TWI444658B - Refractive index adjusting panel, manufacturing method thereof and display apparatus - Google Patents

Refractive index adjusting panel, manufacturing method thereof and display apparatus Download PDF

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TWI444658B
TWI444658B TW98123904A TW98123904A TWI444658B TW I444658 B TWI444658 B TW I444658B TW 98123904 A TW98123904 A TW 98123904A TW 98123904 A TW98123904 A TW 98123904A TW I444658 B TWI444658 B TW I444658B
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substrate
refractive index
index adjusting
electrode layer
chambers
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TW201102677A (en
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Chen Pin Hung
Cheng Yi Chen
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Innolux Corp
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折射率調整面板及其製造方法與顯示裝置Refractive index adjusting panel, manufacturing method thereof and display device

本發明是有關於一種光電裝置及其元件與此元件的製造方法,且特別是有關於一種顯示裝置及其折射率調整面板與折射率調整面板的製造方法。The present invention relates to an optoelectronic device and its components and a method of fabricating the same, and more particularly to a display device and a method for fabricating the same and a refractive index adjustment panel.

近年來,隨著顯示技術的不斷進步,使用者對於顯示裝置之顯示品質(如影像解析度、色彩飽和度等)的要求也越來越高。然而,除了高影像解析度以及高色彩飽和度之外,對於使用者而言,顯示裝置是否能夠顯示立體影像亦成為購買上的考量因素之一。In recent years, with the continuous advancement of display technology, users have become more and more demanding on display quality (such as image resolution, color saturation, etc.) of display devices. However, in addition to high image resolution and high color saturation, it is one of the consideration factors for the purchaser to display a stereoscopic image for the user.

在目前的顯示技術而言,立體顯示技術可大致分成使用者需戴特殊設計眼鏡觀看之戴眼鏡式(stereoscopic)以及直接裸眼觀看之裸眼式(auto-stereoscopic)。其中戴眼鏡式立體顯示技術已經發展成熟,並廣泛用到如軍事模擬或大型娛樂等某些特殊用途上,但戴眼鏡式立體顯示技術因其方便性與舒適性不佳,使得此類技術不易普及。因此,裸眼式立體顯示技術已逐漸發展並成為新潮流。In the current display technology, the stereoscopic display technology can be roughly divided into a stereoscopic view in which a user wears a special design eyeglass and an auto-stereoscopic view in which the naked eye is directly viewed. Among them, the glasses-type stereo display technology has been developed and widely used in some special applications such as military simulation or large-scale entertainment, but the glasses-type stereo display technology is difficult to use due to its convenience and comfort. popular. Therefore, the naked-eye stereoscopic display technology has gradually developed and become a new trend.

裸眼式立體顯示技術一般可利用光柵(barrier)遮光、柱狀鏡(lenticular plate)折光或稜鏡(prism)折光等方式來達成,其中利用固定式光柵來控制觀賞者左眼與右眼所接收到的影像為現今主流。根據人眼的視覺特性,當左、右眼分別觀視相同的影像內容但是具有不同視差(parallax)的二影像時,人眼會觀察將二影像重疊解讀成一立體影像。依照光柵位置的不同,可將立體顯示技術大致上區分為前光柵式(front barrier)立體顯示技術以及後光柵式(back barrier)立體顯示技術兩種。The naked-eye stereoscopic display technology can generally be achieved by using barrier light blocking, lenticular plate refractive or prismatic refraction, wherein a fixed grating is used to control the viewer's left and right eye reception. The image arrived is the current mainstream. According to the visual characteristics of the human eye, when the left and right eyes respectively view the same image content but have two images with different parallax, the human eye observes the interpretation of the two images as a stereo image. According to the difference of the grating position, the stereoscopic display technology can be roughly divided into two types: a front barrier stereoscopic display technology and a back barrier stereoscopic display technology.

值得注意的是,利用固定式光柵來產生立體影像屬於一種空間多工(spatial-multiplexed)的方式,此方式雖然可以使得顯示面板具有立體顯示之效果,但卻使立體顯示裝置之解析度減半。此外,具有固定式光柵之立體顯示裝置只能用來顯示立體影像而無法顯示平面影像。對於使用者而言,具有固定式光柵之立體顯示裝置的實用性不高。It is worth noting that the use of a fixed grating to generate a stereoscopic image is a spatial-multiplexed method. Although this method can make the display panel have a stereoscopic display effect, the resolution of the stereoscopic display device is halved. . In addition, a stereoscopic display device having a fixed grating can only be used to display a stereoscopic image and cannot display a planar image. For the user, the stereoscopic display device having a fixed grating is not practical.

本發明關於一種折射率調整面板,其可依據需求來調整自身的光折射率,以使出射光聚焦在不同或相同的平面上。The present invention relates to a refractive index adjustment panel that adjusts its own refractive index of light as needed to focus the outgoing light on different or identical planes.

本發明再關於一種顯示裝置,其採用上述之折射率調整面板以顯示立體影像或平面影像,其中立體影像會讓使用者感受不同景深的視覺效果。The invention further relates to a display device using the above-mentioned refractive index adjustment panel to display a stereoscopic image or a planar image, wherein the stereoscopic image allows the user to feel the visual effect of different depth of field.

本發明另關於一種折射率調整面板的製造方法,其用以製造出上述之折射率調整面板。The invention further relates to a method of manufacturing a refractive index adjusting panel for manufacturing the refractive index adjusting panel described above.

為具體描述本發明之內容,在此提出一種折射率調整面板,其包括一第一基板、一第二基板以及一電致折射率調整介質。第二基板與第一基板相互平行設置而在第一基板與第二基板之間形成相連的多個腔室(cavity),其中第一基板在朝向腔室的一側具有一第一電極層,而第二基板在朝向些腔室的一側具有一第二電極層。電致折射率調整介質配置於第一基板與第二基板之間並填入腔室中。To specifically describe the contents of the present invention, a refractive index adjusting panel is proposed herein, which includes a first substrate, a second substrate, and an electrostrictive refractive index adjusting medium. The second substrate and the first substrate are disposed in parallel with each other to form a plurality of connected cavities between the first substrate and the second substrate, wherein the first substrate has a first electrode layer on a side facing the chamber, The second substrate has a second electrode layer on a side facing the chambers. The electro-refractive index adjusting medium is disposed between the first substrate and the second substrate and filled into the chamber.

為具體描述本發明之內容,在此再提出一種顯示裝置,其包括一顯示面板以及一折射率調整面板。顯示面板具有多個次畫素,而折射率調整面板包括一第一基板、一第二基板以及一電致折射率調整介質。第二基板與第一基板相互平行設置而在第一基板與第二基板之間形成相連的多個腔室,其中第一基板在朝向腔室的一側具有一第一電極層,而第二基板在朝向腔室的一側具有一第二電極層。電致折射率調整介質配置於第一基板與第二基板之間並填入腔室中。To specifically describe the content of the present invention, a display device is further provided, which includes a display panel and a refractive index adjustment panel. The display panel has a plurality of sub-pixels, and the refractive index adjustment panel includes a first substrate, a second substrate, and an electro-refractive index adjusting medium. The second substrate and the first substrate are disposed in parallel with each other to form a plurality of connected chambers between the first substrate and the second substrate, wherein the first substrate has a first electrode layer on a side facing the chamber, and the second substrate The substrate has a second electrode layer on a side facing the chamber. The electro-refractive index adjusting medium is disposed between the first substrate and the second substrate and filled into the chamber.

依據本發明之一實施例,每一腔室對應一個或兩個以上的次畫素。在一實施例中,每一腔室對應的次畫素構成一畫素。According to an embodiment of the invention, each chamber corresponds to one or more sub-pixels. In one embodiment, the corresponding sub-pixels of each chamber constitute a pixel.

依據本發明之一實施例,第二基板包括一基底以及一介電層,其中第二電極層以及介電層位於基底上。介電層具有多個凹穴(recess),以在第一基板與第二基板組立後形成腔室。在一實施例中,介電層覆蓋第二電極層,而第二基板更包括一配向層,且配向層覆蓋介電層。在另一實施例中,介電層位於基底以及第二電極層之間,而第二基板更包括一配向層,其中配向層覆蓋第二電極層。According to an embodiment of the invention, the second substrate comprises a substrate and a dielectric layer, wherein the second electrode layer and the dielectric layer are on the substrate. The dielectric layer has a plurality of recesses to form a chamber after the first substrate and the second substrate are assembled. In one embodiment, the dielectric layer covers the second electrode layer, and the second substrate further includes an alignment layer, and the alignment layer covers the dielectric layer. In another embodiment, the dielectric layer is between the substrate and the second electrode layer, and the second substrate further includes an alignment layer, wherein the alignment layer covers the second electrode layer.

