Sub-resolution assist feature cleanup based on grayscale map

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CTM-SRAF: Continuous Transmission Mask-Based Constraint-Aware Subresolution Assist Feature Generation

Z Yu, P Liao, Y Ma, B Yu… - IEEE Transactions on …, 2023 - ieeexplore.ieee.org
In the lithography process, subresolution assist features (SRAFs), as an essential resolution
enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the …
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RuleLearner: OPC Rule Extraction From Inverse Lithography Technique Engine

Z Yu, S Zheng, W Zhao, S Yin, X Liang… - … on Computer-Aided …, 2024 - ieeexplore.ieee.org
Model-based Optical Proximity Correction (OPC) with Sub-Resolution Assist Feature (SRAF)
generation is a critical standard practice for compensating lithography distortions in the …
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[PDF][PDF] 计算光刻研究及进展

马旭， 张胜恩， 潘毅华， 张钧碧， 余成臻… - Laser & …, 2022 - researching.cn
摘要光刻是将集成电路器件的结构图形从掩模转移到硅片或其他半导体基片表面上的工艺过程,
是实现高端芯片量产的关键技术. 在摩尔定律的推动下, 光刻技术跨越了90~ 7 nm …
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