CN104651798B - Volume production method for multilayer film - Google Patents

Volume production method for multilayer film Download PDF

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Publication number
CN104651798B
CN104651798B CN201510081055.4A CN201510081055A CN104651798B CN 104651798 B CN104651798 B CN 104651798B CN 201510081055 A CN201510081055 A CN 201510081055A CN 104651798 B CN104651798 B CN 104651798B
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interval
buffering
carrier
plated
film
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CN104651798A (en
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王楠华
沈定宇
纪仁捷
黄原
黄一原
刘家玮
赖佩君
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Linco Technology Co Ltd
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Linco Technology Co Ltd
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Abstract

The invention discloses a volume production method for a multilayer film. The method comprises the following steps: (a) providing a coating production line with (n+1) buffer regions, n coating regions and a plurality of carriers, wherein the buffer regions and the coating regions are arranged in a vacuum cavity in an arrangement direction in turns; (b) putting a first carrier provided with a first to-be-coated object in the first buffer region; (c) setting the number of displacements in the first and second buffer regions when the first carrier executes a first coating program in the first coating region; (d) ordering the first carrier in the second buffer region and meanwhile putting a second carrier provided with a second to-be-coated object in the first buffer region; and (e) setting the number of displacements in the first and second buffer region sand the second and third buffer regions when the second carrier and the first carrier execute the first and second coating programs in the first and second coating regions. The film enters into the coating regions at the same time by virtue of the carriers, so that the coating production efficiency is improved.

Description

The mass production method of multilayer film
Technical field
The present invention relates to a kind of mass production method of film, more particularly to a kind of mass production method of multilayer film.
Background technology
Mostly it is with a plated film typically to the volume production equipment in thing coating surface multilayer film to be plated in thin film manufacture process Production line is completing.The coating film production line be along an orientation be sequentially configured with same vacuum cavity one before buffering area Between, multiple plated films respectively containing different targets it is interval, and one buffer afterwards interval, and the coating film production line also carries comprising one Tool.The coating film production line of aforementioned volume production equipment, when the mass production method of the multilayer film of thing to be plated of lot time is performed, is by this Carrier sequentially sends into the thing to be plated in the coating film production line, with respectively sequentially interval with the plated film area by the front buffering It is interior to perform each film-plating process, and it is total to be formed with one on each thing to be plated in the film-plating process for completing each plated film interval respectively After the multilayer film of thickness about tens nanometer (nm) to some tens of pm (μm), leave from the rear buffering interval of the coating film production line, The finished goods for being plated with each multilayer film of lot time is obtained.
Although at present the mass production method of above-mentioned multilayer film can volume production go out the finished goods of multilayer film secondary by the gross.But need explanation , it is equably to coat the multilayer film during volume production, the thing to be plated is in each plated film system of the interval execution of each plated film Cheng Shixu is multiple respectively at the interval generated beneath displacement of each plated film.However, at due to the interval generated beneath position of each plated film It is belonging to a plasma-based area;Therefore, it is described in the film-plating process for carrying out the multilayer film that each thickness reaches tens nanometer to some tens of pm Thing to be plated will derive problems of excessive heat because long-time is exposed to each plasma-based area.Once the thing to be plated is by heat labile material When constituted, the thing to be plated also will be deformed because of aforementioned problems of excessive heat, so that reducing the plating film quality of the finished goods Amount.
Furthermore, also for fear of the restriction of the volume production equipment, the carrier can only make this by the gross in thing to be plated to above-mentioned coating film production line Single thing to be plated after the interval film-plating process of each plated film is completed to produce its finished goods, could again again placing be next Individual thing to be plated.Therefore, the plated film for causing to be not carried out film-plating process is interval idle, and cause volume production efficiency unevident and the raising time into This puzzlement.
Jing described above understands, on the premise of the problems such as solution thing to be plated is overheated, finds out and how efficiently to utilize Each plated film interval, to lift volume production efficiency, is the person skilled of this technical field difficult problem to be broken through.
The content of the invention
It is an object of the invention to provide a kind of mass production method of multilayer film.
The mass production method of the multilayer film of the present invention, is that it is sequentially wrapped multiple things to be plated are carried out into multiple tracks plating run Containing following steps:One step (a), a step (b), a step (c), a step (d), and a step (e).
