KR20070104074A - A display and a method for manufacturing thereof - Google Patents

Abstract

A display device and a manufacturing method thereof are provided to improve electromagnetic shielding effect and shielding effect from visible rays by forming an electromagnetic wave shield layer through a sputtering method. An electromagnetic wafer shield layer is formed on a board(100) which is used for an image display panel, a PET film or a glass. The electromagnetic shield layer is formed by depositing a conductive material which is any one selected the group consisting of silver, copper, aluminium, stainless steel and nickel. The conductive material has a thickness of 1 to 10 micrometers and a line width of 10 to 30 micrometers. The electromagnetic shield layer is patterned in a mesh or stripe shape.

Description

A display and a method for manufacturing thereof

1A is a cross-sectional view of a first embodiment of an electromagnetic shielding film of a display device according to the present invention;

FIG. 1B is a top view of FIG. 1A,

2 is a cross-sectional view of a second embodiment of an electromagnetic shielding film of a display device according to the present invention;

3 is a cross-sectional view of a third embodiment of an electromagnetic shielding film of a display device according to the present invention;

4 is a flowchart illustrating an embodiment of a manufacturing process of an electromagnetic wave shielding film in a method of manufacturing a display device according to the present invention;

5 is a diagram illustrating a process of applying a mask on a substrate and sputtering a conductive material.

<Explanation of symbols for main parts of the drawings>

100 substrate 110 conductive material

120a: first ITO layer 120b: second ITO layer

150: mask

With the advent of the multimedia era, display devices that can express more detailed, larger, and more natural colors are required. However, the current CRT (Cathode Ray Tube) has a limit to compose a large screen of 40 inches or more, and the LCD (Liquid Crystal Display), PDP (Plasma Display Panel), and projection TV (Television) are used for high definition video. It is rapidly developing for expansion.

The maximum feature of the display device described above can be manufactured in a thin thickness compared to the CRT, which is self-luminous, and is easy to manufacture a large flat screen (60 to 80 inches), and is clearly distinguished from the conventional CRT in terms of style and design. However, since the above-described PDP and the like generate electromagnetic waves harmful to a human body in the driving process, a front filter may be provided on the front of the panel on which an image is displayed in order to block them.

Hereinafter, a front filter of the PDP, which is one of the display devices described above, and a problem thereof will be described.

The PDP has a lower plate having an address electrode, a top plate having a sustain electrode pair, and a discharge cell defined by a partition wall, and phosphors are coated in the discharge cell to display a screen. Specifically, when discharge occurs in the discharge space between the upper plate and the lower plate, ultraviolet rays generated at this time are incident on the phosphor to generate visible light, and the screen is displayed by the visible light.

A front filter is provided on the front side of the PDP. The front filter shields electromagnetic waves (EMI) and near infrared rays (NIR) and prevents color correction and reflection of light incident from the outside. Conventionally, a glass type front filter provided with a plurality of layers on glass is used. The glass type front filter can prevent the front filter from being damaged by an external impact, but is thick, heavy, and expensive to manufacture. There was a downside.

Therefore, a film type front filter has been proposed to solve the above problems. A film type front filter is provided with a near-infrared shielding film, an electromagnetic wave shielding film, a color correction film, an antireflection film, etc. on a base film in turn, and each film is bonded by an adhesive agent.

The configuration of the electromagnetic wave shielding film described above is as follows. A conductive material is provided in a mesh shape on a basefilm, and the conductive material may be supported by a frame. The mesh shape is formed by patterning a conductive material on a polyethylene terephthalate (PET) base film by a photolithography or etching process or a sputtering method.

However, when the electromagnetic shielding film is formed by the sputtering method described above, there are the following problems.

Ag and the like having a low resistance is excellent in the electromagnetic shielding effect, but there is a problem to lower the color luminance by shielding the visible light emitted from the inside of the display device. In addition, if the electromagnetic shielding film is formed by sputtering transparent ITO or the like, the problem of inferior color luminance is solved, but there is a problem that the electromagnetic shielding effect is not sufficiently exhibited due to the high electric resistance of the ITO.

Therefore, conventionally, conductive materials such as Ag and ITO are repeatedly stacked to form an electromagnetic shielding film composed of 5 to 11 layers.

However, when the electromagnetic shielding film is formed of 5 to 11 layers as described above, there is a problem in that the number of processes increases and the process time is lengthened. In addition, there is a problem in that the thickness of the electromagnetic shielding film is thickened and the weight is increased by being composed of a plurality of layers. In particular, in the case of plasma display panels of class B for home use, in order to form the electromagnetic shielding film by sputtering, there is a problem in that the electrical resistance increases and the formation thereof is very difficult.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a display device and a method for manufacturing the same, including an electromagnetic shielding film having a short process time by reducing the manufacturing process.

Another object of the present invention is to provide a display device having a thin film, a light weight, and an electromagnetic shielding film having an excellent electromagnetic shielding effect, and a method of manufacturing the same.

In order to achieve the above object, the present invention provides a panel for displaying image information; And an electromagnetic shielding film formed on the front surface of the panel with a thickness of 1 to 10 micrometers and formed by patterning a conductive material layer.

The present invention comprises the steps of covering the mask on the substrate; And stacking a conductive material layer on the substrate by a sputtering method to produce an electromagnetic shielding film.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention that can specifically realize the above object will be described.

The same components as in the prior art are given the same names and the same reference numerals for convenience of description, and detailed description thereof will be omitted.

The display device according to the present invention comprises a panel on which image information is displayed and an electromagnetic shielding film provided on the front of the panel. The electromagnetic wave shielding film is formed by patterning a conductive material. In addition, an electromagnetic shielding film is patterned by forming a mask on the substrate and stacking a conductive material. Where the conductive material is not laminated, ITO may be laminated to increase the electromagnetic shielding effect.

1A is a cross-sectional view of a first embodiment of an electromagnetic shielding film of a display device according to the present invention, and FIG. 1B is a plan view of FIG. 1A. A first embodiment of a display device according to the present invention will be described with reference to FIGS. 1A and 1B as follows.

In this embodiment, the electromagnetic shielding film is formed on the substrate 100. The substrate 100 may be a panel in which image information is displayed, or may be a PET film or glass. That is, the electromagnetic shielding film may be manufactured in the form of a film-type or glass-type front filter, or may be directly formed on the display panel. The electromagnetic shielding film is formed by stacking the conductive material 110, and the conductive material 110 is preferably any one of silver, copper, aluminum, stainless steel, and nickel. In addition, the conductive material 110 is preferably formed with a thickness of 1 to 10 micrometers and a line width of 10 to 30 micrometers. In FIG. 1B, the electromagnetic shielding layer is formed by patterning a mesh, but may be patterned into a stripe shape. The conductive material 110 may be formed by a printing method or the like, but is preferably formed by a sputtering method. When the electromagnetic shielding film is formed by the sputtering method, the electromagnetic shielding film can be patterned by sputtering the conductive material 110 after covering the mask on the substrate 100. The rest of the configuration of the display apparatus except for the above-described electromagnetic shielding film is the same as that of the conventional display panel.

The operation of the first embodiment of the display device according to the present invention described above is as follows.

By stacking a conductive material having a low electrical resistance, the electromagnetic shielding effect is increased, and the empty space formed by the patterning of the conductive material is emitted to the outside of visible light inside the display device to improve light transmittance.

2 is a cross-sectional view of a second embodiment of the electromagnetic shielding film of the display device according to the present invention, Figure 3 is a cross-sectional view of a third embodiment of the electromagnetic shielding film of the display device according to the present invention. The second and third embodiments of the electromagnetic shielding film of the display device according to the present invention will be described with reference to FIGS. 2 and 3 as follows.

The second embodiment differs from the first embodiment described above in that the ITO 120a is formed on the substrate 100 and the conductive material 110 is laminated on the ITO 120a. Same as the first embodiment. The third embodiment is basically the same as the second embodiment, but differs from the second embodiment in that the ITO 120b is formed in an empty space between the respective conductive materials 110 stacked. In the second and third embodiments, each of the ITO layers 120a and 120b preferably has a thickness of 20 to 200 nanometers. It is preferable that the line width of the conductive material 110 is 10 to 30 micrometers, and the thickness is preferably 1 to 5 micrometers, and the reason thereof will be described later.

The operation of the second and third embodiments of the display device according to the present invention described above is as follows.

Electromagnetic shielding effect can be increased by stacking conductive materials with low electrical resistance, and ITO is laminated in empty spaces formed by patterning conductive materials to increase electrical conductivity without lowering light transmittance, thereby improving electromagnetic shielding effect. do. In the first embodiment, the electromagnetic shielding effect can be expected only when the conductive material is formed to a thickness of 1 to 10 micrometers, but in the present embodiment, since ITO is laminated together, the thickness may be 1 to 5 micrometers.

A method of manufacturing a display device according to the present invention is characterized in that an electromagnetic shielding film is produced by putting a mask on a substrate and stacking a conductive material by sputtering. The method is a method of manufacturing the above-described embodiments of the display device, the manufacturing method of the other configuration other than the electromagnetic shielding film is the same as the prior art.

4 is a flowchart illustrating an example of a manufacturing process of an electromagnetic wave shielding film in a method of manufacturing a display device according to the present invention, and FIG. 5 is a diagram illustrating a process of putting a mask on a substrate and sputtering a conductive material. 4 and 5, an embodiment of the method for manufacturing an electromagnetic shielding film according to the present invention will be described.

First, the first ITO layer 120a is formed on the substrate 100 (S410). As described above, the substrate 100 is any one of a panel, a PET film, and a glass of the display device. Subsequently, a conductive material is formed on the first ITO layer 120a. The conductive material is patterned using the mask 150 (S420). The conductive material is formed by sputtering. Specifically, the particles having high energy (> 30 eV) impinge on the target of the conductive material to transfer energy to the atoms forming the target of the conductive material, whereby the atoms are released. Stacked on the substrate 100.

The shape of the mask 150 is different depending on the shape of the conductive material to be formed. Preferably, the mask 150 has a stripe type when the stripe-type conductive material is formed, and a plurality of squares when the mesh-type conductive material is formed. It is characterized by the type. The conductive material is preferably patterned with a line width of 10 to 30 micrometers, the thickness and the thickness of the first and second ITO layers being the same as those of the display device described above.

After the conductive material layer is patterned, grooves are formed in the empty space, and a second ITO layer is formed therein (S430). In the present embodiment, the first and second ITO layers are formed to improve the electromagnetic shielding effect while maintaining the light transmittance, but may not be formed in other embodiments. In addition, the manufacturing method of the structure other than the manufacturing process of an electromagnetic wave shielding film is the same as that of the prior art.

Referring to the operation of the embodiment of the manufacturing method of the display device according to the present invention described above are as follows.

By forming a mask on the substrate and sputtering the conductive material layer, the electromagnetic shielding film can be patterned to form. Therefore, both the electromagnetic wave shielding effect and the light transmittance can be improved. In addition, ITO may be formed above and below the conductive material to reduce the thickness of the electromagnetic shielding layer by reducing the thickness of the conductive material layer. In addition, the effect of shielding near-infrared radiation emitted from the inside of the display by stacking the ITO and the conductive material can be expected.

The rest of the configuration of the display apparatus except for the above-described electromagnetic shielding film is the same as in the related art. In addition, it is apparent that the above-described electromagnetic shielding film may be used not only for plasma display panels but also for other display devices such as LCDs and portable terminals.

The present invention is not limited to the above-described embodiments, and such modifications are included in the scope of the present invention even if modifications are possible by those skilled in the art to which the present invention pertains.

Referring to the effects of the display device and the manufacturing method according to the present invention described above are as follows.

First, the manufacturing process and time of the electromagnetic shielding film constituting the display device can be simplified.

Second, it is possible to reduce the thickness and weight of the electromagnetic shielding film of the display device.

Claims (19)

A panel on which image information is displayed; And And a microwave shielding film formed on a front surface of the panel with a thickness of 1 to 10 micrometers and formed by patterning a conductive material layer. The method of claim 1, wherein the substrate, Display device, characterized in that any one of a panel of the display device, PET film and glass. The method of claim 1, wherein the conductive material, And at least one of silver, copper, aluminum, stainless steel, and nickel. The method of claim 1, wherein the conductive material layer, Display device, characterized in that the line width is 10 to 30 micrometers. The method of claim 1, wherein the conductive material layer, Display device characterized in that the patterned stripe type. The method of claim 1, wherein the conductive material layer, Display device characterized in that the patterned in the mesh type. The method of claim 1, wherein the conductive material layer, A display device formed by the sputtering method. The method of claim 1, And a ITO layer formed on at least one of upper and lower portions of the conductive material layer. The method of claim 8, wherein the ITO layer, Display device, characterized in that the thickness of 20 ~ 200 nanometers. Applying a mask on the substrate; And And manufacturing an electromagnetic shielding film by stacking a conductive material layer on the substrate by sputtering. The method of claim 10, wherein the substrate, Method of manufacturing a display device, characterized in that any one of a panel of the display device, PET film and glass. The method of claim 10, wherein the mask, A method of manufacturing a display device, characterized in that the stripe type. The method of claim 10, wherein the mask, A plurality of rectangular type, wherein the conductive material layer is laminated in a mesh type manufacturing method of a display device. The method of claim 10, wherein the conductive material, And at least one of silver, copper, aluminum, stainless steel, and nickel on the substrate. The method of claim 10, Stacking ITO on the groove on the conductive material layer. The method of claim 10, And forming ITO between the substrate and the conductive material layer. The method of claim 15 or 16, wherein the ITO layer, Method of manufacturing a display device, characterized in that the thickness is 20 ~ 200 nanometers. The method of claim 10, wherein the conductive material layer, A method of manufacturing a display device, characterized in that the thickness is 1 ~ 10 micrometers. The method of claim 10, wherein the conductive material layer, A manufacturing method of a display device, characterized in that the line width is laminated to 10 ~ 30 micrometers.

Images