CN103247509B - A kind of plasma processing device - Google Patents
A kind of plasma processing device Download PDFInfo
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- CN103247509B CN103247509B CN201210028082.1A CN201210028082A CN103247509B CN 103247509 B CN103247509 B CN 103247509B CN 201210028082 A CN201210028082 A CN 201210028082A CN 103247509 B CN103247509 B CN 103247509B
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Abstract
The invention provides a kind of plasma processing device, comprise reaction chamber, the thimble system for promoting workpiece to be machined movement being fixed on the hoisting mechanism on the locular wall of described reaction chamber and being connected with described hoisting mechanism, described hoisting mechanism comprises driver element and transfer unit, one end of described transfer unit is connected with described thimble system, the other end is connected with described driver element, by described transfer unit by the transmission of power of described driver element to described thimble system, straight reciprocating motion is done to make described thimble system, wherein, described driver element is linear electric motors, the stator of described linear electric motors is fixed on described reaction chamber, described transfer unit is connected with the mover of described linear electric motors.Plasma processing device provided by the invention not only volume is little, and structure is simple, and machining accuracy is high.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, be specifically related to a kind of plasma processing device.
Background technology
Plasma processing device is the common equipment of processing semiconductor device, such as etching, sputters, in the technical process such as physical vapour deposition (PVD) and chemical vapour deposition (CVD), usually needs make workpiece to be machined increase by hoisting mechanism or decline.
Typical plasma processing device comprises reaction chamber and is fixed on the hoisting mechanism on the locular wall of reaction chamber.Hoisting mechanism comprises electric rotating machine, linear motion unit and top flat unit, and wherein, linear motion unit is in order to be converted to rectilinear motion by rotary motion, and its one end is connected with electric rotating machine by shaft coupling, and the other end fixes top flat unit.Top flat unit is for carrying workpiece to be machined.Rotating and reverse of electric rotating machine, makes top flat unit realize straight reciprocating motion, thus workpiece to be machined can be made to increase or decline.
Above-mentioned hoisting mechanism drives top flat unit motion by electric rotating machine, large for complex structure, volume rotary motion being converted to the linear motion unit of rectilinear motion, causes the bulky of plasma processing device, installation and maintenance difficulty.In actual use, owing to needing the change-over time of being changed to rectilinear motion by rotary motion, extend the reaction speed of hoisting mechanism, reduce the machining accuracy of plasma processing device.
Summary of the invention
For solving the problem, the invention provides a kind of plasma processing device, not only volume is little for it, and structure is simple, and machining accuracy is high.
A kind of plasma processing device is provided for realizing object of the present invention, comprise reaction chamber, the thimble system for promoting workpiece to be machined movement being fixed on the hoisting mechanism on the locular wall of described reaction chamber and being connected with described hoisting mechanism, described hoisting mechanism comprises driver element and transfer unit, one end of described transfer unit is connected with described thimble system, the other end is connected with described driver element, by described transfer unit by the transmission of power of described driver element to described thimble system, straight reciprocating motion is done to make described thimble system, wherein, described driver element is linear electric motors, the stator of described linear electric motors is fixed on described reaction chamber, described transfer unit is connected with the mover of described linear electric motors.
Wherein, described transfer unit comprises support unit and the fixed block for described thimble system being connected with described support unit, described support unit is connected with the mover of described linear electric motors, described support unit is relative to the stator moving linearly of described linear electric motors, and described fixed block is fixed on described support unit.
Wherein, the slide block being provided with guide rail and matching with described guide rail between described support unit with described linear electric motors, described guide rail is fixed on the stator of described linear electric motors, and described slide block is fixed on described support unit, described support unit by described slide block along described slide.
Wherein, described support unit comprises connecting portion and is separately positioned on the first extension of two ends and second extension of described connecting portion, described first extension is vertical with described connecting portion with the second extension, described first extension, described second extension and described connecting portion are formed and lack square box on one side, and in the vertical direction of described connecting portion, described first extension is shorter than described second extension, described mover is connected with described first extension, described slide block is fixed on the inner side of described connecting portion, described guide rail is arranged on the described stator face relative with described connecting portion, described fixed block is arranged on the outside of described connecting portion.