The step (a) is to provide one and has that (n+1) individual buffering is interval, the interval plated film production with multiple carriers of n plated film Line, it with the plated film interval is sequentially arranged in turn in a vacuum cavity along an orientation that the buffering is interval, n≤2 and It is positive integer.
The step (b) is in first of coating film production line buffering be interval or interval loading of second buffering is placed with the First carrier of one thing to be plated.
The step (c) is after the step (b), to make first carrier in first plated film, first plated film journey of interval execution When sequence on first thing to be plated to form first film layer, be in this first buffering be interval, second buffering it is interval both Between be moved to it is few once.
The step (d) is after the step (c), to make first carrier be located at second buffering interval or the 3rd buffering area Between, and while it is placed with second thing to be plated in first buffering interval of the coating film production line or second interval loading of buffering Second carrier, but it is conditional be, when second carrier be located at second buffering it is interval when, first carrier is to be located at the Three bufferings are interval.
The step (e) is after the step (d), with second carrier of season and first carrier respectively at first plated film First plating run of interval interior execution interval with second plated film and second plating run, with respectively at second thing to be plated It is upper with first thing to be plated on when forming first film layer with second film layer, be simultaneously respectively at first buffering it is interval, the Two buffering intervals buffer interval displacement between the two at least one times, but have ready conditions with second buffering interval, the 3rd between the two , when second carrier is located at second buffering interval, first carrier is interval positioned at the 3rd buffering.
The mass production method of the multilayer film of the present invention, the mass production method of the multilayer film is also comprising a step (f) and a step (g), and n=3.The step (f), after the step (e), makes first carrier be located at the 3rd buffering interval or the 4th buffering Interval, and it is interval positioned at second buffering interval or the 3rd buffering with second carrier of season, and while produce in the plated film First buffering interval of line or second interval loading of buffering are placed with the 3rd carrier of the 3rd thing to be plated, but have ready conditions , when the 3rd carrier is interval positioned at second buffering, second carrier is to be located at the 3rd buffering interval, and first Carrier is to be located at the 4th buffering interval.The step (g), after the step (f), with the 3rd carrier, second carrier of season Perform first in first plated film interval, second plated film interval are interval with the 3rd plated film with first carrier and plate Film program, second plating run and the 3rd road plating run, with the 3rd thing to be plated, on second thing to be plated with It is to buffer respectively at first simultaneously when first film layer, second film layer are formed on first thing to be plated with a third membrane layer Interval, second buffering is interval between the two, second buffering is interval, the 3rd buffering it is interval between the two with the 3rd buffering area Between, the interval displacement between the two of the 4th buffering at least one times, but it is conditional be, when the 3rd carrier is located at second buffering area Between when, second carrier is to be located at that the 3rd buffering be interval and first carrier is that to be located at the 4th buffering interval.
The mass production method of the multilayer film of the present invention, the step (b) is the interval load of first buffering in the coating film production line Enter to be placed with first carrier of first thing to be plated;The step (d) is to make first carrier be located at second buffering interval, and The interval loading of first buffering in the coating film production line simultaneously is placed with second carrier of second thing to be plated.
The mass production method of the multilayer film of the present invention, the step (f) is to make first carrier be located at the 3rd buffering interval, and Second buffering interval is located at second carrier of season, and while interval loading of first buffering in the coating film production line is put It is equipped with the 3rd carrier of the 3rd thing to be plated.
The mass production method of the multilayer film of the present invention, second carrier and first carrier of the step (e) is respectively at first Individual plated film first plating run of interval interior execution interval with second plated film and time spent during second plating run It is identical.
The mass production method of the multilayer film of the present invention, second carrier and first carrier of the step (e), respectively at first Individual interval, the second buffering interval of buffering buffers interval institute's displacement between the two with second buffering interval, the 3rd between the two Number of times is identical, and the speed of institute's displacement is identical.
The mass production method of the multilayer film of the present invention, the 3rd carrier of the step (g), second carrier and first carrier Respectively at first plated film interval, second plated film it is interval it is interval with the 3rd plated film in perform first plating run, second Road plating run is identical with the time spent during the 3rd road plating run.
The mass production method of the multilayer film of the present invention, the 3rd carrier of the step (g), second carrier are carried with first Tool, respectively at first buffering it is interval, second buffering is interval between the two, second buffering is interval, the 3rd buffering interval two Person is identical with the number of times of the 3rd buffering interval, the 4th buffering interval institute's displacement between the two, and the speed of institute's displacement is identical.
