CN105892222A - Mask, approximate exposure machine and fabrication method of color filter - Google Patents
Mask, approximate exposure machine and fabrication method of color filter Download PDFInfo
- Publication number
- CN105892222A CN105892222A CN201610391422.5A CN201610391422A CN105892222A CN 105892222 A CN105892222 A CN 105892222A CN 201610391422 A CN201610391422 A CN 201610391422A CN 105892222 A CN105892222 A CN 105892222A
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- CN
- China
- Prior art keywords
- mask plate
- region
- size
- exposure
- central region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Filters (AREA)
Abstract
The invention provides a mask, an approximate exposure machine and a fabrication method of a color filter, belongs to the technical field of fabrication of a display device and can be used for solving the problem of non-uniform pattern sizes obtained through exposure of an existing approximate exposure machine. The sizes of a plurality of opening regions in the mask are different, so that the non-uniformity of the exposure pattern sizes caused by different exposure distances is made up, and the sizes of the exposure patterns of each opening region are equal. The mask provided by the invention is applicable to various exposure machines, and is particularly applicable to the approximate exposure machine. With the fabrication method of the color filter, provided by the invention, the exposure patterns are uniform in sizes, and the step of color filter process debugging during production can be reduced.
Description
Technical field
The invention belongs to the preparing technical field of display device, be specifically related to a kind of mask plate,
Proximity printing machine, the preparation method of colored filter.
Background technology
Prior art makes the side of colored filter many employings proximity printing machine exposure
Formula.Inventor finds that in prior art, at least there are the following problems: expose using proximity
During ray machine, if as it is shown in figure 1, mask plate 10 being divided into marginal area 11, central region
12, nucleus 13, then from figure 2 it can be seen that conduct oneself with dignity due to mask plate 10 and cause
Its nucleus 13 is bent downwardly, and the most in vertical direction, can cause its nucleus 13
With spacing between marginal area 11 and substrate 1 (or claiming exposure gap) is not of uniform size.
Concrete, exposure gap between these three region and substrate 1 be respectively G1, G2,
G3, its exposure gap ecto-entad is gradually reduced, i.e. G1 ＞ G2 ＞ G3.In conjunction with Fig. 3
Comparison diagram understand, due to during proximity printing machine optical system exposure by the angle of diffraction etc. because of
The impact of element, the dimension of picture that exposure obtains can reduce along with the reduction of exposure gap,
The dimension of picture that the exposure of marginal area 11, central region 12, nucleus 13 obtains divides
Not Wei CD1, CD2, CD3, be so the same from condition at technological parameters such as light exposures
Under, due to exposure gap G1 ＞ G2 ＞ G3, cause the dimension of picture size that exposure obtains
Heterogeneity, i.e. CD1 ＞ CD2 ＞ CD3, thus affect the quality of colored filter.
In actual production technique, as shown in Figure 4, above-mentioned difference shows as nucleus
The dimension of picture CD3 that 13 obtain is less, easily causes light leak, and marginal area 11 obtains
The dimension of picture CD1 arrived is relatively big, easily causes colour mixture, considerably increases colored filter
The difficulty of process debugging.
Summary of the invention
The present invention is directed to existing proximity printing machine and expose the dimension of picture size obtained not
Homogeneous problem, it is provided that a kind of mask plate, proximity printing machine, the system of colored filter
Preparation Method.
Solve the technology of the present invention problem be the technical scheme is that
A kind of mask plate, including multiple open regions and multiple shading region, multiple described openings
The size in district is different, so that the size of the figure of each open region exposure is equal.
Preferably, the size of multiple open regions of described mask plate is depended on to edge by center
Secondary reduction.
Preferably, described mask plate is included the core around center successively by center to edge
Heart region, central region, marginal area；The size of the open region of described marginal area is little
Size in the open region of described central region.
Preferably, the size of the open region of described nucleus is more than described central region
The size of open region.
Preferably, described marginal area includes first marginal zone adjacent with central region
And the second marginal zone around the first marginal zone；The open region of described second marginal area
The open region being smaller in size than described first marginal zone.
