TWI767555B - Cover plate structure and manufacturing method thereof - Google Patents
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- G—PHYSICS
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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Abstract
Description
本發明是關於一種紅外線穿透率結構技術領域,特別是有關於一種高紅外線穿透率的蓋板結構及其製作方法。The invention relates to the technical field of infrared transmittance structures, in particular to a cover plate structure with high infrared transmittance and a manufacturing method thereof.
現今對於行動裝置之資料安全性與隱私保護變得更為重要。行動裝置中的虹膜辨識、臉部辨識技術、體態偵測、手勢偵測以及部分生物辨識等系統,皆採用紅外線鏡頭。Data security and privacy protection for mobile devices are becoming more important these days. Iris recognition, facial recognition technology, posture detection, gesture detection and some biometric recognition systems in mobile devices all use infrared lenses.
上述技術,採用紅外線透光板來提取紅外線訊號光,進行偵測並辨識使用者的虹膜或面貌等特徵。對比行動裝置內部儲存獲授權之持有者的特徵相符,行動裝置才會自動解鎖。In the above-mentioned technology, the infrared light-transmitting plate is used to extract the infrared signal light to detect and identify the user's iris or facial features. The mobile device will be automatically unlocked only if the characteristics of the authorized holder stored in the mobile device match.
紅外線感應模組需要精確地判斷出不同使用者之間的差異,避免判斷錯誤,而造成行動裝置中的資料被外露的風險。若所偵測到的使用者的虹膜或臉部的特徵與行動裝置中內部儲存已獲授權的持有者的特徵不相符,則行動裝置將無法解鎖,以避免資料外泄。The infrared sensor module needs to accurately determine the difference between different users, so as to avoid the wrong judgment and the risk of exposure of the data in the mobile device. If the detected features of the user's iris or face do not match the features of the authorized owner stored in the mobile device, the mobile device will not be unlocked to avoid data leakage.
因此,行動裝置對於紅外線偵測功能的靈敏度與距離的要求亦日漸提高,亦即對紅外線穿透率要求將不斷提高。而在外觀上,亦需要能達到紅外線偵測孔隱藏的效果,以提升行動裝置的外觀及保持偵測裝置的隱密性。Therefore, the requirements for the sensitivity and distance of the infrared detection function of mobile devices are also increasing day by day, that is, the requirements for the infrared transmittance will continue to increase. In terms of appearance, it is also necessary to achieve the effect of hiding the infrared detection hole, so as to enhance the appearance of the mobile device and maintain the privacy of the detection device.
本發明之一目的在於提供一種蓋板結構及其製作方法,能提升紅外線的穿透率。One objective of the present invention is to provide a cover plate structure and a manufacturing method thereof, which can improve the transmittance of infrared rays.
本發明之另一目的在於提升紅外線的穿透率的同時,藉由調整蓋板結構的折射率設定,還可以降低可見光的穿透率,藉此可以維持紅外線偵測孔的隱藏效果。Another object of the present invention is to improve the transmittance of infrared rays, and to reduce the transmittance of visible light by adjusting the refractive index setting of the cover structure, thereby maintaining the concealment effect of the infrared detection holes.
本發明提供一種蓋板結構,包括有一蓋板以及一填充體。該蓋板具有一通孔,以及該填充體設置於該通孔中,該填充體具有相對應的一第一表面以及一第二表面,該第一表面以及該第二表面分別具有一次波長結構,且該次波長結構裸露於空氣中。The invention provides a cover plate structure, which includes a cover plate and a filling body. The cover plate has a through hole, and the filling body is disposed in the through hole, the filling body has a corresponding first surface and a second surface, and the first surface and the second surface respectively have a primary wavelength structure, And the sub-wavelength structure is exposed in the air.
藉由上述,當紅外線自空氣入射該次波長結構表面,紅外線行進至該次波長結構底部,進入該填充體內,且紅外線不致自次波長結構表面反射出紅外線。Through the above, when infrared rays are incident on the surface of the sub-wavelength structure from the air, the infrared rays travel to the bottom of the sub-wavelength structure and enter the filling body, and the infrared rays are not reflected from the surface of the sub-wavelength structure.