The mass production method of the multilayer film of the present invention, each plated film of the step (a) is interval including an at least plated film section, and The plated film section is to perform each plating run with a target respectively, and the target is made up of unlike material or by identical material Matter is constituted.
The mass production method of the multilayer film of the present invention, coating film production line of the step (a) also has one to be respectively arranged at this One inlet valve of the opposite end of vacuum cavity, an outlet valve, one are continuously provided plating interval and described in the buffering Transmitting the transmission mechanism of the carrier in film is interval, and one is back to the inlet valve for the carrier from the outlet valve Automatic back flow unit, the automatic back flow unit includes setting out chamber, being connected the inlet valve for the linking outlet valve Chamber is loaded into, and one is connected and sets out the loopback mechanism between chamber and the loading chamber in this, the loopback mechanism there is a correspondence to set out chamber set The settling section put, the lifting section that chamber setting should be loaded into for a pair, and the hop of the connection settling section and the lifting section.
The beneficial effects of the present invention is:Using the buffering interval and plated film area of sequentially taking turns stream configuration of the coating film production line Between, and be in each plated film area when coordinating the carrier to enter corresponding each plated film each road plating run of interval interior execution simultaneously Between two adjacent buffering areas between displacement, it is while performing each road plating run and not presenting idle shape to make in each plated film interval State, to effectively utilize each plated film interval and improve the utilization rate of coating film production line, and then improves production capacity.
Description of the drawings
Other features and effect of the present invention, will clearly be presented in the embodiment with reference to schema, wherein:
Fig. 1 is a schematic diagram, illustrates first of a step (c) of an embodiment of the mass production method of multilayer film of the present invention Carrier is in the interval displacement between the two of first and second of coating film production line buffering carrying out first plating run;
Fig. 2 is a schematic diagram, illustrate second of a step (e) of the embodiment with first carrier respectively first, Two buffer interval displacement between the two to carry out first and second road plating run respectively with second and third;
Fig. 3 is a schematic diagram, illustrates the 3rd, second and first carrier difference of a step (g) of the embodiment First and second, second and third with third and fourth interval displacement between the two of buffering carrying out first, second and the 3rd road respectively Plating run;
Fig. 4 is a schematic diagram, illustrate first carrier of the embodiment after each road plating run is completed with by one from A loopback mechanism in dynamic reflux unit is sent at an inlet valve of the coating film production line.
Specific embodiment
Before the present invention is described in detail, it shall be noted that in the following description content, similar component is with identical Number to represent.
It is to treat multiple refering to Fig. 1, Fig. 2, Fig. 3 and Fig. 4, an embodiment of the mass production method of multilayer film of the present invention Plating thing (not shown) carries out multiple tracks plating run, and volume production goes out on each thing to be plated to be plated with completing for a multilayer film (not shown) Product.Aforementioned finished goods can be that for example, plated surface is covered with optically coated optical mirror slip or plated surface is covered with the half of metal coating Conductor encapsulation chip etc..This embodiment of the invention is comprised the steps of:One step (a), a step (b), a step (c), a step Suddenly (d), a step (e), a step (f), and a step (g).
The step (a) is to provide a coating film production line as shown in Figure 1.Specifically, the coating film production line has (n+1) Individual buffering interval 41,42,43,44, n plated film interval 51,52,53, with multiple carriers 61,62,63,64.The buffering is interval 41st, 42,43,44 with the plated film interval 51,52,53 is sequentially arranged in turn in a vacuum cavity 1 along an orientation X, n ≤ 2 and be positive integer.
The coating film production line also has an inlet valve 2, an outlet of the opposite end for being respectively arranged at the vacuum cavity 1 Valve 3, one is continuously provided in the buffering interval 41,42,43,44 and the plated film interval 51,52,53 and to transmit The transmission mechanism 7 of the carrier 61,62,63,64, and one be back to this for the carrier 61,62,63,64 from the outlet valve 3 The automatic back flow unit 8 of inlet valve 2.The automatic back flow unit 8 includes that the linking outlet valve 3 sets out chamber 81, a rank Connect the loading chamber 82 of the inlet valve 2, and one is connected and sets out the loopback mechanism 83 between chamber 81 and the loading chamber 82 in this.The loopback Mechanism 83 has a pair lifting sections 832 that should be set out the settling section 831 for arranging of chamber 81, should be loaded into the setting of chamber 82 for a pair, and One hop 833 for connecting the settling section 831 and the lifting section 832.In this embodiment of the invention, n=3;The carrier 61, 62nd, 63,64 quantity is more than four.