Preferably, described central region includes first middle region adjacent with nucleus
Territory and the second central region around the first central region, described second central region
The size of the open region being smaller in size than described first central region of open region.
The present invention also provides for a kind of proximity printing machine, including above-mentioned mask plate.
Preferably, described exposure machine also includes the exposure bench for supporting substrate, institute
Stating the spacing between mask plate and described exposure bench is 100-200nm.
Preferably, described mask plate is made up of quartz, and the thickness of described mask plate is
5-20mm。
Preferably, on vertical direction, between described marginal area and exposure bench
Away from the spacing more than described central region Yu exposure bench.
Preferably, on vertical direction, between described nucleus and exposure bench
Away from the spacing less than described central region Yu exposure bench.
The present invention also provides for the preparation method of a kind of colored filter, is included in shape on substrate
Become the step of color film, and the step by color film patterning；Described by color film patterning
Step uses above-mentioned proximity printing machine exposure to be formed.
In the mask plate of the present invention, the size of multiple open regions is different, to make up exposure gap
The exposure figure size that difference causes is uneven so that the figure of each open region exposure
Size is equal.The mask plate of the present invention is applicable to various exposure machine, is particularly suited for
Proximity printing machine.The preparation method exposure figure size of the colored filter of the present invention is equal
Even, it is possible to reduce the step of colored filter process debugging in concrete production.
Accompanying drawing explanation
Fig. 1 is the structural representation of existing mask plate；
Fig. 2 is the exposure gap schematic diagram of existing mask plate；
Fig. 3 is the dimension of picture contrast schematic diagram that the exposure of existing mask plate obtains；
Fig. 4 is that existing mask plate exposes the dimension of picture schematic diagram obtained；
Fig. 5 is the structural representation of the mask plate of embodiments of the invention 1 and embodiment 2；
Fig. 6 is that the mask plate of embodiments of the invention 2 exposes the dimension of picture contrast obtained
Schematic diagram；
Fig. 7 is that the mask plate of embodiments of the invention 2 exposes the dimension of picture signal obtained
Figure；
Fig. 8 is the structural representation of the proximity printing machine of embodiments of the invention 3；
Fig. 9 is the preparation flow figure of the colored filter of embodiments of the invention 4；
Wherein, reference is: 1, substrate；10, mask plate；11, marginal area；
12, central region；13, nucleus；2, exposure bench；3, exposure light source.
Detailed description of the invention
For making those skilled in the art be more fully understood that technical scheme, knot below
Close the drawings and specific embodiments the present invention is described in further detail.
Embodiment 1:
The present embodiment provides a kind of mask plate 10, as it is shown in figure 5, include multiple open region
With multiple shading regions, the size of multiple open regions is different, so that the exposure of each open region
The size of figure is equal.
In the mask plate 10 of the present embodiment, the size of multiple open regions is different, to make up exposure
The exposure figure size that spacing difference causes is uneven so that the figure of each open region exposure
The size of shape is equal.The mask plate 10 of the present invention is applicable to various exposure machine, especially
It is applicable to proximity printing machine.The preparation method exposure figure of the colored filter of the present invention
Size uniform, it is possible to reduce the step of colored filter process debugging in concrete production.
Embodiment 2:
The present embodiment provides a kind of mask plate 10, as illustrated in figs. 5-7, including multiple openings
District and multiple shading region, wherein, the size of multiple open regions is subtracted to edge successively by center
It is little, so that the size of the figure of each open region exposure is equal.
It is to say, owing to mask plate 10 deadweight causes its nucleus 13 to be bent downwardly,
The most in vertical direction, between multiple open regions and the substrate 1 at center to edge
Away from being gradually increased, will be sized to subtract successively by multiple open regions at center to edge
Little, the exposure figure size that exposure gap difference causes can be made up uneven so that each
The size of the figure of individual open region exposure is equal.
Preferably, mask plate 10 is included the core around center successively by center to edge
Region 13, central region 12, marginal area 11；The chi of the open region of marginal area 11
The size of the very little open region less than central region 12.
Preferably, the size of the open region of nucleus 13 is more than central region 12
The size of open region.