進一步地,該次波長結構包括有複數次波長子結構,每一該次波長子結構具有一高度、一長度以及一寬度,該高度小於240nm,該長度小於240nm,該寬度小於240nm,且每二該次波長子結構之間距小於240nm。Further, the sub-wavelength structure includes a plurality of sub-wavelength substructures, each sub-wavelength substructure has a height, a length and a width, the height is less than 240nm, the length is less than 240nm, the width is less than 240nm, and every two The distance between the sub-wavelength substructures is less than 240 nm.
更進一步地,複數該次波長子結構以陣列排設,且設置於該第一表面以及該第二表面。Furthermore, a plurality of the sub-wavelength sub-structures are arranged in an array and disposed on the first surface and the second surface.
更進一步地,每一該次波長子結構之頂部皆與該蓋板之表面位於同一平面上。Furthermore, the top of each sub-wavelength substructure and the surface of the cover plate are located on the same plane.
此外,進一步地,該填充體對波長為850nm至900nm的光具有100%的穿透率。In addition, further, the filler has a transmittance of 100% to light with a wavelength of 850 nm to 900 nm.
進一步地,該填充體對波長為550nm的光具有1.04%的穿透率。Further, the filler has a transmittance of 1.04% to light with a wavelength of 550 nm.
進一步地,該填充體的折射率介於1.33至4之間。Further, the refractive index of the filler is between 1.33 and 4.
進一步地,該填充體的莫氏硬度大於3(3H)。Further, the Mohs hardness of the filler is greater than 3 (3H).
進一步地,該填充體以及該次波長結構為相同油墨材質製作,該油墨組成成分包括55%至60%的樹脂聚合物、25%至百分10%的顏料以及20%至30%的溶劑。Further, the filler and the sub-wavelength structure are made of the same ink material, and the ink composition includes 55% to 60% of resin polymer, 25% to 10% of pigment and 20% to 30% of solvent.
於一實施例中,該蓋板結構還包括有一油墨層,該油墨層設置於該蓋板之一表面,且該油墨層避設該通孔。In one embodiment, the cover plate structure further includes an ink layer, the ink layer is disposed on a surface of the cover plate, and the ink layer avoids the through hole.
進一步地,該油墨層包括有第一油墨部以及一第二油墨部,該第一油墨部之一面貼合於該表面,且露出該通孔;該第二油墨部之一面貼合該第一油墨部之另一面,且露出該通孔以及該孔洞周圍部分之該第一油墨部。Further, the ink layer includes a first ink part and a second ink part, one surface of the first ink part is attached to the surface and exposes the through hole; one surface of the second ink part is attached to the first ink part The other side of the ink portion exposes the through hole and the first ink portion around the hole.
同時,本發明提供一種蓋板結構之製作方法,包括有以下步驟:Meanwhile, the present invention provides a method for manufacturing a cover plate structure, which includes the following steps:
a. 提供一蓋板以及一鑽孔機;a. Provide a cover and a drilling machine;
b. 以該鑽孔機於該蓋板上形成一通孔;b. Use the drilling machine to form a through hole on the cover plate;
c. 形成一填充體於該通孔中,該填充體具有相對應的一第一表面以及一第二表面,且該第一表面以及該第二表面分別具有複數次波長子結構以陣列排設。c. forming a filling body in the through hole, the filling body has a corresponding first surface and a second surface, and the first surface and the second surface respectively have a plurality of wavelength sub-structures arranged in an array .
