TWI781331B - Flux Materials, Solder Paste, and Solder Joints - Google Patents

Flux Materials, Solder Paste, and Solder Joints Download PDF

Info

Publication number
TWI781331B
TWI781331B TW108124086A TW108124086A TWI781331B TW I781331 B TWI781331 B TW I781331B TW 108124086 A TW108124086 A TW 108124086A TW 108124086 A TW108124086 A TW 108124086A TW I781331 B TWI781331 B TW I781331B
Authority
TW
Taiwan
Prior art keywords
mass
flux
solder
powder
content
Prior art date
Application number
TW108124086A
Other languages
Chinese (zh)
Other versions
TW202010592A (en
Inventor
川中子宏
橫田智史
赤川隆
高橋宏
川崎浩由
宗形修
Original Assignee
日商千住金屬工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商千住金屬工業股份有限公司 filed Critical 日商千住金屬工業股份有限公司
Publication of TW202010592A publication Critical patent/TW202010592A/en
Application granted granted Critical
Publication of TWI781331B publication Critical patent/TWI781331B/en

Links

Images

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

本發明之目的在於提供一種可抑制經時之黏度上升且潤濕性及可靠性優異之焊劑材料、焊膏、及焊劑接頭。 本發明之焊劑材料之特徵在於:包含Sn或Sn系合金、40~250質量ppm之As、及20質量ppm~0.7質量%之Pb,且具有As濃化層。An object of the present invention is to provide a solder material, solder paste, and solder joint that can suppress the increase in viscosity over time and have excellent wettability and reliability. The flux material of the present invention is characterized in that it contains Sn or a Sn-based alloy, 40-250 mass ppm of As, and 20 mass ppm-0.7 mass % of Pb, and has an As-concentrated layer.

Description

焊劑材料、焊膏、及焊劑接頭Solder materials, solder paste, and solder joints

本發明係關於一種焊劑材料、焊膏、及焊劑接頭。The invention relates to a flux material, a solder paste, and a flux joint.

電子零件向印刷基板之安裝等電子機器中之電子零件之固定及電性連接一般藉由於成本方面及可靠性方面最有利之焊接進行。Fixing and electrical connection of electronic parts in electronic equipment such as mounting of electronic parts to printed circuit boards are generally performed by soldering which is most advantageous in terms of cost and reliability.

焊劑材料一般以Sn為主成分,因而製造時或製造後Sn與空氣中之氧反應,於表面形成Sn氧化物之膜,導致變黃。Solder materials generally contain Sn as the main component, so Sn reacts with oxygen in the air during or after manufacture, forming a film of Sn oxide on the surface, resulting in yellowing.

作為改善焊劑材料之變色之方法,已知於焊劑材料中添加P、Ge、Ga等元素。該等元素相較於Sn而言氧化物之標準生成自由能較小,非常容易被氧化。因此,由熔融焊劑形成焊劑粉末或焊劑球等焊劑材料時,不是Sn而是P、Ge、Ga等元素被氧化而於表面濃化,可抑制焊劑表面變黃。但是,一般而言對於焊劑材料要求熔融時擴展於電子零件之金屬上之性質(潤濕性),因而於添加了P、Ge、Ga等元素之情形時,焊劑材料之潤濕性降低。若焊劑材料之潤濕性較差,則會成為產生焊接不良之原因。As a method of improving the discoloration of the flux material, it is known to add elements such as P, Ge, and Ga to the flux material. Compared with Sn, the standard free energy of formation of oxides of these elements is smaller, and they are very easy to be oxidized. Therefore, when a flux material such as flux powder or solder ball is formed from molten flux, elements such as P, Ge, Ga, etc. are oxidized and concentrated on the surface instead of Sn, and yellowing of the flux surface can be suppressed. However, in general, solder materials are required to spread on metals of electronic parts (wettability) when molten, so when elements such as P, Ge, and Ga are added, the wettability of the solder materials decreases. If the wettability of the flux material is poor, it will become the cause of poor soldering.

又,焊接中,於電子零件向電子機器之基板之接合、組裝中,使用焊膏之焊接於成本方面及可靠性方面有利,最為普遍地進行。焊膏係將焊劑材料(焊劑粉末)與包含松香、活性劑、觸變劑、溶劑等除焊劑材料以外之成分之助焊劑進行混練而製成膏狀之混合物。 焊膏向基板之塗佈例如藉由使用金屬遮罩之網版印刷進行。因此,為了確保焊膏之印刷性,焊膏之黏度需適度。但是,一般而言焊膏之保存穩定性較差,有焊膏之黏度經時上升之情況。In addition, among soldering, soldering using solder paste is most commonly performed because it is advantageous in terms of cost and reliability in bonding and assembling electronic components to a substrate of an electronic device. Solder paste is a mixture made by kneading flux material (flux powder) and flux containing components other than flux material such as rosin, activator, thixotropic agent, and solvent. The application of the solder paste to the substrate is performed, for example, by screen printing using a metal mask. Therefore, in order to ensure the printability of the solder paste, the viscosity of the solder paste must be moderate. However, generally speaking, the storage stability of solder paste is poor, and the viscosity of solder paste may increase over time.

進而,於構成焊膏之焊劑材料中,若液相線溫度(TL )與固相線溫度(TS )之差(ΔT=TL -TS )變大,則塗佈於電子機器之基板後,凝固時焊劑材料之組織容易變得不均勻,成為降低將來之可靠性之原因。Furthermore, in the flux material constituting the solder paste, if the difference between the liquidus temperature (T L ) and the solidus temperature (T S ) (ΔT = T L - T S ) becomes large, the After the substrate is solidified, the structure of the flux material tends to become uneven, which will reduce future reliability.

作為含有Pb之焊劑材料,例如提出有一種凸塊用焊劑合金粉末,該凸塊用焊劑合金粉末具有如下成分組成:含有2.8~4.2重量%之Ag、0.4~0.6重量%之Cu及50~5000 ppm之Pb,且其餘部分包含Sn及不可避免之雜質(專利文獻1)。 但是,專利文獻1所記載之焊劑材料係以抑制形成凸塊時所產生之突起為課題,並未改善變色或製成焊膏時之經時之黏度上升之問題。As a solder material containing Pb, for example, a solder alloy powder for bumps has been proposed. ppm of Pb, and the remainder contains Sn and unavoidable impurities (Patent Document 1). However, the flux material described in Patent Document 1 is aimed at suppressing protrusions generated during bump formation, and does not improve problems of discoloration or viscosity increase over time when it is made into a solder paste.

如上所述,期望一種可抑制變色或製成膏時之經時之黏度上升之問題,並且潤濕性及可靠性亦優異之焊劑材料。 [先前技術文獻] [專利文獻]As described above, there is a demand for a flux material that can suppress discoloration or increase in viscosity over time when it is made into a paste, and that is also excellent in wettability and reliability. [Prior Art Literature] [Patent Document]

[專利文獻1]日本專利特開2013-237088號[Patent Document 1] Japanese Patent Laid-Open No. 2013-237088

[發明所欲解決之問題][Problem to be solved by the invention]

本發明之目的在於提供一種變色或製成膏時之經時之黏度上升較小且潤濕性及可靠性優異之焊劑材料。 [解決問題之技術手段]It is an object of the present invention to provide a flux material that has less discoloration or a viscosity increase over time when it is made into a paste, and has excellent wettability and reliability. [Technical means to solve the problem]

本發明人等為了解決上述問題而進行了銳意研究,結果發現,於表面側具有As濃化層之焊劑材料之變色或製成膏時之黏度之經時變化較少,並且含有As之焊劑材料雖通常存在潤濕性變低之傾向,但若於表面形成有As濃化層,則亦不存在此種潤濕性之降低,得知若使用此種材料則可解決上述問題,從而完成本發明。 即,本發明之具體態樣如下所述。 再者,於本說明書中,使用「~」表示數值範圍時,該範圍係包括兩端之數值者。又,各元素之含量例如可藉由依據JIS Z 3910利用ICP-AES(inductively coupled plasma-atomic emission spectrometry,感應耦合電漿原子發射光譜分析裝置)進行分析而測定。The inventors of the present invention conducted earnest research in order to solve the above-mentioned problems, and as a result, found that the discoloration of the flux material having an As-concentrated layer on the surface side or the change over time in the viscosity when it is made into a paste is small, and that the flux material containing As is less. Generally, there is a tendency for the wettability to decrease, but if an As concentration layer is formed on the surface, there is no such decrease in wettability. It is known that the above-mentioned problems can be solved by using this material, and this paper was completed. invention. That is, specific aspects of the present invention are as follows. Furthermore, in this specification, when "~" is used to indicate a numerical range, the range includes numerical values at both ends. Moreover, the content of each element can be measured by analyzing with ICP-AES (inductively coupled plasma-atomic emission spectrometry, inductively coupled plasma-atomic emission spectrometry) based on JIS Z 3910, for example.

