201102677 〜1TW 29506twf.doc/n 六、發明說明： 【發明所屬之技術領域】 、本發暇有關於-種光電U及其元件與此元件的 製造方法，轉別是有關於—軸示裝置及其折射率調整 面板與折射率調整面板的製造方法。 ° 【先前技術】 裝來，隨著齡技術料斷進步，使用者對於顯示 如影像解析度、色彩飽和度等)的要求 1而，除了高影像解析度以及高色彩飽和度 為„而言，顯示裝置是否能夠顯示立體影像 Τ成為購貝上的考量因素之一。 用者技術而言，立體顯示技術可大致分成使 及眼鏡觀看之戴眼鏡式(st_sc_)以 鏡式立體顯示技輪—c)。其中戴眼 或大型娛樂4:===事， 裸眼式立體佳，使得此類技術不Μ及。因此， 技術已逐漸發展並成為新潮流。 桎狀f 立體顯示技術一般可利用光栅（barrier)遮光、 ri：；arplate) 接收到㈣定式光柵來控制觀賞者左眼與右眼所 右眼分別觀2；^=人眼的視覺特性，當左、 (parallax)的二兴二f衫像内容但是具有不同視差 〜冢時，人眼會觀察將二影像重疊解讀成 201102677 r.以儿0Z1TW 29506twf.d〇c/n 一立，影像。依照光柵位置的不同，可將立體顯示技術大 致上區分為前光柵式（front barrier)立體顯示技術以及後 光柵式（back barrier)立體顯示技術兩種。 值得注意的是，利用固定式光柵來產生立體影像屬於 種空間多工（spatial-multiplexed)的方式，此方式雖然 可以使得顯示面板具有立體顯示之效果，但卻使立體顯示 裝置之解析度減半^此外’具有固定式光桃之立體顯示裝 置月b用來顯示立體影像而無法顯示平面影像。對於使用 者而言，具有固定式光栅之立體顯示裝置的實用性不高。 【發明内容】 本發明關於-種折射率調整面板，其可依據需求來調 整自身的光折射率’以使出射統焦在不同或相同的平面 上。 本發明再關於-種顯示裝置，其採用上述之折射率調 整面板以顯不立體f彡像或平面影像’其巾立體影像會讓使 用者感受:不同景深的視覺效果。 本發明另關於-種折射率調整面板的製造方法，其用 以製造出上述之折射率調整面板。 為具體描述本發明之内容，在此提出一種折射率調整 面板’其包括—第—基板、—第二基板以及—電致折射率 f整，f。$二基板與第-基板相互平行設㈣在第—基 反與第-基板之間形成相連的多個腔室（⑽ky)，其中第 :基板在朝向腔室.的-側具有U極層，而第二基板 朝向些腔室的-側具有—第二電極層。電麟射率調整 201102677 J VUU厶1TW 29506lwf.d〇c/n 介質配置於第一基板與第二基板之間並填入腔室中。 為具體描述本發明之内容，在此再提出一種顯示裝 置，其包括一顯示面板以及一折射率調整面板。顯示面^ 具有多個次畫素，而折射率調整面板包括一第一基板、一 第二基板以及一電致折射率調整介質。第二基板與第—基 板相互平行設置而在第一基板與第二基板之間形成相連的 多個腔室，其中第一基板在朝向腔室的一側具有一第—電 極層，而第二基板在朝向腔室的一側具有一第二電極層。 電致折射率調整介質配置於第一基板與第二基板之間^ 入腔室中。 依據本發明之一實施例，每一腔室對應一個或兩個以 上的次晝素。在一實施例中，每一腔室對應的次晝素構成 一晝素。 依據本發明之一實施例，第二基板包括一基底以及一 介電層’其中第二電極層以及介電層位於基底上。介電層 具有多個凹穴（recess)，以在第一基板與第二基板組立^ 形成腔室。在一實施例中，介電層覆蓋第二電極層，而第 一基板更包括一配向層，且配向層覆蓋介電層。在另一實 施例中，介電層位於基底以及第二電極層之間，而第二基 板更包括一配向層，其中配向層覆蓋第二電極層。 板據本發明之一實施例，第一基板位於第二基板與顯 示面板之間，其中第一基板朝向顯示面板的一表面上具有 少個#文鏡結構’而每一棱鏡結構分別對應於該些腔室設置。 依據本發明之一實施例，顯示面板為一液晶顯示面 201102677 Γυ〇〇^ν^ι^ΟΖ1Τ\ν 29506twf.doc/n 板。 依據本發明之一實施例，顯示裴置更包括一背光模 組’其中顯示面板位於背光模組與折射率調整面板之間。 為具體描述本發明之内容’在此提出另一種折射率調 整面板的製造方法，而此製造方法包括下列步驟。首先， 提供一第一基板，其中第一基板具有—第一電極層。然後， 提供一第二基板，其中第二基板與第一基板相互平行設置 而在第一基板與第二基板之間形成相連的多個腔室。此 外，第二基板在朝向腔室的一側具有一第二電極層，而第 一基板在朝向腔室的一側具有第—電極層。之後，在第一 基板以及第二基板之間形成—電致折射率調整介質，且電 致折射率調整介質填入腔室中。 、 依據本發明之-實施例’折射率調整面板的製造方法 ^下列步驟。首先，提供—基底，其中第二電極層位 =&上。然後，在基底上形成—介電層，並^在介電層 室。乂成夕個凹a ’以在第—基板與第二基板組立後形成腔 機械:凹穴的方法例如是藉由 雷射 形成實施例，介電層為-感光材料層，^ 行微影製程。在:實—灰階光罩對此感光材料層均 鈀例中，折射率調整面板的製造方注 201102677201102677~1TW 29506twf.doc/n VI. Description of the Invention: [Technical Fields of the Invention] The present invention relates to a kind of photoelectric U and its components and a manufacturing method of the same, and the following is related to the axial display device and A method of manufacturing a refractive index adjusting panel and a refractive index adjusting panel. ° [Prior Art] In addition, with the advancement of age technology, the user's requirements for display such as image resolution, color saturation, etc., except for high image resolution and high color saturation, Whether the display device can display the stereoscopic image becomes one of the consideration factors on the purchase of the shell. In terms of user technology, the stereoscopic display technology can be roughly divided into a glasses-type (st_sc_) mirror-type stereoscopic display technology wheel-c Among them, wearing eye or large-scale entertainment 4:=== things, naked-eye stereo is good, so that this technology is not inconsistent. Therefore, technology has gradually developed and become a new trend. 桎-shaped f stereoscopic display technology can generally use grating ( Barrier, ri:;arplate) Received (4) fixed grating to control the viewer's left eye and right eye to the right eye respectively; 2^ The visual characteristics of the human eye, when left, (parallax) two-dimensional two-shirt Like the content but with different parallax ~ ,, the human eye will observe the interpretation of the two images as 201102677 r. With the child 0Z1TW 29506twf.d〇c/n, the image. According to the different raster position, the stereo display technology can be roughly The upper part is divided into a front barrier stereoscopic display technology and a back barrier stereoscopic display technology. It is worth noting that the use of a fixed grating to generate stereoscopic images belongs to spatial-multiplexed. In this way, although the display panel can have the effect of stereoscopic display, the resolution of the stereoscopic display device is reduced by half. In addition, the stereoscopic display device with the fixed light peach is used to display the stereoscopic image and cannot display the plane. The present invention relates to a stereoscopic display device having a fixed grating, which is not practical. [Invention] The present invention relates to a refractive index adjusting panel which can adjust its own refractive index of light according to requirements. The present invention relates to a display device which uses the above-mentioned refractive index adjusting panel to display a stereoscopic image or a flat image. The stereoscopic image of the towel can be perceived by the user: different The visual effect of the depth of field. The present invention further relates to a method of manufacturing a refractive index adjusting panel for manufacturing the above Refractive Index Adjustment Panel. To specifically describe the content of the present invention, a refractive index adjustment panel is proposed which includes a -first substrate, a second substrate, and an electrorefractive index f, f. - the substrates are arranged in parallel with each other (4) forming a plurality of connected chambers ((10) ky) between the first base and the first substrate, wherein the first substrate has a U pole layer on the side facing the chamber, and the second substrate faces The sides of the chambers have