進一步地,於一實施例中,上述方法步驟c,於形成一填充體於該通孔中之步驟,更包括以下步驟:Further, in one embodiment, the above-mentioned method step c, in the step of forming a filling body in the through hole, further includes the following steps:
c1. 提供一注塑治具以及一填充體;c1. Provide an injection fixture and a filler;
c2. 將該蓋板套上該注塑治具;c2. Put the cover on the injection fixture;
c3. 注塑該填充體至該通孔;c3. Injection molding the filler to the through hole;
c4. 將該填充體進行固化;c4. Curing the filler;
c5. 移除該注塑治具;c5. Remove the injection fixture;
c6. 提供一去毛邊機;c6. Provide a deburring machine;
c7. 以該去毛邊機於固化該填充體進行去毛邊作業;c7. Use the deburring machine to cure the filler to deburr;
c8. 將去毛邊後之該填充體形成次波長結構;c8. The filler body after deburring is formed into a sub-wavelength structure;
c9. 完成該填充體於該通孔中。c9. Complete the filling body in the through hole.
另外,於另一實施例中,上述方法步驟c,於形成一填充體於該通孔中之步驟,更包括以下步驟:In addition, in another embodiment, the above-mentioned method step c, in the step of forming a filling body in the through hole, further includes the following steps:
c11. 提供一該填充體以及一去毛邊機;c11. Provide a filler and a deburring machine;
c12. 將該填充體進行固化;c12. Curing the filler;
c13. 以該去毛邊機於該固化油膜表面進行去毛邊作業;c13. Use the deburring machine to deburr the surface of the solidified oil film;
c14. 於該填充體對應之兩表面形成次波長結構;c14. Form sub-wavelength structures on the two surfaces corresponding to the filler;
c15. 提供一離線成型機;c15. Provide an offline molding machine;
c16. 以該離線成型機製作具有該通孔直徑大小的該填充體;c16. Use the off-line molding machine to make the filling body with the diameter of the through hole;
c17. 將該填充體鑲入該通孔中;c17. Insert the filler into the through hole;
c18. 完成該填充體於該通孔中。c18. Complete the filling body in the through hole.
本發明蓋板結構,其優點為:The cover plate structure of the present invention has the following advantages:
藉由將次波長結構製備於該填充體之兩表面,可以有效地提升紅外線的穿透率,並藉此可以有效地提高對於紅外線感應模組的靈敏度與偵測距離。By preparing the sub-wavelength structures on the two surfaces of the filler, the transmittance of infrared rays can be effectively improved, and thereby the sensitivity and detection distance of the infrared sensing module can be effectively improved.
同時,藉由調整填充體的顏料添加比例,還可以降低可見光的穿透率,藉此維持紅外線偵測孔隱藏的效果。At the same time, by adjusting the pigment addition ratio of the filler, the transmittance of visible light can also be reduced, thereby maintaining the effect of hiding the infrared detection hole.
為了使本申請的目的、技術方案及優點更加清楚明白,以下結合附圖及實施例,對本申請進行進一步詳細說明。應當理解,此處所描述的具體實施例僅僅用以解釋本申請,並不用於限定本申請。In order to make the purpose, technical solutions and advantages of the present application more clearly understood, the present application will be described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application, but not to limit the present application.