Wherein, described support unit comprises connecting portion and is separately positioned on the first extension of two ends and second extension of described connecting portion, described first extension is vertical with described connecting portion with the second extension, described first extension, described second extension and described connecting portion composition lack square box on one side, and in the vertical direction of described connecting portion, described first extension is shorter than described second extension, described mover is connected with described first extension, described slide block is fixed on the inner side of described second extension, described guide rail is arranged on the described stator face relative with described second extension, described fixed block is arranged on the outside of described connecting portion.
Wherein, between described support unit and the stator of described linear electric motors, be provided with self-locking device, for support unit described in locking and the relative motion between the stator of described linear electric motors.
Wherein, plasma processing device comprises the monitoring means for the position and translational speed measuring described workpiece to be machined, and described monitoring means is arranged between the stator of described support unit and described linear electric motors.
Wherein, described monitoring means comprises grating read head and grating scale, and described grating read head is arranged on described support unit, and described grating scale is arranged on the stator of described linear electric motors; Or described grating read head is arranged on the stator of described linear electric motors, described grating scale is arranged on described support unit, obtains position and the translational speed of described workpiece to be machined by described grating read head and grating scale.
Wherein, plasma processing device comprises control unit, and described control unit is connected with described linear electric motors and described monitoring means, and described control unit is used for the speed of service of linear electric motors according to the Position Control of the described workpiece to be machined monitored.
The present invention has following beneficial effect:
Plasma processing device provided by the invention adopts linear electric motors to drive thimble system to realize straight reciprocating motion, thus the linear motion unit eliminated in order to rotary motion to be converted to rectilinear motion, and then simplify the structure of plasma processing device, reduce volume, and be conducive to the installation and maintenance of plasma processing device.In addition, adopt linear electric motors to drive thimble system can improve the reaction speed of hoisting mechanism, and then improve the machining accuracy of plasma processing device.
Accompanying drawing explanation
Fig. 1 is the structure diagram of embodiment of the present invention plasma processing device;
Fig. 2 is the exploded view of the hoisting mechanism of embodiment of the present invention plasma processing device;
Fig. 3 a is the right view of the hoisting mechanism of embodiment of the present invention plasma processing device; And
Fig. 3 b is the profile along A-A line in Fig. 3 a.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with accompanying drawing, plasma processing device provided by the invention is described in detail.
Fig. 1 is the structure diagram of embodiment of the present invention plasma processing device.Refer to Fig. 1, plasma processing device comprises reaction chamber 20, the electrostatic chuck 21 in order to carry workpiece to be machined 22, the hoisting mechanism that is arranged on the thimble system 23 below electrostatic chuck 21 and is fixed on the locular wall of reaction chamber 20.Thimble system 23 is for being placed on the workpiece to be machined jack-up on electrostatic chuck 21 surface or workpiece to be machined being placed on the surface of electrostatic chuck 21.Hoisting mechanism is used for providing actuating force for thimble system 23.
Hoisting mechanism comprises the driver element 25 and the transfer unit 24 that provide power, and wherein, one end of transfer unit 24 is connected with driver element 25, and the other end is connected with thimble system 23.Transfer unit 24 for by the transmission of power of driver element 25 to thimble system 23, rise to make thimble system 23 or decline.Particularly, thimble system 23 moves upward and makes the top of thimble system 23 exceed the upper surface of electrostatic chuck 21 under the driving of driver element 25, thus will workpiece to be machined 22 jack-up on electrostatic chuck 21 surface be placed on, or move downward and make the top of thimble system 23 lower than the upper surface of static determinacy chuck 21, thus workpiece to be machined 22 being placed on the upper surface of electrostatic chuck 21.
Fig. 2 is the exploded view of the hoisting mechanism of embodiment of the present invention plasma processing device, the mover 4 in Fig. 2, guide rail 5 and slide block 6 from home position to the left side translation of installing component 10; Support unit 7 and fixed block 11 from home position to the front translation of installing component 10; Self-locking device 16, grating read head 8 and grating scale 9 from home position to the right side translation of installing component 10.Fig. 3 a is the right view of the hoisting mechanism of embodiment of the present invention plasma processing device.Fig. 3 b is the profile along A-A line in Fig. 3 a.See also Fig. 2, Fig. 3 a and Fig. 3 b, in the present embodiment, driving mechanism 25 is linear electric motors, and the stator 1 of linear electric motors is connected with the locular wall of reaction chamber by installing component 10, thus is fixed on the locular wall of reaction chamber by linear electric motors.In the air gap that mover 4 is arranged on stator 1 and along the air gap moving linearly of stator 1.