[1]一種焊劑材料,其包含Sn或Sn系合金、40~250質量ppm之As、及20質量ppm~0.7質量%之Pb,且具有As濃化層。 [2]如[1]記載之焊劑材料,其中上述Sn或Sn系合金為包含0.005~40質量%之Ag及/或0.001~10質量%之Cu之Sn系合金。 [3]如[1]或[2]記載之焊劑材料,其中上述焊劑材料之形態為粉末。 [4]一種焊膏,其包含如[3]記載之焊劑材料、及助焊劑。 [5]如[4]記載之焊膏,其進而包含氧化鋯粉末。 [6]如[5]記載之焊膏,其中氧化鋯粉末相對於焊膏整體質量之含量為0.05~20.0質量%。 [7]一種焊劑接頭,其包含Sn或Sn系合金、40~250質量ppm之As、及20質量ppm~0.7質量%之Pb,且具有As濃化層。 [發明之效果][1] A flux material comprising Sn or a Sn-based alloy, 40 to 250 mass ppm of As, and 20 to 0.7 mass % of Pb, and having an As-concentrated layer. [2] The flux material according to [1], wherein the Sn or Sn-based alloy is a Sn-based alloy containing 0.005 to 40% by mass of Ag and/or 0.001 to 10% by mass of Cu. [3] The flux material according to [1] or [2], wherein the form of the flux material is powder. [4] A solder paste comprising the flux material as described in [3], and a flux. [5] The solder paste according to [4], further comprising zirconia powder. [6] The solder paste described in [5], wherein the content of the zirconia powder is 0.05 to 20.0% by mass relative to the entire mass of the solder paste. [7] A solder joint comprising Sn or a Sn-based alloy, 40 to 250 mass ppm of As, and 20 to 0.7 mass % of Pb, and having an As-concentrated layer. [Effect of Invention]

根據本發明,可提供一種焊劑材料,其變色較少,潤濕性亦良好,循環特性等可靠性較高,製成焊膏時之經時之黏度上升較小。According to the present invention, it is possible to provide a flux material which has less discoloration, good wettability, high reliability such as cycle characteristics, and a small increase in viscosity over time when it is made into a solder paste.

以下,對用以實施本發明之形態(以下,稱為「本實施形態」)進行說明。 但是,本發明並不限定於此,於不脫離其主旨之範圍內可進行各種變化。Hereinafter, an embodiment for implementing the present invention (hereinafter referred to as "the present embodiment") will be described. However, this invention is not limited to this, Various changes are possible in the range which does not deviate from the summary.

於本實施形態中,焊劑材料包含Sn或Sn系合金、40~250質量ppm之As、及20質量ppm~0.7質量%之Pb。In this embodiment, the flux material contains Sn or a Sn-based alloy, 40-250 mass ppm of As, and 20 mass ppm-0.7 mass % of Pb.

此處,Sn之純度並無特別限定,例如可使用純度為3 N(99.9%以上)、4 N(99.99%以上)、5 N(99.999%以上)者等業界中一般者。 又,作為Sn系合金,可列舉Sn-Ag合金、Sn-Cu合金、Sn-Ag-Cu合金、Sn-Ag-Cu-Ni-Co合金、Sn-In合金、Sn-Bi合金、Sn-Sb合金或於上述合金組成中進而添加Ag、Cu、In、Ni、Co、Sb、Bi、Ge、P、Fe、Zn、Al、Ga等而得之合金。Sn系合金中之Sn之含量並無限定,例如可設為超過40質量%。 再者,Sn及Sn系合金亦可包含不可避免之雜質。Here, the purity of Sn is not particularly limited, and for example, those with a purity of 3 N (99.9% or higher), 4 N (99.99% or higher), and 5 N (99.999% or higher) can be used. In addition, examples of the Sn-based alloys include Sn-Ag alloys, Sn-Cu alloys, Sn-Ag-Cu alloys, Sn-Ag-Cu-Ni-Co alloys, Sn-In alloys, Sn-Bi alloys, and Sn-Sb alloys. Alloys or alloys obtained by adding Ag, Cu, In, Ni, Co, Sb, Bi, Ge, P, Fe, Zn, Al, Ga, etc. to the above alloy composition. The content of Sn in the Sn-based alloy is not limited, and may be, for example, more than 40% by mass. Furthermore, Sn and Sn-based alloys may also contain unavoidable impurities.

於本實施形態中,就焊劑潤濕性、熔點、作為其他焊劑材料之物性之觀點而言,Sn系合金較佳為包含0.005~40質量%之Ag及/或0.001~10質量%之Cu且其餘部分為Sn者。 於該情形時,就ΔT之觀點而言,Ag相對於焊劑材料整體質量之含量較佳為4質量%以下。若Ag之含量超過3.8質量%,則存在ΔT大幅度增大之傾向。Ag相對於焊劑材料整體質量之含量更佳為0.1~3.8質量%,最佳為0.5~3.5質量%。 又,就ΔT之觀點而言,Cu相對於焊劑材料整體質量之含量較佳為1.0質量%以下。若Cu之含量超過0.9質量%,則存在ΔT大幅度增大之傾向。Cu相對於焊劑材料整體質量之含量更佳為0.05~0.9質量%,最佳為0.1~0.7質量%。 再者,上述Ag及Cu之含量之較佳之數值範圍為各自獨立者,Ag及Cu之含量可各自獨立地決定。In this embodiment, the Sn-based alloy preferably contains 0.005 to 40% by mass of Ag and/or 0.001 to 10% by mass of Cu and The rest are Sn. In this case, from the viewpoint of ΔT, the content of Ag with respect to the entire mass of the solder material is preferably 4% by mass or less. When the content of Ag exceeds 3.8% by mass, ΔT tends to increase significantly. The content of Ag relative to the mass of the entire flux material is more preferably 0.1 to 3.8% by mass, most preferably 0.5 to 3.5% by mass. In addition, from the viewpoint of ΔT, the content of Cu with respect to the mass of the entire flux material is preferably 1.0% by mass or less. When the content of Cu exceeds 0.9% by mass, ΔT tends to increase significantly. The content of Cu relative to the mass of the entire flux material is more preferably 0.05 to 0.9% by mass, most preferably 0.1 to 0.7% by mass. Furthermore, the preferred numerical ranges of the above-mentioned Ag and Cu contents are independent, and the Ag and Cu contents can be determined independently.

於本實施形態中,As相對於焊劑材料整體質量之含量為40~250質量ppm(0.0040~0.0250質量%),較佳為50~150質量ppm,更佳為50~100質量ppm。若As之含量未達40質量ppm,則極難形成As濃化層。 若As滿足相對於焊劑材料整體質量之含量為40~250質量ppm之條件,且於焊劑材料中存在As濃化層,則其一部分或全部可與Sn或Sn系合金一同構成合金(金屬間化合物或固溶體等),亦可與Sn系合金分開,例如作為As單一成分或氧化物而存在。In this embodiment, the content of As relative to the mass of the entire flux material is 40-250 mass ppm (0.0040-0.0250 mass %), preferably 50-150 mass ppm, more preferably 50-100 mass ppm. If the As content is less than 40 mass ppm, it will be extremely difficult to form an As concentrated layer. If As satisfies the condition that the content of As is 40 to 250 mass ppm relative to the mass of the entire flux material, and there is an As concentrated layer in the flux material, part or all of it can form an alloy (intermetallic compound) together with Sn or a Sn-based alloy. Or solid solution, etc.), can also be separated from the Sn-based alloy, for example, exist as a single component of As or as an oxide.

於本實施形態中,Pb相對於焊劑材料整體質量之含量為20質量ppm~0.7質量%(0.002~0.7質量%)。判明若Pb充分存在,則存在抑制黏度上升之傾向。其原因尚不明確,但可認為其原因在於,Pb相對於Sn為較貴之金屬,因此Sn-Pb合金相較於Sn而言不易離子化,不易作為離子狀態(鹽)溶出至助焊劑。但是,機制不取決於此。另一方面,若Pb之含量過大,則有液相線溫度(TL )與固相線溫度(TS )之差(ΔT=TL -TS )變大,降低循環特性等可靠性之虞。就此種觀點而言,Pb相對於焊劑材料整體質量之含量較佳為0.005~0.7質量%,更佳為0.01~0.5質量%。 若Pb滿足相對於焊劑材料整體質量之含量為20質量ppm~0.7質量%之條件,則可全部與Sn或Sn系合金一同構成合金(金屬間化合物或固溶體等),亦可其一部分與Sn系合金分開存在。In this embodiment, content of Pb with respect to the mass of the whole flux material is 20 mass ppm - 0.7 mass % (0.002-0.7 mass %). It was found that when Pb is sufficiently present, there is a tendency to suppress the increase in viscosity. The reason for this is not clear, but it is considered that the reason is that since Pb is a relatively noble metal compared to Sn, the Sn—Pb alloy is less likely to be ionized than Sn, and is less likely to be eluted into the flux as an ionic state (salt). However, the mechanism does not depend on this. On the other hand, if the content of Pb is too large, the difference between the liquidus temperature (T L ) and the solidus temperature (T S ) (ΔT=T L -T S ) will increase, which will reduce the reliability of the cycle characteristics. Yu. From such a viewpoint, the content of Pb is preferably from 0.005 to 0.7% by mass, more preferably from 0.01 to 0.5% by mass, with respect to the entire mass of the solder material. If Pb satisfies the condition that the content of Pb is 20 mass ppm to 0.7 mass % relative to the overall mass of the flux material, it may form an alloy (intermetallic compound or solid solution, etc.) The Sn-based alloy exists separately.