請參閱圖1,圖1係本發明蓋板結構之結構示意圖。本發明一種蓋板結構 1,包括有一蓋板 2 以及一填充體 3。Please refer to FIG. 1 , which is a schematic structural diagram of the cover plate structure of the present invention. A
該蓋板 2 具有一通孔 21,於本實施例中,該蓋板 2 可以為鈉鈣玻璃或是鋁矽酸鹽玻璃,一般紅外線填充物的穿透率為:於光波長850奈米(nm)時穿透率大於84%,且於光波長550奈米(nm)時穿透率小於10%。The
該填充體 3 設置於該通孔 21 中,該填充體 3 具有相對應的一第一表面 31 以及一第二表面 32,該第一表面 31 以及該第二表面 32 分別具有一次波長結構 4,且該次波長結構 4 與空氣貼靠。The filling
該次波長結構 4 包括有複數次波長子結構 41,複數該次波長子結構 41 以陣列排設,且設置於該第一表面 31 以及該第二表面 32。每一該次波長子結構之頂部皆與該蓋板 2 之表面位於同一平面上。The
當紅外線自空氣入射該次波長結構 4 表面,紅外線行進至該次波長結構 4 底部,進入該填充體 3 內,且紅外線不致自次波長結構 4 表面反射出紅外線。When infrared rays are incident on the surface of the
請參閱圖2以及圖3,圖2係本發明填充體之結構示意圖,以及圖3係圖2中B部分之放大示意圖。該次波長結構 4 在其結構頂部表面之折射率與環境折射率相同,例如空氣,其折射率(n)為1.0,隨著光入射每一該次波長子結構 41 愈接近該次波長子結構 41 底部時,其折射率在於最底面時與該填充體 3 相同。該次波長結構 4 之折射率呈現漸變式的改變現象(漸變折射率效應),主要是因為當其結構尺寸小於入射波長時,就會產生此現象。Please refer to FIG. 2 and FIG. 3 , FIG. 2 is a schematic view of the structure of the filling body of the present invention, and FIG. 3 is an enlarged schematic view of part B in FIG. 2 . The refractive index of the
於本實施例中,每一該次波長子結構 41 具有一高度 H、一長度 L以及一寬度 W,該高度 H 小於240nm,該長度 L 小於240nm,該寬度 W 小於240nm,且每二該次波長子結構 41 之間距 D 小於240nm,且其外型可為任何外形,如長柱外形、圓柱外型或錐體外形等,本實施例以長柱外形進行示例,但不以此限定,其中該長度 L 為該次波長子結構 41 長度之最大值;該寬度 W 為該次波長子結構 41 寬度之最大值;該高度 H 為該次波長子結構 41 高度之最大值。In this embodiment, each of the
因此,當紅外線自空氣入射該次波長結構 4 表面,紅外線行進至該次波長結構 4 底部,進入該填充體 3 內,期間沒有發生折射現象且使得紅外線不致自次波長結構 4 表面反射出紅外線。Therefore, when infrared rays are incident on the surface of the
請附加參閱圖4,圖4係本發明次波長結構之光波長與穿透率之曲線示意圖。將二填充體 3 進行光波長與穿透率之實驗,二該填充體 3 分別為具有次波長結構 4 之填充體 3 以及未具有次波長結構 4 之另一填充體 3。經由曲線圖,當光波長自500奈米(nm)至光波長700奈米(nm)時,兩者幾乎相同的穿透率,如光波長550奈米(nm)時,兩者穿透率皆為1.04%。當光波長700奈米(nm)後,具有次波長結構 4 之填充體 3 的穿透率皆大於未具有次波長結構 4 之另一填充體 3,如光波長850奈米(nm)時,具有次波長結構 4 之填充體 3 的穿透率為100%,未具有次波長結構 4 之另一填充體 3 的穿透率為85.17%,兩者相差14.83%。Please additionally refer to FIG. 4 , which is a schematic diagram of a curve of light wavelength and transmittance of the sub-wavelength structure of the present invention. The experiment of light wavelength and transmittance is carried out on two filling
也就是說,紅外線自空氣中射入及射出穿透具有次波長結構 4 之填充體 3,沒有發生折射現象以及反射現象,比未具有次波長結構 4 之另一填充體 3 更能減少光穿透該填充體時的流失現象。That is to say, infrared rays enter and exit from the air and penetrate the filling
再進一步說明的是,當空氣中之紅外線射入至位於該第一平面 31 之該次波長結構 4 頂部時,因為該次波長結構 4 之頂部之折射率與空氣相同,使得紅外線自空氣中進入該次波長結構 4 之頂部時沒有發生折射現象以及反射現象。It is further explained that when the infrared rays in the air are incident on the top of the
