AU544964B2 - Nozzle for depositing a layer of solid on a substrate - Google Patents

Nozzle for depositing a layer of solid on a substrate

Info

Publication number
AU544964B2
AU544964B2 AU64404/80A AU6440480A AU544964B2 AU 544964 B2 AU544964 B2 AU 544964B2 AU 64404/80 A AU64404/80 A AU 64404/80A AU 6440480 A AU6440480 A AU 6440480A AU 544964 B2 AU544964 B2 AU 544964B2
Authority
AU
Australia
Prior art keywords
depositing
nozzle
substrate
solid
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU64404/80A
Other versions
AU6440480A (en
Inventor
Otto Baumberger
Reinhard Kalbskopf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societa Italiana Vetro SIV SpA
Original Assignee
Societa Italiana Vetro SIV SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Societa Italiana Vetro SIV SpA filed Critical Societa Italiana Vetro SIV SpA
Publication of AU6440480A publication Critical patent/AU6440480A/en
Application granted granted Critical
Publication of AU544964B2 publication Critical patent/AU544964B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AU64404/80A 1979-11-21 1980-11-14 Nozzle for depositing a layer of solid on a substrate Ceased AU544964B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH1037779 1979-11-21
CH10377/79 1979-11-21

Publications (2)

Publication Number Publication Date
AU6440480A AU6440480A (en) 1981-05-28
AU544964B2 true AU544964B2 (en) 1985-06-27

Family

ID=4362579

Family Applications (1)

Application Number Title Priority Date Filing Date
AU64404/80A Ceased AU544964B2 (en) 1979-11-21 1980-11-14 Nozzle for depositing a layer of solid on a substrate

Country Status (16)

Country Link
US (1) US4361284A (en)
EP (1) EP0029809B1 (en)
JP (1) JPS5687451A (en)
KR (2) KR830004448A (en)
AU (1) AU544964B2 (en)
CA (1) CA1150749A (en)
CS (1) CS274255B2 (en)
DD (1) DD154584A5 (en)
DE (1) DE3066643D1 (en)
ES (1) ES497005A0 (en)
IT (1) IT1134153B (en)
MX (1) MX153336A (en)
PL (1) PL129254B1 (en)
SU (1) SU1187705A3 (en)
TR (1) TR21534A (en)
ZA (1) ZA807242B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU601594B2 (en) * 1987-05-18 1990-09-13 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
AU618543B2 (en) * 1987-07-09 1992-01-02 Atofina Chemicals, Inc. Apparatus for coating a substrate

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH643469A5 (en) * 1981-12-22 1984-06-15 Siv Soc Italiana Vetro Installation for continuous drop on the surface of a substrate door high temperature, layer solid matter.
US4524718A (en) * 1982-11-22 1985-06-25 Gordon Roy G Reactor for continuous coating of glass
WO1985002418A1 (en) * 1983-12-01 1985-06-06 Shatterproof Glass Corporation Gas distribution system for sputtering cathodes
DE3869793D1 (en) * 1987-01-27 1992-05-14 Asahi Glass Co Ltd GAS SUPPLY PIPE FOR REACTIVE DEPOSITION FROM THE GAS PHASE.
US5136975A (en) * 1990-06-21 1992-08-11 Watkins-Johnson Company Injector and method for delivering gaseous chemicals to a surface
DE4103413C1 (en) * 1991-02-05 1992-11-12 Gunter M. 8918 Diessen De Voss
US6379466B1 (en) * 1992-01-17 2002-04-30 Applied Materials, Inc. Temperature controlled gas distribution plate
FR2724923B1 (en) * 1994-09-27 1996-12-20 Saint Gobain Vitrage TECHNIQUE FOR THE DEPOSITION OF PYROLYSIS COATINGS OF A PRECURSOR GAS COMPOSITION (S)
JP3836217B2 (en) * 1997-05-21 2006-10-25 株式会社ベルデックス Sealing liquid supply apparatus and method
CN102154628B (en) * 2004-08-02 2014-05-07 维高仪器股份有限公司 Multi-gas distribution injector for chemical vapor deposition reactors
DE102006043542B4 (en) * 2006-09-12 2012-05-16 Innovent E.V. Process for coating surfaces
DE102006043543B4 (en) * 2006-09-12 2012-05-10 Innovent E.V. Homogenizer for coating surface gas streams
US8431187B2 (en) * 2006-12-28 2013-04-30 Korea Institute Of Industrial Technology Manufacturing method of filter media available at medium and high temperature exhaust gas using foam coating technology and filter media manufactured thereby
JP5116313B2 (en) * 2007-02-07 2013-01-09 東洋刃物株式会社 Application head
US20110092076A1 (en) * 2008-05-19 2011-04-21 E.I. Du Pont De Nemours And Company Apparatus and method of vapor coating in an electronic device
US9540277B2 (en) * 2011-03-23 2017-01-10 Pilkington Group Limited Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus
CN102921600B (en) * 2012-11-30 2016-04-06 贵州贵航汽车零部件股份有限公司 Oiler oiling station

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3511703A (en) * 1963-09-20 1970-05-12 Motorola Inc Method for depositing mixed oxide films containing aluminum oxide
GB1282866A (en) * 1968-08-16 1972-07-26 Pilkington Brothers Ltd Improvements in or relating to the production of glass having desired surface characteristics
CH544156A (en) * 1971-04-16 1973-11-15 Bbc Brown Boveri & Cie Process for the production of oxide semiconductor layers and device for carrying out the process
US3970037A (en) * 1972-12-15 1976-07-20 Ppg Industries, Inc. Coating composition vaporizer
GB1516032A (en) * 1976-04-13 1978-06-28 Bfg Glassgroup Coating of glass
US4270702A (en) * 1978-04-26 1981-06-02 Albany International Corp. Adjustable orifice air knife
CH628600A5 (en) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro PROCESS FOR CONTINUOUSLY DEPOSITING, ON THE SURFACE OF A SUBSTRATE CARRIED AT HIGH TEMPERATURE, A LAYER OF A SOLID MATERIAL AND INSTALLATION FOR THE IMPLEMENTATION OF THIS PROCESS.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU601594B2 (en) * 1987-05-18 1990-09-13 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
AU618543B2 (en) * 1987-07-09 1992-01-02 Atofina Chemicals, Inc. Apparatus for coating a substrate

Also Published As

Publication number Publication date
KR860000024Y1 (en) 1986-01-30
PL129254B1 (en) 1984-04-30
SU1187705A3 (en) 1985-10-23
AU6440480A (en) 1981-05-28
TR21534A (en) 1984-08-22
ZA807242B (en) 1981-11-25
KR830004448A (en) 1983-07-13
ES8107052A1 (en) 1981-10-01
IT1134153B (en) 1986-07-31
JPS6148988B2 (en) 1986-10-27
CS797580A2 (en) 1990-09-12
CS274255B2 (en) 1991-04-11
DE3066643D1 (en) 1984-03-22
US4361284A (en) 1982-11-30
MX153336A (en) 1986-09-22
JPS5687451A (en) 1981-07-16
IT8025742A0 (en) 1980-11-03
DD154584A5 (en) 1982-04-07
EP0029809A1 (en) 1981-06-03
EP0029809B1 (en) 1984-02-15
ES497005A0 (en) 1981-10-01
CA1150749A (en) 1983-07-26
PL227980A1 (en) 1981-09-04

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