依據本發明之一實施例,第一基板位於第二基板與顯示面板之間,其中第一基板朝向顯示面板的一表面上具有多個稜鏡結構,而每一稜鏡結構分別對應於該些腔室設置。According to an embodiment of the invention, the first substrate is located between the second substrate and the display panel, wherein the first substrate has a plurality of 稜鏡 structures on a surface of the display panel, and each 稜鏡 structure corresponds to the 基板 structure Chamber settings.

依據本發明之一實施例,顯示面板為一液晶顯示面板。According to an embodiment of the invention, the display panel is a liquid crystal display panel.

依據本發明之一實施例,顯示裝置更包括一背光模組,其中顯示面板位於背光模組與折射率調整面板之間。According to an embodiment of the invention, the display device further includes a backlight module, wherein the display panel is located between the backlight module and the index adjustment panel.

為具體描述本發明之內容,在此提出另一種折射率調整面板的製造方法,而此製造方法包括下列步驟。首先,提供一第一基板,其中第一基板具有一第一電極層。然後,提供一第二基板,其中第二基板與第一基板相互平行設置而在第一基板與第二基板之間形成相連的多個腔室。此外,第二基板在朝向腔室的一側具有一第二電極層,而第一基板在朝向腔室的一側具有第一電極層。之後,在第一基板以及第二基板之間形成一電致折射率調整介質,且電致折射率調整介質填入腔室中。In order to specifically describe the contents of the present invention, another method of manufacturing a refractive index adjusting panel is proposed, and the manufacturing method includes the following steps. First, a first substrate is provided, wherein the first substrate has a first electrode layer. Then, a second substrate is provided, wherein the second substrate and the first substrate are disposed in parallel with each other to form a plurality of connected chambers between the first substrate and the second substrate. Further, the second substrate has a second electrode layer on a side facing the chamber, and the first substrate has a first electrode layer on a side facing the chamber. Thereafter, an electro-refractive index adjusting medium is formed between the first substrate and the second substrate, and the electro-refractive index adjusting medium is filled into the chamber.

依據本發明之一實施例,折射率調整面板的製造方法更包括下列步驟。首先,提供一基底,其中第二電極層位於基底上。然後,在基底上形成一介電層,並且在介電層上形成多個凹穴,以在第一基板與第二基板組立後形成腔室。According to an embodiment of the invention, the method of fabricating the refractive index adjusting panel further comprises the following steps. First, a substrate is provided in which the second electrode layer is on the substrate. Then, a dielectric layer is formed on the substrate, and a plurality of recesses are formed on the dielectric layer to form a chamber after the first substrate and the second substrate are assembled.

依據本發明之一實施例,形成凹穴的方法例如是藉由機械刀具來移除部份的介電層。In accordance with an embodiment of the present invention, the method of forming the recess is, for example, removing a portion of the dielectric layer by a mechanical cutter.

依據本發明之一實施例,形成凹穴的方法例如是藉由雷射或準分子雷射來移除部份的介電層。In accordance with an embodiment of the invention, the method of forming the recesses is, for example, by removing a portion of the dielectric layer by laser or excimer laser.

依據本發明之一實施例,介電層為一感光材料層,而形成凹穴的方法例如是藉由一灰階光罩對此感光材料層進行微影製程。在一實施例中,折射率調整面板的製造方法更包括在微影製程後,固化感光材料層。According to an embodiment of the invention, the dielectric layer is a layer of photosensitive material, and the method of forming the recess is, for example, a lithography process of the photosensitive material layer by a gray scale mask. In an embodiment, the method of fabricating the refractive index adjustment panel further comprises curing the photosensitive material layer after the lithography process.

依據本發明之一實施例,形成凹穴的方法包括下列步驟。首先,在介電層上形成一圖案化罩幕。然後,藉由圖案化罩幕來圖案化介電層,以在介電層中形成凹穴。之後,移除圖案化罩幕。在一實施例中,圖案化罩幕為光阻層。In accordance with an embodiment of the present invention, a method of forming a pocket includes the following steps. First, a patterned mask is formed on the dielectric layer. The dielectric layer is then patterned by patterning the mask to form recesses in the dielectric layer. After that, remove the patterned mask. In an embodiment, the patterned mask is a photoresist layer.

依據本發明之一實施例,折射率調整面板的製造方法更包括在介電層上形成一配向層,其中介電層位於配向層以及第二電極層之間。According to an embodiment of the invention, a method of fabricating a refractive index adjustment panel further includes forming an alignment layer on the dielectric layer, wherein the dielectric layer is between the alignment layer and the second electrode layer.

依據本發明之一實施例,折射率調整面板的製造方法更包括在第二電極層上形成一配向層,其中配向層位於電致折射率調整介質以及第二電極層之間。According to an embodiment of the present invention, a method of fabricating a refractive index adjusting panel further includes forming an alignment layer on the second electrode layer, wherein the alignment layer is between the electro-refractive index adjusting medium and the second electrode layer.

依據本發明之一實施例,在前述的折射率調整面板(的製造方法)中,第一基板背對第二基板的一表面上具有多個稜鏡結構,且每一稜鏡結構分別對應於腔室設置。According to an embodiment of the present invention, in the foregoing method for manufacturing a refractive index adjusting panel, the first substrate has a plurality of 稜鏡 structures on a surface opposite to the second substrate, and each 稜鏡 structure corresponds to Chamber settings.

依據本發明之一實施例,第二基板包括一黑矩陣,其中黑矩陣設置於腔室的鄰接處。According to an embodiment of the invention, the second substrate comprises a black matrix, wherein the black matrix is disposed adjacent to the chamber.

依據本發明之一實施例,第二電極層為一共用電極。According to an embodiment of the invention, the second electrode layer is a common electrode.

依據本發明之一實施例,第一電極層包括多個控制電極,其中控制電極分別對應於腔室設置。According to an embodiment of the invention, the first electrode layer comprises a plurality of control electrodes, wherein the control electrodes are respectively arranged corresponding to the chamber.

依據本發明之一實施例,第一基板包括多條線路,其中線路耦接至第一電極層,並設置於腔室的鄰接處。According to an embodiment of the invention, the first substrate comprises a plurality of lines, wherein the lines are coupled to the first electrode layer and disposed adjacent to the chamber.

依據本發明之一實施例,第一基板包括一配向層,其中配向層覆蓋第一電極層。According to an embodiment of the invention, the first substrate comprises an alignment layer, wherein the alignment layer covers the first electrode layer.

依據本發明之一實施例,電致折射率調整介質為一液晶材料。According to an embodiment of the invention, the electrorefractive index adjusting medium is a liquid crystal material.

本發明的顯示裝置及其折射率調整面板可藉由調整電致折射率調整介質的光折射率,以使出射光聚焦在不同或相同的平面上。如此,顯示裝置得以顯示立體影像或平面影像,以使使用者感受不同景深的視覺效果。另外,本發明的折射率調整面板的製造方法用以製造作出本發明的折射率調整面板。The display device of the present invention and its refractive index adjusting panel can adjust the refractive index of the light of the electro-refractive index adjusting medium to focus the outgoing light on different or the same plane. In this way, the display device can display a stereoscopic image or a planar image so that the user can feel the visual effect of different depth of field. Further, a method of manufacturing a refractive index adjusting panel of the present invention is used to manufacture a refractive index adjusting panel of the present invention.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式,作詳細說明如下。The above and other objects, features and advantages of the present invention will become more <RTIgt;

圖1為本發明之一實施例之一種顯示裝置的剖面示意圖。請參照圖1,本實施例之顯示裝置100包括一顯示面板200以及一折射率調整面板300。顯示面板200具有多個次畫素210,其中顯示面板200例如是液晶顯示面板,而次畫素210可以是紅色次畫素、綠色次畫素、藍色次畫素...等帶有顏色的次畫素而使顯示面板200顯示彩色畫面。以穿透式或半穿透半反射式的顯示裝置100為例,顯示裝置100可進一步設置背光模組400,其中顯示面板200位於背光模組400與折射率調整面板300之間。1 is a cross-sectional view showing a display device according to an embodiment of the present invention. Referring to FIG. 1 , the display device 100 of the embodiment includes a display panel 200 and a refractive index adjustment panel 300 . The display panel 200 has a plurality of sub-pixels 210, wherein the display panel 200 is, for example, a liquid crystal display panel, and the sub-pixels 210 may be red sub-pixels, green sub-pixels, blue sub-pixels, etc. The secondary panel causes the display panel 200 to display a color screen. For example, the display device 100 can further be provided with a backlight module 400, wherein the display panel 200 is located between the backlight module 400 and the index adjustment panel 300.

