Kenney et al., 1984 - Google Patents
Soft X-ray microscopy at the NSLSKenney et al., 1984
- Document ID
- 1999505504330267629
- Author
- Kenney J
- Kirz J
- Rarback H
- Howells M
- Chang P
- Coane P
- Feder R
- Houzego P
- Kern D
- Sayre D
- Publication year
- Publication venue
- Nuclear Instruments and Methods in Physics Research
External Links
Snippet
The U15 beamline at the NSLS has been instrumented for various forms of soft X-ray imaging. A toroidal grating serves as the monochromator and as the optical element that images the source onto the exit slit. Thin contamination barriers separate the UHV region …
- 238000003963 x-ray microscopy 0 title description 5
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionizing radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Exposure apparatus for microlithography
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