於本實施形態中,焊劑材料於其至少一部分具有As濃化層。此處,所謂As濃化層係指As濃度高於焊劑材料中之平均As濃度(As相對於焊劑材料整體質量之含量)之區域,具體而言,可藉由後述之判定基準而確認存在。 As濃化層較佳為存在於焊劑材料之表面側之至少一部分,更佳為覆蓋整個表面。In this embodiment, the flux material has an As concentrating layer in at least a part thereof. Here, the As-concentrated layer refers to a region where the As concentration is higher than the average As concentration in the solder material (the content of As relative to the overall mass of the solder material), and specifically, its existence can be confirmed by the criteria for determination described later. The As concentration layer is preferably present on at least a part of the surface side of the solder material, and more preferably covers the entire surface.

(判定基準) 準備5.0 mm×5.0 mm之大小之樣品(於焊劑材料不為板狀之情形時,為於5.0 mm×5.0 mm之範圍內將焊劑材料(焊劑粉末、焊劑球等)無間隙地鋪滿而得者),自其中選定任意之700 μm×300 μm之區域,進行併用離子濺鍍之XPS分析。對每個樣品選定1個區域,對3個樣品分別進行1次、合計3次之分析。於全部3次分析中後述之S1與S2之大小關係均一致之情形時(當As濃化層存在於表面側時,於全部3次分析中均成為S1>S2之情形時),判斷為形成有As濃化層。 此處,S1、S2及D1之定義如下所述。 S1:於對上述樣品進行之XPS分析之線圖中,SiO2 換算之深度為0~2×D1(nm)之區域中之As之檢測強度之積分值 S2:於對上述樣品進行之XPS分析之線圖中,SiO2 換算之深度為2×D1~4×D1(nm)之區域中之As之檢測強度之積分值 D1:於對上述樣品進行之XPS分析之線圖中,於較O原子之檢測強度成為最大之SiO2 換算之深度(Do・max(nm))深之部分中,O原子之檢測強度成為最大檢測強度(Do・max處之強度)之1/2之強度的最初之SiO2 換算之深度(nm)(參考圖3)。 其中,本判定基準中之XPS分析之詳細條件按照後述之「(1)有無As濃化層之評價」之記載。 再者,於本判定基準中,以可定義D1、即於XPS分析線圖中O原子之檢測強度取最大值為前提,於無法定義D1之情形時(O原子之檢測強度始終固定等之情形時),判斷為As濃化層不存在。(Criteria for judging) Prepare a sample with a size of 5.0 mm x 5.0 mm (if the solder material is not in the form of a plate, the solder material (solder powder, solder ball, etc.) (obtained by conglomeration), select an arbitrary area of 700 μm×300 μm, and perform XPS analysis using ion sputtering. One region is selected for each sample, and three samples are analyzed once each, for a total of three times. When the size relationship between S1 and S2 described later is consistent in all three analyzes (when the As concentration layer exists on the surface side, it is the case that S1 > S2 in all three analyzes), it is judged to be formed There is an As concentrated layer. Here, the definitions of S1, S2 and D1 are as follows. S1: In the line graph of the XPS analysis performed on the above sample, the integrated value of the detection intensity of As in the region where the SiO 2 converted depth is 0 to 2×D1 (nm) S2: In the XPS analysis performed on the above sample In the line graph, the integral value D1 of the detection intensity of As in the region where the SiO 2 conversion depth is 2×D1~4×D1 (nm): in the line graph of the XPS analysis performed on the above sample, at In the deep part where the detection intensity of atoms becomes the maximum SiO2 equivalent depth (Do・max(nm)), the detection intensity of O atoms becomes 1/2 of the maximum detection intensity (the intensity at Do・max) at the beginning Depth (nm) in terms of SiO 2 (refer to Figure 3). However, the detailed conditions of the XPS analysis in this criterion are as described in "(1) Evaluation of the presence or absence of an As-concentrated layer" described later. Furthermore, in this judgment standard, it is premised that D1 can be defined, that is, the detection intensity of O atoms in the XPS analysis line diagram takes the maximum value. In the case where D1 cannot be defined (the detection intensity of O atoms is always fixed, etc.) ), it was judged that the As-concentrated layer did not exist.

若存在As濃化層,則可解決變色、潤濕性、製成焊膏時之黏度上升之問題之原因尚不明確,但可認為黏度上升係由藉由Sn或Sn氧化物與焊膏(助焊劑)中所包含之活性劑等各種添加劑之間產生之反應形成鹽,或焊劑材料凝聚等所引起,因而可認為其原因在於,若於焊劑材料之表面存在As濃化層,則As濃化層介存於焊劑合金與助焊劑之間,不易發生如上述之反應。但是,機制不取決於此。If there is an As concentration layer, it is not clear why the problems of discoloration, wettability, and viscosity increase when it is made into solder paste are not clear, but it is considered that the increase in viscosity is due to the interaction between Sn or Sn oxide and solder paste ( It is caused by the reaction between various additives such as activators contained in the flux) to form a salt, or the aggregation of the flux material, etc. Therefore, it is considered that the reason is that if there is an As concentration layer on the surface of the flux material, As Concentration The chemical layer is interposed between the flux alloy and the flux, and the above-mentioned reaction is not easy to occur. However, the mechanism does not depend on this.

於本實施形態中,As濃化層之厚度(SiO2 換算)並無限定,較佳為0.5~8.0 nm,更佳為0.5~4.0 nm,最佳為0.5~2.0 nm。此處,As濃化層之厚度係指2×D1。 若As濃化層之厚度為上述範圍,則不會對潤濕性造成不良影響而可充分抑制變色及製成焊膏時之經時之黏度上升。In this embodiment, the thickness of the As-concentrated layer (in terms of SiO 2 ) is not limited, but is preferably 0.5-8.0 nm, more preferably 0.5-4.0 nm, most preferably 0.5-2.0 nm. Here, the thickness of the As concentrated layer refers to 2×D1. When the thickness of the As concentration layer is within the above range, it is possible to sufficiently suppress discoloration and an increase in viscosity over time when it is made into a solder paste without adversely affecting wettability.

本實施形態之焊劑材料藉由使As及Pb相對於焊劑材料整體質量之含量為上述範圍內,且於焊劑材料中包含As濃化層,可抑制變色或製成焊膏時之經時之黏度上升,並且潤濕性或可靠性亦優異。The flux material of this embodiment can suppress discoloration or viscosity of solder paste over time by making the content of As and Pb relative to the mass of the entire flux material within the above-mentioned range, and including an As-concentrated layer in the flux material. rise, and excellent wettability and reliability.

本實施形態之焊劑材料之製造方法並無限定,可藉由將原料金屬熔融混合而製造。 於焊劑材料中形成As濃化層之方法亦無限定。作為As濃化層之形成方法之一例,可列舉將焊劑材料於氧化氛圍(空氣或氧氣氛圍)中進行加熱。加熱溫度並無限定,例如可設為40~200℃,亦可為50~80℃。加熱時間亦無限定,例如可設為數分鐘~數天,較佳為可設為數分鐘~數小時。為了形成充分量之As濃化層,加熱時間較佳為設為10分鐘以上,進而較佳為設為20分鐘以上。The manufacturing method of the flux material of this embodiment is not limited, It can manufacture by melt-mixing raw material metal. The method of forming the As concentration layer in the solder material is also not limited. As an example of the formation method of an As concentration layer, heating a flux material in an oxidation atmosphere (air or oxygen atmosphere) is mentioned. Heating temperature is not limited, For example, it may be 40-200 degreeC, and may be 50-80 degreeC. The heating time is also not limited, for example, it may be several minutes to several days, preferably several minutes to several hours. In order to form a sufficient amount of As concentrating layer, the heating time is preferably at least 10 minutes, more preferably at least 20 minutes.

於本實施形態中,焊劑材料之形態並無特別限定,可為如焊劑棒之棒狀,亦可為線狀,亦可為焊劑球或焊劑粉末等粒子狀。 若焊劑材料為粒子狀,則焊劑材料之流動性提高。In this embodiment, the form of the flux material is not particularly limited, and may be in the form of a rod such as a solder rod, a wire, or particles such as solder balls or solder powder. When the flux material is in the form of particles, the fluidity of the flux material is improved.