It is to say, as it is shown in figure 5, mask plate 10 is divided into marginal area 11, in
Region, portion 12, nucleus 13, the most as shown in Figure 6, these three region and substrate 11
Between exposure gap be respectively G1, G2, G3, its exposure gap ecto-entad is gradually
Reduce, i.e. G1 ＞ G2 ＞ G3, the open region of marginal area 11 be smaller in size than middle region
The size of the open region in territory 12, the size of the open region of nucleus 13 is more than middle region
The size of the open region in territory 12, the most as shown in Figure 7 so that the graphic scale that exposure obtains
Very little size is identical, i.e. CD1=CD2=CD3.
Preferably, marginal area 11 includes first edge adjacent with central region 12
District and the second marginal zone around the first marginal zone；The open region of the second marginal area 11
The open region being smaller in size than the first marginal zone.
Preferably, central region 12 includes in the middle part of first adjacent with nucleus 13
Region 12 and the second central region 12 around the first central region 12, in the middle part of in the of second
The size of the open region being smaller in size than the first central region 12 of the open region in region 12.
It is to say, when mask plate 10 is relatively big, (it is female that such as line production produces display floater
Plate) time, merely mask plate 10 is divided into three regions by center to edge and is designed
It is not enough to start each of which the dimension of picture size that the exposure in district obtains identical, now,
By center to edge, whole mask plate 10 is carried out further region divide, to make up
The exposure figure size that exposure gap difference causes is uneven so that each open region exposes
The size of figure equal.
Embodiment 3:
The present embodiment provides a kind of proximity printing machine, as shown in Figure 8, including above-mentioned reality
Execute the mask plate 10 of example, also include the exposure bench 2 for supporting substrate, exposure light source 3,
Spacing between mask plate 10 and exposure bench 2 is 100-200nm.
Preferably, mask plate 10 is made up of quartz, and the thickness of mask plate 10 is
5-20mm。
Wherein, due to the mask plate 10 self gravitation effect of quartz material, in vertical side
Upwards, the spacing of marginal area and exposure bench is more than between central region and exposure bench
Away from, nucleus and the spacing being smaller than central region and exposure bench of exposure bench.
And the chi of the open region being smaller in size than central region of the open region of mask plate 10 marginal area
Very little, the size of the open region of nucleus is more than the size of the open region of central region, more
The exposure figure size that benefit exposure gap difference causes is uneven so that each open region exposes
The size of the figure of light is equal.
Embodiment 4:
The present embodiment provides the preparation method of a kind of colored filter, as it is shown in figure 9, bag
Include following steps:
S01, on substrate coat one layer of color film；Wherein, color film include red resin film layer,
Green resin film layer, blue resins film layer.
S02, use above-described embodiment proximity printing machine by coloured silk film patterning.
The preparation method exposure figure size uniform of the colored filter of the present embodiment, permissible
Reduce the step of colored filter process debugging in concrete production.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present
And the illustrative embodiments used, but the invention is not limited in this.For ability
For those of ordinary skill in territory, in the situation without departing from spirit and substance of the present invention
Under, various modification and improvement can be made, these modification and improvement are also considered as the present invention's
Protection domain.
Claims (12)
1. a mask plate, including multiple open regions and multiple shading region, it is characterised in that
The size of multiple described open regions is different, so that the size of the figure of each open region exposure
Equal in magnitude.
Mask plate the most according to claim 1, it is characterised in that described mask plate
The size of multiple open regions be sequentially reduced to edge by center.
Mask plate the most according to claim 1, it is characterised in that described mask plate
Included successively around the nucleus at center, central region, marginal zone by center to edge
Territory；The open region being smaller in size than described central region of the open region of described marginal area
Size.
Mask plate the most according to claim 3, it is characterised in that described core space
The size of the open region in territory is more than the size of the open region of described central region.
Mask plate the most according to claim 3, it is characterised in that described marginal zone
Territory includes first marginal zone adjacent with central region and the second of cincture the first marginal zone
Marginal zone；The open region of described second marginal area be smaller in size than described first marginal zone
Open region.
Mask plate the most according to claim 3, it is characterised in that described middle region
Territory includes first central region adjacent with nucleus and around the first central region
Second central region, the open region of described second central region be smaller in size than described first
The size of the open region of central region.
