CN100357092C - Method for preparing micron planar bravais lattice or chain lattice on polymer surface - Google Patents
Method for preparing micron planar bravais lattice or chain lattice on polymer surface Download PDFInfo
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- CN100357092C CN100357092C CNB2005100949173A CN200510094917A CN100357092C CN 100357092 C CN100357092 C CN 100357092C CN B2005100949173 A CNB2005100949173 A CN B2005100949173A CN 200510094917 A CN200510094917 A CN 200510094917A CN 100357092 C CN100357092 C CN 100357092C
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- 229920000642 polymer Polymers 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 14
- 238000002360 preparation method Methods 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000004952 Polyamide Substances 0.000 claims abstract description 6
- 229920002647 polyamide Polymers 0.000 claims abstract description 6
- 150000004291 polyenes Chemical class 0.000 claims abstract description 6
- 239000002253 acid Substances 0.000 claims description 6
- 229920006254 polymer film Polymers 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 3
- 239000004005 microsphere Substances 0.000 claims description 2
- 238000013021 overheating Methods 0.000 claims description 2
- 229920006149 polyester-amide block copolymer Polymers 0.000 claims description 2
- 229920006324 polyoxymethylene Polymers 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims 1
- 238000003825 pressing Methods 0.000 abstract description 2
- 230000006399 behavior Effects 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 238000007731 hot pressing Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920000728 polyester Polymers 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000001338 self-assembly Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
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Abstract
The present invention discloses a method for preparing a submicron two-dimensional bravais lattice and a chain array on the surface of polymers, which belongs to nanometer/micron microstructure materials and the preparation technique thereof. The polymers of the submicron two-dimensional bravais lattice and the chain array on the surface of polymers provided by the present invention are high polymers of polyene, polyester, polyamide, etc. which have obvious mechanical yielding behaviors; the two-dimensional bravais lattice comprises all two-dimensional basic bravais lattices, namely a hexagon, a square, an oblong, a rhombus and a quadrate. The preparation method adopts a mold pressing and stretching method, namely a colloidal crystal mold plate is firstly utilized to be combined with a heat treatment technique for preparing a submicron printing mold; a submicron hexagonal lattice is prepared by hot-pressing mold releasing; then, the lattice structures of the hexagon, the square, the rhombus, the oblong, the quadrate, etc. and the surface microstructures of the chain, etc. are prepared by controllable stretching. The present invention has the characteristics of capability of preparation of all types of two-dimensional basic bravais lattices, adjustable and precise range of lattice parameter width, wide application range of polymeric materials, low cost, easy operation, no need of complicated equipment and techniques, capability of rapid production in bulk, etc.
Description
One, technical field
The present invention relates to a kind of polymer surfaces sub-micron two dimension Bravias lattice and chain array preparation method.
Two, background technology
Two dimension sub-micron periodic surface micro-structural is a technology with important application background.Because the periodicity of array and the wide usable range of material, two dimension sub-micron periodic surface micro-structural shows novel optics, electricity, magnetics, catalysis and special surface characteristic, has a wide range of applications in information storage, Optical Electro-Chemistry catalysis, sensor, field such as antifouling.Two dimension sub-micron periodically polymer surfaces micro-structural has important scientific research value and application prospect equally, and the surface topography that for example changes polymer can be regulated and control its hydrophobicity performance on a large scale continuously; The behavior important influence such as absorption of the surface micro-structure pair cell of polymer; They in addition can directly apply to fields such as antifog, antifouling.The preparation method of periodic surface micro-structural mainly contains technology such as photoetching, little printing, die at present, but photoetching preparation cost height.Though but large tracts of land such as little printing, die are duplicated, the die needed photoetching technique that still depends on costliness the more important thing is that above-mentioned technology is difficult to regulate and control easily surperficial lattice type.
Three, summary of the invention
1, goal of the invention: the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method that the purpose of this invention is to provide the polymer that a kind of technology is simple, cost is low.
