3    例4    例5    例6
SnO2(2) 40 - - - 30 30
Ta2O5(3) - 38 38 38 10 10
Ni-Cr(4)    1    1    1    1    1    1
Ag(5)    9    9    7.9    9    9    9
Ni-Cr(6)    3    3    3    3    3    3
SnO2(7) 40 - - 40 - 30
Ta2O5(8) - 38 38 - 38 10
然后将涂覆过的6块基体中的每一块借助于每一块相同的玻璃基体(4毫米厚钠-钙-硅玻璃)用于双层窗玻璃中,两者用气体隔开,在目前情况下用一层空气隔开,厚度为12mm。
下列表2结果表明了,在每一个实施例中的透光率TL值(百分比)、能量透过值TE(百分比,根据亮度D65测定)、太阳因子FS(无单位,它对应于透过该窗玻璃的总能量与入射太阳能之比)、表面传热值(K因子,以W/m2K表示)以及辐射值ε(无单位)。
表 2实例 TLTEFS K ε
1    74.4    52.6    0.64    1.77    0.09
2    77.9    55.2    0.64    1.72    0.06
3    77.5    58.2    0.68    1.76    0.08
4    76.9    54.1    0.64    1.75    0.07
5    76.6    54.6    0.64    1.74    0.07
6    75.6    52.9    0.64    1.76    0.08
所有这些实施例除了例3以外均采用相同厚度的银层5,大约40nm的相同的总下部涂层2、3、4,相同厚度的上部涂层6、7、8,其厚度也大约为40nm。
比较例1和例4,例4和例1的不同之处仅在于在银层下面采用Ta2O5涂层代替了SnO2涂层,可以看出有Ta2O5涂层存在(例5)将会使辐射值由0.09降为0.07,这是一个相当大的改进。伴随着辐射值的下降,TL值由74.4%改善到76.9%,这也是不容忽视且极为有利的。
例5和例6出现了一个退步,这是因为该下部涂层在离开Ta2O5涂层的地方有第一SnO2涂层。
令人惊奇的是即使以有限的厚度,Ta2O5涂层也能对银层产生极为有益的影响,因为其辐射值保持等于或低于0.08。这两个实施例的TL值也比对比例1的TL值高,其次,分成两种下部涂层的一个不容忽略的优点在于以这种方式可以降低制造成本,钽靶比锡靶要贵得多,同时还可以提高生产速度(工业上已经证明氧化钽沉积速度低于氧化锡的沉积速度)。
因此,一切均取决于所需的性能指数。因此,例2和例3表明通过在银层5上放置相当厚的Ta2O5涂层8可以进一步改善叠层的性能。例2在银层下部有38nm厚的Ta2O5层在银层上有40nm厚的Ta2O5层,这样可以使辐射值格外降低至0.06,TL值接近78%。
另一种选择是降低银层5的厚度而不会降低叠层的性能。因此例3表明随着银层厚度大约降低12%,两层Ta2O5层的存在可以获得低到0.08的辐射率和接近78%的高TL值。此外,例3的TE值明显比例1高,两者的辐射值接近,这对于装备这种窗玻璃的旅客房间来说其整个受热水平可以获得极为有利的改进。
还应该看到在银层上放置Ta2O5涂层(辅以或没有锡层)可以使叠层的化学及物理稳定性获得极为明显的改善。
实施例7-12
为了更好地分析银层5下部的Ta2O5层3和Ni-Cr层4的影响,又进行了第二批实施例7-12,此时该叠层在银层5上没有氧化物涂层7、8。
例7是一个对比例,它在银层5下部没有Ta2O5层。
表3示出了这些例子中涂层的组成及厚度(纳米)。
表 3SnO2(2) Ta2O5(3) NiCr(4) Ag(5) NiCr(6)
例7    40    -    1    9    3
例8    -    38    -    9    3
例9    35    5    -    9    3
例10    32.5    7.5    -    9    3
例11    40    10    -    9    3
例12    25    15    -    9    3
为了评价这些叠层的性能,利用4点法,对表面电阻R
Figure 941027597_IMG2
进行了测试,R
Figure 941027597_IMG3
用平方欧姆表示。结果示于表4中。
表    4
实例 R
Figure 941027597_IMG4
7    8.0
8    6.5
9    7.8
10    7.5
11    7.2
12    7.2
通过适当取舍,可以认为该平方电阻与辐射率成正比,还可以看出即使在厚度有限的例子9和10中下部Ta2O5涂层均会导致明显改善。
这些例子还表明Ni-Cr涂层4是任选的,Ta2O5涂层本身就足以会使银层的光学性带来相当的改善。
此外,利用原子力显微分析可以获知一些有关该银层的表面状态。该分析是在2微米2表面上进行的。首先在与例7相同的叠层7′的银层(5)上进行分析,然后在例8的叠层中的银层(5)上进行分析,所述的叠层7′中没有NiCr涂层(4)。
表5中给出了峰至谷高度值(纳米)以及在涂层表面上存在的物块的横向尺寸(m.l.d.纳米)的分析结果:
表    5实例    峰至谷高度    m.l.d.
7'    11.3    30
8    10.0    70
这些数据可以按照下列内容来解释,由于峰至谷高度值较小,当在Ta2O5涂层上沉积银层而非在SnO2涂层上沉积银层时可以使该银层表面的粗糙度稍稍降低。但是,相应地,证实由本发明提供的润湿作用的物块或集块的宽度则增加好多,结果“更宽”的物块使该涂层获得更好的表面连续性,从而带来更佳的性能,尤其是在导电性方面。
下列实施例涉及使用本发明的“润湿”涂层,在该情况下该涂层是指氧化铌。
实施例13
表6概述了本发明的叠层的结构并且给出了每一涂层的厚度(纳米)。
表    6
实例13
SnO2(2) 35
Nb2O5(3) 10
Sn(4)    1
Ag(5)    10
Ni-Cr(6)    6
SnO2(7) 45
在这种叠层中,覆盖银层(5)的Ni-Cr涂层6比前面例子中的厚,这可以使携带基体的透光性稍稍降低,使该叠层的透光性达到70%以下,特别是大约60-65%。因此,某些适用需要透光性较低的窗玻璃。因此,下部的氧化铌涂层(3)以及“覆盖”银层(5)具有与氧化钽涂层相类似的作用并且至少有效,同时与氧化钽相比在起始物料的成本方面稍微有利。
综上所述,本发明在功能涂层下面具有两种新型的介电涂层,它们可以对功能涂层产生有利的影响并且在使用时十分方便。