Below for convenient illustrations for the sake of, from the inlet valve 2 along orientation X to the outlet valve 3, plan described slow Punching interval 41,42,43,44 is respectively designated as with the plated film interval 51,52,53, first buffering interval, 41, first plated film Interval 51, second buffering, 42, second, interval plated film interval 52, the 43, the 3rd plated film interval 53 in the 3rd buffering interval, and 4th buffering interval 44, and the carrier 61,62,63,64 is to be named as first carrier, 61, second carrier in order 62nd, the 3rd carrier 63, and the 4th carrier 64.
Each plated film interval 51,52,53 of the step (a) includes an at least plated film section, and the plated film section is difference Each plating run is performed with a target, the target is made up of unlike material or phase same material.In the enforcement of the invention In example, first, second is respectively two, one and two with the quantity of the plated film section in the 3rd plated film interval 51,52,53;This Outward, the target of the two plated films section (hereinafter referred to as front plated film Duan Yuhou plated film sections) in first plated film interval 51 is along orientation X It is sequentially by stainless steel (stainless steel;SUS) constituted with copper (Cu), the plated film section in second plated film interval 52 Target is made up of copper, and the target of the two plated films section (hereinafter referred to as front plated film Duan Yuhou plated film sections) in the 3rd plated film interval 53 Material along orientation X is made up of with stainless steel copper.
Referring again to Fig. 1, the step (b) is interval in first buffering interval 41 or second buffering of the coating film production line 42 are loaded into first carrier 61 for being placed with first thing to be plated.The step (c) is after the step (b), to make first carrier 61 when first plated film interval 51 performs first plating run to form first film layer on first thing to be plated, be in This first and second buffering 41,42 displacements between the two of interval are at least one times.In this embodiment of the invention, the step (b) is in this First buffering interval 41 of coating film production line is loaded into first carrier 61 for being placed with first thing to be plated;The step (c) is then It is target (SUS) power supply for first opening plated film section before first plated film interval 51, makes first carrier 61 in first and second buffering After interval 41,42 displacement between the two 5 times, and close target (SUS) power supply and the unlatching of plated film section before first plated film interval 51 Afterwards target (Cu) power supply of plated film section, to make first carrier 61 buffer interval 41,42 in first and second displacement is continued between the two 20 times, so as to complete first plating run of the step (c).For in detail, first carrier 61 of the step (c) is in It is that interval 41,42 displacement between the two 25 times is buffered at first and second when one plated film interval 51 performs first plating run, And aforementioned displacements number of times refers to make first carrier 61 set out to second buffering interval 42 from first buffering interval 41 It is defined as displacement for the first time, returns to first buffering interval 41 from second buffering interval 42 and be referred to as second of displacement, and with this Analogize.
Refering to Fig. 2, the step (d) be after the step (c), make first carrier 61 be located at second buffering interval 42 or 3rd buffering interval 43, and while first buffering interval 41 or second buffering interval 42 in the coating film production line is loaded into It is placed with second carrier 62 of second thing to be plated;But it is conditional to be, when second carrier 62 is located at second buffering area Between 42 when, first carrier 61 is to be located at the 3rd buffering interval 43.
Referring again to Fig. 2, the step (e) is after the step (d), with second carrier 62 of season and first 61 points of carrier First plating run and second plating run are not performed in first plated film interval 51 and second plated film interval 52, with On second thing to be plated with first thing to be plated on form first film layer with second film layer when, be simultaneously respectively at First and second buffering interval 41,42 is between the two with interval 42,43 displacements between the two of second and third buffering at least one times;But there is bar Part, when second carrier 62 is located at second buffering interval 42, first carrier 61 is to be located at the 3rd buffering interval 43。
In this embodiment of the invention, the step (d) is to make first carrier 61 positioned at second buffering interval 42, and together When be loaded into second carrier 62 being placed with second thing to be plated in first of coating film production line buffering interval 41;The step E () is then to open target (SUS) power supply of plated film section and second plated film interval 52 before first plated film interval 51 at the same time Plated film section target (Cu) power supply after, make second carrier 62 and first carrier 61 interval in first and second buffering respectively 41st, 42 between the two with second and third interval 42,43 displacement between the two of buffering 5 times after, close plated film before first plated film interval 51 Target (SUS) power supply of section simultaneously opens target (Cu) power supply of plated film section thereafter, continues to make second carrier 62 and first carries Tool 61 buffers interval 42,43 displacement between the two 20 times with second and third between the two respectively at first and second buffering interval 41,42, To be respectively completed first plating run and second plating run of the step (e);Additionally, second load of the step (e) Tool 62 and first carrier 61 perform first plated film journey in first plated film interval 51 and second plated film interval 52 Sequence is identical with the time spent during second plating run, the number of times identical (being all 25 times) of institute's displacement, and the speed of institute's displacement Rate is identical.