2, technical scheme: submicron polymer two-dimentional Bravias lattice in surface of the present invention and chain array, it has the surperficial two-dimentional Bravias lattice and the chain of submicron order polymer, and its preparation method may further comprise the steps:
(1) arranges sub-micron/micron silica (SiO by self-assembling technique at polymer surfaces
2) microballoon, the two-dimension single layer micro-sphere array of acquisition large tracts of land high-sequential, heat treatment in insulating box then uses HF (chemical corrosion method) acid corrosion to remove SiO at last
2Microballoon obtains polymer stamp;
(2) utilize above-mentioned polymer stamp in another thin polymer film surface imprint, put into insulating box demoulding after Overheating Treatment, the surface micro-structure of step (1) resulting polymers die is copied to another thin polymer film surface;
(3) regulate and control the extensibility and the draw direction of another polymer, realize the non-homogeneous extension of microcosmic of another polymer, form surface micro-structures such as lattice structure and chain.
3, beneficial effect: the present invention compared with prior art has following outstanding advantage:
(1) can be according to self assembly SiO
2The granular size of the size regulation and control gained surface Bravias lattice of microballoon, adjustable continuously from hundreds of nanometer to tens micron.
(2) self assembly in conjunction with heat treatment technics prepare die not light requirement quarter etc. complex technology, greatly reduced cost.
(3) it is adjustable continuously to obtain basic Bravias lattice types of all two dimensions and chain and lattice parameter precision.
(4) the suitable material scope is wide, and non-brittle film is all applicable.
(5) technology is simple, and is less demanding to equipment, and expense is cheap.
Four, description of drawings
Fig. 1 is the schematic diagram of preparation process, wherein (A) SiO
2The microballoon self assembly; (B) heat treatment; (C) HF acid corrosion; (D) pressing mold; (E) demoulding; (F) controlled stretching.
Fig. 2 is the sem photograph of all basic Bravias lattice structures.
Fig. 3 is the sem photograph of the chain structure of preparation.
Five, the specific embodiment
Among the present invention, the thin polymer film that is stamped is the high polymer that polyene, polyester or polyamide etc. have obvious mechanics yield behavior.
Embodiment 1: the present invention includes self assembly and prepare the design of die technology in conjunction with heat treatment technics with definite; The preparation method of the two-dimentional Bravias lattice in submicron polymer surface, chain array.The steps include:
1, utilize self-assembling technique with SiO
2Microballoon is arranged in polycarbonate surface, then at 140～180 ℃ of following heat treatment 1min～24h, utilizes HF acid with SiO after the cooling naturally
2Template is removed and is promptly got required die.Die is placed another polymer polyene film surface, handle 1min～60min down, can get the two-dimentional hexagonal lattice structure of polymer surfaces after the demoulding at 100～140 ℃.
2, be different amounts with the above-mentioned thin polymer film that makes along [10] or [11] direction extensibility of two-dimentional hexagonal lattice, can obtain two-dimentional Bravais lattice of different lattice types.
Embodiment 2: utilize self-assembling technique with SiO
2Microballoon is arranged in polyamide surface, then at 160 ℃ of following heat treatment 5h, utilizes HF acid with SiO after the cooling naturally
2Template is removed and is obtained die.Die is placed the polyethylene film surface, handle 30min down, can get the two-dimentional hexagonal lattice structure on polyene surface after the demoulding, see Fig. 2 (A) at 120 ℃.
Is 0.414 with above-mentioned film along hexagonal lattice [10] direction extensibility, is 0.25 promptly to get rectangular lattice along [10] the direction extensibility in gained four directions then, sees Fig. 2 (B).
Embodiment 3: is 0.414 with the film among the embodiment 2 along hexagonal lattice [10] direction extensibility, promptly gets cubic dot matrix, sees Fig. 2 (C).
Embodiment 4: is 0.25 with the film among the embodiment 2 along hexagonal lattice [10] direction extensibility, promptly gets rhombohedral lattice, sees Fig. 2 (D).
Embodiment 5: is 0.5 with the film among the embodiment 2 along hexagonal lattice [10] direction and each extensibility of [11] direction, promptly gets the non-close heap dot matrix of six sides, sees Fig. 2 (E).
Embodiment 6: is 0.25 with the film among the embodiment 2 along hexagonal lattice [10] direction extensibility, is 0.5 promptly to get oblique square lattice along the rhombohedral lattice extensibility of gained then, sees Fig. 2 (F).
Embodiment 7: is 3.1 with the film among the embodiment 2 along hexagonal lattice [10] direction extensibility, promptly gets chain structure, sees Fig. 3.