在本實施例中,背光模組400提供顯示面板200以及折射率調整面板300所需的光線L,以使光線L得以入射至顯示面板200並自折射率調整面板300射出,而使用者A便可觀看顯示裝置100所呈現的顯示畫面。In the embodiment, the backlight module 400 provides the light L required by the display panel 200 and the refractive index adjusting panel 300, so that the light L is incident on the display panel 200 and emitted from the refractive index adjusting panel 300, and the user A The display screen presented by the display device 100 can be viewed.

如圖1所示,本實施例之折射率調整面板300具有電致折射率調整介質330,可使使用者A所觀看到的顯示畫面具有不同景深的效果。詳細而言,光線L通過不同次畫素210所對應之電致折射率調整介質330的光折射率可不盡相同。因此,出射折射率調整面板300的光線L可聚焦在不同的平面上,進而使同一個顯示畫面具有不同的景深值D1、D2。如此一來,使用者A便可觀看到具有立體效果的顯示畫面。As shown in FIG. 1, the refractive index adjusting panel 300 of the present embodiment has an electro-refractive index adjusting medium 330, which can make the display screen viewed by the user A have different depth of field effects. In detail, the light refractive index of the electro-refractive index adjusting medium 330 corresponding to the light L passing through the different pixels 210 may be different. Therefore, the light L exiting the refractive index adjusting panel 300 can be focused on different planes, so that the same display screen has different depth of field values D1, D2. In this way, the user A can view the display screen having a stereoscopic effect.

由上述可知,本實施例之顯示裝置100藉由折射率調整面板300來顯示具有不同景深大小的立體顯示畫面。如此,立體顯示畫面的解析度會等同於顯示面板200的解析度,有別於習知立體顯示裝置在顯示立體畫面卻發生其解析度減半的情形。As can be seen from the above, the display device 100 of the present embodiment displays the stereoscopic display screens having different depths of field by the refractive index adjustment panel 300. As described above, the resolution of the stereoscopic display screen is equivalent to the resolution of the display panel 200, and is different from the case where the conventional stereoscopic display device reduces the resolution by half the display of the stereoscopic display device.

值得一提的是,本實施例之顯示裝置100也可作為一般不具有立體畫面的顯示裝置。當光線L通過每一次畫素210所對應之電致折射率調整介質330的折射率為相同時,同一個顯示畫面便具有相同的景深值(例如D1),則使用者A所觀看到的顯示畫面便不具有立體效果。It should be noted that the display device 100 of the present embodiment can also be used as a display device that generally does not have a stereoscopic picture. When the light beam L passes through the refractive index of the electro-refractive index adjusting medium 330 corresponding to each pixel 210, the same display screen has the same depth of field value (for example, D1), and the display viewed by the user A is displayed. The picture does not have a stereo effect.

接下來,舉例說明本實施例之幾種顯示裝置及其折射率調整面板以及折射率調整面板的製造方法。但本發明並不限定以下實施例為本發明的所有實施方式。Next, several display devices of the present embodiment, a refractive index adjusting panel thereof, and a method of manufacturing the refractive index adjusting panel will be exemplified. However, the present invention is not limited to the following examples, which are all embodiments of the present invention.

【第一實施例】[First Embodiment]

圖2為本發明之第一實施例之一種折射率調整面板的剖面示意圖。請參照圖2,本實施例之折射率調整面板300a包括一第一基板310、一第二基板320以及一電致折射率調整介質330。第二基板320與第一基板310相互平行設置而在第一基板310與第二基板320之間形成相連的多個腔室(cavity)C,且電致折射率調整介質330配置於第一基板310與第二基板320之間並填入腔室C中。2 is a cross-sectional view showing a refractive index adjusting panel according to a first embodiment of the present invention. Referring to FIG. 2 , the refractive index adjusting panel 300 a of the present embodiment includes a first substrate 310 , a second substrate 320 , and an electro-refractive index adjusting medium 330 . The second substrate 320 and the first substrate 310 are disposed in parallel with each other to form a plurality of cavities C connected between the first substrate 310 and the second substrate 320, and the electro-refractive index adjusting medium 330 is disposed on the first substrate. The space between the 310 and the second substrate 320 is filled into the chamber C.

在本實施例中,第一基板310在朝向腔室C的一側具有一第一電極層312,其中第一電極層312例如是由多個控制電極312a所構成,且控制電極312a分別對應於腔室C設置。另一方面,第二基板320在朝向些腔室C的一側具有一第二電極層322,其中第二電極層322例如為一共用電極。In this embodiment, the first substrate 310 has a first electrode layer 312 on a side facing the chamber C, wherein the first electrode layer 312 is composed of, for example, a plurality of control electrodes 312a, and the control electrodes 312a respectively correspond to Chamber C is set. On the other hand, the second substrate 320 has a second electrode layer 322 on a side facing the chamber C, wherein the second electrode layer 322 is, for example, a common electrode.

詳細而言,本實施例之第二基板320包括一基底320s以及一介電層324,其中介電層324及上述之第二電極層322位於基底320s上,且介電層324覆蓋第二電極層322。介電層324具有多個凹穴(depression)R,以在第一基板310與第二基板320組立後形成多個腔室C。此外,在本實施例中,每一腔室C對應一個次畫素210(繪示於圖1)。然而,在其他實施例中,每一腔室C也可以對應兩個以上的次畫素210,此時每一腔室C對應的該些次畫素210構成一畫素(未繪示)。舉例來說,當次畫素210例如是紅色次畫素、綠色次畫素與藍色次畫素時,則每一腔室C所對應的畫素便是由紅色次畫素、綠色次畫素與藍色次畫素三者所構成。當然,本發明並無意限制次畫素210的顏色為紅色、綠色與藍色,也不限制構成畫素之次畫素210的個數為三個,而次畫素210的顏色與構成畫素之次畫素210的個數應視實際產品而定。In detail, the second substrate 320 of the embodiment includes a substrate 320s and a dielectric layer 324, wherein the dielectric layer 324 and the second electrode layer 322 are disposed on the substrate 320s, and the dielectric layer 324 covers the second electrode. Layer 322. The dielectric layer 324 has a plurality of depressions R to form a plurality of chambers C after the first substrate 310 and the second substrate 320 are assembled. Further, in the present embodiment, each chamber C corresponds to one sub-pixel 210 (shown in FIG. 1). However, in other embodiments, each of the chambers C may correspond to two or more sub-pixels 210, and the sub-pixels 210 corresponding to each of the chambers C constitute a pixel (not shown). For example, when the sub-pixel 210 is, for example, a red sub-pixel, a green sub-pixel, and a blue sub-pixel, the pixel corresponding to each chamber C is composed of a red sub-pixel and a green sub-picture. It consists of three elements: blue and blue. Of course, the present invention is not intended to limit the colors of the sub-pixel 210 to red, green, and blue, nor to limit the number of sub-pixels 210 constituting the pixels to three, and the color and composition of the sub-pixel 210. The number of secondary pixels 210 should be determined by the actual product.

在本實施例中,電致折射率調整介質330的光折射率與第一電極層312的電壓值以及第二電極層322的電壓值相關。更進一步而言,控制電極312a以及第二電極層322之間的電壓差改變時,該控制電極312a所對應之腔室C中的電致折射率調整介質330的光折射率也會隨之改變。In the present embodiment, the refractive index of the electro-refractive index adjusting medium 330 is related to the voltage value of the first electrode layer 312 and the voltage value of the second electrode layer 322. Further, when the voltage difference between the control electrode 312a and the second electrode layer 322 is changed, the refractive index of the electro-refractive index adjusting medium 330 in the chamber C corresponding to the control electrode 312a also changes. .