a second electrode layer. The electrical radiance adjustment 201102677 J VUU 厶 1TW 29506lwf.d〇c/n The medium is disposed between the first substrate and the second substrate and filled into the chamber. To specifically describe the contents of the present invention, a display device is further provided which includes a display panel and a refractive index adjustment panel. The display surface has a plurality of sub-pixels, and the refractive index adjustment panel includes a first substrate, a second substrate, and an electro-refractive index adjusting medium. The second substrate and the first substrate are disposed in parallel with each other to form a plurality of connected chambers between the first substrate and the second substrate, wherein the first substrate has a first electrode layer on a side facing the chamber, and the second substrate The substrate has a second electrode layer on a side facing the chamber. The electro-refractive index adjusting medium is disposed between the first substrate and the second substrate into the chamber. According to an embodiment of the invention, each chamber corresponds to one or more secondary halogens. In one embodiment, the corresponding secondary monomers of each chamber constitute a halogen. According to an embodiment of the invention, the second substrate comprises a substrate and a dielectric layer ' wherein the second electrode layer and the dielectric layer are on the substrate. The dielectric layer has a plurality of recesses to form a chamber in the first substrate and the second substrate. In one embodiment, the dielectric layer covers the second electrode layer, and the first substrate further includes an alignment layer, and the alignment layer covers the dielectric layer. In another embodiment, the dielectric layer is between the substrate and the second electrode layer, and the second substrate further includes an alignment layer, wherein the alignment layer covers the second electrode layer. According to an embodiment of the present invention, the first substrate is located between the second substrate and the display panel, wherein the first substrate has a plurality of # mirror structures on a surface of the display panel, and each prism structure corresponds to the Some chamber settings. According to an embodiment of the invention, the display panel is a liquid crystal display surface 201102677 Γυ〇〇^ν^ι^ΟΖ1Τ\ν 29506twf.doc/n board. According to an embodiment of the invention, the display device further includes a backlight module ′ wherein the display panel is located between the backlight module and the index adjustment panel. In order to specifically describe the contents of the present invention, another method of manufacturing a refractive index adjusting panel is proposed, and the manufacturing method includes the following steps. First, a first substrate is provided, wherein the first substrate has a first electrode layer. Then, a second substrate is provided, wherein the second substrate and the first substrate are disposed in parallel with each other to form a plurality of connected chambers between the first substrate and the second substrate. Further, the second substrate has a second electrode layer on a side facing the chamber, and the first substrate has a first electrode layer on a side facing the chamber. Thereafter, an electro-refractive index adjusting medium is formed between the first substrate and the second substrate, and the electro-refractive index adjusting medium is filled into the chamber. According to the present invention, the method of manufacturing the refractive index adjusting panel is as follows. First, a substrate is provided, wherein the second electrode layer = & Then, a dielectric layer is formed on the substrate and is placed in the dielectric layer chamber. Forming a cavity a' to form a cavity machine after the first substrate and the second substrate are assembled: the method of the cavity is, for example, a laser formation embodiment, the dielectric layer is a photosensitive material layer, and the lithography process is performed. . In the real-grey reticle for this photosensitive material layer, palladium in the case of the refractive index adjustment panel manufacturing note 201102677
一 Z1TW 29506twf.doc/n 更包括在微影製程後，固化感光材料層。 依據本發明之一實施例’形成凹穴的方法包括下列步 驟。首先，在介電層上形成一圖案化罩幕。然後，藉由圖 案化罩幕來圖案化介電層，以在介電層中形成凹穴。之後， 移除圖案化罩幕。在一實施例中，圖案化罩幕為光阻層。 依據本發明之一實施例，折射率調整面板的製造方法 更包括在介電層上形成一配向層，其中介電層位於配向層 以及第二電極層之間。 依據本發明之一實施例，折射率調整面板的製造方法 更包括在第二電極層上形成一配向層，其中配向層位於電 致折射率調整介質以及第二電極層之間。 依據本發明之一實施例，在前述的折射率調整面板 製造方法）中，第一基板背對第二基板的一表面上具 有多個稜鏡結構，且每一稜鏡結構分別對應於腔室設置二 依據本發明之一實施例，第二基板包括一黑矩陣，苴 中黑矩陣設置於腔室的鄰接處。 八 依據本發明之-實施例，第二電極層為一共用電極。 極，發明之—實闕，第一電極層包括多個控制電 -、干控制電極分別對應於腔室設置。 其 中線實施例，第一基板包括多條線路 揭接至苐一電極層，並設置於腔室的鄰接處。 配向層，其 依據本發明之一實施例，第一基板包括一 甲配向層覆蓋第一電極層。 液 依據本發明之—實施例，電致折射率調整介質為 201102677 r^^u^OZlTW 29506tvvf.doc/n 晶材料。 本發明的顯示裝置及其折射率調整面板可藉由調整 電致折射率調整介質的光折射率’以使出射光聚焦在不同 或相同的平面上。如此，顯开：裝置得以顯示立體影像或平 面影像’以使使用者感受不同景深的視覺效果。另外，本 發明的折射率調整面板的製造方法用以製造作出本發明的 折射率調整面板。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂，下文特舉實施例，並配合所附圖式，作詳細說明如 下。 【實施方式】 圖1為本發明之一實施例之一種顯示裝置的剖面示意 圖。請參照圖1，本實施例之顯示裝置100包括一顯示面 板200以及一折射率調整面板300。顯示面板200具有多 個次晝素210，其中顯示面板200例如是液晶顯示面板’ 而次晝素210可以是紅色次晝素、綠色次畫素、藍色次晝 素…等帶有顏色的次晝素而使顯示面板200顯示彩色畫 面。以穿透式或半穿透半反射式的顯示裝置100為例’顯 示裝置100可進一步設置背光模組4〇〇,其中顯示面板2〇〇 位於背光模組400與折射率調整面板3〇〇之間。 在本實施例中，背光模組400提供顯示面板200以及 折射率調整面板300所需的光線L，以使光線L得以入射 至顯示面板200並自折射率調整面板3〇〇射出，而使用者 A便可觀看顯示裝置1〇〇所呈現的顯示晝面。 201102677 -----------£1TW 295〇6twf.doc/n 如圖1所不，本實施例之折射率調整面板3〇〇 i 致折射率調整介質330，可使使財a所觀相的顯= :具有不同景深的效果。詳細而言，光線L通過不同次晝 '、210所對應之電致折射率調整介質MG的光折射率可不 盡相同。