在紅外線射入該次波長結構 4 頂部後,紅外線入射至該次波長子結構 41 之底部,因為該次波長結構 4 的漸變折射率效應,該次波長子結構 41 底部之折射率與該填充體 3 折射率相同,使得紅外線自該次波長子結構 41 底部進入該填充體 3 時沒有發生折射現象以及反射現象。After the infrared rays are incident on the top of the
此外,當紅外線自該填充體 3 內部向外射出時,該第二平面 32 之該次波長結構 4 底部折射率與該填充體 3 之折射率相同,使得紅外線由該填充體 3 到達該次波長子結構 41 底部時,沒有發生折射現象以及反射現象。In addition, when infrared rays are emitted from the inside of the filling
在紅外線射入該次波長結構 4 底部後,因為該次波長結構 4 的漸變折射率效應,該次波長結構 4 頂部之折射率與空氣之折射率相同,使得紅外線自該次波長子結構 41 底部到達頂部射出該填充體 3 時,沒有發生折射現象以及反射現象。After the infrared rays are injected into the bottom of the
因此,紅外線自空氣入射該第一平面 31 之該次波長結構 4 表面,進入該填充體 3 內部,且紅外線自該填充體 3 內部射出該第二平面 32 之該次波長結構 4 表面,紅外線對具有次波長結構 4 之填充體 3 的穿透率為100%,且紅外線不致自次波長結構 4 表面反射出紅外線。Therefore, infrared rays enter the surface of the
在一個實施例中,請參閱圖1,該填充體 3 以及該次波長結構 4 皆為固化油墨,固化後的填充體 3 具有更高的折射率,該填充體 3 的折射率介於1.33至4之區間,硬度大於莫氏硬度3(3H),其組成成分包括55%至60%的樹脂聚合物、25%至10%的顏料、20%至30%的溶劑,其中,樹脂聚合物可為聚酯樹脂聚合物或環氧樹脂聚合物,顏料可為酞菁藍(C
32H
16CuN
8),溶劑可以為烴溶劑、酮溶劑、醇溶劑或醋溶劑等。
In one embodiment, please refer to FIG. 1 , the
另外,該填充體 3 可根據所需要的折射率進行調整,如使用滲入低或高折射率物質於該填充體 3 中調整成分比例。In addition, the
請參閱圖5以及圖6,圖5係本發明另一實施例之結構示意圖,以及圖6係圖5中AA剖面線之剖面圖。於另一實施例中,該蓋板結構 1 運用於筆記型電腦、平板或智慧型電話之觸控顯示面板模組中,主要是為了前述產品內的紅外線感應模組,能提升紅外線的穿透率,但是,在外觀視效上,又不想讓使用者可以很清淅的看見其背面紅外線感應模組機構,因此,該蓋板結構 1 還包括有一油墨層 5 ,該油墨層 5 為黑色,該油墨層 5 設置於該蓋板 2 之一表面,且該油墨層 5 避設該通孔 21。於本實施例中,該蓋板 2 區分為一可視區 22 以及一非可視區 23,該油墨層 5 貼合於該非可視區 23,並露出該通孔 21,而該填充體 3 設置該非可視區 23 之該通孔 21。Please refer to FIG. 5 and FIG. 6 , FIG. 5 is a schematic structural diagram of another embodiment of the present invention, and FIG. 6 is a cross-sectional view of the section line AA in FIG. 5 . In another embodiment, the
進一步地,該油墨層 5 包括有第一油墨部 51 以及一第二油墨部 52,該第一油墨部 51 之一面貼合於該基板 2 之一表面,且露出該通孔 21;該第二油墨部 52 之一面貼合該第一油墨部 51 之另一面,且露出該通孔 21 以及該孔洞周圍部分之該第一油墨部 51。Further, the
當經由射入蓋板 2 之光,其傳遞至油墨層 5 時進行吸收,沒發生穿透現象,使得設置於該蓋板 2 下的紅外線感應模組,不被其他入射光干擾。When the light entering the
煩請參閱圖7,圖7係本發明又一實施例之剖面結構示意圖。於本實施例中,該填充體 3 填滿於該通孔 21 以及該油墨層 5 所避設該通孔 21 之區域,也就是說,製備於該第二表面 32 之次波長結構 4之表面,與該第二油墨部 52 之另一面位於同一平面上。Please refer to FIG. 7 , which is a schematic cross-sectional structure diagram of another embodiment of the present invention. In this embodiment, the filling
當紅外線自空氣入射該第一平面 31 之該次波長結構 4 表面,進入該填充體 3 內部,且紅外線自該填充體 3 內部射出該第二平面 32 之該次波長結構 4 表面,該次波長結構 4 使得紅外線對該填充體 3 的穿透率提高至100%。When infrared rays are incident on the surface of the
煩請參閱圖8,此外,本發明提供一種蓋板結構之製作方法,包括有以下步驟:Please refer to FIG. 8 . In addition, the present invention provides a method for fabricating a cover plate structure, which includes the following steps:
a. 提供一蓋板以及一鑽孔機。a. Provide a cover and a drill.