Refering to Fig. 3, the step (f) be after the step (e), make first carrier 61 be located at the 3rd buffering interval 43 or 4th buffering interval 44, and second buffering interval 42 or the 3rd buffering interval 43 are located at second carrier 62 of season, And while in first of coating film production line buffering interval 41 or second buffering interval 42 be loaded into be placed with the 3rd it is to be plated 3rd carrier 63 of thing;But it is conditional to be, when the 3rd carrier 63 is located at second buffering interval 42, second carrier 62 is to be located at the 3rd buffering interval 43, and first carrier 61 is to be located at the 4th buffering interval 44.
Referring again to Fig. 3, the step (g) be after the step (f), with season 63, second carrier 62 of the 3rd carrier with The execution the in 51, second, first plated film interval plated film interval 52 with the 3rd plated film interval 53 of first carrier 61 One plating run, second plating run and the 3rd road plating run, with the 3rd thing to be plated, second it is to be plated On thing with first thing to be plated on form first film layer, second film layer and a third layer film when, be simultaneously respectively at first, Two bufferings interval 41,42 between the two, second and third buffering interval 42,43 between the two with third and fourth buffering interval 43,44 Displacement between the two is at least one times;But it is conditional to be, when the 3rd carrier 63 is located at second buffering interval 42, second load Tool 62 is positioned at the 3rd buffering interval 43 and first carrier 61 is to be located at the 4th buffering interval 44.
In this embodiment of the invention, the step (f) is to make first carrier 61 positioned at the 3rd buffering interval 43, and together Second carrier 62 of season is located at second buffering interval 42, and while first buffering interval 41 in the coating film production line is carried Enter to be placed with the 3rd carrier 63 of the 3rd thing to be plated;The step (g) is opened at the same time before first plated film interval 51 Target (SUS) power supply of plated film section, target (Cu) power supply of the plated film section in second plated film interval 52 and the 3rd plated film area Between before 53 after target (Cu) power supply of plated film section, make respectively 63, second carrier 62 of the 3rd carrier and first carrier 61 in First and second buffering interval 41,42 between the two, second and third buffering interval 42,43 it is interval with third and fourth buffering between the two 43rd, after 44 displacement between the two 5 times, simultaneously close off plated film section before first plated film interval 51 target (SUS) power supply and the 3rd Target (Cu) power supply of plated film section and target (Cu) power supply of plated film section behind first plated film interval 51 is opened before plated film interval 53 With target (SUS) power supply of plated film section behind the 3rd plated film interval 53, continue to make 63, second carrier 62 of the 3rd carrier and One carrier 61 respectively at first and second buffering interval 41,42 between the two, second and third buffering interval 42,43 is between the two with the 3rd, four buffer interval 43,44 displacement between the two 20 times, to be respectively completed first plating run, the second of the step (g) Plating run and the 3rd road plating run;Additionally, 63, second carrier 62 of the 3rd carrier of the step (g) and first load Tool 61 performs first plated film in first 51, second, plated film interval plated film interval 52 and the 3rd plated film interval 53 Program, second plating run are identical with the time spent during the 3rd road plating run, and the number of times of institute's displacement is identical (to be all 25 It is secondary), and the speed of institute's displacement is identical.
The explanation that upper several sections of Jing understands that first thing to be plated being placed on first carrier 61 sequentially terminates first After road, second and the 3rd road plating run, become displacement 75 times is plated with the first film layer, the second film layer and third membrane layer First finished goods.