7. a proximity printing machine, it is characterised in that include that claim 1-6 is arbitrary
Mask plate described in Xiang.
Proximity printing machine the most according to claim 7, it is characterised in that also wrap
Include the exposure bench for supporting substrate, between described mask plate and described exposure bench
Spacing is 100-200nm.
Proximity printing machine the most according to claim 7, it is characterised in that described
Mask plate is made up of quartz, and the thickness of described mask plate is 5-20mm.
Proximity printing machine the most according to claim 8, it is characterised in that institute
Stating mask plate is the mask plate described in claim 3, on vertical direction, and described limit
The spacing of edge region and exposure bench is more than the spacing of described central region with exposure bench.
11. proximity printing machines according to claim 8, it is characterised in that institute
Stating mask plate is the mask plate described in claim 4, on vertical direction, and described core
Heart region and the spacing being smaller than described central region and exposure bench of exposure bench.
The preparation method of 12. 1 kinds of colored filters, it is characterised in that be included in substrate
The upper step forming color film, and the step by color film patterning；Described by coloured silk film figure
The step changed uses the proximity printing machine exposure shape described in any one of claim 7-11
Become.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610391422.5A CN105892222A (en) | 2016-06-03 | 2016-06-03 | Mask, approximate exposure machine and fabrication method of color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610391422.5A CN105892222A (en) | 2016-06-03 | 2016-06-03 | Mask, approximate exposure machine and fabrication method of color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105892222A true CN105892222A (en) | 2016-08-24 |
Family
ID=56709891
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610391422.5A Pending CN105892222A (en) | 2016-06-03 | 2016-06-03 | Mask, approximate exposure machine and fabrication method of color filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105892222A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116644707A (en) * | 2023-07-12 | 2023-08-25 | 湖北江城芯片中试服务有限公司 | Semiconductor layout design method and semiconductor layout |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5523184A (en) * | 1993-05-21 | 1996-06-04 | Hyundai Electronics Industries Co., Ltd. | Photomask for forming high resolution photoresist patterns |
| CN1384530A (en) * | 2001-04-27 | 2002-12-11 | 株式会社东芝 | Image forming method, exposure mask for forming image and its making process |
| CN202735676U (en) * | 2012-04-16 | 2013-02-13 | 京东方科技集团股份有限公司 | Proximity exposure mask |
| CN103235486A (en) * | 2013-01-30 | 2013-08-07 | 常州同泰光电有限公司 | Method for correction of exposed pattern |
| CN103760747A (en) * | 2013-12-25 | 2014-04-30 | 深圳市华星光电技术有限公司 | Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate |
| CN103885298A (en) * | 2014-03-06 | 2014-06-25 | 京东方科技集团股份有限公司 | Exposure device and exposure system |
-
2016
- 2016-06-03 CN CN201610391422.5A patent/CN105892222A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5523184A (en) * | 1993-05-21 | 1996-06-04 | Hyundai Electronics Industries Co., Ltd. | Photomask for forming high resolution photoresist patterns |
| CN1384530A (en) * | 2001-04-27 | 2002-12-11 | 株式会社东芝 | Image forming method, exposure mask for forming image and its making process |
| CN202735676U (en) * | 2012-04-16 | 2013-02-13 | 京东方科技集团股份有限公司 | Proximity exposure mask |
| CN103235486A (en) * | 2013-01-30 | 2013-08-07 | 常州同泰光电有限公司 | Method for correction of exposed pattern |
| CN103760747A (en) * | 2013-12-25 | 2014-04-30 | 深圳市华星光电技术有限公司 | Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate |
| CN103885298A (en) * | 2014-03-06 | 2014-06-25 | 京东方科技集团股份有限公司 | Exposure device and exposure system |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116644707A (en) * | 2023-07-12 | 2023-08-25 | 湖北江城芯片中试服务有限公司 | Semiconductor layout design method and semiconductor layout |
| CN116644707B (en) * | 2023-07-12 | 2023-11-28 | 湖北江城芯片中试服务有限公司 | Semiconductor layout design method and semiconductor layout |
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| PB01 | Publication | ||
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Application publication date: 20160824 |