AU2001234319A1 - Device for homogeneous heating of an object - Google Patents

Device for homogeneous heating of an object

Info

Publication number
AU2001234319A1
AU2001234319A1 AU2001234319A AU3431901A AU2001234319A1 AU 2001234319 A1 AU2001234319 A1 AU 2001234319A1 AU 2001234319 A AU2001234319 A AU 2001234319A AU 3431901 A AU3431901 A AU 3431901A AU 2001234319 A1 AU2001234319 A1 AU 2001234319A1
Authority
AU
Australia
Prior art keywords
homogeneous heating
homogeneous
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001234319A
Inventor
Babak Heidari
Lars Montelius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat AB filed Critical Obducat AB
Publication of AU2001234319A1 publication Critical patent/AU2001234319A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/52—Heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0083—Temperature control
    • B81B7/009—Maintaining a constant temperature by heating or cooling
    • B81B7/0096—Maintaining a constant temperature by heating or cooling by heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/25—Solid
    • B29K2105/253—Preform
    • B29K2105/256—Sheets, plates, blanks or films
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Resistance Heating (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Heating Bodies (AREA)
  • Control Of Resistance Heating (AREA)
AU2001234319A 2000-02-23 2001-02-21 Device for homogeneous heating of an object Abandoned AU2001234319A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE0000574 2000-02-23
SE0000574A SE515785C2 (en) 2000-02-23 2000-02-23 Apparatus for homogeneous heating of an object and use of the apparatus
PCT/SE2001/000381 WO2001063361A1 (en) 2000-02-23 2001-02-21 Device for homogeneous heating of an object

Publications (1)

Publication Number Publication Date
AU2001234319A1 true AU2001234319A1 (en) 2001-09-03

Family

ID=20278542

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001234319A Abandoned AU2001234319A1 (en) 2000-02-23 2001-02-21 Device for homogeneous heating of an object

Country Status (7)

Country Link
US (2) US20030141291A1 (en)
EP (1) EP1275030A1 (en)
JP (1) JP2003524304A (en)
CN (1) CN1215377C (en)
AU (1) AU2001234319A1 (en)
SE (1) SE515785C2 (en)
WO (1) WO2001063361A1 (en)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
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JP4740518B2 (en) 2000-07-17 2011-08-03 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム Automated liquid dispensing method and system for transfer lithography process
JP2004523906A (en) 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム Templates for room-temperature and low-pressure micro and nano-transfer lithography
DE20019210U1 (en) * 2000-11-11 2001-01-25 Schott Glas, 55122 Mainz Cooktop
US20050146083A1 (en) * 2002-06-20 2005-07-07 Lennart Olsson Method and device for transferring a pattern
DE10343323A1 (en) * 2003-09-11 2005-04-07 Carl Zeiss Smt Ag Stamp lithography method and device and stamp for the stamp lithograph
JP4321213B2 (en) * 2003-10-24 2009-08-26 ウシオ電機株式会社 Heating unit
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
TWI243796B (en) * 2004-06-08 2005-11-21 Ind Tech Res Inst Device of nano-structure imprint for pattern transfer and method of the same
CN1300635C (en) * 2004-12-09 2007-02-14 上海交通大学 Vacuum negative pressure nanometer press printing method
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) * 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
JP4619854B2 (en) * 2005-04-18 2011-01-26 東京エレクトロン株式会社 Load lock device and processing method
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) * 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
JP4657940B2 (en) * 2006-02-10 2011-03-23 東京エレクトロン株式会社 Substrate processing system
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
DE102008002579A1 (en) * 2008-06-23 2009-12-24 Robert Bosch Gmbh Microelectromechanical sensor element
CN104981735A (en) * 2012-09-18 2015-10-14 Ev集团E·索尔纳有限责任公司 Method and device for embossing
CN103837249B (en) * 2012-11-20 2016-12-21 深南电路有限公司 The method of testing of temperature of heat plate uniformity and test device
US10287685B2 (en) 2013-08-29 2019-05-14 Maruwa Co., Ltd. Susceptor
CN110798923B (en) * 2019-10-29 2021-11-23 珠海格力绿色再生资源有限公司 Heating panel and fireless stove
CN111430836A (en) * 2020-02-18 2020-07-17 蜂巢能源科技有限公司 Self-adaptive temperature adjusting structural unit and application thereof

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
US3277419A (en) * 1963-11-20 1966-10-04 Du Pont Laminated heating unit
US4567132A (en) * 1984-03-16 1986-01-28 International Business Machines Corporation Multi-level resist image reversal lithography process
IT1218221B (en) * 1988-04-15 1990-04-12 Bayer Ag HIGH TEMPERATURE HEATING SYSTEMS AND METHOD TO PRODUCE THEM
US5151871A (en) * 1989-06-16 1992-09-29 Tokyo Electron Limited Method for heat-processing semiconductor device and apparatus for the same
JP2745438B2 (en) * 1990-07-13 1998-04-28 株式会社荏原製作所 Heat transfer material and heating element for heating and heating device using the same
US5106455A (en) * 1991-01-28 1992-04-21 Sarcos Group Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography
DE4219667C2 (en) * 1992-06-16 1994-12-01 Kernforschungsz Karlsruhe Tool and method for producing a microstructured plastic layer
US5861609A (en) * 1995-10-02 1999-01-19 Kaltenbrunner; Guenter Method and apparatus for rapid thermal processing
DE19709496A1 (en) * 1996-03-07 1997-09-11 Norbert Koessinger Kg Sublimation image carrier for transferring images onto ceramic objects
JPH11343571A (en) * 1998-05-29 1999-12-14 Ngk Insulators Ltd Susceptor

Also Published As

Publication number Publication date
SE0000574L (en) 2001-08-24
US20030141291A1 (en) 2003-07-31
JP2003524304A (en) 2003-08-12
SE0000574D0 (en) 2000-02-23
EP1275030A1 (en) 2003-01-15
WO2001063361A1 (en) 2001-08-30
CN1419661A (en) 2003-05-21
US20050077285A1 (en) 2005-04-14
CN1215377C (en) 2005-08-17
SE515785C2 (en) 2001-10-08

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