粒子狀之焊劑材料之製造方法並無限定,可採用滴加經熔融之焊劑材料而獲得粒子之滴加法或進行離心噴霧之噴霧法、將塊狀之焊劑材料粉碎之方法等公知之方法。於滴加法或噴霧法中,為了製成粒子狀,滴加或噴霧較佳為於惰性氛圍或溶劑中進行。The method of producing the granular flux material is not limited, and known methods such as a dropping method of dripping molten flux material to obtain particles, a spray method of centrifugal spraying, and a method of pulverizing bulk flux material can be used. In the dropping method or the spraying method, in order to form particles, the dropping or spraying is preferably performed in an inert atmosphere or in a solvent.

又,於焊劑材料為粒子狀之情形時,若具有於JIS Z 3284-1:2004中之粉末尺寸之分類(表2)中相當於標號1~8之尺寸(粒度分佈),則可實現對微細零件之焊接。粒子狀焊劑材料之尺寸更佳為相當於標號4~8之尺寸,進而較佳為相當於標號5~8之尺寸。 於焊劑材料為粒子狀之情形時,真球度較佳為0.90以上,更佳為0.95以上,最佳為0.99以上。In addition, when the flux material is in the form of particles, if it has a size (particle size distribution) corresponding to the number 1 to 8 in the powder size classification (Table 2) in JIS Z 3284-1:2004, it can be realized. Welding of micro parts. The size of the particulate flux material is more preferably the size corresponding to the number 4-8, and more preferably the size corresponding to the number 5-8. When the flux material is granular, the true sphericity is preferably at least 0.90, more preferably at least 0.95, and most preferably at least 0.99.

於本實施形態中,焊劑材料之使用形態並無特別限定。例如,可與油脂等混合而製成樹脂粉芯焊劑,於焊劑材料為粉末狀之情形時,亦可與包含松香系樹脂、活性劑、溶劑等之助焊劑混合而作為焊膏使用,或作為焊劑球使用,但本實施形態之焊劑材料於製成焊膏之情形時之經時之黏度上升較小,故而特別適合用作焊膏。In this embodiment, the usage form of the flux material is not particularly limited. For example, it can be mixed with fats and oils to make resin cored flux, and when the flux material is in powder form, it can also be mixed with flux containing rosin-based resins, activators, solvents, etc. to use as solder paste, or as a Solder balls are used, but the flux material of this embodiment has a small increase in viscosity over time when it is made into a solder paste, so it is particularly suitable for use as a solder paste.

於本實施形態中,焊膏包含本實施形態之焊劑粉末及助焊劑。 此處,所謂「助焊劑」係指焊膏中除焊劑粉末以外之所有成分,焊劑粉末與助焊劑之質量比(焊劑粉末:助焊劑)並無限定,可根據用途適宜地設定。In this embodiment, the solder paste contains the flux powder and flux of this embodiment. Here, "flux" refers to all components in the solder paste except flux powder, and the mass ratio of flux powder to flux (solder powder:flux) is not limited and can be appropriately set according to the application.

於本實施形態中,助焊劑之組成並無限定,例如可以任意比率包含:樹脂成分;溶劑;活性劑、觸變劑、pH值調整劑、抗氧化劑、著色劑、消泡劑等各種添加劑等。對於樹脂、溶劑、各種添加劑亦無限定,可使用焊膏中一般使用者。對於活性劑,作為較佳之具體例,可列舉有機酸、胺、鹵素(有機鹵化合物、胺氫鹵酸鹽)等。In this embodiment, the composition of the soldering flux is not limited, for example, it may include various additives such as resin components, solvents, activators, thixotropic agents, pH regulators, antioxidants, colorants, defoamers, etc. in any ratio. . Resins, solvents, and various additives are also not limited, and general users of solder paste can be used. Preferable specific examples of the activator include organic acids, amines, halogens (organic halogen compounds, amine hydrohalides), and the like.

於本實施形態中,焊膏可進一步包含氧化鋯粉末。氧化鋯粉末相對於焊膏整體質量之含量較佳為0.05~20.0質量%,更佳為0.05~10.0質量%,最佳為0.1~3質量%。 若氧化鋯粉末之含量為上述範圍內,則助焊劑中所包含之活性劑與氧化鋯粉末優先反應,不易發生與焊劑粉末表面之Sn或Sn氧化物之反應,藉此發揮進一步抑制由經時變化所導致之黏度上升之效果。In this embodiment, the solder paste may further include zirconia powder. The content of the zirconia powder relative to the overall mass of the solder paste is preferably 0.05-20.0% by mass, more preferably 0.05-10.0% by mass, most preferably 0.1-3% by mass. If the content of the zirconia powder is within the above range, the activator contained in the flux reacts preferentially with the zirconia powder, and the reaction with Sn or Sn oxide on the surface of the flux powder is less likely to occur, thereby further suppressing the effect of aging. The effect of the viscosity increase caused by the change.

添加於焊膏之氧化鋯粉末之粒徑之上限並無限定,較佳為5 μm以下。若粒徑為5 μm以下,則可維持膏之印刷性。又,下限亦無特別限定,較佳為0.5 μm以上。上述粒徑係設為拍攝氧化鋯粉末之SEM(scanning electron microscope,掃描式電子顯微鏡)照片,對視野內存在之各粒子藉由圖像分析求出投影圓當量徑時,投影圓當量徑為0.1 μm以上者之投影圓當量徑之平均值。 氧化鋯粒子之形狀並無特別限定,若為異形狀,則與助焊劑之接觸面積較大而有增黏抑制效果。若為球形,則可獲得良好之流動性,因此可獲得作為膏之優異之印刷性。只要根據所需特性而適宜地選擇形狀即可。There is no upper limit on the particle size of the zirconia powder added to the solder paste, but it is preferably 5 μm or less. If the particle size is 5 μm or less, the printability of the paste can be maintained. Also, the lower limit is not particularly limited, but is preferably 0.5 μm or more. The above-mentioned particle size is taken as a SEM (scanning electron microscope, scanning electron microscope) photo of zirconia powder. When the projected circle equivalent diameter is obtained by image analysis for each particle existing in the field of view, the projected circle equivalent diameter is 0.1 The average value of the projected circle equivalent diameter of those above μm. The shape of the zirconia particles is not particularly limited, and if it is of a different shape, the contact area with the flux will be larger, and it will have the effect of suppressing the increase of viscosity. If it is spherical, good fluidity can be obtained, so excellent printability as a paste can be obtained. What is necessary is just to select a shape suitably according to the required characteristic.

於本實施形態中,焊膏可藉由將本實施形態之焊劑材料(焊劑粉末)與助焊劑藉由公知之方法進行混練而製造。 本實施形態中之焊膏例如可用於電子機器中之微細構造之電路基板,具體而言,可藉由使用金屬遮罩之印刷法、使用分注器之噴出法或利用轉印針之轉印法等,塗佈於焊接部,進行回焊。In the present embodiment, the solder paste can be produced by kneading the flux material (flux powder) and flux according to the present embodiment by a known method. The solder paste in this embodiment can be used for, for example, a circuit board with a fine structure in an electronic device. Specifically, it can be printed by a printing method using a metal mask, a discharge method using a dispenser, or a transfer needle. method, etc., apply to the welded part, and perform reflow.

於本實施形態中,焊劑材料可用作將2個或2個以上之各種構件接合之接頭(接合部分)。接合構件並無限定,例如,作為電子機器構件之接頭亦有用。 於本實施形態中,焊劑接頭包含Sn或Sn系合金、40~250質量ppm之As、及20質量ppm~0.7質量%之Pb,且至少於其一部分包含As濃化層。本實施形態之焊劑接頭可具有與上述之本實施形態之焊劑材料相同之組成及物性,可使用上述之本實施形態之焊劑材料形成。 於As及Pb相對於焊劑接頭整體質量之含量為上述範圍內,且於焊劑接頭中包含As濃化層之情形時,成為無變色而可靠性優異之焊劑接頭。In this embodiment, the flux material can be used as a joint (joint portion) for joining two or more various members. The joining member is not limited, for example, it is also useful as a joint of an electronic equipment member. In this embodiment, the solder joint contains Sn or a Sn-based alloy, 40-250 mass ppm of As, and 20 mass ppm-0.7 mass % of Pb, and at least a part thereof contains an As-concentrated layer. The solder joint of this embodiment can have the same composition and physical properties as the above-mentioned flux material of this embodiment, and can be formed using the above-mentioned flux material of this embodiment. When the content of As and Pb with respect to the mass of the whole solder joint is within the above-mentioned range, and when the As concentrated layer is included in the solder joint, it becomes a solder joint with no discoloration and excellent reliability.

於本實施形態中,焊劑接頭例如可藉由將包含本實施形態之焊劑材料之焊劑球或本實施形態之焊膏配置或塗佈於接合預定部分並進行加熱等業界中一般之方法製造。In this embodiment, the solder joint can be manufactured by, for example, a common method in the industry, such as disposing or applying solder balls containing the flux material of this embodiment or the solder paste of this embodiment on portions to be joined and heating.

