CN102998779A - Varifocal photoetching objective lens system - Google Patents
Varifocal photoetching objective lens system Download PDFInfo
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- CN102998779A CN102998779A CN2012102798182A CN201210279818A CN102998779A CN 102998779 A CN102998779 A CN 102998779A CN 2012102798182 A CN2012102798182 A CN 2012102798182A CN 201210279818 A CN201210279818 A CN 201210279818A CN 102998779 A CN102998779 A CN 102998779A
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Abstract
The invention relates to a varifocal photoetching objective lens system, belongs to the technical field of optics and solves the problem that mask plate exposure patterns different in proportion cannot be exposed by a same existing photoetching objective lens. The varifocal photoetching objective lens system sequentially comprises an object surface, a first lens group, a second lens group, a third lens group, a fourth lens group, a fifth lens group and an image surface from the object surface to the image surface. The object surface is a plane where a mask plate is located, the first lens group is used for fixing the distance between the object surface and a first lens of the varifocal system, the second lens group functions in changing the focal of a photoetching objective lens and the size of the image surface, the third lens group functions in compensating moving of the image surface during moving of a zoom group so as to enable the image surface to be kept fixed during zooming, the fourth lens group is provided with a negative power, a fifth lens group is provided with a positive power, the fourth lens group and the fifth lens group form a rear fixing group which is used for guaranteeing constant distance between the last lens, close to one side of the image surface, of the photoetching objective lens and the image surface, and the image surface is a plane where an etching substrate is located.
Description
Technical field
The invention belongs to optical technical field, be specifically related to a kind of varifocal lithographic objective system.
Background technology
Lithographic equipment is a kind of very important equipment in the photoetching technique of modern high resolving power integrated circuit fabrication process.The lithographic objective system is vital core component in the lithography equipment.Lithographic equipment has mask lithography device and maskless lithography device two large classes by whether adopting mask plate mainly to be divided into, and two kinds of photolithographicallpatterned adopt projection lithography exposure form mostly.Have the mask lithography device with the exposure figure information projection on the mask plate to the etching substrate; To the etching substrate, the etching substrate presents the exposure figure information on the mask plate by complicated technologies such as developments the maskless lithography device with the exposure figure information projection of spatial light modulator.But the lithographic objective system adopts fixed-focus system substantially, the an i.e. cover lithographic objective system a kind of exposure figure of ratio of mask plate or digital light modulator that can only expose to, the varifocal function of lithographic objective in the same lithographic equipment can't be implemented in, namely presenting of mask plate exposure figure different proportion size can not be realized.
Summary of the invention
The present invention is fixed-focus system in order to solve existing lithographic objective, can't realize same lithographic objective expose to the problem of mask plate exposure figure of different proportion size, and a kind of varifocal lithographic objective system is provided.
Technical scheme of the present invention is:
A kind of varifocal lithographic objective system is followed successively by from the object plane to image planes: object plane, first lens group, the second lens combination, the 3rd lens combination, the 4th lens combination, the 5th lens combination and image planes;
Object plane is plane, mask plate place;
The first lens group is front fixedly group, has positive light coke, is used for the fixedly distance of object plane and zoom system first lens;
The second lens combination is the zoom group, has negative power, plays the effect that changes lithographic objective focal length and image planes size;
The 3rd lens combination is the compensation group, has positive light coke, and effect is the movement of compensation image planes in zoom group moving process, and image planes are fixed the holding position in whole zoom process;
The 4th lens combination has negative power, and the 5th lens combination has positive light coke, and both consist of rear fixedly group, is used for guaranteeing that lithographic objective is constant near last a slice lens and the image planes distance of image planes one side;
Image planes are plane, etching substrate place.
Described a kind of varifocal lithographic objective system comprises 22 lens altogether, near object plane one side to being arranged in order near image planes one side.
Described first lens group is comprised of first lens to the three lens, and first lens is that biconvex positive lens, the second lens are that the recessed negative lens in the left protruding right side and the 3rd lens are the thin positive lens of biconvex.
Described the second lens combination is comprised of the 4th lens and the 5th lens, the 4th lens are the protruding thin negative lens in the left recessed right side, the 5th lens are double-concave negative lens, and the rear surface of the 4th lens is identical with the front surface radius-of-curvature of the 5th lens, but the 4th lens and the 5th lens can be joined together or infinite approach.