As shown in figure 4, the execution condition to be same as These steps, with the 4th carrier 64, the 3rd carrier of season 63 and second carrier 62 in 51, second, first plated film interval plated film interval 52 and the 3rd plated film interval 53, First plating run, second plating run and the 3rd road plating run are performed, with the 4th thing to be plated, the 3rd On individual thing to be plated with second thing to be plated on form first film layer, second film layer and the third layer film when, be simultaneously respectively In first and second buffering interval 41,42 between the two, second and third buffering interval 42,43 between the two with third and fourth buffering area Between 43,44 displacement between the two 25 times, its time phase spent when performing first, second with the 3rd road plating run respectively Together, and institute's displacement speed it is identical.The rest may be inferred, when second thing to be plated being placed on second carrier 62 sequentially terminates Firstth, after second and the 3rd road plating run, become displacement 75 times is plated with the first film layer, the second film layer and the 3rd Second finished goods of film layer.
Herein it should be noted that (referring again to Fig. 4), first finished goods being placed on first carrier 61 is through this This sets out chamber 81 to the entrance of outlet valve 3, then takes out first finished goods by a mechanical arm or manual type.Now, arrange First carrier 61 for not being placed with any thing to be plated can be driven in the compression lifting unit (not shown) for setting out chamber 81 Drop to the settling section 831, to make first carrier 61 that the command of execution is not placed with any thing to be plated by the loopback mechanism 83 It is back to after the lifting section 832 by the hop 833, then by being arranged at a compression lifting unit of the lifting section 832 (not shown) drives first carrier 61 for not being placed with any thing to be plated to rise to the loading chamber 82, mechanical to continue through one Arm or manual type place the 5th thing to be plated on first carrier 61.
Similar process is repeated continuously to be carried out, and is placed with first carrier, 61, second carrier the 62, the 3rd of thing to be plated Individual carrier 63, and the 4th carrier 64 is constantly synchronous and while respectively enters in the plated film interval being destined to go into, by each carrier 63rd, 62,61 carry each thing to be plated and complete each road plating run simultaneously, and after Wan Ge roads plating run is performed, make each carrier 64, 63rd, 62 under execution be before one plating run it is pre- be introduced between buffering area one plating run under 41,42,43 waitings, to enter One step ground is while lower one plating run of each thing to be plated that continues.Therefore, can leave unused completely in whole piece coating film production line Under situation, correctly batch quantity output thickness identical finished goods.
It is worth supplementary notes, in this embodiment of the invention, the transmission mechanism 7 corresponds to respectively described slow including seven groups The roller groups 71 that punching interval 41,42,43,44 and the plated film interval 51,52,53 are arranged, and seven independently drive it is described The servo motor 72 of roller group 71.When being embodied as, the three, the second is accordingly to put with first carrier 63,62,61 In the roller group 71 in first, second and the 3rd buffering interval 41,42,43, while controlling the servo motor 72 Actuating speed and rotation direction, to drive the roller group 71 to roll and drive the carrier 63,62,61 reciprocally to move.
As shown in the above description, the mass production method of multilayer film of the present invention be by the plated film interval 51,52,53 with it is described The configuration relation of buffering interval 41,42,43,44, at the same coordinate the carrier 61,62,63,64, the transmission mechanism 7 it is automatic with this The operational relationship of reflux unit 8, to allow the three, the second and first carriers 63,62,61 continuously interval in each plated film whereby 51st, it is to buffer interval 41,42,43,44 shift reciprocatelies respectively at described simultaneously during 52, the 53 each road plating run of interior execution.One side Face can avoid prior art in film-plating process, and the thing to be plated is exposed at the interval generated beneath of each plated film because of long-time Plasma-based area caused by problems of excessive heat;On the other hand, by means of the buffering interval 41,42,43,44 and the plated film interval 51,52, 53 configuration relation, coordinates the carrier 64,63,62,61, the transmission mechanism 7 to design with the mechanism of automatic back flow unit 8, allows The carrier 64,63,62 that each placing has thing to be plated while can perform synchronously and in each plated film interval 51,52,53 each road plated film journey Sequence, and cause overall plated film to produce to form a smooth and continual circulating production line, none of plated film interval 51, 52nd, 53 leave unused, and capacity benefit is performed to into maximum.
To be illustrated herein, the coating film production line that the above-mentioned embodiment is demonstrated only with 4 bufferings it is interval 41, 42nd, 43,44 with 3 plated film intervals 51,52,53 as a example by explain.But substantially, the plated film of the mass production method of multilayer film of the present invention The interval quantity interval with plated film of buffering in production line can be to expand upwards.Simply, the present invention is in execution multilayer The quantity point of the interval quantity of the interval quantity of the plated film of the coating film production line used during the mass production method of film, buffering and carrier Be not n, (n+1) it is individual with more than n.Understand according to the detailed description of the above-mentioned embodiment of the present invention, when the number that plated film is interval When amount extends to 4, sufficient amount of carrier must be just coordinated just to avoid plated film interval idle;Therefore, the now number of carrier Amount must be 4 or more than 4.
