BR9000665A - Processos para formar uma pelicula sobre um substrato - Google Patents
Processos para formar uma pelicula sobre um substratoInfo
- Publication number
- BR9000665A BR9000665A BR909000665A BR9000665A BR9000665A BR 9000665 A BR9000665 A BR 9000665A BR 909000665 A BR909000665 A BR 909000665A BR 9000665 A BR9000665 A BR 9000665A BR 9000665 A BR9000665 A BR 9000665A
- Authority
- BR
- Brazil
- Prior art keywords
- processes
- substrate
- film
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Silicon Polymers (AREA)
- Physical Vapour Deposition (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Insulating Films (AREA)
- Paints Or Removers (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31132689A | 1989-02-15 | 1989-02-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9000665A true BR9000665A (pt) | 1991-01-15 |
Family
ID=23206394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR909000665A BR9000665A (pt) | 1989-02-15 | 1990-02-14 | Processos para formar uma pelicula sobre um substrato |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP0382932B1 (pt) |
JP (1) | JPH0739629B2 (pt) |
KR (1) | KR920005620B1 (pt) |
CN (1) | CN1029043C (pt) |
AU (1) | AU624467B2 (pt) |
BR (1) | BR9000665A (pt) |
CA (1) | CA1334911C (pt) |
DE (1) | DE68919346T2 (pt) |
HK (1) | HK90595A (pt) |
MX (1) | MX172109B (pt) |
MY (1) | MY110289A (pt) |
PH (1) | PH27127A (pt) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0643655A (ja) * | 1991-03-04 | 1994-02-18 | Internatl Business Mach Corp <Ibm> | レジスト画像の生成プロセス及び電子デバイス |
DE4202652C2 (de) * | 1992-01-30 | 1996-03-28 | Fraunhofer Ges Forschung | Verfahren zum Aufbringen einer UV- und/oder elektronenstrahlempfindlichen Lackschicht |
DE4202651A1 (de) * | 1992-01-30 | 1993-08-05 | Fraunhofer Ges Forschung | Verfahren zur trockenentwicklung einer siliziumhaltigen ultraviolett- und/oder elektronenstrahlempfindlichen lackschicht |
US5439780A (en) * | 1992-04-29 | 1995-08-08 | At&T Corp. | Energy sensitive materials and methods for their use |
US5635338A (en) * | 1992-04-29 | 1997-06-03 | Lucent Technologies Inc. | Energy sensitive materials and methods for their use |
EP0731982B1 (en) | 1992-07-04 | 1999-12-01 | Trikon Equipments Limited | A method of treating a semiconductor wafer |
WO1995006900A1 (fr) * | 1993-09-03 | 1995-03-09 | Hitachi, Ltd. | Procede et appareil de realisation de motifs |
US5858880A (en) * | 1994-05-14 | 1999-01-12 | Trikon Equipment Limited | Method of treating a semi-conductor wafer |
DE19781956B4 (de) | 1996-08-24 | 2006-06-14 | Trikon Equipments Ltd., Newport | Verfahren zum Aufbringen einer planarisierten dielektrischen Schicht auf einem Halbleitersubstrat |
US5885751A (en) * | 1996-11-08 | 1999-03-23 | Applied Materials, Inc. | Method and apparatus for depositing deep UV photoresist films |
EP1717848A4 (en) | 2004-02-17 | 2010-03-24 | Toagosei Co Ltd | PROCESS FOR PRODUCING SILICONE OXIDE FILM |
CN101402446B (zh) * | 2008-11-06 | 2011-06-01 | 西安交通大学 | 一种减阻表面的制造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4348473A (en) * | 1981-03-04 | 1982-09-07 | Xerox Corporation | Dry process for the production of microelectronic devices |
US4460436A (en) * | 1983-09-06 | 1984-07-17 | International Business Machines Corporation | Deposition of polymer films by means of ion beams |
JPS6250337A (ja) * | 1985-08-28 | 1987-03-05 | Nippon Sheet Glass Co Ltd | プラズマ重合による保護膜形成方法 |
US4781942A (en) * | 1985-12-19 | 1988-11-01 | Hughes Aircraft Company | Process for the photochemical vapor deposition of siloxane polymers |
JP2528471B2 (ja) * | 1987-06-22 | 1996-08-28 | 出光興産株式会社 | ジクロロシラン類の製造方法 |
-
1989
- 1989-08-24 CA CA000609377A patent/CA1334911C/en not_active Expired - Fee Related
- 1989-12-16 EP EP89123324A patent/EP0382932B1/en not_active Expired - Lifetime
- 1989-12-16 DE DE68919346T patent/DE68919346T2/de not_active Expired - Fee Related
-
1990
- 1990-01-08 AU AU47788/90A patent/AU624467B2/en not_active Ceased
- 1990-01-09 CN CN90100094A patent/CN1029043C/zh not_active Expired - Fee Related
- 1990-01-12 PH PH39885A patent/PH27127A/en unknown
- 1990-01-15 MY MYPI90000060A patent/MY110289A/en unknown
- 1990-01-15 KR KR1019900000410A patent/KR920005620B1/ko not_active IP Right Cessation
- 1990-02-12 MX MX019461A patent/MX172109B/es unknown
- 1990-02-14 BR BR909000665A patent/BR9000665A/pt not_active Application Discontinuation
- 1990-02-15 JP JP2032615A patent/JPH0739629B2/ja not_active Expired - Fee Related
-
1995
- 1995-06-08 HK HK90595A patent/HK90595A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0382932A3 (en) | 1990-12-05 |
CA1334911C (en) | 1995-03-28 |
CN1044995A (zh) | 1990-08-29 |
MY110289A (en) | 1998-04-30 |
JPH0739629B2 (ja) | 1995-05-01 |
AU624467B2 (en) | 1992-06-11 |
CN1029043C (zh) | 1995-06-21 |
DE68919346T2 (de) | 1995-05-24 |
PH27127A (en) | 1993-03-16 |
KR900013102A (ko) | 1990-09-03 |
MX172109B (es) | 1993-12-03 |
AU4778890A (en) | 1990-08-23 |
DE68919346D1 (de) | 1994-12-15 |
KR920005620B1 (ko) | 1992-07-10 |
JPH02263981A (ja) | 1990-10-26 |
EP0382932A2 (en) | 1990-08-22 |
HK90595A (en) | 1995-06-16 |
EP0382932B1 (en) | 1994-11-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FB20 | Grant procedure suspended (art. 20) | ||
FB36 | Technical and formal requirements: requirement - article 36 of industrial property law | ||
FA8 | Dismissal: dismissal - article 36, par. 1 of industrial property law |