因此’出射折射率調整面板3GG的光線L可聚隹 面上’進而使同—個顯示晝面具有不同的景深 果的顯示晝面如此—來’使时A便可觀看到具有立體效 鼓二^上述可知，本實施例之顯示裝置100藉由折射率調 ^面板3GG麵*具料同景深大小的立體顯*晝面。如 立體顯示晝面的解析度會等同於顯示面板2GG的解析 有另j於4知立體顯示裝置在顯示立體晝面卻發生苴 析度減半的情形。 '、 ^值得—提的是，本實施例之顯示裝置100也可作為一 般不具有立體晝面的顯示裝置。當光線L通過每一次書素 =所對應之電致折射率調整介f 33G的折射率為二同 J ’同-個顯示畫面便具有相同的景深值（例如叫，則 者A所觀看到的顯示晝面便不具有立體效果。 ^來’舉例說明本實施例之幾種顯示裝置及其折射 率^面板以及折射率調整面板的製造方法。但本發明並 不，疋以下實施例為本發明的所有實施方式。 【第一實施例】 圖2為本發明之第—實施例之—種折射率調整面板的 ㈣示意圖。請參關2,本實施例之折射率輕面板施 201102677 rwou^uji^OZlTW 29506twf.doc/a 包括一苐一基板310、一第二基板320以及一電致折射率 5周整介質330。第二基板320與第一基板310相互平行設 置而在第一基板310與第二基板320之間形成相連的多個 腔室（cavity) C ’且電致折射率調整介質330配置於第一 基板310與第二基板320之間並填入腔室c中。 在本實施例中’第一基板310在朝向腔室c的一侧具 有一第一電極層312，其中第一電極層312例如是由多個 控制電極312a所構成，且控制電極312a分別對應於腔室 c設置。另一方面，第二基板320在朝向些腔室c的一側 具有一第二電極層322，其中第二電極層322例如為一共 詳細而言，本實施例之第二基板32〇包括—基底32〇s 以及-介電層324,其中介電層324及上述之第:電極層 322位於基底32〇3上，且介電層324覆蓋第二電極層％2曰。 ;|電層324具有多個凹穴（depression) R，以在第一美板 310與第二基板320組立後形成多個腔室c。此外，在 ^施例中，每-腔室c對應一個次晝素21〇(緣示於㈣。 二金實施例中，每—腔室C也可以對應兩個以上 1::匕時每一腔室C對應的該些次晝素210構 ^ 未緣示）。舉例來說，當次畫素2_ 色:人畫素、綠色次晝素與藍色次晝料，祕—腔室〇 對應的晝素便是*紅色:欠晝素、綠色:欠畫賴㊣色欠 :者所構成。當然:’本發明並無意限制次晝素训的= 為紅色、綠色與藍色，也不限制構成晝素之次竺素21〇的 201102677 29506twf.doc/a 個數為二個，而次晝f 210的顏色與構成晝素之次晝素21〇 的個數應視實際產品而定。 在本實施例中，電致折射率調整介質330的光折射率 與第-電極層312的電壓值以及第二電極層322的電壓值 相關。更進一步而言，控制電極312&以及第二電極層3D 之間的電壓差改麟，該控制電極3i2a所對應之腔室c 中的電致折射率調整介質·的光折射率也會隨之改變。 ^舉例來說，當電致折射率調整介質33〇為液晶材料 時，第二電極層322與控制電極312a之間的電壓差可 決定腔室C巾之液晶分子的排列方式，進而決定電致折射 率調整介質330的折射率。如此一·來，各個腔室c中之電 致折射率調整介質330的折射率便可藉由調整第二電極層 322與5亥腔室c所對應的控制電極312a之間的電壓差Δν 而有所不同，以使光線L通過該腔室c所對應之液晶分子 的光學路徑也隨之改變。實務上，第一基板31〇與第二基 板320可分別進一步包括一配向層316與一配向層326， 以使夾設於配向層316、326之間的液晶分子具有良好的配 向效果。在本實施例中，配向層316覆蓋第一電極層312， 而配向層326覆蓋介電層324。此外，於腔室c之鄰接處， 液曰a分子通常會發生排列不良或排列紊亂的情形 。因此， 第二基板320可進-步於腔室c之鄰接處設置黑矩陣 328，以遮敝通過該處之液晶分子的光線。 在本實施例中，第一電極層312與第二電極層322為 透明電極’其材質可包括透光之導電材，例如銦錫氧化物 12 201102677 ^一一OZ1TW 29506twf.doc/n (indium-tin oxide，ITO)、銦鋅氧化物（indium-zinc oxide, IZ0)、鋁鋅氧化物（aluminum-zinc oxide, AZO)、鎵鋅氧化物 (GZ0)、鋅氧化物（zincoxide,ZnO)及錫氧化物（Sn02)。 在本實施例中，第一基板3l〇可進一步設置多條線路 318，以分別耦接至控制電極312a並提供控制電極312& 所需的電壓。此外，線路318 一般是由不透光的導電材質 所形成，若將這些線路318也設置於腔室c之鄰接處，則 φ 通過相鄰腔室C的光線發生互相干擾的情形可有效降低。 圖3A〜圖3C為本發明之第一實施例之折射率調整面 板的製造流程局部剖面示意圖。首先，請參照圖3A，提供 一第一基板310，其中第一基板31〇具有一第—電極層 312。在本實施例中，形成第一電極層312的方法例如是先 提供一基底310s，接著在基底31〇s上形成多個控制電極 312a’其中第一電極層312由這些控制電極312a所構成。 此外’本實施例還可選擇性地在基底3丨〇 s上依序形成多條 線路318，其中線路318耦接至第一電極層；312。 • 再者，請參照圖3B，提供一第二基板32〇，其中第二 基板320具有一第二電極層322。在本實施例中，形成第 二電極層322的方法例如是先提供一基底32〇s，接著在基 底320s上形成第二電極層322，其中本實施例之第二電極 層322為共用電極。值得一提的是，本實施例在形成第二 電極層322之前’可選擇性地在基底32〇s上依序形成一黑 矩陣328以及一平坦化介電層340,其中平坦化介電層34〇 用以提供平坦的上表面。 13 201102677 jl 29506twf.doc/n 在本實施例中，可進一步在具有第二電極層322的基 底320s上形成一介電層324，並且在介電層324上形成多 個凹穴R，以在後續步驟中對第一基板310與第二基板32〇 進行組立而形成多個腔室C (繪示於圖2)。 之後，請參照圖3C，在第一基板 --- -μ汉弟二巷槪 320之間形成一電致折射率調整介質33〇。在本實施例中， 形成電致折射率調整介質330的方法例如是先將第二基板 320與第一基板31〇相互平行設置而在第一基板31〇與第 —基板320之間形成相連的多個腔室匚，然後再將電致折 射率調整介質顶填入腔室C中。然而，在其他實施例中， ，成電致折射率調整介質33G的方法也可以先將電致折射 二。周1 ;丨貝330填入凹穴r中，然後再將第二基板32〇與 第-基板3Η)相互平行設置而在第一基板3㈣第二基板 r 形成多個已填有電致折射率調整介質33G的腔室 間α之’本發明並不限制第一基板31〇與第二基板挪 :::步驟以及電致折射率調整介質33。之形成步驟的順 有二基板现在朝向腔室C的一側具 要 " 控制電極312a分別對;^ γ室e $： :外線;矩陣328對應腔室C的 上形成配向層316，其中=^步=，於基底獅 配向層316覆盍第—電極層312 ; 201102677 rueuzuDj^OZlXW 29506twf.doc/n 而在圖3B的步驟中，於基底320s上形成配向層326，其 中介電層324位於配向層326以及第二電極層322之間。 特別一提的是，本實施例可在圖3B的步驟中會形成 多個凹穴R，其中凹穴r可形成於由介電層324以及基底 320s所構成的第二基板320中。接下來，舉例說明幾種形 成凹穴R的方法，但本發明並不限定以下的形成凹穴R的 方法為本實施例形成凹穴R的所有方法。此外，為方便說A Z1TW 29506twf.doc/n further includes a layer of cured photosensitive material after the lithography process. The method of forming a pocket in accordance with an embodiment of the present invention includes the following steps. First, a patterned mask is formed on the dielectric layer. The dielectric layer is then patterned by patterning the mask to form recesses in the dielectric layer. After that, remove the patterned mask. In an embodiment, the patterned mask is a photoresist layer. According to an embodiment of the invention, a method of fabricating a refractive index adjusting panel further includes forming an alignment layer on the dielectric layer, wherein the dielectric layer is between the alignment layer and the second electrode layer. According to an embodiment of the present invention, a method of fabricating a refractive index adjusting panel further includes forming an alignment layer on the second electrode layer, wherein the alignment layer is between the electro-refractive index adjusting medium and the second electrode layer. According to an embodiment of the present invention, in the foregoing refractive index adjusting panel manufacturing method, the first substrate has a plurality of 稜鏡 structures on a surface opposite to the second substrate, and each 稜鏡 structure corresponds to the chamber Setting 2 According to an embodiment of the invention, the second substrate comprises a black matrix, and the black matrix in the crucible is disposed at an abutment of the chamber. According to an embodiment of the invention, the second electrode layer is a common electrode. In fact, the first electrode layer includes a plurality of control electrodes, and the dry control electrodes respectively correspond to the chamber settings. In the midline embodiment, the first substrate includes a plurality of lines that are attached to the first electrode layer and disposed adjacent to the chamber. An alignment layer, according to an embodiment of the invention, the first substrate comprises an alignment layer covering the first electrode layer. Liquid According to the embodiment of the present invention, the electrorefractive index adjusting medium is 201102677 r^^u^OZlTW 29506tvvf.doc/n crystal material. The display device of the present invention and its refractive index