以下,藉由實施例對本發明進行具體說明,但本發明並不限定於實施例所記載之內容。 [實施例]Hereinafter, the present invention will be specifically described with examples, but the present invention is not limited to the contents described in the examples. [Example]

(評價) 對實施例、比較例各者之焊劑粉末,如下所述般進行(1)有無As濃化層之評價、(2)增黏抑制之評價、(3)焊劑潤濕性之評價、(4)可靠性之評價。(Evaluation) For the flux powders of Examples and Comparative Examples, (1) evaluation of the presence or absence of an As concentrated layer, (2) evaluation of inhibition of thickening, (3) evaluation of solder wettability, (4) Evaluation of reliability.

(1)有無As濃化層之評價 有無As濃化層係使用利用XPS(X射線光電子光譜法:X-ray Photoelectron Spectroscopy)之深度方向分析以如下方式進行評價。 (分析條件) ・分析裝置:微小區域X射線光電子光譜分析裝置(Kratos Analytical公司製造之AXIS Nova) ・分析條件:X射線源為AlKα射線、X射線槍電壓為15 kV、X射線槍電流值為10 mA、分析區域為700 μm×300 μm ・濺鍍條件:離子種為Ar+ 、加速電壓為2 kV、濺鍍速率為0.5 nm/min(SiO2 換算) ・樣品:準備3個於貼有碳帶之載台上無間隙地鋪滿焊劑材料(實施例及比較例中之焊劑粉末)而得者,作為樣品。其中,樣品之大小設為5.0 mm×5.0 mm。 (評價順序) 自5.0 mm×5.0 mm之大小之樣品中選定任意之700 μm×300 μm之區域,一面進行離子濺鍍一面對Sn、O及As之各原子進行XPS分析,獲得XPS分析之線圖。對每個樣品選定1個區域,對3個樣品分別進行1次、合計3次之分析。 將藉由XPS分析獲得之線圖之一例示於圖1~3。圖1~3係對同一樣品變更縱軸之檢測強度(cps)之標度而得者,橫軸為由濺鍍時間算出之SiO2 換算之深度(nm)。於XPS分析之線圖中,縱軸為檢測強度(cps),橫軸可選自濺鍍時間(min)或由濺鍍時間使用SiO2 標準試樣之濺鍍蝕刻速率算出之SiO2 換算之深度(nm)之任一者,但於圖1~3中,將XPS分析之線圖中之橫軸設為由濺鍍時間使用SiO2 標準試樣之濺鍍蝕刻速率算出之SiO2 換算之深度(nm)。 並且,於各樣品之XPS分析之線圖中,將O原子之檢測強度成為最大之SiO2 換算之深度設為Do・max(nm)(參考圖2)。然後,將於較Do・max深之部分中,O原子之檢測強度成為最大檢測強度(Do・max處之強度)之1/2之強度的最初之SiO2 換算之深度設為D1(nm)。 其次,於各樣品之XPS分析之線圖中,求出自最表面至深度2×D1的區域(SiO2 換算之深度為0~2×D1(nm)之區域)中之As之檢測強度之積分值(S1)及自深度2×D1至進而深僅2×D1之部分的區域(SiO2 換算之深度為2×D1~4×D1(nm)之區域)中之As之檢測強度之積分值(S2)(參考圖3),並將其等進行比較。 繼而,基於以下之基準進行評價。 ・於全部3次之測定中均成為S1>S2 :形成有As濃化層(○) ・全部3次之測定中2次以下之次數成為S1>S2 :未形成有As濃化層(×)(1) Evaluation of the presence or absence of an As concentrating layer The presence or absence of an As concentrating layer was evaluated as follows using depth direction analysis by XPS (X-ray photoelectron spectroscopy: X-ray Photoelectron Spectroscopy). (Analysis conditions) ・Analysis device: Micro-area X-ray photoelectron spectroscopy analyzer (AXIS Nova manufactured by Kratos Analytical Co., Ltd.) ・Analysis conditions: X-ray source is AlKα rays, X-ray gun voltage is 15 kV, X-ray gun current is 10 mA, analysis area 700 μm×300 μm ・Sputtering conditions: Ar + ion species, accelerating voltage 2 kV, sputtering rate 0.5 nm/min (SiO 2 conversion) ・Samples: Prepare 3 samples A sample obtained by spreading the flux material (flux powder in Examples and Comparative Examples) on the stage of the carbon ribbon without gaps was used. Among them, the size of the sample is set at 5.0 mm×5.0 mm. (Evaluation procedure) Select an arbitrary area of 700 μm x 300 μm from a sample with a size of 5.0 mm x 5.0 mm, perform XPS analysis on each atom of Sn, O, and As while performing ion sputtering, and obtain the results of the XPS analysis line graph. One region is selected for each sample, and three samples are analyzed once each, for a total of three times. An example of the line graph obtained by XPS analysis is shown in FIGS. 1 to 3 . Figures 1 to 3 are obtained by changing the scale of the detection intensity (cps) on the vertical axis for the same sample, and the horizontal axis is the depth (nm) converted to SiO2 calculated from the sputtering time. In the line graph of XPS analysis, the vertical axis is the detection intensity (cps), and the horizontal axis can be selected from the sputtering time (min) or the SiO2 conversion calculated from the sputtering etching rate of the SiO2 standard sample for the sputtering time Any depth (nm), but in Figures 1 to 3, the horizontal axis in the XPS analysis line graph is set to the SiO2 conversion calculated from the sputtering etching rate of the SiO2 standard sample for the sputtering time Depth (nm). In addition, in the line graph of XPS analysis of each sample, the depth in terms of SiO 2 at which the detection intensity of O atoms becomes the maximum is defined as Do·max (nm) (see FIG. 2 ). Then, in the part deeper than Do・max, the detection intensity of O atoms becomes 1/2 of the maximum detection intensity (intensity at Do・max) in the first SiO2 -converted depth is set to D1 (nm) . Next, in the line graph of the XPS analysis of each sample, the ratio of the detection intensity of As in the region from the outermost surface to the depth of 2×D1 (the depth of SiO2 conversion is 0 to 2×D1 (nm)) is obtained. Integral value (S1) and the integral of detection intensity of As in the region from the depth of 2×D1 to the part as deep as 2×D1 (the region with a depth of 2×D1 to 4×D1 (nm) in terms of SiO 2 ) value (S2) (refer to Figure 3), and compare them. Then, evaluation was performed based on the following criteria.・S1>S2 in all 3 measurements: As-concentrated layer formed (○) ・S1>S2 in 2 or less of all 3 measurements: As-concentrated layer not formed (×)

(2)增黏抑制之評價 將以下之表1所示之組成之各材料加熱攪拌後,進行冷卻,藉此製備助焊劑。將所製備之助焊劑以及實施例、比較例各者之焊劑粉末以助焊劑與焊劑粉末之質量比(助焊劑:焊劑粉末)成為11:89之方式進行混練而製造焊膏。(2) Evaluation of viscosity increase inhibition After each material of the composition shown in the following Table 1 was heated and stirred, it cooled, and the flux was prepared. Solder paste was produced by kneading the prepared flux and the flux powder of each of Examples and Comparative Examples so that the mass ratio of the flux and the flux powder (flux:flux powder) would be 11:89.

[表1]

Figure 108124086-A0304-0001
[Table 1]
Figure 108124086-A0304-0001

對所獲得之焊膏,按照JIS Z 3284-3之「4.2 黏度特性試驗」所記載之方法,使用旋轉黏度計(PCU-205、Malcom股份有限公司製造),於轉速:10 rpm、測定溫度:25℃下,持續測定黏度12小時。然後,將初始黏度(攪拌30分鐘後之黏度)與12小時後之黏度進行比較,基於以下之基準進行增黏抑制效果之評價。 12小時後之黏度≦初始黏度×1.2:經時之黏度上升較小而良好(○) 12小時後之黏度>初始黏度×1.2:經時之黏度上升較大而不良(×)For the obtained solder paste, according to the method described in "4.2 Viscosity characteristic test" of JIS Z 3284-3, use a rotational viscometer (PCU-205, manufactured by Malcom Co., Ltd.) at a rotation speed of 10 rpm and a measurement temperature of: At 25°C, continue to measure the viscosity for 12 hours. Then, the initial viscosity (viscosity after stirring for 30 minutes) was compared with the viscosity after 12 hours, and the thickening suppression effect was evaluated based on the following criteria. Viscosity after 12 hours≦initial viscosity×1.2: Viscosity increase over time is small and good (○) Viscosity after 12 hours > Initial viscosity × 1.2: Viscosity increases over time and is not good (×)