b. 以該鑽孔機於該蓋板上形成一通孔。b. Use the drill to form a through hole on the cover.
c. 形成一填充體於該通孔中,該填充體具有相對應的一第一表面以及一第二表面,且該第一表面以及該第二表面分別具有複數次波長子結構以陣列排設之次波長結構。c. forming a filling body in the through hole, the filling body has a corresponding first surface and a second surface, and the first surface and the second surface respectively have a plurality of wavelength sub-structures arranged in an array Subwavelength structure.
本實施例之製作方法,當紅外線自空氣入射該次波長結構表面,紅外線行進至該次波長結構底部,進入該填充體內,期間沒有發生折射現象且使得紅外線不致自次波長結構表面反射出紅外線,使得該填充體對紅外線達到完全穿透。In the manufacturing method of this embodiment, when infrared rays are incident on the surface of the sub-wavelength structure from the air, the infrared rays travel to the bottom of the sub-wavelength structure and enter the filling body, during which refraction does not occur and the infrared rays are prevented from being reflected from the surface of the sub-wavelength structure. Make the filling body achieve complete penetration of infrared rays.
煩請附加參閱圖9,另外,於步驟c中,還包括一製作方式,該製作方式包括以下步驟:Please additionally refer to Figure 9. In addition, in step c, a production method is also included, and the production method includes the following steps:
c1. 提供一注塑治具以及一填充體。c1. Provide an injection fixture and a filler.
c2. 將該蓋板套上該注塑治具。c2. Put the cover on the injection fixture.
c3. 注塑該填充體至該通孔。c3. Injection molding the filler body into the through hole.
c4. 將該填充體進行固化。c4. Curing the filler.
c5. 移除該注塑治具。c5. Remove the injection fixture.
c6. 提供一去毛邊機。c6. Provide a deburring machine.
c7. 以該去毛邊機於固化該填充體上進行去毛邊作業。c7. Use the deburring machine to deburr the cured filler.
c8. 將去毛邊後之該填充體形成次波長結構。c8. The filler body after deburring is formed into a sub-wavelength structure.
於步驟c8中,該次波長結構生產以蝕刻、雷射雕刻、轉印或滾壓等加工方式完成。In step c8, the production of the sub-wavelength structure is completed by processing methods such as etching, laser engraving, transfer printing or rolling.
c9. 完成該填充體於該通孔中。c9. Complete the filling body in the through hole.
煩請附加參閱圖10,值得一提的是,於步驟c中,更提供另一製作方式,另一該製作方式包括以下步驟:Please additionally refer to Figure 10. It is worth mentioning that in step c, another production method is provided, and the other production method includes the following steps:
c11. 提供一該填充體以及一去毛邊機。c11. Provide a filler and a deburring machine.
c12. 將該填充體進行固化。c12. Curing the filler.
c13. 以該去毛邊機於該填充體表面進行去毛邊作業。c13. Use the deburring machine to deburr the surface of the filler.
c14. 於該填充體對應之兩表面形成次波長結構。c14. Subwavelength structures are formed on the corresponding two surfaces of the filler.