Described the 3rd lens combination is comprised of the 6th lens and the 7th lens, and the 6th lens and the 7th lens are the biconvex positive lens.
Described the 4th lens combination is comprised of the 8th lens to the 12 lens, and the 8th lens are the protruding positive meniscus lens in the left recessed right side, and the 9th lens to the 12 lens are the protruding negative lens in the left recessed right side, and the 12 lens, the 13 lens are double-concave negative lens; The rear surface of the 8th lens is identical with the front surface radius-of-curvature of the 9th lens, but the 8th lens and the together glue-bondable or infinite approach of the 9th lens.
Described the 5th lens combination is comprised of the 14 lens to the 22 lens, the 14 lens are the protruding positive lens in the left recessed right side, the 15 lens are the biconvex positive lens, the 16 lens and the 17 lens are the recessed positive lens in the left protruding right side, the 18 lens are the recessed negative lens mirror in the left protruding right side, the 19 lens are double-concave negative lens, and the 20 lens are the recessed positive lens in the left protruding right side, and the 21 lens and the 22 lens are the recessed positive meniscus lens in the left protruding right side.
The principle of work explanation: first lens group G1 compresses the telecentric beam of object space into the zoom group, the second lens combination G2 is that the zoom group moves to four varifocal positions from left to right, the i.e. compensation group of the 3rd lens combination G3 simultaneously from left to right the mobile movement that compensates image planes in the zoom group moving process simultaneously the object space telecentric beam is pressed into the 4th lens combination again, the 4th lens combination is put upside down light beam and is incided the 5th lens combination the 5th lens combination that is comprised of ten lens and mainly finish the correction of aberration and generation as Fang Yuanxin.Control object plane O is always 805mm to the distance of image planes I in whole zoom process, and object plane is 147.5733mm to the distance of first lens front surface, and the 22 lens rear surface is 3.5mm to the distance of image planes.
The invention has the beneficial effects as follows: the present invention is combined in varifocal and two core structures far away in the system, realizes the high-resolution image quality of different multiplying in a group for photo etching objective system; All lens of light varifocal lithographic objective of the present invention are spherical mirror, and the total length of optics, clear aperture are less, and compact conformation has reduced difficulty of processing and manufacturing cost.
Description of drawings
Fig. 1 is the structural representation of optical system of the present invention when four zoom positions.
Fig. 2 is the transport function of optical system of the present invention when zoom position zoom1.
Fig. 3 is optical system of the present invention transport function during out of focus 1 μ m when zoom position zoom1.
Fig. 4 is curvature of field figure and the distortion figure of optical system of the present invention when zoom position zoom1.
Fig. 5 is the transport function of optical system of the present invention when zoom position zoom2.
Fig. 6 is optical system of the present invention transport function during out of focus 1 μ m when zoom position zoom2.
Fig. 7 is the curvature of field and the distortion figure of optical system of the present invention when zoom position zoom2.
Fig. 8 is the transport function of optical system of the present invention when zoom position zoom3.
Fig. 9 is optical system of the present invention transport function during out of focus 1 μ m when zoom position zoom3.
Figure 10 is the curvature of field and the distortion figure of optical system of the present invention when zoom position zoom3.
Figure 11 is the transport function of optical system of the present invention when zoom position zoom4.
Figure 12 is optical system of the present invention transport function during out of focus 1 μ m when zoom position zoom4.
Figure 13 is the curvature of field and the distortion figure of optical system of the present invention when zoom position zoom4.
Figure 14 is the distortion figure of optical system of the present invention when zoom position zoom1.
Figure 15 is the structural representation of optical system of the present invention when zoom position zoom2
Figure 16 is the distortion figure of optical system of the present invention when zoom position zoom2.
Figure 17 is the structural representation of optical system of the present invention when zoom position zoom3.
Figure 18 is the distortion figure of optical system of the present invention when zoom position zoom3.
Figure 19 is the structural representation of optical system of the present invention when zoom position zoom4.
Figure 20 is the distortion figure of optical system of the present invention when zoom position zoom4.