Claims (13)

1、透明的,特别是玻璃基体(1),其上有多层薄涂层,其中至少有一层具有红外特性。尤其是低辐射性的金属涂层,该金属涂层位于两层介电材料基涂层之间,其特征在于在涂层(5)之下并且具有红外特性的涂层在靠近涂层(5)之处至少具有一层润湿层,它或者引入氧化钽基涂层(3),或者引入氧化铌基涂层。
2、根据权利要求1的基体,其特征在于该润湿层由氧化钽或氧化铌基涂层(3)组成,该涂层(3)上覆盖以金属合金或金属基涂层(4)。
3、根据权利要求2的基体,其特征在于其有红外特性的涂层(5)是以银为基础的。
4、根据权利要求2和3中一个的基体,其特征在于润湿层的金属合金或金属基涂层(4)是锡或镍-铬合金,尤其是其厚度为0.3-4纳米。
5、根据前面任一权利要求的基体,其特征在于位于具有红外特性的金属涂层(5)下面的涂层在润湿层下面至少具有一层薄的金属氧化物基涂层(2),尤其是基于氧化锡或氧化钛或氮化物如氮化硅的涂层。
6、根据前面任一权利要求的基体,其特征在于具有红外特性的涂层(5)上覆盖一种金属合金或金属基牺牲涂层(6),例如镍-铬合金,尤其是其厚度为0.3-8纳米,特别是在1-3纳米之间,或大约6纳米。
7、根据前面任一权利要求所述的基体,其特征在于在具有红外特性的涂层(5)上面的介电材料基涂层至少具有一层薄的金属氧化物涂层,特别是基于氧化锡的涂层(7)和/或基于氧化钽的涂层(8)和/或氮化硅涂层。
8、根据前面任一权利要求所述的基体,其特征在于具有红外特性的涂层(5)厚度为7-12纳米。
9、根据前面任一权利要求所述的基体,其特征在于在具有红外特性的涂层(5)下面的涂层的总厚度在30-60纳米之间。
10、根据前面任一权利要求所述的基体,其特征在于润湿层的氧化钽或氧化铌基涂层(3)其厚度为5-30纳米,优选地为5-20纳米,尤其是约为10纳米。
11、根据前面任一权利要求所述的基体,其特征在于位于具有红外特性的金属涂层(5)之上的介电材料层(6、7)其总厚度为30-60纳米。
12、根据前面任一权利要求所述的基体,其特征在于它具有包括两层具有红外特性的金属涂层(5)在内的多层薄涂层。
13、前面任一权利要求所述的基体在低辐射多层窗玻璃,特别是辐射率等于或低于0.08,且透光性TL等于或高于75%或透光性等于或低于70%,尤其约为60-65%的多层窗玻璃中的运用。
CN94102759A 1993-02-11 1994-02-09 涂覆多层薄涂层的玻璃基体,及其在具有红外反射性能和/或太阳辐射领域内性能的窗玻璃上的运用 Pending CN1093346A (zh)

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CN1067965C (zh) * 1996-07-25 2001-07-04 格拉沃贝尔公司 涂层基体及含有它的双层窗玻璃
CN102653455A (zh) * 2011-03-01 2012-09-05 苏州大学 低辐射薄膜、低辐射镀膜玻璃及其制备方法
WO2012116518A1 (zh) * 2011-03-01 2012-09-07 苏州大学 低辐射薄膜、低辐射镀膜玻璃及其制备方法
CN102653455B (zh) * 2011-03-01 2015-05-13 苏州大学 低辐射薄膜、低辐射镀膜玻璃及其制备方法
EP2682375A4 (en) * 2011-03-01 2015-06-24 Univ Soochow LOW EMISSIVITY THIN FILM, LOW EMISSIVITY LAYER GLASS AND METHOD FOR PRODUCING THE SAME
CN103643208A (zh) * 2013-11-07 2014-03-19 中山市创科科研技术服务有限公司 一种高透薄膜的制备方法

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CA2115320A1 (fr) 1994-08-12
NO940395L (no) 1994-08-12
CZ29194A3 (en) 1995-06-14
NO940395D0 (no) 1994-02-07
PL302208A1 (en) 1994-08-22
EP0611213A1 (fr) 1994-08-17
BR9400492A (pt) 1994-08-23
AU673564B2 (en) 1996-11-14
EP0611213B1 (fr) 1997-08-06
JPH06279060A (ja) 1994-10-04
FR2701475B1 (fr) 1995-03-31
ES2107759T3 (es) 1997-12-01
AU5482094A (en) 1994-08-18
DK0611213T3 (da) 1998-03-23
ATE156464T1 (de) 1997-08-15
FI940619A0 (fi) 1994-02-10
DE69404690D1 (de) 1997-09-11
US5718980A (en) 1998-02-17
DE69404690T2 (de) 1998-03-12
FR2701475A1 (fr) 1994-08-19
FI940619A (fi) 1994-08-12
TW255879B (zh) 1995-09-01

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