(3)焊劑潤濕性之評價 以與上述之「(2)增黏抑制之評價」相同之方式,使用實施例及比較例各者之焊劑粉末製造焊膏。 使用開口直徑為6.5 mm、開口數量為4個、遮罩厚度為0.2 mm之金屬遮罩將所獲得之焊膏印刷至Cu板上,於回焊爐中,於N2 氛圍下,以1℃/sec之升溫速度自25℃加熱至260℃後,於空氣中冷卻至室溫(25℃),形成4個焊劑凸塊。使用光學顯微鏡(倍率:100倍),觀察所獲得之焊劑凸塊之外觀,基於以下之基準進行評價。 於4個焊劑凸塊中均未觀察到未熔融完之焊劑粒子。 :焊劑潤濕性良好(○) 於4個焊劑凸塊中之1個以上中觀察到未熔融完之焊劑粒子。 :焊劑潤濕性不良(×)(3) Evaluation of solder wettability In the same manner as in the above-mentioned "(2) Evaluation of thickening suppression", solder paste was produced using the flux powders of each of the examples and comparative examples. Use a metal mask with an opening diameter of 6.5 mm, a number of openings of 4, and a mask thickness of 0.2 mm to print the obtained solder paste on a Cu board, and in a reflow furnace under N 2 atmosphere at 1 °C The heating rate of /sec is from 25°C to 260°C, and then cooled to room temperature (25°C) in air to form 4 solder bumps. The external appearance of the obtained solder bump was observed using an optical microscope (magnification: 100 times), and it evaluated based on the following reference|standard. Incompletely melted flux particles were not observed in any of the four solder bumps. : Solder wettability is good (◯) Incompletely melted flux particles were observed in one or more of the four solder bumps. : Poor flux wettability (×)

(4)可靠性之評價 對實施例、比較例各者之焊劑粉末,使用示差掃描熱量計(EXSTAR DSC7020、SII Nano Technologies股份有限公司製造),於升溫速度:5℃/分鐘(180℃~250℃)、降溫速度:-3℃/分鐘(250℃~150℃)、載氣:N2 之測定條件下進行DSC(Differential Scanning Calorimetry,示差掃描熱量)測定,測定液相線溫度(TL )及固相線溫度(TS )。然後,算出液相線溫度(TL )與固相線溫度(TS )之差(ΔT=TL -TS ),基於以下之基準進行評價。 ΔT為10℃以內 :可靠性優異(○) ΔT超過10℃ :可靠性較差(×) 於焊劑粉末之液相線溫度(TL )與固相線溫度(TS )之差(ΔT=TL -TS )較大之情形時,將包含該焊劑粉末之焊膏塗佈於電子機器之基板後,進行凝固時,熔點較高之組織容易析出至焊劑粉末之表面。若熔點較高之組織析出至焊劑粉末之表面,則其後,向焊劑粉末之內側逐次析出熔點較低之組織,成為焊劑粉末之組織容易變得不均勻,降低循環性等可靠性之原因。(4) Evaluation of reliability For the flux powders of Examples and Comparative Examples, use a differential scanning calorimeter (EXSTAR DSC7020, manufactured by SII Nano Technologies Co., Ltd.) at a heating rate of 5°C/min (180°C to 250°C). ℃), cooling rate: -3℃/min (250℃~150℃), carrier gas: N 2 under the conditions of DSC (Differential Scanning Calorimetry, Differential Scanning Calorimetry) measurement, liquidus temperature (T L ) and solidus temperature (T S ). Then, the difference (ΔT=T L -T S ) between the liquidus temperature (T L ) and the solidus temperature (T S ) was calculated, and the evaluation was performed based on the following criteria. ΔT within 10°C: excellent reliability (○) ΔT over 10°C: poor reliability (×) The difference between the liquidus temperature (T L ) and solidus temperature (T S ) of the solder powder (ΔT=T When L - T S ) is large, when the solder paste containing the flux powder is applied to the substrate of the electronic device and then solidified, structures with a higher melting point tend to precipitate on the surface of the flux powder. If the structure with higher melting point precipitates on the surface of the flux powder, then the structure with lower melting point gradually precipitates to the inside of the flux powder, which will cause the structure of the flux powder to become uneven and reduce the reliability of the cycle.

(實施例A1~A35、比較例A1~A12) 以As及Pb之含量成為以下之表2所示、Sn成為其之其餘部分(Sn、As及Pb之合計成為100質量%之其餘部分)之方式秤取Sn、As及Pb,進行熔融混合,於Ar氛圍中進行離心噴霧,藉此製備粉末(平均粒徑為21 μm,相當於JIS Z3284-1:2004之粉末尺寸分類(表2)之5)。將所獲得之粉末於空氣中使用乾燥裝置於60℃下加熱30分鐘,獲得實施例、比較例之焊劑粉末。其中,對於比較例A1~A6,不施加加熱處理,將離心噴霧所獲得之粉末直接作為焊劑粉末。 再者,於以下之表中,As之含量為相對於焊劑材料整體質量之質量ppm,Pb之含量為相對於焊劑材料整體質量之質量%。 又,作為Sn,使用包含不可避免之雜質之3N材。(Examples A1 to A35, Comparative Examples A1 to A12) Sn, As, and Pb were weighed so that the content of As and Pb became as shown in Table 2 below, and Sn became the rest (the total of Sn, As, and Pb became the rest of 100% by mass), and melt-mixed, Centrifugal spraying was performed in an Ar atmosphere to prepare a powder (average particle size: 21 μm, corresponding to JIS Z3284-1:2004 powder size classification (Table 2) 5). The obtained powder was heated in air at 60° C. for 30 minutes using a drying device to obtain flux powders of Examples and Comparative Examples. However, for Comparative Examples A1 to A6, heat treatment was not applied, and the powder obtained by centrifugal spraying was directly used as flux powder. In addition, in the following table|surface, content of As is mass ppm with respect to the mass of the whole flux material, and content of Pb is mass % with respect to the mass of the whole flux material. Also, as Sn, a 3N material containing unavoidable impurities is used.

(實施例B1~B35、比較例B1~B12) 以Cu之含量成為0.7質量%、As及Pb之含量成為以下之表3所示、Sn成為其之其餘部分(Sn、As、Pb及Cu之合計成為100質量%之其餘部分)之方式秤取Sn、As、Pb及Cu,進行熔融混合,於Ar氛圍中進行離心噴霧,藉此製備粉末(平均粒徑為21 μm、粉末尺寸分類之5)。將所獲得之粉末於空氣中使用乾燥裝置於60℃下加熱30分鐘,獲得實施例、比較例之焊劑粉末。其中,對於比較例B1~B6,不施加加熱處理,將離心噴霧所獲得之粉末直接作為焊劑粉末。 再者,於以下之表中,As之含量為相對於焊劑材料整體質量之質量ppm,Pb及Cu之含量為相對於焊劑材料整體質量之質量%。 又,作為Sn,使用包含不可避免之雜質之3N材。(Examples B1-B35, Comparative Examples B1-B12) Weighed so that the content of Cu becomes 0.7% by mass, the content of As and Pb becomes as shown in Table 3 below, and the rest of Sn (the total of Sn, As, Pb, and Cu becomes the rest of 100% by mass) Sn, As, Pb, and Cu were melt-mixed and centrifugally sprayed in an Ar atmosphere to prepare powder (average particle size 21 μm, powder size classification 5). The obtained powder was heated in air at 60° C. for 30 minutes using a drying device to obtain flux powders of Examples and Comparative Examples. However, for Comparative Examples B1 to B6, heat treatment was not applied, and the powder obtained by centrifugal spraying was directly used as flux powder. In addition, in the following table|surface, content of As is mass ppm with respect to the mass of the whole flux material, and content of Pb and Cu is mass % with respect to the mass of the whole flux material. Also, as Sn, a 3N material containing unavoidable impurities is used.

(實施例C1~C35、比較例C1~C12) 以Cu之含量成為0.5質量%、Ag之含量成為1.0質量%、As及Pb之含量成為以下之表4所示、Sn成為其之其餘部分(Sn、As、Pb、Ag及Cu之合計成為100質量%之其餘部分)之方式秤取Sn、As、Pb、Ag及Cu,進行熔融混合,於Ar氛圍中進行離心噴霧,藉此製備粉末(平均粒徑為21 μm、粉末尺寸分類之5)。將所獲得之粉末於空氣中使用乾燥裝置於60℃下加熱30分鐘,獲得實施例、比較例之焊劑粉末。其中,對於比較例C1~C6,不施加加熱處理,將離心噴霧所獲得之粉末直接作為焊劑粉末。 再者,於以下之表中,As之含量為相對於焊劑材料整體質量之質量ppm,Pb、Ag及Cu之含量為相對於焊劑材料整體質量之質量%。 又,作為Sn,使用包含不可避免之雜質之3N材。 對實施例C1所獲得之焊劑粉末,依據JIS Z 3910利用ICP-AES分析Sn、As、Pb、Ag及Cu之含量,結果可確認到與添加量一致。(Examples C1-C35, Comparative Examples C1-C12) When the content of Cu is 0.5% by mass, the content of Ag is 1.0% by mass, the content of As and Pb is as shown in Table 4 below, and Sn is the rest (the total of Sn, As, Pb, Ag, and Cu is 100 Sn, As, Pb, Ag, and Cu were weighed by the method of mass %, melted and mixed, and centrifugally sprayed in Ar atmosphere to prepare powder (average particle size 21 μm, powder size classification 5) . The obtained powder was heated in air at 60° C. for 30 minutes using a drying device to obtain flux powders of Examples and Comparative Examples. Among them, for Comparative Examples C1 to C6, heat treatment was not applied, and the powder obtained by centrifugal spraying was directly used as flux powder. In addition, in the following table|surface, content of As is mass ppm with respect to the mass of the whole solder material, and content of Pb, Ag, and Cu is mass % with respect to the mass of the whole solder material. Also, as Sn, a 3N material containing unavoidable impurities is used. For the flux powder obtained in Example C1, the contents of Sn, As, Pb, Ag, and Cu were analyzed by ICP-AES according to JIS Z 3910, and the results confirmed that they were consistent with the added amounts.