Transfer unit comprises support unit 7 and the fixed block 11 for being connected with thimble system.Wherein, support unit 7 comprises connecting portion 71 and is separately positioned on first extension 73 and second extension 72 of two ends of connecting portion 71, first extension 73 is vertical with connecting portion 71 with the second extension 72, and the first extension 73, second extension 72 and connecting portion 71 are formed and lack square box on one side, and in the vertical direction of connecting portion 71, the first extension 73 to the second extension 72 is short.
In the present embodiment, the first extension 73 is connected with mover 4, namely by mover 4 Direct driver support unit 7.First extension 73 can be connected with mover 4 by connected modes such as welding, riveted joint, bolts.Fixed block 11 is arranged on the outside of connecting portion 71, drives support unit 7 under the driving of mover 4, drive fixed block 11 moving linearly at mover 4.
In the outside of stator 1 and the position relative with connecting portion 71 is provided with guide rail 5, accordingly, the slide block 6 matched with guide rail 5 is provided with in the inner side of connecting portion 71, support unit 7 moves along guide rail 5, guide rail 5 is utilized to share the weight of part support unit 7, fixed block 11 and thimble system 23, thus the operation making hoisting mechanism stable.
In the present embodiment, between the inner side and stator 1 of the second extension 72, be provided with self-locking device 16, for the relative motion between locking support unit 7 and stator 1.When there is the accidents such as power down when hoisting mechanism, support unit 7 can be locked by self-locking device 16, thus improve the stability of hoisting mechanism.
The present embodiment plasma processing device also comprises the monitoring means for the position and/or translational speed measuring workpiece to be machined, monitoring means comprises grating read head 8 and grating scale 9, grating read head 8 is arranged on the inner side of support unit 7, grating scale 9 is arranged on the stator 1 and the surface relative with inside support unit 7 accordingly, when support unit 7 and stator 1 carry out relative motion, position and the translational speed of support unit 7 can be obtained by grating read head 8 and grating scale 9, thus position and the translational speed of workpiece to be machined can be obtained.
The present embodiment plasma processing device also comprises control unit (not shown), the input of control unit is connected with monitoring means, the output of control unit is connected with linear electric motors, and the position of the workpiece to be machined that control unit monitors according to detecting unit controls the speed of service of linear electric motors.
It should be noted that; in the present embodiment; the slide block 6 being provided with guide rail 5 and matching with guide rail 5 between the inner side of connecting portion 71 and the surface relative to connecting portion 71 of stator 1; but in actual applications; between the inner side that guide rail 5 and slide block 6 can also arrange the second extension 72 and stator 1; and slide block 6 is fixed on the inner side of the second extension 72; guide rail 5 is arranged on the surface relative to the second extension 72 of stator 1; this can reach object of the present invention equally, should be considered as protection scope of the present invention.
Also it should be noted that, in the present embodiment, between the inner side that self-locking device 16 is arranged on the second extension 72 and stator 1, but be not limited thereto in actual applications, between the inner side that can also be arranged on connecting portion 71 and stator, as long as be arranged on the position between support unit 7 and stator 1, the object of the relative motion between locking support unit 7 of the present invention and stator 1 all can be reached.
Also it should be noted that; in the present embodiment; grating read head 8 is arranged on the inner side of support unit 7; grating scale 9 is arranged on the surface relative with the inner side of support unit 7 of stator 1 accordingly; but be not limited thereto in actual applications, can also arrange on the stator 1 by grating read head 8, grating scale 9 is arranged on support unit 7; this can reach object of the present invention equally, should be considered as protection scope of the present invention.
In sum, plasma processing device provided by the invention, it is by driving the reciprocating motion in the straight direction of thimble system by linear electric motors, the linear motion unit in order to rotary motion to be converted to rectilinear motion can be saved, thus simplify the structure of plasma processing device, reduce volume, and be conducive to the installation and maintenance of plasma processing device; In addition, adopt linear electric motors to drive thimble system can improve the reaction speed of hoisting mechanism, and then improve the machining accuracy of equipment.