Embodiment
Below in conjunction with accompanying drawing embodiment is further specified.
Embodiment 1: as shown in Figure 1, the present invention provides a kind of refraction type varifocal lithographic objective system of the 410nm of being operated in wavelength by the structure of zoom1, be used for the pattern of object plane O is imaged on image planes I, it is comprised of 22 optical lenses, be L1 ~ L22 to image planes one side with lens markings from object plane one side, these 22 optical lenses are divided into G1 ~ G5 group by focal power and the effect in system of the present invention, the distribution of focal power is followed successively by Negative-Positive-Negative-negative-just from the object plane to image planes, object plane is 805mm to the image planes distance, maximum eyeglass is unified less than 153mm in the system, and is several 2 as square F, as number formulary value aperture 0.2, enlargement ratio is 0.25, image planes size 14.8mm.
The concrete structure of varifocal lithographic objective system:
First lens group G1 has positive light coke, comprises that three lens are first lens L1 ~ the 3rd lens L3, and wherein, first lens L1 is the biconvex positive lens, and the second lens L2 is the recessed negative lens in the left protruding right side (the right is towards image planes), and the 3rd lens L3 is the thin positive lens of biconvex.First lens L1 adopts the purpose of biconvex positive lens to be the outer field rays of axle is forced down, avoid the generation of the excessive clear aperture of eyeglass, the second lens L2 can provide larger spherical aberration, the barrel distortion of while balance first lens L1, the 3rd lens L3 adopts thin positive lens to proofread and correct the excessive positive Petzval curvature of field that the second lens L2 produces.
The second lens combination G2 has negative power, comprise two lens i.e. the 4th lens L4 and the 5th lens L5, wherein the 4th lens L4 is the protruding negative lens in the left recessed right side (right convex surface is towards image planes), the 5th lens L5 is double-concave negative lens, wherein the left concave curvature radius of the right convex surface of the 4th lens L4 and the 5th lens L5 equates, the 4th lens L4 and the 5th lens L5 interval infinitely small (be easy to process can be with the 4th lens L4, the 5th lens L5 does two gummeds and processes), better, the second lens combination G2 adopts less eyeglass number, guarantee simultaneously the generation of negative power, fundamental purpose has 2 points: reduce eyeglass quantity in the second lens combination G2 zoom group as far as possible and made the eyeglass quantity minimizing of whole system and then can shorten system's overall length, make system architecture compact, the barrel distortion of proofreading and correct on the other hand first lens group G1.
The 3rd lens combination G3 has positive light coke, comprise two lens i.e. the 6th lens L6 and the 7th lens L7, the 6th lens L6 and the 7th lens L7 are the biconvex positive lens, two mirrors produce larger positive light coke, group appears at the system front portion by way of compensation, fundamental purpose is to work as the function that the second lens combination G2 keeps image planes not to be moved in the zoom process and realizes system's zoom, the lens of two other positive light coke can be proofreaied and correct the positive spherical aberration of front two groups of lens, the 6th lens L6 and the 7th lens L7 produce negative meridian and sagittal coma, compensate front two groups larger positive coma, proofread and correct simultaneously the positive Petzval curvature of field that the second lens combination G2 produces.
The 4th lens combination G4 has negative power, comprise i.e. the 8th lens L8 ~ the 13 lens L13 of six-element lens, the 8th lens L8 is the protruding positive lens in the left recessed right side, the 9th lens L9, the tenth lens L10, the 11 lens L11 are the protruding negative lens in the left recessed right side, the 12 lens L12, the 13 lens L13 are double-concave negative lens, wherein the left concave curvature radius of the right convex surface of the 8th lens L8 and the 9th lens L9 equates, interval infinitely small (for easy to process doing processed two the gummed).Because through the intimate optical axis that is parallel to of the marginal ray of each visual field after the first three groups lens combination, to produce very large aberration when converging directly on the image planes at rear arrangement of mirrors sheet negligible amounts, aberration is very serious when especially larger in picture number formulary value aperture, the lens combination that the 4th lens combination G4 outwards disperses certain angle and back with incident light consists of a protuberance, monochrome correction aberration.