於步驟c14中,該次波長結構生產以蝕刻、雷射雕刻、轉印或滾壓等加工方式完成。In step c14, the sub-wavelength structure is produced by etching, laser engraving, transfer printing or rolling and other processing methods.
c15. 提供一離線成型機。c15. Provide an off-line molding machine.
c16. 以該離線成型機製作具有該通孔直徑大小的該填充體。c16. Use the off-line molding machine to make the filling body with the diameter of the through hole.
c17. 將該填充體鑲入該通孔中。c17. Insert the filler into the through hole.
c18. 完成該填充體於該通孔中。c18. Complete the filling body in the through hole.
綜上所述,藉由調整填充體的折射率,可以降低可見光的穿透率,藉此維持紅外線偵測孔隱藏的效果,同時,更藉由將次波長結構製備於該填充體之兩表面,可以有效地提高紅外線的穿透率。To sum up, by adjusting the refractive index of the filler, the transmittance of visible light can be reduced, thereby maintaining the effect of hiding the infrared detection hole, and at the same time, the sub-wavelength structure is prepared on both surfaces of the filler. , which can effectively improve the penetration rate of infrared rays.
以上實施方式僅用以說明本發明的技術方案而非限制,儘管參照較佳實施方式對本發明進行了詳細說明,本領域的普通技術人員應當理解,可以對本發明的技術方案進行修改或等同替換,而不脫離本發明技術方案的精神及範圍。The above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be modified or equivalently replaced. without departing from the spirit and scope of the technical solutions of the present invention.
1:蓋板結構 2:蓋板 21:通孔 22:可視區 23:非可視區 3:填充體 31:第一表面 32:第二表面 4:次波長結構 41:次波長子結構 5:油墨層 51:第一油墨部 52:第二油墨部 H:高度 L:長度 W:寬度 a~c:步驟 c1~c9:步驟 c11~c18:步驟 1: Cover structure 2: Cover 21: Through hole 22: Visible area 23: Non-visible area 3: Filler 31: First Surface 32: Second Surface 4: Subwavelength Structure 41: Subwavelength Substructure 5: ink layer 51: The first ink department 52: Second Ink Section H: height L: length W: width a~c: steps c1~c9: steps c11~c18: steps
圖1係本發明蓋板結構之結構示意圖。 圖2係本發明填充體之結構示意圖。 圖3係圖2中B部分之放大示意圖。 圖4係本發明次波長結構之光波長與穿透率之曲線示意圖。 圖5係本發明另一實施例之結構示意圖。 圖6係圖5中AA剖面線之剖面圖。 圖7係本發明又一實施例之剖面結構示意圖。 圖8係本發明蓋板結構之製作方法之製作方法流程圖。 圖9係本發明蓋板結構之製作方法之實際製作流程圖。 圖10係本發明蓋板結構之製作方法之另一實際製作流程圖。 FIG. 1 is a schematic structural diagram of the cover plate structure of the present invention. FIG. 2 is a schematic view of the structure of the packing body of the present invention. FIG. 3 is an enlarged schematic view of part B in FIG. 2 . FIG. 4 is a schematic diagram of a curve of light wavelength and transmittance of the sub-wavelength structure of the present invention. FIG. 5 is a schematic structural diagram of another embodiment of the present invention. FIG. 6 is a cross-sectional view of the section line AA in FIG. 5 . FIG. 7 is a schematic cross-sectional structure diagram of another embodiment of the present invention. 8 is a flow chart of the manufacturing method of the manufacturing method of the cover plate structure of the present invention. FIG. 9 is an actual manufacturing flow chart of the manufacturing method of the cover plate structure of the present invention. FIG. 10 is another actual manufacturing flow chart of the manufacturing method of the cover plate structure of the present invention.
1:蓋板結構 1: Cover structure
2:蓋板 2: Cover
21:通孔 21: Through hole
3:填充體 3: Filler
31:第一表面 31: First Surface
32:第二表面 32: Second Surface
4:次波長結構 4: Subwavelength Structure
41:次波長子結構 41: Subwavelength Substructure
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CN202041668U (en) * | 2011-04-28 | 2011-11-16 | 西北工业大学 | Zinc sulfide (ZnS) infrared optical window |
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