adjusting panel can adjust the refractive index of the light of the electro-refractive index adjusting medium to focus the outgoing light on different or the same plane. Thus, the display is displayed: the device is capable of displaying a stereoscopic image or a flat image' to allow the user to experience the visual effects of different depths of field. Further, a method of manufacturing a refractive index adjusting panel of the present invention is for manufacturing a refractive index adjusting panel according to the present invention. The above and other objects, features and advantages of the present invention will become more <RTIgt; [Embodiment] FIG. 1 is a cross-sectional view showing a display device according to an embodiment of the present invention. Referring to FIG. 1, the display device 100 of the present embodiment includes a display panel 200 and a refractive index adjustment panel 300. The display panel 200 has a plurality of secondary halogens 210, wherein the display panel 200 is, for example, a liquid crystal display panel', and the secondary halogen 210 may be a red color, such as a red sub-tendin, a green sub-pixel, a blue sub-element, etc. The display panel 200 displays a color picture. Taking the transmissive or transflective display device 100 as an example, the display device 100 can further be provided with a backlight module 4, wherein the display panel 2 is located in the backlight module 400 and the refractive index adjustment panel 3 between. In the embodiment, the backlight module 400 provides the light L required by the display panel 200 and the refractive index adjusting panel 300 to allow the light L to be incident on the display panel 200 and ejected from the refractive index adjusting panel 3, and the user A can view the display surface presented by the display device 1〇〇. 201102677 -----------£1TW 295〇6twf.doc/n As shown in Fig. 1, the refractive index adjusting panel 3〇〇i of the present embodiment causes the refractive index adjusting medium 330 to The appearance of a: = has the effect of different depth of field. In detail, the light refractive index of the electro-refractive index adjusting medium MG corresponding to the light ray L passing through the different times ', 210 may be different. Therefore, the light L of the exiting refractive index adjusting panel 3GG can be gathered on the surface, so that the same display surface has a different depth of field display surface, so that 'A can be viewed with a stereo effect drum 2 ^ As can be seen from the above, the display device 100 of the present embodiment has a stereoscopic display surface with the same depth of field as the refractive index adjustment panel 3GG surface. For example, the resolution of the stereoscopic display surface is equivalent to the analysis of the display panel 2GG. In addition, the stereoscopic display device has a case where the degree of fading is halved when the stereoscopic display device is displayed. It is worth mentioning that the display device 100 of the present embodiment can also be used as a display device which generally does not have a stereoscopic face. When the light L passes through each of the readings = the corresponding refractive index of the electro-refractive index adjustment f 33G is the same J 'the same display screen has the same depth of field value (for example, called, then A sees The display of the kneading surface does not have a stereoscopic effect. ^ To illustrate the display device of the present embodiment and its refractive index panel and the manufacturing method of the refractive index adjustment panel. However, the present invention does not, the following embodiments are the present invention. [First Embodiment] Fig. 2 is a (four) schematic view of a refractive index adjusting panel according to a first embodiment of the present invention. Please refer to Fig. 2, the refractive index light panel of this embodiment is applied to 201102677 rwou^uji ^OZlTW 29506twf.doc/a includes a substrate 310, a second substrate 320, and an electro-refractive index 5-cycle dielectric 330. The second substrate 320 and the first substrate 310 are disposed in parallel with each other on the first substrate 310. A plurality of connected chambers C ′ are formed between the second substrates 320 , and the electro-refractive index adjusting medium 330 is disposed between the first substrate 310 and the second substrate 320 and filled in the chamber c. In the example, the first substrate 310 is facing the cavity One side of c has a first electrode layer 312, wherein the first electrode layer 312 is composed of, for example, a plurality of control electrodes 312a, and the control electrodes 312a are respectively disposed corresponding to the chamber c. On the other hand, the second substrate 320 is A second electrode layer 322 is disposed on a side of the chamber c. The second electrode layer 322 of the present embodiment includes a substrate 32 〇 s and a dielectric layer 324 . The dielectric layer 324 and the first electrode layer 322 are disposed on the substrate 32〇3, and the dielectric layer 324 covers the second electrode layer %2曰. The electrical layer 324 has a plurality of depressions R, A plurality of chambers c are formed after the first and second substrates 310 and the second substrate 320 are assembled. Further, in the embodiment, each chamber c corresponds to one sub-cylinder 21 (the edge is shown in (4). In the example, each chamber C may also correspond to two or more 1:: 匕, each of the chambers C corresponding to the sub-halogen 210 