Also, need further supplementary notes, the detailed description of this embodiment of the invention herein, be each carrier 61,62, Perform under conditions of 63 shift numbers, displacement time and rate of displacement most simple (all identical).Certainly, as long as appropriate adjustment is every One carrier 63,62,61 is in the target for performing the number of times of each road plating run when institute's displacement, adjust each plated film interval 51,52,53 Power output, or consider stand-by period of each carrier 63,62,61 in each buffering interval 41,42,43, even each carrier 63, 62nd, in the case that 61 shift numbers when each plated film interval 51,52,53 performs each road plating run are differed, also can make Obtain the carrier 63,62,61 and simultaneously and synchronously perform lower one plating run, and allow the coating film production line fully to operate, no The problems such as idle plated film interval and wasting of resources can be produced.
In sum, the mass production method of multilayer film of the present invention, on the one hand can avoid prior art in film-plating process, described Thing to be plated is exposed to the problems of excessive heat caused by each plasma-based area because of long-time;On the other hand, each placing have thing to be plated carrier 63, 62nd, 61 synchronously and while perform each road plating run in each plated film interval 51,52,53 plated film can be made to produce to form one stream Leave unused so as to capacity benefit be performed to most in smooth and continual circulating production line, none of plated film interval 51,52,53 Greatly, so the purpose of the present invention can be reached really.
As described above, only embodiments of the invention are when limiting the scope of present invention enforcement with this, i.e., all The simple equivalence changes made according to claims of the present invention and description and modification, all still belong to the scope of the present invention.

Claims (10)

1. a kind of mass production method of multilayer film, is multiple things to be plated are carried out into multiple tracks plating run, it is characterised in that:Its bag Containing following steps:
One step (a), there is provided one has that (n+1) individual buffering is interval, the interval coating film production line with multiple carriers of n plated film, institute It with the plated film interval is sequentially arranged in turn in a vacuum cavity along an orientation to state buffering interval, n≤2 and be just whole Number;
One step (b), in first buffering interval of the coating film production line or second interval loading of buffering first is placed with First carrier of thing to be plated;
One step (c), after the step (b), make first carrier in first plated film it is interval perform first plating run with It is to buffer interval position between the two in this first buffering interval and second when forming first film layer on first thing to be plated Move at least one times;
One step (d), after the step (c), second buffering is interval or the 3rd buffering is interval to make first carrier be located at, and First buffering simultaneously in the coating film production line be interval or interval loading of second buffering is placed with the of second thing to be plated Two carriers, but conditional is that, when second carrier is located at second buffering interval, first carrier is to be located at the 3rd Buffering is interval;And
One step (e), after the step (d), with second carrier of season and first carrier respectively at first plated film interval Perform first plating run and second plating run in interval with second plated film, with second thing to be plated with It is to buffer interval and second respectively at first simultaneously when first film layer is formed on first thing to be plated with second film layer Buffering is interval to buffer interval displacement between the two at least one times with second buffering interval and the 3rd between the two, but conditional It is that, when second carrier is located at second buffering interval, first carrier is interval positioned at the 3rd buffering.
2. the mass production method of multilayer film according to claim 1, it is characterised in that:The mass production method of the multilayer film is also included One step (f) and a step (g), and n=3,
The step (f), after the step (e), the 3rd buffering is interval or the 4th buffering is interval to make first carrier be located at, and Second buffering interval is located at second carrier of season or the 3rd buffering is interval, and while in the first of the coating film production line Individual buffering is interval or second buffering is interval is loaded into the 3rd carrier for being placed with the 3rd thing to be plated, but it is conditional be, when Positioned at when buffering interval for second, second carrier is to be located at the 3rd buffering interval to 3rd carrier, and first carrier is It is interval positioned at the 4th buffering;And
The step (g), after the step (f), with the 3rd carrier, second carrier and first carrier of season respectively at first Execution first plating run, second plating run in individual plated film interval, second plated film interval are interval with the 3rd plated film With the 3rd road plating run, with the 3rd thing to be plated, on second thing to be plated with first thing to be plated on formed should It is simultaneously interval respectively at first buffering interval and second buffering when first film layer, second film layer are with a third membrane layer Between the two, second buffering is interval and the 3rd buffering interval buffers between the two interval and the 4th buffering interval two with the 3rd It is moved between person less once, but conditional is that, when the 3rd carrier is located at second buffering interval, second carrier is position Buffer in the 3rd interval and first carrier is to be located at the 4th buffering interval.