Embodiment 8: utilize self-assembling technique with SiO
2Microballoon is arranged in the polyformaldehyde surface, then at 300 ℃ of following heat treatment 20h, utilizes HF acid with SiO after the cooling naturally
2Template is removed and is obtained die.Die is placed the polyamide film surface, handle 10min down, can get the two-dimentional hexagonal lattice structure on polyene surface after the demoulding at 120 ℃.
Claims (9)
1, a kind of surperficial sub-micron two dimension Bravias lattice and chain array preparation method of polymer is characterized in that this method may further comprise the steps:
(1) arranges sub-micron/micron SiO by self-assembling technique at polymer surfaces
2Microballoon, the two-dimension single layer micro-sphere array of acquisition large tracts of land high-sequential, heat treatment in insulating box is then removed SiO with the HF acid corrosion at last
2Microballoon obtains polymer stamp;
(2) utilize above-mentioned polymer stamp in another thin polymer film surface imprint, put into insulating box demoulding after Overheating Treatment, the surface micro-structure of step (1) resulting polymers die is copied to another thin polymer film surface;
(3) regulate and control the extensibility and the draw direction of another polymer, realize the non-homogeneous extension of microcosmic of this polymer, form various six sides or four directions or rhombus or rectangular or oblique dot matrix or chain battle array body structure surface micro-structurals such as side.
2, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 1 is characterized in that in step (1) said polymer stamp material is a high softening-point low elasticity polymer.
3, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 2 is characterized in that described polymer stamp material is Merlon, polyamide or polyformaldehyde.
4, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 1 is characterized in that in step (1), described heat treatment temperature is 80～300 ℃; Time is 1min～24h.
5, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 1 is characterized in that in step (2), the material of described another polymer is the high polymer with obvious mechanics yield behavior.
6, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 5, the material that it is characterized in that described another polymer is polyene, polyester or polyamide.
7, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 1, it is characterized in that in step (2), the heat treatment temperature of impression is the softening point temperature that is higher than another polymer, is lower than the softening point temperature of the polymer in the step (1) simultaneously; Time is 1min～60min.
8, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 1, it is characterized in that in step (3), said two-dimentional Bravias lattice comprises basic Bravais lattice of all two dimensions, i.e. six sides, four directions, rectangular, rhombus and tiltedly square.
9, the surperficial sub-micron two dimension Bravias lattice and the chain array preparation method of polymer according to claim 1 is characterized in that in step (3) said chain array is that the chain spacing is adjustable, chain internal particle spacing is adjustable.
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| CNB2005100949173A CN100357092C (en) | 2005-10-20 | 2005-10-20 | Method for preparing micron planar bravais lattice or chain lattice on polymer surface |
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| CN100357092C true CN100357092C (en) | 2007-12-26 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101737707B (en) * | 2008-11-12 | 2012-01-11 | 苏州维旺科技有限公司 | Light diffusion sheet for back light module and manufacture method thereof |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103569952B (en) * | 2013-11-12 | 2016-01-20 | 无锡英普林纳米科技有限公司 | The preparation method of one-dimensional Polymers periodic micro structure |
| CN105160099B (en) * | 2015-09-02 | 2018-06-26 | 中国科学院长春光学精密机械与物理研究所 | The free transplantation method of artificial micro-structure material |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1451992A (en) * | 2003-05-20 | 2003-10-29 | 武汉光迅科技有限责任公司 | Method for mfg. changeable scintilation optical grating |
| CN1517723A (en) * | 2003-01-27 | 2004-08-04 | ���ǵ�����ʽ���� | Method for manufacturing microlens array |
| CN1602569A (en) * | 2002-02-08 | 2005-03-30 | 松下电器产业株式会社 | Semiconductor light-emitting device and its manufacturing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1602569A (en) * | 2002-02-08 | 2005-03-30 | 松下电器产业株式会社 | Semiconductor light-emitting device and its manufacturing method |
| CN1517723A (en) * | 2003-01-27 | 2004-08-04 | ���ǵ�����ʽ���� | Method for manufacturing microlens array |
| CN1451992A (en) * | 2003-05-20 | 2003-10-29 | 武汉光迅科技有限责任公司 | Method for mfg. changeable scintilation optical grating |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101737707B (en) * | 2008-11-12 | 2012-01-11 | 苏州维旺科技有限公司 | Light diffusion sheet for back light module and manufacture method thereof |
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