structure is not shown. For example, when the sub-pixel 2_ color: Human priming, green sputum and blue secondary sputum, secret - chamber 〇 corresponding to the scorpion is * red: 昼 昼, green: owe painting Of course: 'The invention is not intended to limit the number of secondary sputum training = red, green and blue, nor to limit the number of 201102677 29506twf.doc/a constituting the secondary scorpion 21 昼. The number of colors of the secondary 昼 f 210 and the number of secondary oxime 〇 21 昼 constituting the halogen should be determined depending on the actual product. In the present embodiment, the refractive index of the electrorefractive index adjusting medium 330 and the first electrode layer 312 The voltage value is related to the voltage value of the second electrode layer 322. Further, the voltage difference between the control electrode 312& and the second electrode layer 3D is changed, and the electricity in the chamber c corresponding to the control electrode 3i2a The refractive index of the refractive index-adjusting medium also changes. For example, when the electro-refractive index adjusting medium 33 is a liquid crystal material, the voltage difference between the second electrode layer 322 and the control electrode 312a can determine the arrangement of the liquid crystal molecules in the chamber C, thereby determining the electro-optic The refractive index adjusts the refractive index of the medium 330. In this way, the refractive index of the electro-refractive index adjusting medium 330 in each chamber c can be adjusted by adjusting the voltage difference Δν between the second electrode layer 322 and the control electrode 312a corresponding to the 5 chamber c. The difference is such that the optical path of the liquid crystal molecules corresponding to the light L passing through the chamber c also changes. In practice, the first substrate 31 and the second substrate 320 may further include an alignment layer 316 and an alignment layer 326, respectively, so that the liquid crystal molecules sandwiched between the alignment layers 316 and 326 have a good alignment effect. In the present embodiment, the alignment layer 316 covers the first electrode layer 312, and the alignment layer 326 covers the dielectric layer 324. In addition, in the vicinity of the chamber c, liquid helium a molecules usually have poor alignment or disordered arrangement. Therefore, the second substrate 320 can be further provided with a black matrix 328 adjacent to the chamber c to conceal the light of the liquid crystal molecules passing therethrough. In this embodiment, the first electrode layer 312 and the second electrode layer 322 are transparent electrodes, and the material thereof may include a light-transmitting conductive material, such as indium tin oxide 12 201102677 ^ one OZ1TW 29506twf.doc/n (indium- Tin oxide, ITO), indium-zinc oxide (IZ0), aluminum-zinc oxide (AZO), gallium zinc oxide (GZ0), zinc oxide (ZnO), tin Oxide (Sn02). In this embodiment, the first substrate 310 may further be provided with a plurality of lines 318 to be coupled to the control electrodes 312a and to provide voltages required for the control electrodes 312 & In addition, the line 318 is generally formed of an opaque conductive material. If these lines 318 are also disposed adjacent to the chamber c, the φ interference of light passing through the adjacent chamber C can be effectively reduced. 3A to 3C are partial cross-sectional views showing a manufacturing flow of a refractive index adjusting panel according to a first embodiment of the present invention. First, referring to FIG. 3A, a first substrate 310 is provided, wherein the first substrate 31 has a first electrode layer 312. In the present embodiment, the method of forming the first electrode layer 312 is, for example, first providing a substrate 310s, and then forming a plurality of control electrodes 312a' on the substrate 31's, wherein the first electrode layer 312 is composed of the control electrodes 312a. Further, the present embodiment can selectively form a plurality of lines 318 sequentially on the substrate 3?s, wherein the lines 318 are coupled to the first electrode layer; • Further, referring to FIG. 3B, a second substrate 32 is provided, wherein the second substrate 320 has a second electrode layer 322. In the present embodiment, the method of forming the second electrode layer 322 is, for example, first providing a substrate 32 〇s, and then forming a second electrode layer 322 on the substrate 320s, wherein the second electrode layer 322 of the present embodiment is a common electrode. It should be noted that, in this embodiment, a black matrix 328 and a planarization dielectric layer 340 are selectively formed on the substrate 32 〇s before forming the second electrode layer 322, wherein the dielectric layer is planarized. 34〇 is used to provide a flat upper surface. 