Be understandable that, the illustrative embodiments that above execution mode is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (7)
1. a plasma processing device, comprise reaction chamber, the thimble system for promoting workpiece to be machined movement being fixed on the hoisting mechanism on the locular wall of described reaction chamber and being connected with described hoisting mechanism, described hoisting mechanism comprises driver element and transfer unit, one end of described transfer unit is connected with described thimble system, the other end is connected with described driver element, by described transfer unit by the transmission of power of described driver element to described thimble system, straight reciprocating motion is done to make described thimble system, it is characterized in that, described driver element is linear electric motors, the stator of described linear electric motors is fixed on described reaction chamber, described transfer unit is connected with the mover of described linear electric motors,
Described transfer unit comprises support unit and the fixed block for described thimble system being connected with described support unit, described support unit is connected with the mover of described linear electric motors, described support unit is relative to the stator moving linearly of described linear electric motors, described fixed block is fixed on described support unit, the slide block being provided with guide rail and matching with described guide rail between described support unit with described linear electric motors, described guide rail is fixed on the stator of described linear electric motors, described slide block is fixed on described support unit, described support unit by described slide block along described slide.
2. plasma processing device according to claim 1, it is characterized in that, described support unit comprises connecting portion and is separately positioned on the first extension of two ends and second extension of described connecting portion, described first extension is vertical with described connecting portion with the second extension, described first extension, described second extension and described connecting portion are formed and lack square box on one side, and in the vertical direction of described connecting portion, described first extension is shorter than described second extension, described mover is connected with described first extension, described slide block is fixed on the inner side of described connecting portion, described guide rail is arranged on the described stator face relative with described connecting portion, described fixed block is arranged on the outside of described connecting portion.
3. plasma processing device according to claim 1, it is characterized in that, described support unit comprises connecting portion and is separately positioned on the first extension of two ends and second extension of described connecting portion, described first extension is vertical with described connecting portion with the second extension, described first extension, described second extension and described connecting portion composition lack square box on one side, and in the vertical direction of described connecting portion, described first extension is shorter than described second extension, described mover is connected with described first extension, described slide block is fixed on the inner side of described second extension, described guide rail is arranged on the described stator face relative with described second extension, described fixed block is arranged on the outside of described connecting portion.
4. plasma processing device according to claim 1, is characterized in that, between described support unit and the stator of described linear electric motors, be provided with self-locking device, for support unit described in locking and the relative motion between the stator of described linear electric motors.
5. plasma processing device according to claim 1, is characterized in that, comprise the monitoring means for the position and translational speed measuring described workpiece to be machined, described monitoring means is arranged between the stator of described support unit and described linear electric motors.
6. plasma processing device according to claim 5, is characterized in that, described monitoring means comprises grating read head and grating scale, and described grating read head is arranged on described support unit, and described grating scale is arranged on the stator of described linear electric motors; Or described grating read head is arranged on the stator of described linear electric motors, described grating scale is arranged on described support unit, obtains position and the translational speed of described workpiece to be machined by described grating read head and grating scale.
7. plasma processing device according to claim 6, it is characterized in that, comprise control unit, described control unit is connected with described linear electric motors and described monitoring means, and described control unit is used for the speed of service of linear electric motors according to the Position Control of the described workpiece to be machined monitored.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210028082.1A CN103247509B (en) | 2012-02-08 | 2012-02-08 | A kind of plasma processing device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210028082.1A CN103247509B (en) | 2012-02-08 | 2012-02-08 | A kind of plasma processing device |
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| CN103247509A CN103247509A (en) | 2013-08-14 |
| CN103247509B true CN103247509B (en) | 2016-04-20 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0443831A2 (en) * | 1990-02-21 | 1991-08-28 | Canon Kabushiki Kaisha | Motion guiding device |
| CN102214593A (en) * | 2010-03-24 | 2011-10-12 | 株式会社安川电机 | Processing-object-supporting mechanism, supporting method, and conveying system including the mechanism |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050263070A1 (en) * | 2004-05-25 | 2005-12-01 | Tokyo Electron Limited | Pressure control and plasma confinement in a plasma processing chamber |
| JP2011199218A (en) * | 2010-03-24 | 2011-10-06 | Dainippon Screen Mfg Co Ltd | Substrate conveyance device and substrate inspection system using the same |
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- 2012-02-08 CN CN201210028082.1A patent/CN103247509B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0443831A2 (en) * | 1990-02-21 | 1991-08-28 | Canon Kabushiki Kaisha | Motion guiding device |
| CN102214593A (en) * | 2010-03-24 | 2011-10-12 | 株式会社安川电机 | Processing-object-supporting mechanism, supporting method, and conveying system including the mechanism |
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Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |