ASM’s Post

Check out new research on area-selective etching from the University of Helsinki, AlixLabs, and our very own Eva - with the help of ASM wafers and equipment. "Area-selective etching (ASE) of polymers is a new, inventive, and simple self-aligned patterning technique which has the potential to become an important method for the fabrication of semiconductor devices. A polymer film is etched by using etchant gases, which diffuse through the polymer and are activated by catalytic materials underneath the polymer. The polymer is decomposed locally on top of catalytically active materials, while on top of catalytically inactive materials, the polymer stays intact. This makes the process area-selective and self-aligned, which avoids edge placement errors and other defects." Read the full article here - https://lnkd.in/eJ5JYnvr