13 201102677 jl 29506twf.doc/n In this embodiment, a dielectric layer 324 may be further formed on the substrate 320s having the second electrode layer 322, and a plurality of recesses R may be formed on the dielectric layer 324 to In the subsequent step, the first substrate 310 and the second substrate 32 are assembled to form a plurality of chambers C (shown in FIG. 2). Thereafter, referring to FIG. 3C, an electro-refractive index adjusting medium 33 is formed between the first substrate --- μ Handi Er Lane 320. In this embodiment, the method of forming the electro-refractive index adjusting medium 330 is, for example, first, the second substrate 320 and the first substrate 31 are disposed in parallel with each other to form a connection between the first substrate 31 and the first substrate 320. A plurality of chambers are then filled, and then the electrorefractive index adjusting medium is topped into the chamber C. However, in other embodiments, the method of forming the electro-refractive index adjusting medium 33G may also first electrorefract. Week 1; the mussels 330 are filled into the pockets r, and then the second substrate 32〇 and the first substrate 3Η are disposed in parallel with each other to form a plurality of electro-refractive indexes on the first substrate 3 (four) second substrate r. The process of adjusting the inter-chamber α of the medium 33G does not limit the steps of the first substrate 31 and the second substrate and the electro-refractive index adjusting medium 33. The forming step of the second substrate is now facing the side of the chamber C with the control electrode 312a being respectively paired; ^ γ chamber e $: : outer line; the matrix 328 corresponding to the chamber C is formed with an alignment layer 316, wherein = ^Step =, the base lion alignment layer 316 is covered with the first electrode layer 312; 201102677 rueuzuDj^OZlXW 29506twf.doc/n and in the step of FIG. 3B, the alignment layer 326 is formed on the substrate 320s, wherein the dielectric layer 324 is located Between the alignment layer 326 and the second electrode layer 322. In particular, in this embodiment, a plurality of recesses R may be formed in the step of FIG. 3B, wherein the recesses r may be formed in the second substrate 320 composed of the dielectric layer 324 and the substrate 320s. Next, several methods of forming the pockets R are exemplified, but the present invention does not limit the following methods of forming the pockets R as all the methods of forming the pockets R in the present embodiment. In addition, for convenience
明，以下圖示僅繪示介電層324與基底320s等膜層，並省 略其餘膜層。 圖4A〜圖4C為本發明之一實施例之—種凹穴的製& 流程局部剖©示雜。在本實施财，軸凹穴R的^ . =括下列步驟:首先，請參照圖4A，在介電層324A上另 ^-圖案化罩幕PR卜其中圖案化罩幕pRl為光阻層。^ 案化罩㈣1的方法例如是先用旋轉塗佈法^ d 324A上形成—感光材料層（未緣示），缺後祝 2先材⑽輯—道微影製程。 由圖案化罩幕m來圖案化介電層觀(^於= 以在保留下來的介電層324中形成、，^、'圖幸 電層3則方法例如是 |:::案仏The following illustrations only show the dielectric layers 324 and the substrate 320s and the like, and the remaining layers are omitted. 4A to 4C are partial cross-sectional views showing the process of forming a recess according to an embodiment of the present invention. In the present implementation, the shaft recess R includes the following steps: First, referring to FIG. 4A, the mask PR is further patterned on the dielectric layer 324A, wherein the patterned mask pR1 is a photoresist layer. ^ The method of the case cover (4) 1 is, for example, first forming a photosensitive material layer (not shown) by spin coating method d 324A, and then splicing the first material (10) to the lithography process. The dielectric layer is patterned by the patterned mask m (^ is formed in the remaining dielectric layer 324, and the method is, for example, a |::: case)
Etching)製程pi。之尨^ . 水進仃乾蝕刻（D! PR1。 之後，凊參照圖扣，移除圖案化& 在另一實施例中，如圖s张_ 感光材_，而形成凹穴如是-光罩Mi對此感光材料層pR2進行微影丨製^错2由: 15 201102677 rv/ow^yjj^wZlTW 29506twf.doc/n =’ ^先，在基底32〇s上形成—具有感光特性的介電材料 層（未緣示），其中形成介電材料層的方法包括旋轉 (spm coating)法。然後，利用—灰階光罩撾〗對介恭 料層進行微影製程P2’其中灰階料姐包括不同光^ 率的透规、料光區从核光區，則彡賴光罩吣 之圖案相同或互補的感光材料層PR2 (介電層324) 而形成凹穴R。實務上，可在上述之微影製^後，進— 固化感光材料層PR2 (介電層324)，以硬化凹穴r的二 側壁。 在又-實施例中，如圖6所示，形成凹穴R的方法 可以是利用機械刀具來移除部份的介電層324。 二_械刀具來對介電層324進行精密機械加工‘程 4 ’部份介電層324會被移除，而部份介電層似 保^下來，其中被保留下來的部份介電層324便形成^個 凹穴R。 或者，再一實施例中，如圖7所示，利用雷 子雷射通過光罩禮來對介電層似進行雷射或準分子二 射加工製程P4，以移除部份的介電層似 ^ 的部份介電層324便形成多個凹穴R。 被保留下末 =，在其他實施财，也可彻上述幾種凹穴的黎』 形成-母模（GriginalmGki)，然制用此母模形 模（sub-mold)，再利用這些子模在基底32〇s中 或基底320s上方的膜層中形成多個凹穴尺 製作具有凹穴R之第二基板32G的產能。其中，利 16 201102677 ruouzu^j^OZlTW 29506twf.doc/n 形成多個子模的方法可以採用電鑄技術，而利用子模在基 底320s中或基底320s上方的膜層中形成多個凹穴R的方 法可以採用熱壓成型技術。 【第二實施例】 圖8為本發明之第二實施例之一種顯示裝置的剖面示 意圖。請參照圖8，本實施例之折射率調整面板3〇〇b與第 一實施例之折射率調整面板3〇〇相類似，帷二者主要差異 之處在於：本實施例進一步在折射率調整面板3〇〇b中的第 一基板310b中設置多個稜鏡結構8〇〇。此外，本實施例與 第一實施例若有相同或相似的標號則代表相同或相似的構 件，在此不重複敘述。 如圖8所示’本實施例之顯示裝置1〇〇b包括一顯示 面板200以及一折射率調整面板3〇〇b，其中折射率調整面 板300b包括一第一基板31〇b、一第二基板320以及一電 致折射率調整介質330。第一基板31〇b位於第二基板320 與顯示面板200之間，其中第一基板31〇b朝向顯示面板 200的一表面上具有多個稜鏡結構8〇〇,而每一稜鏡結構 800分別對應於該些腔室c設置。 由上述可知，第一基板310b在背對第二基板320的 一表面上具有多個分別對應於腔室C的稜鏡結構800。當 背光模組400提供的光線L斜向入射顯示面板2〇〇時’稜 鏡結構800可改變光線L的行進方向，進而使使入射至電 致折射率調整介質330的光線L具有高準直性。如此，通 過相鄰腔室C之電致折射率調整介質330的光線彼此較不 17 201102677 a v〇vz-w-»^wZ1TW 29506twf.doc/n 易互相干擾。簡言之，稜鏡結構800有助於提升折射率調 整面板300b的光學品質，以使顯示裝置I00b具有良好的 顯示效果’其中顯示裝置100b所顯示的晝面可具有良好的 立體效果。 【第三實施例】 圖9為本發明之第三實施例之一種折射率調整面板的 剖面示意圖。請參照圖9,本實施例之折射率調整面板3〇〇c 與第一實施例之折射率調整面板300相類似，惟二者主要 差異之處在於：本實施例之第二基板320c中之構件的佈局 與第一實施例不同。此外，本實施例與第—實施例若有相 同或相似的標號則代表相同或相似的構件，在此不重複敛 述。 如圖9所示’本實施例之折射率調整面板3〇〇c包括 弟一基板310、一第二基板320c以及一電致折射率調整 j質330 ’其中第一基板320c包括基底32〇s、第二電極層 322、介電層324、配向層326以及黑矩陣328。在本實施 例中，介電層324位於基底320s以及第二電極層322之 間’且配向層326位於第二電極層322以及電致折射率調 整介質330之間。 值得一提的是，本實施例之折射率調整面板3〇〇c也 可進一步設置稜鏡結構800 (續·示於圖8),以提升其光學 品質。 由上述可知，本實施例之折射率調整面板3〇〇c的大 致架構。接下來，說明折射率調整面板3〇〇c的製造方法。 201102677 τυ〇_ 儿 OZ1TW 29506nvf.d〇c/n 然而，本貫施例之折射率調整面板3〇〇C的製造方法與第一 貫施例之折射率調整面板3〇〇的製造方法相類似’惟二者 主要差異之處在於：第一實施例在圖3B的步驟中所提供 之第二基板320的佈局與本實施例所提供之第二基板32〇c 的佈局不盡相同。 詳細而言，在本實施例中，介電層324位於基底320s 以及第二電極層322之間，且配向層326以及介電層324 | 之間夾有第二電極層322。因此，本實施例形成第二基板 320c的方法可以是依序基底32〇s上形成黑矩陣328、介電 層324、第二電極層322以及配向層326,其中形成這些膜 層的方法可參考第一實施例，在此不加以描述。此外，本 實施例在形成介電層324之前，可進一步在基底32〇s上形 成平坦化介電層34〇，以提供平坦的上表面。 然而，其餘製造步驟可參考第一實施例，在此不重複 钦述。 —綜上所述，本發明的顯示裝置及其折射率調整面板可 藉由調整電致折射率調整介質的光折射率，以使出射光聚 焦在不同的平面上。如此，顯示裝置便可顯示具有不同景 深效果的立體影像，其中立體影像不會發生解析度減半的 情形。此外，本發明的顯示裝置也可顯示一般不星立體效 果的平面影像，如此，使用者便可視其需求來選擇立體>或 平面兩種視覺效果的影像。另外，本發明的折射率調整面 板的製造方法用以製造作出本發明的折射率調整面板。 雖然本發明已以實施例揭露如上，然其並非用以阳定 本發明，任何所屬領域中具有通常知識者，在不脫離树 19 201102677 ^u^lvZITW 29506twf.doc/n :之:锖，和|&圍内，當可作些許之更動與潤飾 ==後附之申請專利範圍所界定者為準 圖。圖1為本發明之一實施例之一義示裝置的剖面示意 剖面本發明之第1施例之—種折射率調整面板的 板二-實施例之折射率調㈣ 流程㈣之—實關之—翻穴的製造 月邻：Π7為本發明之-實施例之另三種形成凹穴的 局部剖面不意圖。 音、圖圖8為本發明之第二實施例之—種顯示|置的剖面示 判而圖ί ^本發明之第三實施例之—種折射率調整面板的 刮曲不意圖。 【主要元件符號說明】 100、100b :顯示裝置 200 :顯示面板 210 :次晝素 3〇〇、300a、300b、300c:折射率調整 310、310b :第一基板 310s、320s :基底 312 :第一電極層 20 201102677Etching) Process pi. After that, the water is dried and etched (D! PR1. Thereafter, referring to the figure, removing the patterning & in another embodiment, as shown in the figure _ photosensitive material_, forming a pocket such as - light The cover Mi is lithographically patterned for this photosensitive material layer pR2. 2: 15 201102677 rv/ow^yjj^wZlTW 29506twf.doc/n = ' ^ First, formed on the substrate 32〇s - with photosensitive properties A layer of electrical material (not shown), wherein the method of forming a layer of dielectric material comprises a spm coating method. Then, using a gray scale mask, the lithography layer P2' is used for the gray layer. The sister includes the transparent light of different light transmittances, and the light-receiving area is from the nuclear light-emitting area, and the photosensitive material layer PR2 (dielectric layer 324) having the same or complementary pattern of the mask is formed to form the recess R. In practice, After the above-described lithography, the photosensitive material layer PR2 (dielectric layer 324) is cured to harden the two side walls of the recess r. In still another embodiment, as shown in Fig. 6, the recess R is formed. The method may be to use a mechanical cutter to remove a portion of the dielectric layer 324. The second tool is used to precisely machine the dielectric layer 324 'Process 4' partial dielectric The layer 324 is removed, and a portion of the dielectric layer appears to be secured, wherein the remaining portion of the dielectric layer 324 forms a recess R. Alternatively, in another embodiment, as shown in FIG. The laser or the excimer laser processing process P4 is performed on the dielectric layer by using a ray laser to form a plurality of dielectric layers 324 of the dielectric layer. The pocket R. is retained at the end =, in other implementations, it can also be formed in the above-mentioned several pockets of the 』 』 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 母 G These sub-modes form a plurality of pockets in the substrate 32 〇s or in the film layer above the substrate 320s to produce a capacity of the second substrate 32G having the recess R. Among them, Li 16 201102677 ruouzu^j^OZlTW 29506twf.doc/ n The method of forming a plurality of sub-modules may employ electroforming technology, and the method of forming a plurality of pockets R in the substrate 320s or the film layer above the substrate 320s by using the sub-mold may employ a hot press forming technique. [Second Embodiment] Figure 8 is a cross-sectional view showing a display device according to a second embodiment of the present invention. The refractive index adjusting panel 3〇〇b is similar to the refractive index adjusting panel 3〇〇 of the first embodiment, and the main difference between the two is that the present embodiment is further in the refractive index adjusting panel 3〇〇b. A plurality of 稜鏡 structures 8 设置 are disposed in the first substrate 310b. In addition, the same or similar reference numerals as in the first embodiment denote the same or similar members, and the description thereof will not be repeated. The display device 1b of the present embodiment includes a display panel 200 and a refractive index adjustment panel 3B, wherein the refractive index adjustment panel 300b includes a first substrate 31〇b, a second substrate 320, and a Electrorefractive index adjusting medium 330. The first substrate 31〇b is located between the second substrate 320 and the display panel 200, wherein the first substrate 31〇b has a plurality of 稜鏡 structures 8〇〇 on a surface of the display panel 200, and each 稜鏡 structure 800 Corresponding to the chambers c are respectively arranged. As can be seen from the above, the first substrate 310b has a plurality of 稜鏡 structures 800 respectively corresponding to the chambers C on a surface facing away from the second substrate 320. When the light L provided by the backlight module 400 is obliquely incident on the display panel 2〇〇, the structure 800 can change the traveling direction of the light L, thereby enabling the light L incident on the electro-refractive index adjusting medium 330 to have high collimation. Sex. Thus, the light of the electro-refractive index-adjusting medium 330 passing through the adjacent chambers C is less likely to interfere with each other than the light-emitting elements of the medium-refractive-index-adjusting medium 330. In short, the 稜鏡 structure 800 helps to improve the optical quality of the refractive index adjusting panel 300b so that the display device 100b has a good display effect' wherein the facet displayed by the display device 100b can have a good stereoscopic effect. [THIRD EMBODIMENT] Fig. 9 is a cross-sectional view showing a refractive index adjusting panel according to a third embodiment of the present invention. Referring to FIG. 9, the refractive index adjusting panel 3〇〇c of the present embodiment is similar to the refractive index adjusting panel 300 of the first embodiment, but the main difference between the two is: in the second substrate 320c of the embodiment. The layout of the components is different from that of the first embodiment. In addition, the same or similar reference numerals are used for the same or similar components in the embodiment to the first embodiment, and the description will not be repeated here. As shown in FIG. 9 , the refractive index adjustment panel 3 〇〇 c of the present embodiment includes a substrate 310 , a second substrate 320 c , and an electrorefractive index adjustment 330 . The first substrate 320 c includes a substrate 32 〇 s. a second electrode layer 322, a dielectric layer 324, an alignment layer 326, and a black matrix 328. In the present embodiment, the dielectric layer 324 is located between the substrate 320s and the second electrode layer 322 and the alignment layer 326 is located between the second electrode layer 322 and the electro-refractive index modifying medium 330. It is worth mentioning that the refractive index adjusting panel 3〇〇c of the present embodiment can further be provided with a 稜鏡 structure 800 (continued and shown in Fig. 8) to improve its optical quality. From the above, the general structure of the refractive index adjusting panel 3A of the present embodiment can be known. Next, a method of manufacturing the refractive index adjustment panel 3〇〇c will be described. 201102677 τυ〇_ 儿 OZ1TW 29506nvf.d〇c/n However, the manufacturing method of the refractive index adjusting panel 3〇〇C of the present embodiment is similar to the manufacturing method of the refractive index adjusting panel 3〇〇 of the first embodiment. The main difference between the two is that the layout of the second substrate 320 provided in the step of FIG. 3B in the first embodiment is different from the layout of the second substrate 32 〇c provided in this embodiment. In detail, in the embodiment, the dielectric layer 324 is located between the substrate 320s and the second electrode layer 322, and the second electrode layer 322 is sandwiched between the alignment layer 326 and the dielectric layer 324. Therefore, the method for forming the second substrate 320c in this embodiment may be to form a black matrix 328, a dielectric layer 324, a second electrode layer 322, and an alignment layer 326 on the substrate 32 〇 s, wherein the method for forming the film layers may be referred to The first embodiment will not be described here. In addition, the present embodiment may further form a planarization dielectric layer 34〇 on the substrate 32〇s to provide a flat upper surface prior to forming the dielectric layer 324. However, the remaining manufacturing steps can be referred to the first embodiment, and the description will not be repeated here. In summary, the display device of the present invention and its refractive index adjusting panel can adjust the refractive index of the light of the electro-refractive index adjusting medium so that the outgoing light is focused on different planes. In this way, the display device can display stereoscopic images with different depth of field effects, wherein the stereoscopic image does not suffer from a halving of resolution. In addition, the display device of the present invention can also display a planar image which is generally not star-shaped, so that the user can select a stereoscopic image or a planar visual effect depending on the needs thereof. Further, the method of producing a refractive index adjusting panel of the present invention is for producing a refractive index adjusting panel of the present invention. Although the present invention has been disclosed above by way of example, it is not intended to be used to the present invention, and any one of ordinary skill in the art, without departing from the tree 19 201102677 ^u^lvZITW 29506twf.doc/n: 锖, and| & within the circumference, when a few changes can be made and retouched == the scope of the patent application is defined as the standard. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional schematic cross-sectional view of an apparatus according to an embodiment of the present invention. FIG. 2 is a second embodiment of a refractive index adjusting panel, and the refractive index is adjusted (4). Manufacturing of the burrowing hole: Π7 is a partial cross-section of the other three forming pockets of the present invention. 8 is a cross-sectional view showing a display according to a second embodiment of the present invention, and FIG. 3 is a schematic view of a refractive index adjusting panel according to a third embodiment of the present invention. [Description of main component symbols] 100, 100b: display device 200: display panel 210: secondary metal 3〇〇, 300a, 300b, 300c: refractive index adjustment 310, 310b: first substrate 310s, 320s: substrate 312: first Electrode layer 20 201102677
OZ1TW 29506tw£doc/n 312a :控制電極 316 :配向層 318 :線路 320、320c :第二基板 322:第二電極層 ’ 324、324A :介電層 328 :黑矩陣 330 :電致折射率調整介質 # 340 :平坦化介電層 400:背光模組 800 :稜鏡結構 A :使用者 C :腔室 D卜D2 :景深值 L :光線 Ml :灰階光罩 m M2 :光罩 P1 :蝕刻製程 P2:微影製程 P3 :精密機械加工製程 P4:雷射或準分子雷射加工製程 PR1 :圖案化罩幕 PR2 :感光材料層 R :凹穴 △ V:電壓差 21OZ1TW 29506tw£doc/n 312a: control electrode 316: alignment layer 318: lines 320, 320c: second substrate 322: second electrode layer '324, 324A: dielectric layer 328: black matrix 330: electrorefractive index adjusting medium # 340 : Flattening dielectric layer 400: backlight module 800: 稜鏡 structure A: user C: chamber D Bu D2: depth of field value L: light Ml: gray scale mask m M2: mask P1: etching process P2: lithography process P3: precision machining process P4: laser or excimer laser processing process PR1: patterned mask PR2: photosensitive material layer R: pocket △ V: voltage difference 21