(實施例D1~D35、比較例D1~D12) 以Cu之含量成為0.5質量%、Ag之含量成為2.0質量%、As及Pb之含量成為以下之表5所示、Sn成為其之其餘部分(Sn、As、Pb、Ag及Cu之合計成為100質量%之其餘部分)之方式秤取Sn、As、Pb、Ag及Cu,進行熔融混合,於Ar氛圍中進行離心噴霧,藉此製備粉末(平均粒徑為21 μm、粉末尺寸分類之5)。將所獲得之粉末於空氣中使用乾燥裝置於60℃下加熱30分鐘,獲得實施例、比較例之焊劑粉末。其中,對於比較例D1~D6,不施加加熱處理,將離心噴霧所獲得之粉末直接作為焊劑粉末。 再者,於以下之表中,As之含量為相對於焊劑材料整體質量之質量ppm,Pb、Ag及Cu之含量為相對於焊劑材料整體質量之質量%。 又,作為Sn,使用包含不可避免之雜質之3N材。(Examples D1-D35, Comparative Examples D1-D12) The content of Cu is 0.5% by mass, the content of Ag is 2.0% by mass, the content of As and Pb is as shown in the following Table 5, and the rest is Sn (the total of Sn, As, Pb, Ag and Cu is 100 Sn, As, Pb, Ag, and Cu were weighed by the method of mass %, melted and mixed, and centrifugally sprayed in Ar atmosphere to prepare powder (average particle size 21 μm, powder size classification 5) . The obtained powder was heated in air at 60° C. for 30 minutes using a drying device to obtain flux powders of Examples and Comparative Examples. Among them, for Comparative Examples D1 to D6, heat treatment was not applied, and the powder obtained by centrifugal spraying was directly used as flux powder. In addition, in the following table|surface, content of As is mass ppm with respect to the mass of the whole solder material, and content of Pb, Ag, and Cu is mass % with respect to the mass of the whole solder material. Also, as Sn, a 3N material containing unavoidable impurities is used.

(實施例E1~E35、比較例E1~E12) 以Cu之含量成為0.5質量%、Ag之含量成為3.0質量%、As及Pb之含量成為以下之表6所示、Sn成為其之其餘部分(Sn、As、Pb、Ag及Cu之合計成為100質量%之其餘部分)之方式秤取Sn、As、Pb、Ag及Cu,進行熔融混合,於Ar氛圍中進行離心噴霧,藉此製備粉末(平均粒徑為21 μm、粉末尺寸分類之5)。將所獲得之粉末於空氣中使用乾燥裝置於60℃下加熱30分鐘,獲得實施例、比較例之焊劑粉末。其中,對於比較例E1~E6,不施加加熱處理,將離心噴霧所獲得之粉末直接作為焊劑粉末。 再者,於以下之表中,As之含量為相對於焊劑材料整體質量之質量ppm,Pb、Ag及Cu之含量為相對於焊劑材料整體質量之質量%。 又,作為Sn,使用包含不可避免之雜質之3N材。(Examples E1-E35, Comparative Examples E1-E12) When the content of Cu is 0.5% by mass, the content of Ag is 3.0% by mass, the content of As and Pb is as shown in Table 6 below, and the rest is Sn (the total of Sn, As, Pb, Ag, and Cu is 100 Sn, As, Pb, Ag, and Cu were weighed by the method of mass %, melted and mixed, and centrifugally sprayed in Ar atmosphere to prepare powder (average particle size 21 μm, powder size classification 5) . The obtained powder was heated in air at 60° C. for 30 minutes using a drying device to obtain flux powders of Examples and Comparative Examples. Among them, for Comparative Examples E1 to E6, heat treatment was not applied, and the powder obtained by centrifugal spraying was directly used as flux powder. In addition, in the following table|surface, content of As is mass ppm with respect to the mass of the whole solder material, and content of Pb, Ag, and Cu is mass % with respect to the mass of the whole solder material. Also, as Sn, a 3N material containing unavoidable impurities is used.

(實施例F1~F35、比較例F1~F12) 以Cu之含量成為0.5質量%、Ag之含量成為3.5質量%、As及Pb之含量成為以下之表7所示、Sn成為其之其餘部分(Sn、As、Pb、Ag及Cu之合計成為100質量%之其餘部分)之方式秤取Sn、As、Pb、Ag及Cu,進行熔融混合,於Ar氛圍中進行離心噴霧,藉此製備粉末(平均粒徑為21 μm、粉末尺寸分類之5)。將所獲得之粉末於空氣中使用乾燥裝置於60℃下加熱30分鐘,獲得實施例、比較例之焊劑粉末。其中,對於比較例F1~F6,不施加加熱處理,將離心噴霧所獲得之粉末直接作為焊劑粉末。 再者,於以下之表中,As之含量為相對於焊劑材料整體質量之質量ppm,Pb、Ag及Cu之含量為相對於焊劑材料整體質量之質量%。 又,作為Sn,使用包含不可避免之雜質之3N材。(Examples F1 to F35, Comparative Examples F1 to F12) When the content of Cu is 0.5% by mass, the content of Ag is 3.5% by mass, the content of As and Pb is as shown in Table 7 below, and Sn is the rest (the total of Sn, As, Pb, Ag, and Cu is 100 Sn, As, Pb, Ag, and Cu were weighed by the method of mass %, melted and mixed, and centrifugally sprayed in Ar atmosphere to prepare powder (average particle size 21 μm, powder size classification 5) . The obtained powder was heated in air at 60° C. for 30 minutes using a drying device to obtain flux powders of Examples and Comparative Examples. Among them, for Comparative Examples F1 to F6, heat treatment was not applied, and the powder obtained by centrifugal spraying was directly used as flux powder. In addition, in the following table|surface, content of As is mass ppm with respect to the mass of the whole solder material, and content of Pb, Ag, and Cu is mass % with respect to the mass of the whole solder material. Also, as Sn, a 3N material containing unavoidable impurities is used.

將對實施例及比較例各者之焊劑粉末的(1)有無As濃化層之評價、(2)增黏抑制之評價、(3)焊劑潤濕性之評價、(4)可靠性之評價的評價結果示於以下之表2~7。(1) Evaluation of the presence or absence of an As concentration layer, (2) evaluation of inhibition of thickening, (3) evaluation of solder wettability, and (4) evaluation of reliability of the flux powders of Examples and Comparative Examples The results of the evaluation are shown in Tables 2 to 7 below.

[表2-1]

Figure 108124086-A0304-0002
[表2-2]
Figure 108124086-A0304-0003
[table 2-1]
Figure 108124086-A0304-0002
[Table 2-2]
Figure 108124086-A0304-0003

[表3-1]

Figure 108124086-A0304-0004
[表3-2]
Figure 108124086-A0304-0005
[Table 3-1]
Figure 108124086-A0304-0004
[Table 3-2]
Figure 108124086-A0304-0005

[表4-1]

Figure 108124086-A0304-0006
[表4-2]
Figure 108124086-A0304-0007
[Table 4-1]
Figure 108124086-A0304-0006
[Table 4-2]
Figure 108124086-A0304-0007

[表5-1]

Figure 108124086-A0304-0008
[表5-2]
Figure 108124086-A0304-0009
[Table 5-1]
Figure 108124086-A0304-0008
[Table 5-2]
Figure 108124086-A0304-0009

[表6-1]

Figure 108124086-A0304-0010
[表6-2]
Figure 108124086-A0304-0011
[Table 6-1]
Figure 108124086-A0304-0010
[Table 6-2]
Figure 108124086-A0304-0011

[表7-1]

Figure 108124086-A0304-0012
[表7-2]
Figure 108124086-A0304-0013
[產業上之可利用性][Table 7-1]
Figure 108124086-A0304-0012
[Table 7-2]
Figure 108124086-A0304-0013
[Industrial availability]

本發明之焊劑材料由於無變色、焊劑潤濕性或循環特性等可靠性亦優異,故而可用於各種用途,尤其是,由於製成膏時之經時之黏度上升較小,故而可較佳地用作焊膏用焊劑材料。The flux material of the present invention can be used in various applications because it has no discoloration and is excellent in reliability such as flux wettability and cycle characteristics. Used as a flux material for solder paste.