The 5th lens combination G5 has positive light coke, and it is maximum to bear focal power, and the image quality of image planes in the comprehensive compensation zoom process produces the illumination of each visual field homogeneous and large picture number formulary value aperture value simultaneously.Comprise i.e. the 14 lens L14 ~ the 22 lens L22 of nine lens, the 14 lens L14 is the protruding positive meniscus lens in the left recessed right side, the 15 lens L15 is the biconvex positive lens, the 16 lens L16 is two prominent positive meniscus lenss, the 17 lens L17 is the recessed positive lens in the left protruding right side, the 18 lens L18 is the recessed negative lens in the left protruding right side, the 19 lens L19 is double-concave negative lens, the 20 lens L20 is the recessed positive lens in the left protruding right side, the 21 lens L21, the 22 lens L22 is the recessed positive meniscus lens in the left protruding right side, the 18 lens L18 wherein, the 19 lens L19 is mainly used in the primary spherical aberration that the balanced system positive lens produces, last two left sides recessed positive meniscus lens L21 in the protruding right side, L22 mainly proofreaies and correct curvature of the image.
Below table 1 provides is system's design parameter of each eyeglass in the varifocal lithographic objective when being in the zoom1 position, every a slice lens front and rear surfaces radius-of-curvature, refractive index have been recorded, the spacing distance of dispersion Abbe number and lens thickness or adjacent two lens surfaces (unit at radius-of-curvature and thickness or interval is mm).
Table 1: the optical system structure parameter list of implementation example.
Principle according to variable focal length optical system need to provide the corresponding number list of all zoom positions, and table 2 is corresponding space-number value lists of four zoom positions of the present invention (variable spacing D1, variable spacing D2, variable spacing D3 unit are mm).
Table 2: four corresponding space-number value lists in zoom position.
| The convergent-divergent multiplying power | Variable spacing D1 | Variable spacing D2 | Variable spacing D3 |
| -0.4× | 5.169 | 18.901 | 144.545 |
| -0.35× | 46.991 | 19.021 | 103.053 |
| -0.3× | 93.777 | 19.714 | 55.574 |
| -0.25× | 146.918 | 21.345 | 0.800 |
In above-mentioned specific embodiment 1, as shown in Figure 2, the transport function figure of this optical system, as seen each visual field transport function when 500cl/mm all greater than 0.4.As shown in Figure 3, it is inaccurate that focusing occurs in real work, the transport function figure when producing 1 μ m out of focus, and as seen each visual field transport function all approaches when 500cl/mm or greater than 0.4.As shown in Figure 4, the curvature of field of embodiment and distortion.
Because there are four zoom positions in lithographic objective of the present invention system, be respectively zoom1, zoom2, zoom3, zoom4, be respectively 0.25,0.3,0.35,0.4 as number formulary value aperture in zoom1, zoom2, zoom3, zoom4 position, the zoom1 pantograph ratio is-0.4, the zoom2 pantograph ratio is-0.35, the zoom3 pantograph ratio is-0.3, the zoom4 pantograph ratio is-0.25, object plane can be dwindled 2.5 times to dwindling 4 times, be respectively 2,1.75,1.5,1.25 as square F number in zoom1, zoom2, zoom3, zoom4 position.
The implementation method of same other three zoom position situations can be with reference to above-mentioned description at zoom1 position embodiment 1.
Embodiment 2:
As shown in Figure 5, the present invention is at the structural representation of zoom position zoom2, and as shown in Figure 6, this optical system is at the transport function figure of zoom position zoom2, as shown in Figure 7, and the transport function figure during out of focus 1 μ m, as shown in Figure 8, the curvature of field and distortion figure.
Embodiment 3:
As shown in Figure 9, the present invention is at the structural representation of zoom position zoom3, as shown in figure 10, and the transport function figure of this optical system, as shown in figure 11, the transport function figure during out of focus 1 μ m, as shown in figure 12, the curvature of field and distortion figure.
Embodiment 4:
As shown in figure 13, the present invention is at the structural representation of zoom position zoom4, and as shown in figure 14, this optical system is at the transport function figure of zoom4 position, as shown in figure 15, and the transport function figure during out of focus 1 μ m, as shown in figure 16, the curvature of field and distortion figure.
Equally, when above-mentioned three zoom positions, each visual field (0.0 of optical system, 0.3,0.5,0.7,1.0 meridian and sagitta of arc direction) transport function all near diffraction limit, the transfer function values of each visual field all approaches or greater than 0.4 when 500cl/mm, simultaneously under the situation of 1 μ m out of focus occurs in system, still can keep good transfer function values, the transfer function values of each visual field all approaches or greater than 0.4 when 500cl/mm, the curvature of field and distortion value at three each zoom positions are all less, the curvature of field is less than 5 μ m, astigmatism is less than 6um, each visual field maximum distortion is less than 0.007%, maximum absolute distortion is less than 0.563 μ m, in the impact of distortion of having satisfied elimination in the situation of resolution, provide good picture element.
Namely can obtain having the varifocal lithographic objective system of variable power by above-mentioned setting.
The present invention synthesizes the core structures two far away of the object space heart far away and picture Fang Yuanxin with 22 global face lens combination, object space chief ray and all be parallel to optical axis as square chief ray, its convergence center is at the infinite point of object space and picture side, and convergent-divergent multiplying power and illuminance of image plane that this pair heart lithographic objective far away system can avoid the out of focus owing to object plane to make the mistake are inhomogeneous.
Varifocal lithographic objective of the present invention system is made of five lens combination, from object plane to receiving plane focal power distribution condition be: Negative-Positive-Negative-negative-just, diaphragm is positioned at the first lens of first lens group, whole optical system is comprised of 22 global face lens, the combination of multiple lens shape and focal power is the outer visual field of axis calibration aberration effectively, obtains preferably image quality.Realize anamorphosis function by the position of adjusting zoom group, compensation group, in front fixing group and the rear fixedly group various combination of lens guaranteed image planes different during just by the position holding position constant, object plane and image planes are 805mm apart from perseverance, front fixing group first lens and the last a slice lens distance perseverance of rear fixedly group are 655.4mm, the compact conformation Effective Raise system's transmitance.The employing of whole world face lens greatly reduces difficulty of processing, is convenient to actual production and processing manufacturing.The present invention a kind ofly can provide variable power, has high resolving power, little, the used lenses negligible amounts of distortion, and maximum caliber is less, the lithographic objective of compact conformation.
Claims (10)
1. varifocal lithographic objective system, it is characterized in that, be followed successively by to image planes one side from object plane one side: object plane (O), first lens group (G1), the second lens combination (G2), the 3rd lens combination (G3), the 4th lens combination (G4), the 5th lens combination (G5) and receiving plane (I);
Object plane (O) is plane, mask plate place;
First lens group (G1) is front fixedly group, has positive light coke, is used for the fixedly distance of object plane (O) and zoom system first lens;
The second lens combination (G2) is the zoom group, has negative power, plays the effect that changes lithographic objective focal length and image planes size;
The 3rd lens combination (G3) is the compensation group, has positive light coke, and effect is the movement of compensation image planes in zoom group moving process, and image planes are fixed the holding position in whole zoom process;
The 4th lens combination (G4) has negative power, and the 5th lens combination (G5) has positive light coke, and both consist of rear fixedly group, is used for guaranteeing that lithographic objective is constant near last a slice lens and the image planes distance of image planes one side;
Image planes (I) are plane, etching substrate place.
2. a kind of varifocal lithographic objective according to claim 1 system is characterized in that varifocal lithographic objective system comprises 22 lens altogether, near object plane one side to being arranged in order near image planes one side.
3. a kind of varifocal lithographic objective according to claim 1 system is characterized in that first lens group (G1) is comprised of first lens to the three lens, and first lens is that biconvex lens, the second lens are that diverging meniscus lens and the 3rd lens are biconvex lens.
4. a kind of varifocal lithographic objective according to claim 1 system, it is characterized in that, the second lens combination (G2) is comprised of the 4th lens and the 5th lens, the 4th lens are thin negative lens, the 5th lens are negative lens, and the rear surface of the 4th lens is identical with the front surface radius-of-curvature of the 5th lens, but the 4th lens and the 5th lens can be joined together or infinite approach.
5. a kind of varifocal lithographic objective according to claim 1 system is characterized in that the 3rd lens combination (G3) is comprised of the 6th lens and the 7th lens, and the 6th lens are biconvex lens, and the 7th lens are biconvex lens.
6. a kind of varifocal lithographic objective according to claim 1 system, it is characterized in that, the 4th lens combination (G4) is comprised of the 8th lens to the 12 lens, and the 8th lens are that positive meniscus lens, the 9th lens are that diverging meniscus lens, the tenth lens to the 12 lens are thin diverging meniscus lens; And the rear surface of the 8th lens is identical with the front surface radius-of-curvature of the 9th lens, but the 8th lens and the 9th lens can be joined together or infinite approach.
7. a kind of varifocal lithographic objective according to claim 1 system, it is characterized in that, the 5th lens combination (G5) is comprised of the 13 lens to the 22 lens, the 13 lens are thick negative lens, and the 14 lens to the 15 lens are positive lens, and the 17 lens are positive meniscus lens, the 18 lens are thick meniscus lens, the 19 lens are negative lens, and the 20 lens are thin positive lens, and the 21 lens and the 22 lens are thick positive lens.
8. a kind of varifocal lithographic objective according to claim 1 system is characterized in that maximum lens are unified less than 153mm in the lithographic objective system.
9. a kind of varifocal lithographic objective according to claim 1 system, it is characterized in that, the overall length of lithographic objective system is 805mm, the overall length 655.4mm of optical lens group, object plane (O) is 147.5733mm to the distance of first lens front surface, and the 22 lens rear surface is 3.5mm to the distance of image planes (I).
10. a kind of varifocal lithographic objective according to claim 1 system is characterized in that the operation wavelength of lithographic objective system is 410nm.
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| CN104049347A (en) * | 2014-06-20 | 2014-09-17 | 福建福光数码科技有限公司 | Compact type oversized-image-plane continuous zooming lens |
| CN104062748A (en) * | 2014-07-17 | 2014-09-24 | 张家港中贺自动化科技有限公司 | Multiplying power adjustment method of wide spectral line projection optical system |
| CN105445933A (en) * | 2015-12-22 | 2016-03-30 | 中国科学院长春光学精密机械与物理研究所 | High-resolution ratio moon edge optical imaging objective lens |
| CN110045492A (en) * | 2019-04-26 | 2019-07-23 | 中国科学院长春光学精密机械与物理研究所 | The microcobjective optical system of wide spectrum large-numerical aperture ultra-high throughput |
| CN110716298A (en) * | 2019-10-29 | 2020-01-21 | 福建福光天瞳光学有限公司 | 1.1-inch large-target-surface 16-mm-focus high-definition low-distortion industrial lens and manufacturing method thereof |
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| CN104049347A (en) * | 2014-06-20 | 2014-09-17 | 福建福光数码科技有限公司 | Compact type oversized-image-plane continuous zooming lens |
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| CN105445933A (en) * | 2015-12-22 | 2016-03-30 | 中国科学院长春光学精密机械与物理研究所 | High-resolution ratio moon edge optical imaging objective lens |
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| CN110045492A (en) * | 2019-04-26 | 2019-07-23 | 中国科学院长春光学精密机械与物理研究所 | The microcobjective optical system of wide spectrum large-numerical aperture ultra-high throughput |
| CN110045492B (en) * | 2019-04-26 | 2024-03-15 | 中国科学院长春光学精密机械与物理研究所 | Wide-spectrum large-numerical aperture ultrahigh-flux micro-objective optical system |
| CN110716298A (en) * | 2019-10-29 | 2020-01-21 | 福建福光天瞳光学有限公司 | 1.1-inch large-target-surface 16-mm-focus high-definition low-distortion industrial lens and manufacturing method thereof |
| WO2021185181A1 (en) * | 2020-03-20 | 2021-09-23 | 华为技术有限公司 | Zoom lens, camera module and terminal device |
| CN111856735A (en) * | 2020-07-10 | 2020-10-30 | 宁波永新光学股份有限公司 | Objective lens for 40 times biological observation |
| CN112612128A (en) * | 2020-12-24 | 2021-04-06 | 西安中科立德红外科技有限公司 | Medium-wave infrared refrigeration continuous zoom lens with large target surface and small F number and optical system |
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