舉例來說,當電致折射率調整介質330為液晶材料時,第二電極層322與控制電極312a之間的電壓差ΔV可決定腔室C中之液晶分子的排列方式,進而決定電致折射率調整介質330的折射率。如此一來,各個腔室C中之電致折射率調整介質330的折射率便可藉由調整第二電極層322與該腔室C所對應的控制電極312a之間的電壓差ΔV而有所不同,以使光線L通過該腔室C所對應之液晶分子的光學路徑也隨之改變。實務上,第一基板310與第二基板320可分別進一步包括一配向層316與一配向層326,以使夾設於配向層316、326之間的液晶分子具有良好的配向效果。在本實施例中,配向層316覆蓋第一電極層312,而配向層326覆蓋介電層324。此外,於腔室C之鄰接處,液晶分子通常會發生排列不良或排列紊亂的情形。因此,第二基板320可進一步於腔室C之鄰接處設置黑矩陣328,以遮蔽通過該處之液晶分子的光線。For example, when the electro-refractive index adjusting medium 330 is a liquid crystal material, the voltage difference ΔV between the second electrode layer 322 and the control electrode 312a can determine the arrangement of liquid crystal molecules in the chamber C, thereby determining electrorefractive. The rate is adjusted to the refractive index of the medium 330. In this way, the refractive index of the electro-refractive index adjusting medium 330 in each chamber C can be adjusted by adjusting the voltage difference ΔV between the second electrode layer 322 and the control electrode 312a corresponding to the chamber C. Differently, the optical path of the liquid crystal molecules corresponding to the light L passing through the chamber C also changes. In practice, the first substrate 310 and the second substrate 320 may further include an alignment layer 316 and an alignment layer 326 respectively, so that the liquid crystal molecules sandwiched between the alignment layers 316 and 326 have a good alignment effect. In the present embodiment, the alignment layer 316 covers the first electrode layer 312 and the alignment layer 326 covers the dielectric layer 324. Further, in the vicinity of the chamber C, liquid crystal molecules usually have poor alignment or disordered arrangement. Therefore, the second substrate 320 may further be provided with a black matrix 328 adjacent to the chamber C to shield the light passing through the liquid crystal molecules.

在本實施例中,第一電極層312與第二電極層322為透明電極,其材質可包括透光之導電材,例如銦錫氧化物(indium-tin oxide,ITO)、銦鋅氧化物(indium-zinc oxide,IZO)、鋁鋅氧化物(aluminum-zinc oxide,AZO)、鎵鋅氧化物(GZO)、鋅氧化物(zinc oxide,ZnO)及錫氧化物(SnO2)。In this embodiment, the first electrode layer 312 and the second electrode layer 322 are transparent electrodes, and the material thereof may include a light-transmitting conductive material, such as indium-tin oxide (ITO), indium zinc oxide (indium-tin oxide). Indium-zinc oxide (IZO), aluminum-zinc oxide (AZO), gallium zinc oxide (GZO), zinc oxide (ZnO), and tin oxide (SnO2).

在本實施例中,第一基板310可進一步設置多條線路318,以分別耦接至控制電極312a並提供控制電極312a所需的電壓。此外,線路318一般是由不透光的導電材質所形成,若將這些線路318也設置於腔室C之鄰接處,則通過相鄰腔室C的光線發生互相干擾的情形可有效降低。In this embodiment, the first substrate 310 may further be provided with a plurality of lines 318 to be respectively coupled to the control electrode 312a and provide a voltage required for the control electrode 312a. In addition, the line 318 is generally formed of an opaque conductive material. If these lines 318 are also disposed adjacent to the chamber C, the interference of light passing through the adjacent chambers C can be effectively reduced.

圖3A~圖3C為本發明之第一實施例之折射率調整面板的製造流程局部剖面示意圖。首先,請參照圖3A,提供一第一基板310,其中第一基板310具有一第一電極層312。在本實施例中,形成第一電極層312的方法例如是先提供一基底310s,接著在基底310s上形成多個控制電極312a,其中第一電極層312由這些控制電極312a所構成。此外,本實施例還可選擇性地在基底310s上依序形成多條線路318,其中線路318耦接至第一電極層312。3A to 3C are partial cross-sectional views showing a manufacturing flow of a refractive index adjusting panel according to a first embodiment of the present invention. First, referring to FIG. 3A, a first substrate 310 is provided, wherein the first substrate 310 has a first electrode layer 312. In the present embodiment, the method of forming the first electrode layer 312 is, for example, first providing a substrate 310s, and then forming a plurality of control electrodes 312a on the substrate 310s, wherein the first electrode layer 312 is composed of the control electrodes 312a. In addition, the present embodiment can also selectively form a plurality of lines 318 on the substrate 310s, wherein the lines 318 are coupled to the first electrode layer 312.

再者,請參照圖3B,提供一第二基板320,其中第二基板320具有一第二電極層322。在本實施例中,形成第二電極層322的方法例如是先提供一基底320s,接著在基底320s上形成第二電極層322,其中本實施例之第二電極層322為共用電極。值得一提的是,本實施例在形成第二電極層322之前,可選擇性地在基底320s上依序形成一黑矩陣328以及一平坦化介電層340,其中平坦化介電層340用以提供平坦的上表面。Furthermore, referring to FIG. 3B , a second substrate 320 is provided, wherein the second substrate 320 has a second electrode layer 322 . In this embodiment, the method of forming the second electrode layer 322 is, for example, first providing a substrate 320s, and then forming a second electrode layer 322 on the substrate 320s, wherein the second electrode layer 322 of the embodiment is a common electrode. It is to be noted that, before the second electrode layer 322 is formed, a black matrix 328 and a planarization dielectric layer 340 are sequentially formed on the substrate 320s, wherein the planarization dielectric layer 340 is used. To provide a flat upper surface.

在本實施例中,可進一步在具有第二電極層322的基底320s上形成一介電層324,並且在介電層324上形成多個凹穴R,以在後續步驟中對第一基板310與第二基板320進行組立而形成多個腔室C(繪示於圖2)。In the present embodiment, a dielectric layer 324 may be further formed on the substrate 320s having the second electrode layer 322, and a plurality of recesses R may be formed on the dielectric layer 324 to be opposite to the first substrate 310 in the subsequent step. A plurality of chambers C (shown in FIG. 2) are formed by being assembled with the second substrate 320.

之後,請參照圖3C,在第一基板310以及第二基板320之間形成一電致折射率調整介質330。在本實施例中,形成電致折射率調整介質330的方法例如是先將第二基板320與第一基板310相互平行設置而在第一基板310與第二基板320之間形成相連的多個腔室C,然後再將電致折射率調整介質330填入腔室C中。然而,在其他實施例中,形成電致折射率調整介質330的方法也可以先將電致折射率調整介質330填入凹穴R中,然後再將第二基板320與第一基板310相互平行設置而在第一基板310與第二基板320之間形成多個已填有電致折射率調整介質330的腔室C。簡言之,本發明並不限制第一基板310與第二基板320之組立步驟以及電致折射率調整介質330之形成步驟的順序為何。Thereafter, referring to FIG. 3C, an electro-refractive index adjusting medium 330 is formed between the first substrate 310 and the second substrate 320. In this embodiment, the method of forming the electro-refractive index adjusting medium 330 is, for example, that the second substrate 320 and the first substrate 310 are disposed in parallel with each other to form a plurality of connected between the first substrate 310 and the second substrate 320. The chamber C is then filled into the chamber C by the electrostrictive refractive index adjusting medium 330. However, in other embodiments, the method of forming the electro-refractive index adjusting medium 330 may first fill the electrorefractive index adjusting medium 330 into the cavity R, and then parallel the second substrate 320 and the first substrate 310. A plurality of chambers C filled with the electro-refractive index adjusting medium 330 are formed between the first substrate 310 and the second substrate 320. In short, the present invention does not limit the order in which the first substrate 310 and the second substrate 320 are combined and the order in which the electrorefractive index adjusting medium 330 is formed.

如圖3C所示,第二基板320在朝向腔室C的一側具有一第二電極層322,而第一基板310在朝向腔室C的一側具有第一電極層312。控制電極312a分別對應腔室C設置,線路318以及黑矩陣328對應腔室C的鄰接處設置。此外,在本實施例中,電致折射率調整介質330例如是液晶材料。因此,可進一步在圖3A的步驟中,於基底310s上形成配向層316,其中配向層316覆蓋第一電極層312;而在圖3B的步驟中,於基底320s上形成配向層326,其中介電層324位於配向層326以及第二電極層322之間。As shown in FIG. 3C, the second substrate 320 has a second electrode layer 322 on a side facing the chamber C, and the first substrate 310 has a first electrode layer 312 on a side facing the chamber C. The control electrodes 312a are respectively disposed corresponding to the chamber C, and the line 318 and the black matrix 328 are disposed adjacent to the chamber C. Further, in the present embodiment, the electrorefractive index adjusting medium 330 is, for example, a liquid crystal material. Therefore, in the step of FIG. 3A, an alignment layer 316 is formed on the substrate 310s, wherein the alignment layer 316 covers the first electrode layer 312; and in the step of FIG. 3B, an alignment layer 326 is formed on the substrate 320s. The electrical layer 324 is between the alignment layer 326 and the second electrode layer 322.

特別一提的是,本實施例可在圖3B的步驟中會形成多個凹穴R,其中凹穴R可形成於由介電層324以及基底320s所構成的第二基板320中。接下來,舉例說明幾種形成凹穴R的方法,但本發明並不限定以下的形成凹穴R的方法為本實施例形成凹穴R的所有方法。此外,為方便說明,以下圖示僅繪示介電層324與基底320s等膜層,並省略其餘膜層。In particular, in this embodiment, a plurality of recesses R may be formed in the step of FIG. 3B, wherein the recesses R may be formed in the second substrate 320 composed of the dielectric layer 324 and the substrate 320s. Next, several methods of forming the pockets R are exemplified, but the present invention does not limit the following methods of forming the pockets R as all the methods of forming the pockets R in the present embodiment. In addition, for convenience of explanation, the following illustrations only show the film layers such as the dielectric layer 324 and the substrate 320s, and the remaining film layers are omitted.

圖4A~圖4C為本發明之一實施例之一種凹穴的製造流程局部剖面示意圖。在本實施例中,形成凹穴R的方法包括下列步驟。首先,請參照圖4A,在介電層324A上形成一圖案化罩幕PR1,其中圖案化罩幕PR1為光阻層。此外,形成圖案化罩幕PR1的方法例如是先用旋轉塗佈法在介電層324A上形成一感光材料層(未繪示),然後再對此感光材料層進行一道微影製程。而後,請參照圖4B,藉由圖案化罩幕PR1來圖案化介電層324A(繪示於圖4A),以在保留下來的介電層324中形成凹穴R,其中圖案化介電層324A的方法例如是利用電漿進行乾蝕刻(Dry Etching)製程P1。之後,請參照圖4C,移除圖案化罩幕PR1。4A-4C are partial cross-sectional views showing a manufacturing process of a recess according to an embodiment of the present invention. In the present embodiment, the method of forming the pocket R includes the following steps. First, referring to FIG. 4A, a patterned mask PR1 is formed on the dielectric layer 324A, wherein the patterned mask PR1 is a photoresist layer. In addition, the method of forming the patterned mask PR1 is, for example, first forming a photosensitive material layer (not shown) on the dielectric layer 324A by spin coating, and then performing a lithography process on the photosensitive material layer. Then, referring to FIG. 4B, the dielectric layer 324A (shown in FIG. 4A) is patterned by patterning the mask PR1 to form a recess R in the remaining dielectric layer 324, wherein the dielectric layer is patterned. The method of 324A is, for example, a plasma etching process (Pry Etching) P1. Thereafter, referring to FIG. 4C, the patterned mask PR1 is removed.

在另一實施例中,如圖5所示,介電層324例如是一感光材料層PR2,而形成凹穴R的方法例如是藉由一灰階光罩M1對此感光材料層PR2進行微影製程P2。具體而言,首先,在基底320s上形成一具有感光特性的介電材料層(未繪示),其中形成介電材料層的方法包括旋轉塗佈(spin coating)法。然後,利用一灰階光罩M1對介電材料層進行微影製程P2,其中灰階光罩M1包括不同光穿透率的透光區、非透光區以及半透光區,以形成與光罩M1之圖案相同或互補的感光材料層PR2(介電層324),進而形成凹穴R。實務上,可在上述之微影製程後,進一步固化感光材料層PR2(介電層324),以硬化凹穴R的內側壁。In another embodiment, as shown in FIG. 5, the dielectric layer 324 is, for example, a photosensitive material layer PR2, and the method of forming the recess R is performed by, for example, a gray scale mask M1. Shadow process P2. Specifically, first, a dielectric material layer (not shown) having photosensitive properties is formed on the substrate 320s, and a method of forming a dielectric material layer includes a spin coating method. Then, a lithography process P2 is performed on the dielectric material layer by using a gray scale mask M1, wherein the gray scale mask M1 includes a light transmissive region, a non-transmissive region, and a semi-transmissive region with different light transmittances to form and The photosensitive material layer PR2 (dielectric layer 324) having the same or complementary pattern of the mask M1 forms a recess R. In practice, the photosensitive material layer PR2 (dielectric layer 324) may be further cured after the lithography process described above to harden the inner sidewall of the recess R.

在又一實施例中,如圖6所示,形成凹穴R的方法還可以是利用機械刀具來移除部份的介電層324。具體而言,透過機械刀具來對介電層324進行精密機械加工製程P3後,部份介電層324會被移除,而部份介電層324會被保留下來,其中被保留下來的部份介電層324便形成多個凹穴R。In yet another embodiment, as shown in FIG. 6, the method of forming the recess R may also be to remove a portion of the dielectric layer 324 using a mechanical cutter. Specifically, after the mechanical processing process P3 is performed on the dielectric layer 324 by a mechanical cutter, part of the dielectric layer 324 is removed, and part of the dielectric layer 324 is retained, and the remaining portion is retained. The dielectric layer 324 forms a plurality of pockets R.

或者,再一實施例中,如圖7所示,利用雷射或準分子雷射通過光罩M2來對介電層324進行雷射或準分子雷射加工製程P4,以移除部份的介電層324,而被保留下來的部份介電層324便形成多個凹穴R。Alternatively, in another embodiment, as shown in FIG. 7, a laser or excimer laser processing process P4 is performed on the dielectric layer 324 by using a laser or excimer laser through the mask M2 to remove portions. The dielectric layer 324, while the remaining portion of the dielectric layer 324 forms a plurality of recesses R.

然而,在其他實施例中,也可利用上述幾種凹穴的製造方法來形成一母模(original mold),然後利用此母模形成多個子模(sub-mold),再利用這些子模在基底320s中或基底320s上方的膜層中形成多個凹穴R。如此,可提升製作具有凹穴R之第二基板320的產能。其中,利用母模形成多個子模的方法可以採用電鑄技術,而利用子模在基底320s中或基底320s上方的膜層中形成多個凹穴R的方法可以採用熱壓成型技術。However, in other embodiments, an original mold may be formed by using the above-described methods for manufacturing the recesses, and then a plurality of sub-molds are formed by using the master mold, and then the sub-modules are used. A plurality of pockets R are formed in the substrate 320s or in the film layer above the substrate 320s. In this way, the productivity of fabricating the second substrate 320 having the recesses R can be improved. Wherein, the method of forming a plurality of sub-modules by using a master mold may employ an electroforming technique, and the method of forming a plurality of pockets R in the film layer of the substrate 320s or the substrate 320s by using the sub-mold may employ a hot press forming technique.

【第二實施例】[Second embodiment]

圖8為本發明之第二實施例之一種顯示裝置的剖面示意圖。請參照圖8,本實施例之折射率調整面板300b與第一實施例之折射率調整面板300相類似,惟二者主要差異之處在於:本實施例進一步在折射率調整面板300b中的第一基板310b中設置多個稜鏡結構800。此外,本實施例與第一實施例若有相同或相似的標號則代表相同或相似的構件,在此不重複敘述。Figure 8 is a cross-sectional view showing a display device in accordance with a second embodiment of the present invention. Referring to FIG. 8, the refractive index adjusting panel 300b of the present embodiment is similar to the refractive index adjusting panel 300 of the first embodiment, but the main difference between the two is that the first embodiment of the refractive index adjusting panel 300b is further A plurality of crucible structures 800 are disposed in a substrate 310b. In addition, the same or similar reference numerals as in the first embodiment denote the same or similar members, and the description thereof will not be repeated.

如圖8所示,本實施例之顯示裝置100b包括一顯示面板200以及一折射率調整面板300b,其中折射率調整面板300b包括一第一基板310b、一第二基板320以及一電致折射率調整介質330。第一基板310b位於第二基板320與顯示面板200之間,其中第一基板310b朝向顯示面板200的一表面上具有多個稜鏡結構800,而每一稜鏡結構800分別對應於該些腔室C設置。As shown in FIG. 8, the display device 100b of the present embodiment includes a display panel 200 and a refractive index adjusting panel 300b. The refractive index adjusting panel 300b includes a first substrate 310b, a second substrate 320, and an electrorefractive index. The medium 330 is adjusted. The first substrate 310b is located between the second substrate 320 and the display panel 200. The first substrate 310b has a plurality of 稜鏡 structures 800 on a surface of the display panel 200, and each 稜鏡 structure 800 corresponds to the cavities respectively. Room C is set.

由上述可知,第一基板310b在背對第二基板320的一表面上具有多個分別對應於腔室C的稜鏡結構800。當背光模組400提供的光線L斜向入射顯示面板200時,稜鏡結構800可改變光線L的行進方向,進而使使入射至電致折射率調整介質330的光線L具有高準直性。如此,通過相鄰腔室C之電致折射率調整介質330的光線彼此較不易互相干擾。簡言之,稜鏡結構800有助於提升折射率調整面板300b的光學品質,以使顯示裝置100b具有良好的顯示效果,其中顯示裝置100b所顯示的畫面可具有良好的立體效果。As can be seen from the above, the first substrate 310b has a plurality of 稜鏡 structures 800 respectively corresponding to the chambers C on a surface facing away from the second substrate 320. When the light L provided by the backlight module 400 is obliquely incident on the display panel 200, the crucible structure 800 can change the traveling direction of the light L, thereby making the light L incident to the electro-refractive index adjusting medium 330 highly collimated. Thus, the light passing through the electro-refractive index adjusting medium 330 of the adjacent chamber C is less likely to interfere with each other. In short, the 稜鏡 structure 800 helps to improve the optical quality of the refractive index adjustment panel 300b, so that the display device 100b has a good display effect, and the screen displayed by the display device 100b can have a good stereoscopic effect.

【第三實施例】[Third embodiment]

圖9為本發明之第三實施例之一種折射率調整面板的剖面示意圖。請參照圖9,本實施例之折射率調整面板300c與第一實施例之折射率調整面板300相類似,惟二者主要差異之處在於:本實施例之第二基板320c中之構件的佈局與第一實施例不同。此外,本實施例與第一實施例若有相同或相似的標號則代表相同或相似的構件,在此不重複敘述。Figure 9 is a cross-sectional view showing a refractive index adjusting panel according to a third embodiment of the present invention. Referring to FIG. 9, the refractive index adjusting panel 300c of the present embodiment is similar to the refractive index adjusting panel 300 of the first embodiment, but the main difference between the two is that the layout of the components in the second substrate 320c of the present embodiment Different from the first embodiment. In addition, the same or similar reference numerals as in the first embodiment denote the same or similar members, and the description thereof will not be repeated.

如圖9所示,本實施例之折射率調整面板300c包括一第一基板310、一第二基板320c以及一電致折射率調整介質330,其中第二基板320c包括基底320s、第二電極層322、介電層324、配向層326以及黑矩陣328。在本實施例中,介電層324位於基底320s以及第二電極層322之間,且配向層326位於第二電極層322以及電致折射率調整介質330之間。As shown in FIG. 9, the refractive index adjusting panel 300c of the present embodiment includes a first substrate 310, a second substrate 320c, and an electro-refractive index adjusting medium 330. The second substrate 320c includes a substrate 320s and a second electrode layer. 322, dielectric layer 324, alignment layer 326, and black matrix 328. In the present embodiment, the dielectric layer 324 is located between the substrate 320s and the second electrode layer 322, and the alignment layer 326 is located between the second electrode layer 322 and the electro-refractive index adjusting medium 330.

值得一提的是,本實施例之折射率調整面板300c也可進一步設置稜鏡結構800(繪示於圖8),以提升其光學品質。It is worth mentioning that the refractive index adjusting panel 300c of the embodiment may further be provided with a 稜鏡 structure 800 (shown in FIG. 8) to improve its optical quality.

由上述可知,本實施例之折射率調整面板300c的大致架構。接下來,說明折射率調整面板300c的製造方法。然而,本實施例之折射率調整面板300c的製造方法與第一實施例之折射率調整面板300的製造方法相類似,惟二者主要差異之處在於:第一實施例在圖3B的步驟中所提供之第二基板320的佈局與本實施例所提供之第二基板320c的佈局不盡相同。From the above, the approximate structure of the refractive index adjustment panel 300c of the present embodiment is known. Next, a method of manufacturing the refractive index adjustment panel 300c will be described. However, the manufacturing method of the refractive index adjusting panel 300c of the present embodiment is similar to the manufacturing method of the refractive index adjusting panel 300 of the first embodiment, but the main difference between the two is that the first embodiment is in the step of FIG. 3B. The layout of the second substrate 320 provided is not the same as the layout of the second substrate 320c provided in this embodiment.

詳細而言,在本實施例中,介電層324位於基底320s以及第二電極層322之間,且配向層326以及介電層324之間夾有第二電極層322。因此,本實施例形成第二基板320c的方法可以是依序基底320s上形成黑矩陣328、介電層324、第二電極層322以及配向層326,其中形成這些膜層的方法可參考第一實施例,在此不加以描述。此外,本實施例在形成介電層324之前,可進一步在基底320s上形成平坦化介電層340,以提供平坦的上表面。In detail, in the embodiment, the dielectric layer 324 is located between the substrate 320s and the second electrode layer 322, and the second electrode layer 322 is sandwiched between the alignment layer 326 and the dielectric layer 324. Therefore, the method of forming the second substrate 320c in this embodiment may be to form a black matrix 328, a dielectric layer 324, a second electrode layer 322, and an alignment layer 326 on the substrate 320s. The method for forming the film layers may refer to the first method. Embodiments are not described herein. In addition, the present embodiment may further form a planarization dielectric layer 340 on the substrate 320s to provide a flat upper surface prior to forming the dielectric layer 324.

然而,其餘製造步驟可參考第一實施例,在此不重複敘述。However, the remaining manufacturing steps can be referred to the first embodiment, and the description will not be repeated here.

綜上所述,本發明的顯示裝置及其折射率調整面板可藉由調整電致折射率調整介質的光折射率,以使出射光聚焦在不同的平面上。如此,顯示裝置便可顯示具有不同景深效果的立體影像,其中立體影像不會發生解析度減半的情形。此外,本發明的顯示裝置也可顯示一般不具立體效果的平面影像,如此,使用者便可視其需求來選擇立體或平面兩種視覺效果的影像。另外,本發明的折射率調整面板的製造方法用以製造作出本發明的折射率調整面板。In summary, the display device of the present invention and its refractive index adjusting panel can adjust the refractive index of the refractive index of the medium by adjusting the refractive index of the medium to focus the emitted light on different planes. In this way, the display device can display a stereoscopic image with different depth of field effects, wherein the stereoscopic image does not suffer from a case where the resolution is halved. In addition, the display device of the present invention can also display a planar image that is generally not stereoscopic, so that the user can select images of stereoscopic or planar visual effects depending on his needs. Further, a method of manufacturing a refractive index adjusting panel of the present invention is used to manufacture a refractive index adjusting panel of the present invention.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

100、100b...顯示裝置100, 100b. . . Display device

200...顯示面板200. . . Display panel

210...次畫素210. . . Subpixel

300、300a、300b、300c...折射率調整面板300, 300a, 300b, 300c. . . Refractive index adjustment panel

310、310b...第一基板310, 310b. . . First substrate

310s、320s...基底310s, 320s. . . Base

312...第一電極層312. . . First electrode layer

312a...控制電極312a. . . Control electrode

316...配向層316. . . Alignment layer

318...線路318. . . line

320、320c...第二基板320, 320c. . . Second substrate

322...第二電極層322. . . Second electrode layer

324、324A...介電層324, 324A. . . Dielectric layer

328...黑矩陣328. . . Black matrix

330...電致折射率調整介質330. . . Electrorefractive index adjusting medium

340...平坦化介電層340. . . Planar dielectric layer

400...背光模組400. . . Backlight module

800...稜鏡結構800. . .稜鏡 structure

A...使用者A. . . user

C...腔室C. . . Chamber

D1、D2...景深值D1, D2. . . Depth of field value

L...光線L. . . Light

M1...灰階光罩M1. . . Gray scale mask

M2...光罩M2. . . Mask

P1...蝕刻製程P1. . . Etching process

P2...微影製程P2. . . Photolithography process

P3...精密機械加工製程P3. . . Precision machining process

P4...雷射或準分子雷射加工製程P4. . . Laser or excimer laser processing

PR1...圖案化罩幕PR1. . . Patterned mask

PR2...感光材料層PR2. . . Photosensitive material layer

R...凹穴R. . . Pocket

ΔV...電壓差ΔV. . . Voltage difference

圖1為本發明之一實施例之一種顯示裝置的剖面示意圖。1 is a cross-sectional view showing a display device according to an embodiment of the present invention.