圖1係焊劑材料表面之XPS(X-ray photoelectron spectroscopy,X射線光電子光譜)分析之線圖之一例。 圖2係焊劑材料表面之XPS分析之線圖之一例。 圖3係焊劑材料表面之XPS分析之線圖之一例。Fig. 1 is an example of a line diagram of XPS (X-ray photoelectron spectroscopy, X-ray photoelectron spectroscopy) analysis on the surface of a solder material. Fig. 2 is an example of a line diagram of XPS analysis of the surface of a solder material. Fig. 3 is an example of a line diagram of XPS analysis of the surface of a solder material.

Claims (5)

一種焊劑合金,其包含40~250質量ppm之As、及20質量ppm~0.7質量%之Pb,其餘部分為Sn,且於表面具有藉由以下判定基準所確認之As濃化層;(判定基準)於5.0mm×5.0mm之大小之樣品中,自其中選定任意之700μm×300μm之區域,進行併用離子濺鍍之XPS分析;對每個樣品選定1個區域,對3個樣品分別進行1次、合計3次之分析;於全部3次分析中當成為S1>S2之情形時,判斷為形成有As濃化層;此處,S1:於XPS分析之線圖中,SiO2換算之深度為0~2×D1(nm)之區域中之As之檢測強度之積分值;S2:於XPS分析之線圖中,SiO2換算之深度為2×D1~4×D1(nm)之區域中之As之檢測強度之積分值;D1:於XPS分析之線圖中,於較O原子之檢測強度成為最大之SiO2換算之深度(Do‧max(nm))深之部分中,O原子之檢測強度成為最大檢測強度(Do‧max處之強度)之1/2之強度的最初之SiO2換算之深度(nm);再者,於XPS分析線圖中,O原子之檢測強度沒有取到最大值,無法定義D1之情形時,則判斷為As濃化層不存在。 A solder alloy comprising 40-250 mass ppm of As and 20 mass ppm-0.7 mass % of Pb, the remainder being Sn, and having an As-concentrated layer confirmed by the following criteria on the surface; (criteria ) in a sample with a size of 5.0mm×5.0mm, select any area of 700μm×300μm from it, and perform XPS analysis with ion sputtering; select 1 area for each sample, and conduct 1 time for each of the 3 samples , a total of 3 times of analysis; in all 3 times of analysis, when S1>S2 is the case, it is judged that there is an As concentrated layer; here, S1: in the line diagram of XPS analysis, the depth converted to SiO2 is Integral value of the detection intensity of As in the region of 0~2×D1(nm); S2: In the line diagram of XPS analysis, the depth converted from SiO 2 is in the region of 2×D1~4×D1(nm) Integral value of the detection intensity of As; D1: In the line diagram of XPS analysis, the detection of O atoms in the part deeper than the depth (Do‧max (nm)) converted to SiO 2 at which the detection intensity of O atoms becomes the maximum The initial SiO2 -converted depth (nm) at which the intensity becomes 1/2 of the intensity of the maximum detection intensity (the intensity at Do‧max); moreover, in the XPS analysis line diagram, the detection intensity of the O atom does not reach the maximum When the value of D1 cannot be defined, it is judged that the As-concentrated layer does not exist. 如請求項1之焊劑合金,其進而包含0~3.5質量%之Ag及/或0~0.7質量%之Cu。 The solder alloy according to claim 1, further comprising 0-3.5% by mass of Ag and/or 0-0.7% by mass of Cu. 如請求項1或2之焊劑合金,其中上述焊劑合金之形態為粉末。 The flux alloy according to claim 1 or 2, wherein the form of the above-mentioned flux alloy is powder. 一種焊膏,其包含如請求項3之焊劑合金、及助焊劑。 A solder paste, comprising the solder alloy according to claim 3, and flux. 一種焊劑接頭,其由如請求項1~3中任一項之焊劑合金所形成。 A solder joint formed of the solder alloy according to any one of Claims 1 to 3.
TW108124086A 2018-07-20 2019-07-09 Flux Materials, Solder Paste, and Solder Joints TWI781331B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018136676A JP6678704B2 (en) 2018-07-20 2018-07-20 Solder materials, solder paste, and solder joints
JP2018-136676 2018-07-20

Publications (2)

Publication Number Publication Date
TW202010592A TW202010592A (en) 2020-03-16
TWI781331B true TWI781331B (en) 2022-10-21

Family

ID=69170231

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108124086A TWI781331B (en) 2018-07-20 2019-07-09 Flux Materials, Solder Paste, and Solder Joints

Country Status (2)

Country Link
JP (1) JP6678704B2 (en)
TW (1) TWI781331B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6849934B1 (en) * 2020-03-18 2021-03-31 千住金属工業株式会社 Flux and solder paste
JP6836091B1 (en) * 2020-04-10 2021-02-24 千住金属工業株式会社 Solder alloys, solder powders, solder pastes, solder balls, solder preforms and solder fittings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201602366A (en) * 2014-07-15 2016-01-16 Tanaka Electronics Ind Copper rarefied-nickel alloy wire structure for bonding semiconductor devices
JP2016537206A (en) * 2013-10-31 2016-12-01 アルファ・メタルズ・インコーポレイテッドAlpha Metals, Inc. Lead-free and silver-free solder alloy
TW201800237A (en) * 2015-12-25 2018-01-01 日商三井金屬鑛業股份有限公司 Copper foil with carrier, copper foil with resin and method for manufacturing printed wiring board

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002224881A (en) * 2001-02-05 2002-08-13 Hitachi Metals Ltd Solder ball
JP5730353B2 (en) * 2013-07-17 2015-06-10 ハリマ化成株式会社 Solder composition, solder paste and electronic circuit board
JP6717559B2 (en) * 2013-10-16 2020-07-01 三井金属鉱業株式会社 Solder alloy and solder powder

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016537206A (en) * 2013-10-31 2016-12-01 アルファ・メタルズ・インコーポレイテッドAlpha Metals, Inc. Lead-free and silver-free solder alloy
TW201602366A (en) * 2014-07-15 2016-01-16 Tanaka Electronics Ind Copper rarefied-nickel alloy wire structure for bonding semiconductor devices
TW201800237A (en) * 2015-12-25 2018-01-01 日商三井金屬鑛業股份有限公司 Copper foil with carrier, copper foil with resin and method for manufacturing printed wiring board

Also Published As

Publication number Publication date
JP6678704B2 (en) 2020-04-08
TW202010592A (en) 2020-03-16
JP2020011284A (en) 2020-01-23

Similar Documents

Publication Publication Date Title
KR102600306B1 (en) Solder materials, solder paste and solder joints
JP7183313B2 (en) Solder alloy and solder powder
KR102241026B1 (en) Solder alloy, solder powder, solder paste and solder joints using these
Gain et al. The influence of a small amount of Al and Ni nano-particles on the microstructure, kinetics and hardness of Sn–Ag–Cu solder on OSP-Cu pads
JP6691305B2 (en) Solder materials, solder pastes, and solder joints
JP2018058090A (en) Solder paste and solder alloy powder
TWI695892B (en) Solder ball, solder joint and joining method
TWI781331B (en) Flux Materials, Solder Paste, and Solder Joints
US20090107584A1 (en) Solder and methods of making solder
TWI695893B (en) Solder paste
JP6691304B2 (en) Solder materials, solder pastes, and solder joints
JP6708942B1 (en) Solder alloy, solder paste, preform solder, solder ball, wire solder, grease solder, solder joint, electronic circuit board and multilayer electronic circuit board
JP6722378B2 (en) Solder material, solder paste, and solder joint
JP2020011301A (en) Solder material, solder paste, and solder joint
JP2020110843A (en) Solder material, solder paste, and solder joint
JP2020099950A (en) Solder material, solder paste and solder joint
JP2020055038A (en) Solder material, solder paste and solder joint
JP6810374B1 (en) Solder alloys, solder pastes, solder balls, solder preforms, and solder fittings
TWI720814B (en) Solder alloys, solder powders, and solder joints
JP5966449B2 (en) Solder alloy powder for bumps, solder paste for bumps and solder bumps
JP2017177122A (en) HIGH-TEMPERATURE Pb-FREE SOLDER PASTE AND MANUFACTURING METHOD THEREOF
TWI801734B (en) Solder alloys, solder powders, solder pastes, solder balls and solder preforms
JP2016172914A (en) Solder powder and solder paste using the powder
JP7032687B1 (en) Solder alloys, solder pastes, solder balls, solder preforms, and solder fittings
JP2016097420A (en) Au-Sn ALLOY SOLDER PASTE, METHOD FOR PRODUCING Au-Sn ALLOY SOLDER LAYER, AND Au-Sn ALLOY SOLDER LAYER

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent