CH525705A - Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen - Google Patents

Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen

Info

Publication number
CH525705A
CH525705A CH494969A CH494969A CH525705A CH 525705 A CH525705 A CH 525705A CH 494969 A CH494969 A CH 494969A CH 494969 A CH494969 A CH 494969A CH 525705 A CH525705 A CH 525705A
Authority
CH
Switzerland
Prior art keywords
vortex
carry out
chemical reactions
out chemical
plasma torches
Prior art date
Application number
CH494969A
Other languages
English (en)
Inventor
Jakob Dr Silbiger
Tibor Dipl Ing Kugler
Original Assignee
Lonza Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH1925968A external-priority patent/CH508412A/de
Application filed by Lonza Ag filed Critical Lonza Ag
Priority to CH494969A priority Critical patent/CH525705A/de
Priority to NO04820/69A priority patent/NO127094B/no
Priority to DE19691961339 priority patent/DE1961339A1/de
Priority to GB1297388D priority patent/GB1297388A/en
Priority to BE743039D priority patent/BE743039A/xx
Priority to DE19691962989 priority patent/DE1962989A1/de
Priority to US885927A priority patent/US3649497A/en
Priority to US885929A priority patent/US3658673A/en
Priority to NL6919179A priority patent/NL6919179A/xx
Priority to NL6919285A priority patent/NL6919285A/xx
Priority to NO05095/69A priority patent/NO127095B/no
Priority to GB1297389D priority patent/GB1297389A/en
Priority to SE6917835A priority patent/SE381575B/xx
Priority to FR6945017A priority patent/FR2027085A1/fr
Priority to FR6945016A priority patent/FR2027608A1/fr
Priority to JP44103547A priority patent/JPS5022986B1/ja
Publication of CH525705A publication Critical patent/CH525705A/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0615—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium
    • C01B21/0617—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium with vanadium, niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/90—Carbides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/02—Halides of titanium
    • C01G23/026—Titanium trichloride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/341—Arrangements for providing coaxial protecting fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3468—Vortex generators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Soil Working Implements (AREA)
  • Plasma Technology (AREA)
CH494969A 1968-12-24 1969-04-01 Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen CH525705A (de)

Priority Applications (16)

Application Number Priority Date Filing Date Title
CH494969A CH525705A (de) 1968-12-24 1969-04-01 Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen
NO04820/69A NO127094B (de) 1968-12-24 1969-12-05
DE19691961339 DE1961339A1 (de) 1968-12-24 1969-12-06 Verfahren zur Durchfuehrung chemischer Reaktionen
GB1297388D GB1297388A (de) 1968-12-24 1969-12-11
BE743039D BE743039A (de) 1968-12-24 1969-12-12
DE19691962989 DE1962989A1 (de) 1968-12-24 1969-12-16 Verfahren zur Durchfuehrung chemischer Reaktionen
US885929A US3658673A (en) 1968-12-24 1969-12-17 Process for carrying out chemical reactions
US885927A US3649497A (en) 1968-12-24 1969-12-17 Process for carrying out chemical reactions
NL6919179A NL6919179A (de) 1968-12-24 1969-12-22
NL6919285A NL6919285A (de) 1968-12-24 1969-12-23
NO05095/69A NO127095B (de) 1968-12-24 1969-12-23
GB1297389D GB1297389A (de) 1968-12-24 1969-12-23
SE6917835A SE381575B (sv) 1968-12-24 1969-12-23 Forfarande for genomforande av kemiska reaktioner med hjelp av bagurladdning
FR6945017A FR2027085A1 (de) 1968-12-24 1969-12-24
FR6945016A FR2027608A1 (de) 1968-12-24 1969-12-24
JP44103547A JPS5022986B1 (de) 1968-12-24 1969-12-24

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH1925968A CH508412A (de) 1968-12-24 1968-12-24 Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen
CH494969A CH525705A (de) 1968-12-24 1969-04-01 Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen

Publications (1)

Publication Number Publication Date
CH525705A true CH525705A (de) 1972-07-31

Family

ID=25696596

Family Applications (1)

Application Number Title Priority Date Filing Date
CH494969A CH525705A (de) 1968-12-24 1969-04-01 Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen

Country Status (10)

Country Link
US (2) US3649497A (de)
JP (1) JPS5022986B1 (de)
BE (1) BE743039A (de)
CH (1) CH525705A (de)
DE (2) DE1961339A1 (de)
FR (2) FR2027608A1 (de)
GB (2) GB1297388A (de)
NL (2) NL6919179A (de)
NO (2) NO127094B (de)
SE (1) SE381575B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3304790A1 (de) * 1982-02-15 1983-09-01 Československá akademie věd, Praha Verfahren zur stabilisierung des niedertemperatur-plasmas eines lichtbogenbrenners und lichtbogenbrenner zu seiner durchfuehrung

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3938988A (en) * 1971-01-04 1976-02-17 Othmer Donald F Method for producing aluminum metal from its salts
BE791550A (fr) * 1971-11-20 1973-03-16 Max Planck Gesellschaft Procede et dispositif pour le traitement d'un materiau au moyendu plasma d'un arc electrique
US4206190A (en) * 1974-03-11 1980-06-03 Westinghouse Electric Corp. Plasma arc production of silicon nitride
US4022872A (en) * 1975-11-12 1977-05-10 Ppg Industries, Inc. Process for preparing finely-divided refractory powders
US4051043A (en) * 1976-01-26 1977-09-27 O-3 Company Apparatus for fluid treatment by electron emission
US4102764A (en) * 1976-12-29 1978-07-25 Westinghouse Electric Corp. High purity silicon production by arc heater reduction of silicon intermediates
US4102765A (en) * 1977-01-06 1978-07-25 Westinghouse Electric Corp. Arc heater production of silicon involving alkali or alkaline-earth metals
US4102767A (en) * 1977-04-14 1978-07-25 Westinghouse Electric Corp. Arc heater method for the production of single crystal silicon
US4102766A (en) * 1977-04-14 1978-07-25 Westinghouse Electric Corp. Process for doping high purity silicon in an arc heater
CH616348A5 (de) * 1977-04-29 1980-03-31 Alusuisse
US4145403A (en) * 1977-09-29 1979-03-20 Fey Maurice G Arc heater method for producing metal oxides
US4292342A (en) * 1980-05-09 1981-09-29 Motorola, Inc. High pressure plasma deposition of silicon
JPS579890A (en) * 1980-06-20 1982-01-19 Inoue Japax Res Inc Treatment of rare earth concentrate
US6096109A (en) * 1996-01-18 2000-08-01 Molten Metal Technology, Inc. Chemical component recovery from ligated-metals
US5948294A (en) * 1996-08-30 1999-09-07 Mcdermott Technology, Inc. Device for cathodic cleaning of wire
US6579805B1 (en) * 1999-01-05 2003-06-17 Ronal Systems Corp. In situ chemical generator and method
US6846467B1 (en) 2000-06-27 2005-01-25 Mikhail Rudolfovich Predtechensky Plasma-chemical reactor
RU2200058C1 (ru) * 2002-02-12 2003-03-10 Открытое акционерное общество "ТВЭЛ" Способ проведения гомогенных и гетерогенных химических реакций с использованием плазмы
US7375035B2 (en) 2003-04-29 2008-05-20 Ronal Systems Corporation Host and ancillary tool interface methodology for distributed processing
US7429714B2 (en) * 2003-06-20 2008-09-30 Ronal Systems Corporation Modular ICP torch assembly
WO2007068085A1 (en) * 2005-12-12 2007-06-21 Albonia Innovative Technologies Ltd. Method and apparatus for treating contaminated material
DE112007000428T5 (de) 2006-02-20 2008-12-11 AISAN KOGYO K.K., Obu-shi Kraftstoffzufuhrvorrichtung
RU2532676C2 (ru) 2011-11-28 2014-11-10 Юрий Александрович Чивель Способ плазмохимического синтеза и реактор плазмохимического синтеза для его осуществления
CN108883388B (zh) * 2016-01-05 2020-09-01 螺旋株式会社 涡水流产生器、水等离子体产生装置、以及分解处理装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1065385B (de) * 1955-01-05 1959-09-17 Chemische Werke Hüls Aktiengesellschaft, Marl (Kr, Recklinghausen) Verfahren zur Durchführung chemischer und physikalischer Prozesse mit Hilfe elektrischer Entladungen
US2854392A (en) * 1955-09-22 1958-09-30 Tokumoto Shin-Ichi Arc discharge production of low valency halides of titanium
CH357378A (de) * 1956-04-02 1961-10-15 Berghaus Elektrophysik Anst Verfahren und Einrichtung zur Durchführung technischer Prozesse
FR1294283A (fr) * 1960-04-13 1962-05-26 Ici Ltd Procédé permettant de conduire des réactions chimiques dans des décharges électriques
DE1206399B (de) * 1963-04-27 1965-12-09 Bayer Ag Verfahren zur Durchfuehrung von Gasphasenreaktionen
GB1066651A (en) * 1965-01-18 1967-04-26 British Titan Products Oxides
US3494762A (en) * 1967-11-27 1970-02-10 Iwatani & Co Method of manufacturing microfine metal powder
US3516921A (en) * 1968-03-26 1970-06-23 Allis Chalmers Mfg Co Apparatus for magnetic stirring of discharge plasma in chemical synthesis

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3304790A1 (de) * 1982-02-15 1983-09-01 Československá akademie věd, Praha Verfahren zur stabilisierung des niedertemperatur-plasmas eines lichtbogenbrenners und lichtbogenbrenner zu seiner durchfuehrung

Also Published As

Publication number Publication date
NO127094B (de) 1973-05-07
FR2027608A1 (de) 1970-10-02
DE1961339A1 (de) 1970-06-25
NL6919285A (de) 1970-06-26
NO127095B (de) 1973-05-07
BE743039A (de) 1970-05-14
US3649497A (en) 1972-03-14
GB1297388A (de) 1972-11-22
DE1962989A1 (de) 1970-07-09
JPS5022986B1 (de) 1975-08-04
US3658673A (en) 1972-04-25
GB1297389A (de) 1972-11-22
FR2027085A1 (de) 1970-09-25
SE381575B (sv) 1975-12-15
NL6919179A (de) 1970-06-26

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