3. the mass production method of multilayer film according to claim 2, it is characterised in that:The step (b) is in the plated film production First buffering of line is interval to be loaded into first carrier for being placed with first thing to be plated;The step (d) is to make first carrier It is interval positioned at second buffering, and while interval loading of first buffering in the coating film production line is placed with second thing to be plated Second carrier.
4. the mass production method of multilayer film according to claim 3, it is characterised in that:The step (f) is to make first carrier It is interval positioned at the 3rd buffering and interval positioned at second buffering with second carrier of season, and while in the coating film production line First buffering interval be loaded into the 3rd carrier for being placed with the 3rd thing to be plated.
5. the mass production method of multilayer film according to claim 1, it is characterised in that:Second carrier of the step (e) with First carrier is plated respectively at first plated film, first plating run of interval interior execution interval with second plated film with second The spent time is identical during film program.
6. the mass production method of multilayer film according to claim 5, it is characterised in that:Second carrier of the step (e) with First carrier, interval and the 3rd are buffered respectively at first buffering interval and second buffering interval with second between the two The number of times of the interval institute's displacement between the two of buffering is identical, and the speed of institute's displacement is identical.
7. the mass production method of multilayer film according to claim 2, it is characterised in that:3rd carrier of the step (g), Two carriers and first carrier are performed in first plated film interval, second plated film interval are interval with the 3rd plated film First plating run, second plating run are identical with the time spent during the 3rd road plating run.
8. the mass production method of multilayer film according to claim 7, it is characterised in that:3rd carrier of the step (g), Two carriers and first carrier, respectively at first buffering be interval and second buffering is interval between the two, second buffering area Between and the 3rd buffering both interval with the 3rd buffering and the 4th buffering interval institute's displacement between the two number of times interval it is identical, And the speed of institute's displacement is identical.
9. the mass production method of the multilayer film according to claim 1 to 8 any claim, it is characterised in that:The step (a) Each plated film it is interval include an at least plated film section, and the plated film section is to perform each plating run with a target respectively, The target is to be made up of unlike material or be made up of phase same material.
10. the mass production method of the multilayer film according to claim 1 to 8 any claim, it is characterised in that:The step A the coating film production line of () also has an inlet valve, an outlet valve of an opposite end for being respectively arranged at the vacuum cavity Door, one are continuously provided the interior transmission mechanism to transmit the carrier interval in the interval and described plated film of the buffering, and one The automatic back flow unit of the inlet valve is back to from the outlet valve for the carrier, the automatic back flow unit includes a linking The outlet valve sets out chamber, one is connected the loading chamber of the inlet valve, and one is connected and is set out between chamber and the loading chamber in this There is a correspondence to set out the settling section of chamber setting, should be loaded into the lifting section of chamber setting for a pair for loopback mechanism, the loopback mechanism, and One hop for connecting the settling section and the lifting section.
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CN1970828A (en) * 2005-11-26 2007-05-30 鸿富锦精密工业(深圳)有限公司 Method and apparatus for forming multilayer coating on die
CN101970714A (en) * 2007-12-27 2011-02-09 埃克阿泰克有限责任公司 Multi-pass vacuum coating systems
CN203401544U (en) * 2013-06-27 2014-01-22 东莞市锦诚机械有限公司 Plate jointing machine with a panel fastener lifting returning mechanism

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TW201213572A (en) * 2010-09-29 2012-04-01 Hon Hai Prec Ind Co Ltd Sputtering apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1970828A (en) * 2005-11-26 2007-05-30 鸿富锦精密工业(深圳)有限公司 Method and apparatus for forming multilayer coating on die
CN101970714A (en) * 2007-12-27 2011-02-09 埃克阿泰克有限责任公司 Multi-pass vacuum coating systems
CN203401544U (en) * 2013-06-27 2014-01-22 东莞市锦诚机械有限公司 Plate jointing machine with a panel fastener lifting returning mechanism

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