圖2為本發明之第一實施例之一種折射率調整面板的剖面示意圖。2 is a cross-sectional view showing a refractive index adjusting panel according to a first embodiment of the present invention.

圖3A~圖3C為本發明之第一實施例之折射率調整面板的製造流程局部剖面示意圖。3A to 3C are partial cross-sectional views showing a manufacturing flow of a refractive index adjusting panel according to a first embodiment of the present invention.

圖4A~圖4C為本發明之一實施例之一種凹穴的製造流程局部剖面示意圖。4A-4C are partial cross-sectional views showing a manufacturing process of a recess according to an embodiment of the present invention.

圖5~圖7為本發明之一實施例之另三種形成凹穴的局部剖面示意圖。5 to 7 are partial cross-sectional views showing another three forming recesses according to an embodiment of the present invention.

圖8為本發明之第二實施例之一種顯示裝置的剖面示意圖。Figure 8 is a cross-sectional view showing a display device in accordance with a second embodiment of the present invention.

圖9為本發明之第三實施例之一種折射率調整面板的剖面示意圖。Figure 9 is a cross-sectional view showing a refractive index adjusting panel according to a third embodiment of the present invention.

300a...折射率調整面板300a. . . Refractive index adjustment panel

310...第一基板310. . . First substrate

310s、320s...基底310s, 320s. . . Base

312...第一電極層312. . . First electrode layer

312a...控制電極312a. . . Control electrode

316、326...配向層316, 326. . . Alignment layer

318...線路318. . . line

320...第二基板320. . . Second substrate

322...第二電極層322. . . Second electrode layer

324...介電層324. . . Dielectric layer

328...黑矩陣328. . . Black matrix

330...電致折射率調整介質330. . . Electrorefractive index adjusting medium

340...平坦化介電層340. . . Planar dielectric layer

C...腔室C. . . Chamber

L...光線L. . . Light

R...凹穴R. . . Pocket

ΔV...電壓差ΔV. . . Voltage difference

Claims (37)

一種折射率調整面板,包括:一第一基板;一第二基板,具有一基底、一介電層以及一黑矩陣,該介電層位於該基底上,該第二基板與該第一基板相互平行設置而在該第一基板與該第二基板之間形成相連的多個腔室,該介電層具有多個凹穴,以在該第一基板與該第二基板組立後形成該些腔室,該黑矩陣設置於該些腔室的鄰接處,其中該第一基板在朝向該些腔室的一側具有一第一電極層,而該第二基板在朝向該些腔室的一側具有一第二電極層,該第二電極層位於該基底上;以及一電致折射率調整介質,配置於該第一基板與該第二基板之間並填入該些腔室中。 A refractive index adjusting panel comprises: a first substrate; a second substrate having a substrate, a dielectric layer and a black matrix, the dielectric layer is located on the substrate, and the second substrate and the first substrate are mutually Parallelly disposed to form a plurality of connected chambers between the first substrate and the second substrate, the dielectric layer having a plurality of recesses to form the cavities after the first substrate and the second substrate are assembled a black matrix disposed at an abutment of the chambers, wherein the first substrate has a first electrode layer on a side facing the chambers, and the second substrate is on a side facing the chambers Having a second electrode layer on the substrate; and an electro-refractive index adjusting medium disposed between the first substrate and the second substrate and filled in the chambers. 如申請專利範圍第1項所述之折射率調整面板,其中該介電層覆蓋該第二電極層,且該第二基板更包括一配向層,其覆蓋該介電層。 The refractive index adjusting panel of claim 1, wherein the dielectric layer covers the second electrode layer, and the second substrate further comprises an alignment layer covering the dielectric layer. 如申請專利範圍第1項所述之折射率調整面板,其中該介電層位於該基底以及該第二電極層之間,且該第二基板更包括一配向層,其覆蓋該第二電極層。 The refractive index adjusting panel of claim 1, wherein the dielectric layer is located between the substrate and the second electrode layer, and the second substrate further comprises an alignment layer covering the second electrode layer . 如申請專利範圍第1項所述之折射率調整面板,其中該第二電極層為一共用電極。 The refractive index adjusting panel of claim 1, wherein the second electrode layer is a common electrode. 如申請專利範圍第1項所述之折射率調整面板,其中該第一電極層包括多個控制電極,分別對應於該些腔室設置。 The refractive index adjusting panel of claim 1, wherein the first electrode layer comprises a plurality of control electrodes respectively corresponding to the chambers. 如申請專利範圍第1項所述之折射率調整面板,其中該第一基板包括多條線路,耦接至該第一電極層,且該些線路設置於該些腔室的鄰接處。 The refractive index adjusting panel of claim 1, wherein the first substrate comprises a plurality of lines coupled to the first electrode layer, and the lines are disposed adjacent to the chambers. 如申請專利範圍第1項所述之折射率調整面板,其中該第一基板包括一配向層,覆蓋該第一電極層。 The refractive index adjusting panel of claim 1, wherein the first substrate comprises an alignment layer covering the first electrode layer. 如申請專利範圍第1項所述之折射率調整面板,其中該電致折射率調整介質為一液晶材料。 The refractive index adjusting panel of claim 1, wherein the electrorefractive index adjusting medium is a liquid crystal material. 如申請專利範圍第1項所述之折射率調整面板,其中該第一基板背對該第二基板的一表面上具有多個稜鏡結構,且每一稜鏡結構分別對應於該些腔室設置。 The refractive index adjusting panel of claim 1, wherein the first substrate has a plurality of 稜鏡 structures on a surface of the second substrate, and each 稜鏡 structure corresponds to the chambers respectively. Settings. 一種顯示裝置,包括:一顯示面板,具有多個次畫素;以及一折射率調整面板,與該顯示面板相對設置,且該折射率調整面板包括:一第一基板;一第二基板,具有一基底、一介電層以及一黑矩陣,該介電層位於該基底上,該第二基板與該第一基板相互平行設置而在該第一基板與該第二基板之間形成相連的多個腔室,該介電層具有多個凹穴,以在該第一基板與該第二基板組立後形成該些腔室,該黑矩陣設置於該些腔室的鄰接處,其中該第一基板在朝向該些腔室的一側具有一第一電極層,而該第二基板在朝向該些腔室的一側具有一第二電極層,該第二電極層位於該基底上;以及 一電致折射率調整介質,配置於該第一基板與該第二基板之間並填入該些腔室中。 A display device comprising: a display panel having a plurality of sub-pixels; and a refractive index adjustment panel disposed opposite the display panel, the refractive index adjustment panel comprising: a first substrate; a second substrate having a substrate, a dielectric layer, and a black matrix, the dielectric layer is disposed on the substrate, the second substrate and the first substrate are disposed in parallel with each other to form a connection between the first substrate and the second substrate a chamber having a plurality of recesses for forming the chambers after the first substrate and the second substrate are assembled, the black matrix being disposed at an abutment of the chambers, wherein the first The substrate has a first electrode layer on a side facing the chambers, and the second substrate has a second electrode layer on a side facing the chambers, the second electrode layer being located on the substrate; An electro-refractive index adjusting medium is disposed between the first substrate and the second substrate and filled in the chambers. 如申請專利範圍第10項所述之顯示裝置,其中每一腔室對應一個或兩個以上的次畫素。 The display device of claim 10, wherein each of the chambers corresponds to one or more sub-pixels. 如申請專利範圍第11項所述之顯示裝置,其中每一腔室對應的該些次畫素構成一畫素。 The display device of claim 11, wherein the sub-pixels corresponding to each of the chambers constitute a pixel. 如申請專利範圍第10項所述之顯示裝置,其中該該介電層覆蓋該第二電極層,且該第二基板更包括一配向層,其覆蓋該介電層。 The display device of claim 10, wherein the dielectric layer covers the second electrode layer, and the second substrate further comprises an alignment layer covering the dielectric layer. 如申請專利範圍第10項所述之顯示裝置,其中該介電層位於該基底以及該第二電極層之間,且該第二基板更包括一配向層,其覆蓋該第二電極層。 The display device of claim 10, wherein the dielectric layer is between the substrate and the second electrode layer, and the second substrate further comprises an alignment layer covering the second electrode layer. 如申請專利範圍第10項所述之顯示裝置,其中該第二電極層為一共用電極。 The display device of claim 10, wherein the second electrode layer is a common electrode. 如申請專利範圍第10項所述之顯示裝置,其中該第一電極層包括多個控制電極,分別對應於該些腔室設置。 The display device of claim 10, wherein the first electrode layer comprises a plurality of control electrodes respectively corresponding to the chambers. 如申請專利範圍第10項所述之顯示裝置,其中該第一基板包括多條線路,耦接至該第一電極層,且該些線路設置於該些腔室的鄰接處。 The display device of claim 10, wherein the first substrate comprises a plurality of lines coupled to the first electrode layer, and the lines are disposed adjacent to the chambers. 如申請專利範圍第10項所述之顯示裝置,其中該第一基板包括一配向層,覆蓋該第一電極層。 The display device of claim 10, wherein the first substrate comprises an alignment layer covering the first electrode layer. 如申請專利範圍第10項所述之顯示裝置,其中該電致折射率調整介質為一液晶材料。 The display device of claim 10, wherein the electrorefractive index adjusting medium is a liquid crystal material. 如申請專利範圍第10項所述之顯示裝置,其中該 第一基板位於該第二基板與該顯示面板之間,且該第一基板朝向該顯示面板的一表面上具有多個稜鏡結構,每一稜鏡結構分別對應於該些腔室設置。 The display device of claim 10, wherein the display device The first substrate is located between the second substrate and the display panel, and the first substrate has a plurality of 稜鏡 structures on a surface of the display panel, and each 稜鏡 structure is respectively disposed corresponding to the chambers. 如申請專利範圍第10項所述之顯示裝置,其中該顯示面板為一液晶顯示面板。 The display device of claim 10, wherein the display panel is a liquid crystal display panel. 如申請專利範圍第10項所述之顯示裝置,更包括一背光模組,該顯示面板位於該背光模組與該折射率調整面板之間。 The display device of claim 10, further comprising a backlight module, the display panel being located between the backlight module and the refractive index adjustment panel. 一種折射率調整面板的製造方法,包括:提供一第一基板,該第一基板具有一第一電極層;提供一第二基板,該第二基板包括一黑矩陣,該第二基板與該第一基板相互平行設置而在該第一基板與該第二基板之間形成相連的多個腔室,該黑矩陣設置於該些腔室的鄰接處,其中該第二基板在朝向該些腔室的一側具有一第二電極層,而該第一基板在朝向該些腔室的一側具有該第一電極層;提供一基底,其中該第二電極層位於該基底上;在該基底上形成一介電層,並且在該介電層上形成多個凹穴,以在該第一基板與該第二基板組立後形成該些腔室;以及在該第一基板以及該第二基板之間形成一電致折射率調整介質,且該電致折射率調整介質填入該些腔室中。 A method for manufacturing a refractive index adjusting panel, comprising: providing a first substrate, the first substrate having a first electrode layer; providing a second substrate, the second substrate comprising a black matrix, the second substrate and the second substrate a substrate is disposed in parallel with each other to form a plurality of connected chambers between the first substrate and the second substrate, the black matrix being disposed at an abutment of the chambers, wherein the second substrate is facing the chambers One side has a second electrode layer, and the first substrate has the first electrode layer on a side facing the chambers; a substrate is provided, wherein the second electrode layer is on the substrate; on the substrate Forming a dielectric layer, and forming a plurality of recesses on the dielectric layer to form the chambers after the first substrate and the second substrate are assembled; and in the first substrate and the second substrate An electro-refractive index adjusting medium is formed therebetween, and the electro-refractive index adjusting medium is filled in the chambers. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中形成該些凹穴的方法包括藉由機械刀具來 移除部份的該介電層。 The method for manufacturing a refractive index adjusting panel according to claim 23, wherein the method of forming the recesses comprises: Part of the dielectric layer is removed. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中形成該些凹穴的方法包括藉由雷射或準分子雷射來移除部份的該介電層。 The method of fabricating a refractive index adjusting panel according to claim 23, wherein the method of forming the recesses comprises removing a portion of the dielectric layer by laser or excimer laser. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該介電層為一感光材料層,且形成該些凹穴的方法包括藉由一灰階光罩對該感光材料層進行微影製程。 The method for fabricating a refractive index adjusting panel according to claim 23, wherein the dielectric layer is a photosensitive material layer, and the method of forming the recesses comprises: coating the photosensitive material layer by a gray scale mask Perform lithography process. 如申請專利範圍第26項所述之折射率調整面板的製造方法,更包括在微影製程後,固化該感光材料層。 The method for fabricating a refractive index adjusting panel according to claim 26, further comprising curing the photosensitive material layer after the lithography process. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中形成該些凹穴的方法包括:在該介電層上形成一圖案化罩幕;藉由該圖案化罩幕來圖案化該介電層,以在該介電層中形成該些凹穴;以及移除該圖案化罩幕。 The method for manufacturing a refractive index adjusting panel according to claim 23, wherein the method of forming the recesses comprises: forming a patterned mask on the dielectric layer; patterning by the patterned mask The dielectric layer is formed to form the recesses in the dielectric layer; and the patterned mask is removed. 如申請專利範圍第28項所述之折射率調整面板的製造方法,其中該圖案化罩幕為光阻層。 The method of manufacturing a refractive index adjusting panel according to claim 28, wherein the patterned mask is a photoresist layer. 如申請專利範圍第23項所述之折射率調整面板的製造方法,更包括:在該介電層上形成一配向層,其中該介電層位於該配向層以及該第二電極層之間。 The method for fabricating a refractive index adjusting panel according to claim 23, further comprising: forming an alignment layer on the dielectric layer, wherein the dielectric layer is located between the alignment layer and the second electrode layer. 如申請專利範圍第23項所述之折射率調整面板的製造方法,更包括: 在該第二電極層上形成一配向層,其中該配向層位於該電致折射率調整介質以及該第二電極層之間。 The method for manufacturing a refractive index adjusting panel according to claim 23, further comprising: An alignment layer is formed on the second electrode layer, wherein the alignment layer is between the electro-refractive index adjusting medium and the second electrode layer. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該第二電極層為一共用電極。 The method of manufacturing a refractive index adjusting panel according to claim 23, wherein the second electrode layer is a common electrode. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該第一電極層包括多個控制電極,分別對應於該些腔室設置。 The method of manufacturing a refractive index adjusting panel according to claim 23, wherein the first electrode layer comprises a plurality of control electrodes respectively corresponding to the chambers. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該第一基板包括多條線路,耦接至該第一電極層,且該些線路設置於該些腔室的鄰接處。 The method of manufacturing a refractive index adjusting panel according to claim 23, wherein the first substrate comprises a plurality of wires coupled to the first electrode layer, and the wires are disposed adjacent to the chambers . 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該第一基板包括一配向層,覆蓋該第一電極層。 The method of manufacturing a refractive index adjusting panel according to claim 23, wherein the first substrate comprises an alignment layer covering the first electrode layer. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該該電致折射率調整介質為一液晶材料。 The method of manufacturing a refractive index adjusting panel according to claim 23, wherein the electrorefractive index adjusting medium is a liquid crystal material. 如申請專利範圍第23項所述之折射率調整面板的製造方法,其中該第一基板背對該第二基板的一表面上具有多個稜鏡結構,且每一稜鏡結構分別對應於該些腔室設置。 The method for manufacturing a refractive index adjusting panel according to claim 23, wherein the first substrate has a plurality of 稜鏡 structures on a surface of the second substrate, and each 稜鏡 structure corresponds to the 分别 structure Some chamber settings.
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